JPS6114234B2 - - Google Patents

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Publication number
JPS6114234B2
JPS6114234B2 JP8548382A JP8548382A JPS6114234B2 JP S6114234 B2 JPS6114234 B2 JP S6114234B2 JP 8548382 A JP8548382 A JP 8548382A JP 8548382 A JP8548382 A JP 8548382A JP S6114234 B2 JPS6114234 B2 JP S6114234B2
Authority
JP
Japan
Prior art keywords
metal
rolling
alloy
plated
metal plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP8548382A
Other languages
Japanese (ja)
Other versions
JPS57203792A (en
Inventor
Akito Okamura
Mitsuzo Motoki
Rensei Futatsuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Shindoh Co Ltd
Original Assignee
Mitsubishi Shindoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Shindoh Co Ltd filed Critical Mitsubishi Shindoh Co Ltd
Priority to JP8548382A priority Critical patent/JPS57203792A/en
Publication of JPS57203792A publication Critical patent/JPS57203792A/en
Publication of JPS6114234B2 publication Critical patent/JPS6114234B2/ja
Granted legal-status Critical Current

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  • Heat Treatment Of Nonferrous Metals Or Alloys (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Preventing Corrosion Or Incrustation Of Metals (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

この発明は、金属メツキ面にフクレの発生が全
くない金属メツキCuおよびCu合金板材および条
材の製造法に関するものである。 従来、一般に、金属メツキCuおよびCu合金板
材および条材(以下これらを総称して金属メツキ
Cu合金板材と略記し、板材について説明する)
は、まず、所定寸法のCuまたはCu合金の鋳塊に
熱間圧延を施して所定板厚の板状素材とし、つい
でこれに面削を施した後、焼鈍―酸洗―圧延を1
サイクルとする工程を、最終板材に要求される硬
さに応じて、1回以上施すことからなる冷間圧延
によつて所定板厚の板材を成形し、引続いて、連
続して、あるいは所定期間経過後に、前記冷間圧
延工程における最終仕上圧延において板材の表面
に付着した油を脱脂し、ついでエツチング処理
し、最終的に金属メツキを施すことによつて製造
されているが、この従来製造法によつて製造され
た金属メツキCu合金板材においては、例えば、
これを半導体素子用リード材として使用するに際
して、半導体組立工程において加熱されると、金
属メツキ面にフクレが多発し、半導体製品の歩留
をきわめて悪化させるなどの問題点があつた。 そこで、本発明者等は、上述のような観点か
ら、金属メツキ面にフクレの発生がない金属メツ
キCu合金板材を得べく研究を行なつた結果、 (a) 焼鈍によつて素材表面に形成された金属酸化
物被膜を除去するために酸洗を施すと、酸洗後
の素材表面には、酸洗液と、金属酸化物および
素材金属との化学的反応によつて化合物(以下
酸洗化合物という)が形成し、このように素材
表面に酸洗化合物が存在した状態で圧延を行な
うと、圧延後の素材表面には油を含んだ酸洗化
合物が強固に付着するようになり、この油を含
んだ酸洗化合物は、金属メツキ処理の前工程と
して施される通常の脱脂処理およびエツチング
処理では完全に除去することができず、この結
果、これら酸洗化合物が素材表面に残留付着し
た状態で金属メツキが施されることになるた
め、金属メツキ面には前記酸洗化合物が原因で
フクレが発生するようになること。 一方、前記油を含んだ酸洗化合物を完全に除
去するために強いエツチング処理を施すことも
考えられるが、このように強いエツチング処理
を施すと、板材の表面が著しく荒れるようにな
り、平滑な金属メツキ面が得られないこと。 (b) しかしながら、焼鈍時に素材表面に形成され
た金属酸化物皮膜を、酸化性の弱い酸性溶液
(例えば希硫酸)を使用する酸洗処理に代つ
て、酸化性のきわめて強い酸性溶液、例えど光
輝処理液(キリンス液)、硝酸液,クロム酸―
硫酸液,あるいは過酸化水素系光輝・スケール
除去液を使用する研磨処理により完全に除去す
る(以下化学研磨処理という)と、この化学研
磨処理によつて素材表面に形成された化合物
(以下化学研磨化合物という)は、圧延後に通
常の金属メツキ処理を行なうに先立つて施され
る通常のエツチング処理によつて容易に、かつ
完全に除去することができるものであり、した
がつて金属メツキ面にはフクレの発生が皆無と
なること。 (c) 上記(a)および(b)項に示されることは、板材に
限らず、断面形状が円形,正方形,長方形,あ
るいは異形の形材,棒材,または線材(これら
総称して条材という)にも同様にあてはまるこ
と。 以上(a)〜(c)項に示される知見を得たのである。 この発明は、上記知見にもとづいてなされたも
のであつて、通常の熱間圧延および冷間圧延によ
つてCuおよびCu合金板材またはCuおよびCu合
金条材(以下これらを総称してCu合金板材とい
う)を成形し、ついでこれに通常の前処理を施し
た後、金属メツキを施すことからなる金属メツキ
Cu合金板材の製造法において、冷間圧延工程に
おける少なくとも最終工程を、焼鈍―化学研磨―
最終仕上圧延からなる工程とすることによつて、
金属メツキCu合金板材における金属メツキ面に
フクレが発生するのを皆無とした点に特徴を有す
るものである。 なお、この発明の方法を実施するに際しては、
最終仕上圧延後のCu合金板材の表面をできるだ
け平滑にするのがよく、平均粗さ:0.1μm以下
にして最大粗さ:1.0μm以下に制御した場合に
最も良好な金属メツキ面が得られるのである。 つぎに、この発明の方法を実施例により具体的
に説明する。 実施例 通常の溶解鋳造法により、それぞれ第1表に示
される材質の溶湯を調製し、厚さ:160mm×幅:
370mm×長さ:1400mmの寸法をもつた鋳塊とした
後、前記鋳塊に熱間圧延を施して板厚:11mmの板
状素材とし、さらにこの板状素材の上下面にスケ
ール除去のための面削を施して板厚:10mmとし、
引続いて前記板状素材に通常の冷間圧延、すなわ
ち圧延―焼鈍―酸洗を繰り返し施して仕上り前圧
延の板厚をそれぞれ第1表に示される板厚とした
後、同じくそれぞれ第1表に示される条件での焼
鈍、前記焼鈍時に生成した金属酸化物皮膜除去の
ための化学研磨処理、および仕上圧延を行なうこ
とによつて本発明Cu合金板材1〜4をそれぞれ
製造した。
The present invention relates to a method for manufacturing metal-plated Cu and Cu alloy plates and strips that do not cause any blistering on the metal-plated surface. Conventionally, metal-plated Cu and Cu alloy plates and strips (hereinafter collectively referred to as metal-plated Cu)
(abbreviated as Cu alloy plate material and explanation of the plate material)
First, a Cu or Cu alloy ingot of a specified size is hot-rolled to form a plate material of a specified thickness, which is then face-milled and then annealed, pickled, and rolled in one step.
A plate material of a predetermined thickness is formed by cold rolling, which is performed one or more times depending on the hardness required for the final plate material, and then, successively, continuously or in a predetermined manner. After a period of time has elapsed, the oil adhering to the surface of the plate material is degreased during the final finish rolling in the cold rolling process, followed by etching treatment, and finally metal plating. For example, in the metal-plated Cu alloy plate material manufactured by the method,
When using this material as a lead material for semiconductor devices, there were problems such as frequent blistering on the metal plating surface when heated during the semiconductor assembly process, which significantly deteriorated the yield of semiconductor products. Therefore, from the above-mentioned viewpoint, the present inventors conducted research to obtain a metal-plated Cu alloy plate material that does not cause blisters on the metal-plated surface. When pickling is performed to remove the metal oxide film, a chemical compound (hereinafter referred to as pickling If rolling is performed with the pickling compound present on the surface of the material, the oil-containing pickling compound will firmly adhere to the surface of the material after rolling. Pickling compounds containing oil cannot be completely removed by the usual degreasing and etching processes that are performed as a pre-process to metal plating, and as a result, these pickling compounds remain attached to the surface of the material. Since metal plating will be applied in this state, blisters will occur on the metal plating surface due to the pickling compound. On the other hand, it may be possible to perform a strong etching treatment to completely remove the oil-containing pickling compound, but if such a strong etching treatment is applied, the surface of the board will become extremely rough, and it will not be smooth. A metal-plated surface cannot be obtained. (b) However, instead of pickling treatment using a weakly oxidizing acidic solution (e.g. diluted sulfuric acid) to remove the metal oxide film formed on the surface of the material during annealing, an extremely strongly oxidizing acidic solution, e.g. Brightening treatment liquid (Kirinsu liquid), nitric acid liquid, chromic acid -
If it is completely removed by a polishing process using a sulfuric acid solution or a hydrogen peroxide brightness/scale removal solution (hereinafter referred to as chemical polishing process), the compounds formed on the surface of the material by this chemical polishing process (hereinafter referred to as chemical polishing process) These compounds (compounds) can be easily and completely removed by a normal etching process that is performed after rolling and prior to normal metal plating. There will be no occurrence of blisters. (c) Paragraphs (a) and (b) above apply not only to plates but also to shapes, bars, or wires with circular, square, rectangular, or irregular cross-sectional shapes (collectively referred to as strips). The same applies to The findings shown in sections (a) to (c) above were obtained. The present invention has been made based on the above knowledge, and it is possible to produce Cu and Cu alloy plate material or Cu and Cu alloy strip material (hereinafter collectively referred to as Cu alloy plate material) by normal hot rolling and cold rolling. metal plating, which consists of molding a molded material (known as ``metal plating''), then subjecting it to normal pretreatment, and then applying metal plating.
In the manufacturing method of Cu alloy plate material, at least the final step in the cold rolling process is annealing, chemical polishing,
By making the process consist of final finish rolling,
The feature is that there is no blistering on the metal-plated surface of the metal-plated Cu alloy plate material. In addition, when carrying out the method of this invention,
It is best to make the surface of the Cu alloy plate as smooth as possible after final finish rolling, and the best metal plating surface can be obtained by controlling the average roughness to 0.1 μm or less and the maximum roughness to 1.0 μm or less. be. Next, the method of the present invention will be specifically explained using examples. Example Molten metals of the materials shown in Table 1 were prepared by the usual melting and casting method, and the thickness: 160 mm x width:
After making an ingot with dimensions of 370 mm x length: 1400 mm, the ingot was hot rolled to form a plate-like material with a thickness of 11 mm, and the top and bottom surfaces of this plate-like material were further coated to remove scale. The thickness of the plate is 10mm by face cutting.
Subsequently, the plate material was repeatedly subjected to normal cold rolling, that is, rolling, annealing, and pickling, so that the thickness of the pre-rolled plate was as shown in Table 1. Cu alloy sheets 1 to 4 of the present invention were manufactured by performing annealing under the conditions shown in (1), chemical polishing treatment for removing the metal oxide film generated during the annealing, and finish rolling.

【表】【table】

【表】 一方、比較の目的で、上記化学研磨処理に代つ
て同じく第1表に示される条件での酸洗を行なう
以外は、上記本発明Cu合金板材1〜4のそれぞ
れの製造条件と同一の条件で比較Cu合金板材1
〜4をそれぞれ製造した。 ついで、この結果得られた本発明Cu合金板材
1〜4および比較Cu合金板材1〜4に対して、
金属メツキ処理の前工程としての脱脂およびエツ
チング処理を行ない、引続いて通常の電気メツキ
条件により、それぞれNiおよびAgの金属メツキ
をいずれも2μmの厚さで施し、ついでこの結果
得られた各種の金属メツキCu合金板材を同じく
第2表に示される条件で加熱し、加熱後の金属メ
ツキ面におけるフクレの発生状況を観察した。 この結果、本発明金属メツキCu合金板材1〜
4にはいずれも全くフクレの発生が見られなかつ
たのに対して、比較金属メツキCu合金板材1〜
4においては、いずれも多数のフクレが発生して
いた。 上述のように、この発明によれば、きわめて簡
単な操作で、しかもコスト安く、金属メツキ面に
フクレの発生がない金属CuおよびCu合金板材お
よび条件を製造することができるなど工業上有用
な効果がもたらされるのである。
[Table] On the other hand, for the purpose of comparison, the manufacturing conditions are the same as each of the above-mentioned Cu alloy sheets 1 to 4 of the present invention, except that pickling is performed under the conditions shown in Table 1 instead of the above-mentioned chemical polishing treatment. Comparison Cu alloy plate material 1 under the conditions of
-4 were produced, respectively. Next, for the resulting Cu alloy plates 1 to 4 of the present invention and comparative Cu alloy plates 1 to 4,
Degreasing and etching are performed as a pre-process for metal plating, followed by Ni and Ag metal plating with a thickness of 2 μm under normal electroplating conditions. A metal-plated Cu alloy plate material was heated under the same conditions shown in Table 2, and the occurrence of blisters on the metal-plated surface after heating was observed. As a result, the metal-plated Cu alloy plate material 1 of the present invention
No blistering was observed in any of the comparative metal-plated Cu alloy sheets 1 to 4.
4, a large number of blisters occurred in all cases. As described above, the present invention has industrially useful effects such as being able to manufacture metal Cu and Cu alloy plates and conditions that do not cause blisters on the metal plating surface with extremely simple operations and at low cost. is brought about.

Claims (1)

【特許請求の範囲】[Claims] 1 CuまたはCu合金の鋳塊に熱間圧延および冷
間圧延を施して板材または条材とし、ついで前記
板材または条材に脱脂処理およびエツチング処理
を施した後、最終的に金属メツキを施すことから
なる基本的工程によつて金属メツキCuおよびCu
合金板材および条材を製造する方法において、前
記冷間圧延工程の少なくとも最終工程における焼
鈍後に、前記焼鈍によつて素材表面に形成された
金属酸化物皮膜を完全に除去するための化学研磨
処理を行ない、引続いて最終仕上圧延を行なうこ
とを特徴とする金属メツキCuおよびCu合金板材
および条材の製造法。
1 Hot-rolling and cold-rolling an ingot of Cu or Cu alloy to form a plate or strip, then degreasing and etching the plate or strip, and finally applying metal plating. Metal plating Cu and Cu
In the method for manufacturing alloy plates and strips, after annealing in at least the final step of the cold rolling step, a chemical polishing treatment is performed to completely remove the metal oxide film formed on the material surface by the annealing. 1. A method for producing metal-plated Cu and Cu alloy plates and strips, which comprises the steps of: rolling, followed by final finish rolling.
JP8548382A 1982-05-20 1982-05-20 Production of metal plated cu, cu alloy plate and rod material Granted JPS57203792A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8548382A JPS57203792A (en) 1982-05-20 1982-05-20 Production of metal plated cu, cu alloy plate and rod material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8548382A JPS57203792A (en) 1982-05-20 1982-05-20 Production of metal plated cu, cu alloy plate and rod material

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP4843479A Division JPS55141591A (en) 1979-04-19 1979-04-19 Manufacture of metal plating cu and cu alloy plate and filament material

Publications (2)

Publication Number Publication Date
JPS57203792A JPS57203792A (en) 1982-12-14
JPS6114234B2 true JPS6114234B2 (en) 1986-04-17

Family

ID=13860155

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8548382A Granted JPS57203792A (en) 1982-05-20 1982-05-20 Production of metal plated cu, cu alloy plate and rod material

Country Status (1)

Country Link
JP (1) JPS57203792A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07116573B2 (en) * 1985-03-05 1995-12-13 古河電気工業株式会社 Manufacturing method of Cu-based strip for lead frame
US4800178A (en) * 1987-09-16 1989-01-24 National Semiconductor Corporation Method of electroplating a copper lead frame with copper

Also Published As

Publication number Publication date
JPS57203792A (en) 1982-12-14

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