JPH0770186B2 - Method of polishing air bearing surface of slider of magnetic head - Google Patents

Method of polishing air bearing surface of slider of magnetic head

Info

Publication number
JPH0770186B2
JPH0770186B2 JP62263977A JP26397787A JPH0770186B2 JP H0770186 B2 JPH0770186 B2 JP H0770186B2 JP 62263977 A JP62263977 A JP 62263977A JP 26397787 A JP26397787 A JP 26397787A JP H0770186 B2 JPH0770186 B2 JP H0770186B2
Authority
JP
Japan
Prior art keywords
slider
polishing
air bearing
bearing surface
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62263977A
Other languages
Japanese (ja)
Other versions
JPH01107309A (en
Inventor
千博 磯野
政則 荒屋敷
正雄 伊藤
幸二 竹下
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62263977A priority Critical patent/JPH0770186B2/en
Publication of JPH01107309A publication Critical patent/JPH01107309A/en
Publication of JPH0770186B2 publication Critical patent/JPH0770186B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、磁気ディスク装置に使用される磁気ヘッドの
浮上面を高精度の平面に加工するのに好適な浮上面の研
摩方法に関する。
The present invention relates to an air bearing surface polishing method suitable for processing the air bearing surface of a magnetic head used in a magnetic disk device into a highly accurate flat surface.

〔従来の技術〕[Conventional technology]

近年、磁気ディスク装置は記録密度の増加に伴ない、磁
気ディスク面に対する磁気ヘッドの浮上量が増々狭小化
する傾向にある。このように磁気ヘッドの浮上量を狭小
化するためには、第9図に示すように、磁気ディスク面
上に微小な間隙をもって浮上する磁気ヘッドHの浮上面
の平面度を高精度に加工することが必要である。
In recent years, as the recording density of magnetic disk devices has increased, the flying height of the magnetic head with respect to the magnetic disk surface has tended to become narrower. In order to narrow the flying height of the magnetic head in this way, as shown in FIG. 9, the flatness of the floating surface of the magnetic head H, which floats above the surface of the magnetic disk with a minute gap, is processed with high precision. It is necessary.

そのため、一般には、第10図に示すように、上面である
研摩面1′が真平らに形成された円板形状のラップ定盤
1を駆動軸2に取付け、そのラップ定盤1の研摩面1′
に、ワーク貼付け治具3に貼付けられた磁気ヘッドのス
ライダー4と修正輪5とを載せ、ラップ定盤1を駆動軸
2によって回転させかつ修正輪5及びワーク貼付け治具
3を支持軸6によって回転させて、修正輪5,スライダー
4とラップ定盤1とが互に擦り合うことにより、ラップ
定盤1がスライダー4の浮上面を高精度の平面に加工
し、かつ修正輪5がスライダー4の加工によって摩耗し
たラップ定盤1の平面度を修正するようにしている。し
かし、このような磁気ヘッド用研摩装置では、ラップ定
盤1の定位置にスライダー4及び修正輪5があるため、
ラップ定盤1が使用することによって摩耗し、所望精度
を維持するのが困難になる結果、スライダー4の浮上面
の精度が低下する。
Therefore, generally, as shown in FIG. 10, a disc-shaped lapping plate 1 having a polishing surface 1 ′ which is an upper surface formed flat is attached to a drive shaft 2, and the lapping plate 1 has a polishing surface. 1 '
, The slider 4 of the magnetic head and the correction wheel 5 attached to the work attaching jig 3 are placed, the lap surface plate 1 is rotated by the drive shaft 2, and the correction wheel 5 and the work attaching jig 3 are moved by the support shaft 6. The lap surface plate 1 processes the air bearing surface of the slider 4 into a highly precise flat surface by rotating the correction wheel 5, the slider 4 and the lap surface plate 1 to rub each other, and The flatness of the lap surface plate 1 worn by the processing of 1 is corrected. However, in such a polishing apparatus for a magnetic head, since the slider 4 and the correction wheel 5 are located at a fixed position on the lapping plate 1,
The use of the lap surface plate 1 causes wear and makes it difficult to maintain desired accuracy, and as a result, the accuracy of the air bearing surface of the slider 4 decreases.

この対策として複数の従来技術がある。即ち、第1の従
来技術では、第11図に示すようにラップ定盤1の研摩面
1′が外周部から中央部にかけて直線的に高くなる形状
とし、修正輪5を重心移動して研摩面1′上の中央部に
移動させ、或いは第12図に示すように研摩面1′の外周
部が中央部から直線的に高い形状とし、修正輪5を同様
にしてラップ定盤1上の外周部に移動させ、かくしてラ
ップ定盤1の高い部分を摩耗させて修正するようにして
いる。
There are a plurality of conventional techniques as measures against this. That is, in the first prior art, as shown in FIG. 11, the lapping surface 1'of the lapping plate 1 has a shape which linearly rises from the outer peripheral portion to the central portion, and the correction wheel 5 is moved to the center of gravity to polish the lapping surface. 1 ', or as shown in FIG. 12, the outer peripheral portion of the polishing surface 1'is linearly higher than the central portion, and the correction wheel 5 is similarly outer peripheral on the lapping plate 1. The lap surface plate 1 is thus worn out and corrected.

また第2の従来技術では、第13図に示すように、ラップ
定盤1の中央部と外周部とにまたがる大型の修正輪5を
使用し、その修正輪5におけるラップ定盤1の中央部及
び外周部と対応する位置にリンク機構8を介して錘り7,
7を夫々載せ、該錘り7,7によって修正輪5の重心位置を
変えることによりラップ定盤1の平面度を修正するよう
にしている。なお、この種の装置として関連するものに
は、例えば特開昭59−81056号公報が挙げられる。
Further, in the second conventional technique, as shown in FIG. 13, a large correction wheel 5 extending over the central portion and the outer peripheral portion of the lap surface plate 1 is used, and the center portion of the lap surface plate 1 in the correction wheel 5 is used. And the weight 7 through the link mechanism 8 at a position corresponding to the outer peripheral portion,
The weights 7 and 7 are mounted on the lap surface 1 and the flatness of the lapping plate 1 is corrected by changing the center of gravity of the correction wheel 5. As a device related to this type, there is, for example, JP-A-59-81056.

〔発明が解決しようとする問題点〕[Problems to be solved by the invention]

ところで、磁気ヘッドの浮上量を狭小化しようとする
と、例えば0.2〜0.3μmの浮上量が要請されると、その
浮上量を得るには第14図に示す磁気ヘッド浮上量と磁気
ヘッドのスライダー平面度との関係からスライダーの浮
上面の平面度を0.05μm以下と云う超高精度に加工しな
ければならない。
By the way, when the flying height of the magnetic head is narrowed, for example, when a flying height of 0.2 to 0.3 μm is requested, in order to obtain the flying height, the flying height of the magnetic head shown in FIG. The flatness of the air bearing surface of the slider must be machined with an extremely high precision of 0.05 μm or less from the relationship with the degree.

しかし、上記に示す第11図及び第12図,第13図に示す従
来技術は、何れもラップ定盤1の研摩面1′の平面度を
正確に修正しようとするためのものであるが、スライダ
ーの浮上面の加工精度とラップ定盤1の形状との関係に
ついて配慮されていない。
However, the prior arts shown in FIGS. 11 and 12 and FIG. 13 are all for accurately correcting the flatness of the polishing surface 1 ′ of the lapping plate 1. No consideration is given to the relationship between the processing accuracy of the air bearing surface of the slider and the shape of the lapping plate 1.

また、何れの従来技術でも、ラップ定盤1が外周部から
中央部に亘り略直線状の平面形状となっているが、この
ような形状のラップ定盤1を用いて0.05μm以下のスラ
イダーの浮上面の平面度を得ようとすると、ラップ定盤
1の研摩面の修正作業を試行さく誤を繰返して行なわな
ければならず、非常に長い修正時間を要し、場合によっ
ては不可能なこともあり、そのため、研摩装置の稼動率
が著しく低下する問題があり、また、ラップ定盤1を直
線状の平面に修正することができても、磁気ヘッド浮上
面の加工精度にばらつきが生じる結果、歩留りが低下す
ると云う問題がある。
Further, in any of the conventional techniques, the lap surface plate 1 has a substantially linear planar shape from the outer peripheral portion to the central portion. However, by using the lap surface plate 1 having such a shape, a slider of 0.05 μm or less can be formed. In order to obtain the flatness of the air bearing surface, it is necessary to repeat the mistake of trying to correct the polished surface of the lapping plate 1, which requires a very long correction time, which is impossible in some cases. Therefore, there is a problem that the operating rate of the polishing apparatus is significantly reduced, and even if the lapping platen 1 can be corrected to a linear plane, the machining accuracy of the air bearing surface of the magnetic head varies. However, there is a problem that the yield decreases.

本発明の目的は、前記従来技術の問題点に鑑み、研摩面
の形状を規定し、以てヘッドスライダーの浮上面の要求
加工精度を容易に得ることができるとともに、機械稼動
率を向上し得る磁気ヘッドのスライダーの浮上面の研摩
方法を提供することにある。
In view of the above-mentioned problems of the prior art, an object of the present invention is to define the shape of the polished surface so that the required processing accuracy of the air bearing surface of the head slider can be easily obtained and the machine operating rate can be improved. Another object of the present invention is to provide a method of polishing an air bearing surface of a slider of a magnetic head.

〔問題点を解決するための手段〕[Means for solving problems]

本発明では、ラップ定盤の研摩面が、ラップ定盤及び磁
気ヘッドのスライダーの大きさと該スライダーの浮上面
に要求される平面図に基づき適宜の曲率をもつとともに
研摩面の外周部と中央部とを結ぶ直線に対してスライダ
ーと接触し得る範囲の最も高い部分である有効研摩部の
肉厚寸法を適宜に設定した円弧状に形成されたラップ定
盤を軸周りに回転し、該回転するラップ定盤の研摩面に
対し、該研摩面における前記有効研摩部にスライダーの
浮上面の中心部を位置させながらスライダーと修正輪と
の底面を押圧するとともに、該スライダーと修正輪との
双方をスライダー浮上面の中心部周りに回転させること
により、スライダーの浮上面を平面に研摩する一方、修
正輪によりラップ定盤の研摩面を修正するようにしてい
る。
In the present invention, the polishing surface of the lapping plate has an appropriate curvature based on the size of the lapping plate and the slider of the magnetic head and the plan view required for the air bearing surface of the slider, and the outer peripheral portion and the central portion of the polishing surface. The lap surface plate formed in an arc shape in which the wall thickness dimension of the effective polishing portion, which is the highest portion that can contact the slider with respect to the straight line connecting the With respect to the polishing surface of the lapping plate, while pressing the bottom surface of the slider and the correction wheel while locating the center of the air bearing surface of the slider at the effective polishing portion of the polishing surface, both the slider and the correction wheel are pressed. By rotating around the center of the slider air bearing surface, the air bearing surface of the slider is polished to a flat surface, while the polishing surface of the lapping plate is corrected by a correction wheel.

〔作 用〕[Work]

磁気ヘッドのスライダーの研摩においては、該スライダ
ーがラップ定盤の研摩面上の定位置で回転するため、ス
ライダーとラップ定盤とが常時接触していなければなら
ず、そのため、ラップ定盤の研摩面が第8図に示すよう
に、I−Xの如き円弧状のもの、II−Yの如き真平らの
もの、III−Zの如き陥没円弧状のものが種々考えられ
る。しかし、II−Yの如き真平らのものはその形状を保
ち続けることが実用上不可能であり、またIII−Zの如
き陥没円弧状のものは、研摩時、研摩面の外周部から摩
耗し、その形状を保ち続けることが難しい。
In polishing a slider of a magnetic head, the slider rotates at a fixed position on the polishing surface of the lapping plate, so that the slider and the lapping plate must be in constant contact with each other. As shown in FIG. 8, various surfaces such as arcuate ones such as IX, true flat ones such as II-Y, and depressed arcuate ones such as III-Z can be considered. However, it is practically impossible to keep the shape of a flat surface such as II-Y, and a concave arc shape such as III-Z is worn from the outer peripheral portion of the polishing surface during polishing. , It is difficult to keep its shape.

本発明では、前述の如く、ラップ定盤の研摩面が該ラッ
プ定盤及び磁気ヘッドのスライダーの大きさと該スライ
ダーの浮上面に要求される平面度に基づき適宜の曲率を
もつとともに、外周部と中央部とを結ぶ直線上の途中位
置に最も高い部分(有効研摩部r)の高さをもつ円弧状
に形成され、このラップ定盤を軸周りに回転し、該回転
するラップ定盤の研摩面に対し、該研摩面における最も
い高い部分にスライダーの浮上面の中心部を位置させた
状態で該スライダーと修正輪とを押圧し乍ら、かつスラ
イダ浮上面の中心部の周りに回転させるので、研摩時、
ラップ定盤とスライダーとが常時接触し、ラップ定盤が
研摩面をスライダーの浮上面に転写させる如くスライダ
ーの浮上面を研摩することができる結果、スライダーの
浮上面をその要求精度に確実に加工し得、しかも安定し
た加工精度が得られる。また、研摩面が円弧状に形成さ
れることにより、研摩面の修正作業を容易に行なうこと
が可能になり、研摩装置の稼動率が低下するのを防止し
得ると云う結果がある。
In the present invention, as described above, the polishing surface of the lapping plate has an appropriate curvature based on the size of the lapping plate and the slider of the magnetic head and the flatness required for the air bearing surface of the slider, and the outer peripheral portion It is formed in an arc shape having the height of the highest portion (effective polishing portion r) at a midpoint on a straight line connecting to the central portion, and this lap surface plate is rotated around an axis to polish the rotating lap surface plate. With respect to the surface, the slider and the correction wheel are pressed while the center of the air bearing surface of the slider is positioned at the highest point of the polished surface, and the slider is rotated around the center of the air bearing surface of the slider. So when polishing,
The lapping platen and the slider are in constant contact, and the lapping platen can polish the slider's air bearing surface so that the lapping surface is transferred to the slider's air bearing surface. As a result, the slider's air bearing surface can be machined to the required accuracy. And stable processing accuracy can be obtained. Further, since the polishing surface is formed in an arc shape, it is possible to easily perform the work of correcting the polishing surface, and it is possible to prevent a decrease in the operating rate of the polishing device.

〔実施例〕〔Example〕

以下、本発明の一実施例を第1図乃至第7図により説明
する。第1図は本発明の研摩方法の一実施例を示す一部
断面の斜視図、第2図は本発明の研摩方法に用いるラッ
プ定盤を示す一部断面の斜視図、第13図はラップ定盤の
形状を示す説明図、第4図は第3図におけるラップ定盤
とヘッドスライダーとの関係を示す説明図である。
An embodiment of the present invention will be described below with reference to FIGS. 1 to 7. 1 is a perspective view of a partial cross section showing an embodiment of the polishing method of the present invention, FIG. 2 is a perspective view of a partial cross section of a lapping plate used in the polishing method of the present invention, and FIG. 13 is a lap. FIG. 4 is an explanatory view showing the shape of the surface plate, and FIG. 4 is an explanatory view showing the relationship between the lap surface plate and the head slider in FIG.

この研摩方法の実施例は、第1図に示すように、回転さ
れたラップ定盤11の研摩面11′に、磁気ヘッドのスライ
ダー14を押圧し乍らかつ研摩面11′の定位置で回転さ
せ、研摩面11′によりスライダー14の浮上面を研摩する
ようにしている。
In this embodiment of the polishing method, as shown in FIG. 1, the slider 14 of the magnetic head is pressed against the polishing surface 11 'of the rotated lapping plate 11 and rotated at a fixed position of the polishing surface 11'. Then, the air bearing surface of the slider 14 is polished by the polishing surface 11 '.

前記ラップ定盤11は、その中央部が取付けボルト等によ
って駆動軸12に取付けられ、該駆動軸12の駆動により軸
周りに回転するようにしている。前記磁気ヘッドのスラ
イダー14は、修正輪15の内方位置に配置されたワーク貼
付け治具13に取付けられて、その浮上面がラップ定盤11
の研磨面11′上の定位置に配置され、ラップ定盤11の回
転時、該ラップ定盤の11の研摩面11′に対し浮上面が押
圧されるとともに研摩面11′の定位置で回転され、浮上
面が研摩面11′と擦り合うことによって研摩されるよう
にしている。なお、前記スライダー14は、研摩時、複数
個のものが一体となってブロック化されたももで同時に
研摩され、その研摩後、各々切断され、かつ所望形状に
形成されるとともに組付け及び配線されることにより磁
気ヘッドを構成する。
The central portion of the lap surface plate 11 is attached to the drive shaft 12 by a mounting bolt or the like, and the drive shaft 12 is driven to rotate about the axis. The slider 14 of the magnetic head is attached to the work attaching jig 13 arranged at the inner position of the correction wheel 15, and the air bearing surface of the slider 14 is attached to the lapping plate 11.
Is placed at a fixed position on the polishing surface 11 'of the lapping plate, and when the lapping plate 11 rotates, the air bearing surface is pressed against the polishing surface 11' of the lapping plate 11 and the lapping plate 11 'rotates at the fixed position. The air bearing surface is rubbed against the polishing surface 11 'for polishing. When the slider 14 is polished, a plurality of sliders are integrally polished into a block, and the slider 14 is simultaneously polished, and after the polishing, each slider is cut into a desired shape and assembled and wired. By doing so, a magnetic head is constructed.

前記修正輪15は、その上部が支持軸16に取付けられると
ともに、その下部に形成された凹部にブロック化された
スライダー14を貼付けたワーク貼付け治具を配置し、支
持軸16の駆動により前記ワーク貼付け治具13を介しブロ
ック化されたスライダー14を回転させるようにしてい
る。またその際、前記修正輪15はその下端面がラップ定
盤11の研摩面11′と擦り合うことにより、該研摩面11′
を所望形状に修正し得るようにしている。
The correction wheel 15 has an upper portion attached to the support shaft 16, and a work attaching jig having a slider 14 attached to a block is placed in a recess formed in the lower portion thereof. The slider 14 which is made into a block is rotated via the attachment jig 13. Further, at this time, the lower end surface of the correction wheel 15 rubs against the polishing surface 11 'of the lapping plate 11 so that the polishing surface 11'
To be modified into a desired shape.

しかして、実施例においては、その研摩面11′が第2図
乃至第4図に示すように、適宜の曲率をもつ円弧状に形
成されている。即ち、前記ラップ定盤11の研摩面11′
は、ラップ定盤11の大きさ及びスライダー14の大きさ
と、スライダー14の浮上面に要求される平面度とに基づ
き、所望の曲率Rをもつとともに、その外周部と中央部
との間に適宜の高さyをもつ円弧状に形成され、しかも
該円弧面の外周部と中央部とを結ぶ直線に対しスライダ
ー14と接触する範囲の最も高い部分である有効研摩部r
までの肉厚寸法Δrを適宜に設定している。前記有効研
摩部rにはブロック化されたスライダー14の浮上面の中
心部が位置するのが望ましい。
Thus, in the embodiment, the polishing surface 11 'is formed in an arc shape having an appropriate curvature as shown in FIGS. That is, the polishing surface 11 'of the lapping plate 11
Has a desired curvature R based on the size of the lapping plate 11 and the size of the slider 14, and the flatness required for the air bearing surface of the slider 14, and is appropriately between the outer peripheral portion and the central portion. Of the effective polishing portion r which is formed in an arc shape having a height y of 1 and has the highest contact area with the slider 14 with respect to a straight line connecting the outer peripheral portion and the central portion of the arc surface.
The wall thickness dimension Δr up to is set appropriately. It is desirable that the central portion of the air bearing surface of the slider 14 which is a block is located in the effective polishing portion r.

次に、前記ラップ定盤11及びスライダー14の大きさと、
該スライダー14の浮上面に要求される平面度の関係につ
いて述べる。
Next, the size of the lap platen 11 and the slider 14,
The relationship of flatness required for the air bearing surface of the slider 14 will be described.

まず、ラップ定盤11内の半径をl1、ラップ定盤11の研摩
面11′の幅をl2、球の半径をR、球の中心とラップの定
盤の最外周とを結んだ線の角度をθとすると、次式が成
り立つ。
First, the radius inside the lapping plate 11 is l 1 , the width of the polishing surface 11 ′ of the lapping plate 11 is l 2 , the radius of the sphere is R, and the line connecting the center of the sphere and the outermost periphery of the lapping plate Let θ be the angle of, then the following equation holds.

(l1+l2+(Rsinθ) =R2……(1) l1 2+(Rsinθ+y)=R2 ……(3) 上記式(1),(2),(3)より肉厚寸法Δrは次の
とおりとなる。
(L 1 + l 2 ) 2 + (Rsinθ) 2 = R 2 (1) l 1 2 + (Rsin θ + y) 2 = R 2 (3) From the above formulas (1), (2) and (3), the wall thickness dimension Δr is as follows.

また、ラップ定盤11の肉厚寸法Δrと、ブロック化され
たスライダー14の長手方向の長さDの平面度a及び短手
方向の長さCの平面度bとは次の関係となる。
Further, the wall thickness dimension Δr of the lapping plate 11 and the flatness a of the length D of the slider 14 in the longitudinal direction and the flatness b of the length C of the lateral direction have the following relationship.

上記式(4),(5),(6),(7)より、スライダ
ー14の浮上面に必要とされる平面度a,bの寸法により、
ラップ定盤11の曲率R,高さy,肉厚寸法Δrが求められ
る。
From the above formulas (4), (5), (6) and (7), according to the dimensions of the flatness a and b required for the air bearing surface of the slider 14,
The curvature R, the height y, and the wall thickness dimension Δr of the lapping plate 11 are obtained.

上記の如くして形成されたラップ定盤11を用いてスライ
ダー14を研摩すると、回転するラップ定盤の研摩面11′
が円弧状に形成され、しかも研摩面11′に対し、該研摩
面における最も高い部分に(有効研摩部r)にスライダ
ー14の浮上面の中心部を位置させた状態で該スライダー
14と修正輪15とを押圧し乍ら、かつスライダー浮上面の
中心部の周りに回転させるので、が円弧状に形成される
ことにより該研摩面11′にスライダー14の浮上面が常時
接触し、その浮上面に研摩面11′が転写される如くスラ
イダー14を加工することができるので、スライダー14の
浮上面をその要求精度に確実に研摩し得、しかも安定し
た加工精度が得られる。また、ラップ定盤11が上述の如
く円弧状に形成され、該研摩面11′における最も高いい
部分(有効研摩部r)にスライダー14の浮上面の中心部
が位置するように修正輪15をラップ定盤11に押圧しかつ
回転させるので、第8図に示すII−Y及びIII−Zの如
き真平らなものや陥没円弧状のものに比べ、修正輪15に
よる研真面11′の修正が簡単であって容易に修正作業を
行なうことが可能となり、それだけ研摩装置の稼動率が
低下するのを防止し得る。
When the slider 14 is polished using the lapping plate 11 formed as described above, the polishing surface 11 'of the rotating lapping plate 11'
Is formed in an arc shape, and the center of the air bearing surface of the slider 14 is located at the highest portion of the polishing surface 11 '(effective polishing portion r) with respect to the polishing surface 11'.
Since 14 and the correction wheel 15 are pressed and rotated around the center of the slider air bearing surface, the air bearing surface of the slider 14 is always in contact with the polishing surface 11 'by forming a circular arc shape. Since the slider 14 can be processed so that the polishing surface 11 'is transferred to the air bearing surface, the air bearing surface of the slider 14 can be surely ground to the required accuracy, and stable processing accuracy can be obtained. Further, the lapping plate 11 is formed in an arc shape as described above, and the correction wheel 15 is provided so that the center of the air bearing surface of the slider 14 is located at the highest portion (effective polishing portion r) of the polishing surface 11 '. Since the lapping plate 11 is pressed and rotated, the correction surface 15 is used to correct the polishing surface 11 ', as compared with a flat plate such as II-Y and III-Z shown in FIG. Since it is simple and the correction work can be easily performed, it is possible to prevent the operating rate of the polishing apparatus from decreasing.

因みに、ラップ定盤11の高さyが10μmの場合における
肉厚寸法Δrとスライダー14の浮上面の長手方向の平面
度との関係を第5図に示す。同図から、肉厚寸法Δrが
−2μm〜2μmぐらいのとき、スライダー14の平面度
が最小値になることがわかる。
Incidentally, FIG. 5 shows the relationship between the wall thickness dimension Δr and the flatness in the longitudinal direction of the air bearing surface of the slider 14 when the height y of the lapping plate 11 is 10 μm. From the figure, it can be seen that the flatness of the slider 14 has the minimum value when the wall thickness dimension Δr is about −2 μm to 2 μm.

また、ラップ定盤11の肉厚寸法Δrが1.5μmの場合に
おける高さyと単一のスライダー14の長手方向の平面度
との関係を第6図に示す。同図から、肉厚寸法Δrが1.
5μmの場合、高さyが略10μmにすると、スライダー1
4の浮上面の平面度が最小となり、高さyがそれより大
きく或いは小さくとも平面度が大きくなるので、高さy
を略10μmの寸法に保つことにより極めて高精度に加工
し得る。なお、第6図に示すスライダー14の長手方向と
は、単一のスライダー14のものであり、第4図に示すよ
うにブロック化されたスライダー14の短手方向に相当す
る。
Further, FIG. 6 shows the relationship between the height y and the flatness in the longitudinal direction of the single slider 14 when the wall thickness dimension Δr of the lapping plate 11 is 1.5 μm. From the figure, the wall thickness dimension Δr is 1.
In the case of 5 μm, if the height y is set to about 10 μm, the slider 1
Since the flatness of the air bearing surface of 4 becomes the minimum and the flatness becomes large even if the height y is larger or smaller than that, the height y
Can be processed with extremely high precision by keeping the dimension of about 10 μm. The longitudinal direction of the slider 14 shown in FIG. 6 refers to a single slider 14, and corresponds to the lateral direction of the slider 14 which is blocked as shown in FIG.

さらに、肉厚寸法Δrが1.5μmの場合における高さy
とスライダー14の加工能率との関係を第7図に示す。同
図から、高さyが略10μmのときにスライダー14対する
加工能率が高く、その高さyを管理すれば、研摩作業の
高能率化を図り得ることがわかる。
Furthermore, the height y when the wall thickness dimension Δr is 1.5 μm
The relationship between the machining efficiency of the slider 14 and the machining efficiency of the slider 14 is shown in FIG. From the figure, it is understood that when the height y is approximately 10 μm, the machining efficiency with respect to the slider 14 is high, and if the height y is managed, the efficiency of the polishing work can be improved.

図示実施例では、ラップ定盤11の径が一般的な12インチ
(約305mm)の場合、高さyを15μm、肉厚寸法Δrを
2μmにすることにより、スライダー14の浮上面の平面
度を0.05gμm以下に達成できることが確認されたが、
それらはラップ定盤11及びスライダー14の大きさや該ス
ライダー14の浮上面に要求される平面度に応じ適宜に選
定されるのは勿論である。
In the illustrated embodiment, when the diameter of the lapping plate 11 is a general 12 inches (about 305 mm), the height y is set to 15 μm and the wall thickness dimension Δr is set to 2 μm, whereby the flatness of the air bearing surface of the slider 14 is set. It was confirmed that it can be achieved below 0.05gμm,
It goes without saying that they are appropriately selected according to the sizes of the lapping plate 11 and the slider 14 and the flatness required for the air bearing surface of the slider 14.

〔発明の効果〕〔The invention's effect〕

以上述べたように、本発明によれば、研摩面が、ラップ
定盤及びスライダーの大きさとスライダーの浮上面に要
求される平面度とに基づき所望の曲率をもち、かつ研摩
面の外周部と中央部とを結ぶ直線に対しスライダーと接
触し得る範囲の最も高い部分である有効研摩部の肉厚寸
法を適宜に設定した円弧状に形成されたラップ定盤を軸
周りに回転し、該回転するラップ定盤の研摩面に対し、
該研摩面における前記有効研摩部にスライダーの浮上面
の中心部を位置させながらスライダーと修正輪との底面
を押圧するとともに、該スライダーと修正輪との双方を
スライダー浮上面の中心部周りに回転させることによ
り、スライダーの浮上面を平面に研摩する一方、修正輪
によりラップ定盤の研摩面を修正するように構成したの
で、研摩時にはラップ定盤の研摩面にスライダーの浮上
面が常時接触し、その浮上面に研摩面が転写される如く
スライダーを加工し得る結果、スライダーの浮上面をそ
の要求精度に確実に研摩し得、しかも安定した加工精度
が得られる効果があり、またラップ定盤の研摩面を簡単
かつ確実に修正することができ、容易に修正作業を行う
ことができる結果、それだけ研摩装置の稼動率を向上し
得る効果がある。
As described above, according to the present invention, the polishing surface has a desired curvature based on the size of the lapping plate and the slider and the flatness required for the air bearing surface of the slider, and is the outer peripheral portion of the polishing surface. The lap surface plate formed in an arc shape in which the wall thickness dimension of the effective polishing portion, which is the highest portion that can contact the slider with respect to the straight line connecting the central portion, is appropriately set is rotated around the axis, and the rotation is performed. For the polished surface of the lapping plate
The bottom of the slider and the correction wheel is pressed while the center of the air bearing surface of the slider is positioned on the effective polishing portion of the polishing surface, and both the slider and the correction wheel are rotated around the center of the slider air bearing surface. By doing so, the air bearing surface of the slider is polished to a flat surface, and the polishing surface of the lap surface plate is corrected by the correction wheel, so the air bearing surface of the slider always contacts the polishing surface of the lap surface plate during polishing. As a result, the slider can be machined so that the polished surface is transferred to the air bearing surface, so that the air bearing surface of the slider can be surely ground to the required accuracy, and stable processing accuracy can be obtained. The polishing surface can be easily and surely corrected, and the correction work can be easily performed. As a result, the operating rate of the polishing apparatus can be improved.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明の研摩方法の一実施例を示す斜視図、第
2図は本発明の研摩方法に用いるラップ定盤を示す斜視
図、第3図はラップ定盤の形状を示す説明図、第4図は
第3図におけるラップ定盤とスライダーとの関係を示す
説明図、第5図はラップ定盤の肉厚寸法とスライダーの
浮上面の平面度との関係を示す説明図、第6図はラップ
定盤の高さとスライダーの浮上面の平面度との関係を示
す説明図、第7図はラップ定盤の高さとスライダーの加
工能率との関係を示す説明図、第8図はラップ定盤の種
々の形状を示す説明図、第9図(a),(b)は種々の
磁気ヘッドを示す斜視図、第10図は一般の研摩装置を示
す説明用斜視図、第11図乃至第13図は従来の研摩装置の
種々の例を示す説明図、第14図は磁気ヘッド浮上量とス
ライダーの浮上面の平面度との関係を示す説明図であ
る。 1,11……ラップ定盤、1′,11′……ラップ定盤の研摩
面、4,14……磁気ヘッドのスライダー、R……ラップ定
盤の曲率半径、y……ラップ定盤の研摩面の高さ。
FIG. 1 is a perspective view showing an embodiment of the polishing method of the present invention, FIG. 2 is a perspective view showing a lapping plate used in the polishing method of the present invention, and FIG. 3 is an explanatory view showing the shape of the lapping plate. FIG. 4 is an explanatory diagram showing the relationship between the lapping plate and the slider in FIG. 3, and FIG. 5 is an explanatory diagram showing the relationship between the wall thickness of the lapping plate and the flatness of the air bearing surface of the slider. 6 is an explanatory diagram showing the relationship between the height of the lapping plate and the flatness of the air bearing surface of the slider, FIG. 7 is an explanatory diagram showing the relationship between the height of the lapping plate and the machining efficiency of the slider, and FIG. Explanatory views showing various shapes of the lapping plate, FIGS. 9 (a) and 9 (b) are perspective views showing various magnetic heads, FIG. 10 is an explanatory perspective view showing a general polishing apparatus, and FIG. 13 to 13 are explanatory views showing various examples of the conventional polishing apparatus, and FIG. 14 shows the flying height of the magnetic head and the flying surface of the slider. Is an explanatory view showing the relationship between Mending. 1,11 …… lap surface plate, 1 ′, 11 ′ …… lap surface polishing surface, 4,14 …… magnetic head slider, R …… lap surface radius of curvature, y …… lap surface plate The height of the polished surface.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 竹下 幸二 神奈川県小田原市国府津2880番地 株式会 社日立製作所小田原工場内 (56)参考文献 特開 昭62−166958(JP,A) 実開 昭62−61019(JP,U) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Koji Takeshita 2880, Kozu, Odawara-shi, Kanagawa Inside the Odawara Plant, Hitachi Ltd. (56) References JP 62-166958 (JP, A) 61019 (JP, U)

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】回転するラップ定盤の研摩面に修正輪と該
修正輪の内部に配置される磁気ヘッドのスライダーの浮
上面とを押圧し乍ら回転させ、前記研摩面によりスライ
ダーの浮上面を研摩する研摩方法において、研摩面が、
ラップ定盤及びスライダーの大きさとスライダーの浮上
面に要求される平面度とに基づき所望の曲率をもち、か
つ研摩面の外周部と中央部とを結ぶ直線に対しスライダ
ーと接触し得る範囲の最も高い部分である有効研摩部の
肉厚寸法を適宜に設定した円弧状に形成されたラップ定
盤を軸周りに回転し、該回転するラップ定盤の研摩面に
対し、該研摩面における前記有効研摩部にスライダーの
浮上面の中心部を位置させながらスライダーと修正輪と
の底面を押圧するとともに、該スライダーと修正輪との
双方をスライダー浮上面の中心部周りに回転させること
により、スライダーの浮上面を平面に研摩する一方、修
正輪によりラップ定盤の研摩面を修正するようにしたこ
とを特徴とする磁気ヘッドのスライダーの浮上面の研摩
方法。
1. A lap surface of a rotating lapping plate is pressed against a polishing wheel and an air bearing surface of a slider of a magnetic head disposed inside the correction wheel to rotate the lap surface, and the air bearing surface of the slider is rotated by the polishing surface. In the polishing method for polishing a
It has the desired curvature based on the size of the lapping plate and slider and the flatness required for the air bearing surface of the slider, and is the most of the range that can contact the slider with respect to the straight line connecting the outer peripheral part and the central part of the polishing surface. The lap surface plate formed in an arc shape in which the wall thickness dimension of the effective polishing portion which is a high portion is appropriately set is rotated about an axis, and the effective surface of the polishing surface of the rotating lap surface plate is the effective surface of the polishing surface of the rotating lap surface plate. While arranging the center of the air bearing surface of the slider on the polishing portion, the bottom surface of the slider and the correction wheel is pressed, and both the slider and the correction wheel are rotated around the center of the slider air bearing surface, A method of polishing an air bearing surface of a slider of a magnetic head, characterized in that the air bearing surface is polished to a flat surface while a polishing wheel is used to correct the polishing surface of a lapping plate.
JP62263977A 1987-10-21 1987-10-21 Method of polishing air bearing surface of slider of magnetic head Expired - Lifetime JPH0770186B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62263977A JPH0770186B2 (en) 1987-10-21 1987-10-21 Method of polishing air bearing surface of slider of magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62263977A JPH0770186B2 (en) 1987-10-21 1987-10-21 Method of polishing air bearing surface of slider of magnetic head

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP15569796A Division JPH08329441A (en) 1996-06-17 1996-06-17 Polishing method of floating face of magnetic head slider

Publications (2)

Publication Number Publication Date
JPH01107309A JPH01107309A (en) 1989-04-25
JPH0770186B2 true JPH0770186B2 (en) 1995-07-31

Family

ID=17396840

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62263977A Expired - Lifetime JPH0770186B2 (en) 1987-10-21 1987-10-21 Method of polishing air bearing surface of slider of magnetic head

Country Status (1)

Country Link
JP (1) JPH0770186B2 (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53111594A (en) * 1977-02-23 1978-09-29 Fujitsu Ltd Method of mounting workpiece on holder
JPS60152133A (en) * 1984-01-19 1985-08-10 Onkyo Corp Fm receiver
JPS6261019U (en) * 1985-10-04 1987-04-15
JPS62166958A (en) * 1986-01-16 1987-07-23 Tohoku Metal Ind Ltd Surface plate for polishing concave face
JPH0664693B2 (en) * 1987-02-03 1994-08-22 株式会社日立製作所 Magnetic head manufacturing method

Also Published As

Publication number Publication date
JPH01107309A (en) 1989-04-25

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