JPH08195560A - Method for manufacturing printed circuit board - Google Patents

Method for manufacturing printed circuit board

Info

Publication number
JPH08195560A
JPH08195560A JP349595A JP349595A JPH08195560A JP H08195560 A JPH08195560 A JP H08195560A JP 349595 A JP349595 A JP 349595A JP 349595 A JP349595 A JP 349595A JP H08195560 A JPH08195560 A JP H08195560A
Authority
JP
Japan
Prior art keywords
layer
protrusion
conductor
insulator
conductor circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP349595A
Other languages
Japanese (ja)
Inventor
Satoru Itaya
哲 板谷
Yutaka Karasuno
ゆたか 烏野
Susumu Ozawa
進 小澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OKI PURINTETSUDO CIRCUIT KK
Oki Electric Industry Co Ltd
Original Assignee
OKI PURINTETSUDO CIRCUIT KK
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by OKI PURINTETSUDO CIRCUIT KK, Oki Electric Industry Co Ltd filed Critical OKI PURINTETSUDO CIRCUIT KK
Priority to JP349595A priority Critical patent/JPH08195560A/en
Publication of JPH08195560A publication Critical patent/JPH08195560A/en
Pending legal-status Critical Current

Links

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)

Abstract

PURPOSE: To achieve contact and contact bonding to an opposing conductor circuit layer by allowing a protrusion to break through an insulator resin layer with the pressure obtained by pressing a lamination body using a press tool plate. CONSTITUTION: A protrusion 112 for connecting first and second conductor layers, a protrusion 122 for connecting second and third conductor layers, and a protrusion 132 for connecting third and fourth conductor layers break through an insulator 120 between the first and second conductor layers, an insulator 130 between the second and third conductor layers, and an insulator 140 between the third and fourth conductor layers, thus achieving contact to a second conductor layer 121, a third conductor layer 131, and a fourth conductor layer 141, respectively, for improved contact bonding. The insulator layer between conductor layers is a sheet made of insulation resin and the protrusion for connecting conductor layers is formed by electrolytic plating.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はプリント回路基板の製造
方法に関し、特に一枚の基板の厚さ方向に多数の導体配
線層を有する多層プリント基板と呼ばれているプリント
回路基板の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a printed circuit board, and more particularly to a method for manufacturing a printed circuit board called a multilayer printed circuit board having a large number of conductor wiring layers in the thickness direction of one board. It is a thing.

【0002】[0002]

【従来の技術】この種のプリント回路基板に関しては、
例えば、文献;プリント基板技術とその品質保証:応用
技術出版(株)刊、情報技術センター発売、(昭和55
年8月27日発行)の第8章に詳説されている。
2. Description of the Related Art Regarding a printed circuit board of this type,
For example, literature; printed circuit board technology and its quality assurance: published by Applied Technology Publishing Co., Ltd., Information Technology Center, (Showa 55
(Published August 27, 2013).

【0003】従来、プリント回路基板の製造において
は、ガラス繊維を布状に織りあげたシート状板に絶縁性
の樹脂を含浸させたシートの片面又は両面に銅箔を貼り
付けた銅張積層板や、ガラス繊維を布状に織りあげたシ
ート状板に絶縁性の樹脂を含浸させたシート状の絶縁材
料に銅箔を貼り付けた銅箔プリプレグ等を使用し、これ
らの銅箔部分をエッチングする等の技術により、必要な
回路を形成する方法を採用していた。
[0003] Conventionally, in the manufacture of printed circuit boards, a copper clad laminate in which a sheet-like plate made by weaving glass fibers into a cloth shape is impregnated with an insulating resin and a copper foil is attached to one or both sides of the sheet. Alternatively, use a copper foil prepreg made by pasting a copper foil on a sheet-shaped insulating material that is a sheet-shaped plate woven of glass fiber in a cloth shape and impregnated with an insulating resin. A method of forming a necessary circuit by a technique such as the above has been adopted.

【0004】また、上述のような単層基板の外に、銅の
層を多数持っている前述の多層基板の製造の場合には、
銅の回路層間の電気回路的接続が必要である。このよう
な層間の接続のためには、厚さ方向に貫通するスルーホ
ールを形成し、その内壁をめっき等の方法で導電性膜で
コーティングし、かつ接続の必要な層と電気的に接続さ
せる構造となっている。この為、所要の場所にスルーホ
ールを設けるためにドリル等で基板に穴を空ける必要が
あった。そして、これらの手法により回路形成が完了し
た材料を積み重ねて、熱と圧力によりプレスして多層基
板を製造する方法が主流となっていた。
Further, in the case of manufacturing the above-mentioned multi-layer board having a large number of copper layers in addition to the above-mentioned single-layer board,
Electrical circuit connections between copper circuit layers are required. For such connection between layers, a through hole penetrating in the thickness direction is formed, the inner wall of the through hole is coated with a conductive film by a method such as plating, and the layer is electrically connected to a layer requiring connection. It has a structure. Therefore, it is necessary to make a hole in the substrate with a drill or the like in order to provide a through hole at a required place. Then, a method in which materials for which circuit formation is completed by these methods are stacked and pressed by heat and pressure to manufacture a multilayer substrate has been mainstream.

【0005】[0005]

【発明が解決しようとする課題】上述のような従来のプ
リント回路基板の製造方法では、最新技術における要請
のように、基板のサイズが小形化、薄型化し、層間の厚
さも薄くなり、さらにスルーホールの穴径も非常に小さ
くなつている場合には、次に箇条書きするような幾つか
の問題が生じていた。 (1)銅張積層板やプリプレグを構成しているガラス繊
維が、スルーホールの穴あけにおけるドリル加工の障害
になる。 (2)ガラス繊維がドリルの刃を傷めるため、ドリルの
刃の寿命を著しく縮め、特に穴径が小さい場合は、ドリ
ルの折損等により、ドリルの刃代等のコストがかさむ。 (3)ドリルやレーザー加工等の方法では、加工可能穴
径に限界がある。 (4)小径スルーホール内のめっき及びその前処理工程
で、スルーホール径が小さくなると、めっき液や処理液
が穴の中に入らないためにめっきが形成されず、導通不
良となる。 そして、これらの問題点によって、プリント回路基板の
製造が難しくなり、不良の発生する確率も高くなり、さ
らに進むと、前述の製造方法では製造が困難になる等の
問題があった。
In the conventional method of manufacturing a printed circuit board as described above, the size of the board is made smaller and thinner, the thickness of the interlayer is made thinner, and the through-hole is further required, as required by the latest technology. When the hole diameter was also very small, there were some problems as listed below. (1) The glass fiber forming the copper clad laminate or the prepreg becomes an obstacle to the drilling process for drilling through holes. (2) Since glass fiber damages the blade of the drill, the life of the blade of the drill is significantly shortened, and especially when the hole diameter is small, the cost of the blade edge of the drill is increased due to breakage of the drill. (3) With methods such as drilling and laser processing, there is a limit to the hole diameter that can be processed. (4) If the diameter of the through hole is reduced in the plating in the small diameter through hole and its pretreatment process, the plating solution or the processing solution does not enter the hole, so that the plating is not formed, resulting in poor conduction. Due to these problems, it is difficult to manufacture the printed circuit board, the probability of occurrence of defects increases, and further progresses, there is a problem that the manufacturing method becomes difficult.

【0006】[0006]

【課題を解決するための手段】本発明に係るプリント回
路基板の製造方法は、両面又は片面に導電体回路層を有
する絶縁体層と導電体回路層を有しない絶縁体層とを所
定数積み重ねた積層体を、導電体回路層を有するプレス
治具板を用いて両端面から加圧・成形し、同時に所定の
少なくとも上下2つの導電体回路層を電気的に接続させ
て多層プリント基板を形成するプリント回路基板の製造
方法において、絶縁体層をいずれもガラス繊維を含まな
いシート状の絶縁体樹脂層で形成し、導電体回路層の所
定場所上に導電体回路層間の電気的接続用の導電体から
なる突起を設けておき、積層体をプレス治具板を用いて
プレスを行うことによる圧力によって絶縁体樹脂層を突
起が突き破り、対向する導電体回路層に当接・圧着させ
るものである。
A method for manufacturing a printed circuit board according to the present invention comprises stacking a predetermined number of insulator layers having conductor circuit layers on both sides or one side and insulator layers having no conductor circuit layers. The laminated body is pressed and molded from both end faces using a press jig plate having a conductor circuit layer, and at the same time, at least two conductor circuit layers at a predetermined level are electrically connected to form a multilayer printed circuit board. In the method for manufacturing a printed circuit board, the insulating layer is formed of a sheet-shaped insulating resin layer that does not contain any glass fiber, and for electrical connection between the conductive circuit layers on a predetermined place of the conductive circuit layer. A protrusion made of a conductor is provided, and the protrusion breaks through the insulating resin layer due to the pressure generated by pressing the laminated body using a pressing jig plate, and the conductor resin layer is brought into contact with and pressure-bonded to the opposing conductor circuit layer. is there.

【0007】そして、前記の絶縁体樹脂層を突起が突き
破る手段において、圧力に加えて、絶縁体樹脂層の溶融
温度まで加熱して突起の突き破りを容易にする製造方法
であってもよく、これとは別に、絶縁体樹脂層を突起が
突き破る手段の代りに、突起が突き破る位置に予め突起
が通る大きさの穴を開けておき、プレス時に突起が穴を
通って対向する導電体回路層に当接・圧着させるように
してもよい。さらに、突起の先端部に、絶縁体樹脂層の
樹脂硬化温度より高い溶融温度を有する半田層を設けて
おき、熱及び圧力で絶縁体樹脂層を突起で突き破り半田
層を導電体回路層に圧接させ、絶縁体樹脂層を硬化させ
た後、この状態で温度を半田の溶融温度まで上昇し半田
層を溶融させて突起を導電体回路層に接続させた後、冷
却して半田層を固化させる製造方法でもよい。また、接
続部を構成する導電体回路層上に形成した突起をその先
端部が対向するように上下の絶縁体樹脂層の同位置に設
け、突起の先端部に接続部がプレス時に互いに接触しつ
つ滑り合う面と、互いに噛み合い、引っ掛かり合い接触
する面を設けている突起部構造のものを使用してもよ
い。
Further, in the above-mentioned means for the protrusion to break through the insulating resin layer, a manufacturing method for heating the insulating resin layer to the melting temperature of the insulating resin layer to facilitate the breaking of the protrusion may be applied. Separately, instead of a means for the protrusion to break through the insulating resin layer, a hole large enough for the protrusion to pass is formed in advance at the position where the protrusion penetrates, and the conductor circuit layer facing the conductor circuit layer through the hole during pressing. You may make it contact | abut and crimp. Furthermore, a solder layer having a melting temperature higher than the resin curing temperature of the insulating resin layer is provided at the tip of the protrusion, and the insulating resin layer is pierced by the protrusion by heat and pressure and the solder layer is pressed against the conductor circuit layer. Then, after curing the insulating resin layer, the temperature is raised to the melting temperature of the solder in this state to melt the solder layer and connect the protrusion to the conductor circuit layer, and then cooled to solidify the solder layer. A manufacturing method may be used. In addition, the protrusions formed on the conductor circuit layer that constitutes the connecting portion are provided at the same positions of the upper and lower insulating resin layers so that the tips of the protrusions face each other, and the connecting portions contact the tips of the protrusions during pressing. You may use the thing of a protrusion part structure provided with the surface which slides, and the surface which meshes mutually and is caught and contacted.

【0008】[0008]

【作用】本発明においては、両面又は片面に導電体回路
層を有する絶縁体層と導電体回路層を有しない絶縁体層
とを所定数積み重ねた積層体を、加圧・成形し、同時に
所定の少なくとも上下2つの導電体回路層を電気的に接
続させるプリント回路基板の製造方法において、絶縁体
層をいずれもガラス繊維を含まないシート状の絶縁体樹
脂層で形成し、導電体回路層の所定場所上に導電体回路
層間の電気的接続用の導電体からなる突起(金属塊)を
設けておき、積層体をプレス治具板を用いてプレスを行
うものである。そのため、従来の繊維を含むシート状の
絶縁体樹脂材料(プリプレグ)を使用していたのに比
べ、プレス圧力によって絶縁体樹脂層の突起による突き
破りができるようになり、これを利用して、対向する導
電体回路層に突起部を当接・圧着させるので、従来のス
ルーホールによる接続部の形成より、接続部を薄くかつ
小径(小面積)で形成できるようになる。
According to the present invention, a laminate in which a predetermined number of insulator layers having conductor circuit layers on both sides or one side and insulator layers having no conductor circuit layers are stacked is pressed and molded at the same time. In the method for manufacturing a printed circuit board in which at least two upper and lower conductor circuit layers are electrically connected, the insulator layer is formed of a sheet-shaped insulator resin layer containing neither glass fiber, A protrusion (metal block) made of a conductor for electrical connection between conductor circuit layers is provided on a predetermined place, and the laminated body is pressed using a pressing jig plate. Therefore, compared to the conventional sheet-shaped insulating resin material (prepreg) containing fibers, the insulating resin layer can be pierced by the projection of the insulating resin layer due to the pressing pressure. Since the protrusion is brought into contact with and pressure-bonded to the conductor circuit layer, the connecting portion can be formed thinner and with a smaller diameter (small area) than the conventional forming of the connecting portion by the through hole.

【0009】[0009]

【実施例】 (第1の実施例)図1は本発明の第1の実施例を示す基
板構成説明図であり、左側図(a)はプレス成形前の状
態、右側図(b)はプレス成形後の状態を示している。
110は回路パターンを構成している第1導電体層11
1を形成するための板状の下側ステンレス台であり、最
終工程で樹脂及び銅材が剥離し易いように表面を鏡面仕
上げを行ったステンレス鋼(以下ステンレスという)等
の導電性のある金属で作られている。なお、この下側ス
テンレス台110は第1導電体層111を形成するため
の台だけでなく、熱プレスの際の下側プレス治具のプレ
ス板の役目もするもので、厚さは少なくとも1mm必要
であり、反りのない表面が平滑なものであることが必要
である。そして、下側ステンレス台110の平滑面に回
路パターンとなる第1導電体層111を形成するが、そ
の形成はめっきレジストを用いた電解めっきによる方法
でよいが、例えばペースト等を用いたスクリーン版等に
よる印刷による方法でもよい。
Embodiments (First Embodiment) FIG. 1 is a substrate configuration explanatory view showing a first embodiment of the present invention. A left side view (a) is a state before press molding, and a right side view (b) is a press. The state after molding is shown.
110 is a first conductor layer 11 that constitutes a circuit pattern.
1 is a plate-shaped lower stainless steel table for forming 1 and has a conductive metal such as stainless steel (hereinafter referred to as stainless steel) whose surface is mirror-finished so that the resin and the copper material are easily separated in the final step. Is made of. The lower stainless steel table 110 not only serves as a table for forming the first conductor layer 111, but also serves as a pressing plate of a lower pressing jig during hot pressing, and has a thickness of at least 1 mm. It is necessary, and it is necessary that the surface without warpage is smooth. Then, the first conductor layer 111 to be a circuit pattern is formed on the smooth surface of the lower stainless steel table 110. The formation may be performed by electrolytic plating using a plating resist. For example, a screen plate using a paste or the like may be used. It is also possible to use a printing method such as printing.

【0010】形成した第1導電体層111の所定場所上
に、第1、第2導電体層間接続用突起112を形成す
る。第1、第2導電体層間接続用突起112の形成は、
第1導電体層111を形成した後に行ってもよいが、第
1導電体層111の形成時に同時に行ってもよい。この
第1、第2導電体層間接続用突起112の形成方法は、
第1導電体層111の形成方法と同じで、めっきレジス
トを用いた電解めっきによる方法で形成しても、導電性
ペースト等を用いてスクリーン製版による印刷、又はデ
ィスペンサー等による方法でもよい。第1、第2導電体
層間接続用突起112の高さは、製造しようとしている
基板の設計仕様に定められる絶縁層の厚さ分必要であ
る。
Protrusions 112 for connecting the first and second conductor layers are formed on predetermined locations of the formed first conductor layer 111. The formation of the first and second conductor interlayer connection protrusions 112 is
Although it may be performed after forming the first conductor layer 111, it may be performed at the same time when the first conductor layer 111 is formed. The method for forming the first and second conductor interlayer connecting protrusions 112 is as follows.
Similar to the method of forming the first conductor layer 111, the first conductor layer 111 may be formed by an electrolytic plating method using a plating resist, a screen printing method using a conductive paste or the like, or a dispenser method. The height of the first and second conductor interlayer connection protrusions 112 is required to be the thickness of the insulating layer determined by the design specifications of the substrate to be manufactured.

【0011】第1、第2導電体層間絶縁体層120は、
絶縁性樹脂よりなるシートで、第1導電体層111と第
2導電体層121との間の電気的絶縁を図るために用い
る基板用部材である。その厚さは、製造しようとしてい
る基板の設計仕様に定められる絶縁層の厚さ分必要であ
る。第1、第2導電体層間絶縁体層120の所定場所上
に、第1、第2導電体層間接続用突起112を形成した
方法と同じ方法により、第2導電体層121と第2、第
3導電体層間接続用突起122を形成する。第2、第3
導電体層間接続用突起122の高さは、製造しようとし
ている基板の設計仕様に定められる絶縁層の厚さ分必要
である。
The first and second conductor interlayer insulator layers 120 are
It is a sheet made of an insulating resin and is a substrate member used for achieving electrical insulation between the first conductor layer 111 and the second conductor layer 121. The thickness is required to be the thickness of the insulating layer defined in the design specifications of the substrate to be manufactured. The second conductor layer 121, the second conductor layer 121, and the second conductor layer insulator 120 are formed on the predetermined locations of the first and second conductor interlayer insulator layers 120 by the same method as the method of forming the first and second conductor interlayer connecting protrusions 112. Protrusions 122 for connecting three-conductor layers are formed. 2nd, 3rd
The height of the conductor-to-conductor connection 122 is required to be equal to the thickness of the insulating layer defined in the design specifications of the substrate to be manufactured.

【0012】第2、第3導電体層間絶縁体層130は、
絶縁性樹脂よりなるシートで、第2導電体層121と第
3導電体層131との間の電気的絶縁を図るために用い
る基板用部材である。その厚さは、製造しようとしてい
る基板の設計仕様に定められる絶縁層の厚さ分必要であ
る。第2、第3導電体層間絶縁体層130の所定場所上
に、第1、第2導電体層間接続用突起112を形成した
方法と同じ方法により、第3導電体層131と第3、第
4導電体層間接続用突起132を形成する。第3、第4
導電体層間接続用突起132の高さは、製造しようとし
ている基板の設計仕様に定められる絶縁層の厚さ分必要
である。
The second and third conductor interlayer insulator layers 130 are
It is a sheet made of an insulating resin and is a substrate member used for achieving electrical insulation between the second conductor layer 121 and the third conductor layer 131. The thickness is required to be the thickness of the insulating layer defined in the design specifications of the substrate to be manufactured. The third conductor layer 131 and the third and third conductor layers 131 and 131 are formed by the same method as the method of forming the first and second conductor interlayer connecting protrusions 112 on the predetermined locations of the second and third conductor interlayer insulator layers 130. A protrusion 132 for 4-conductor interlayer connection is formed. 3rd and 4th
The height of the conductor interlayer connection protrusion 132 is required to be the thickness of the insulating layer determined by the design specifications of the substrate to be manufactured.

【0013】第3、第4導電体層間絶縁体層140は、
絶縁性樹脂よりなるシートで、第3導電体層131と第
4導電体層141との間の電気的絶縁を図るために用い
る基板用部材である。その厚さは、製造しようとしてい
る基板の設計仕様に定められる絶縁層の厚さ分必要であ
る。上側ステンレス台150は回路パターンの第4導電
体層141を形成するための台であり、最後の工程で樹
脂及び銅が剥離し易いように、表面を鏡面仕上げを行っ
たステンレス板等の導電性のある金属製であることが望
ましい。なお、このステンレス製の上側ステンレス台1
50は第4導電体層141を形成するための台だけでな
く、熱プレスの際のプレス板の役目も果たすためのもの
であり、厚さは少なくとも1mm以上必要で、かつ反り
がなく、表面が平滑であるものが必要である。従って、
この上側ステンレス台150は、下側ステンレス台11
0と同一機能のものである。そして、上側ステンレス台
150の平滑面に回路パターンとなる第4導電体層14
1を形成するが、その形成はめっきレジストを用いた電
解めっきによる方法でよいが、例えばペースト等を用い
たスクリーン版等による印刷による方法でもよい。な
お、図1は第4導電体層141形成後の状態を示してい
るが、基板層の構成や製造方法の説明の便宜上、天地反
転して図示している。
The third and fourth conductor interlayer insulator layers 140 are
It is a sheet made of an insulating resin, and is a substrate member used for achieving electrical insulation between the third conductor layer 131 and the fourth conductor layer 141. The thickness is required to be the thickness of the insulating layer defined in the design specifications of the substrate to be manufactured. The upper stainless steel table 150 is a table for forming the fourth conductor layer 141 of the circuit pattern, and is made of a conductive material such as a stainless steel plate whose surface is mirror-finished so that the resin and copper are easily separated in the last step. It is desirable that it be made of a certain metal. In addition, this stainless steel upper stainless steel table 1
Reference numeral 50 not only serves as a base for forming the fourth conductor layer 141, but also serves as a press plate during hot pressing, and the thickness is required to be at least 1 mm or more, and there is no warp, and the surface. Is required to be smooth. Therefore,
The upper stainless steel table 150 is the lower stainless steel table 11
It has the same function as 0. Then, the fourth conductor layer 14 serving as a circuit pattern is formed on the smooth surface of the upper stainless steel table 150.
1 may be formed by electrolytic plating using a plating resist, but may also be formed by printing using a screen plate or the like using a paste or the like. Note that FIG. 1 shows a state after the fourth conductor layer 141 is formed, but is shown upside down for convenience of explanation of the structure of the substrate layer and the manufacturing method.

【0014】上述のようにして準備された図1に示す部
品番号110から150までの部材を位置精度よく積み
重ねた後、熱プレスによりプレスして、一枚の多層基板
を形成する。プレス時に印加する温度は、第1、第2導
電体層間絶縁体層120、第2、第3導電体層間絶縁体
層130及び第3、第4導電体層間絶縁体層140に使
用される絶縁体材料の種類により異なるが、一般的には
使用する樹脂のガラス転移温度+20〜30℃程度が最
適である。例えば、エポキシ樹脂の場合は大体、170
〜180℃程度である。プレスの時間は、第1、第2導
電体層間絶縁体層120、第2、第3導電体層間絶縁体
層130及び第3、第4導電体層間絶縁体層140が溶
融し導体回路パターンの間隙に隙間なく流れ込むための
時間が必要で、概ね100分程度必要である。そして、
プレスの加圧力は25kg/cm程度が必要である。
After the members of the part numbers 110 to 150 shown in FIG. 1 prepared as described above are stacked with high positional accuracy, they are pressed by a hot press to form a single multilayer substrate. The temperature applied during pressing is the insulation used for the first and second conductor interlayer insulator layers 120, the second and third conductor interlayer insulator layers 130, and the third and fourth conductor interlayer insulator layers 140. Although it depends on the type of body material, the optimum glass transition temperature of the resin used is generally about 20 to 30 ° C. For example, in the case of an epoxy resin, about 170
It is about 180 ° C. The pressing time is such that the first and second conductor interlayer insulator layers 120, the second and third conductor interlayer insulator layers 130 and the third and fourth conductor interlayer insulator layers 140 are melted, and the conductor circuit pattern It takes about 100 minutes to flow into the gap without any gap. And
The pressing force of the press needs to be about 25 kg / cm 2 .

【0015】上述のようなプレス操作により、第1、第
2導電体層間接続用突起112、第2、第3導電体層間
接続用突起122及び第3、第4導電体層間接続用突起
132は、それぞれ第1、第2導電体層間絶縁体層12
0、第2、第3導電体層間絶縁体層130及び第3、第
4導電体層間絶縁体層140を突き破り、図1の(b)
に示されるように、それぞれ第2導電体層121、第3
導電体層131及び第4導電体層141にしっかり圧着
されるようになる。そして、それぞれ十分な電気的接続
を取ることが可能となる。この場合、接続の信頼性をよ
り高めるために、図4に示すように、導電体回路パター
ン401上の接続部用突起402の先端部を、金403
又は白金(403)等の貴金属で覆うようにしてもよ
い。なお、各突起が絶縁体層を突き破る際には、熱プレ
スより供給される熱により、絶縁層の樹脂自体も軟化し
ているので、非常に滑らかに各絶縁層樹脂を突き破るこ
とが可能である。突き破りが完了した後も、絶縁層樹脂
自体が溶融しているため、突起の周囲は空隙なく樹脂に
よって埋め込まれるため、多層基板としての品質も良好
なものとなる。
By the pressing operation as described above, the first and second conductor interlayer connecting protrusions 112, the second and third conductor interlayer connecting protrusions 122, and the third and fourth conductor interlayer connecting protrusions 132 are formed. , The first and second conductor interlayer insulator layers 12, respectively
1B through the 0th, 2nd, and 3rd conductor interlayer insulating layers 130 and the 3rd and 4th conductor interlayer insulating layers 140.
, The second conductor layer 121 and the third conductor layer 121, respectively.
The conductor layer 131 and the fourth conductor layer 141 are firmly pressed. Then, it becomes possible to make sufficient electrical connection with each. In this case, in order to further enhance the reliability of the connection, as shown in FIG.
Alternatively, it may be covered with a noble metal such as platinum (403). When each protrusion breaks through the insulating layer, the resin itself of the insulating layer is softened by the heat supplied from the hot press, so it is possible to break through each insulating layer resin very smoothly. . Even after the piercing is completed, since the insulating layer resin itself is melted, the periphery of the protrusion is filled with the resin without any voids, so that the quality of the multilayer substrate is also good.

【0016】また、その他の方法として図5に示すよう
に、適当な方法で各導電体回路パターン501上に形成
された接続部用突起502の先端部に半田を塗布して半
田付着部分503を形成したものとし、各層をプレスし
てもよい。この場合の半田の塗布方法として、次の
(イ),(ロ)に示す2つの方法が好適である。 (イ)図6の左図に示すように、半田が加熱溶融されて
いる半田槽603中に、導電体回路パターン601上に
形成された接続部用突起602の先端のみを浸漬し、図
6の右図のように半田付着部分603を形成する。 (ロ)図7の左図に示すように、導電体回路パターン7
01上に接続部形成用のめっきレジスト702を使用し
て接続部突起703をめっきにより形成した場合には、
さらに図7の右図のように、そのめっきレジスト702
を利用して、電解半田めっきを行って接続部突起703
の先端に半田付着部分704を形成してもよい。 使用する半田は、その理由を後述するが、各導電体槽間
絶縁体層120,130…等用に使用されている樹脂の
硬化温度より、10℃程度以上高い融点を持つ組成の半
田がよい。
As another method, as shown in FIG. 5, solder is applied to the tips of the connection portion projections 502 formed on the respective conductor circuit patterns 501 by an appropriate method to form the solder attachment portions 503. Once formed, each layer may be pressed. In this case, the following two methods (a) and (b) are suitable as the solder application method. (A) As shown in the left diagram of FIG. 6, only the tips of the connection portion projections 602 formed on the conductor circuit pattern 601 are immersed in the solder bath 603 in which the solder is heated and melted. As shown in the right diagram of FIG. (B) As shown in the left diagram of FIG. 7, the conductor circuit pattern 7
In the case where the connection portion projection 703 is formed on the 01 by using the connection portion forming plating resist 702,
Further, as shown on the right side of FIG. 7, the plating resist 702
Electrolytic solder plating is performed using
A solder attachment portion 704 may be formed at the tip of the. Although the reason will be described later, the solder to be used is preferably a solder having a composition having a melting point higher by about 10 ° C. or more than the curing temperature of the resin used for the inter-conductor-tank insulating layers 120, 130. .

【0017】図5〜図7に示したような接続部突起の先
端部に半田を塗布した場合のプレス時の各部材の要部の
様子を、図8のa)〜d)で示す模式図によって説明す
る。この場合説明の簡略化のために、上部回路パターン
821が形成された上部絶縁体層820と、絶縁体用樹
脂シート810と、下部回路パターン801に形成され
た接続部突起802の先端に半田付着部分803を有す
る下部絶縁体層800とについて、熱プレスする場合に
ついて示す。 a)において、図はプレス前の配列状態を示すが、半田
付着部分803は固体の状態である。 b)では、熱プレスが進行して、供給されてくる熱によ
って、常温から徐々に温度が上昇し、絶縁体樹脂の温度
がガラス転移温度を越えると、樹脂が軟化してくるよう
になる。 c)やがて、樹脂の部分は流動状態となり、さらに温度
が上昇するとゲル化し、最後に硬化温度に達すると固体
になる。この経過中において、半田付着部分803は、
硬化温度+10℃の溶融温度になるまでは絶縁体用樹脂
シート810を突き破るに充分な硬さを有している。そ
して、半田付着部分803が絶縁体用樹脂シート810
を突き破り、相手側の導電体層の上部回路パターン82
1に圧接される。なお、811は溶融後固化した樹脂部
分である。 d)さらに供給されてくる熱により、半田が溶融する温
度になると、半田が溶融して溶融した半田部分804と
なる。 そして、上記のa)〜d)で示すプレス工程が終了し全
体が冷却されると、接続部突起802の先端と上部回路
パターン821とは固化した半田により強固に接続され
るようになる。
8A to 8D are schematic diagrams showing the states of the main parts of each member at the time of pressing when solder is applied to the tips of the connection projections as shown in FIGS. Explained by. In this case, for simplification of description, solder is attached to the upper insulator layer 820 having the upper circuit pattern 821 formed thereon, the insulating resin sheet 810, and the tips of the connection protrusions 802 formed on the lower circuit pattern 801. A case of hot pressing the lower insulator layer 800 having the portion 803 will be described. In a), the drawing shows the arrangement state before pressing, but the solder attachment portion 803 is in a solid state. In b), the heat pressing proceeds, and the temperature of the supplied heat gradually rises from the room temperature, and when the temperature of the insulating resin exceeds the glass transition temperature, the resin softens. c) Eventually, the resin portion becomes in a fluidized state, gels when the temperature further rises, and finally becomes solid when the curing temperature is reached. During this process, the solder-attached portion 803 is
It has sufficient hardness to break through the insulating resin sheet 810 until the melting temperature of the curing temperature + 10 ° C. is reached. Then, the solder-attached portion 803 is the insulator resin sheet 810.
The upper circuit pattern 82 of the conductor layer on the other side
Pressed to 1. In addition, 811 is a resin part solidified after melting. d) When the temperature of the solder is melted by the heat supplied further, the solder is melted and becomes the melted solder portion 804. Then, when the pressing steps shown in a) to d) above are completed and the whole is cooled, the tips of the connection protrusions 802 and the upper circuit patterns 821 are firmly connected by the solidified solder.

【0018】図1の実施例の場合は、上述と同様にし
て、第2、第3導電体層間接続用突起122と第3導電
体層131、第3、第4導電体層間接続用突起132と
第4導電体層141とが圧着される。図1の(b)はプ
レス終了後の基板断面を示すものである。なお、160
は全体の絶縁体層が溶融してプレス終了後の固化した樹
脂層である。その後、不要な下側ステンレス台110及
び上側ステンレス台150を剥離することにより図1の
(b)のような多層基板が完成する。下側ステンレス台
110及び上側ステンレス台150の表面は鏡面仕上げ
になっているので、プレス後でも簡単に剥離が可能であ
る。また、第1導電体層111や第4導電体層141等
の外部に露出した部分には、必要に応じて、ソルダレジ
スト及び半田等を塗布して仕上げを終了する。
In the case of the embodiment shown in FIG. 1, similarly to the above, the second and third conductor interlayer connection protrusions 122 and the third conductor layer 131, and the third and fourth conductor interlayer connection protrusions 132 are formed. And the fourth conductor layer 141 are pressure bonded. FIG. 1B shows a cross section of the substrate after the pressing is completed. Note that 160
Is a solidified resin layer after the entire insulating layer is melted and pressed. Thereafter, the unnecessary lower stainless steel table 110 and upper unnecessary stainless steel table 150 are peeled off to complete the multilayer substrate as shown in FIG. Since the surfaces of the lower stainless steel table 110 and the upper stainless steel table 150 are mirror-finished, they can be easily peeled off even after pressing. If necessary, a solder resist, solder, or the like is applied to the exposed portions of the first conductor layer 111, the fourth conductor layer 141, and the like to finish the finish.

【0019】なお、本実施例においては、絶縁体の樹脂
層を上下層の電気的接続用の突起が突き破る方法をとっ
ているが、これに限るものではなく、例えば、突き破る
位置に突起が通る程度の穴を、ドリルやレーザー等によ
り予め開けておき、その穴に突起をはめこむようにし
て、上述の実施例に準じて積み重ねていってもよい。こ
のような方式の場合の要領を図3の概要図によって説明
する。311は下部導電体回路パターンであり、312
は下部導電体回路パターン311と上部導電体回路パタ
ーン(図示せず)を電気的に接続するための接続用突起
である。また、313は接続用突起312はめこみ用の
穴であり、320は穴313を有する絶縁体層樹脂シー
トである。詳細説明は省略するが、この方式により、プ
レスにおける無理のない導電体回路パターン間の電気的
接続が可能となる。
In this embodiment, the upper and lower layer electrical connection projections penetrate the resin layer of the insulator, but the method is not limited to this. For example, the projections pass at the breakthrough positions. Holes of a certain size may be preliminarily opened with a drill, a laser, or the like, and protrusions may be fitted into the holes so that the holes are stacked according to the above-described embodiment. The procedure in the case of such a system will be described with reference to the schematic diagram of FIG. 311 is a lower conductor circuit pattern, and 312
Is a connection protrusion for electrically connecting the lower conductor circuit pattern 311 and the upper conductor circuit pattern (not shown). Further, 313 is a connection projection 312 is a hole for fitting, and 320 is an insulator layer resin sheet having a hole 313. Although detailed description is omitted, this method enables electrical connection between the conductor circuit patterns in the press without difficulty.

【0020】(第2の実施例)図2は本発明の第2の実
施例を示す基板構成説明図であり、左側図(a)はプレ
ス成形前の状態、右側図(b)はプレス成形後の状態を
示している。本実施例は第1の実施例の一応用を示し、
1つの絶縁製樹脂の両面に導電体層及び接続部突起を設
けたことを特徴とするものである。図において、210
は回路パターンを構成している第1導電体層211を形
成するための板状の下側ステンレス台であり、最終工程
で樹脂及び銅材が剥離し易いように表面を鏡面仕上げを
行ったステンレス等の導電性のある金属で作られてい
る。なお、この下側ステンレス台210は第1導電体層
211を形成するための台だけでなく、熱プレスの際の
下側プレス治具のプレス板の役目もするもので、厚さは
少なくとも1mm必要であり、反りのない表面が平滑な
ものであることが必要である。そして、下側ステンレス
台210の平滑面に回路パターンとなる第1導電体層2
11を形成するが、その形成はめっきレジストを用いた
電解めっきによる方法でよいが、例えばペースト等を用
いたスクリーン版等による印刷による方法でもよい。
(Second Embodiment) FIGS. 2A and 2B are explanatory views of a substrate structure showing a second embodiment of the present invention. The left side view (a) is a state before press molding and the right side view (b) is press molding. The latter state is shown. This embodiment shows one application of the first embodiment,
It is characterized in that a conductor layer and a connecting portion projection are provided on both surfaces of one insulating resin. In the figure, 210
Is a plate-shaped lower stainless steel table for forming the first conductor layer 211 forming the circuit pattern, and is a stainless steel whose surface is mirror-finished so that the resin and the copper material are easily peeled off in the final step. It is made of conductive metal such as. The lower stainless steel table 210 serves not only as a table for forming the first conductor layer 211 but also as a pressing plate of the lower pressing jig during hot pressing, and has a thickness of at least 1 mm. It is necessary, and it is necessary that the surface without warpage is smooth. Then, the first conductor layer 2 to be a circuit pattern is formed on the smooth surface of the lower stainless steel table 210.
11 is formed by electrolytic plating using a plating resist, but may be printed by a screen plate using a paste or the like.

【0021】第1、第2導電体層間絶縁体層220は、
絶縁性樹脂よりなるシートで、第1導電体層211と第
2導電体層221との間の電気的絶縁を図るために用い
る基板用シートである。その厚さは、製造しようとして
いる基板の設計仕様に定められる絶縁層の厚さ分必要で
ある。
The first and second conductor interlayer insulator layers 220 are
It is a sheet made of an insulating resin, and is a substrate sheet used for achieving electrical insulation between the first conductor layer 211 and the second conductor layer 221. The thickness is required to be the thickness of the insulating layer defined in the design specifications of the substrate to be manufactured.

【0022】第2、第3導電体層間絶縁体層230は、
絶縁性樹脂よりなるシートで、第2導電体層221と第
3導電体層231との間の電気的絶縁を図るために用い
る基板用シートである。その厚さは、製造しようとして
いる基板の設計仕様に定められる絶縁層の厚さ分必要で
ある。第2、第3導電体層間絶縁体層230の両面に、
図1の第1、第2導電体層間接続用突起112を形成し
た方法と同じ方法により第2導電体層221及び第3導
電体層231と第1、第2導電体層間接続用突起222
と第3、第4導電体層間接続用突起232を形成する。
これらの接続用突起222,232の高さは、製造しよ
うとしている基板の設計仕様に定められる絶縁層の厚さ
分必要である。
The second and third conductor interlayer insulator layers 230 are
A sheet made of an insulating resin, which is a sheet for a substrate used for achieving electrical insulation between the second conductor layer 221 and the third conductor layer 231. The thickness is required to be the thickness of the insulating layer defined in the design specifications of the substrate to be manufactured. On both surfaces of the second and third conductor interlayer insulator layers 230,
The second conductor layer 221 and the third conductor layer 231 and the first and second conductor interlayer connection protrusions 222 are formed by the same method as the method of forming the first and second conductor interlayer connection protrusions 112 of FIG.
And third and fourth conductor interlayer connecting protrusions 232.
The heights of the connection protrusions 222 and 232 are required to be the thickness of the insulating layer determined by the design specifications of the substrate to be manufactured.

【0023】第3、第4導電体層間絶縁体層240は、
絶縁性樹脂よりなるシートで、第3導電体層231と第
4導電体層241との間の電気的絶縁を図るために用い
る基板用部材である。その厚さは、製造しようとしてい
る基板の設計仕様に定められる絶縁層の厚さ分必要であ
る。上側ステンレス台250は回路パターンの第4導電
体層241を形成するための台であり、最後の工程で樹
脂及び銅が剥離し易いように、表面を鏡面仕上げを行っ
たステンレス板等の導電性のある金属製であることが望
ましい。なお、このステンレス製の上側ステンレス台2
50は第4導電体層241を形成するための台だけでな
く、熱プレスの際のプレス板の役目も果たすためのもの
であり、厚さは少なくとも1mm以上必要で、かつ反り
がなく、表面が平滑であるものが必要である。この上側
ステンレス台250は、下側ステンレス台210と同一
機能のものである。そして、上側ステンレス台250の
平滑面に回路パターンとなる第4導電体層241を形成
するが、その形成はめっきレジストを用いた電解めっき
による方法でよいが、例えばペースト等を用いたスクリ
ーン版等による印刷による方法でもよい。
The third and fourth conductor interlayer insulator layers 240 are
It is a sheet made of an insulating resin, and is a substrate member used for achieving electrical insulation between the third conductor layer 231 and the fourth conductor layer 241. The thickness is required to be the thickness of the insulating layer defined in the design specifications of the substrate to be manufactured. The upper stainless steel table 250 is a table for forming the fourth conductor layer 241 having a circuit pattern, and is made of a conductive material such as a stainless steel plate whose surface is mirror-finished so that the resin and copper are easily separated in the last step. It is desirable that it be made of a certain metal. In addition, this stainless steel upper stainless steel table 2
Reference numeral 50 not only serves as a base for forming the fourth conductor layer 241, but also serves as a pressing plate during hot pressing, and the thickness is required to be at least 1 mm or more, and there is no warpage, Is required to be smooth. The upper stainless steel table 250 has the same function as the lower stainless steel table 210. Then, the fourth conductor layer 241 which becomes a circuit pattern is formed on the smooth surface of the upper stainless steel table 250. The formation may be performed by electrolytic plating using a plating resist, for example, a screen plate using a paste or the like. Alternatively, the method of printing may be used.

【0024】この場合も、第1の実施例の場合と同様な
方法で熱プレスを行い、図2の(b)に見られるよう
に、溶融後固化した樹脂部分260による一体型多層基
板が得られる。その後、下側ステンレス台210及び上
側ステンレス台250を剥離・除去することにより、本
実施例の型の多層基板が完成する。なお、上述の実施例
の説明においては、導電体層が4層の基板を例として説
明したが、導電体層の数については4層に限られるもの
ではなく、任意の整数の層数について本発明の製造方法
が適用可能である。
Also in this case, hot pressing is carried out in the same manner as in the case of the first embodiment, and as shown in FIG. 2 (b), an integrated multi-layer substrate having the resin portion 260 which is solidified after melting is obtained. To be Then, the lower stainless steel table 210 and the upper stainless steel table 250 are peeled off and removed to complete the multilayer substrate of the mold of this embodiment. In the above description of the embodiments, the substrate having four conductor layers has been described as an example. However, the number of conductor layers is not limited to four, and any number of integer layers can be used. The manufacturing method of the invention is applicable.

【0025】(第3の実施例)本実施例では、接続部突
起の特に先端部の構造の他の態様について、幾つかの形
成方法の実施態様例を挙げて説明する。まず、図9に示
すように、接続部突起を向き合わせて配設した後、プレ
スしてこれらの突起同士を圧着する方式がある。例えば
1つの電気的接続例として、下部絶縁体層901の上に
下部導電体層902と下部側接続部突起903をこの順
に形成し、もう1つ上部絶縁体層906の下に上部導電
体層905と上部側接続部突起904をこの順に形成
し、下部側接続部突起903と上部側接続部突起904
とを向き合わせてプレスし、接続するようにする方式で
ある。この場合、図10に示す下部側接続部突起100
1及び上部側接続部突起1002のように、先端部を鉤
型にした形状とすることにより、プレス後の基板接続性
を著しく向上させることが可能である。
(Third Embodiment) In this embodiment, other aspects of the structure of the connecting portion projection, particularly the tip portion will be described with reference to some embodiment examples of forming methods. First, as shown in FIG. 9, there is a method in which, after arranging the connection portion projections facing each other, they are pressed to crimp these projections. For example, as one example of electrical connection, a lower conductor layer 902 and a lower-side connection protrusion 903 are formed in this order on the lower insulator layer 901, and another upper conductor layer is formed below the upper insulator layer 906. 905 and an upper connecting portion protrusion 904 are formed in this order, and a lower connecting portion protrusion 903 and an upper connecting portion protrusion 904 are formed.
It is a method of pressing and facing each other and connecting them. In this case, the lower-side connecting portion projection 100 shown in FIG.
1 and the upper connecting portion projection 1002, by making the tip end into a hook shape, it is possible to significantly improve the substrate connectivity after pressing.

【0026】図11は、図10に示した上下突起がプレ
ス時に接続するメカニズムを簡略的に示す説明図であ
る。図において、図11のa)はプレス前の配列状態を
示し、下部側接続部突起1101の先端部はすべり面1
106と接続面1104が形成されている。また、上部
側接続部突起1102の先端には、すべり面1105と
接続面1103が形成されて上下の先端部同士が対向し
ている。なお、矢印はそれぞれのプレス方向を示すもの
である。プレス時の圧力で上下の突起は、図11のb)
に見られるように、互いに接近した後、すべり面110
5、1106同士で接触すようになる。そして、さらに
互いにすべり面で接触しながら滑り、図11のc)のよ
うに、最後にお互いに接続面1103、1104で噛み
合う格好で接続が完了する。上述のようなプレス及び突
起の接触から噛み合いにいたる間、突起周囲の絶縁性の
樹脂はプレス時の熱によって溶融状態であるので、突起
の接触、滑り噛み合いの動作に対して何等の妨害をしな
いようになっている。そして、このような構造により、
膨脹、圧縮等にも強い接続が可能となる。なお、接続の
信頼性をより高めるため、接続面に金、白金等の貴金属
膜を設けてもよい。
FIG. 11 is an explanatory view schematically showing the mechanism in which the upper and lower protrusions shown in FIG. 10 are connected during pressing. In the figure, a) of FIG. 11 shows the arrangement state before pressing, and the tip end of the lower-side connecting portion projection 1101 has a sliding surface 1
106 and a connection surface 1104 are formed. A sliding surface 1105 and a connecting surface 1103 are formed at the tip of the upper-side connecting portion projection 1102 so that the upper and lower tip portions face each other. The arrows indicate the respective press directions. The upper and lower protrusions due to the pressure at the time of pressing are shown in Fig. 11 b).
As shown in Fig. 2, the slip surface 110
5, 1106 come into contact with each other. Then, the slide surfaces further come into contact with each other on the slip surfaces, and finally, as shown in FIG. 11C, the connection is completed by engaging the connection surfaces 1103 and 1104 with each other. Since the insulating resin around the protrusions is in a molten state due to the heat during pressing during contact from the contact between the press and the protrusions as described above, there is no hindrance to the contact of the protrusions and the sliding meshing operation. It is like this. And with such a structure,
A strong connection is possible even for expansion and compression. Note that a noble metal film of gold, platinum, or the like may be provided on the connection surface in order to further increase the reliability of connection.

【0027】ここで、上述の突起部の形成方法について
説明する。その概略を図12の(a)、(b)に示す。
まず、図12の(a)のように、絶縁体層又はステンレ
ス台に形成された導電体層1202の上に、めっきレジ
スト1201を用いて電解めっきを行い、まず、すべり
面、接続面のない接続用突起1203を形成する。次
に、図12の(b)に示すように、図10に示したよう
な形状のすべり面を持つ形状にめっきするためのめっき
レジスト1204を形成する。この場合、使用するめっ
きレジスト1204は、後で詳細説明する理由により、
露光時の硬化反応が二量化反応タイプのものを使用す
る。次にめっきを行って、図10に示すような鉤形突起
を持った接続用突起が形成される。
Here, a method of forming the above-mentioned protrusion will be described. The outline is shown in (a) and (b) of FIG.
First, as shown in FIG. 12A, electrolytic plating is performed using a plating resist 1201 on an insulator layer or a conductor layer 1202 formed on a stainless steel table, and first, there is no slip surface or connection surface. A connection protrusion 1203 is formed. Next, as shown in FIG. 12B, a plating resist 1204 for forming a shape having a slip surface having a shape as shown in FIG. 10 is formed. In this case, the plating resist 1204 used is for the reason described in detail later.
A dimerization reaction type curing reaction at the time of exposure is used. Next, plating is performed to form connection protrusions having hook-shaped protrusions as shown in FIG.

【0028】めっきレジストに二量化反応タイプのレジ
ストを用いる理由を図13によって説明する。二量化反
応タイプのレジストはラジカル反応タイプのようにレジ
スト層全体が硬化するのではなく、レジスト表面から数
μmが硬化してレジスト硬化部分1304を形成するだ
けであり、現像によってレジスト未硬化部分1305に
はレジスト側壁がえぐられたレジストえぐり部分130
3が形成された構造が得られる。図13に示すように側
壁下部側に下部しぼり部分1302が形成されるのは、
下部しぼみ部分1302が下地1301と強い密着性を
持つためである。従って、図14に示すように、予め下
地にこの密着力を低減させる表面処理を行ってレジスト
密着性低下用の処理膜1404を形成しておき、処理膜
1404の上に滑り・噛み合い面形成用レジスト140
5を形成しておくことによって、図13に示した手法を
適用して、突起1403の上に形成した断面が台形状の
空間部にめっきして、鉤形突起を形成することができ
る。なお、図において、1402は下地の上に形成され
た導電体層であり、その上に突起1403が形成されて
いる。そして、1401は突起形成用レジストである。
上述のレジスト密着性低下用の処理膜1404を形成す
るには、突起形成用レジスト1401面を鏡面に近いく
らい研磨する方法でもよいし、テフロン樹脂等の他の物
質との密着性が小さい物質を塗布する等の方法でもよ
い。図14に示す形成方法によれば、滑り・噛み合いの
必要のない全方向に滑り噛み合い用の突起先端部構造が
形成されるが、支障なく使用可能である。
The reason why the dimerization reaction type resist is used as the plating resist will be described with reference to FIG. The dimerization reaction type resist does not cure the entire resist layer as in the radical reaction type, but only cures several μm from the resist surface to form a resist cured portion 1304, and the resist uncured portion 1305 is developed by development. The resist cut-away portion 130 in which the resist side wall is cut
A structure with 3 formed is obtained. As shown in FIG. 13, the lower squeezed portion 1302 is formed on the lower side of the side wall.
This is because the lower dent portion 1302 has strong adhesion to the base 1301. Therefore, as shown in FIG. 14, a surface treatment for reducing this adhesive force is previously performed on the underlayer to form a treatment film 1404 for reducing the resist adhesiveness, and a slipping / meshing surface forming surface is formed on the treatment film 1404. Resist 140
By forming No. 5, it is possible to form the hook-shaped projection by applying the method shown in FIG. 13 and plating the space formed on the projection 1403 and having a trapezoidal cross section. In the figure, reference numeral 1402 denotes a conductor layer formed on the base, on which a protrusion 1403 is formed. 1401 is a resist for forming a protrusion.
In order to form the above-mentioned treatment film 1404 for reducing the resist adhesiveness, a method of polishing the surface of the resist 1401 for forming the protrusion to a mirror surface may be used, or a substance having a low adhesiveness with other substances such as Teflon resin may be used. A method such as coating may be used. According to the forming method shown in FIG. 14, the projection tip structure for sliding engagement is formed in all directions without the need for sliding and engaging, but it can be used without any trouble.

【0029】上述の第3の実施例の説明においては、接
続部の形状及びその特徴に関してのみ説明を行ったが、
回路基板の製造については、この接続部を用いて第1又
は第2の実施例で示した方法をそのまま適用できること
は言うまでもない。
In the above description of the third embodiment, only the shape and characteristics of the connecting portion have been described.
It goes without saying that the method shown in the first or second embodiment can be directly applied to the manufacture of the circuit board by using this connecting portion.

【0030】以上、第1〜第3の実施例によって詳細に
説明したが、上下の各導電体層間の接続部を金属塊様の
突起で構成し、多層基板のプレス形成に当たって、突起
が絶縁体層を突き破ることによって突起の先端と導電体
層とが容易に当接し、圧着、溶着を容易にすることがで
き、従来方法に比べて薄い多層基板を、簡便にかつ品質
よく製作できるるようになった。その上、従来のプリン
ト回路基板の製造方法のように、NCドリル等によるス
ルーホール形成のための穴開けが不要となり、かつ接続
部を突起で構成するから、ドリルの径よりも小面積によ
る接続が可能となった。これにより、上述の効果と相俟
って基板回路のより微細化が達成される。
As described above in detail with reference to the first to third embodiments, the connecting portions between the upper and lower conductor layers are formed by protrusions like metal lumps, and the protrusions are made of an insulating material when press-forming a multilayer substrate. By breaking through the layer, the tip of the protrusion and the conductor layer can be easily brought into contact with each other, and pressure bonding and welding can be facilitated, so that a thin multilayer substrate can be manufactured easily and with high quality as compared with the conventional method. became. Moreover, unlike the conventional method for manufacturing a printed circuit board, it is not necessary to make holes for forming through holes by using an NC drill or the like, and the connection portion is formed by a protrusion, so that the connection can be performed with an area smaller than the diameter of the drill. Became possible. As a result, in combination with the above-mentioned effects, further miniaturization of the substrate circuit is achieved.

【0031】[0031]

【発明の効果】以上詳細に説明したように本発明によれ
ば、多層基板を構成する導電体層間絶縁体層をガラス繊
維を含まないシート状の絶縁体樹脂層で形成し、導電体
回路層の所定場所上に導電体回路層間の電気的接続用の
導電体からなる突起を設けておき、この積層体をプレス
治具板を用いてプレスを行うことによる圧力によって絶
縁体樹脂層を突起が突き破ったり、あるいは突起を絶縁
体に設けた所定位置の穴を通して絶縁体層を通貫させる
ことが容易となり、対向する前記導電体回路層に当接・
圧着させようにして接続部を形成しているから、従来の
製造方法と比べて、より薄い多層プリント基板を、簡便
にかつ品質よく製作できるという効果が得られる。ま
た、従来の多層基板製造の場合のように、NCドリル等
によるスルーホール形成のための細密な穴開け工程が不
要となり、その上、接続部を小さな突起で構成するか
ら、ドリルの径よりも小面積による接続が可能となっ
た。これにより、上述の効果と相俟って、基板回路のよ
り微細化を達成するのに対する寄与は大である。
As described above in detail, according to the present invention, the conductor inter-layer insulator layer forming the multilayer substrate is formed of a sheet-shaped insulator resin layer containing no glass fiber, and the conductor circuit layer is formed. A protrusion made of a conductor for electrical connection between conductor circuit layers is provided on a predetermined location of the insulator circuit layer, and the laminate resin is pressed by using a press jig plate so that the insulator resin layer is not protruded. It becomes easy to pierce or penetrate the insulating layer through a hole at a predetermined position provided in the insulating body, and contact the opposing conductor circuit layer.
Since the connection portion is formed by crimping, there is an effect that a thinner multilayer printed circuit board can be easily manufactured with high quality as compared with the conventional manufacturing method. Further, unlike the conventional multilayer board manufacturing, a fine drilling step for forming a through hole by an NC drill or the like is not necessary, and moreover, since the connecting portion is composed of small protrusions, the diameter is smaller than the diameter of the drill. Connection is possible with a small area. As a result, in combination with the above-mentioned effects, the contribution to achieving the miniaturization of the substrate circuit is great.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の第1の実施例を示す基板構成説明図で
あり、左側図(a)はプレス成形前の状態、右側図
(b)はプレス成形後の状態を示すものである。
FIG. 1 is an explanatory diagram of a substrate structure showing a first embodiment of the present invention, in which a left side view (a) shows a state before press molding and a right side view (b) shows a state after press molding.

【図2】本発明の第2の実施例を示す基板構成説明図で
あり、左側図(a)はプレス成形前の状態、右側図
(b)はプレス成形後の状態を示すものである。
2A and 2B are explanatory views of a substrate configuration showing a second embodiment of the present invention, in which a left side view (a) shows a state before press molding and a right side view (b) shows a state after press molding.

【図3】本発明の第1の実施例の接続部形成の別の態様
を示す説明図である。
FIG. 3 is an explanatory diagram showing another mode of forming the connection portion according to the first embodiment of the present invention.

【図4】本発明の第1の実施例における突起先端部の態
様を示す説明図である。
FIG. 4 is an explanatory view showing a mode of a tip end portion of a protrusion in the first embodiment of the present invention.

【図5】本発明の第1の実施例における突起先端部の他
の態様を示す説明図である。
FIG. 5 is an explanatory diagram showing another aspect of the tip end portion of the protrusion in the first embodiment of the present invention.

【図6】図5の半田付着部分の一形成方法を示す説明図
である。
FIG. 6 is an explanatory diagram showing a method of forming the solder attachment portion of FIG.

【図7】図5の半田付着部分の他の形成方法を示す説明
図である。
FIG. 7 is an explanatory diagram showing another method for forming the solder-attached portion of FIG.

【図8】図5の突起によるプレス成形時の様子を示す説
明図である。
FIG. 8 is an explanatory diagram showing a state at the time of press molding by the protrusion of FIG.

【図9】本発明の第3の実施例を示す接続部の突起先端
部の説明図である。
FIG. 9 is an explanatory view of a tip end portion of a protrusion of a connection portion showing a third embodiment of the present invention.

【図10】図9の対向する突起の鉤型先端部を示す斜視
図である。
FIG. 10 is a perspective view showing hook-shaped tip portions of the opposed protrusions of FIG. 9;

【図11】図10の先端部の接続状態を示す説明図であ
る。
FIG. 11 is an explanatory diagram showing a connection state of the tip portion of FIG.

【図12】図10の突起の鉤型先端部の一形成方法を示
す断面説明図である。
12 is a cross-sectional explanatory view showing one method of forming the hook-shaped tip portion of the protrusion of FIG.

【図13】二量化レジストによる鉤型先端部の他の形成
方法の原理を示す説明図である。
FIG. 13 is an explanatory diagram showing the principle of another method of forming a hook-shaped tip portion using a dimerized resist.

【図14】二量化レジストによる鉤型先端部の別の形成
方法の原理を示す説明図である。
FIG. 14 is an explanatory diagram showing the principle of another method of forming a hook-shaped tip portion using a dimerized resist.

【符号の説明】[Explanation of symbols]

110,210 下側ステンレス台 111,211 第1導電体層 112 第1、第2導電体層間接続用突起 120,220 第1、第2導電体層間絶縁体層 121,221 第2導電体層 122 第2、第3導電体層間接続用突起 222 第1、第2導電体層間接続用突起 130,230 第2、第3導電体層間絶縁体層 131,231 第3導電体層 132,232 第3、第4導電体層間接続用突起 140,240 第3、第4導電体層間絶縁体層 141,241 第4導電体層 150,250 上側ステンレス台 160 固化した樹脂層 260 溶融後固化した樹脂部分 311 下部導電体回路パターン 312 接続用突起 313 穴 320 絶縁体層樹脂シート 401 導電体回路パターン 402 接続部用突起 403 金(又は白金) 501,601,701 導電体回路パターン 502,602,703 接続部用突起 503 半田付着部分 603 半田槽 702 めっきレジスト 604,704,803 半田付着部分 800 下部絶縁体層 801 下部回路パターン 802 接続部突起 804 溶融した半田部分 810 絶縁体用樹脂シート 811 溶融後固化した樹脂部分 820 上部絶縁体層 821 上部回路パターン 901 下部絶縁体層 902 下部導電体層 903 下部側接続部突起 904 上部側接続部突起 905 上部導電体層 906 上部絶縁体層 1001 下部側接続部突起 1002 上部側接続部突起 1101 下部側接続部突起 1102 上部側接続部突起 1103,1104 接続面 1105,1106 すべり面 1201,1204 めっきレジスト 1202 導電体層 1203 接続用突起 1301 下地 1302 下部しぼみ部分 1303 レジストえぐり部分 1304 レジスト硬化部分 1305 レジスト未硬化部分 1401 突起形成用レジスト 1402 導電体層 1403 突起 1404 処理膜 1405 滑り・噛み合い面形成用レジスト 110, 210 Lower stainless steel table 111, 211 First conductor layer 112 First and second conductor interlayer connection protrusions 120, 220 First and second conductor interlayer insulator layers 121, 221 Second conductor layer 122 Second and third conductor interlayer connection protrusions 222 First and second conductor interlayer connection protrusions 130 and 230 Second and third conductor interlayer insulator layers 131 and 231 Third conductor layer 132 and 232 Third , Fourth conductor interlayer connection protrusion 140,240 third, fourth conductor interlayer insulating layer 141,241 fourth conductor layer 150,250 upper stainless steel table 160 solidified resin layer 260 solidified resin portion after melting 311 Lower conductor circuit pattern 312 Connection protrusion 313 Hole 320 Insulator layer resin sheet 401 Conductor circuit pattern 402 Connection protrusion 403 Gold (or platinum) 501, 01,701 Conductor circuit pattern 502,602,703 Connection part protrusion 503 Solder adhesion part 603 Solder bath 702 Plating resist 604,704,803 Solder adhesion part 800 Lower insulator layer 801 Lower circuit pattern 802 Connection part protrusion 804 Melted Solder portion 810 Insulator resin sheet 811 Resin portion solidified after melting 820 Upper insulator layer 821 Upper circuit pattern 901 Lower insulator layer 902 Lower conductor layer 903 Lower side connection protrusion 904 Upper side connection protrusion 905 Upper conductor Layer 906 Upper insulating layer 1001 Lower side connecting portion protrusion 1002 Upper side connecting portion protrusion 1101 Lower side connecting portion protrusion 1102 Upper side connecting portion protrusion 1103, 1104 Connecting surface 1105, 1106 Sliding surface 1201, 1204 Plating resist 1202 Conductor layer 203 connection protruding 1301 base 1302 lower deflated portions 1303 resist gouging portions 1304 resist cured portions 1305 resist uncured portion 1401 protruding forming resist 1402 conductive layer 1403 projections 1404 treated film 1405 slip-engaging surface forming resist

───────────────────────────────────────────────────── フロントページの続き (72)発明者 小澤 進 東京都港区虎ノ門1丁目7番12号 沖電気 工業株式会社内 ─────────────────────────────────────────────────── ─── Continued Front Page (72) Inventor Susumu Ozawa 1-7-12 Toranomon, Minato-ku, Tokyo Oki Electric Industry Co., Ltd.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 両面又は片面に導電体回路層を有する絶
縁体層と導電体回路層を有しない前記絶縁体層とを所定
数積み重ねた積層体を、前記導電体回路層を有するプレ
ス治具板を用いて両端面から加圧・成形し、同時に所定
の少なくとも上下2つの前記導電体回路層を電気的に接
続させて多層プリント基板を形成するプリント回路基板
の製造方法において、 前記絶縁体層をいずれもガラス繊維を含まないシート状
の絶縁体樹脂層で形成し、 前記導電体回路層の所定場所上に前記導電体回路層間の
電気的接続用の導電体からなる突起を設けておき、 前記積層体を前記プレス治具板を用いてプレスを行うこ
とによる圧力によって前記絶縁体樹脂層を前記突起が突
き破り、対向する前記導電体回路層に当接・圧着させる
ことを特徴とするプリント回路基板の製造方法。
1. A pressing jig having a conductor circuit layer, which is a laminate obtained by stacking a predetermined number of an insulator layer having a conductor circuit layer on both sides or one side and the insulator layer having no conductor circuit layer. A method for manufacturing a printed circuit board, comprising pressurizing and molding from both end faces using a plate, and at the same time electrically connecting at least two upper and lower conductor circuit layers to each other to form a multilayer printed circuit board. Both are formed of a sheet-shaped insulator resin layer containing no glass fiber, and a protrusion made of a conductor for electrical connection between the conductor circuit layers is provided on a predetermined place of the conductor circuit layer. A printing method characterized in that the protrusion is pierced through the insulating resin layer by pressure applied by pressing the laminated body using the pressing jig plate, and the insulating resin layer is brought into contact with and pressure-bonded to the opposing conductor circuit layer. Road substrate manufacturing method.
【請求項2】 前記絶縁体樹脂層を前記突起が突き破る
手段において、前記圧力に加えて、前記絶縁体樹脂層の
溶融温度まで加熱して前記突起の突き破りを容易にする
ことを特徴とする請求項1記載のプリント回路基板の製
造方法。
2. The means for causing the protrusion to pierce the insulating resin layer, in addition to the pressure, heats up to the melting temperature of the insulating resin layer to facilitate the piercing of the protrusion. Item 2. A method for manufacturing a printed circuit board according to item 1.
【請求項3】 前記絶縁体樹脂層を前記突起が突き破る
手段の代りに、前記突起が突き破る位置に予め前記突起
が通る大きさの穴を開けておき、プレス時に前記突起が
前記穴を通って対向する前記導電体回路層に当接・圧着
させることを特徴とする請求項1記載のプリント回路基
板の製造方法。
3. In place of the means for the protrusion to break through the insulating resin layer, a hole having a size through which the protrusion passes is formed in advance at a position where the protrusion penetrates, and the protrusion passes through the hole during pressing. The method for manufacturing a printed circuit board according to claim 1, wherein the conductor circuit layers facing each other are brought into contact with and pressed against each other.
【請求項4】 前記突起の先端部に、前記絶縁体樹脂層
の樹脂硬化温度より高い溶融温度を有する半田層を設け
ておき、前記熱及び圧力で前記絶縁体樹脂層を前記突起
で突き破り前記半田層を前記導電体回路層に圧接させ、
前記絶縁体樹脂層を硬化させた後、この状態で温度を前
記半田の溶融温度まで上昇し前記半田層を溶融させて前
記突起を前記導電体回路層に接続させた後、冷却して前
記半田層を固化させることを特徴とする請求項2記載の
プリント回路基板の製造方法。
4. A solder layer having a melting temperature higher than the resin curing temperature of the insulator resin layer is provided at the tip of the protrusion, and the insulator resin layer is pierced by the protrusion by the heat and pressure. The solder layer is brought into pressure contact with the conductor circuit layer,
After the insulating resin layer is cured, the temperature is raised to the melting temperature of the solder in this state to melt the solder layer and connect the protrusion to the conductor circuit layer, and then cool the solder. The method for manufacturing a printed circuit board according to claim 2, wherein the layer is solidified.
【請求項5】 接続部を構成する前記導電体回路層上に
設けた前記突起をその先端部が対向するように上下の絶
縁体樹脂層の同位置に設け、前記突起の先端部に前記接
続部がプレス時に互いに接触しつつ滑り合う面と、互い
に噛み合い、引っ掛かり合い接触する面を設けているこ
とを特徴とする請求項2記載のプリント回路基板の製造
方法。
5. The protrusion provided on the conductor circuit layer forming the connection portion is provided at the same position of the upper and lower insulating resin layers so that the tip portions thereof face each other, and the connection is made at the tip portion of the protrusion. 3. The method of manufacturing a printed circuit board according to claim 2, wherein the parts are provided with a surface that is in contact with each other and slides during pressing, and a surface that is in mesh with each other and is in contact with each other.
JP349595A 1995-01-12 1995-01-12 Method for manufacturing printed circuit board Pending JPH08195560A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP349595A JPH08195560A (en) 1995-01-12 1995-01-12 Method for manufacturing printed circuit board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP349595A JPH08195560A (en) 1995-01-12 1995-01-12 Method for manufacturing printed circuit board

Publications (1)

Publication Number Publication Date
JPH08195560A true JPH08195560A (en) 1996-07-30

Family

ID=11558926

Family Applications (1)

Application Number Title Priority Date Filing Date
JP349595A Pending JPH08195560A (en) 1995-01-12 1995-01-12 Method for manufacturing printed circuit board

Country Status (1)

Country Link
JP (1) JPH08195560A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002111216A (en) * 2000-09-29 2002-04-12 Ibiden Co Ltd Method of manufacturing multilayered circuit board
WO2002076161A1 (en) * 2001-03-19 2002-09-26 Sumitomo Bakelite Company, Ltd. Method of manufacturing electronic part and electronic part obtained by the method
WO2007052584A1 (en) 2005-11-04 2007-05-10 Sumitomo Bakelite Co., Ltd. Method for fabricating multilayer circuit board, circuit plate, and method for fabricating the circuit plate
WO2009107346A1 (en) * 2008-02-29 2009-09-03 住友ベークライト株式会社 Circuit board, and circuit board manufacturing method
US7651940B2 (en) 2002-12-02 2010-01-26 Tdk Corporation Electronic part producing method and electronic part
WO2011058978A1 (en) * 2009-11-10 2011-05-19 株式会社フジクラ Manufacturing method of circuit board
JP2011159883A (en) * 2010-02-02 2011-08-18 Fujikura Ltd Wiring board and method of manufacturing the same
US8011086B2 (en) 2006-08-30 2011-09-06 Samsung Electro-Mechanics Co., Ltd. Method of manufacturing a component-embedded printed circuit board
US8042263B2 (en) 2006-02-13 2011-10-25 Sumitomo Bakelite Co., Ltd. Process for manufacturing circuit board
JP2014007256A (en) * 2012-06-22 2014-01-16 Murata Mfg Co Ltd Wiring board and method for manufacturing the same
KR20170135438A (en) * 2016-05-31 2017-12-08 삼성전기주식회사 Multi-layered printed circuit board

Cited By (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002111216A (en) * 2000-09-29 2002-04-12 Ibiden Co Ltd Method of manufacturing multilayered circuit board
JP4593752B2 (en) * 2000-09-29 2010-12-08 イビデン株式会社 Multilayer circuit board manufacturing method
WO2002076161A1 (en) * 2001-03-19 2002-09-26 Sumitomo Bakelite Company, Ltd. Method of manufacturing electronic part and electronic part obtained by the method
CN1294790C (en) * 2001-03-19 2007-01-10 住友电木株式会社 Method of manufacturing electronic part and electronic part obtained by the method
US7331502B2 (en) 2001-03-19 2008-02-19 Sumitomo Bakelite Company, Ltd. Method of manufacturing electronic part and electronic part obtained by the method
US7651940B2 (en) 2002-12-02 2010-01-26 Tdk Corporation Electronic part producing method and electronic part
WO2007052584A1 (en) 2005-11-04 2007-05-10 Sumitomo Bakelite Co., Ltd. Method for fabricating multilayer circuit board, circuit plate, and method for fabricating the circuit plate
JP5109662B2 (en) * 2005-11-04 2012-12-26 住友ベークライト株式会社 Method for manufacturing laminated circuit board and method for manufacturing circuit board
US8153901B2 (en) 2005-11-04 2012-04-10 Sumitomo Bakelite Co., Ltd. Method for fabricating multilayer circuit board, circuit plate, and method for fabricating the circuit plate
US8042263B2 (en) 2006-02-13 2011-10-25 Sumitomo Bakelite Co., Ltd. Process for manufacturing circuit board
US8011086B2 (en) 2006-08-30 2011-09-06 Samsung Electro-Mechanics Co., Ltd. Method of manufacturing a component-embedded printed circuit board
JPWO2009107346A1 (en) * 2008-02-29 2011-06-30 住友ベークライト株式会社 Circuit board and circuit board manufacturing method
WO2009107346A1 (en) * 2008-02-29 2009-09-03 住友ベークライト株式会社 Circuit board, and circuit board manufacturing method
WO2011058978A1 (en) * 2009-11-10 2011-05-19 株式会社フジクラ Manufacturing method of circuit board
CN102598881A (en) * 2009-11-10 2012-07-18 株式会社藤仓 Manufacturing method of circuit board
JP2014042080A (en) * 2009-11-10 2014-03-06 Fujikura Ltd Wiring board and manufacturing method of the same
JP2011159883A (en) * 2010-02-02 2011-08-18 Fujikura Ltd Wiring board and method of manufacturing the same
JP2014007256A (en) * 2012-06-22 2014-01-16 Murata Mfg Co Ltd Wiring board and method for manufacturing the same
KR20170135438A (en) * 2016-05-31 2017-12-08 삼성전기주식회사 Multi-layered printed circuit board

Similar Documents

Publication Publication Date Title
JP2707903B2 (en) Manufacturing method of multilayer printed wiring board
JP2005322871A (en) Rigid-flexible board and method for manufacturing the same
JP2008124398A (en) Semiconductor package and its manufacturing method
JPH08195560A (en) Method for manufacturing printed circuit board
JPH11204939A (en) Multilayer circuit board and manufacture thereof
JPH06342977A (en) Manufacture of printed circuit board
JP4480548B2 (en) Double-sided circuit board and manufacturing method thereof
JP2006100704A (en) Rigid-flexible substrate and manufacturing method therefor
JP3609126B2 (en) Printed wiring board and method for producing printed wiring board manufacturing member
JPH0774466A (en) Manufacture of printed wiring board
JP4574310B2 (en) Manufacturing method of rigid-flexible substrate
JP3474897B2 (en) Printed wiring board and method of manufacturing the same
JPH1168267A (en) Production of resin sheet and multilayer printed wiring board
JPH03120892A (en) Multilayer printed circuit board and manufacture thereof
JPH11112149A (en) Multilayered printed wiring board
JP4433531B2 (en) Method for manufacturing printed circuit board with conductive bump
JP2743110B2 (en) Method for manufacturing multilayer wiring board
JPH11112147A (en) Multilayered printed wiring board
JPH09181452A (en) Multilayer printed wiring board manufacturing method
US20030121146A1 (en) Method for fabricating electrical connecting elements, and connecting element
JP3549063B2 (en) Manufacturing method of printed wiring board
JP2005045008A (en) Multilayer body and its producing process
JPH0360097A (en) Manufacture of multilayer printed circuit board
JP2000133943A (en) Manufacture of multilayered board
JPH1146064A (en) Circuit board and its manufacture

Legal Events

Date Code Title Description
A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20040127