JPH0812809B2 - Method of manufacturing voltage non-linear resistor - Google Patents

Method of manufacturing voltage non-linear resistor

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Publication number
JPH0812809B2
JPH0812809B2 JP63286887A JP28688788A JPH0812809B2 JP H0812809 B2 JPH0812809 B2 JP H0812809B2 JP 63286887 A JP63286887 A JP 63286887A JP 28688788 A JP28688788 A JP 28688788A JP H0812809 B2 JPH0812809 B2 JP H0812809B2
Authority
JP
Japan
Prior art keywords
linear resistor
crystal system
voltage
particle size
voltage non
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63286887A
Other languages
Japanese (ja)
Other versions
JPH02133903A (en
Inventor
孝則 曽田
今井  修
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NGK Insulators Ltd
Original Assignee
NGK Insulators Ltd
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Priority to JP63286887A priority Critical patent/JPH0812809B2/en
Publication of JPH02133903A publication Critical patent/JPH02133903A/en
Publication of JPH0812809B2 publication Critical patent/JPH0812809B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は酸化亜鉛を主成分とする電圧非直線抵抗体の
製造法に関するものである。
Description: TECHNICAL FIELD The present invention relates to a method for producing a voltage nonlinear resistor containing zinc oxide as a main component.

(従来の技術) 電圧非直線抵抗体は一般にバリスタと呼ばれ、通常は
絶縁体で、過大な電圧が印加されたときに導体として作
用する特性を備え、電圧安定素子、サージアブソーバ、
アレスタ等に広く利用される。
(Prior Art) A voltage non-linear resistor is generally called a varistor, which is usually an insulator and has a property of acting as a conductor when an excessive voltage is applied, and has a voltage stabilizing element, a surge absorber,
Widely used for arresters, etc.

このような非直線抵抗体として近年開発された酸化亜
鉛バリスタは、例えば、酸化亜鉛を主成分とし、これに
所定量の酸化ビスマス、酸化コバルト、酸化マンガン、
酸化アンチモン、酸化クロム、酸化ニッケル等の添加物
を添加混合し、この混合物を加圧成形した後、焼成し、
得られた焼結体に電極を付設する工程を経て製造され、
その非直線特性は極めて優れたものであった。
A zinc oxide varistor recently developed as such a non-linear resistor has, for example, zinc oxide as a main component, and a predetermined amount of bismuth oxide, cobalt oxide, manganese oxide,
Additives such as antimony oxide, chromium oxide, and nickel oxide are added and mixed, and the mixture is pressure-molded and then fired,
Manufactured through the steps of attaching electrodes to the obtained sintered body,
Its non-linear characteristic was extremely excellent.

(発明が解決しようとする課題) しかしながら、このような従来の非直線抵抗体の製造
法では、抵抗体を量産する場合の原料の結晶系及び粒径
が特定されてなく、種々の状態の原料が使用されてい
た。
(Problems to be Solved by the Invention) However, in such a conventional method of manufacturing a non-linear resistor, the crystal system and particle size of the raw material in mass production of the resistor are not specified, and the raw material in various states is not specified. Was used.

例えば、酸化ニッケルは結晶系が立方晶で平均粒径が
0.4〜2.2μmのものが、二酸化マンガンは結晶系が斜方
晶で平均粒径が1〜25μmのものが用いられていた。
For example, nickel oxide has a cubic crystal system and an average particle size of
Those having a particle size of 0.4 to 2.2 μm and manganese dioxide having an orthorhombic crystal system and an average particle size of 1 to 25 μm were used.

このため、従来の非直線抵抗体の製造法では、非直線
抵抗体を工業的に量産製造すると、非直線特性の低下や
その特性上のバラツキが生じ、特に微少電流領域におけ
る特性のバラツキ及びサージ耐量後の微少電流領域の変
化率のバラツキが大きく、課電寿命特性や微小電流特性
などの品質が安定しないという問題点があった。
Therefore, in the conventional method for manufacturing a non-linear resistor, when the non-linear resistor is industrially mass-produced, a non-linear characteristic is deteriorated or a variation in the characteristic occurs. Especially, variation and surge of the characteristic in a minute current region occur. There is a problem that the variation rate of the minute current region after withstanding is large, and the quality such as the charging life characteristic and the minute current characteristic is not stable.

本発明の目的は、抵抗分電流が1mA以下の微少電流領
域における電圧、電流特性のバラツキを小さくするとと
もに、サージ耐量後の微少電流領域の劣化のバラツキを
小さくすることのできる電圧非直線抵抗体の製造法を得
ることである。
An object of the present invention is a voltage nonlinear resistor capable of reducing the variation in the voltage and current characteristics in the minute current region where the resistance current is 1 mA or less and reducing the deterioration in the minute current region after the surge resistance. Is to obtain a manufacturing method of.

(課題を解決するための手段) この目的を達成するため、本発明の電圧非直線抵抗体
の製造法は、酸化亜鉛を主成分とし、これに少なくとも
酸化ニッケルを含む添加物を添加混合し、この混合物を
成形した後焼成する電圧非直線抵抗体の製造法におい
て、前記混合前の酸化ニッケルの結晶系を六方晶にし、
平均粒径を1.2μm以下にしたことを特徴とするもので
ある。
(Means for Solving the Problem) In order to achieve this object, the method for producing a voltage non-linear resistor of the present invention comprises zinc oxide as a main component, to which an additive containing at least nickel oxide is added and mixed, In the method for manufacturing a voltage nonlinear resistor in which this mixture is molded and fired, the crystal system of the nickel oxide before mixing is made into a hexagonal crystal,
The feature is that the average particle size is 1.2 μm or less.

また、本発明の電圧非直線抵抗体の製造法は、酸化亜鉛
を主成分とし、これに少なくとも二酸化マンガンを含む
添加物を添加混合し、この混合物を成形した後焼成する
電圧非直線抵抗体の製造法において、前記混合前の二酸
化マンガンの結晶系を正方晶にし、平均粒径を12μm以
下にしたことを特徴とするものである。
Further, the method for producing a voltage non-linear resistor according to the present invention comprises zinc oxide as a main component, an additive containing at least manganese dioxide is added to and mixed with the zinc oxide, and the mixture is molded and then fired. In the production method, the crystal system of manganese dioxide before mixing is tetragonal and the average particle size is 12 μm or less.

さらに、本発明の電圧非直線抵抗体の製造法は、酸化亜
鉛を主成分とし、これに少なくとも酸化ニッケル及び二
酸化マンガンを含む添加物を添加混合し、この混合物を
成形した後焼成する電圧非直線抵抗体の製造法におい
て、前記混合前の酸化ニッケルの結晶系を六方晶にし、
平均粒径を1.2μm以下にするとともに、前記混合前の
二酸化マンガンの結晶系を正方晶にし、平均粒径を12μ
m以下にしたことを特徴とするものである。
Further, the method for producing a voltage non-linear resistor of the present invention is a voltage non-linear resistor in which zinc oxide is a main component, an additive containing at least nickel oxide and manganese dioxide is added and mixed, and the mixture is molded and then fired. In the method for manufacturing the resistor, the crystal system of nickel oxide before mixing is hexagonal,
The average particle size is 1.2 μm or less, and the crystal system of manganese dioxide before mixing is tetragonal, and the average particle size is 12 μm.
It is characterized in that it is set to m or less.

(作用) 本発明の電圧非直線抵抗体の製造法では、酸化ニッケ
ル原料の結晶系及び平均粒径を特定することにより、直
流1mAを流した時の両端電圧であるV1mA及び非直線指数
αのロット内のバラツキ及びロット間のバラツキが小さ
くなり、量産における品質が安定し、特にサージ電圧印
加前後のV1mAの変化率のバラツキが小さくできる。
(Operation) In the method for producing a voltage non-linear resistor of the present invention, by specifying the crystal system and the average particle size of the nickel oxide raw material, V 1mA which is the voltage across both ends when a direct current of 1 mA is applied and the non-linear index α Variations within lots and between lots are reduced, quality in mass production is stable, and variations in the rate of change of V 1mA before and after the application of surge voltage can be reduced.

さらに本発明では二酸化マンガン原料の結晶系及び平
均粒径を特定することにより、V1mA変化率のバラツキを
向上させることができるが、この場合特にV1mA及びαの
バラツキを少なくすることができる。
Further, in the present invention, the variation of the V 1mA change rate can be improved by specifying the crystal system and the average particle size of the manganese dioxide raw material, but in this case, the variation of V 1mA and α can be particularly reduced.

(実施例) 次に本発明の電圧非直線抵抗体の製造法の実施例を説
明する。
(Example) Next, the Example of the manufacturing method of the voltage nonlinear resistor of this invention is described.

まず所定の粒度に調整した酸化亜鉛原料と所定の粒度
に調整したBi2O3,Co3O4,MnO2,Sb2O3,Cr2O3,SiO2,N
iO等よりなる添加物の所定量を混合する。この際、本発
明の第1実施例では、混合前のNiOの結晶系を六方晶に
するとともに平均粒径を1.2μm以下にし、本発明の第
2実施例では、混合前のMnO2の結晶系を正方晶にすると
ともに平均粒径を12μm以下にし、本発明の第3実施例
では、混合前のNiOの結晶系を六方晶にし、平均粒径を
1.2μm以下にするとともに、混合前の二酸化マンガン
の結晶系を正方晶にし、平均粒径を12μm以下にする。
First, a zinc oxide raw material adjusted to a predetermined particle size and Bi 2 O 3 , Co 3 O 4 , MnO 2 , Sb 2 O 3 , Cr 2 O 3 , SiO 2 , N adjusted to a predetermined particle size.
A predetermined amount of an additive such as iO is mixed. At this time, in the first embodiment of the present invention, the crystal system of NiO before mixing is hexagonal and the average particle size is 1.2 μm or less. In the second embodiment of the present invention, the crystal of MnO 2 before mixing is made. The system is tetragonal and the average grain size is 12 μm or less. In the third embodiment of the present invention, the NiO crystal system before mixing is hexagonal and the average grain size is
In addition to 1.2 μm or less, the crystal system of manganese dioxide before mixing is tetragonal, and the average particle size is 12 μm or less.

これらの原料粉末に対して所定量のポリビニルアルコ
ール水溶液等を加え、好ましくはディスパーミルにより
混合した後、好ましくはスプレードライヤにより造粒し
て造粒物を得る。造粒後、成形圧力800〜1000kg/cm2
下で所定の形状に成形する。その成形体を昇降温速度50
〜70℃/hrで800〜1000℃で保持時間1〜5時間という条
件で仮焼成する。
A predetermined amount of an aqueous polyvinyl alcohol solution or the like is added to these raw material powders, preferably mixed by a disper mill, and then preferably granulated by a spray dryer to obtain a granulated product. After granulation, it is molded into a predetermined shape under a molding pressure of 800 to 1000 kg / cm 2 . The temperature rise and fall rate of the molded body is 50
Preliminary calcination is performed at a temperature of ~ 70 ° C / hr at 800-1000 ° C and a holding time of 1-5 hours.

なお、仮焼の前に成形体を昇降温速度10〜100℃/hrで
400〜600℃に1〜10時間保持し、結合剤を飛散除去する
ことが好ましい。
Before calcination, the molded body should be heated / cooled at a rate of 10-100 ° C / hr.
It is preferable to keep the binder at 400 to 600 ° C. for 1 to 10 hours to scatter and remove the binder.

次に、仮焼成した仮焼体の側面に高抵抗層を形成す
る。これには、Bi2O3,Sb2O3,SiO2等の所定量に有機結
合剤としてエチルセルロース、ブチルカルビトール、酢
酸nブチル等を加えた側面高抵抗層用混合物ペースト
を、60〜300μmの厚さに仮焼体の側面に塗布する。次
に、これを昇降温速度40〜60℃/hr,1000〜1300℃好まし
くは1100〜1250℃、3〜7時間という条件で本焼成す
る。なお、ガラス粉末に有機結合剤としてエチルセルロ
ース、ブチルカルビトール、酢酸nブチル等を加えたガ
ラスペーストを前記の絶縁被覆層上に100〜300μmの厚
さに塗布し、空気中で昇降温速度100〜200℃/hr,400〜6
00℃保持時間0.5〜2時間という条件で熱処理すること
によりガラス層を形成すると好ましい。
Next, a high resistance layer is formed on the side surface of the calcined calcined body. For this, a mixture paste for side surface high resistance layer, which is obtained by adding ethyl cellulose, butyl carbitol, n-butyl acetate or the like as an organic binder to a predetermined amount of Bi 2 O 3 , Sb 2 O 3 , SiO 2 or the like, is added to 60 to 300 μm. Apply to the side of the calcined body to the thickness of. Next, this is main-baked under the conditions of a temperature raising / lowering rate of 40 to 60 ° C / hr, 1000 to 1300 ° C, preferably 1100 to 1250 ° C for 3 to 7 hours. A glass paste prepared by adding ethyl cellulose, butyl carbitol, n-butyl acetate, etc. as an organic binder to glass powder is applied on the above-mentioned insulating coating layer to a thickness of 100 to 300 µm, and the temperature rising / falling rate is 100 ~ in air. 200 ° C / hr, 400-6
It is preferable to form the glass layer by heat-treating at a temperature of 00 ° C. for 0.5 to 2 hours.

その後、得られた電圧非直線抵抗体の両端面をSiC,Al
2O3,ダイヤモンド等の#400〜2000相当の研磨剤により
水または油を使用して研磨する。次に、研磨面を洗浄
後、研磨した両端面に例えばアルミニウム等によって電
極を例えば溶射により設けて電圧非直線抵抗体を得てい
る。
After that, both end surfaces of the obtained voltage nonlinear resistor are
Polish with water or oil using a # 400-2000 equivalent abrasive such as 2 O 3 or diamond. Next, after cleaning the polished surface, electrodes are provided, for example, by spraying, on the polished both end surfaces by, for example, aluminum or the like to obtain a voltage non-linear resistor.

次に本発明の製造法による電圧非直線抵抗体と本発明
範囲外の製造法による電圧非直線抵抗体との比較実験例
について説明する。
Next, a comparative experiment example of the voltage nonlinear resistor manufactured by the manufacturing method of the present invention and the voltage nonlinear resistor manufactured by the manufacturing method outside the scope of the invention will be described.

実験例1 実験例1においては、添加物に結晶系が単斜晶系のBi
2O3,立方晶系のSb2O3,立方晶系のCo3O4,六方晶系のC
r2O3,非晶質のSiO2,斜方晶系のMnO2,及びNiOとして
比較例の立方晶系のものと、本発明の六方晶系のも
のとを用いて、又結晶粒径は0.3,0.7,1.2,1.5μm、規
定せずの5種類を用意して、直径47mm、高さ22.5mm、V
1mA=200V/mmの抵抗体を製造し、微少電流領域の電圧、
電流特性を調べた。結果を第1表に示す。
Experimental Example 1 In Experimental Example 1, the crystal system of the additive was Bi, which was monoclinic.
2 O 3 , cubic Sb 2 O 3 , cubic Co 3 O 4 , hexagonal C
As r 2 O 3 , amorphous SiO 2 , orthorhombic MnO 2 , and NiO, the cubic system of the comparative example and the hexagonal system of the present invention were used, and the crystal grain size was changed. Is 0.3, 0.7, 1.2, 1.5 μm, 5 types not specified are prepared, diameter 47 mm, height 22.5 mm, V
Manufacture a resistor of 1mA = 200V / mm,
The current characteristics were investigated. The results are shown in Table 1.

第1表の結果からこの第1実施例の製造法では、NiO
原料の結晶系を六方晶系にしたことにより、比較例の立
方晶系のものよりV1mA及び非直線指数αのロット内及び
ロット間の標準偏差が小さくなり、特にサージ印加前後
のV1mAの変化率の標準偏差が小さくなることがわかる。
From the results of Table 1, in the manufacturing method of the first embodiment, NiO
By making the crystal system of the raw material hexagonal, the standard deviation within the lot and between lots of V 1mA and the nonlinear index α becomes smaller than that of the cubic system of the comparative example, and especially the V 1mA before and after the surge application. It can be seen that the standard deviation of the rate of change becomes small.

なお、結晶粒径の比較においては、V1mA及び非直線指
数αの標準偏差は0.3,0.7,1.2μmについては大差ない
が、規定せずの場合は著しく値が高くなることがわか
る。
In the comparison of crystal grain sizes, the standard deviations of V 1mA and the nonlinear index α are not very different at 0.3, 0.7, and 1.2 μm, but it is found that the values become remarkably high when not specified.

また、サージ印加後のV1mAの変化率の標準偏差は、0.
3,0.7,1.2μmの場合は比較的小さい値となっている
が、1.5μmの場合はこれらの倍程度の値となり、規定
せずの場合はさらにその倍ぐらいの値となっていること
がわかる。
The standard deviation of the rate of change of V 1mA after the application of surge is 0.
The values are relatively small in the case of 3,0.7 and 1.2 μm, but they are about twice the value in the case of 1.5 μm, and even more about that value when not specified. Recognize.

実験例2 実験例2においては、添加物に結晶系が単斜晶系のBi
2O3,立方晶系のSb2O3,立方晶系のCo3O4,六方晶系のC
r2O3,非晶質のSiO2,立方晶系のNiO,及びMnO2として比
較例の斜方晶系のものと、本発明の正方晶系のもの
とを用いて、又結晶粒径は3,7,12,15μm、規定せずの
5種類を用意して、直径47mm、高さ22.5mm、V1mA=200V
/mmの抵抗体を製造し、その微少電流領域の電圧、電流
特性を調べた。
Experimental Example 2 In Experimental Example 2, in the additive, the crystal system was monoclinic Bi.
2 O 3 , cubic Sb 2 O 3 , cubic Co 3 O 4 , hexagonal C
Using r 2 O 3 , amorphous SiO 2 , cubic NiO, and MnO 2 of the orthorhombic system of the comparative example and the tetragonal system of the present invention, and the grain size , 3,7,12,15μm, 5 types not specified, diameter 47mm, height 22.5mm, V 1mA = 200V
A / mm resistor was manufactured, and the voltage and current characteristics in the minute current region were investigated.

結果を第2表に示す。 The results are shown in Table 2.

第2表の結果から、この第2実施例の製造法では、Mn
O2原料の結晶系を正方晶系にしたことにより、比較例の
斜方晶系のものよりV1mA変化率の標準偏差が小さくな
り、特にV1mA及びαの標準偏差が小さくなっていること
がわかる。
From the results of Table 2, in the manufacturing method of the second embodiment, Mn
Since the crystal system of the O 2 raw material is a tetragonal system, the standard deviation of the V 1mA change rate is smaller than that of the orthorhombic system of the comparative example, and particularly the standard deviation of V 1mA and α is small. I understand.

なお、結晶粒径の比較においては、V1mA及び非直線指
数αの標準偏差は、3,7,12μmの場合は比較的小さい値
となっているが、15μmの場合はこれらの倍程度の値と
なり、規定せずの場合はさらにその倍ぐらいとなること
がわかる。
In comparing the crystal grain sizes, the standard deviation of V 1mA and the nonlinear index α is a relatively small value in the case of 3,7,12 μm, but is a value about twice that in the case of 15 μm. Therefore, it can be seen that the value will be about twice that if not specified.

また、サージ印加後のV1mAの変化率の標準偏差は、3,
7,12μmの場合は比較的小さい値となっているが15μm,
及び規定せずの場合には、著しく高い値となっているこ
とがわかる。
Also, the standard deviation of the rate of change of V 1mA after applying a surge is 3,
In the case of 7,12 μm, the value is relatively small, but 15 μm,
Also, it can be seen that the values are remarkably high when not specified.

実験例3 実験例3においては、添加物に結晶系が単斜晶系のBi
2O3,立方晶系のSb2O3,立方晶系のCo3O4,六方晶系のC
r2O3,非晶質のSiO2,及びNiOの結晶系に比較例の立
方晶系のものと、本発明の六方晶系のものを、又MnO2
の結晶系に比較例の斜方晶系のものと、本発明の正
方晶系のものとを用いて、NiOの結晶粒径は、0.3,0.7,
1.2,1.5μm、規定せずの5種類を、MnO2の結晶粒径は
3,7,12,15μm、規定せずの5種類を用意して直径47mm,
高さ22.5mm、V1mA=200V/mmの抵抗体を製造し、その微
少電流領域の電圧、電流特性を調べた。結果を第3表に
示す。
Experimental Example 3 In Experimental Example 3, in the additive, the crystal system was monoclinic Bi.
2 O 3 , cubic Sb 2 O 3 , cubic Co 3 O 4 , hexagonal C
As the crystal system of r 2 O 3 , amorphous SiO 2 and NiO, the cubic system of the comparative example, the hexagonal system of the present invention, and the MnO 2
Using the orthorhombic system of Comparative Example and the tetragonal system of the present invention, the crystal grain size of NiO is 0.3, 0.7,
1.2, 1.5 μm, 5 types not specified, the grain size of MnO 2 is
3,7,12,15μm, 5 types not specified, diameter 47mm,
A resistor with a height of 22.5 mm and V 1mA = 200 V / mm was manufactured, and the voltage and current characteristics in the minute current region were investigated. The results are shown in Table 3.

第3表の結果から、この第3実施例の製造法では、Ni
O原料の結晶系を六方晶系にするとともに、MnO2原料の
結晶系を正方晶系にすることにより、比較例のものよ
り、V1mA、非直線指数α及びサージ印加後のV1mAの変化
率のバラツキを更に小さくできることがわかる。
From the results of Table 3, in the manufacturing method of the third embodiment, Ni
By changing the crystal system of the O raw material to the hexagonal system and the crystal system of the MnO 2 raw material to the tetragonal system, the change of V 1mA , the nonlinear index α, and the V 1mA after the surge application from the comparative example It can be seen that the variation in the rate can be further reduced.

なお、結晶粒径の比較においては、前述の第1実施例
及び第2実施例と同様な傾向を示し、NiOの結晶粒径が
1.2μm以下の場合で、MnO2の結晶粒径が12μm以下の
場合がV1mA、非直線指数α、サージ印加後のV1mA変化率
とも標準偏差の値が比較的小さく、特性にバラツキが少
ないことが確認された。
In the comparison of the crystal grain sizes, the same tendency as in the above-mentioned first and second examples was shown, and the crystal grain size of NiO was
When the crystal grain size of MnO 2 is 1.2 μm or less, and when the crystal grain size of MnO 2 is 12 μm or less, the standard deviation values are relatively small for V 1mA , nonlinear index α, and V 1mA change rate after surge application, and there are few variations in characteristics. It was confirmed.

(発明の効果) 以上詳述したように、本発明の電圧非直線抵抗体の製
造法は、酸化ニッケル原料若しくは二酸化マンガン原料
の結晶系及び平均粒径を特定することにより、又これら
両者の結晶系及び平均粒径を特定することにより、直流
1mAを流した時の両端電圧であるV1mA、非直線指数α、
及びサージ印加後のV1mAの変化率のバラツキを小さくす
ることができ、量産における品質を安定させ、安全性及
び耐久性の高い電圧非直線抵抗体を提供することができ
る。
(Effects of the Invention) As described in detail above, the method for producing a voltage non-linear resistor of the present invention is characterized by specifying the crystal system and the average particle size of the nickel oxide raw material or the manganese dioxide raw material, and Direct current by specifying the system and average particle size
V 1mA is a voltage across that which causes 1 mA, nonlinear index alpha,
Further, it is possible to reduce the variation in the rate of change of V 1mA after application of a surge, stabilize the quality in mass production, and provide a voltage non-linear resistor having high safety and durability.

又、課電寿命、雷サージ放電耐量、開閉サージ放電耐
量、制限電圧等の他の特性も向上することが確認され
た。
It was also confirmed that other characteristics such as the life span, the withstand voltage of lightning surge discharge, the withstand voltage of switching surge discharge, and the limiting voltage were improved.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】酸化亜鉛を主成分とし、これに少なくとも
酸化ニッケルを含む添加物を添加混合し、この混合物を
成形した後焼成する電圧非直線抵抗体の製造法におい
て、前記混合前の酸化ニッケルの結晶系を六方晶にし、
平均粒径を1.2μm以下にしたことを特徴とする電圧非
直線抵抗体の製造法。
1. A method for producing a voltage non-linear resistor, which comprises zinc oxide as a main component, an additive containing at least nickel oxide is added to and mixed with the mixture, and the mixture is molded and fired. Hexagonal crystal system,
A method of manufacturing a voltage non-linear resistor characterized in that the average particle size is 1.2 μm or less.
【請求項2】酸化亜鉛を主成分とし、これに少なくとも
二酸化マンガンを含む添加物を添加混合し、この混合物
を成形した後焼成する電圧非直線抵抗体の製造法におい
て、前記混合前の二酸化マンガンの結晶系を正方晶に
し、平均粒径を12μm以下にしたことを特徴とする電圧
非直線抵抗体の製造法。
2. A method for producing a voltage non-linear resistor, which comprises zinc oxide as a main component, and an additive containing at least manganese dioxide, which is added and mixed, and which is molded and fired. Is a tetragonal crystal system and the average grain size is 12 μm or less.
【請求項3】酸化亜鉛を主成分とし、これに少なくとも
酸化ニッケル及び二酸化マンガンを含む添加物を添加混
合し、この混合物を成形した後焼成する電圧非直線抵抗
体の製造法において、前記混合前の酸化ニッケルの結晶
系を六方晶にし、平均粒径を1.2μm以下にするととも
に、前記混合前の二酸化マンガンの結晶系を正方晶に
し、平均粒径を12μm以下にしたことを特徴とする電圧
非直線抵抗体の製造法。
3. A method for producing a voltage non-linear resistor, which comprises zinc oxide as a main component, and an additive containing at least nickel oxide and manganese dioxide, which is added and mixed, and the mixture is molded and fired, before the mixing. The nickel oxide crystal system having a hexagonal crystal structure and an average particle size of 1.2 μm or less, and the manganese dioxide crystal system before mixing having a tetragonal crystal system having an average particle size of 12 μm or less are used. Manufacturing method of non-linear resistor.
JP63286887A 1988-11-15 1988-11-15 Method of manufacturing voltage non-linear resistor Expired - Lifetime JPH0812809B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63286887A JPH0812809B2 (en) 1988-11-15 1988-11-15 Method of manufacturing voltage non-linear resistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63286887A JPH0812809B2 (en) 1988-11-15 1988-11-15 Method of manufacturing voltage non-linear resistor

Publications (2)

Publication Number Publication Date
JPH02133903A JPH02133903A (en) 1990-05-23
JPH0812809B2 true JPH0812809B2 (en) 1996-02-07

Family

ID=17710287

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63286887A Expired - Lifetime JPH0812809B2 (en) 1988-11-15 1988-11-15 Method of manufacturing voltage non-linear resistor

Country Status (1)

Country Link
JP (1) JPH0812809B2 (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58220405A (en) * 1982-06-16 1983-12-22 松下電器産業株式会社 Method of producing voltage nonlinear resistor
JPS58220403A (en) * 1982-06-16 1983-12-22 松下電器産業株式会社 Method of producing voltage nonlinear resistor
JPS59903A (en) * 1982-06-25 1984-01-06 株式会社東芝 Voltage nonlinear resistor

Also Published As

Publication number Publication date
JPH02133903A (en) 1990-05-23

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