JPH0786073A - Manufacture of soft magnetic alloy film and manufacture of magnetic head - Google Patents

Abstract

PURPOSE:To conduct the massproduction of high permeability soft magnetic alloy films suitable for a multilayered type MIG type magnetic head, with high yield by a sputtering method. CONSTITUTION:Many strip-form insulative substrates 6 are arranged in the width direction on a conductive mounting stand 5 turning to an earth potential electrode. Both of the ends in the length direction are fixed by using conductive pressing segments 7. Conductive diaphragms 9 are interposed in suitable parts of the arrangement of the substrates 6. The diaphragm 9 has almost the same surface height as the substrate 6, and is electrically connected with the mounting stand 5 together with the pressing segment 7. The above structure body is set in the vacuum vessel of a sputtering equipment, so as to face a target composed of soft magnetic alloy. Sputtering material from the target is uniformly stuck on the surface of the substrate 6.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic head used in a magnetic recording device such as a hard disk, and more particularly to a method of manufacturing a soft magnetic alloy film and a method of manufacturing a magnetic head incorporated in a magnetic head of MIG type or laminated type. Is.

[0002]

2. Description of the Related Art In recent years, a high-performance magnetic head has been demanded in order to achieve miniaturization, large capacity and high frequency of a magnetic recording device. Known as a high-performance magnetic head are a metal-in-gap (MIG) type and a laminated type. The former has a configuration in which a soft magnetic alloy film with a high saturation magnetic flux density is provided on the surface of the core made of ferrite or the like on the magnetic gap side, and the latter has a soft magnetic alloy film with a high saturation magnetic flux density on a non-magnetic insulating substrate. It is sandwiched between.

As a substrate on which a soft magnetic alloy film is formed,
In the MIG type magnetic head, a ferromagnetic material such as Mn—Zn type ferrite is used, while in the laminated type magnetic head, iron oxide type, calcium oxide type, magnesium oxide type, nickel oxide type, oxide type. A non-magnetic ceramic material such as silicon or titanium carbide is used. Since both the MIG type substrate and the laminated type substrate have higher electric resistance values than metals, they are referred to as insulating substrates in the present specification.

In the manufacture of a MIG type magnetic head, a winding groove is formed on one side surface of an insulating substrate made of ferromagnetic ferrite or the like, and the surface is polished to a mirror surface. A soft magnetic alloy film is formed on this mirror surface by a sputtering method or the like, and a nonmagnetic film for generating a magnetic gap is provided on the film surface. Obtained 2
A plurality of magnetic cores are obtained by integrally bonding individual cores with a glass material and then cutting the cores into a predetermined unit length.

In the manufacture of a laminated magnetic head, a soft magnetic alloy film is formed on a non-magnetic insulating substrate made of ceramic by a sputtering method or the like so that the soft magnetic alloy film and the substrate are alternately arranged. , A plurality of layers are laminated with an adhesive glass layer between the respective layers. After cutting this laminated body in the width direction to obtain a plurality of blocks, a winding groove is formed on one side surface of each block and a polishing process is performed. After attaching a non-magnetic film for creating a gap to this polished surface, the two blocks are integrally joined with a glass material, and the obtained composite block is placed at a predetermined unit length at both sides centering on the soft magnetic alloy film. Cut into multiple magnetic cores.

When the soft magnetic alloy film is formed by applying the sputtering method, as shown in FIG. 9, a large number of strip-shaped insulating substrates 2, 2, ... Are mounted on a conductive mounting base 1 as shown in FIG. Arranged in the width direction, the both ends in the longitudinal direction of all the insulating substrates 2, 2 ...
The pair of pressing pieces 3 and 3 and the set screws 4 and 4 are fixed to the mounting base 1. The structure thus configured is placed in a vacuum chamber of a sputtering apparatus together with a target made of a soft magnetic alloy, and a predetermined voltage is applied between the mounting table 1 and the target to insulate the insulating substrates 2 and 2. A soft magnetic alloy film is formed on each exposed surface of.

[0007]

The electromagnetic conversion characteristics of the MIG type magnetic head and the laminated type magnetic head are largely dependent on the magnetic permeability of the soft magnetic alloy film incorporated in the magnetic head. If the magnetic permeability of the formed soft magnetic alloy film is low, a highly efficient magnetic head cannot be obtained. In particular, since the magnetic path in the laminated magnetic head is composed of only the soft magnetic alloy film, the quality of the incorporated soft magnetic alloy film greatly affects the electromagnetic conversion characteristics. By the way, taking a floating structure for a hard disk as an example, a magnetic head provided with a soft magnetic alloy film having an initial magnetic permeability of 1500 or more can obtain a head output of 300 μV or more, whereas the initial magnetic permeability is less than 1000. The head output of the magnetic head provided with the soft magnetic alloy film is less than 200 μV.

However, it is not easy to mass-produce a soft magnetic alloy film having a high magnetic permeability by applying the sputtering method. That is, when a large or large number of insulating substrates are mounted on a conductive mounting base at a ground potential, which is placed opposite to the target in the vacuum chamber of the sputtering apparatus, it is difficult to give an electric field with a uniform distribution to them, and it may be possible to vary depending on the region. There was a problem that the magnetic permeability greatly varied.

Therefore, it is an object of the present invention to provide a method of manufacturing a soft magnetic alloy film and a method of manufacturing a magnetic head, which can apply a sputtering method to mass-produce a soft magnetic alloy film having a high magnetic permeability with a high yield.

[0010]

According to the present invention, in order to achieve the above-mentioned object, a large number of insulating substrates formed in strips are provided on a conductive mounting base which serves as a ground potential electrode. Are arranged in the same direction, both ends in the longitudinal direction are fixed by conductive pressing pieces, and conductive partitioning parts and pressing pieces having substantially the same surface height as the insulating substrate are interposed at appropriate positions of the arrangement. The step of obtaining a structure that is electrically connected to the mounting table, and the structure is placed together with the target made of soft magnetic alloy in the vacuum chamber of the sputtering device to perform the sputtering operation, and the sputtering substance from the target is insulated. And a step of depositing the soft magnetic alloy film on the surface of the substrate.

The sputtering apparatus may be a high-frequency sputtering apparatus, and the structure and the target may be arranged to face each other in the vacuum chamber.

Further, the entire exposed surface of the plurality of insulating substrates interposed between the partition parts can be set within an area of 30 mm square.

Further, a large number of strip-shaped insulating substrates are arrayed in the width direction on a conductive mounting table which serves as a ground potential electrode, and both ends in the longitudinal direction are fixed by conductive pressing pieces. And a step of obtaining a structure in which a conductive partition part and a pressing piece having substantially the same surface height as the insulative substrate are electrically connected to the mounting table by interposing the structure at a proper position, and The target is made of a soft magnetic alloy and is placed in the vacuum chamber of the sputtering device to perform the sputtering operation to deposit the sputtered material from the target on the surface of the insulating substrate, and a large number of insulation after the sputtered material is deposited. A stack of flexible substrates with an adhesive layer interposed between them to obtain a laminated body, a step of cutting the laminated body in the width direction to divide it into a number of blocks, and one side surface of the block along the laminating direction. Forming groove for winding And a step of joining the two blocks after the groove formation together through a magnetic gap to obtain a composite block, and cutting the composite block into predetermined unit lengths at positions on both sides centering on the soft magnetic alloy film. And a step of obtaining a large number of magnetic cores.

As the target, an Fe-Al-Si type alloy or a nitriding alloy can be used.

[0015]

When the soft magnetic alloy film is formed on the insulating substrate by the sputtering method, an electric field due to self-bias is applied to the surface of the insulating substrate on the mounting table which is held at the ground potential.

If this electric field acts uniformly on all the insulating substrates on the mounting table, the magnetic characteristics of the obtained soft magnetic alloy film are also made uniform.

The present invention has been made on the basis of the above reasoning, but in the present invention, a pressing piece for fixing a large number of insulating substrates arranged on the mounting table at both ends in the longitudinal direction thereof. Is formed of a conductive material, and is interposed in an array of a large number of insulating substrates to provide a conductive partitioning part having substantially the same surface height as the insulating substrate, and the pressing piece and the partitioning part are grounded. Since it is electrically connected to the mounting table, the following effects can be obtained. That is, even if the total exposed surface area of a large number of insulative substrates arranged on the mounting table is large, it is divided into a plurality of small units by the partition portion, and the pressing pieces are provided at both ends in the longitudinal direction of the insulative substrate. Not only is it fixed, but it also surrounds a small unit of the insulating substrate together with the partition, so that the electric field applied to the surface of the insulating substrate during film formation is made uniform.

Therefore, even if a large number of insulating substrates are mounted on the mounting table, it is possible to form a soft magnetic alloy film that is homogeneous and has a high magnetic permeability for each.

[0019]

An embodiment of the present invention will be described below with reference to the drawings.

FIG. 1 shows an insulative substrate arranged with a target in a vacuum chamber of a high frequency sputtering apparatus and its mounting portion.

25 strip-shaped insulating substrates 6, 6 ... Are arrayed in the width direction on a mounting base 5 made of aluminum, and both ends in the longitudinal direction of all the insulating substrates 6, 6 ... It is fixed to the mounting table 1 by holding pieces 7, 7 and set screws 8, 8.

The insulating substrate 6 is made of a non-magnetic material made of iron oxide type alpha hematite (α-Fe ₂ O ₃ ), and its width, length and thickness are 3 mm, 30 mm and 3 mm, respectively.
In mm, 5 units form one unit group. Aluminum partition 9 between each unit (at 15 mm intervals)
Is intervening. The surface step difference between the insulating substrate 6 and the partition 9 is 0.1 mm or less. That is, each of the four partition portions 9, 9 ... Has a surface height substantially the same as that of the insulating substrate 6. The pair of pressing pieces 7, 7 and the partition parts 9, 9 ... Are electrically connected to the mounting table 5.

The structure constructed as described above is arranged so as to face the target in the vacuum chamber of the high frequency sputtering apparatus. The target used in this example is Fe-Al-Si-Cr.
A circular plate made of an alloy and having a diameter of 203 mm. The mounting table 5 is held at the ground potential together with the pair of pressing pieces 7, 7 and the partition parts 9, 9. It should be noted that copper, non-magnetic stainless steel, or the like can be used as a material for the mounting table 5, the pair of pressing pieces 7, 7, and the partition portions 9, 9.

When a predetermined voltage is applied between the mounting table 5 and the target to operate the high frequency sputtering apparatus, the insulating substrates 6 and 6 are sputtered by the sputtering material from the target.
A soft magnetic alloy film made of an Fe-Al-Si-Cr alloy is formed on each surface of. The obtained film was heat-treated at a temperature of 550 ° C. for 1 hour, and the initial permeability thereof was measured. As a result, a distribution characteristic as shown by a curve A in FIG. 2 was recognized.
That is, all of the 29 insulating substrates 6, 6 ...
It showed a high initial permeability of 00 or more.

The initial permeability distribution characteristic shown by the curve B in FIG.
When the conventional structure shown in FIG. 9 is used, in this case, among the 29 insulating substrates, those having an initial magnetic permeability of 1500 or more are the first to fifth five from one end, and 25 ~ 2
There were only 10 in total, including the 9th and 5th.

When the composition of the soft magnetic alloy film is analyzed, in the conventional structure, the soft magnetic alloy films formed on the insulating substrates (first and 29th) located at both ends are in the center. Fe content is higher than that of the soft magnetic alloy film formed on the insulating substrate (15th) located in the vicinity of
In addition, while the Al content was 0.3 to 1% by weight less, in the case of carrying out the present invention, the film compositions of the central portion and both end portions were almost the same.

In the above-described embodiment, five insulating substrates 6 are used as one unit, and the partition 9 is interposed between each unit. However, 10 insulating substrates 6 are used as one unit, and the partition is provided between each unit. When 9 was interposed, a soft magnetic alloy film showing a high initial magnetic permeability of 1500 or more could be obtained over the entire area. The width and length of the insulating substrate 6 are 3 mm and 30 mm, respectively.
Therefore, if it is configured such that the entire exposed surface of the insulating substrate interposed between the partition portions 9 and 9 fits within an area of 30 mm square, the soft magnetic alloy film having an initial magnetic permeability of 1500 or more at all substrate positions. Can be obtained.

The present invention is particularly effective in the case of applying the high frequency sputtering method in which a target made of an alloy that easily causes self-bias and an insulating substrate are arranged to face each other. Further, Fe-Al-Si whose film composition sensitively affects the magnetic permeability.
An excellent magnetic permeability distribution can be obtained by applying it to the production of a -Cr alloy or a nitride alloy film produced by introducing nitrogen gas into the sputtering gas.

In the structure of the embodiment shown in FIG. 3, a pair of pressing pieces 7, 7 for fixing the longitudinal ends of a large number of insulating substrates 6, 6 arranged in the width direction on the mounting table 5. , And a plurality of partition parts 9, 9 ... Are integrally formed. In this case, if the difference (step) in surface height between the partition 9 and the insulating substrate 6 is about 0.3 mm or less, the same effect as in the above-described embodiment can be obtained.

As shown in FIG. 4, the structure shown in FIGS. 1 and 3 is fixed on the turntable 10 in the vacuum chamber of the sputtering apparatus. The target 11 arranged above the turntable 10 is a disk-shaped target made of Fe-Al-Si-Cr alloy and having a diameter of 203 mm.

As shown in FIG. 5, the insulating substrate 6 which has been subjected to the film forming process using such a sputtering apparatus has a soft magnetic alloy film 1 made of Fe--Al--Si--Cr alloy on its surface, as shown in FIG.
Equipped with 2. In this embodiment, in order to manufacture a laminated type magnetic head, a large number of glass substrates are provided with a high melting point glass layer for adhesion therebetween so that the insulating substrate 6 and the soft magnetic alloy film 12 are alternately arranged. It is stacked in multiple stages to form a laminated body. The insulating substrate 6 in this example has α-Fe ₂ -O
_{Although 3} materials are used, CaO-TiO ₂ and Ni are used.
It may be a material such as O—CoO system.

A plurality of blocks are obtained by cutting the laminate along the broken line indicated by AB in the figure,
As shown in FIG. 6, a winding groove 13 is formed on one side surface of this block along the stacking direction. The surface on which the groove 13 is formed is used as a gap facing surface, a gap generating film made of silicon oxide, low melting point glass or the like is formed thereon, and then the two blocks are integrally joined by a low melting point glass material. Obtain a composite block as shown. Here, 14 is a magnetic gap, and 15 is a low melting glass material.

Next, this composite block is shown by CD in the figure.
Cut along the broken line indicated by and the broken line indicated by EF.
That is, the soft magnetic alloy film 12 is cut at both sides of the center and polished. Through these steps, a laminated magnetic head having two air bearing surfaces 16, 16 as shown in FIG. 8 is completed. In addition, the two air bearing surfaces 16, 16
One of them has a configuration in which the soft magnetic alloy film 12 is exposed.

[0034]

As described above, according to the present invention, when a soft magnetic alloy film is formed on an insulating substrate by applying the sputtering method, even if a large number of insulating substrates are arranged on the mounting table. Further, it becomes possible to form a soft magnetic film which is uniform with respect to these and has a high magnetic permeability with a high yield.

[Brief description of drawings]

FIG. 1 is a perspective view of a structure of a mounting base and mounted members according to an embodiment of the present invention.

FIG. 2 is a characteristic diagram showing a relationship between an insulating substrate on a mounting table and initial permeability of a generated film.

FIG. 3 is a perspective view of a structure of a mounting base and mounted members according to another embodiment of the present invention.

FIG. 4 is a plan view showing a relative relationship between a sputtering apparatus and a structure.

FIG. 5 is a perspective view of a laminated body obtained in the manufacturing process of the laminated magnetic head.

FIG. 6 is a perspective view of a block obtained in a manufacturing process of a laminated magnetic head.

FIG. 7 is a perspective view of a composite block obtained in a manufacturing process of a laminated magnetic head.

FIG. 8 is a perspective view of a laminated magnetic head for a hard disk.

FIG. 9 is a plan view of a structure of a conventional mounting table and mounted members.

[Explanation of symbols]

 5 Mounting Table 6 Insulating Substrate 7 Holding Piece 9 Partition 11 Target 12 Soft Magnetic Alloy Film 13 Winding Groove

Claims (5)

[Claims] 1. A large number of strip-shaped insulating substrates are arranged in the width direction on a conductive mounting table that serves as a ground potential electrode, and both ends in the longitudinal direction are fixed by conductive pressing pieces. And a step of obtaining a structure in which a conductive partition part and a pressing piece having substantially the same surface height as the insulative substrate are electrically connected to the mounting table by interposing the structure at a proper position, and And a target made of a soft magnetic alloy, disposed in a vacuum chamber of a sputtering apparatus to perform a sputtering operation, and depositing a sputtering substance from the target on the surface of an insulating substrate. Method for manufacturing alloy film. 2. The method for producing a soft magnetic alloy film according to claim 1, wherein the sputtering device is a high-frequency sputtering device, and the structure and the target are arranged to face each other in a vacuum chamber of the sputtering device. 3. The method for producing a soft magnetic alloy film according to claim 1, wherein all exposed surfaces of the plurality of insulating substrates interposed between the partition parts are within an area of 30 mm square. 4. A large number of strip-shaped insulating substrates are arrayed in the width direction on a conductive mounting base that serves as a ground potential electrode, and both ends in the longitudinal direction are fixed by conductive pressing pieces. And a step of obtaining a structure in which a conductive partition part and a pressing piece having substantially the same surface height as the insulative substrate are electrically connected to the mounting table by interposing the structure at a proper position, and The target is made of a soft magnetic alloy and is placed in the vacuum chamber of the sputtering device to perform the sputtering operation to deposit the sputtered material from the target on the surface of the insulative substrate. Of the flexible substrates with an adhesive layer interposed between them to obtain a laminated body, cutting the laminated body in the width direction to divide into a plurality of blocks, and one side surface of the block along the laminating direction. Form a winding groove And a step of integrally combining the two blocks after the groove formation via a magnetic gap to obtain a composite block, and cutting the composite block into a predetermined unit length at positions on both sides centering on the soft magnetic alloy film. A step of obtaining a large number of magnetic cores. 5. The method of manufacturing a magnetic head according to claim 4, wherein the target is made of an Fe—Al—Si alloy or a nitriding alloy.