JPH08103648A - Packed tower type gas-liquid contact device - Google Patents
Packed tower type gas-liquid contact deviceInfo
- Publication number
- JPH08103648A JPH08103648A JP6259685A JP25968594A JPH08103648A JP H08103648 A JPH08103648 A JP H08103648A JP 6259685 A JP6259685 A JP 6259685A JP 25968594 A JP25968594 A JP 25968594A JP H08103648 A JPH08103648 A JP H08103648A
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- treated
- gas
- packed
- tower
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明は、純水や、超純水を製
造する際に、水中の溶存酸素を窒素ガスなどの脱気用ガ
スで放散、除去する脱気塔や、ガス中のアンモニアを水
中に吸収、除去する吸収塔に使用できる充填塔式気液接
触装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a degassing tower for releasing and dissolving dissolved oxygen in water with a degassing gas such as nitrogen gas when producing pure water or ultrapure water, and a degassing tower The present invention relates to a packed-column gas-liquid contactor that can be used in an absorption tower that absorbs and removes ammonia in water.
【0002】[0002]
【従来の技術】図3に示す脱気塔を例にとって説明する
と、処理塔1内に、ダウンカマー3、ガスライザ4を取
付けた支持板2を上下方向に複数段固定し、各支持板上
にラシヒリングによる充填層5を設け、給水管6、散水
装置7で最上段の充填層上に被処理液を散水して被処理
液を各段の支持板のダウンカマーを通じ下向流させると
共に、最下段の充填層の支持板の下方に送気管8で窒素
ガスなどの脱気用ガスを供給し、各段の支持板のガスラ
イザを通じ脱気用ガスを上向流させ、各段の充填層中で
被処理液と脱気用ガスを向流接触させて被処理液中の溶
存酸素を脱気用ガスで放散除去する脱気塔は従来から公
知であり、塔内上部に上昇したガスは塔頂の排気口9か
ら外に放出し、脱気処理水は塔下部の水槽10に集め、
ポンプP、送水管11で送水する。2. Description of the Related Art A degassing tower shown in FIG. 3 will be explained as an example. A support plate 2 having a downcomer 3 and a gas riser 4 mounted therein is fixed in a vertical direction in a plurality of stages in a processing tower 1, and each support plate is mounted on each support plate. The Raschig ring filling layer 5 is provided, and the liquid to be treated is sprinkled on the uppermost filling layer by the water supply pipe 6 and the water sprinkling device 7 so that the liquid to be treated flows downward through the downcomers of the supporting plates at each stage. A degassing gas such as nitrogen gas is supplied to the lower side of the supporting plate of the lower packed bed through an air supply pipe 8, and the degassing gas is caused to flow upward through a gas riser of the supporting plate of each stage, so that the degassing gas in each packed bed A degassing tower is conventionally known in which the solution to be treated and the degassing gas are countercurrently contacted with each other to dissipate and remove the dissolved oxygen in the solution to be treated by the degassing gas. It is discharged from the top exhaust port 9 and the degassed water is collected in a water tank 10 at the bottom of the tower,
Water is supplied by the pump P and the water supply pipe 11.
【0003】脱気運転中、上の段の充填層から下の段の
充填層に被処理液を均一に流下させ、充填層中を被処理
液が偏流するのを防止するため、図4に示すように各段
の支持板に取付けた上端に斜めの開口を有するダウンカ
マーの液流入口3´は支持板の上面から一定量の高さを
とって上に位置させてある。従って、支持板上に被処理
液が溜り、その水位hがダウンカマーの上端の液流入口
の位置よりも上がろうとすると、溜った被処理液は全部
のダウンカマーの液流入口に溢入し、その内部を通って
一斉に下の段の充填層に流れ落ちる。During the deaeration operation, the liquid to be treated is allowed to flow down uniformly from the packed layer in the upper stage to the packed layer in the lower stage, and in order to prevent the liquid to be treated from flowing unevenly in the packed layer, as shown in FIG. As shown, the liquid inlet 3'of the downcomer having an oblique opening at the upper end attached to the support plate of each stage is located above a certain height from the upper surface of the support plate. Therefore, when the liquid to be treated accumulates on the support plate and the water level h tries to rise above the position of the liquid inlet at the upper end of the downcomer, the accumulated liquid to be treated overflows into the liquid inlets of all downcomers. Then, it flows all at once into the lower packed bed.
【0004】[0004]
【発明が解決しようとする課題】このようにダウンカマ
ーの液流入口3´の位置を支持板の上面よりも高くして
あるので、運転を停止すると各段の支持板上には液流入
口3´の位置よりも水位を下にした被処理液が残溜し、
残溜した被処理液の水質は、塔内雰囲気により悪化す
る。特に、超純水製造用に使用するときには、超純水の
要求水質レベルであるppbのオーダーでは、この水質
の悪化は非常に問題になる。従って、運転を再開した当
初は残溜被処理液が脱気されて塔下部の水槽10に流下
するので、これは捨て、運転を再開して供給した被処理
液が処理水になって水槽に溜るまで処理水の送水を待た
ねばならず、運転再開後の起ち上がりに長い時間(通常
は90分程度)を要し、運転効率が低下する。又、その
間、被処理液、脱気用ガスの供給を行わねばならないの
で、これらが無駄になり、ロスとなる。Since the position of the liquid inlet 3'of the downcomer is set higher than the upper surface of the support plate as described above, when the operation is stopped, the liquid inlet 3'is provided on each of the support plates. The liquid to be treated below the 3'position remains,
The water quality of the remaining liquid to be treated is deteriorated by the atmosphere in the tower. In particular, when used for the production of ultrapure water, this deterioration of water quality becomes a serious problem at the order of ppb, which is the required water quality level of ultrapure water. Therefore, when the operation is restarted, the residual liquid to be treated is degassed and flows down to the water tank 10 at the lower part of the tower. Therefore, this is discarded and the liquid to be treated supplied after restarting the operation becomes treated water and is stored in the water tank. Since it is necessary to wait for the treated water to be fed until it is accumulated, it takes a long time (usually about 90 minutes) to rise after the operation is restarted, and the operation efficiency is reduced. Further, during that time, the liquid to be treated and the gas for deaeration have to be supplied, which is wasted and causes a loss.
【0005】[0005]
【課題を解決するための手段】本発明は、上記問題点を
解消するため、各段の支持板に被処理液の残溜防止用の
小穴を開設したことを特徴とする。In order to solve the above problems, the present invention is characterized in that small holes are formed in the support plates of each stage to prevent the residual liquid to be treated from remaining.
【0006】[0006]
【実施例】図1,2は本発明による各段の支持板で、ダ
ウンカマー3、ガスライザ4を取付けたほか1ケ所、又
は複数個所に被処理液の残溜防止用の小孔12が開設し
てある。小孔12の直径は5〜10mm程度であり、小
孔の開口率はダウンカマーの全開口面積の10%以下、
好ましくは0.1〜5%にする。そして、上の段の支持
板の小孔と、下の段の小孔の位置は喰違わせ、脱気運転
中に上の段の支持板の小孔から流下する被処理液が下の
段の充填層を通り、下の段の支持板の小孔から流下し、
脱気が不充分になる短絡流が起こらないようにする。1 and 2 show a supporting plate of each stage according to the present invention, in which a downcomer 3 and a gas riser 4 are attached and a small hole 12 is formed at one place or a plurality of places for preventing residual liquid to be treated. I am doing it. The diameter of the small holes 12 is about 5 to 10 mm, and the opening ratio of the small holes is 10% or less of the total opening area of the downcomer.
It is preferably 0.1 to 5%. The positions of the small holes of the upper support plate and the small holes of the lower process are confused so that the liquid to be treated flowing down from the small holes of the support plate of the upper process during deaeration is Pass through the packed bed, flow down from the small holes in the lower support plate,
Avoid short circuit flow that results in insufficient degassing.
【0007】このように各段の支持板に小孔12を開設
すると、脱気運転を停止した際、各段の支持板上に溜っ
た被処理液は小孔を通って下の段の充填層に流れ落ち、
最終的には最下段の支持板の小孔から水槽10に落ち、
運転の中断時間の長さにもよるが、例えば24時間脱気
運転し、24時間運転を停め、それから運転を再開する
場合、各段の支持板上には前回運転の際の被処理液は殆
どない。When the small holes 12 are formed in the support plates of the respective stages in this way, when the degassing operation is stopped, the liquid to be treated accumulated on the support plates of the respective stages passes through the small holes to fill the lower stage. Drained into layers,
Eventually, it fell into the water tank 10 through the small holes in the bottom support plate,
Depending on the length of the interruption time of the operation, for example, when degassing operation is performed for 24 hours, operation is stopped for 24 hours, and then operation is restarted, the liquid to be treated in the previous operation is on the support plate of each stage. Almost never.
【0008】従って、運転を再開する際は水槽10に溜
っている前回の被処理液を排出して捨て、脱気塔の内部
が完全に脱気用ガスで満たされるのに必要な約20分間
程度の立ち上がり時間で脱気処理水を得ることができ
る。Therefore, when the operation is restarted, the previous liquid to be treated accumulated in the water tank 10 is discharged and discarded, and it takes about 20 minutes to completely fill the inside of the degassing tower with the degassing gas. Degassed water can be obtained with a rise time of about a certain degree.
【0009】尚、ダウンカマー、ガスライザは図示の構
造のものに限定されない。又、処理塔は脱気塔に限ら
ず、吸収塔でもよい。The downcomer and the gas riser are not limited to those having the illustrated structure. Further, the processing tower is not limited to the degassing tower, and may be an absorption tower.
【0010】[0010]
【発明の効果】以上で明らかなように、本発明によれば
運転再開後の立ち上がり時間が著しく短縮する充填塔式
気液接触装置が得られる。従って、運転効率は高まると
共に、無駄になる被処理液やガスの量も少ない。更に、
支持板に小孔を開設すればよいので、既設の塔を容易に
改造して実施できる。As is apparent from the above, according to the present invention, there can be obtained a packed column gas-liquid contactor in which the rise time after resumption of operation is significantly shortened. Therefore, the operating efficiency is increased, and the amount of liquid or gas to be treated that is wasted is small. Furthermore,
Since it is only necessary to form a small hole in the support plate, the existing tower can be easily modified and implemented.
【図1】この発明の脱気塔の要部の一部を拡大した断面
図である。FIG. 1 is an enlarged cross-sectional view of a part of a main part of a degassing tower of the present invention.
【図2】図1の一半の平面図である。2 is a plan view of a half of FIG. 1. FIG.
【図3】脱気塔の全体の断面図である。FIG. 3 is a sectional view of the entire degassing tower.
【図4】従来の脱気塔の支持板の一部を拡大した断面図
である。FIG. 4 is an enlarged sectional view of a part of a support plate of a conventional degassing tower.
【図5】図4の一半の平面図である。5 is a plan view of a half of FIG. 4. FIG.
1 処理塔 2 支持板 3 ダウンカマー 3´ ダウンカマーの液流入口 4 ガスライザ 5 充填層 6 給水管 7 散水装置 8 送気管 9 排気管 10 水槽 11 送水管 12 小孔 1 treatment tower 2 support plate 3 downcomer 3'downcomer liquid inlet 4 gas riser 5 packed bed 6 water supply pipe 7 water sprinkler 8 air supply pipe 9 exhaust pipe 10 water tank 11 water supply pipe 12 small holes
Claims (1)
持板を上下方向に複数段固定し、各支持板上に充填層を
設け、塔内で被処理液を下向流させると共に、ガスを上
向流させ、被処理液とガスを各段の充填層中で向流接触
させる充填塔式気液接触装置において、支持板に被処理
液の残溜防止用の小穴を開設したことを特徴とする充填
塔式気液接触装置。1. A support plate having downcomers attached thereto is vertically fixed in a plurality of stages in a treatment tower, a packed bed is provided on each support plate, and a liquid to be treated is allowed to flow downward in the tower, and a gas is supplied. In the packed column gas-liquid contactor that causes the liquid to be treated and the gas to flow countercurrently in the packed beds of each stage, a small hole for preventing residual liquid to be treated has been opened in the support plate. Characteristic packed tower gas-liquid contactor.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6259685A JPH08103648A (en) | 1994-09-30 | 1994-09-30 | Packed tower type gas-liquid contact device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6259685A JPH08103648A (en) | 1994-09-30 | 1994-09-30 | Packed tower type gas-liquid contact device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH08103648A true JPH08103648A (en) | 1996-04-23 |
Family
ID=17337499
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6259685A Pending JPH08103648A (en) | 1994-09-30 | 1994-09-30 | Packed tower type gas-liquid contact device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH08103648A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001120982A (en) * | 1999-10-25 | 2001-05-08 | Nittetu Chemical Engineering Ltd | Gas-liquid contact device of column system |
JP2011516107A (en) * | 2008-02-28 | 2011-05-26 | メガイア リミテッド | Apparatus and method for air treatment and cleaning |
-
1994
- 1994-09-30 JP JP6259685A patent/JPH08103648A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001120982A (en) * | 1999-10-25 | 2001-05-08 | Nittetu Chemical Engineering Ltd | Gas-liquid contact device of column system |
JP4615079B2 (en) * | 1999-10-25 | 2011-01-19 | 月島環境エンジニアリング株式会社 | Tower-type gas-liquid contact device |
JP2011516107A (en) * | 2008-02-28 | 2011-05-26 | メガイア リミテッド | Apparatus and method for air treatment and cleaning |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH04190803A (en) | Vacuum degassing method | |
US4954294A (en) | Vapor/liquid contact apparatus | |
JPH08103648A (en) | Packed tower type gas-liquid contact device | |
EP0496295A1 (en) | High-Performance flue-gas desulfurization process and apparatus | |
JPH06254538A (en) | Removing device for dissolving oxygen | |
JP2865452B2 (en) | Removal device for dissolved gas in raw water | |
JP3894788B2 (en) | Wastewater treatment equipment containing hydrogen peroxide | |
CN205570047U (en) | Dynamic wave washing tower with automatic blowdown function | |
JP4514901B2 (en) | Purification method for (meth) acrylic acid, etc. | |
JPH05269306A (en) | Deoxygenation device | |
JP2002320959A (en) | Method for removing dissolved oxygen in water and device therefor | |
JP3444725B2 (en) | Vacuum deaerator | |
JP2001300513A (en) | Method for treating waste water at the time of recovering volatile organic compound | |
JP3009789B2 (en) | Removal of dissolved oxygen in water | |
JP2000300931A (en) | Gas treatment apparatus | |
JP4186551B2 (en) | Sealed hot / cold water circulation equipment | |
JP3643979B2 (en) | Purification equipment for water containing volatile organic compounds | |
JP2000300930A (en) | Gas treatment apparatus | |
JP3992891B2 (en) | Method and equipment for removing dissolved gas in liquid | |
JPH01315301A (en) | Device for removing dissolved gas in pure water | |
JPH10211487A (en) | Activated carbon treatment apparatus | |
JPH05301089A (en) | Degassing device | |
KR101553365B1 (en) | Substrate treating apparatus and chemical recycling method | |
JP2507597Y2 (en) | Dissolved oxygen removal device | |
JP2003080086A (en) | Counter flow regeneration type ion exchanger |