JPH08125209A - Photovoltaic device and its manufacture - Google Patents

Photovoltaic device and its manufacture

Info

Publication number
JPH08125209A
JPH08125209A JP6260572A JP26057294A JPH08125209A JP H08125209 A JPH08125209 A JP H08125209A JP 6260572 A JP6260572 A JP 6260572A JP 26057294 A JP26057294 A JP 26057294A JP H08125209 A JPH08125209 A JP H08125209A
Authority
JP
Japan
Prior art keywords
photoelectric conversion
electrode film
electrode
groove
photovoltaic device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6260572A
Other languages
Japanese (ja)
Inventor
Koji Katsube
浩司 勝部
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP6260572A priority Critical patent/JPH08125209A/en
Publication of JPH08125209A publication Critical patent/JPH08125209A/en
Pending legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

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  • Photovoltaic Devices (AREA)

Abstract

PURPOSE: To prevent the deterioration of a phtotvoltaic device by preventing corrosion of an outer element region located outside a photoelectric transducer region. CONSTITUTION: In a photovoltaic device where a plurality of photoelectric conversion element 10a-10c consisting of the lamination body of first electrode films 2a-2c, semiconductor films 8a-8c, and second electrode films 9a-9c are laid out on the insulation surface of a substrate 1 and these elements are electrically and serially connected, the photoelectric transducer 10a-10c are electrically insulated from an element region 14 outside a groove and at the same time a first electrode film 2f and a second electrode film 9f of an element region 14f are electrically short-circuited.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、基板の絶縁表面に、第
1電極膜、半導体膜及び第2電極膜の積層体からなる複
数の光電変換素子を配置し、これら素子を電気的に直列
接続した光起電力装置及びその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention arranges a plurality of photoelectric conversion elements each composed of a laminate of a first electrode film, a semiconductor film and a second electrode film on an insulating surface of a substrate, and electrically connects these elements in series. The present invention relates to a connected photovoltaic device and a manufacturing method thereof.

【0002】[0002]

【従来の技術】基板の絶縁表面に、第1電極膜、半導体
膜及び第2電極膜の積層体からなる複数の光電変換素子
を配置し、これら素子を電気的に直列接続した光起電力
装置において、第1電極膜、半導体膜及び第2電極膜の
分離形成にレーザビームを用いることは、既に公知であ
る。更に、前記光電変換素子の配置方向に沿う前記基板
の端部の内方にエネルギービームを照射して溝を形成し
て、前記光電変換素子を前記溝の外方の素子領域と電気
的に絶縁し、隣り合う光電変換素子の電気的な短絡を防
止することも、米国特許第4,721,629号公報に見
られるように公知である。
2. Description of the Related Art A photovoltaic device in which a plurality of photoelectric conversion elements composed of a laminated body of a first electrode film, a semiconductor film and a second electrode film are arranged on an insulating surface of a substrate and these elements are electrically connected in series. In the above, it is already known to use a laser beam for separating and forming the first electrode film, the semiconductor film and the second electrode film. Further, a groove is formed by irradiating the inside of the end portion of the substrate along the arrangement direction of the photoelectric conversion element with an energy beam to electrically insulate the photoelectric conversion element from the element region outside the groove. However, it is also known to prevent an electrical short circuit between adjacent photoelectric conversion elements as seen in US Pat. No. 4,721,629.

【0003】[0003]

【発明が解決しようとする課題】ところで、前述のよう
に、光電変換素子の配置方向に沿う基板の端部の内方に
エネルギービームを照射して溝を形成し、光電変換素子
を溝の外方の素子領域と電気的に絶縁した場合、外方素
子領域の構造は、光電変換素子と同様に、第1電極膜、
半導体膜及び第2電極膜の積層体からなる。従って、こ
の領域に光を照射すると光起電力が発生する。
By the way, as described above, the energy beam is irradiated to the inside of the end portion of the substrate along the arrangement direction of the photoelectric conversion element to form the groove, and the photoelectric conversion element is placed outside the groove. When electrically insulated from the other element region, the structure of the outer element region is similar to that of the photoelectric conversion element, that is, the first electrode film,
It is composed of a laminated body of a semiconductor film and a second electrode film. Therefore, when light is applied to this area, a photoelectromotive force is generated.

【0004】このような光起電力装置において、電解質
溶液、例えば塩化ナトリウム水溶液に晒した状態の(例
えば、海岸に近い場所に設置した)光起電力装置に光照
射した場合、外方素子領域の金属からなる電極及び半導
体膜が腐食され、その結果、内方の光電変換素子に悪影
響を与え、光起電力装置の機能が著しく低下することが
判明した。
In such a photovoltaic device, when a photovoltaic device exposed to an electrolyte solution, for example, an aqueous sodium chloride solution (for example, installed near a coast) is irradiated with light, the external element region It was found that the electrode and the semiconductor film made of metal are corroded, and as a result, the photoelectric conversion element on the inner side is adversely affected and the function of the photovoltaic device is significantly deteriorated.

【0005】この原因は明らかではないが、外方素子領
域への光照射によって発生した光起電力により、塩化ナ
トリウムの電気分解反応が起こって塩酸及び水酸化ナト
リウムが発生し、これらが金属及び半導体膜を腐食して
いるものと推測される。
Although the cause of this is not clear, the photoelectromotive force generated by the light irradiation to the outer element region causes an electrolysis reaction of sodium chloride to generate hydrochloric acid and sodium hydroxide, which are metal and semiconductor. It is presumed that the film is corroded.

【0006】これを防止するには、光起電力装置が電解
質溶液に晒されないように、光起電力装置を強化ガラス
や保護樹脂フィルム等を用いて完全に防水構造とするこ
とが考えられるが、装置が高価となり、また形状及び重
量も大きくなってしまう。
In order to prevent this, it is conceivable that the photovoltaic device has a completely waterproof structure using tempered glass or a protective resin film so that the photovoltaic device is not exposed to the electrolyte solution. The device becomes expensive, and the shape and weight increase.

【0007】[0007]

【課題を解決するための手段】本発明は、基板の絶縁表
面に、第1電極膜、半導体膜及び第2電極膜の積層体か
らなる複数の光電変換素子を配置し、これら素子を電気
的に直列接続した光起電力装置において、前記光電変換
素子の配置方向に沿う前記基板の端部の内方に設けられ
た溝により、前記光電変換素子を前記溝の外方の素子領
域と電気的に絶縁すると共に、当該外方素子領域の第1
電極膜と第2電極膜とを電気的に短絡したことを特徴と
している。
According to the present invention, a plurality of photoelectric conversion elements composed of a laminate of a first electrode film, a semiconductor film and a second electrode film are arranged on an insulating surface of a substrate, and these elements are electrically connected. In a photovoltaic device connected in series, the photoelectric conversion element is electrically connected to an element region outside the groove by a groove provided inside the end portion of the substrate along the arrangement direction of the photoelectric conversion element. To the first element of the outer element region.
It is characterized in that the electrode film and the second electrode film are electrically short-circuited.

【0008】更に、本発明による光起電力装置の製造方
法は、前記溝の形成及び電気的短絡をエネルギービーム
の照射により行うことを特徴としている。
Further, the method for manufacturing a photovoltaic device according to the present invention is characterized in that the formation of the groove and the electrical short circuit are performed by irradiation with an energy beam.

【0009】[0009]

【作用】本発明によれば、基板の絶縁表面に、第1電極
膜、半導体膜及び第2電極膜の積層体からなる複数の光
電変換素子を配置し、これら素子を電気的に直列接続し
た光起電力装置において、前記光電変換素子の配置方向
に沿う前記基板の端部の内方に設けられた溝によって前
記光電変換素子より分離された外方素子領域の第1電極
膜及び第2電極膜は、電気的に短絡されている。従っ
て、例えこの素子領域に光が照射されても光起電力を出
力することはなく、この外方素子領域が腐食されること
はない。
According to the present invention, a plurality of photoelectric conversion elements each composed of a laminate of the first electrode film, the semiconductor film and the second electrode film are arranged on the insulating surface of the substrate, and these elements are electrically connected in series. In the photovoltaic device, the first electrode film and the second electrode in the outer element region separated from the photoelectric conversion element by a groove provided inside the end of the substrate along the arrangement direction of the photoelectric conversion element. The membrane is electrically shorted. Therefore, even if this element region is irradiated with light, no photovoltaic power is output and the outer element region is not corroded.

【0010】[0010]

【実施例】図1〜図3は本発明の一実施例を示してい
る。ガラス、耐熱性プラスチック等の絶縁表面を有する
長方形の透光性基板1上に、酸化インジウム錫(IT
O)、酸化錫(SnO2)、酸化亜鉛(ZnO)等の透
明導電膜からなる複数の第1電極膜2a〜2cが形成さ
れている。これら第1電極膜2a〜2cは、0.3〜
1.0μmの膜厚で基板1の全面に形成された後、隣接
間隔部にレーザビームを照射することにより、個々の電
極に分割して配置されたものである。
1 to 3 show an embodiment of the present invention. On a rectangular transparent substrate 1 having an insulating surface such as glass or heat resistant plastic, indium tin oxide (IT
O), tin oxide (SnO 2 ), zinc oxide (ZnO), and other first conductive films 2a to 2c are formed. These first electrode films 2a to 2c have a thickness of 0.3 to
After being formed on the entire surface of the substrate 1 with a film thickness of 1.0 μm, a laser beam is radiated to the adjacent gaps to divide the electrodes into individual electrodes.

【0011】更に、前記レーザビームは、第1電極膜2
a〜2cの全周を取り囲むように照射される。従って、
第1電極膜2a〜2cは、その配置方向に沿う基板1の
両端部(即ち、基板1の長手方向の両端部)の内方に設
けられた幅約50μmの第1溝3により、当該第1溝3
の外方の第1電極領域2eと電気的に分離されている。
また、第1電極膜2a、2cは、基板1の短手方向の両
端部の内方に設けられた幅約50μmの第2溝4によ
り、当該第2溝4の外方の第1電極領域2fとも電気的
に分離されている。
Further, the laser beam is applied to the first electrode film 2
Irradiation is performed so as to surround the entire circumference of a to 2c. Therefore,
The first electrode films 2a to 2c are formed by the first groove 3 having a width of about 50 μm provided inside the both end portions of the substrate 1 (that is, both end portions in the longitudinal direction of the substrate 1) along the arrangement direction. 1 groove 3
Is electrically separated from the outer first electrode region 2e.
In addition, the first electrode films 2a and 2c are formed by the second grooves 4 having a width of about 50 μm provided inwardly on both ends in the lateral direction of the substrate 1 so that the first electrode regions outside the second grooves 4 are formed. Both 2f are electrically separated.

【0012】そして、第1溝3及び第2溝4内には、第
1絶縁部材5が充填されている。第1絶縁部材5は、ポ
リイミドまたはフェノール系樹脂からなるバインダーに
二酸化シリコン等の無機材料からなる粒径1.5〜7μ
mのフィラーを混入した絶縁ペーストからなり、スクリ
ーン印刷によりパターニングされた後、250〜300
℃の温度で焼成されて、高さ10〜50μm、幅0.4
〜0.6mmに形成される。
The first groove 3 and the second groove 4 are filled with a first insulating member 5. The first insulating member 5 is made of a binder made of polyimide or phenol resin and has a particle size of 1.5 to 7 μm made of an inorganic material such as silicon dioxide.
m-filler mixed insulating paste, 250-300 after patterning by screen printing
It is fired at a temperature of ℃, height 10 ~ 50μm, width 0.4
It is formed to be about 0.6 mm.

【0013】更に、第1電極膜2a〜2cの一端(図中
の左端)の上面には、左端から順に導電部材6a〜6c
及び絶縁部材7a〜7cが帯状に並列して形成されてい
る。導電部材6a〜6cは、ポリイミドまたはフェノー
ル系樹脂からなるバインダーに、銀、ニッケル、アルミ
ニウム等の導電材料からなる粒径3〜7μmのフィラー
を混入した導電ペーストからなり、スクリーン印刷によ
りパターニングされた後、250〜300℃の温度で焼
成されて高さ10〜50μm、幅0.4〜0.6mmに
形成される。絶縁部材7a〜7cは第1絶縁部材5と全
く同様の絶縁ペーストからなり、その形成方法も同様で
ある。
Further, on the upper surface of one end (the left end in the drawing) of the first electrode films 2a to 2c, the conductive members 6a to 6c are arranged in order from the left end.
And insulating members 7a to 7c are formed in parallel in a strip shape. The conductive members 6a to 6c are made of a conductive paste in which a binder made of a conductive material such as silver, nickel, or aluminum is mixed in a binder made of a polyimide or phenol resin, and the conductive paste is patterned by screen printing. , And is fired at a temperature of 250 to 300 ° C. to form a height of 10 to 50 μm and a width of 0.4 to 0.6 mm. The insulating members 7a to 7c are made of the same insulating paste as the first insulating member 5, and the forming method is also the same.

【0014】第1電極膜2a〜2c上には、夫々半導体
膜8a〜8cが積層形成されている。半導体膜8a〜8
cは、アモルファスシリコン、アモルファスシリコンカ
ーバイド等をpnまたはpinに積層した膜厚0.3〜
1.0μmの半導体光活性層からなる。更に、半導体膜
8a〜8c上には、夫々第2電極膜9a〜9cが積層形
成されている。第2電極膜9a〜9cは、アルミニウ
ム、銀、チタン、ニッケル等の金属を単層構造またはこ
れら金属の積層構造を膜厚0.1〜1.0μmに形成し
てなる。
Semiconductor films 8a to 8c are laminated on the first electrode films 2a to 2c, respectively. Semiconductor films 8a-8
c is a film thickness of 0.3 to 10 in which amorphous silicon, amorphous silicon carbide or the like is laminated in pn or pin.
It consists of a semiconductor photoactive layer of 1.0 μm. Further, second electrode films 9a to 9c are laminated and formed on the semiconductor films 8a to 8c, respectively. The second electrode films 9a to 9c are formed by forming a metal such as aluminum, silver, titanium, nickel or the like in a single layer structure or a laminated structure of these metals in a film thickness of 0.1 to 1.0 μm.

【0015】こうして、第1電極膜2a〜2c、半導体
膜8a〜8c及び第2電極膜9a〜9cの積層体からな
る光電変換素子10a〜10cが基板1上の長手方向に
並設される。
In this way, the photoelectric conversion elements 10a to 10c made of a laminate of the first electrode films 2a to 2c, the semiconductor films 8a to 8c, and the second electrode films 9a to 9c are arranged in parallel on the substrate 1 in the longitudinal direction.

【0016】これら半導体膜8a〜8c及び第2電極膜
9a〜9cは、一旦基板1の全面に形成された後、レー
ザビームの照射により個々に分割される。即ち、基板1
の全面に形成された第2電極膜上より、絶縁部材7a〜
7cに対向する位置にレーザビームを照射して分離溝を
形成し、半導体膜8a〜8c及び第2電極膜9a〜9c
が形成される。
The semiconductor films 8a to 8c and the second electrode films 9a to 9c are once formed on the entire surface of the substrate 1 and then individually divided by laser beam irradiation. That is, the substrate 1
From the second electrode film formed on the entire surface of the insulating member 7a ...
7c is irradiated with a laser beam to form a separation groove, and the semiconductor films 8a to 8c and the second electrode films 9a to 9c are formed.
Is formed.

【0017】また、第2電極膜9a、9b上より導電部
材6b、6cに対向する位置にレーザビームを照射する
ことにより、導電部材6b、6cを介して第2電極膜9
a、9bと第1電極膜2b、2cとを各々電気的に接続
することにより、光電変換素子10a〜10cが電気的
に直列接続される。
Further, by irradiating the laser beam from above the second electrode films 9a and 9b to the positions facing the conductive members 6b and 6c, the second electrode film 9 is interposed through the conductive members 6b and 6c.
The photoelectric conversion elements 10a to 10c are electrically connected in series by electrically connecting a and 9b to the first electrode films 2b and 2c, respectively.

【0018】なお、左端の第1電極膜2aは、第2電極
膜9aと同材料でこれの左側に位置する取出電極11と
導電部材6aを介して電気的に接続されている。
The first electrode film 2a at the left end is electrically connected to the extraction electrode 11 made of the same material as the second electrode film 9a and located on the left side of the second electrode film 9a via the conductive member 6a.

【0019】更に、レーザビームは、第2電極膜9a〜
9cの全周を取り囲むように照射される。従って、半導
体膜8a〜8c及び第2電極膜9a〜9cは、その配置
方向に沿う基板1の両端部(即ち、基板1の長手方向の
両端部)の内方に設けられた幅約50μmの第3溝12
により、当該第3溝12の外方の半導体領域8e、第2
電極領域9eと電気的に分離されている。更に、半導体
膜8a、8c及び第2電極膜9a、9cは、基板1の短
手方向の両端部の内方に設けられた幅約50μmの第4
溝13により、当該第4溝13の外方の半導体領域8
f、第2電極領域9fと電気的に分離されている。
Further, the laser beam is applied to the second electrode film 9a ...
Irradiation is performed so as to surround the entire circumference of 9c. Therefore, the semiconductor films 8a to 8c and the second electrode films 9a to 9c have a width of about 50 μm provided inside both ends of the substrate 1 (that is, both ends in the longitudinal direction of the substrate 1) along the arrangement direction. Third groove 12
Thus, the semiconductor region 8e outside the third groove 12 and the second
It is electrically separated from the electrode region 9e. Further, the semiconductor films 8a and 8c and the second electrode films 9a and 9c are provided on the inner side of both ends in the lateral direction of the substrate 1 and have a width of about 50 μm.
Due to the groove 13, the semiconductor region 8 outside the fourth groove 13 is formed.
f, electrically separated from the second electrode region 9f.

【0020】これらの第1溝〜第4溝3、4、12及び
13を形成することにより、光電変換素子10a〜10
cを取り囲むように、第1電極領域2e、2f、半導体
領域8e、8f及び第2電極領域9e、9fの積層体か
らなる(従って、光電変換領域10a〜10cと同じ積
層体構造からなる)外方素子領域14e、14fが、光
電変換素子10a〜10cと電気的に分離された状態で
形成される。
By forming these first to fourth grooves 3, 4, 12 and 13, photoelectric conversion elements 10a to 10a are formed.
Outside the layered structure of the first electrode regions 2e and 2f, the semiconductor regions 8e and 8f, and the second electrode regions 9e and 9f so as to surround c (thus, it has the same layered structure as the photoelectric conversion regions 10a to 10c). The rectangular element regions 14e and 14f are formed in a state of being electrically separated from the photoelectric conversion elements 10a to 10c.

【0021】また、光電変換素子10a〜10c及び外
方素子領域14e、14fの露出表面は、シリコーン樹
脂、エポキシ樹脂、PETフィルム及びフッ素系樹脂フ
ィルム等の絶縁保護膜15にて被覆されている。
The exposed surfaces of the photoelectric conversion elements 10a to 10c and the outer element regions 14e and 14f are covered with an insulating protective film 15 such as a silicone resin, an epoxy resin, a PET film and a fluorine resin film.

【0022】更に、本発明の特徴として、外方素子領域
14e、14fの第2電極領域9e、9f上よりレーザ
ビームを照射することにより、これら第2電極領域9
e、9fと第1電極領域2e、2fとが夫々電気的に接
続されている。
Further, as a feature of the present invention, by irradiating the second electrode regions 9e and 9f of the outer element regions 14e and 14f with a laser beam, the second electrode regions 9e and 9f are irradiated.
e and 9f are electrically connected to the first electrode regions 2e and 2f, respectively.

【0023】従って、外方素子領域14e、14fに光
が照射されても光起電力を出力することはなく、この外
方素子領域14e、14fの腐食は生じない。更に、本
実施例では、外方素子領域14e、14fは、光電変換
素子10a〜10cの全周を取り囲むように配されてい
るため、外方素子領域14e、14fが光電変換素子1
0a〜10cに対する耐湿防護壁としての役目を果た
す。
Therefore, even if the outer element regions 14e and 14f are irradiated with light, no photoelectromotive force is output, and the outer element regions 14e and 14f are not corroded. Further, in this embodiment, the outer element regions 14e and 14f are arranged so as to surround the entire circumference of the photoelectric conversion elements 10a to 10c, so that the outer element regions 14e and 14f are arranged in the photoelectric conversion element 1.
It serves as a moisture resistant protective wall against 0a to 10c.

【0024】[0024]

【発明の効果】本発明は、基板の絶縁表面に、第1電極
膜、半導体膜及び第2電極膜の積層体からなる複数の光
電変換素子を配置し、これら素子を電気的に直列接続し
た光起電力装置において、前記光電変換素子の配置方向
に沿う前記基板の端部の内方に設けられた溝により、前
記光電変換素子を前記溝の外方の素子領域と電気的に絶
縁すると共に、当該外方素子領域の第1電極膜と第2電
極膜とを電気的に短絡したので、外方素子領域に光が照
射されても光起電力を出力することはなく、この外方素
子領域の腐食は発生しない。その結果、簡単な構成で内
方の光電変換素子の劣化を、引いては光起電力装置の機
能低下を防止することができる。
According to the present invention, a plurality of photoelectric conversion elements each composed of a laminate of a first electrode film, a semiconductor film and a second electrode film are arranged on an insulating surface of a substrate, and these elements are electrically connected in series. In the photovoltaic device, a groove provided inside the end portion of the substrate along the arrangement direction of the photoelectric conversion element electrically insulates the photoelectric conversion element from an element region outside the groove. Since the first electrode film and the second electrode film in the outer element region are electrically short-circuited, even if the outer element region is irradiated with light, no photoelectromotive force is output, and the outer element region is not output. No area corrosion occurs. As a result, it is possible to prevent the deterioration of the inner photoelectric conversion element with a simple structure, and thus prevent the deterioration of the function of the photovoltaic device.

【0025】更に、本発明による光起電力装置の製造方
法は、前記溝の形成及び外方素子領域における第1電極
膜と第2電極膜の電気的短絡を、エネルギービームの照
射により行うので、繁雑な工程を要することなく、外方
素子領域の腐食に伴う光起電力装置の機能低下を防止す
ることができる。
Further, in the method for manufacturing a photovoltaic device according to the present invention, the formation of the groove and the electrical short circuit between the first electrode film and the second electrode film in the outer element region are performed by irradiation with an energy beam. It is possible to prevent functional deterioration of the photovoltaic device due to corrosion of the outer element region without requiring complicated steps.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示す平面図である。FIG. 1 is a plan view showing an embodiment of the present invention.

【図2】本発明の一実施例を示す図1のA−A線断面図
である。
FIG. 2 is a sectional view taken along line AA of FIG. 1 showing an embodiment of the present invention.

【図3】本発明の一実施例を示す図1のB−B線断面図
である。
FIG. 3 is a sectional view taken along line BB in FIG. 1 showing an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 基板 2a〜2c 第1電極膜 2e、2f 第1電極領域 3 第1溝 4 第2溝 8a〜8c 半導体膜 8e、8f 半導体領域 9a〜9c 第1電極膜 9e、9f 第1電極領域 10a〜10c 光電変換素子 12 第3溝 13 第4溝 14e、14f 外方素子領域 1 Substrate 2a-2c First electrode film 2e, 2f First electrode region 3 First groove 4 Second groove 8a-8c Semiconductor film 8e, 8f Semiconductor region 9a-9c First electrode film 9e, 9f First electrode region 10a- 10c Photoelectric conversion element 12 Third groove 13 Fourth groove 14e, 14f Outer element region

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 基板の絶縁表面に、第1電極膜、半導体
膜及び第2電極膜の積層体からなる複数の光電変換素子
を配置し、これら素子を電気的に直列接続した光起電力
装置において、前記光電変換素子の配置方向に沿う前記
基板の端部の内方に設けられた溝により、前記光電変換
素子を前記溝の外方の素子領域と電気的に絶縁すると共
に、当該外方素子領域の第1電極膜と第2電極膜とを電
気的に短絡したことを特徴とする光起電力装置。
1. A photovoltaic device in which a plurality of photoelectric conversion elements each including a laminated body of a first electrode film, a semiconductor film, and a second electrode film are arranged on an insulating surface of a substrate, and these elements are electrically connected in series. In, while electrically insulating the photoelectric conversion element from the element region outside the groove by the groove provided inside the end portion of the substrate along the arrangement direction of the photoelectric conversion element, A photovoltaic device, wherein the first electrode film and the second electrode film in the element region are electrically short-circuited.
【請求項2】 基板の絶縁表面に、第1電極膜、半導体
膜及び第2電極膜の積層体からなる複数の光電変換素子
を配置し、これら素子を電気的に直列接続した光起電力
装置の製造方法において、前記光電変換素子の配置方向
に沿う前記基板の端部の内方にエネルギービームを照射
して溝を形成し、前記光電変換素子を前記溝の外方の素
子領域と電気的に絶縁すると共に、エネルギービームの
照射により、当該外方素子領域の第1電極膜と第2電極
膜とを電気的に短絡したことを特徴とする光起電力装置
の製造方法。
2. A photovoltaic device in which a plurality of photoelectric conversion elements each including a laminated body of a first electrode film, a semiconductor film, and a second electrode film are arranged on an insulating surface of a substrate, and these elements are electrically connected in series. In the manufacturing method of, a groove is formed by irradiating an energy beam inward of an end portion of the substrate along the arrangement direction of the photoelectric conversion element, and the photoelectric conversion element is electrically connected to an element region outside the groove. A method for manufacturing a photovoltaic device, characterized in that the first electrode film and the second electrode film in the outer element region are electrically short-circuited while being insulated from each other by irradiation with an energy beam.
JP6260572A 1994-10-25 1994-10-25 Photovoltaic device and its manufacture Pending JPH08125209A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6260572A JPH08125209A (en) 1994-10-25 1994-10-25 Photovoltaic device and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6260572A JPH08125209A (en) 1994-10-25 1994-10-25 Photovoltaic device and its manufacture

Publications (1)

Publication Number Publication Date
JPH08125209A true JPH08125209A (en) 1996-05-17

Family

ID=17349820

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6260572A Pending JPH08125209A (en) 1994-10-25 1994-10-25 Photovoltaic device and its manufacture

Country Status (1)

Country Link
JP (1) JPH08125209A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001267604A (en) * 2000-03-21 2001-09-28 Citizen Watch Co Ltd Electronic device with solar battery, and solar battery module
JP2006253417A (en) * 2005-03-10 2006-09-21 Mitsubishi Heavy Ind Ltd Solar cell panel and manufacturing method
JP2007165531A (en) * 2005-12-13 2007-06-28 Mitsubishi Heavy Ind Ltd Solar cell and manufacturing method thereof
WO2008029476A1 (en) * 2006-09-08 2008-03-13 Mitsubishi Heavy Industries, Ltd. Solar battery panel and method for manufacturing solar battery panel

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001267604A (en) * 2000-03-21 2001-09-28 Citizen Watch Co Ltd Electronic device with solar battery, and solar battery module
JP2006253417A (en) * 2005-03-10 2006-09-21 Mitsubishi Heavy Ind Ltd Solar cell panel and manufacturing method
JP2007165531A (en) * 2005-12-13 2007-06-28 Mitsubishi Heavy Ind Ltd Solar cell and manufacturing method thereof
WO2008029476A1 (en) * 2006-09-08 2008-03-13 Mitsubishi Heavy Industries, Ltd. Solar battery panel and method for manufacturing solar battery panel

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