JP3359467B2 - Rotary substrate cleaning equipment - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a semiconductor wafer, a glass substrate for a photomask, a glass substrate for a liquid crystal display,
Substrate holding means for rotatably holding a substrate around a vertical axis in order to supply a cleaning liquid such as pure water to a substrate such as a substrate for an optical disc for cleaning processing, and a cleaning tool for cleaning the substrate surface Cleaning tool moving means for displacing the cleaning tool between a cleaning position on the substrate and a standby position off the substrate; a standby pot covering the periphery of the cleaning tool at the standby position; and a cleaning tool in the standby pot. The present invention relates to a rotary substrate cleaning apparatus including a nozzle for supplying a cleaning liquid.

[0002]

2. Description of the Related Art Conventional rotary substrate cleaning apparatuses include, for example, Japanese Utility Model Laid-Open No. 1-107129 and Japanese Patent Laid-Open No. 3-52.
The one disclosed in Japanese Patent Publication No. 228 is known. According to this conventional example, while rotating the substrate at a vertical axis around washing liquid is supplied to the substrate surface, cleaning tool (cleaning brush and scrub Lee Bing brush) is moved along a substrate surface, While pressing the cleaning tool against the substrate with a predetermined pressing force, the particles and dirt adhering to the substrate surface are separated, and the separated particles and dirt are removed together with the cleaning liquid using the centrifugal force generated by the substrate rotation. It had to be discharged outside.

[0003] Further, an arm provided with a cleaning tool and the like is integrally attached to a support shaft rotatable about a vertical axis, and an electric motor or the like is operatively connected to the support shaft.
A support shaft is provided so as to be able to move up and down, and by rotating the support shaft, the cleaning tool is displaced in the horizontal direction along the substrate surface, and the cleaning tool is moved to a position where the substrate can be cleaned and to a position above and above the substrate. And the cleaning tool is displaced between a cleaning position on the substrate and a standby position off the substrate. Then, at the standby position, the cleaning tool is inserted into the standby pot, a cleaning liquid such as pure water is supplied to the cleaning tool from a nozzle provided in the standby pot, and contaminants attached to the cleaning tool are removed. ing.

[0004]

By the way, in such a rotary substrate cleaning apparatus, a soft material such as a nylon brush, a mohair brush, a sponge, a felt, or the like is used according to a substrate to be processed or a degree of contamination. They are replaced with various cleaning tools, such as those made of plastic or plastic.

[0005] However, conventionally, a nozzle is generally provided in a standby pot in a fixed state, and a position at which an arm is lowered to insert a cleaning tool into the standby pot is determined. Cleaning liquid is supplied only to the lower end side of the cleaning tool, contaminants attached to the cleaning tool cannot be sufficiently removed, and the remaining contaminants will be brought on the substrate when the substrate is next cleaned.
There is a possibility that the cleaning property for the substrate may be reduced.

The present invention has been made in view of such circumstances, and the rotary substrate cleaning apparatus according to the first aspect of the present invention adheres to the cleaning tool regardless of the type of the cleaning tool. An object of the present invention is to enable a contaminant to be satisfactorily removed in a standby pot, and a rotary substrate cleaning apparatus according to the second aspect of the present invention, wherein the contaminant adhered to the cleaning tool depends on the type of the cleaning tool. In a standby pot.

[0007]

The invention according to claim 1 is
In order to achieve the above object, a substrate holding means for rotatably holding a substrate around a vertical axis, a cleaning tool for cleaning the substrate surface, a cleaning tool for cleaning the substrate and a cleaning position on the substrate. A cleaning tool moving means displaced over a standby position deviated from the standby position, a standby pot covering the periphery of the cleaning tool at the standby position, and a nozzle for supplying a cleaning liquid to the cleaning tool in the standby pot. Wait for the nozzle
A nozzle is provided in the machine pot, and a nozzle is provided so as to be able to change a vertical position of an arrival point of the cleaning liquid supplied from the nozzle to the cleaning tool according to the type of the cleaning tool.

Further, the inventions according to claim 2, in order to achieve the above-described object, the rotary substrate as claimed in claim 1
In the cleaning device, a nozzle is provided in the standby pot so that the jetting angle of the cleaning liquid with respect to the horizontal plane can be changed in the vertical direction.

[0009]

According to the structure of the rotary substrate cleaning apparatus of the present invention, for example, in a brush-like cleaning tool such as a nylon brush or a mohair brush, a cleaning liquid is supplied to the root side of the cleaning tool, and the felt is made of felt. In a cleaning tool such as the above, the vertical position of the reaching point of the cleaning liquid supplied to the cleaning tool can be changed according to the type of the cleaning tool, such as supplying the cleaning liquid from the periphery to the center side. .

Further, according to the structure of the rotary substrate cleaning apparatus of the present invention, for example, in a brush-like cleaning tool such as a nylon brush or a mohair brush, the cleaning liquid is supplied upward to the root side. For cleaning tools such as those made of felt, the cleaning liquid to be supplied to the cleaning tool is positioned in the vertical direction according to the type of cleaning tool, such as supplying the cleaning liquid slightly upward from the periphery to the lower end. In addition, the jetting angle of the cleaning liquid with respect to the horizontal plane can be changed in the vertical direction.

[0011]

Next, an embodiment of the present invention will be described in detail with reference to the drawings. FIG. 1 is a schematic longitudinal sectional view of a main part of a rotary substrate cleaning apparatus according to a first embodiment of the present invention, and FIG.
A rotary table 3 for holding the substrate W by vacuum suction is attached to the upper end of a rotary shaft 2 that rotates about a vertical axis by driving the electric motor 1 so as to be integrally rotatable, and the substrate W is rotated about the vertical axis. A substrate holding means 4 for rotatably holding is provided.

In this embodiment, the substrate holding means 4 is constituted by using the rotary table 3 as a vacuum suction type. However, the present invention is not limited to this. A plurality of substrate supporting members for supporting the outer edge are provided, and positioning pins for regulating the horizontal position of the substrate W are provided at the upper end of the substrate supporting member to constitute a substrate holding means. You may make it hold rotatably in the separated state.

The periphery of the substrate holding means 4 and the substrate W held thereby are covered with a cup 5 which can be moved up and down by a lifting drive mechanism (not shown). Nozzles 6 for ejecting a cleaning liquid, such as pure water or a mixture thereof, toward the center of rotation of the substrate W on the lateral outer side of the cup 5.
Is provided.

As shown in a partially cutaway overall schematic side view of FIG. 3, a rotation support shaft 8 of an angle-shaped support arm 7 is provided on a base 9 on the base 9 on the lateral outer side of the cup 5. 1
0 is provided rotatably about a first axis P1 in the vertical direction, and is rotatably provided only on a rotary cylinder 11 provided on the base 9 so as to be rotatable only. A cleaning tool 12 for cleaning the substrate surface is provided below the side arm portion 7a so as to be rotatable about a second axis P2 in the vertical direction.

An air cylinder 1 for lifting and lowering is provided at a lower end of the rotating shaft 8.
3 are provided. An electric motor 15 is linked to the rotating cylinder 11 via a belt 14. In the figure, 1
6 detects whether the cleaning tool 12 is located at the rotation center position A of the substrate W, the position B corresponding to the outer peripheral edge of the substrate W, or the standby position C at the time of non-cleaning, which is deviated from above the substrate W. 3 shows a position detection mechanism.

A balance arm 17 is provided on the support 10 so as to be swingable about a horizontal axis.
7 are provided with first and second contact rollers 18 and 19 at both ends.

A receiving plate 20 is provided at an intermediate position of the rotary support shaft 8, while a weight base 22 is provided on a support 21 protruding from the base 9 so as to be able to move up and down, and is fitted to the support 21. Weights 23 are placed on the weight table 22. The first contact roller 18 is provided on the lower surface of the receiving plate 20.
The second contact roller 19 is in contact with the lower surface of the weight table 22. The weights of the weights 23 are set slightly smaller than the weights of the rotating shaft 8, the support arm 7, the cleaning tool 12, and the like.

A reduction cylinder 25 is provided on a support member 24 erected on the base 9, and the tip of a cylinder rod 25 a of the reduction cylinder 25 is in contact with the upper surface of the weight base 22. A stopper 26 is provided on the support member 24, and the tip of the stopper 26 abuts on the upper surface of the weight table 22, so that the cleaning tool 12 moves the substrate W from the rotation center position of the substrate W.
It is configured to set the lowest position when it is positioned in the cleaning state up to the position corresponding to the outer peripheral edge of. A micrometer 27 is attached to the stopper 26 so that the lowest position to be set can be adjusted.

As shown in the enlarged longitudinal sectional view of the main part of FIG. 2 and FIG. 4 and the enlarged sectional view of FIG. , A standby pot 28 is provided so as to cover the periphery of the cleaning tool 12 at the standby position, and the cleaning tool 12 inserted into the standby pot 28 is provided at each of a pair of opposing corners in the standby pot 28. A nozzle 29 for supplying pure water or a mixture thereof with a chemical solution or a cleaning liquid such as ultrasonic water is provided, and a drain port 30 is provided at the bottom.

A support bracket 32 is mounted on the apparatus main body 31, and a vertically long hole 33 is formed in the support bracket 32. The standby hole 28 is formed in the long hole 33 through a pair of bolts 34 and nuts (not shown). Is attached, and in the initial setting, the fixing position of the standby pot 28 can be adjusted.

Each of the nozzles 29, 29 is composed of a base member 29a, a front member 29b, and a fixing member 29c for fixing the front member 29b to the base member 29a. The proximal member 29a has a spherical receiving seat 36 on the distal side.
And a screw portion 37 for screwing the fixing member 29c on the outer peripheral surface. Further, the tip side member 29
b is configured by integrally connecting an ejection port 39 to a spherical member 38 rotatably received and supported by a spherical receiving seat 36.

With the above structure, in each of the nozzles 29, 29, the fixing member 29c is loosened to loosen the tip side member 29b.
Is appropriately rotated with respect to the base end member 29a, the ejection angle is changed in a three-dimensional direction, the vertical position of the arrival point P of the cleaning liquid supplied to the cleaning tool 12 is changed to a desired position, and then the fixing member is fixed. As shown in FIG. 5A, the cleaning tool 1 is fixed to the brush-like cleaning tool 12 such as a nylon brush or a mohair brush.
2 is rotated around the vertical axis P2, and the cleaning liquid is spouted and supplied upward to the root side, so that contaminants entering the root side can be satisfactorily removed.

As shown in FIG. 5B, for the cleaning tool 12 that is not made of a brush, such as made of felt, the cleaning tool 12 is rotated while rotating about the vertical axis P2. The cleaning liquid is jetted and supplied to the middle part in the vertical direction of the outer periphery in the horizontal direction, so that the contaminants adhered to the outer surface can be satisfactorily removed.

When changing the jetting direction of the cleaning liquid by the nozzle 29, both nozzles 29
May be directed toward the rotation axis P2 of the cleaning tool 12, and the other may be directed tangentially to the outer peripheral portion of the cleaning tool 12.

FIG. 6 is a plan view of a main part of the second embodiment, and FIG. 7 is a longitudinal sectional view of a main part of the second embodiment.
8, eight nozzles 29 are provided at predetermined intervals in the circumferential direction.

As shown in FIG. 8 which is a partially cutaway overall schematic side view, in place of the micrometer 27 of the first embodiment,
A screw shaft 40 is provided so as to be able to move only up and down, and an inner screw member 41 screwed to the screw shaft 40 is provided so as to be able to rotate only, and the inner screw member 41 and the motor shaft 43 of the pulse motor 42 are gear-type transmission mechanisms. It is interlocked and connected via 44.

A controller 45 is connected to the pulse motor 42. In the controller 45, the number of revolutions is preset in accordance with the type of the cleaning tool 12,
The lower end position of the screw shaft 40 when the cleaning tool 12 is displaced to the standby position C is changed according to the type of
The position of the cleaning tool 12 in the cleaning tool 8 can be changed, and the vertical position of the arrival point P of the cleaning liquid supplied to the cleaning tool 12 can be changed. When the cleaning tool 12 is displaced from the standby position C onto the substrate W, the cleaning tool 12 is automatically returned to a position where a predetermined pressing force can be applied to the substrate W. The other configuration is the same as that of the first embodiment, and the description is omitted by attaching the same figure number.

According to the second embodiment, the cleaning liquid can be supplied from the nozzles 29 to the entire periphery of the cleaning tool 12, and the cleaning tool 12 is not rotatably provided around the second axis P2 in the vertical direction. There is an advantage that it can be suitably applied to a rotary substrate cleaning apparatus.

The arrival point P of the cleaning liquid supplied to the cleaning tool 12
The upper and lower to change the direction of the position, fixed proximal member 29a and the front part 29b of the upper mentioned first embodiment member 2
9c, and the structure in which the position of the cleaning tool 12 in the standby pot 28 is changed by moving the support arm 7 up and down by the pulse motor 42 in the second embodiment.
Not limited to this, the standby pot 28 may be moved up and down.
No.

As the above-described cleaning tool 12, various brush-like tools such as nylon brushes and mohair brushes, and non-brush-like tools such as sponge, felt, and plastic are used.

In the above embodiment, the electric motor 15 rotates the support arm 7 about the first axis P1 in the vertical direction to displace the cleaning tool 12 in the horizontal direction along the surface of the substrate W. However, the support arm 7 may be moved in a linear direction by an air cylinder or the like, and the support arm 7 and the electric motor 15 or the support arm 7 and the air cylinder may be used. The cleaning tool moving means is generally referred to as having such a configuration.

A position ranging from the rotation axis center position A for cleaning the substrate W by moving the cleaning tool 12 to a position B corresponding to the outer peripheral edge is referred to as a cleaning position.

The present invention can be applied not only to the circular substrate as in the above embodiment but also to a rotary substrate cleaning apparatus for a square substrate.

[0034]

As described above, according to the rotary substrate cleaning apparatus of the first aspect of the present invention, the cleaning liquid can be supplied to a suitable position according to the type of the cleaning tool.
Regardless of the type of cleaning tool, contaminants adhering to the cleaning tool can be removed well in the standby pot.

According to the rotary substrate cleaning apparatus of the second aspect of the present invention, the cleaning liquid can be supplied to a suitable position and at a suitable angle according to the type of the cleaning tool. Regardless of the type, contaminants attached to the cleaning tool can be better removed in the waiting pot.

[Brief description of the drawings]

FIG. 1 is a schematic longitudinal sectional view showing a first embodiment of a rotary substrate cleaning apparatus of the present invention.

FIG. 2 is a plan view.

FIG. 3 is a partially cutout overall schematic side view.

FIG. 4 is an enlarged sectional view of a main part.

FIG. 5 is a view taken along line aa of FIG. 4;

FIG. 6 is a plan view of a second embodiment.

FIG. 7 is a longitudinal sectional view of the second embodiment.

FIG. 8 is a partially cutout overall schematic side view.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 4 ... Substrate holding means 7 ... Support arm which comprises cleaning tool moving means 12 ... Cleaning tool 15 ... Electric motor which comprises cleaning tool moving means 28 ... Stand-by pot 29 ... Nozzle A ... Rotation axis center position B ... Peripheral edge equivalent Position C: Standby position P: Arrival point P1: First axis W: Substrate

──────────────────────────────────────────────────続 き Continuation of the front page (56) References JP-A-3-52228 (JP, A) JP-A-4-107824 (JP, A) JP-A-9-29189 (JP, A) JP-A-7-29 307321 (JP, A) JP-A-6-326067 (JP, A) (58) Fields investigated (Int. Cl. ⁷ , DB name) H01L 21/304 B08B 1/00

Claims (2)

(57) [Claims] 1. A substrate holding means for rotatably holding a substrate around a vertical axis, a cleaning tool for cleaning a surface of the substrate, and a cleaning tool on the substrate and a cleaning position on the substrate. A cleaning tool moving means displaced over a standby position; a standby pot covering a periphery of the cleaning tool at a standby position; and a nozzle for supplying a cleaning liquid to the cleaning tool in the standby pot. Providing the nozzle in the standby pot,
The vertical position of the reaching point of the cleaning liquid supplied from the nozzle to the cleaning tool can be changed according to the type of the cleaning tool.
A rotary substrate cleaning apparatus comprising a nozzle . 2. The rotary substrate cleaning apparatus according to claim 1 , wherein
Fraud and mitigating risk nozzle standby pot, rotary substrate cleaning apparatus is provided to enable changing the ejection angle of the cleaning liquid with respect to the horizontal plane in the vertical direction.