JPH0773434A - Magnetic recording medium and its production - Google Patents

Magnetic recording medium and its production

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Publication number
JPH0773434A
JPH0773434A JP23726193A JP23726193A JPH0773434A JP H0773434 A JPH0773434 A JP H0773434A JP 23726193 A JP23726193 A JP 23726193A JP 23726193 A JP23726193 A JP 23726193A JP H0773434 A JPH0773434 A JP H0773434A
Authority
JP
Japan
Prior art keywords
film
magnetic
recording medium
magnetic recording
platinum group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23726193A
Other languages
Japanese (ja)
Other versions
JP2769772B2 (en
Inventor
Masato Fukushima
正人 福島
Shinichi Ogawa
伸一 小川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP5237261A priority Critical patent/JP2769772B2/en
Publication of JPH0773434A publication Critical patent/JPH0773434A/en
Application granted granted Critical
Publication of JP2769772B2 publication Critical patent/JP2769772B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To provide a magnetic recording medium having magnetic characteristics suitable for high-density recording by forming an Si film and platinum group metallic film on a nonmagnetic substrate by a sputtering method, then siliciding the films to form silicided films and forming a ground surface film, magnetic film, etc., by a sputtering method right thereon. CONSTITUTION:This magnetic recording medium is constituted by forming the ground surface film consisting essentially of Cr, magnetic film, protective film and lubricative film on the nonmagnetic substrate consisting of glass, etc. The film constituted of the platinum group element silicided by the Si film formed on the nonmagnetic substrate side or its alloy thereof is interposed between the nonmagnetic substrate and the ground surface film. As a result, the magnetic recording medium having the magnetic characteristics suitable for high-density recording is obtd. The film silicided by the Si film and the platinum group metal film improves the adhesion property to the nonmagnetic substrate and prevents the diffusion of gases or ions from the nonmagnetic substrate.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、非磁性基板上に各種膜
を順次積層して一体状とした磁気記録媒体に関し、さら
に詳しくは磁気記録密度向上に対応可能な磁気記録媒体
とその製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording medium in which various films are sequentially laminated on a non-magnetic substrate so as to be integrated, and more specifically, a magnetic recording medium capable of improving the magnetic recording density and a method of manufacturing the same. It is about.

【0002】[0002]

【従来の技術】従来の磁気記録媒体は、Ni−Pをメッ
キしたAl基板上に、下地膜、磁性膜、保護膜などを順
次スパッタリング法などで成膜させた後、潤滑剤を表面
にコーティングして作製されている。
2. Description of the Related Art In a conventional magnetic recording medium, a base film, a magnetic film, a protective film and the like are sequentially formed on an Al substrate plated with Ni-P by a sputtering method or the like, and then a lubricant is coated on the surface. It is made by.

【0003】そして、上記各種の膜のうち、磁性膜は、
例えば特開昭61−292219号公報、特開昭62−
239420号公報、或いは特開昭62−137720
号公報等に示されるようにCoを主成分としてPt,N
b,Ta,Cr,Ni等を含む3元素系または4元素系
合金をスパッタリング法などにより成膜させることが提
案されている。また、下地膜には、例えば特開昭62−
257618号公報、特開昭63−106917号公
報、或いは前記特開昭61−292219号公報等に示
されるようにCrまたはCr合金が使用されている。
Among the above various films, the magnetic film is
For example, JP-A-61-292219 and JP-A-62-1922
239420, or Japanese Patent Laid-Open No. 62-137720.
As disclosed in Japanese Patent Publication No.
It has been proposed to form a three-element or four-element alloy containing b, Ta, Cr, Ni, etc. by a sputtering method or the like. Further, as the base film, for example, Japanese Patent Laid-Open No. 62-
Cr or Cr alloys are used as shown in JP-A-257618, JP-A-63-106917, or JP-A-61-292219.

【0004】さらに、最近になって非磁性基板として、
高記録密度化を指向して従来のAl基板から、軽くて強
く、しかも平坦性に優れるガラスまたはカーボン系基板
へと材質変換することが検討されている。
Furthermore, recently, as a non-magnetic substrate,
In order to increase the recording density, it is considered to change the material from a conventional Al substrate to a glass or carbon substrate which is light and strong and has excellent flatness.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、従来の
非磁性基板としてのAl基板に代えて、単にそのままガ
ラスまたはカーボン基板を使用したとしても、ガラスま
たはカーボン系基板の表面に存在する元素の一部がCr
またはCr合金からなる下地膜中へ拡散したり、ガラス
またはカーボン系基板内に存在する気孔や粒界に保持
(内包)されているH2 O、H2 が放出し、特にガラス
系基板ではOイオンの拡散があるため、例えば磁性膜で
の保磁力(Hc)が低下して角型比で代表される磁化の
ヒステリシスが適当でなくなり、高記録密度化を達成す
ることができないこともある。
However, even if the glass or carbon substrate is used as it is instead of the conventional Al substrate as the non-magnetic substrate, some of the elements present on the surface of the glass or carbon substrate are used. Is Cr
Alternatively, H 2 O and H 2 which are diffused into a base film made of a Cr alloy or retained (included) in pores or grain boundaries existing in a glass or carbon-based substrate are released. Due to the diffusion of ions, for example, the coercive force (Hc) in the magnetic film is lowered and the hysteresis of the magnetization represented by the squareness ratio becomes unsuitable, so that high recording density may not be achieved.

【0006】[0006]

【課題を解決するための手段】本発明者らは、上記問題
を解決し、且つさらに高い記録密度を達成するために鋭
意研究した結果、非磁性基板、下地膜、磁性膜、保護膜
及び潤滑膜を基本構成とする磁気記録媒体であって、非
磁性基板と下地膜との間に、非磁性基板側に成膜したS
i膜によりシリサイド化した白金族元素またはその合金
で構成された膜(以下、シリサイド化膜という)を介在
させてなることを特徴とする磁気記録媒体及びその製造
方法を見出したのである。
DISCLOSURE OF THE INVENTION The inventors of the present invention have conducted extensive studies to solve the above problems and achieve a higher recording density. As a result, a non-magnetic substrate, a base film, a magnetic film, a protective film and a lubrication film have been obtained. A magnetic recording medium having a film as a basic structure, wherein S formed between a non-magnetic substrate and a base film is formed on the non-magnetic substrate side.
The inventors have found a magnetic recording medium characterized by interposing a film (hereinafter, referred to as a silicidation film) composed of a platinum group element or an alloy thereof which is silicidized by an i film, and a manufacturing method thereof.

【0007】一般に、磁性膜がその性能を発揮するため
には、その直下に位置する下地膜の性状が関係し、この
下地膜の性質はその直下に位置する介在膜の表面に影響
される。その結果、介在膜に備わるべき条件は以下のよ
うになる。 表面が非晶質(アモルファス状)であること。 介在膜の内部からガスまたは構成元素が下地膜中へ拡
散してこないこと。 非磁性基板と介在膜との間、介在膜と下地膜との間が
それぞれ十分な密着性や遮断性を有していること。
Generally, in order for the magnetic film to exhibit its performance, the properties of the underlying film located immediately below it are related, and the properties of this underlying film are affected by the surface of the intervening film located immediately below. As a result, the conditions that the intervening film should have are as follows. The surface should be amorphous. Gas or constituent elements should not diffuse into the underlying film from the inside of the intervening film. The non-magnetic substrate and the intervening film, and the intervening film and the underlying film have sufficient adhesion and blocking properties, respectively.

【0008】そして、特開平4−247323号公報で
は、非磁性支持体の表面にTiの膜及びSiの膜を順次
被覆して積層した後、加熱処理して前記Siを前記Ti
中に熱拡散させた非晶質合金層を形成させた磁気記録媒
体が記載され、この磁気記録媒体が磁気特性を改善し得
ることが開示されている。しかし、上記磁気記録媒体で
は、介在膜の内部において、基板側がTiで下地膜側が
Siであるから、介在膜の内部上方部分に過剰のSiが
存在することがあり、この過剰なSi成分が介在膜の直
上に積層される下地膜中のCrと部分的に反応するた
め、下地膜の安定な条件をつくることができない。
In Japanese Patent Laid-Open No. 4-247323, a Ti film and a Si film are sequentially coated and laminated on the surface of a non-magnetic support, and then heat treatment is performed to convert the Si into the Ti film.
A magnetic recording medium having a thermally diffused amorphous alloy layer formed therein is described, and it is disclosed that the magnetic recording medium can improve magnetic characteristics. However, in the above magnetic recording medium, since the substrate side is Ti and the underlayer side is Si inside the intervening film, excess Si may be present in the upper portion inside the intervening film, and this excess Si component is present. Since it partially reacts with Cr in the base film laminated directly on the film, it is not possible to create stable conditions for the base film.

【0009】本発明の磁気記録媒体の各構成を説明する
と、非磁性基板、下地膜、磁性膜、保護膜及び潤滑膜
は、特にその材質や組成等を限定するものではなく、公
知のものを適宜に選定して使用することができ、その成
膜方法も特に限定するものではない。例えば非磁性基板
はカナサイトガラス、強化ガラス等のガラス系基板やカ
ーボン系基板等を使用することができる。また、前記の
ように下地膜としてはCrまたはCr合金からなるもの
を使用してもよいし、磁性膜としてはCoを主成分とす
るものをスパッタリング法で成膜してもよい。
Each component of the magnetic recording medium of the present invention will be described. The non-magnetic substrate, undercoating film, magnetic film, protective film and lubricating film are not particularly limited in their materials and compositions, but may be known ones. It can be appropriately selected and used, and the film forming method is not particularly limited. For example, as the non-magnetic substrate, a glass-based substrate such as canasite glass or tempered glass or a carbon-based substrate can be used. Further, as described above, a base film made of Cr or a Cr alloy may be used, and a magnetic film containing Co as a main component may be formed by a sputtering method.

【0010】また、前記したシリサイド化膜は、Si膜
と白金族元素(Pt、Pd、Rh、Ir、Ru、Os)
またはその合金で構成される膜(以下、白金族金属膜と
いう)とを順次成膜させた後、必要であれば加熱して得
られるものである。上記したSi膜と白金族金属膜との
シリサイド化速度は、加熱する温度やシリサイド組成に
よっても異なるが、実操業におけるスパッタリング温度
(300〜500℃)では、概略100〜200Å/m
in程度である。そして、Siが白金族金属膜の最上方
部分にまで拡散して到達すれば、白金族金属膜はすべて
シリサイド化されて非晶質状となるのであるから、白金
族金属膜の厚さ(上限)は、実操業状態での加熱温度、
及びその直上の下地膜をスパッタリングするまでの時間
においてSiの拡散が白金族金属膜の最上方部分に到達
できる程度のものに設定するのが好ましい。通常では、
その厚みは50〜1000Åである。一方、Si膜の厚
さは20〜1500Å、好ましくは30〜1000Åに
設定される。Si膜の厚さが20Å以下では密着力が不
足し、非磁性基板から上昇拡散してくるOイオンなどの
ゲッターとしての機能が十分でなくなる。また、150
0Å以上の厚さでは実用上の意味が薄くなり、生産性が
低下する。
The silicidation film is composed of a Si film and platinum group elements (Pt, Pd, Rh, Ir, Ru, Os).
Alternatively, it is obtained by sequentially forming a film composed of the alloy (hereinafter referred to as a platinum group metal film), and then heating the film if necessary. The silicidation rate between the Si film and the platinum group metal film varies depending on the heating temperature and the silicide composition, but is about 100 to 200 Å / m at the sputtering temperature (300 to 500 ° C.) in the actual operation.
It is about in. When Si reaches the uppermost portion of the platinum group metal film by diffusion, the entire platinum group metal film is silicified and becomes amorphous. Therefore, the thickness of the platinum group metal film (upper limit) ) Is the heating temperature in actual operation,
Also, it is preferable to set it to such a degree that the diffusion of Si can reach the uppermost portion of the platinum group metal film in the time period until the underlying film immediately above it is sputtered. Normally,
Its thickness is 50 to 1000Å. On the other hand, the thickness of the Si film is set to 20 to 1500Å, preferably 30 to 1000Å. When the thickness of the Si film is 20 Å or less, the adhesion is insufficient, and the function as a getter for O ions and the like that diffuse and diffuse from the nonmagnetic substrate becomes insufficient. Also, 150
When the thickness is 0 Å or more, the practical meaning is reduced and the productivity is reduced.

【0011】本発明の磁気記録媒体を製造するには、非
磁性基板上にSi膜と白金族金属膜とをスパッタリング
法、その他の手段により成膜してシリサイド化させ、介
在膜としてシリサイド化膜を形成したらその直上に下地
膜、磁性膜、保護膜及び潤滑膜をスパッタリング法、そ
の他、従来から知られている手段により成膜するのであ
る。そして、Si膜と白金族金属膜とをシリサイド化さ
せる場合、常温若しくはそれ以上の温度で加熱してもよ
いし、白金族金属膜の直上に形成する下地膜を成膜する
場合のスパッタリングの熱を利用して加熱してもよい。
Si膜と白金族金属膜とを加熱してシリサイド化させる
と、シリサイド化が促進されるし、安定したシリサイド
化膜を形成することができる。
To manufacture the magnetic recording medium of the present invention, a Si film and a platinum group metal film are formed on a non-magnetic substrate by a sputtering method or other means to be silicidized, and a silicidized film is used as an intervening film. After forming, the underlying film, the magnetic film, the protective film, and the lubricating film are formed directly on the film by the sputtering method or other conventionally known means. When the Si film and the platinum group metal film are silicidized, they may be heated at room temperature or higher, or the heat of sputtering when forming an underlayer film formed directly on the platinum group metal film. You may heat using.
When the Si film and the platinum group metal film are heated to be silicidized, silicidation is promoted and a stable silicidized film can be formed.

【0012】[0012]

【作用】本発明の磁気記録媒体は、Si膜と白金族金属
膜とにより形成されたシリサイド化膜が極めて安定であ
って、非磁性基板からのガスやイオンの拡散を防止し、
しかもその直上の下地膜を確実に保護することができ
る。そして、下地膜の安定化により、その直上に位置す
る磁性膜を安定化させることができ、このことは磁性膜
に悪影響を及ぼすことがなく、しかも磁性膜の磁気特性
としての極めて高い保磁力を確保することにより、磁気
記録密度の向上を図ることができるものである。しかも
Si膜を非磁性基板上に成膜し、その上に白金族金属膜
を成膜してシリサイド化させるので、仮にシリサイド化
された後に過剰のSiが残存したとしても非磁性基板側
に存在するため下地膜の特性に影響を与えることがな
い。
In the magnetic recording medium of the present invention, the silicidized film formed by the Si film and the platinum group metal film is extremely stable and prevents diffusion of gas and ions from the non-magnetic substrate,
Moreover, it is possible to reliably protect the underlying film immediately above it. Further, by stabilizing the underlayer film, it is possible to stabilize the magnetic film located immediately above it, which does not adversely affect the magnetic film and has an extremely high coercive force as a magnetic characteristic of the magnetic film. By ensuring this, the magnetic recording density can be improved. Moreover, since the Si film is formed on the non-magnetic substrate, and the platinum group metal film is formed on the non-magnetic substrate for silicidation, even if excess Si remains after silicidation, it exists on the non-magnetic substrate side. Therefore, the characteristics of the base film are not affected.

【0013】[0013]

【実施例】以下、本発明の実施例を示す。EXAMPLES Examples of the present invention will be shown below.

【0014】[実施例1,2及び比較例1,2];通常
のスパッタリング法により、非磁性基板上にシリサイド
化膜(Si膜+白金族金属膜)、下地膜、磁性膜、保護
膜を順次成膜し、最上面にパーフロロポリエーテル系潤
滑剤を塗布して実施例1,2の磁気記録媒体を製造し、
高密度化の指標としてB−shiftを測定して表2に
示した。尚、上記非磁性基板並びに各種膜の構成内容は
表1に示した。また、B−shiftの測定条件は、ギ
ャップ長0.35μm、トラック幅6.9μmの薄膜ヘ
ッドを使用し、浮上高さ2.5マイクロインチ、半径2
0mmにて測定した。変調コードはM.F.M.、記録
パターンはB6D9にて評価した。一方、磁気特性は、
各ディスクより7mm角の試片を切り出し、振動式磁気
特性装置(VSM)にて保磁力(Hc)、残留磁化*膜
厚(Brδ)、角型比(S* )を測定した。表1中、各
種膜における成膜温度は、放射型温度計により測定した
ものであり、シリサイド化膜については常温若しくは1
00℃以下に設定し、下地膜については100〜600
℃、好ましくは200〜500℃に設定した。磁性膜に
ついては、下地膜析出時の予熱を利用した。さらに、上
記シリサイド化膜を設けない以外は全く同一の構成の比
較例1,2の磁気記録媒体を製造し、同様な試験を行っ
た結果を表2に並記した。
[Examples 1 and 2 and Comparative Examples 1 and 2]: A silicidation film (Si film + platinum group metal film), a base film, a magnetic film, and a protective film were formed on a non-magnetic substrate by an ordinary sputtering method. Films are sequentially formed, and a perfluoropolyether lubricant is applied to the uppermost surface to manufacture the magnetic recording media of Examples 1 and 2,
B-shift was measured as an index of densification and shown in Table 2. The constitutional contents of the above-mentioned non-magnetic substrate and various films are shown in Table 1. The B-shift measurement conditions were a thin film head with a gap length of 0.35 μm and a track width of 6.9 μm, a flying height of 2.5 micro inches, and a radius of 2
It was measured at 0 mm. The modulation code is M.I. F. M. The recording pattern was evaluated by B6D9. On the other hand, the magnetic characteristics are
A 7 mm square sample was cut out from each disk, and coercive force (Hc), remanent magnetization * film thickness (Brδ), and squareness ratio (S * ) were measured by a vibration type magnetic characteristic device (VSM). In Table 1, the film forming temperature of each film is measured by a radiation thermometer, and the silicidation film is at room temperature or 1
The temperature is set to 00 ° C or lower, and the base film is 100 to 600
The temperature was set to 0 ° C, preferably 200 to 500 ° C. For the magnetic film, preheating at the time of depositing the base film was used. Further, the magnetic recording media of Comparative Examples 1 and 2 having exactly the same structure except that the silicidation film was not provided were manufactured, and the results of the same test are shown in Table 2.

【0015】[0015]

【表1】 [Table 1]

【0016】[0016]

【表2】 [Table 2]

【0017】[実施例3〜6];Si膜を1000Åに
し、Pt膜を20〜1000Åに変化させた以外は、前
記実施例1と全く同様に実施例3〜6の磁気記録媒体を
製造し、同様な試験を行った結果を表3に示した。
[Examples 3 to 6]: Magnetic recording media of Examples 3 to 6 were manufactured in exactly the same manner as in Example 1 except that the Si film was changed to 1000 Å and the Pt film was changed to 20 to 1000 Å. The results of similar tests are shown in Table 3.

【0018】[0018]

【表3】 [Table 3]

【0019】[実施例7,8];Pt膜をPd膜に代え
た以外は、前記実施例1,2と全く同様に実施例7,8
の磁気記録媒体を製造し、同様な試験を行った結果を表
4に示した。
[Examples 7 and 8] Examples 7 and 8 are exactly the same as Examples 1 and 2 except that the Pt film is replaced with a Pd film.
Table 4 shows the results of manufacturing the magnetic recording medium of No. 1 and performing the same test.

【0020】[0020]

【表4】 [Table 4]

【0021】[実施例9〜12];Pt膜を他の白金族
(Rh、Ir、Ru、Os)膜に代えた以外は、前記実
施例1と全く同様に実施例9〜12の磁気記録媒体を製
造し、同様な試験を行った結果を表5に示した。
[Examples 9 to 12] Magnetic recording of Examples 9 to 12 was carried out in exactly the same manner as in Example 1 except that the Pt film was replaced with another platinum group (Rh, Ir, Ru, Os) film. Table 5 shows the result of manufacturing the medium and performing the same test.

【0022】[0022]

【表5】 [Table 5]

【0023】[0023]

【発明の効果】以上説明したように、本発明の磁気記録
媒体は、高密度記録に適した磁気特性を有するものであ
る。
As described above, the magnetic recording medium of the present invention has magnetic characteristics suitable for high density recording.

【0024】また、Si膜と白金族金属膜とによりシリ
サイド化された膜が非磁性基板との密着性を向上させる
と共に非磁性基板からのガスまたはイオンの拡散を防止
し、しかも非晶質のシリサイド化膜が下地膜と接するこ
とになるので、下地膜及び磁性膜をその性能を発揮でき
る形で積層させたものとなる。
Further, the film silicidized by the Si film and the platinum group metal film improves the adhesion to the non-magnetic substrate, prevents the diffusion of gas or ions from the non-magnetic substrate, and is amorphous. Since the silicidation film comes into contact with the underlayer film, the underlayer film and the magnetic film are laminated so that the performance can be exhibited.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の磁気記録媒体を模式的に示す断面図で
ある。
FIG. 1 is a sectional view schematically showing a magnetic recording medium of the present invention.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 非磁性基板、下地膜、磁性膜、保護膜及
び潤滑膜を基本構成とする磁気記録媒体であって、非磁
性基板と下地膜との間に、非磁性基板側に成膜したSi
膜によりシリサイド化した白金族元素またはその合金で
構成された膜を介在させてなることを特徴とする磁気記
録媒体。
1. A magnetic recording medium having a non-magnetic substrate, a base film, a magnetic film, a protective film and a lubricating film as a basic structure, which is formed between a non-magnetic substrate and a base film on the non-magnetic substrate side. Done Si
A magnetic recording medium comprising a film made of a platinum group element or an alloy thereof which is silicided by a film.
【請求項2】 非磁性基板がガラスまたはカーボン系基
板である請求項1に記載の磁気記録媒体。
2. The magnetic recording medium according to claim 1, wherein the non-magnetic substrate is a glass or carbon-based substrate.
【請求項3】 下地膜がCrを主成分とする請求項1ま
たは2記載の磁気記録媒体。
3. The magnetic recording medium according to claim 1, wherein the underlayer film contains Cr as a main component.
【請求項4】 非磁性基板上に、Si膜と白金族元素ま
たはその合金で構成された膜とを成膜させることによ
り、非磁性基板側のSi膜からシリサイド化させた膜を
形成させ、上記シリサイド化した膜の表面に下地膜、磁
性膜、保護膜及び潤滑膜を成膜するようにしたことを特
徴とする磁気記録媒体の製造方法。
4. A silicidation film is formed from the Si film on the non-magnetic substrate side by forming a Si film and a film made of a platinum group element or an alloy thereof on the non-magnetic substrate, A method of manufacturing a magnetic recording medium, characterized in that an underlying film, a magnetic film, a protective film, and a lubricating film are formed on the surface of the silicidized film.
JP5237261A 1993-08-31 1993-08-31 Magnetic recording medium and method of manufacturing the same Expired - Lifetime JP2769772B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5237261A JP2769772B2 (en) 1993-08-31 1993-08-31 Magnetic recording medium and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5237261A JP2769772B2 (en) 1993-08-31 1993-08-31 Magnetic recording medium and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPH0773434A true JPH0773434A (en) 1995-03-17
JP2769772B2 JP2769772B2 (en) 1998-06-25

Family

ID=17012789

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JP2769772B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5731070A (en) * 1995-12-20 1998-03-24 Showa Denko Kabushiki Kaisha Magnetic recording medium comprising a substrate, magnetic layer, and under layers including a silicon layer and a layer diffused with silicon
JP2008192275A (en) * 2006-09-21 2008-08-21 Canon Inc Magnetic recording medium and method of manufacturing the same

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04247323A (en) * 1991-02-01 1992-09-03 Nippon Sheet Glass Co Ltd Production of magnetic recording medium

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04247323A (en) * 1991-02-01 1992-09-03 Nippon Sheet Glass Co Ltd Production of magnetic recording medium

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5731070A (en) * 1995-12-20 1998-03-24 Showa Denko Kabushiki Kaisha Magnetic recording medium comprising a substrate, magnetic layer, and under layers including a silicon layer and a layer diffused with silicon
US5914152A (en) * 1995-12-20 1999-06-22 Showa Denko Kabushiki Kaisha Magnetic recording medium and process for making same
JP2008192275A (en) * 2006-09-21 2008-08-21 Canon Inc Magnetic recording medium and method of manufacturing the same

Also Published As

Publication number Publication date
JP2769772B2 (en) 1998-06-25

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