JPH0774229A - Position detection device of semiconductor substrate - Google Patents
Position detection device of semiconductor substrateInfo
- Publication number
- JPH0774229A JPH0774229A JP15556993A JP15556993A JPH0774229A JP H0774229 A JPH0774229 A JP H0774229A JP 15556993 A JP15556993 A JP 15556993A JP 15556993 A JP15556993 A JP 15556993A JP H0774229 A JPH0774229 A JP H0774229A
- Authority
- JP
- Japan
- Prior art keywords
- substrate transfer
- transfer machine
- boat
- cassette
- semiconductor substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体製造装置におけ
る半導体基板位置検知装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor substrate position detecting device in a semiconductor manufacturing apparatus.
【0002】[0002]
【従来の技術】図4(A),(B)は本発明に係る半導
体製造装置における基板移載機周りの構成の1例を示す
平面図及び側面図である。本発明に係る半導体製造装置
には、所要ピッチで設けられた多数の溝にウェーハ9を
多段に保持するボート5と、ウェーハ9を収納したカセ
ットを多段の棚に載置しておくカセット棚3と、このカ
セット棚3とボート5との間でウェーハ9を移載する基
板移載機7が設けられているが、ウェーハ移載を行うに
は基板移載機7のツィーザ7Aがカセット棚3に置かれ
たカセット4内のウェーハ9を中心部で吸着し、180
°回転した場所に置かれたボート5の中心に置くための
基板移載機7のポジション位置設定(コントローラへの
登録)が必要である。2. Description of the Related Art FIGS. 4A and 4B are a plan view and a side view showing an example of a structure around a substrate transfer machine in a semiconductor manufacturing apparatus according to the present invention. The semiconductor manufacturing apparatus according to the present invention includes a boat 5 for holding wafers 9 in multiple stages in a large number of grooves provided at a required pitch, and a cassette shelf 3 for placing cassettes containing the wafers 9 on the multi-stage shelf. A substrate transfer machine 7 for transferring the wafer 9 between the cassette shelf 3 and the boat 5 is provided. To transfer the wafer, the tweezers 7A of the substrate transfer machine 7 are used for the cassette shelf 3 The wafer 9 in the cassette 4 placed on the
It is necessary to set the position of the substrate transfer machine 7 (register it in the controller) so that it is placed at the center of the boat 5 placed in the rotated place.
【0003】従来、基板移載機の位置設定を行うための
ティーチング作業方法としては、まず、カセット棚3か
らボート5へウェーハ9を移すためのティーチング作業
を各カセット棚3ごとに順番を決め行うものとし、最初
のカセット棚3に置かれたカセット4内の任意のウェー
ハ9を人の視覚,感等に頼り、ツィーザ7Aを破線矢印
方向に進行させ、ウェーハ9をツィーザ7Aの中心部で
吸着し、カセット4から引き出して移載機7を180°
回転させ、ウェーハ9をボート5の中心に前記と同様に
人の視覚,感等に頼り、移載する。このボート5,カセ
ット7の位置を基準に残りのカセット棚3のティーチン
グの微調整を行う方法である。Conventionally, as a teaching work method for setting the position of the substrate transfer machine, first, the order of the teaching work for transferring the wafer 9 from the cassette shelf 3 to the boat 5 is determined for each cassette shelf 3. It is assumed that the arbitrary wafer 9 in the cassette 4 placed on the first cassette shelf 3 is moved in the direction of the broken line arrow by advancing the tweezers 7A in the direction of the broken arrow, and the wafer 9 is adsorbed at the center of the tweezers 7A. Then, pull out from the cassette 4 and move the transfer machine 7 180 °
The wafer 9 is rotated and transferred to the center of the boat 5 in the same manner as described above, depending on the human visual sense and feeling. This is a method of finely adjusting the teaching of the remaining cassette shelves 3 based on the positions of the boat 5 and the cassette 7.
【0004】[0004]
【発明が解決しようとする課題】しかしながら上記従来
のティーチング作業におけるウェーハ位置検出は、人の
視覚、感等に頼っており、かつボート5は洗浄等により
研磨されたり、熱膨張等の理由により、次第に機械的精
度が失われて行く可能性があるため、ボート5の脱着作
業の際などにティーチング作業をやり直さなければなら
ないということが生じ、またこの位置合わせ作業の精度
は作業者の熟練度に大きく左右されるという課題がある
と共に、その精度が達成されるまで、多くの試行を伴う
ので作業性が悪く、且つ時間を要するという課題があっ
た。However, the wafer position detection in the above-mentioned conventional teaching work relies on human vision, feeling, etc., and the boat 5 is polished by cleaning or the like, or due to thermal expansion or the like. Since the mechanical accuracy may be gradually lost, the teaching work may have to be redone when the boat 5 is attached or detached, and the accuracy of this alignment work depends on the skill level of the operator. There is a problem that it is greatly affected, and there is a problem that workability is poor and time is required because many trials are required until the accuracy is achieved.
【0005】[0005]
【課題を解決するための手段】本発明は、上記課題を解
決するためになされたもので、基板移載機の位置設定を
行うためのティーチング作業性を改善し、作業効率を挙
げることができる半導体基板位置検知装置を提供しよう
とするものである。即ち、本発明装置は、カセット棚3
のカセット4,ボート5に載置され半導体基板9と同等
形状の板10の中心にピン2を垂設した治具1と、基板
移載機7に設けられ距離計測可能な反射型距離検出セン
サ8とよりなる。The present invention has been made to solve the above-mentioned problems, and improves the teaching workability for setting the position of the substrate transfer machine and can improve the work efficiency. An object of the present invention is to provide a semiconductor substrate position detecting device. That is, the device of the present invention is used in the cassette shelf 3
Jig 1 in which pins 2 are hung vertically from the center of a plate 10 having the same shape as the semiconductor substrate 9 placed on the cassette 4 and the boat 5, and a reflection type distance detection sensor provided on the substrate transfer machine 7 and capable of measuring distance. It consists of eight.
【0006】[0006]
【作用】本発明装置は上記のような構成であるから、基
板移載機7の位置設定を行う場合、治具1をカセット棚
3のカセット4内及びボート5の中心に載るよう保持し
て置く。基板移載機7及びこれに設けられた反射型距離
検出センサ8を上下方向にシフトしスキャンさせ、基板
移載機7に取付けた対象物までの距離を読み取ることが
出来る反射型距離検出センサ8により、治具1の側面を
検知することにより、半導体基板の縦方向位置を読み取
る。次にピン2を検知することが出来るように基板移載
機7を一定量上下方向にシフトし、そこで、基板移載機
7を左右回転方向にスキャンさせる。ピン2のセンター
を反射型距離検出センサ8により検知することにより、
基板移載機7の左右角度方向位置、また、ピン2までの
距離を検出することにより、半導体基板9の送り量を検
知する。この動作をカセット棚3,ボート5の双方で行
うことにより、基板移載機7の位置設定を行うことがで
きる。Since the apparatus of the present invention has the above-described structure, when the position of the substrate transfer machine 7 is set, the jig 1 is held so as to be placed in the cassette 4 of the cassette shelf 3 and in the center of the boat 5. Put. The reflection type distance detection sensor 8 capable of reading the distance to the object mounted on the substrate transfer machine 7 by vertically shifting and scanning the substrate transfer machine 7 and the reflection type distance detection sensor 8 provided therein. The vertical position of the semiconductor substrate is read by detecting the side surface of the jig 1. Next, the substrate transfer device 7 is vertically shifted by a certain amount so that the pin 2 can be detected, and then the substrate transfer device 7 is scanned in the left-right rotation direction. By detecting the center of the pin 2 with the reflection type distance detection sensor 8,
The feed amount of the semiconductor substrate 9 is detected by detecting the position of the substrate transfer machine 7 in the left-right angular direction and the distance to the pin 2. By performing this operation on both the cassette shelf 3 and the boat 5, the position of the substrate transfer machine 7 can be set.
【0007】[0007]
【実施例】図1(A),(B)はそれぞれ本発明装置の
1実施例の構成を示す平面図及び側面図で、1はウェー
ハ9と同等の円形状の板10の中心にピン2を垂設した
治具、8は基板移載機7に取付けられ距離計測可能な反
射型距離検出センサ、6はキャップである。基板移載機
7の位置設定を行う場合、予め治具1をカセット棚3の
カセット4内及びボート5の中心に載せるよう保持して
置く。まず、第2図(A),図3(A)に示すように基
板移載機7及びこれに取付けた反射型距離検出センサ8
を上下方向にシフトしスキャンさせ、該センサ8により
治具1の側面を検知することによりウェーハ9の縦方向
位置を読み取る。次にピン2を検知することができるよ
うに、基板移載機7及びこれに取付けた距離検出センサ
8を図3(A)に示すように一定量上下方向にシフト
し、そこで基板移載機7及び距離検出センサ8を図3
(A)のa,b,c又はD,E,Fに示すように左右回
転方向にスキャンさせる。図3(B)はセンサ検知方向
に対するセンサ出力の波形説明図である。ピン2のセン
ターを距離検出センサ7により検知することにより基板
移載機7の左右角度方向位置,又はピン2までの距離を
検出することにより、ウェーハ9の送り量を検知する。
この動作をカセット棚3、ボート5の双方で行うことに
より基板移載機7の位置設定(位置合せ)を行うことが
できる。なお、この位置はコントローラへ登録する。既
にコントローラに登録されている位置において治具1を
ボート5の上,下部に差し込むことによりボート5の上
部から下部までの変形及び傾き等も検知することができ
る。1 (A) and 1 (B) are a plan view and a side view, respectively, showing the structure of an embodiment of the device of the present invention. 1 is a pin 2 at the center of a circular plate 10 equivalent to a wafer 9. Is a jig, 8 is a reflection type distance detection sensor which is attached to the substrate transfer machine 7 and can measure the distance, and 6 is a cap. When the position of the substrate transfer machine 7 is set, the jig 1 is held and placed in advance in the cassette 4 of the cassette shelf 3 and the center of the boat 5. First, as shown in FIGS. 2 (A) and 3 (A), the substrate transfer machine 7 and the reflection type distance detection sensor 8 attached thereto
Is vertically shifted and scanned, and the side surface of the jig 1 is detected by the sensor 8 to read the vertical position of the wafer 9. Next, the substrate transfer device 7 and the distance detection sensor 8 attached thereto are vertically shifted by a certain amount as shown in FIG. 3A so that the pin 2 can be detected. 7 and the distance detection sensor 8 in FIG.
Scanning is performed in the left-right rotation direction as indicated by a, b, c or D, E, F in (A). FIG. 3B is an explanatory diagram of the waveform of the sensor output with respect to the sensor detection direction. By detecting the center of the pin 2 by the distance detection sensor 7, the position of the substrate transfer machine 7 in the left-right angular direction or by detecting the distance to the pin 2, the feed amount of the wafer 9 is detected.
By performing this operation on both the cassette shelf 3 and the boat 5, the position setting (positioning) of the substrate transfer device 7 can be performed. This position is registered in the controller. By inserting the jig 1 into the upper and lower portions of the boat 5 at the position already registered in the controller, it is possible to detect deformation and inclination of the boat 5 from the upper portion to the lower portion.
【0008】[0008]
【発明の効果】上述のように本発明によれば、カセット
棚のカセット、ボートに載置され半導体基板と同等形状
の板の中心にピンを垂設した治具と、基板移載機に設け
られ距離計測可能な反射型距離検出センサとよりなるの
で、基板移載機の位置設定を行うティーチング作業にお
ける半導体基板位置検出を、治具とセンサを用いて自動
的に行うことができ、基板移載機の位置設定を短時間で
行うことができ(ティーチング作業時間を短縮すること
ができ)、又、ボートの熱膨張,研磨等による変形を早
期に発見することができ、延いては作業効率の向上,性
能アップを図ることができる。As described above, according to the present invention, the cassette of the cassette shelf, the jig mounted on the boat and having the pins hanging down from the center of the plate having the same shape as the semiconductor substrate, and the jig provided on the substrate transfer machine. Since it consists of a reflection type distance detection sensor capable of measuring the distance, it can automatically detect the semiconductor substrate position in the teaching work for setting the position of the substrate transfer machine using a jig and a sensor. The position of the loading machine can be set in a short time (the teaching work time can be shortened), and the deformation of the boat due to thermal expansion, polishing, etc. can be found early, and the work efficiency can be improved. And performance can be improved.
【図面の簡単な説明】[Brief description of drawings]
【図1】(A),(B)はそれぞれ本発明装置の1実施
例の構成を示す平面図及び側面図である。1A and 1B are a plan view and a side view, respectively, showing the configuration of an embodiment of the device of the present invention.
【図2】(A),(B)はそれぞれ本発明における治具
とセンサの作用を説明するための側面図及び平面図であ
る。2A and 2B are a side view and a plan view, respectively, for explaining the operation of the jig and the sensor in the present invention.
【図3】(A),(B)はそれぞれ同じく治具とセンサ
の作用を説明するための斜視図及びセンサ検知方向に対
するセンサ出力の波形説明図である。3 (A) and 3 (B) are respectively a perspective view for explaining the operation of the jig and the sensor and a waveform explanatory view of the sensor output with respect to the sensor detection direction.
【図4】(A),(B)は本発明に係る半導体製造装置
における基板移載機周りの構成の1例を示す平面図及び
側面図である。4A and 4B are a plan view and a side view showing an example of a configuration around a substrate transfer machine in a semiconductor manufacturing apparatus according to the present invention.
1 治具 2 ピン 3 カセット棚 4 カセット 5 ボート 7 基板移載機 8 反射型距離検出センサ 9 半導体基板(ウェーハ) 10 板 1 jig 2 pin 3 cassette shelf 4 cassette 5 boat 7 substrate transfer machine 8 reflection type distance detection sensor 9 semiconductor substrate (wafer) 10 plate
Claims (2)
れ半導体基板と同等形状の板の中心にピンを垂設した治
具と、基板移載機に設けられ距離計測可能な反射型距離
検出センサとよりなる半導体基板位置検知装置。1. A cassette on a cassette shelf, a jig mounted on a boat and having pins hung at the center of a plate having the same shape as a semiconductor substrate, and a reflection type distance detection sensor provided on a substrate transfer machine and capable of measuring distance. And a semiconductor substrate position detecting device.
ト位置の上,下部に治具を差込み、基板移載機及びこれ
に設けられた反射型距離検出センサを左右回転方向及び
上下方向にシフトしスキャンするスキャナを備えたこと
を特徴とする請求項1の半導体基板位置検知装置。2. A jig is inserted above and below a boat position already registered in the controller, and a substrate transfer machine and a reflection type distance detection sensor provided on the substrate transfer machine are shifted in the left and right direction and in the up and down direction for scanning. 2. The semiconductor substrate position detecting device according to claim 1, further comprising a scanner.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15556993A JP3247495B2 (en) | 1993-06-25 | 1993-06-25 | Substrate processing apparatus, position setting method of substrate transfer machine, and boat state detection method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15556993A JP3247495B2 (en) | 1993-06-25 | 1993-06-25 | Substrate processing apparatus, position setting method of substrate transfer machine, and boat state detection method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0774229A true JPH0774229A (en) | 1995-03-17 |
JP3247495B2 JP3247495B2 (en) | 2002-01-15 |
Family
ID=15608912
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15556993A Expired - Fee Related JP3247495B2 (en) | 1993-06-25 | 1993-06-25 | Substrate processing apparatus, position setting method of substrate transfer machine, and boat state detection method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3247495B2 (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5981966A (en) * | 1997-02-20 | 1999-11-09 | Tokyo Electron Limited | Auto-teaching method in semiconductor processing system |
EP0996963A1 (en) * | 1997-07-11 | 2000-05-03 | Genmark Automation, Inc. | Multiple point position scanning system |
US6468816B2 (en) * | 1998-03-06 | 2002-10-22 | Applied Materials, Inc. | Method for sensing conditions within a substrate processing system |
KR100431874B1 (en) * | 1995-06-22 | 2004-10-20 | 동경 엘렉트론 주식회사 | Method of Teaching Bicycles of the Subject |
JP2005286211A (en) * | 2004-03-30 | 2005-10-13 | Tokyo Electron Ltd | Vacuum processing device and method |
US7283255B2 (en) | 2002-02-06 | 2007-10-16 | Cyberoptics Semiconductor, Inc. | Wireless substrate-like sensor |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6568828B2 (en) | 2016-08-01 | 2019-08-28 | 株式会社Kokusai Electric | Teaching jig, substrate processing apparatus and teaching method |
-
1993
- 1993-06-25 JP JP15556993A patent/JP3247495B2/en not_active Expired - Fee Related
Cited By (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100431874B1 (en) * | 1995-06-22 | 2004-10-20 | 동경 엘렉트론 주식회사 | Method of Teaching Bicycles of the Subject |
US5981966A (en) * | 1997-02-20 | 1999-11-09 | Tokyo Electron Limited | Auto-teaching method in semiconductor processing system |
EP0996963A1 (en) * | 1997-07-11 | 2000-05-03 | Genmark Automation, Inc. | Multiple point position scanning system |
EP0996963A4 (en) * | 1997-07-11 | 2006-01-18 | Genmark Automation Inc | Multiple point position scanning system |
US6468816B2 (en) * | 1998-03-06 | 2002-10-22 | Applied Materials, Inc. | Method for sensing conditions within a substrate processing system |
US6642853B2 (en) * | 1998-03-06 | 2003-11-04 | Applied Materials, Inc. | Movable wireless sensor device for performing diagnostics with a substrate processing system |
US6895831B2 (en) | 1998-03-06 | 2005-05-24 | Applied Materials, Inc. | Sensor device for non-intrusive diagnosis of a semiconductor processing system |
US7434485B2 (en) | 1998-03-06 | 2008-10-14 | Applied Materials, Inc. | Sensor device for non-intrusive diagnosis of a semiconductor processing system |
US7331250B2 (en) | 1998-03-06 | 2008-02-19 | Applied Materials, Inc. | Sensor device for non-intrusive diagnosis of a semiconductor processing system |
US7289230B2 (en) | 2002-02-06 | 2007-10-30 | Cyberoptics Semiconductors, Inc. | Wireless substrate-like sensor |
US7283255B2 (en) | 2002-02-06 | 2007-10-16 | Cyberoptics Semiconductor, Inc. | Wireless substrate-like sensor |
JP2005286211A (en) * | 2004-03-30 | 2005-10-13 | Tokyo Electron Ltd | Vacuum processing device and method |
JP4524132B2 (en) * | 2004-03-30 | 2010-08-11 | 東京エレクトロン株式会社 | Vacuum processing equipment |
Also Published As
Publication number | Publication date |
---|---|
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