JPH08158027A - Annealing method for rolled copper foil - Google Patents

Annealing method for rolled copper foil

Info

Publication number
JPH08158027A
JPH08158027A JP33025094A JP33025094A JPH08158027A JP H08158027 A JPH08158027 A JP H08158027A JP 33025094 A JP33025094 A JP 33025094A JP 33025094 A JP33025094 A JP 33025094A JP H08158027 A JPH08158027 A JP H08158027A
Authority
JP
Japan
Prior art keywords
copper foil
rolled copper
rolled
annealing
foils
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33025094A
Other languages
Japanese (ja)
Inventor
Tatsuo Eguchi
達夫 江口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Foil Manufacturing Co Ltd
Original Assignee
Nippon Foil Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Foil Manufacturing Co Ltd filed Critical Nippon Foil Manufacturing Co Ltd
Priority to JP33025094A priority Critical patent/JPH08158027A/en
Publication of JPH08158027A publication Critical patent/JPH08158027A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal

Landscapes

  • Metal Rolling (AREA)
  • Pressure Welding/Diffusion-Bonding (AREA)

Abstract

PURPOSE: To prevent the occurrence of adhesion between rolled copper foils at the time of annealing the rolled copper foils in a piled state. CONSTITUTION: At the time of annealing rolled copper foils in a piled state, the adhesion between the rolled copper foils can be prevented by inserting an electrolytic copper foil between the rolled copper foils and performing annealing in this state. Further, the adhesion between the rolled copper foils can be prevented by inserting a roughed copper foil of 0. 5-1.5μm surface roughness (Ra) of both surfaces between the rolled copper foils and performing annealing in this state. The roughed copper foil can be obtained by applying roughing treatment method, such as sand blasting, brushing, chemical etching, electrolytic etching, electrodeposition roughing, and embossing, to both surfaces of a rolled copper foil prepared by rolling or an electrolytic copper foil prepared by electrolytic method. Moreover, the piling of the rolled copper foils is generally performed by coiling the rolled copper foil.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、圧延銅箔を重合して焼
鈍する際、重合した圧延銅箔間が接着するのを防止しな
がら、焼鈍する方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of annealing rolled copper foils by superposing them on each other, while preventing the polymerized rolled copper foils from adhering to each other.

【0002】[0002]

【従来の技術】従来より、圧延銅箔は、電線等のシール
ド材として使用されている。圧延銅箔は、銅又は銅合金
を溶解して鋳造後、熱間圧延を行い、その後冷間圧延及
び中間焼鈍を繰り返し、0.1〜1.0mmの銅薄板を
得、次いで中間焼鈍を行った後冷間圧延を行って、最終
的に35μm以下に製造されるものである。そして、圧
延銅箔表面に付着した圧延油等を除去するため、トリク
レンやノルマルパラフィン等の有機溶剤で、脱脂・洗浄
処理が施される。このような圧延銅箔を、電線等のシー
ルド材として使用する場合には、圧延銅箔を電線等に密
着させる必要があり、軟質化するのが一般的である。圧
延銅箔を軟質化するには、再結晶完了温度以上の温度
(一般的には250℃以上の温度)で最終焼鈍する必要
がある。
2. Description of the Related Art Conventionally, rolled copper foil has been used as a shield material for electric wires and the like. The rolled copper foil is obtained by melting and casting copper or a copper alloy, followed by hot rolling, then repeating cold rolling and intermediate annealing to obtain a copper thin plate of 0.1 to 1.0 mm, and then performing intermediate annealing. After that, cold rolling is performed to finally manufacture the film having a thickness of 35 μm or less. Then, in order to remove the rolling oil or the like adhering to the surface of the rolled copper foil, degreasing / cleaning treatment is performed with an organic solvent such as trichlene or normal paraffin. When such a rolled copper foil is used as a shield material for electric wires or the like, it is necessary to bring the rolled copper foil into close contact with the electric wires or the like, and it is generally softened. To soften the rolled copper foil, it is necessary to perform final annealing at a temperature equal to or higher than the recrystallization completion temperature (generally 250 ° C. or higher).

【0003】従来、この最終焼鈍は、得られた圧延銅箔
を巻き取ってコイルとし、このコイルを250℃以上の
温度で2〜5時間以上保持して、行われている。しかし
ながら、圧延銅箔を巻き取ってコイルにすると、圧延銅
箔同士が重合して接触しているため、最終焼鈍によっ
て、圧延銅箔間が接着するということがあった。特に、
この圧延銅箔間の接着は、コイルの巻き始めの箇所にお
いて顕著であった。これは、最終焼鈍によって圧延銅箔
が軟質化するため、及びコイルの中心に向かうにしたが
って、圧延銅箔に高圧力が負荷されるからであると考え
られる。
Conventionally, this final annealing is carried out by winding the obtained rolled copper foil into a coil and holding this coil at a temperature of 250 ° C. or higher for 2 to 5 hours or more. However, when the rolled copper foil is wound into a coil, the rolled copper foils are polymerized and are in contact with each other, so that the rolled copper foils may be bonded to each other by the final annealing. In particular,
The adhesion between the rolled copper foils was remarkable at the beginning of coil winding. It is considered that this is because the rolled copper foil is softened by the final annealing, and a high pressure is applied to the rolled copper foil toward the center of the coil.

【0004】このように圧延銅箔間が接着すると、一枚
の圧延銅箔に剥がれにくく、数枚が一体化した状態とな
り、軟質化させた圧延銅箔の生産性が低下するという欠
点があった。また、圧延銅箔間が一枚に剥がれたとして
も、圧延銅箔表面にシワ等の欠陥が発生し、圧延銅箔の
生産性を低下させるという欠点もあった。更に、最悪の
場合には、圧延銅箔を全く巻きほぐせない(巻き戻せな
い)という欠点もあった。
When the rolled copper foils are bonded to each other in this manner, they are difficult to peel off on one rolled copper foil, and several rolled copper foils are in an integrated state, resulting in a decrease in productivity of the softened rolled copper foil. It was Further, even if the rolled copper foils are separated from each other, defects such as wrinkles occur on the surface of the rolled copper foils, and the productivity of the rolled copper foils is reduced. Further, in the worst case, there is a drawback that the rolled copper foil cannot be unwound (rewound) at all.

【0005】[0005]

【発明が解決しようとする課題】本発明者は、最終焼鈍
によって、何故、重合させた圧延銅箔同士が接着するの
かを検討した。即ち、銅の融点よりもはるかに低い温度
で最終焼鈍を行っているにも拘らず、圧延銅箔間が、あ
たかも融着したような状態で接着するのかを検討した。
その結果、圧延銅箔は、冷間圧延を繰り返し行っている
ため、その表面が鏡面状態となっているからであると考
えるに到った。即ち、鏡面を持つ圧延銅箔同士を重合し
て接触させると、各銅箔を構成している各銅元素間の距
離が非常に近くなり、各銅箔中の電子が重合面を超えて
相互に通い合うためであると考えられるのである。特
に、圧延銅箔表面が鏡面となっているため、圧延銅箔全
面にこの現象が生じて、極端な場合には、圧延銅箔間が
あたかも融着したかのような状態で接着すると考えられ
るのである。
DISCLOSURE OF THE INVENTION The present inventor has investigated why the rolled copper foils polymerized by the final annealing adhere to each other. That is, it was examined whether or not the rolled copper foils were adhered as if they were fused even though the final annealing was performed at a temperature much lower than the melting point of copper.
As a result, the rolled copper foil was thought to be because the surface thereof was in a mirror state because it was repeatedly cold-rolled. That is, when rolled copper foils having a mirror surface are polymerized and brought into contact with each other, the distance between the respective copper elements forming each copper foil becomes very close, and the electrons in each copper foil cross each other beyond the polymerized surface. It is thought that it is for communicating with each other. In particular, since the rolled copper foil surface is a mirror surface, this phenomenon occurs on the entire rolled copper foil, and in an extreme case, it is considered that the rolled copper foils adhere to each other as if they were fused. Of.

【0006】そこで、本発明は、重合された圧延銅箔間
に、ある特定の介在物を設け、各圧延銅箔を構成してい
る各銅元素間の距離が、全面に亙って近接しないように
して焼鈍を行うことによって、圧延銅箔間が接着するの
を防止しようというものである。
Therefore, in the present invention, a certain inclusion is provided between the polymerized rolled copper foils, and the distances between the copper elements constituting each rolled copper foil are not close to each other over the entire surface. By carrying out annealing in this way, it is intended to prevent the rolled copper foils from adhering to each other.

【0007】[0007]

【課題を解決するための手段】即ち、本発明は、圧延銅
箔を重合して焼鈍する方法において、該圧延銅箔間に、
電解銅箔を挿入しておくことを特徴とする圧延銅箔の焼
鈍方法に関するものである。また、圧延銅箔を重合して
焼鈍する方法において、該圧延銅箔間に、表面粗度(R
a)が0.5〜1.5μmである粗化銅箔を挿入してお
くことを特徴とする圧延銅箔の焼鈍方法に関するもので
ある。
Means for Solving the Problems That is, the present invention is a method of polymerizing and annealing a rolled copper foil, wherein between the rolled copper foils,
The present invention relates to a method for annealing a rolled copper foil, which is characterized in that an electrolytic copper foil is inserted. Further, in the method of polymerizing rolled copper foils and annealing, the surface roughness (R
a) is a method of annealing a rolled copper foil, characterized in that a roughened copper foil having a thickness of 0.5 to 1.5 μm is inserted.

【0008】本発明において使用する圧延銅箔は、従来
公知の方法で得られたものを用いる。即ち、銅又は銅合
金を溶解して鋳造後、熱間圧延を行い、その後冷間圧延
及び中間焼鈍を繰り返し、0.1〜1.0mmの銅薄板
を得を得る。そして、更に中間焼鈍及び冷間圧延を行っ
て、最終的に例えば35μm以下の厚さに調整された圧
延銅箔を使用する。従って、本発明で言う圧延銅箔に
は、圧延銅合金箔も包含されるものである。銅合金とし
ては、リン(P)が含有されているもの、スズ(Sn)
が含有されているもの、又はリン(P)及びスズ(S
n)が含有されているものが一般的に使用され、またそ
の他の元素が含有されているものもの使用しうる。リン
(P)は、一般的に1重量%以下含有され、特に0.1
重量%以下含有されているのが好ましい。スズ(Sn)
は、一般的に10重量%以下含有され、特に6重量%以
下含有されているのが好ましく、更には0.2重量%以
下含有されているのが最も好ましい。具体的には、JI
S H 3100,JIS H3110,JIS H
3130に規定された銅合金や、その他の実用化されて
いる種々の銅合金を使用する。
The rolled copper foil used in the present invention is obtained by a conventionally known method. That is, after melting and casting copper or a copper alloy, hot rolling is performed, and then cold rolling and intermediate annealing are repeated to obtain a copper thin plate of 0.1 to 1.0 mm. Then, intermediate annealing and cold rolling are further performed to finally use the rolled copper foil adjusted to have a thickness of, for example, 35 μm or less. Therefore, the rolled copper foil referred to in the present invention includes rolled copper alloy foil. Copper alloys containing phosphorus (P), tin (Sn)
Containing phosphorus, or phosphorus (P) and tin (S
Those containing n) are generally used, and those containing other elements may be used. Phosphorus (P) is generally contained in an amount of 1% by weight or less, and particularly 0.1% by weight.
It is preferable that the content is not more than wt%. Tin (Sn)
Is generally contained in an amount of 10% by weight or less, particularly preferably 6% by weight or less, and most preferably 0.2% by weight or less. Specifically, JI
SH 3100, JIS H3110, JIS H
The copper alloy specified in 3130 and other various commercialized copper alloys are used.

【0009】圧延銅箔表面には、圧延油等が付着してい
るため、トリクレンやノルマルパラフィン等の有機溶剤
で、脱脂・洗浄処理を行うことによって、圧延油等を除
去する。この脱脂・洗浄処理は、後述する焼鈍前に行っ
てもよいし、後述する焼鈍後に行っても良い。
Since rolling oil or the like is attached to the surface of the rolled copper foil, the rolling oil or the like is removed by performing degreasing / washing treatment with an organic solvent such as trichlene or normal paraffin. This degreasing / cleaning treatment may be performed before the annealing described below or after the annealing described below.

【0010】次いで、この圧延銅箔を重合する。圧延銅
箔の重合は、一般的に圧延銅箔を巻き取ってコイルにす
ることを意味している。即ち、圧延銅箔を巻き取ると、
下層の圧延銅箔に上層の圧延銅箔が重合するのである。
なお、前述したことは一般的なことであり、本発明にお
ける圧延銅箔の重合という場合、平板状の圧延銅箔を巻
き取らずに、そのまま複数枚を重ねることも包含するも
のである。
Next, the rolled copper foil is polymerized. Polymerization of rolled copper foil generally means winding the rolled copper foil into a coil. That is, when rolling the rolled copper foil,
The upper layer rolled copper foil is polymerized with the lower layer rolled copper foil.
It should be noted that what has been described above is general, and the term "polymerization of a rolled copper foil" in the present invention also encompasses stacking a plurality of flat rolled copper foils as they are without winding them.

【0011】本発明において重要なことは、圧延銅箔を
重合する際に、接触する圧延銅箔間に電解銅箔を挿入す
る点にある。本発明で言う電解銅箔とは、従来公知の電
解法で得られた銅箔のことであり、銅が溶解している電
解液中に浸漬された回転ドラム上に、電着によって銅を
析出させて得られた銅箔のことである。従って、この電
解銅箔表面は、回転ドラムに接触した面と、回転ドラム
に接触していなかった面とよりなる。電解銅箔におい
て、前者の面は比較的平滑であってシャイニー面と呼ば
れ、後者の面は比較的粗であってマット面と呼ばれる。
しかし、比較的平滑と言われるシャイニー面であって
も、圧延銅箔の表面よりも粗である。このように、表面
が比較的粗である電解銅箔を、圧延銅箔間に挿入するた
め、各圧延銅箔を構成している各銅元素間が、全面に亙
って近接することを防止できるのである。なお、圧延銅
箔間に挿入する材料として、銅よりなる電解銅箔を採用
したのは、圧延銅箔と硬度の点等で同一になるようにし
て、圧延銅箔の表面が型押しされたり、或いは電解銅箔
の表面が変形したりすることを防止するためである。
What is important in the present invention is that when the rolled copper foil is polymerized, an electrolytic copper foil is inserted between the rolled copper foils in contact with each other. The electrolytic copper foil referred to in the present invention is a copper foil obtained by a conventionally known electrolytic method, and copper is deposited by electrodeposition on a rotating drum immersed in an electrolytic solution in which copper is dissolved. It is a copper foil obtained by doing so. Therefore, the surface of this electro-deposited copper foil is composed of a surface that is in contact with the rotating drum and a surface that is not in contact with the rotating drum. In the electrolytic copper foil, the former surface is relatively smooth and is called a shiny surface, and the latter surface is relatively rough and is called a matte surface.
However, even the shiny surface, which is said to be relatively smooth, is rougher than the surface of the rolled copper foil. In this way, the electrolytic copper foil having a relatively rough surface is inserted between the rolled copper foils, so that the copper elements forming each rolled copper foil are prevented from coming close to each other over the entire surface. You can do it. As the material to be inserted between the rolled copper foils, the electrolytic copper foil made of copper is adopted because the surface of the rolled copper foil is embossed so that the rolled copper foil has the same hardness and the like. Alternatively, it is for preventing the surface of the electrolytic copper foil from being deformed.

【0012】本発明において使用する電解銅箔の厚さ
は、特にどのような厚さのものを用いても差し支えない
が、一般的に10〜30μm程度のものを用いるのが好
ましく、特に18μm程度のものを用いるのが最も好ま
しい。電解銅箔の厚さは薄くなるにしたがい、高価にな
るので、厚さ10μm未満のものを使用するのは不経済
である。一方、電解銅箔の厚さが30μmを超えると、
これを挿入してコイルにすると、コイルの重量が重くな
ったり、或いはコイルの外径が大きくなりすぎて、取り
扱いにくくなる傾向が生じる。
The thickness of the electrolytic copper foil used in the present invention may be any thickness, but it is generally preferable to use a thickness of about 10 to 30 μm, particularly about 18 μm. The most preferable one is The electrolytic copper foil becomes expensive as it becomes thinner, so that it is uneconomical to use an electrolytic copper foil having a thickness of less than 10 μm. On the other hand, when the thickness of the electrolytic copper foil exceeds 30 μm,
If this is inserted into a coil, the weight of the coil becomes heavy, or the outer diameter of the coil becomes too large, which tends to be difficult to handle.

【0013】また、本発明においては、圧延銅箔を重合
する際に、接触する圧延銅箔間に表面粗度(Ra)が
0.5〜1.5μmである粗化銅箔を挿入しても良い。
このような粗化銅箔は、一般の圧延銅箔の両表面を処理
して粗化銅箔としても良いし、電解銅箔の両表面を処理
し或いは未処理のまま粗化銅箔としても良い。表面粗度
(Ra)が0.5μm未満であると、表面が鏡面に近づ
いて、粗化銅箔と圧延銅箔間において、接着が生じる恐
れがあるので、好ましくない。一方、表面粗度(Ra)
が1.5μmを超えても、圧延銅箔間の接着を防止する
効果が更に向上しない傾向になる。従って、表面粗度
(Ra)が1.5μmを超えるような粗化処理をするこ
とは、不経済である。なお、本発明における表面粗度
(Ra)は、東京精密社製サーフコム303Bを用い、
触針半径2μm,触針駆動速度0.3mm/sec,カ
ットオフ値0.8mmの条件で測定を行った。
In the present invention, when the rolled copper foil is polymerized, a roughened copper foil having a surface roughness (Ra) of 0.5 to 1.5 μm is inserted between the rolled copper foils in contact with each other. Is also good.
Such a roughened copper foil may be a roughened copper foil by treating both surfaces of a general rolled copper foil, or may be a roughened copper foil that is untreated or treated on both surfaces of an electrolytic copper foil. good. When the surface roughness (Ra) is less than 0.5 μm, the surface approaches a mirror surface, and adhesion may occur between the roughened copper foil and the rolled copper foil, which is not preferable. On the other hand, surface roughness (Ra)
Is more than 1.5 μm, the effect of preventing adhesion between rolled copper foils tends not to be further improved. Therefore, it is uneconomical to perform the roughening treatment so that the surface roughness (Ra) exceeds 1.5 μm. The surface roughness (Ra) in the present invention uses Surfcom 303B manufactured by Tokyo Seimitsu Co., Ltd.
The measurement was performed under the conditions of a stylus radius of 2 μm, a stylus drive speed of 0.3 mm / sec, and a cutoff value of 0.8 mm.

【0014】粗化銅箔は、圧延銅箔等の両表面を粗化処
理することによって得ることができる。粗化処理の方法
としては、サンドブラスト法,ブラシ研削法,化学エッ
チング法,電解エッチング法,電着粗化法,エンボス加
工法を単独で又は併用して適用することにより、行うこ
とができる。サンドブラスト法は、圧延銅箔等の表面に
砂粒子を吹き付けて、その表面を粗面化するものであ
る。ブラシ研削法は、圧延銅箔等の表面をブラシで擦る
ことによって、その表面を粗面化するものである。ま
た、化学エッチング法は、化学的な方法で圧延銅箔等の
表面を極く少量溶解させ、表面に凹凸を形成させて、粗
面化するものである。また、電解エッチング法は、電解
液中で圧延銅箔等の表面を極く少量溶解させ、表面に凹
凸を形成させて、粗面化するものである。電着粗化法
は、圧延銅箔等の表面に、電着法によって銅を析出さ
せ、析出した銅が本来的に持つ凹凸を圧延銅箔等の表面
に付与するというものである。エンボス加工法は、表面
に凹凸が形成された加圧ロールを、圧延銅箔等の表面に
押し付けて、その凹凸を圧延銅箔等の表面に転写すると
いうものである。加圧ロールの表面に形成される凹凸柄
としては、絹目格子柄,梨地柄,砂目柄等の任意の柄が
採用される。また、これらの粗化処理法以外の方法も、
本発明において使用することができる。
The roughened copper foil can be obtained by roughening both surfaces of a rolled copper foil or the like. As a roughening treatment method, a sandblasting method, a brush grinding method, a chemical etching method, an electrolytic etching method, an electrodeposition roughening method, an embossing method can be applied alone or in combination. The sandblast method is to spray sand particles onto the surface of a rolled copper foil or the like to roughen the surface. The brush grinding method is to roughen the surface of a rolled copper foil or the like by rubbing it with a brush. Further, the chemical etching method is a method in which a very small amount of the surface of a rolled copper foil or the like is dissolved by a chemical method to form irregularities on the surface to roughen the surface. In the electrolytic etching method, a very small amount of the surface of a rolled copper foil or the like is dissolved in an electrolytic solution to form irregularities on the surface and roughen the surface. The electrodeposition roughening method is to deposit copper on the surface of a rolled copper foil or the like by the electrodeposition method, and to impart the irregularities originally possessed by the deposited copper to the surface of the rolled copper foil or the like. In the embossing method, a pressure roll having irregularities formed on the surface is pressed against the surface of a rolled copper foil or the like, and the irregularities are transferred to the surface of the rolled copper foil or the like. As the concavo-convex pattern formed on the surface of the pressure roll, any pattern such as a silk lattice pattern, a satin pattern, and a grain pattern is adopted. In addition, methods other than these roughening treatment methods,
It can be used in the present invention.

【0015】以上のような電解銅箔又は粗化銅箔を、焼
鈍すべき圧延銅箔を重合する際、圧延銅箔間に挿入す
る。そして、圧延銅箔の再結晶完了温度以上の温度で焼
鈍して、圧延銅箔を軟質化するのである。焼鈍温度は、
一般的に250℃以上である。また、焼鈍の保持時間
は、1時間以上であり、好ましくは2時間程度である。
これらの焼鈍の温度や時間は、圧延銅箔の元素組成や圧
延銅箔の厚さを考慮に入れ、圧延銅箔が満足のゆく程度
に軟質化する条件を適宜決定することができる。圧延銅
箔が焼鈍され軟質化された後、圧延銅箔表面に圧延油等
が付着している場合には、トリクレンやノルマルパラフ
ィン等の有機溶剤で、脱脂・洗浄処理することによっ
て、圧延油等を除去するのが好ましい。
When the rolled copper foil to be annealed is polymerized, the electrolytic copper foil or the roughened copper foil as described above is inserted between the rolled copper foils. Then, the rolled copper foil is annealed at a temperature equal to or higher than the recrystallization completion temperature to soften the rolled copper foil. The annealing temperature is
Generally, it is 250 ° C or higher. The holding time of annealing is 1 hour or more, preferably about 2 hours.
The temperature and time of these annealings can be appropriately determined in consideration of the elemental composition of the rolled copper foil and the thickness of the rolled copper foil, and the conditions for softening the rolled copper foil to a satisfactory degree. After the rolled copper foil is annealed and softened, if rolling oil etc. adheres to the surface of the rolled copper foil, degreasing and cleaning treatment with an organic solvent such as trichlene, normal paraffin, etc. Is preferably removed.

【0016】[0016]

【実施例】 [圧延銅箔a〜cの調整]銅合金を溶解し鋳造した後、
熱間圧延を行い、その後冷間圧延と中間焼鈍とを数回繰
り返し、厚さ9μmで巾600mmの圧延銅箔を得た。
そして、この両表面に有機溶剤で脱脂・洗浄処理を施し
た。ここで、銅合金としては、次の三種を使用した。即
ち、(a)リン(P)0.02重量%で残部が銅(Cu)
の銅合金(JIS C 1220相当合金),(b)スズ
(Sn)0.2重量%で残部が銅(Cu)の銅合金(一
般的に実用化されているCu−Sn合金),(c)スズ
(Sn)6重量%及びリン(P)0.1重量%で残部が
銅(Cu)の銅合金(JISC 1591相当合金)を
使用した。そして、(a)の銅合金を使用して得られた圧
延銅箔を圧延銅箔aとし、(b)の銅合金を使用して得ら
れた圧延銅箔を圧延銅箔bとし、(c)の銅合金を使用し
て得られた圧延銅箔を圧延銅箔cとした。
Example [Adjustment of rolled copper foils a to c] After melting and casting a copper alloy,
Hot rolling was performed, and then cold rolling and intermediate annealing were repeated several times to obtain a rolled copper foil having a thickness of 9 μm and a width of 600 mm.
Then, both surfaces were degreased and washed with an organic solvent. Here, the following three types were used as the copper alloy. That is, (a) phosphorus (P) 0.02 wt% and the balance copper (Cu)
Copper alloy (corresponding to JIS C 1220), (b) tin (Sn) 0.2 wt% and the balance copper (Cu) (generally used Cu-Sn alloy), (c ) A copper alloy containing 6% by weight of tin (Sn) and 0.1% by weight of phosphorus (P) and the balance of copper (Cu) (corresponding to JISC 1591) was used. Then, the rolled copper foil obtained by using the copper alloy of (a) is referred to as a rolled copper foil a, the rolled copper foil obtained by using the copper alloy of (b) is referred to as a rolled copper foil b, and (c The rolled copper foil obtained by using the copper alloy of 1) was designated as rolled copper foil c.

【0017】実施例1 予め準備した厚さ18μmの電解銅箔を圧延銅箔aに重
合した状態で、外径81mmφの鋼管に、シワや巻ずれ
等が発生しない張力で、圧延銅箔aの重量が50kgに
なるまで巻き取って、コイルを作成した。そして、この
コイルを320℃で2時間保持して焼鈍を行った。な
お、コイルの温度を320℃まで昇温するのに、約7〜
9時間必要であった。また、焼鈍後にコイルを常温まで
冷却するのに、約15〜17時間程度必要であった。以
上のようにして焼鈍し、冷却した後、分離機で電解銅箔
と圧延銅箔aとを分離しながら、巻き替え作業を行った
ところ、電解銅箔と圧延銅箔aとは良好に分離し、シワ
等の表面欠陥も発生せずに、巻き替え作業を行うことが
できた。
Example 1 In a state where an electrolytic copper foil having a thickness of 18 μm prepared in advance is superposed on a rolled copper foil a, a rolled steel foil a of a steel pipe having an outer diameter of 81 mmφ is tensioned so as not to cause wrinkles and winding deviation. The coil was wound up until the weight reached 50 kg. Then, this coil was held at 320 ° C. for 2 hours for annealing. In addition, in order to raise the temperature of the coil to 320 ° C., about 7 to
It took 9 hours. Further, it took about 15 to 17 hours to cool the coil to room temperature after annealing. After annealing and cooling as described above, a rewinding operation was performed while separating the electrolytic copper foil and the rolled copper foil a by a separator, and the electrolytic copper foil and the rolled copper foil a were well separated. However, the rewinding work could be performed without causing surface defects such as wrinkles.

【0018】実施例2 圧延銅箔aに代えて、圧延銅箔bを使用し且つ焼鈍温度
を340℃とする他は、実施例1と同様にして焼鈍を行
い、同様にして巻き替え作業を行った。その結果、実施
例1の場合と同様に、良好に巻き替え作業を行うことが
できた。
Example 2 Instead of the rolled copper foil a, a rolled copper foil b was used and the annealing temperature was 340 ° C. Annealing was carried out in the same manner as in Example 1, and the rewinding work was carried out in the same manner. went. As a result, as in the case of Example 1, the rewinding work could be successfully performed.

【0019】実施例3 圧延銅箔aに代えて、圧延銅箔cを使用し且つ焼鈍温度
を370℃とする他は、実施例1と同様にして焼鈍を行
い、同様にして巻き替え作業を行った。その結果、実施
例1の場合と同様に、良好に巻き替え作業を行うことが
できた。
Example 3 Instead of the rolled copper foil a, a rolled copper foil c was used and the annealing temperature was set to 370 ° C. Annealing was performed in the same manner as in Example 1, and the rewinding work was performed in the same manner. went. As a result, as in the case of Example 1, the rewinding work could be successfully performed.

【0020】実施例4 厚さ18μmのタフピッチ銅箔(圧延銅箔)の両面に、
サンドブラスト法を適用して、表面粗度(Ra)が0.
6μmの粗化銅箔を得た。この粗化銅箔を圧延銅箔aに
重合した状態で、外径81mmφの鋼管に、シワや巻ず
れ等が発生しない張力で、圧延銅箔aの重量が50kg
になるまで巻き取って、コイルを作成した。その後は、
実施例1と同様にして焼鈍を行い、同様にして巻き替え
作業を行った。その結果、実施例1の場合と同様に、良
好に巻き替え作業を行うことができた。
Example 4 On both sides of a 18 μm thick tough pitch copper foil (rolled copper foil),
By applying the sandblast method, the surface roughness (Ra) is 0.
A 6 μm roughened copper foil was obtained. With the roughened copper foil superposed on the rolled copper foil a, the rolled copper foil a weighs 50 kg under tension such that wrinkles and winding deviation do not occur in a steel pipe with an outer diameter of 81 mmφ.
It wound up until it became, and the coil was created. After that,
Annealing was performed in the same manner as in Example 1, and rewinding work was performed in the same manner. As a result, as in the case of Example 1, the rewinding work could be successfully performed.

【0021】実施例5 圧延銅箔aに代えて、圧延銅箔bを使用し且つ焼鈍温度
を340℃とする他は、実施例4と同様にして焼鈍を行
い、同様にして巻き替え作業を行った。その結果、実施
例4の場合と同様に、良好に巻き替え作業を行うことが
できた。
Example 5 Instead of the rolled copper foil a, a rolled copper foil b was used and the annealing temperature was 340 ° C. Annealing was carried out in the same manner as in Example 4, and the rewinding work was carried out in the same manner. went. As a result, as in the case of Example 4, the rewinding work could be favorably performed.

【0022】実施例6 圧延銅箔aに代えて、圧延銅箔cを使用し且つ焼鈍温度
を370℃とする他は、実施例4と同様にして焼鈍を行
い、同様にして巻き替え作業を行った。その結果、実施
例4の場合と同様に、良好に巻き替え作業を行うことが
できた。
Example 6 Instead of the rolled copper foil a, a rolled copper foil c was used and the annealing temperature was set to 370 ° C. Annealing was performed in the same manner as in Example 4, and the rewinding work was performed in the same manner. went. As a result, as in the case of Example 4, the rewinding work could be favorably performed.

【0023】実施例7 表面粗度(Ra)が0.6μmの粗化銅箔を使用するの
に代えて、表面粗度(Ra)が1.5μmの粗化銅箔を
使用する他は、実施例4と同様にして焼鈍を行い、同様
にして巻き替え作業を行った。その結果、実施例4の場
合と同様に、良好に巻き替え作業を行うことができた。
Example 7 Instead of using a roughened copper foil having a surface roughness (Ra) of 0.6 μm, a roughened copper foil having a surface roughness (Ra) of 1.5 μm was used. Annealing was performed in the same manner as in Example 4, and rewinding work was performed in the same manner. As a result, as in the case of Example 4, the rewinding work could be favorably performed.

【0024】実施例8 圧延銅箔aに代えて、圧延銅箔bを使用し且つ焼鈍温度
を340℃とする他は、実施例7と同様にして焼鈍を行
い、同様にして巻き替え作業を行った。その結果、実施
例7の場合と同様に、良好に巻き替え作業を行うことが
できた。
Example 8 Instead of the rolled copper foil a, a rolled copper foil b was used and the annealing temperature was 340 ° C. Annealing was carried out in the same manner as in Example 7, and rewinding work was carried out in the same manner. went. As a result, as in the case of Example 7, the rewinding work could be favorably performed.

【0025】実施例9 圧延銅箔aに代えて、圧延銅箔cを使用し且つ焼鈍温度
を370℃とする他は、実施例7と同様にして焼鈍を行
い、同様にして巻き替え作業を行った。その結果、実施
例7の場合と同様に、良好に巻き替え作業を行うことが
できた。
Example 9 Instead of the rolled copper foil a, a rolled copper foil c was used and the annealing temperature was set to 370 ° C. Annealing was performed in the same manner as in Example 7, and the rewinding work was performed in the same manner. went. As a result, as in the case of Example 7, the rewinding work could be favorably performed.

【0026】実施例10 実施例4で使用した粗化銅箔に代えて、粗化銅箔の元素
組成をリン(P)0.02重量%で残部を銅(Cu)と
し、且つ表面粗度(Ra)を1.0μmとする他は、実
施例4と同様にして焼鈍を行い、同様にして巻き替え作
業を行った。その結果、実施例4の場合と同様に、良好
に巻き替え作業を行うことができた。
Example 10 Instead of the roughened copper foil used in Example 4, the elemental composition of the roughened copper foil was 0.02% by weight of phosphorus (P) with the balance being copper (Cu), and the surface roughness. Annealing was performed in the same manner as in Example 4 except that (Ra) was set to 1.0 μm, and rewinding work was performed in the same manner. As a result, as in the case of Example 4, the rewinding work could be favorably performed.

【0027】実施例11 実施例5で使用した粗化銅箔に代えて、粗化銅箔の元素
組成をスズ(Sn)0.2重量%で残部を銅(Cu)と
し、且つ表面粗度(Ra)を1.0μmとする他は、実
施例5と同様にして焼鈍を行い、同様にして巻き替え作
業を行った。その結果、実施例5の場合と同様に、良好
に巻き替え作業を行うことができた。
Example 11 Instead of the roughened copper foil used in Example 5, the elemental composition of the roughened copper foil was 0.2% by weight of tin (Sn) with the balance being copper (Cu) and the surface roughness. Annealing was performed in the same manner as in Example 5 except that (Ra) was set to 1.0 μm, and rewinding work was performed in the same manner. As a result, as in the case of Example 5, the rewinding work could be satisfactorily performed.

【0028】実施例12 実施例6で使用した粗化銅箔に代えて、粗化銅箔の元素
組成をスズ(Sn)6重量%及びリン(P)0.1重量
%で残部を銅(Cu)とし、且つ表面粗度(Ra)を
1.0μmとする他は、実施例6と同様にして焼鈍を行
い、同様にして巻き替え作業を行った。その結果、実施
例6の場合と同様に、良好に巻き替え作業を行うことが
できた。
Example 12 Instead of the roughened copper foil used in Example 6, the elemental composition of the roughened copper foil was 6% by weight of tin (Sn) and 0.1% by weight of phosphorus (P) with the balance being copper ( Cu), and the surface roughness (Ra) was 1.0 μm, annealing was performed in the same manner as in Example 6, and rewinding work was performed in the same manner. As a result, as in the case of Example 6, the rewinding work could be satisfactorily performed.

【0029】実施例13 実施例10で用いた方法であるサンドブラスト法を適用
して粗化銅箔を作成するのに代えて、エンボス加工法
(エンボス柄は絹目格子柄)を適用して粗化銅箔を作成
した他は、実施例10と同様にして焼鈍を行い、同様に
して巻き替え作業を行った。その結果、実施例10の場
合と同様に、良好に巻き替え作業を行うことができた。
Example 13 Instead of producing the roughened copper foil by applying the sand blast method which is the method used in Example 10, an embossing method (embossed pattern is a silk lattice pattern) is applied and roughened. Annealing was performed in the same manner as in Example 10 except that the copper foil was prepared, and rewinding work was performed in the same manner. As a result, as in the case of Example 10, the rewinding work could be favorably performed.

【0030】実施例14 実施例11で用いた方法であるサンドブラスト法を適用
して粗化銅箔を作成するのに代えて、エンボス加工法
(エンボス柄は絹目格子柄)を適用して粗化銅箔を作成
した他は、実施例11と同様にして焼鈍を行い、同様に
して巻き替え作業を行った。その結果、実施例11の場
合と同様に、良好に巻き替え作業を行うことができた。
Example 14 Instead of producing a roughened copper foil by applying the sand blasting method which is the method used in Example 11, an embossing method (embossed pattern is a silk lattice pattern) is applied and roughened. Annealing was performed in the same manner as in Example 11 except that the copper foil was prepared, and rewinding work was performed in the same manner. As a result, as in the case of Example 11, the rewinding work could be satisfactorily performed.

【0031】実施例15 実施例12で用いた方法であるサンドブラスト法を適用
して粗化銅箔を作成するのに代えて、エンボス加工法
(エンボス柄は絹目格子柄)を適用して粗化銅箔を作成
した他は、実施例12と同様にして焼鈍を行い、同様に
して巻き替え作業を行った。その結果、実施例12の場
合と同様に、良好に巻き替え作業を行うことができた。
Example 15 Instead of producing the roughened copper foil by applying the sand blast method which is the method used in Example 12, an embossing method (embossed pattern is a silk lattice pattern) is applied and roughened. Annealing was performed in the same manner as in Example 12 except that the copper foil was prepared, and rewinding work was performed in the same manner. As a result, as in the case of Example 12, the rewinding work could be favorably performed.

【0032】比較例1 電解銅箔を使用しない他は、実施例1と同様の方法で焼
鈍を行った。但し、コイルの温度を320℃まで昇温す
るのには、約5時間必要であった。また、焼鈍後にコイ
ルを常温まで冷却するのには、約10時間必要であっ
た。そして、実施例1と同様にして巻き替え作業を行っ
たところ、圧延銅箔a間が接着しており、剥がれにく
く、巻き替え作業がスムースに行えなかった。また、巻
き替え作業ができても、圧延銅箔a間が剥がれる際に、
圧延銅箔a表面に多数のシワが入り、使用可能な圧延銅
箔aを得ることはできなかった。
Comparative Example 1 Annealing was performed in the same manner as in Example 1 except that the electrolytic copper foil was not used. However, it took about 5 hours to raise the temperature of the coil to 320 ° C. Also, it took about 10 hours to cool the coil to room temperature after annealing. Then, when the rewinding operation was performed in the same manner as in Example 1, the rolled copper foils a were adhered to each other and were not easily peeled off, and the rewinding operation could not be smoothly performed. Further, even if the rewinding work can be performed, when the rolled copper foil a is peeled off,
Many wrinkles were formed on the surface of the rolled copper foil a, and it was not possible to obtain a usable rolled copper foil a.

【0033】比較例2 電解銅箔を使用しない他は、実施例2と同様の方法で焼
鈍を行った。この際、昇温時間や冷却時間は、比較例1
の場合と同様であった。そして、実施例1と同様にして
巻き替え作業を行ったところ、圧延銅箔b間が接着して
おり、剥がれにくく、巻き替え作業がスムースに行えな
かった。また、巻き替え作業ができても、圧延銅箔b間
が剥がれる際に、圧延銅箔b表面に多数のシワが入り、
使用可能な圧延銅箔bを得ることはできなかった。
Comparative Example 2 Annealing was performed in the same manner as in Example 2 except that the electrolytic copper foil was not used. At this time, the temperature rising time and the cooling time were the same as those in Comparative Example 1.
It was similar to the case of. Then, when the rewinding operation was performed in the same manner as in Example 1, the rolled copper foils b were adhered to each other and were not easily peeled off, and the rewinding operation could not be smoothly performed. Further, even if the rewinding work can be performed, when the rolled copper foils b are separated from each other, many wrinkles are formed on the surface of the rolled copper foil b,
It was not possible to obtain usable rolled copper foil b.

【0034】比較例3 電解銅箔を使用しない他は、実施例3と同様の方法で焼
鈍を行った。この際、昇温時間や冷却時間は、比較例1
の場合と同様であった。そして、実施例1と同様にして
巻き替え作業を行ったところ、圧延銅箔c間が接着して
おり、剥がれにくく、巻き替え作業がスムースに行えな
かった。また、巻き替え作業ができても、圧延銅箔c間
が剥がれる際に、圧延銅箔c表面に多数のシワが入り、
使用可能な圧延銅箔cを得ることはできなかった。
Comparative Example 3 Annealing was performed in the same manner as in Example 3 except that the electrolytic copper foil was not used. At this time, the temperature rising time and the cooling time were the same as those in Comparative Example 1.
It was similar to the case of. Then, when a rewinding operation was performed in the same manner as in Example 1, the rolled copper foils c were adhered to each other and were not easily peeled off, and the rewinding operation could not be smoothly performed. Even if the rewinding work can be performed, when the rolled copper foils c are peeled off, many wrinkles are formed on the surface of the rolled copper foil c,
It was not possible to obtain a usable rolled copper foil c.

【0035】以上の実施例1〜15及び比較例1〜3を
比較すれば明らかなように、重合した圧延銅箔間に電解
銅箔や粗化銅箔を挿入して焼鈍すると、圧延銅箔間に接
着が生じにくく、良好に巻き替え作業ができ、更に巻き
替えた圧延銅箔にシワ等の表面欠陥が生じにくいことが
分かる。これに対して、重合した圧延銅箔間に電解銅箔
や粗化銅箔を挿入しないで焼鈍を行うと、圧延銅箔間が
接着し、巻き替え作業ができにくくなったり、或いは巻
き替えた圧延銅箔にシワ等の表面欠陥が生じやすいこと
が分かる。
As is clear from a comparison of Examples 1 to 15 and Comparative Examples 1 to 3 above, when electrolytic copper foil or roughened copper foil is inserted between polymerized rolled copper foils and annealed, rolled copper foils are obtained. It can be seen that the adhesion is unlikely to occur between them, the rewinding work can be favorably performed, and that the rolled copper foil rewound is less likely to have surface defects such as wrinkles. On the other hand, when annealing is performed without inserting an electrolytic copper foil or a roughened copper foil between the polymerized rolled copper foils, the rolled copper foils are bonded to each other, which makes it difficult to perform rewinding work or rewinding. It can be seen that surface defects such as wrinkles easily occur on the rolled copper foil.

【0036】[0036]

【作用】本発明に係る焼鈍方法は、重合した圧延銅箔間
に、電解銅箔又は両面の表面粗度(Ra)が0.5〜
1.5μmである粗化銅箔を挿入して焼鈍するというも
のである。従って、圧延銅箔の鏡面同士が接触すること
を防止できるので、各鏡面を構成している各銅元素間の
距離が近接せず、各銅箔中の電化が重合面を超えて相互
に他の圧延銅箔中に通い合うのを防止できる。なお、電
解銅箔や粗化銅箔の凸部分を構成している銅元素と圧延
銅箔の鏡面を構成している銅元素とは、近接している
が、それは電解銅箔や粗化銅箔の凸部分に対応する箇所
だけであって、圧延銅箔の全面に働くものではない。従
って、圧延銅箔と電解銅箔や粗化銅箔とは、全面に亙っ
て各銅箔中の電子が通い合わず、部分的に各銅箔中の電
子が通い合うだけであるから、容易に剥離しやすく、ま
た剥離する際にシワ等の欠陥が生じにくいのである。
In the annealing method according to the present invention, the surface roughness (Ra) of the electrolytic copper foil or both surfaces is 0.5 to 0.5 between the polymerized rolled copper foils.
A roughened copper foil having a thickness of 1.5 μm is inserted and annealed. Therefore, since it is possible to prevent the mirror surfaces of the rolled copper foil from coming into contact with each other, the distance between the respective copper elements forming the respective mirror surfaces does not approach, and the electrification in each copper foil exceeds the polymerization surface and is mutually different. It is possible to prevent them from communicating with each other in the rolled copper foil. The copper element forming the convex portion of the electrolytic copper foil or the roughened copper foil and the copper element forming the mirror surface of the rolled copper foil are close to each other, but it is the electrolytic copper foil or the roughened copper foil. Only the portion corresponding to the convex portion of the foil does not work on the entire surface of the rolled copper foil. Therefore, the rolled copper foil and the electrolytic copper foil or roughened copper foil, the electrons in each copper foil do not pass through the entire surface, only the electrons in each copper foil partially pass through, It is easily peeled off, and defects such as wrinkles are less likely to occur during peeling.

【0037】[0037]

【発明の効果】以上説明したところから明らかなよう
に、本発明に係る方法を採用すれば、圧延銅箔間におい
て各銅箔中の電子が通い合うのを防止でき、重合して圧
延銅箔を焼鈍しても、圧延銅箔同士が接着するのを防止
することができる。また、圧延銅箔と電解銅箔又は粗化
銅箔間においては、全面的に各銅箔中の電子が通い合う
ことはなく、圧延銅箔と電解銅箔等は容易に剥離するこ
とができ、剥離する際にシワ等の表面欠陥が生じるのを
防止することができる。従って、圧延銅箔を焼鈍した際
の歩留まりが向上し、生産性が高くなるという効果を奏
する。
As is apparent from the above description, by adopting the method according to the present invention, it is possible to prevent electrons in each copper foil from passing through each other between the rolled copper foils, and to polymerize the rolled copper foils. Even if it is annealed, the rolled copper foils can be prevented from adhering to each other. Further, between the rolled copper foil and the electrolytic copper foil or roughened copper foil, the electrons in each copper foil do not pass through the entire surface, and the rolled copper foil and the electrolytic copper foil can be easily peeled off. It is possible to prevent the occurrence of surface defects such as wrinkles when peeling. Therefore, the yield when the rolled copper foil is annealed is improved, and the productivity is increased.

【0038】また、圧延銅箔間に挿入される材質が、圧
延銅箔と同様の銅を素材としているため、その硬度や物
理的性質が近似しているので、圧延銅箔に悪影響を与え
ることが少なく、性能の低下を伴うことなく、圧延銅箔
を焼鈍することができるという効果を奏する。また、圧
延銅箔と挿入される電解銅箔等とは、その硬度が近似し
ているので、電解銅箔等の表面が圧延銅箔によって変形
することも少なく、一旦使用した電解銅箔等であって
も、そのまま再度、圧延銅箔間に挿入して使用すること
ができるという効果をも奏する。
Further, since the material inserted between the rolled copper foils is the same copper as the rolled copper foils, the hardness and the physical properties are similar to each other, so that the rolled copper foils may be adversely affected. And the rolled copper foil can be annealed without deteriorating the performance. Further, since the rolled copper foil and the electrolytic copper foil to be inserted are similar in hardness, the surface of the electrolytic copper foil is less likely to be deformed by the rolled copper foil, and the electrolytic copper foil etc. that has been used once Even if there is, it also has an effect that it can be used again by inserting it between the rolled copper foils.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 圧延銅箔を重合して焼鈍する方法におい
て、該圧延銅箔間に、電解銅箔を挿入しておくことを特
徴とする圧延銅箔の焼鈍方法。
1. A method for annealing rolled copper foils, characterized in that a rolled copper foil is polymerized and annealed, and an electrolytic copper foil is inserted between the rolled copper foils.
【請求項2】 圧延銅箔を重合して焼鈍する方法におい
て、該圧延銅箔間に、両面の表面粗度(Ra)が0.5
〜1.5μmである粗化銅箔を挿入しておくことを特徴
とする圧延銅箔の焼鈍方法。
2. A method of polymerizing rolled copper foils and annealing the rolled copper foils, wherein the surface roughness (Ra) of both surfaces is 0.5 between the rolled copper foils.
A method for annealing a rolled copper foil, characterized in that a roughened copper foil having a thickness of up to 1.5 μm is inserted.
【請求項3】 圧延銅箔をコイル状に巻き取って重合す
る請求項1又は2記載の圧延銅箔の焼鈍方法。
3. The method for annealing a rolled copper foil according to claim 1, wherein the rolled copper foil is wound into a coil and polymerized.
【請求項4】 銅箔に、サンドブラスト法,ブラシ研削
法,化学エッチング法,電解エッチング法,電着粗化法
及びエンボス加工法よりなる群から選ばれた粗化処理法
を施すことによって得られた粗化銅箔を用いる請求項2
記載の圧延銅箔の焼鈍方法。
4. A copper foil is obtained by subjecting a copper foil to a roughening treatment method selected from the group consisting of a sandblasting method, a brush grinding method, a chemical etching method, an electrolytic etching method, an electrodeposition roughening method and an embossing method. A roughened copper foil is used.
A method for annealing a rolled copper foil as described.
JP33025094A 1994-12-05 1994-12-05 Annealing method for rolled copper foil Pending JPH08158027A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33025094A JPH08158027A (en) 1994-12-05 1994-12-05 Annealing method for rolled copper foil

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33025094A JPH08158027A (en) 1994-12-05 1994-12-05 Annealing method for rolled copper foil

Publications (1)

Publication Number Publication Date
JPH08158027A true JPH08158027A (en) 1996-06-18

Family

ID=18230543

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33025094A Pending JPH08158027A (en) 1994-12-05 1994-12-05 Annealing method for rolled copper foil

Country Status (1)

Country Link
JP (1) JPH08158027A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006269706A (en) * 2005-03-24 2006-10-05 Furukawa Circuit Foil Kk Laminate substrate and its manufacturing method
CN1305355C (en) * 1998-11-17 2007-03-14 日矿金属株式会社 Rolled copper foil as base plate for making flexible printed circuit board and its production method
US8187722B2 (en) 2006-05-19 2012-05-29 Mitsui Mining & Smelting Co., Ltd. Copper foil with carrier sheet, method for manufacturing copper foil with carrier sheet, and surface-treated copper foil with carrier sheet
EP3048640A4 (en) * 2013-09-09 2017-07-19 Dowa Metaltech Co., Ltd Electronic-component-equipped substrate and method for producing same

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1305355C (en) * 1998-11-17 2007-03-14 日矿金属株式会社 Rolled copper foil as base plate for making flexible printed circuit board and its production method
JP2006269706A (en) * 2005-03-24 2006-10-05 Furukawa Circuit Foil Kk Laminate substrate and its manufacturing method
JP4593331B2 (en) * 2005-03-24 2010-12-08 古河電気工業株式会社 Multilayer circuit board and manufacturing method thereof
US8187722B2 (en) 2006-05-19 2012-05-29 Mitsui Mining & Smelting Co., Ltd. Copper foil with carrier sheet, method for manufacturing copper foil with carrier sheet, and surface-treated copper foil with carrier sheet
EP3048640A4 (en) * 2013-09-09 2017-07-19 Dowa Metaltech Co., Ltd Electronic-component-equipped substrate and method for producing same
US9831157B2 (en) 2013-09-09 2017-11-28 Dowa Metaltech Co., Ltd. Method of attaching an electronic part to a copper plate having a surface roughness

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