JPH0787115B2 - 高フラックスエネルギ−原子源 - Google Patents
高フラックスエネルギ−原子源Info
- Publication number
- JPH0787115B2 JPH0787115B2 JP62212667A JP21266787A JPH0787115B2 JP H0787115 B2 JPH0787115 B2 JP H0787115B2 JP 62212667 A JP62212667 A JP 62212667A JP 21266787 A JP21266787 A JP 21266787A JP H0787115 B2 JPH0787115 B2 JP H0787115B2
- Authority
- JP
- Japan
- Prior art keywords
- generating
- plasma
- gas
- target
- radiant energy
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000004907 flux Effects 0.000 title claims description 3
- 239000007789 gas Substances 0.000 claims description 58
- 238000000034 method Methods 0.000 claims description 35
- 239000002245 particle Substances 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 9
- 238000012986 modification Methods 0.000 claims description 9
- 230000004048 modification Effects 0.000 claims description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 8
- 239000001301 oxygen Substances 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 239000013077 target material Substances 0.000 claims description 7
- 230000005855 radiation Effects 0.000 claims description 6
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 5
- 238000000576 coating method Methods 0.000 claims description 5
- 238000002347 injection Methods 0.000 claims description 4
- 239000007924 injection Substances 0.000 claims description 4
- 229910001507 metal halide Inorganic materials 0.000 claims description 4
- 150000005309 metal halides Chemical class 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 239000002243 precursor Substances 0.000 claims description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims description 3
- 239000000460 chlorine Substances 0.000 claims description 3
- 229910052801 chlorine Inorganic materials 0.000 claims description 3
- 239000011737 fluorine Substances 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- 229910052761 rare earth metal Inorganic materials 0.000 claims description 3
- 150000002910 rare earth metals Chemical class 0.000 claims description 3
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 2
- 125000002524 organometallic group Chemical group 0.000 claims description 2
- 239000011819 refractory material Substances 0.000 claims description 2
- 238000010304 firing Methods 0.000 claims 1
- 150000004679 hydroxides Chemical class 0.000 claims 1
- 230000003472 neutralizing effect Effects 0.000 claims 1
- 150000003377 silicon compounds Chemical class 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
- 125000004429 atom Chemical group 0.000 description 15
- 238000000354 decomposition reaction Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 239000004698 Polyethylene Substances 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000010494 dissociation reaction Methods 0.000 description 2
- 230000005593 dissociations Effects 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- -1 polyethylene Polymers 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- QHGSGZLLHBKSAH-UHFFFAOYSA-N hydridosilicon Chemical compound [SiH] QHGSGZLLHBKSAH-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000004154 testing of material Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
- H05H1/22—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma for injection heating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H3/00—Production or acceleration of neutral particle beams, e.g. molecular or atomic beams
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Particle Accelerators (AREA)
- Plasma Technology (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/900,616 US4894511A (en) | 1986-08-26 | 1986-08-26 | Source of high flux energetic atoms |
| US900616 | 1986-08-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6372100A JPS6372100A (ja) | 1988-04-01 |
| JPH0787115B2 true JPH0787115B2 (ja) | 1995-09-20 |
Family
ID=25412803
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62212667A Expired - Lifetime JPH0787115B2 (ja) | 1986-08-26 | 1987-08-26 | 高フラックスエネルギ−原子源 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4894511A (enExample) |
| EP (1) | EP0262012B1 (enExample) |
| JP (1) | JPH0787115B2 (enExample) |
| CA (1) | CA1281819C (enExample) |
| DE (1) | DE3767104D1 (enExample) |
| FR (1) | FR2604050A1 (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5059866A (en) * | 1987-10-01 | 1991-10-22 | Apricot S.A. | Method and apparatus for cooling electrons, ions or plasma |
| US4940893A (en) * | 1988-03-18 | 1990-07-10 | Apricot S.A. | Method and apparatus for forming coherent clusters |
| IT1237628B (it) * | 1989-10-03 | 1993-06-12 | Michele Gennaro De | Metodo per misurare l'efficienza di una combustione e apparecchio per attuare il metodo. |
| JP2568006B2 (ja) * | 1990-08-23 | 1996-12-25 | インターナショナル・ビジネス・マシーンズ・コーポレイション | イオン化空気により対象物から電荷を放電させる方法及びそのための装置 |
| GB9119919D0 (en) * | 1991-09-18 | 1991-10-30 | Boc Group Plc | Improved apparatus for the thermic cutting of materials |
| US5883005A (en) * | 1994-03-25 | 1999-03-16 | California Institute Of Technology | Semiconductor etching by hyperthermal neutral beams |
| US5705785A (en) * | 1994-12-30 | 1998-01-06 | Plasma-Laser Technologies Ltd | Combined laser and plasma arc welding torch |
| US5631462A (en) * | 1995-01-17 | 1997-05-20 | Lucent Technologies Inc. | Laser-assisted particle analysis |
| US5821548A (en) * | 1996-12-20 | 1998-10-13 | Technical Visions, Inc. | Beam source for production of radicals and metastables |
| US6454877B1 (en) * | 1998-01-02 | 2002-09-24 | Dana Corporation | Laser phase transformation and ion implantation in metals |
| US6011267A (en) * | 1998-02-27 | 2000-01-04 | Euv Llc | Erosion resistant nozzles for laser plasma extreme ultraviolet (EUV) sources |
| US6911649B2 (en) * | 2002-06-21 | 2005-06-28 | Battelle Memorial Institute | Particle generator |
| JP4660713B2 (ja) * | 2003-07-15 | 2011-03-30 | 財団法人新産業創造研究機構 | 細胞接着材料 |
| US7799273B2 (en) | 2004-05-06 | 2010-09-21 | Smp Logic Systems Llc | Manufacturing execution system for validation, quality and risk assessment and monitoring of pharmaceutical manufacturing processes |
| US7444197B2 (en) | 2004-05-06 | 2008-10-28 | Smp Logic Systems Llc | Methods, systems, and software program for validation and monitoring of pharmaceutical manufacturing processes |
| US7572741B2 (en) * | 2005-09-16 | 2009-08-11 | Cree, Inc. | Methods of fabricating oxide layers on silicon carbide layers utilizing atomic oxygen |
| US7723678B2 (en) * | 2006-04-04 | 2010-05-25 | Agilent Technologies, Inc. | Method and apparatus for surface desorption ionization by charged particles |
| US20080116055A1 (en) * | 2006-11-17 | 2008-05-22 | Lineton Warran B | Laser passivation of metal surfaces |
| JP2008179495A (ja) * | 2007-01-23 | 2008-08-07 | Kansai Electric Power Co Inc:The | オゾン発生方法およびオゾン発生装置 |
| WO2011030326A1 (en) * | 2009-09-11 | 2011-03-17 | Ramot At Tel-Aviv University Ltd. | System and method for generating a beam of particles |
| CN110487708A (zh) * | 2019-08-28 | 2019-11-22 | 哈尔滨工业大学 | 一种远紫外激光诱发原子氧装置及方法 |
Family Cites Families (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2883568A (en) * | 1957-06-25 | 1959-04-21 | Rca Corp | Apparatus for producing thermallycool charged particles |
| US3300000A (en) * | 1965-07-09 | 1967-01-24 | Fairchild Hiller Corp | Control system for infinitely variable transmission |
| US3492074A (en) * | 1967-11-24 | 1970-01-27 | Hewlett Packard Co | Atomic absorption spectroscopy system having sample dissociation energy control |
| FR2102741A5 (enExample) * | 1970-08-19 | 1972-04-07 | Commissariat Energie Atomique | |
| US3723246A (en) * | 1971-05-27 | 1973-03-27 | Atomic Energy Commission | Plasma production apparatus having droplet production means and laserpre-pulse means |
| US3992685A (en) * | 1972-09-05 | 1976-11-16 | Trw Systems & Energy | Chemical laser pump |
| US4514698A (en) * | 1972-09-05 | 1985-04-30 | Trw Inc. | Chemical laser pump including cryogenic and condensing means |
| US3877334A (en) * | 1973-11-23 | 1975-04-15 | Gerber Garment Technology Inc | Method and apparatus for cutting sheet material with a fluid jet |
| US4001136A (en) * | 1974-12-30 | 1977-01-04 | The United States Of America As Represented By The Secretary Of The Air Force | Fluorine generating formulation for use in chemical lasers |
| FR2297665A1 (fr) * | 1975-01-15 | 1976-08-13 | Comp Generale Electricite | Dispositif de separation d'isotopes |
| US4091256A (en) * | 1975-01-16 | 1978-05-23 | The United States Of America As Represented By The Secretary Of The Air Force | Pulsed atomic beam apparatus |
| US4076606A (en) * | 1975-01-29 | 1978-02-28 | Kabushiki Kaisha Pollution Preventing Research Laboratory | Method of decomposing nitrogen oxide (NOx) |
| US4099140A (en) * | 1975-03-14 | 1978-07-04 | Minister Of National Defence | Chemical laser process and apparatus |
| US4036012A (en) * | 1976-02-18 | 1977-07-19 | The United States Of America As Represented By The Secretary Of The Army | Laser powered rocket engine using a gasdynamic window |
| US4119509A (en) * | 1976-06-11 | 1978-10-10 | Massachusetts Institute Of Technology | Method and apparatus for isotope separation from a gas stream |
| US4129772A (en) * | 1976-10-12 | 1978-12-12 | Wisconsin Alumni Research Foundation | Electrode structures for high energy high temperature plasmas |
| US4145668A (en) * | 1977-03-31 | 1979-03-20 | Hughes Aircraft Company | Optical resonance pumped transfer laser with high multiline photon-to-single-line photon conversion efficiency |
| US4102950A (en) * | 1977-08-12 | 1978-07-25 | Rockwell International Corporation | Method for producing singlet molecular oxygen |
| US4182663A (en) * | 1978-03-13 | 1980-01-08 | Vaseen Vesper A | Converting oxygen to ozone by U.V. radiation of a halogen saturated hydrocarbon liquid containing dissolved or absorbed oxygen |
| US4208129A (en) * | 1978-06-30 | 1980-06-17 | The United States Of America As Represented By The Secretary Of The Air Force | Sensitive laser spectroscopy measurement system |
| US4214962A (en) * | 1978-07-21 | 1980-07-29 | Pincon Andrew J | Activated oxygen product and water treatment using same |
| US4331856A (en) * | 1978-10-06 | 1982-05-25 | Wellman Thermal Systems Corporation | Control system and method of controlling ion nitriding apparatus |
| DE2844002A1 (de) * | 1978-10-09 | 1980-05-14 | Leybold Heraeus Gmbh & Co Kg | Verfahren und vorrichtung zur analyse von fluiden |
| US4199419A (en) * | 1978-12-28 | 1980-04-22 | The United State Of America As Represented By The Department Of Energy | Photochemical method for generating superoxide radicals (O2-) in aqueous solutions |
| US4252623A (en) * | 1979-10-03 | 1981-02-24 | Vaseen Vesper A | Ozone production via laser light energy |
| US4360923A (en) * | 1979-12-03 | 1982-11-23 | The Boeing Company | Reagent tailoring for a chemical gas laser to obtain uniform initial chemical reaction rate |
| US4327338A (en) * | 1980-05-09 | 1982-04-27 | The United States Of America As Represented By The Secretary Of The Army | Nuclear activated cw chemical laser |
| US4299860A (en) * | 1980-09-08 | 1981-11-10 | The United States Of America As Represented By The Secretary Of The Navy | Surface hardening by particle injection into laser melted surface |
| US4427636A (en) * | 1980-10-27 | 1984-01-24 | Westvaco Corporation | Method and apparatus for making ozone |
| US4426843A (en) * | 1980-11-12 | 1984-01-24 | United Technologies Corporation | CO2 Coupling material |
| FR2504727A1 (fr) * | 1981-04-28 | 1982-10-29 | Commissariat Energie Atomique | Dispositif de traitement d'un echantillon par faisceau electronique impulsionnel |
| JPS59135730A (ja) * | 1983-01-24 | 1984-08-04 | Hitachi Ltd | 表面改質装置 |
| US4536252A (en) * | 1985-02-07 | 1985-08-20 | The United States Of America As Represented By The Secretary Of The Army | Laser-induced production of nitrosyl fluoride for etching of semiconductor surfaces |
-
1986
- 1986-08-26 US US06/900,616 patent/US4894511A/en not_active Expired - Lifetime
-
1987
- 1987-08-19 CA CA000544897A patent/CA1281819C/en not_active Expired - Lifetime
- 1987-08-26 JP JP62212667A patent/JPH0787115B2/ja not_active Expired - Lifetime
- 1987-08-26 DE DE8787401935T patent/DE3767104D1/de not_active Expired - Lifetime
- 1987-08-26 FR FR8711965A patent/FR2604050A1/fr active Granted
- 1987-08-26 EP EP87401935A patent/EP0262012B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6372100A (ja) | 1988-04-01 |
| EP0262012A1 (en) | 1988-03-30 |
| FR2604050B1 (enExample) | 1993-02-26 |
| CA1281819C (en) | 1991-03-19 |
| DE3767104D1 (de) | 1991-02-07 |
| EP0262012B1 (en) | 1990-12-27 |
| FR2604050A1 (fr) | 1988-03-18 |
| US4894511A (en) | 1990-01-16 |
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