JPH0773435A - Magnetic recording medium and its production - Google Patents

Magnetic recording medium and its production

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Publication number
JPH0773435A
JPH0773435A JP23726293A JP23726293A JPH0773435A JP H0773435 A JPH0773435 A JP H0773435A JP 23726293 A JP23726293 A JP 23726293A JP 23726293 A JP23726293 A JP 23726293A JP H0773435 A JPH0773435 A JP H0773435A
Authority
JP
Japan
Prior art keywords
film
magnetic
recording medium
magnetic recording
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23726293A
Other languages
Japanese (ja)
Inventor
Shinichi Ogawa
伸一 小川
Masato Fukushima
正人 福島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko KK filed Critical Showa Denko KK
Priority to JP23726293A priority Critical patent/JPH0773435A/en
Publication of JPH0773435A publication Critical patent/JPH0773435A/en
Pending legal-status Critical Current

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  • Magnetic Record Carriers (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

PURPOSE:To provide a magnetic recording medium having magnetic characteristics suitable for high-density recording by forming a ground surface film, magnetic film, etc., by a sputtering method right on the morphous films which consist of an Si film and C film formed by a sputtering method, etc., on a nonmagnetic substrate and are made amorphous. CONSTITUTION:This magnetic recording medium is constituted by forming the ground surface film consisting essentially of Cr, magnetic film, protective film and lubricative film on the nonmagnetic substrate consisting of glass, etc. The C film which is made amorphous by the Si film formed on the nonmagnetic substrate side is interposed between the nonmagnetic substrate and the ground surface film. As a result, the magnetic recording medium having the magnetic characteristics suitable for high-density recording is obtd. The films made amorphous by the Si film and the C film improve the adhesion property to the nonmagnetic substrate and prevent the diffusion of the gases or ions from the nonmagnetic substrate.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、非磁性基板上に各種膜
を順次積層して一体状とした磁気記録媒体に関し、さら
に詳しくは磁気記録密度向上に対応可能な磁気記録媒体
及びその製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetic recording medium in which various films are sequentially laminated on a non-magnetic substrate to form an integrated magnetic recording medium. It is about.

【0002】[0002]

【従来の技術】従来の磁気記録媒体は、Ni−Pをメッ
キしたAl基板上に、下地膜、磁性膜、保護膜などを順
次スパッタリング法などで成膜させた後、潤滑剤を表面
にコーティングして作製されている。
2. Description of the Related Art In a conventional magnetic recording medium, a base film, a magnetic film, a protective film and the like are sequentially formed on an Al substrate plated with Ni-P by a sputtering method or the like, and then a lubricant is coated on the surface. It is made by.

【0003】そして、上記各種の膜のうち、磁性膜は、
例えば特開昭61−292219号公報、特開昭62−
239420号公報、或いは特開昭62−137720
号公報等に示されるようにCoを主成分としてPt,N
b,Ta,Cr,Ni等を含む3元素系または4元素系
合金をスパッタリング法などにより成膜させることが提
案されている。また、下地膜には、例えば特開昭62−
257618号公報、特開昭63−106917号公
報、或いは前記特開昭61−292219号公報等に示
されるようにCrまたはCr合金が使用されている。
Among the above various films, the magnetic film is
For example, JP-A-61-292219 and JP-A-62-1922
239420, or Japanese Patent Laid-Open No. 62-137720.
As disclosed in Japanese Patent Publication No.
It has been proposed to form a three-element or four-element alloy containing b, Ta, Cr, Ni, etc. by a sputtering method or the like. Further, as the base film, for example, Japanese Patent Laid-Open No. 62-
Cr or Cr alloys are used as shown in JP-A-257618, JP-A-63-106917, or JP-A-61-292219.

【0004】さらに、最近になって非磁性基板として、
高記録密度化を指向して従来のAl基板から、軽くて強
く、しかも平坦性に優れるガラスまたはカーボン系基板
へと材質変換することが検討されている。
Furthermore, recently, as a non-magnetic substrate,
In order to increase the recording density, it is considered to change the material from a conventional Al substrate to a glass or carbon substrate which is light and strong and has excellent flatness.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、従来の
非磁性基板としてのAl基板に代えて、単にそのままガ
ラスまたはカーボン基板を使用したとしても、ガラスま
たはカーボン系基板の表面に存在する元素の一部がCr
またはCr合金からなる下地膜中へ拡散したり、ガラス
またはカーボン系基板内に存在する気孔や粒界に保持
(内包)されているH2 O、H2 が放出し、特にガラス
系基板ではOイオンの拡散があるため、例えば磁性膜で
の保磁力(Hc)が低下して角型比で代表される磁化の
ヒステリシスが適当でなくなり、高記録密度化を達成す
ることができないこともある。
However, even if the glass or carbon substrate is used as it is instead of the conventional Al substrate as the non-magnetic substrate, some of the elements present on the surface of the glass or carbon substrate are used. Is Cr
Alternatively, H 2 O and H 2 which are diffused into a base film made of a Cr alloy or retained (included) in pores or grain boundaries existing in a glass or carbon-based substrate are released. Due to the diffusion of ions, for example, the coercive force (Hc) in the magnetic film is lowered and the hysteresis of the magnetization represented by the squareness ratio becomes unsuitable, so that high recording density may not be achieved.

【0006】[0006]

【課題を解決するための手段】本発明者らは、上記問題
を解決し、且つさらに高い記録密度を達成するために鋭
意研究した結果、非磁性基板、下地膜、磁性膜、保護膜
及び潤滑膜を基本構成とする磁気記録媒体であって、非
磁性基板と下地膜との間に、非磁性基板側に成膜したS
i膜により非晶質化したC膜(以下、非晶質化膜とい
う)を介在させてなることを特徴とする磁気記録媒体及
びその製造方法を見出したのである。
DISCLOSURE OF THE INVENTION The inventors of the present invention have conducted extensive studies to solve the above problems and achieve a higher recording density. As a result, a non-magnetic substrate, a base film, a magnetic film, a protective film and a lubrication film have been obtained. A magnetic recording medium having a film as a basic structure, wherein S formed between a non-magnetic substrate and a base film is formed on the non-magnetic substrate side.
The present inventors have found a magnetic recording medium characterized by interposing a C film amorphized by an i film (hereinafter referred to as an amorphized film) and a manufacturing method thereof.

【0007】一般に、磁性膜がその性能を発揮するため
には、その直下に位置する下地膜の性状が関係し、この
下地膜の性質はその直下に位置する介在膜の表面に影響
される。その結果、介在膜に備わるべき条件は以下のよ
うになる。 表面が非晶質(アモルファス状)であること。 介在膜の内部からガスまたは構成元素が下地膜中へ拡
散してこないこと。 非磁性基板と介在膜との間、介在膜と下地膜との間が
それぞれ十分な密着性や遮断性を有していること。
Generally, in order for the magnetic film to exhibit its performance, the properties of the underlying film located immediately below it are related, and the properties of this underlying film are affected by the surface of the intervening film located immediately below. As a result, the conditions that the intervening film should have are as follows. The surface should be amorphous. Gas or constituent elements should not diffuse into the underlying film from the inside of the intervening film. The non-magnetic substrate and the intervening film, and the intervening film and the underlying film have sufficient adhesion and blocking properties, respectively.

【0008】そして、特開平4−247323号公報で
は、非磁性支持体の表面にTiの膜及びSiの膜を順次
被覆して積層した後、加熱処理して前記Siを前記Ti
中に熱拡散させた非晶質合金層を形成させた磁気記録媒
体が記載され、この磁気記録媒体が磁気特性を改善し得
ることが開示されている。しかし、上記磁気記録媒体で
は、介在膜の内部において、基板側がTiで下地膜側が
Siであるから、介在膜の内部上方部分に過剰のSiが
存在することがあり、この過剰なSi成分が介在膜の直
上に積層される下地膜中のCrと部分的に反応するた
め、下地膜の安定な条件をつくることができない。
In Japanese Patent Laid-Open No. 4-247323, a Ti film and a Si film are sequentially coated and laminated on the surface of a non-magnetic support, and then heat treatment is performed to convert the Si into the Ti film.
A magnetic recording medium having a thermally diffused amorphous alloy layer formed therein is described, and it is disclosed that the magnetic recording medium can improve magnetic characteristics. However, in the above magnetic recording medium, since the substrate side is Ti and the underlayer side is Si inside the intervening film, excess Si may be present in the upper portion inside the intervening film, and this excess Si component is present. Since it partially reacts with Cr in the base film laminated directly on the film, it is not possible to create stable conditions for the base film.

【0009】本発明の磁気記録媒体の各構成を説明する
と、非磁性基板、下地膜、磁性膜、保護膜及び潤滑膜
は、特にその材質や組成等を限定するものではなく、公
知のものを適宜に選定して使用することができ、その成
膜方法も特に限定するものではない。例えば非磁性基板
はカナサイトガラス、強化ガラス等のガラス系基板やカ
ーボン系基板等を使用することができる。また、前記の
ように下地膜としてはCrまたはCr合金からなるもの
を使用してもよいし、磁性膜としてはCoを主成分とす
るものをスパッタリング法で成膜してもよい。
Each component of the magnetic recording medium of the present invention will be described. The non-magnetic substrate, undercoating film, magnetic film, protective film and lubricating film are not particularly limited in their materials and compositions, but may be known ones. It can be appropriately selected and used, and the film forming method is not particularly limited. For example, as the non-magnetic substrate, a glass-based substrate such as canasite glass or tempered glass or a carbon-based substrate can be used. Further, as described above, a base film made of Cr or a Cr alloy may be used, and a magnetic film containing Co as a main component may be formed by a sputtering method.

【0010】また、前記した非晶質化膜は、Si膜とC
膜とを順次成膜させた後、必要であれば加熱して得られ
るものである。上記したSi膜とC膜との非晶質化速度
は、加熱する温度やシリサイド組成によっても異なる
が、実操業におけるスパッタリング温度(300〜50
0℃)では、概略100〜200Å/min程度であ
る。そして、SiがC膜の最上方部分にまで拡散して到
達すれば、C膜はすべて非晶質化されるのであるから、
C膜の厚さ(上限)は、実操業状態での加熱温度、及び
その直上の下地膜をスパッタリングするまでの時間にお
いてSiの拡散がC膜の最上方部分に到達できる程度の
ものに設定するのが好ましい。通常では、その厚みは1
0〜200Åである。一方、Si膜の厚さは20〜15
00Å、好ましくは30〜1000Åに設定される。S
i膜の厚さが20Å以下では密着力が不足し、非磁性基
板から上昇拡散してくるOイオンなどのゲッターとして
の機能が十分でなくなる。また、1500Å以上の厚さ
では実用上の意味が薄くなり、生産性が低下する。
Further, the amorphized film is a Si film and a C film.
It is obtained by sequentially forming a film and a film and then heating if necessary. The amorphization rate of the Si film and the C film varies depending on the heating temperature and the silicide composition, but the sputtering temperature (300 to 50) in the actual operation.
At 0 ° C., it is approximately 100 to 200 Å / min. When Si reaches the uppermost portion of the C film by diffusion, the entire C film is amorphized.
The thickness (upper limit) of the C film is set to such a degree that the diffusion of Si can reach the uppermost portion of the C film in the heating temperature in the actual operating state and the time until the underlying film immediately above is sputtered. Is preferred. Normally, its thickness is 1
It is 0 to 200Å. On the other hand, the thickness of the Si film is 20 to 15
It is set to 00Å, preferably 30 to 1000Å. S
When the thickness of the i film is 20 Å or less, the adhesion is insufficient, and the function as a getter for O ions and the like that diffuse and diffuse from the non-magnetic substrate becomes insufficient. Further, if the thickness is 1500 Å or more, the practical meaning becomes small and the productivity is lowered.

【0011】本発明の磁気記録媒体を製造するには、非
磁性基板上にSi膜とC膜とをスパッタリング法、その
他の手段により成膜して非晶質化させ、介在膜として非
晶質化膜を形成したらその直上に下地膜、磁性膜、保護
膜及び潤滑膜をスパッタリング法、その他、従来から知
られている手段により成膜するのである。そして、Si
膜とC膜とを非晶質化させる場合、常温若しくはそれ以
上の温度で加熱してもよいし、C膜の直上に形成する下
地膜を成膜する場合のスパッタリングの熱を利用して加
熱してもよい。Si膜とC膜とを加熱すると、安定した
非晶質化膜を形成することができる。
To manufacture the magnetic recording medium of the present invention, a Si film and a C film are formed on a non-magnetic substrate by a sputtering method or other means to make them amorphous, and an amorphous film is used as an intervening film. After the formation of the oxide film, the underlying film, the magnetic film, the protective film and the lubricating film are formed directly on the oxide film by the sputtering method or other conventionally known means. And Si
When the film and the C film are made to be amorphous, they may be heated at room temperature or higher, or they may be heated by using the heat of sputtering when forming a base film formed directly on the C film. You may. By heating the Si film and the C film, a stable amorphized film can be formed.

【0012】[0012]

【作用】本発明の磁気記録媒体は、Si膜とC膜とによ
り形成された非晶質化膜が極めて安定であって、非磁性
基板からのガスやイオンの拡散を防止し、しかもその直
上の下地膜を確実に保護することができる。そして、下
地膜の安定化により、その直上に位置する磁性膜を安定
化させることができ、このことは磁性膜に悪影響を及ぼ
すことがなく、しかも磁性膜の磁気特性としての極めて
高い保磁力を確保することにより、磁気記録密度の向上
を図ることができるものである。しかもSi膜を非磁性
基板上に成膜し、その上にC膜を成膜して非晶質化させ
るので、仮に非晶質化された後に過剰のSiが残存した
としても非磁性基板側に存在するため下地膜の特性に影
響を与えることがない。
In the magnetic recording medium of the present invention, the amorphized film formed by the Si film and the C film is extremely stable and prevents diffusion of gas and ions from the non-magnetic substrate, and directly above it. The underlying film can be surely protected. Further, by stabilizing the underlayer film, it is possible to stabilize the magnetic film located immediately above it, which does not adversely affect the magnetic film and has an extremely high coercive force as a magnetic characteristic of the magnetic film. By ensuring this, the magnetic recording density can be improved. Moreover, since the Si film is formed on the non-magnetic substrate and the C film is formed thereon to make it amorphous, even if excess Si remains after being made amorphous, the non-magnetic substrate side Since it is present in the film, it does not affect the characteristics of the base film.

【0013】[0013]

【実施例】以下、本発明の実施例を示す。EXAMPLES Examples of the present invention will be shown below.

【0014】[実施例1,2及び比較例1,2];通常
のスパッタリング法により、非磁性基板上に非晶質化膜
(Si膜+C膜)、下地膜、磁性膜、保護膜を順次成膜
し、最上面にパーフロロポリエーテル系潤滑剤を塗布し
て実施例1,2の磁気記録媒体を製造し、高密度化の指
標としてB−shiftを測定して表2に示した。尚、
上記非磁性基板並びに各種膜の構成内容は表1に示し
た。また、B−shiftの測定条件は、ギャップ長
0.35μm、トラック幅6.9μmの薄膜ヘッドを使
用し、浮上高さ2.5マイクロインチ、半径20mmに
て測定した。変調コードはM.F.M.、記録パターン
はB6D9にて評価した。一方、磁気特性は、各ディス
クより7mm角の試片を切り出し、振動式磁気特性装置
(VSM)にて保磁力(Hc)、残留磁化*膜厚(Br
δ)、角型比(S* )を測定した。表1中、各種膜にお
ける成膜温度は、放射型温度計により測定したものであ
り、非晶質化膜については常温若しくは100℃以下に
設定し、下地膜については100〜600℃、好ましく
は200〜500℃に設定した。磁性膜については、下
地膜析出時の予熱を利用した。さらに、上記非晶質化膜
を設けない以外は全く同一の構成の比較例1,2の磁気
記録媒体を製造し、同様な試験を行った結果を表2に並
記した。
[Examples 1 and 2 and Comparative Examples 1 and 2]: An amorphized film (Si film + C film), a base film, a magnetic film, and a protective film are sequentially formed on a nonmagnetic substrate by a normal sputtering method. A magnetic recording medium of Examples 1 and 2 was manufactured by forming a film and applying a perfluoropolyether lubricant on the uppermost surface, and B-shift was measured as an index of high density, and the results are shown in Table 2. still,
Table 1 shows the composition of the non-magnetic substrate and various films. The B-shift measurement conditions were a thin film head having a gap length of 0.35 μm and a track width of 6.9 μm, and a flying height of 2.5 microinches and a radius of 20 mm. The modulation code is M.I. F. M. The recording pattern was evaluated by B6D9. On the other hand, as for the magnetic characteristics, a 7 mm square sample was cut out from each disk, and coercive force (Hc), remanent magnetization * film thickness (Br
δ) and squareness ratio (S * ) were measured. In Table 1, the film forming temperatures of various films are measured by a radiation thermometer, and the amorphous film is set to room temperature or 100 ° C. or lower, and the undercoat film is set to 100 to 600 ° C., preferably The temperature was set to 200 to 500 ° C. For the magnetic film, preheating at the time of depositing the base film was used. Further, the magnetic recording media of Comparative Examples 1 and 2 having the same structure except that the amorphized film was not provided were manufactured, and the same test was performed.

【0015】[0015]

【表1】 [Table 1]

【0016】[0016]

【表2】 [Table 2]

【0017】[実施例3,4及び比較例3,4];磁性
層をCo81Cr13Pt6 膜450Åに代えた以外は、前
記実施例1,2と全く同様に実施例3,4の磁気記録媒
体を製造し、同様な試験を行った結果を表3に示した。
さらに、非晶質化膜を設けない以外は全く同一の構成の
比較例3,4の磁気記録媒体を製造し、同様な試験を行
った結果を表3に並記した。
[Examples 3 and 4 and Comparative Examples 3 and 4] The same as Examples 1 and 2 except that the Co 81 Cr 13 Pt 6 film 450Å was used as the magnetic layer. Table 3 shows the results of manufacturing the magnetic recording medium and performing the same test.
Further, magnetic recording media of Comparative Examples 3 and 4 having the same structure except that the amorphized film was not provided were manufactured, and the same test was performed.

【0018】[0018]

【表3】 [Table 3]

【0019】[0019]

【発明の効果】以上説明したように、本発明の磁気記録
媒体は、高密度記録に適した磁気特性を有するものであ
る。
As described above, the magnetic recording medium of the present invention has magnetic characteristics suitable for high density recording.

【0020】また、Si膜とC膜とにより非晶質化され
た膜が非磁性基板との密着性を向上させると共に非磁性
基板からのガスまたはイオンの拡散を防止し、しかも非
晶質化膜が下地膜と接することになるので、下地膜及び
磁性膜をその性能を発揮できる形で積層させたものとな
る。
Further, the film amorphized by the Si film and the C film improves the adhesion to the non-magnetic substrate, prevents gas or ions from diffusing from the non-magnetic substrate, and is amorphized. Since the film comes into contact with the base film, the base film and the magnetic film are laminated in a form capable of exhibiting their performance.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の磁気記録媒体を模式的に示す断面図で
ある。
FIG. 1 is a sectional view schematically showing a magnetic recording medium of the present invention.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 非磁性基板、下地膜、磁性膜、保護膜及
び潤滑膜を基本構成とする磁気記録媒体であって、非磁
性基板と下地膜との間に、非磁性基板側に成膜したSi
膜により非晶質化したC膜を介在させてなることを特徴
とする磁気記録媒体。
1. A magnetic recording medium having a non-magnetic substrate, a base film, a magnetic film, a protective film and a lubricating film as a basic structure, which is formed between a non-magnetic substrate and a base film on the non-magnetic substrate side. Done Si
A magnetic recording medium comprising a C film which is made amorphous by a film.
【請求項2】 非磁性基板がガラスまたはカーボン系基
板である請求項1に記載の磁気記録媒体。
2. The magnetic recording medium according to claim 1, wherein the non-magnetic substrate is a glass or carbon-based substrate.
【請求項3】 下地膜がCrを主成分とする請求項1ま
たは2記載の磁気記録媒体。
3. The magnetic recording medium according to claim 1, wherein the underlayer film contains Cr as a main component.
【請求項4】 非磁性基板上に、Si膜とC膜とを成膜
させることにより、非磁性基板側のSi膜から非晶質化
した膜を形成させ、上記非晶質化した膜の表面に下地
膜、磁性膜、保護膜及び潤滑膜を成膜するようにしたこ
とを特徴とする磁気記録媒体の製造方法。
4. An amorphous film is formed from the Si film on the non-magnetic substrate side by forming a Si film and a C film on the non-magnetic substrate. A method of manufacturing a magnetic recording medium, characterized in that a base film, a magnetic film, a protective film, and a lubricating film are formed on the surface.
JP23726293A 1993-08-31 1993-08-31 Magnetic recording medium and its production Pending JPH0773435A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23726293A JPH0773435A (en) 1993-08-31 1993-08-31 Magnetic recording medium and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23726293A JPH0773435A (en) 1993-08-31 1993-08-31 Magnetic recording medium and its production

Publications (1)

Publication Number Publication Date
JPH0773435A true JPH0773435A (en) 1995-03-17

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP23726293A Pending JPH0773435A (en) 1993-08-31 1993-08-31 Magnetic recording medium and its production

Country Status (1)

Country Link
JP (1) JPH0773435A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5731070A (en) * 1995-12-20 1998-03-24 Showa Denko Kabushiki Kaisha Magnetic recording medium comprising a substrate, magnetic layer, and under layers including a silicon layer and a layer diffused with silicon

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04247323A (en) * 1991-02-01 1992-09-03 Nippon Sheet Glass Co Ltd Production of magnetic recording medium

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04247323A (en) * 1991-02-01 1992-09-03 Nippon Sheet Glass Co Ltd Production of magnetic recording medium

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5731070A (en) * 1995-12-20 1998-03-24 Showa Denko Kabushiki Kaisha Magnetic recording medium comprising a substrate, magnetic layer, and under layers including a silicon layer and a layer diffused with silicon
US5914152A (en) * 1995-12-20 1999-06-22 Showa Denko Kabushiki Kaisha Magnetic recording medium and process for making same

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