JPH0817772A - Rotary substrate washing device - Google Patents

Abstract

PURPOSE:To provide a rotary substrate washing device which can reduce washing time and switch between a washing using a brash and a washing with out using the brush as needed. CONSTITUTION:An elevation plate 32 is mounted, via an interlocking member 31, to the outer periphery of a washing liquid supply nozzle 21 for supplying washing liquid onto the surface of a substrate W which is retained at a rotary stand. With the elevation plate 32, a guide shaft 33 being provided on the lower surface is inserted to a bearing 34 provided at an arm 22 and at the same time is screwed into a screw shaft 36 which is rotated and driven by a motor 35 provided inside the arm 22. The elevation late 32 is raised or lowered according to the rotation of the screw shaft 36, thus switching the brush 30 to a position Q1 where it operates on the surface of the substrate W and a position Q2 where it does not operates on the surface of the substrate W.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a rotary substrate cleaning apparatus for supplying a cleaning liquid to a rotating substrate surface to clean the substrate surface.

[0002]

2. Description of the Related Art Conventionally, a substrate cleaning apparatus of this type has a rotation holding member for rotatably holding a substrate and a cleaning liquid supply for supplying a cleaning liquid with ultrasonic vibration applied to the surface of the substrate held by the rotation holding member. It is composed of a nozzle and a brush provided separately from the cleaning liquid supply nozzle. First, the brush is moved to a position in contact with the substrate surface, the cleaning liquid is supplied to the substrate surface while the substrate is rotated, and the brush is swung to remove relatively large particles adhering to the substrate surface. . Next, after the brush is retracted from above the substrate, the cleaning liquid supply nozzle is moved above the substrate, and the cleaning liquid supply nozzle is swung while supplying the cleaning liquid toward the rotating substrate surface, thereby adhering to the substrate surface. Fine particles are removed.

As a cleaning device in which a brush is attached to the cleaning liquid supply nozzle, for example, a cleaning device described in Japanese Patent Laid-Open No. 15857/1993 is known. This apparatus includes a rotation holding member that rotatably holds a substrate, a cleaning liquid supply nozzle that supplies a cleaning liquid to the surface of the substrate held by the rotation holding member, and a brush that is rotatably arranged around the cleaning liquid supply nozzle. I have it. The cleaning liquid is supplied to the rotating substrate surface from the cleaning liquid supply nozzle, and the cleaning liquid supply nozzle and the brush are swung along the substrate surface while the brush is in sliding contact with the substrate surface, thereby cleaning the entire surface of the substrate. And cleaning with a brush.

[0004]

However, the above-mentioned conventional apparatus has the following problems. That is, in the former conventional apparatus, since the cleaning with the brush and the cleaning with the cleaning liquid supply nozzle are performed separately, the time required for cleaning is long, and further, the processing time required for cleaning is long with the increase in size of the substrate. It was.

Further, in the latter conventional apparatus, since the substrate surface is only cleaned by the diffusion action of the cleaning liquid and the sliding contact action of the brush, the cleaning effect is weak and fine particles adhering to the substrate surface cannot be completely removed. Absent. Further, since the cleaning effect is weak, the processing time required for cleaning the substrate is long as the size of the substrate is increased.

Further, depending on the type of particles to be removed from the surface of the substrate, the material of the substrate itself, etc., in order to avoid the influence of the brush cleaning on the surface of the substrate, cleaning with a brush and cleaning without a brush are used separately. There is a need for a device that is capable of doing so. However, in the latter conventional device, since the brush and the cleaning liquid supply nozzle are integrally formed, it is not possible to properly use the brush and the cleaning liquid supply nozzle.

The present invention has been made in view of the above circumstances, and can shorten the cleaning time, and can switch between brush cleaning and cleaning without using a brush as needed. To provide a device.

[0008]

The present invention has the following constitution in order to achieve the above object. That is, the rotary substrate cleaning apparatus according to claim 1 is a rotary substrate cleaning apparatus for cleaning a substrate surface by supplying a cleaning liquid to a rotating substrate surface, and a substrate rotation holding unit for rotatably holding the substrate, A cleaning liquid supply nozzle for supplying a cleaning liquid to which ultrasonic vibration is applied to the substrate surface held by the substrate rotation holding means, a brush disposed around the cleaning liquid supply nozzle and cleaning the substrate surface, and the brush are A switching means for switching the position of the brush between an operating position where the cleaning effect is exerted on the substrate surface and a non-operating position where the brush exerts no cleaning effect on the substrate surface is provided.

According to a second aspect of the present invention, there is provided the rotary substrate cleaning apparatus according to the first aspect, wherein the brush is arranged so as to be movable up and down with respect to the cleaning liquid supply nozzle, and the switching means is the brush. By moving up and down, the brush is switched between the working position and the non-working position.

Further, the rotary substrate cleaning apparatus according to claim 3 is the apparatus according to claim 1, wherein the brush is
Fixedly arranged with respect to the cleaning liquid supply nozzle, the switching means switches the brush between the working position and the non-working position by raising and lowering the brush and the cleaning liquid supply nozzle integrally.

[0011]

The operation of the invention of claim 1 is as follows. First, the substrate is held by the substrate rotation holding means. Next, in a state in which the brush is positioned at a position where the brush acts on the substrate surface by the switching means, the cleaning liquid to which ultrasonic vibration is applied is supplied to the substrate surface from the cleaning liquid supply nozzle. Then, while the substrate is rotated by the substrate rotation holding means,
The cleaning of the sliding surface with a brush and the cleaning of the substrate surface with the cleaning liquid to which ultrasonic vibration is applied are performed simultaneously.

In the case of cleaning without using a brush, the cleaning liquid supplied with ultrasonic vibration is supplied to the substrate surface from the cleaning liquid supply nozzle in a state where the brush is switched to a position where it does not act on the substrate surface by the switching means. Then, while the substrate is rotated by the substrate rotation holding means, the substrate surface is cleaned with the cleaning liquid to which ultrasonic vibration is applied.

According to the second aspect of the present invention, the brush arranged to be movable up and down with respect to the cleaning liquid supply nozzle is lowered by the switching means, and the brush is positioned at the working position. On the other hand, in the case of cleaning without using a brush, the brush is raised by the switching means while the cleaning liquid supply nozzle is held at that position, and the brush is switched to the non-acting position.

Further, according to the invention of claim 3, the cleaning liquid supply nozzle and the brush are integrally lowered by the switching means, and the brush is positioned at the working position. On the other hand, in the case of cleaning without using a brush, the cleaning liquid supply nozzle and the brush are integrally lifted by the switching means, and the brush is switched to the non-acting position.

[0015]

Embodiments of the present invention will be described below with reference to the drawings. 1 is a partially cutaway perspective view of an embodiment of a rotary substrate cleaning apparatus according to the present invention, FIG. 2 is a vertical sectional view of a nozzle tip, and FIG. 3 is a view taken along the line AA of FIG.

The rotary substrate cleaning apparatus of the present embodiment comprises a substrate rotation holding mechanism 10 for rotatably holding a square substrate (hereinafter simply referred to as “substrate”) W, and a substrate held by the substrate rotation holding mechanism 10. And a substrate cleaning mechanism 20 for cleaning the surface of W. The configuration of each unit will be described below.

The substrate rotation holding mechanism 10 comprises a turntable 11 for holding the substrate W in a posture in which the surface of the substrate W is horizontal, and a motor (not shown) linked to the turntable 11 via a rotary shaft 12. There is. The substrate W held on the turntable 11 is rotated about the vertical axis P ₁ by the rotational driving of the motor. A plurality of positioning pins 13 are provided on the upper surface of the turntable 11. The four corners of the substrate W are brought into contact with each other between the positioning pins 13, and the central portion of the substrate W is positioned so as to be positioned substantially on the axis P ₁ . The turntable 11 is covered with a scattering prevention cup 14. The cup 14 receives and discharges the cleaning liquid scattered from the surface of the substrate W.

The substrate cleaning mechanism 20 includes a cleaning liquid supply nozzle 21 for supplying a cleaning liquid to the surface of the substrate W held on the turntable 11. The cleaning liquid supply nozzle 21 is supported by an arm 22 provided outside the cup 14 so as to be swingable around a rotation axis P ₂ parallel to the rotation axis P ₁ .
The arm 22 is cantilevered by a support member 23, and the support member 23 is connected to a motor (not shown). By rotating the motor in the forward and reverse directions, the cleaning liquid supply nozzle 21 is rockably driven between a standby position above the substrate W and a retracted position separated from above the substrate W. Also,
The support member 23 is provided so as to be able to move up and down, and raises and lowers the cleaning liquid supply nozzle 21 at the standby position from the standby position to an operation position described later.

As shown in FIGS. 2 and 3, the cleaning liquid supply nozzle 21 has a discharge port 21a opened on the lower surface thereof. In addition, an ultrasonic vibrator 24 is provided inside thereof, and the cleaning liquid to which ultrasonic vibration is applied can be supplied to the substrate W from the ejection port 21a.

A brush 30 having bristles made of nylon resin or the like is planted around the outer periphery of the cleaning liquid supply nozzle 21 so as to be movable up and down. This brush 30 has a connecting member 31.
It is attached to the elevating plate 32 via. The elevating plate 32 has a guide shaft 33 provided on the lower surface thereof fitted in a bearing 34 provided in the arm 22 and a screw shaft 36 which is rotationally driven by a motor 35 provided in the arm 22. Have been combined. Motor 3
5 and the screw shaft 36 is equivalent to the switching means of the present invention, by elevating plate 32 is raised and lowered by rotation of the screw shaft 36, and the working position Q ₁ which brush 30 exerts a cleaning effect on the surface of the substrate W , The brush 30 is switched over to the non-acting position Q ₂ which does not exert a cleaning effect on the surface of the substrate W. Here, the action position Q ₁ is not only the position where the tip of the brush 30 is in contact with the surface of the substrate W, but the tip is not in contact with the surface of the substrate W but is extremely close to it, so that the cleaning effect by the cleaning liquid is Also includes the elevated position.

Next, the cleaning operation will be described. First, the substrate W is loaded on the turntable 11 and positioned between the positioning pins 13 so that the central portion of the substrate W is located at the substantially axis P ₁ . Next, the cleaning liquid supply nozzle 21 is swingably displaced from the retracted position to the standby position while the arm 22 is raised.
Further, the brush 30 is lowered to the working position Q ₁ so as to come into contact with (or come close to) the surface of the substrate W. Then, the cleaning liquid to which ultrasonic vibration is applied is supplied from the cleaning liquid supply nozzle 21 toward the surface of the substrate W. Then, while rotating the turntable 11 to rotate the substrate W, the brush 3
While keeping 0 at the working position Q ₁ , the arm 22 is oscillated and displaced along the surface of the substrate W, and the entire surface of the substrate W is cleaned by the sliding contact cleaning by the brush 30 and the cleaning liquid to which ultrasonic vibration is applied. It

At this time, since the brush cleaning and the ultrasonic cleaning are performed at the same time, the cleaning time can be shortened as compared with the conventional case where the ultrasonic cleaning is performed after the brush cleaning. Further, since the cleaning effect is higher than that in the case where the brush cleaning and the cleaning liquid to which ultrasonic vibration is not applied are simultaneously performed, the cleaning time can be shortened.

On the other hand, when only ultrasonic cleaning is performed without using the brush 30, the cleaning liquid supply nozzle 21 is moved to the operating position Q ₁
The motor 30 is driven to rotate the screw shaft 36 to raise the elevating plate 32, and the brush 30 is switched from the operating position Q ₁ to the non-operating position Q ₂ . That is, since the brush 30 is separated from the surface of the substrate W, the cleaning liquid to which ultrasonic vibration is applied is supplied from the cleaning liquid supply nozzle 21 toward the surface of the substrate W in this state,
By swinging and displacing the arm 22 along the surface of the substrate W while rotating the substrate W, the entire surface of the substrate W is cleaned by the cleaning liquid to which ultrasonic vibration is applied.

As described above, the brush 3 is used depending on the type of particles generated on the substrate W and the material of the substrate W itself.
It is possible to select the cleaning using 0 and the cleaning not using the brush 30.

Although the brush 30 is moved up and down by the screw shaft 36 connected to the motor 35 in the above embodiment, the present invention is not limited to this. For example, as shown in FIG. May be connected to the air cylinder 61 via the link mechanism 60 to move the brush 30 up and down. That is, when the air cylinder 61 is expanded and contracted, the pair of swing link mechanisms 62 are swung around the fulcrum a to raise and lower the raising and lowering plate 32 ′, so that the brush 30 is extended between the operating position Q ₁ and the non-operating position Q _2. You may make it switch. Further, in the above-described embodiment, the brush 30 is provided to be movable up and down with respect to the cleaning liquid supply nozzle 21, but the present invention is not limited to this. For example, as shown in FIG. 5, the brush 30 is integrated with the cleaning liquid supply nozzle 21. You may make it attach and detach and raise and lower the arm 22 which supports these. That is, the motor 65 for swinging and displacing the arm 22 around the axis P _{2 is} installed on the guide rail 66 that is installed upright.
It is attached to the elevating and lowering support member 67 which is guided by the above, and the elevating and lowering support member 67 is screwed to the screw shaft 69 connected to the motor 68. The brush 30 may be switched between the operating position Q ₁ and the non-operating position Q ₂ by driving the motor 68 to rotate the screw shaft 69 and moving the arm 22 together with the lifting support member 67. When the brush 30 is displaced to the non-acting position Q ₂ , the cleaning liquid supply nozzle 21 also rises accordingly, but the non-acting position Q ₂ is not so high, so the cleaning effect of the cleaning liquid supply nozzle 21 is extremely reduced. There is nothing to do.

[0026]

As is apparent from the above description, according to the first aspect of the present invention, since the brush cleaning and the ultrasonic cleaning can be performed at the same time, the cleaning effect is high and the cleaning time is shortened. You can Further, since the switching means can switch between a position where the brush acts on the surface of the substrate and a position where it does not act on the surface of the substrate, the brush can be used according to the type of particles generated on the substrate and the material of the substrate itself. It is possible to select between the conventional cleaning and the cleaning without using the brush.

According to the second aspect of the invention, in the case of cleaning without using the brush, only the brush is raised to the non-acting position by the switching means while the washing liquid supply nozzle is held at the working position. Therefore, it is possible to supply the cleaning liquid to which ultrasonic vibration is applied to the surface of the substrate from the cleaning liquid supply nozzle in a state where the cleaning liquid supply nozzle is closer to the surface of the substrate, and the cleaning ability can be further enhanced.

According to the third aspect of the invention, since the cleaning liquid supply nozzle and the brush are integrally switched by the switching means from the working position to the non-working position, the brush can be raised and lowered with respect to the cleaning liquid supply nozzle. The elevating mechanism can be easily configured without the need to arrange the elevating mechanism.

[Brief description of drawings]

FIG. 1 is a partially cutaway perspective view of an embodiment of a rotary substrate cleaning apparatus according to the present invention.

FIG. 2 is a vertical sectional view of a nozzle tip.

FIG. 3 is a view as viewed in the direction of arrows AA in FIG. 2;

FIG. 4 is a diagram showing a main part of another embodiment.

FIG. 5 is a diagram showing a main part of another embodiment.

[Explanation of symbols]

10 ... substrate rotation holding mechanism 20 ... substrate cleaning mechanism 21 ... cleaning liquid supply nozzle 22 ... arm 24 ... ultrasonic oscillator 30 ... brush 32 ... elevating plate Q ₁ ... operative position Q ₂ ... inactive position W ... substrate

Claims (3)

[Claims] 1. A rotary substrate cleaning apparatus for supplying a cleaning liquid to a rotating substrate surface to clean the substrate surface, wherein the substrate rotation holding means holds the substrate rotatably, and the substrate rotation holding means holds the substrate. A cleaning liquid supply nozzle that supplies a cleaning liquid to which ultrasonic vibration is applied to the substrate surface, a brush that is arranged around the cleaning liquid supply nozzle and cleans the substrate surface, and an operating position where the brush exerts a cleaning effect on the substrate surface. ,
A rotary substrate cleaning apparatus comprising: a switching unit that switches the position of the brush between a non-acting position where the brush does not exert a cleaning effect on the substrate surface. 2. The apparatus according to claim 1, wherein the brush is disposed so as to be movable up and down with respect to the cleaning liquid supply nozzle, and the switching unit moves the brush to the working position by moving the brush up and down. A rotary substrate cleaning apparatus that switches over to the non-acting position. 3. The apparatus according to claim 1, wherein the brush is fixedly arranged with respect to the cleaning liquid supply nozzle, and the switching unit raises and lowers the brush and the cleaning liquid supply nozzle integrally with each other. A rotary substrate cleaning apparatus that switches a brush between the operating position and the non-operating position.