JPH0763930B2 - Flat polishing equipment using polishing tape - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial field of use] The present invention allows a polishing head to perform high-cycle reciprocating linear motion within a very small range, while allowing an abrasive tape wound around a pressure roller to run at a low speed. The present invention relates to a flat surface polishing apparatus using a polishing tape having a structure in which a pressure contact roller is brought into pressure contact with an object to be polished to perform flat surface polishing with a delicate polishing amount.

[Conventional technology]

The method of constantly polishing with a new polishing tape by running the polishing tape wound around the pressure roller at a low speed is often used for rotary polishing, but not for flat polishing. .

In a polishing method using a polishing tape, in order to improve the polishing efficiency, it is necessary to increase the relative speed between the object to be polished and the polishing tape, but it is not possible to increase the running speed of the polishing tape so much. Therefore, the moving speed of the object to be polished must be increased.

In the case of rotary polishing, since the object to be polished is a cylinder, a disk, etc., it is possible to increase the relative speed between the object to be polished and the polishing tape by rotating the object to be polished. . On the other hand, in the case of flat surface polishing, it is generally difficult to reciprocate the object to be polished at high speed, so that the flat surface polishing using the polishing tape has not been performed so often.

Despite such circumstances, a polishing tape is used to polish a minute flat surface such as a part of an electronic component or an artificial jewel, and the polishing amount is 1 to 2 μm and the surface roughness is 1 μm or less. Has been developed, and its principle is shown in FIG.

In this flat surface polishing apparatus, a pressure roller mounting block B ₁ is slidably fitted in a slide rail 1 and one end of a lever 3 which rotates around a shaft 2 and a pressure roller mounting block B ₁ are connected to a connecting rod 4. And the other end of the lever 3 and the crank pin 6 eccentrically attached to the disc 5 are connected by the crank rod 7, and the rotation of the disc 5 causes the press contact roller attachment block B ₁ to be attached. The polishing head H'has a structure in which the attached pressing roller 8 is linearly reciprocated in a minute range.

The polishing tape 9 is wound around the pressure contact roller 8, the unused polishing tape 9 is fed out from the feeding roller 11 at a low speed, and the used polishing tape 9 is wound into the winding roller 12.
It is designed to be wound up on. On both sides of the pressure roller mounting block B ₁ represents, are respectively compression spring 13 is elastically mounted, thereby when the pressure roller mounting block B ₁ is carried out a reciprocating linear motion, it is to prevent rattling. Reference numeral 14 in the drawing denotes a guide roller for the polishing tape 9.

Then, when the disk 5 rotates at a high speed, the lever 3 makes a reciprocating arc motion about the shaft 2, and the reciprocating arc motion of the lever 3 is transmitted to the pressure roller mounting block B ₁ via the rod 4, The block B ₁ performs a high-cycle reciprocating linear motion within a minute range, and the polishing tape 9 wound around the pressure contact roller 8 runs at a low speed,
The object W to be polished is always ground flat by the new polishing tape 9.

Here, in order to increase the polishing efficiency, it is necessary to increase the cycle of the reciprocating linear movement of the pressure contact roller 8, but as this increases, the vibration of the polishing head H'part increases.

As described above, the amount of polishing in the planar polishing using the polishing tape 9 is as small as 1 to 2 μm, so that the vibration generated in the portion of the polishing head H ′ has a great influence on the polishing accuracy even if it is small. However, there is a problem in that the polishing accuracy is reduced due to this vibration.

[Problems to be Solved by the Invention]

SUMMARY OF THE INVENTION In view of the problems of the flat surface polishing apparatus using the polishing tape having the above-described structure, the present invention suppresses the vibration generated when the polishing head makes a high-cycle reciprocating linear motion within a minute range. Therefore, it is an object to make it possible to perform planar polishing with a polishing tape having a delicate polishing amount with high efficiency and high accuracy.

[Means for Solving the Problems]

Means adopted by the present invention to solve the above problems is such that a pressure roller mounting block having a pressure roller mounted thereon is slidably fitted to a slide rail, and a drive mechanism allows the pressure roller mounting block to operate at high cycle within a minute range. Having a polishing head configured to make a reciprocating linear motion, while running the polishing tape wound around the pressure roller at a low speed,
In a planar polishing device that uses a polishing tape that performs planar polishing by pressing the pressure roller against the object to be polished, two blocks, a pressure roller mounting block and a damping block, which have the same mass, slide on a common slide rail. The two blocks are fitted to each other by a tuning drive mechanism so that the two blocks are tuned to perform reciprocating linear movements in opposite directions within a minute range.

[Operation of the invention]

Two blocks, a pressure contact roller mounting block and a damping block, which have the same mass, are slidably fitted on a common slide rail, and by a tuning drive mechanism,
The two blocks are tuned to perform reciprocal linear movement in opposite directions within a very small range.

Since the masses of the two blocks fitted to the common slide rail are equal, when the two blocks are tuned to perform reciprocating linear motion within a minute range by the tuning drive mechanism,
The magnitudes of the inertial forces of both blocks during movement are always equal, and the directions are opposite.

Therefore, the inertial force generated by the reciprocating linear motion of both blocks is canceled out, and almost no vibration is generated in the polishing head portion.

For this reason, the pressure contact roller can be reciprocally linearly moved in a high cycle to perform flat surface polishing, and the flat surface polishing with a small polishing amount can be performed with high efficiency and high accuracy.

〔Example〕

1 to 6 show a flat polishing apparatus according to the present invention. The same parts as those described in the above-mentioned "Prior Art" are denoted by the same reference numerals, and repeated description will be avoided, and only characteristic parts of the present invention will be described.

In FIGS. 1 to 3, on the upper surface of the head portion 15,
A table 16 that moves in both X and Y directions that are orthogonal to each other in a horizontal plane is provided, and on the side surface of the column portion 17,
A head portion 18 is mounted so as to be able to move up and down.

A polishing head H is attached to the bottom of the head portion 18,
On the front surface of the head portion 18, a feeding roller 11 and a winding roller are provided.
12 is installed. By operating the handle 19 and slightly moving the head portion 18 up and down, the cut amount during polishing is adjusted.

Details of the polishing head H are shown in FIGS. 4 to 6.

Two blocks, a pressure contact roller mounting block B ₁ and a vibration damping block B ₂ having the same mass are slidably fitted into the slide rail 1. One end of the lever 3 that makes a reciprocating arc motion around the shaft 2 and the pressure contact roller mounting block B ₁ are connected by the connecting rod 4, and the other end of the lever 3 and the damping block B ₂ are connected. Are connected by a connecting rod 21.

A crank pin 6 is eccentrically attached to the disc 5 with respect to the rotary shaft 22, and the rotary shaft 22 of the disc 5 is supported by a bearing box 23. Are rotated by the drive motor 24. The crank pin 6 attached to the disc 5, the lever 3 and one end are connected by a crank rod 7.

Therefore, when the disk 5 is rotated at a high speed by the drive motor 24, the crank rod 7 causes the lever 3 to make a reciprocating circular motion in a high cycle, whereby the pressing roller mounting block B ₁ and the damping block B ₂ are synchronized. Then, the reciprocating linear motion is performed in the opposite direction within a very small range. Since the masses of both blocks B ₁ and B ₂ are equal, when both blocks B ₁ and B ₂ perform the above-described high cycle reciprocating linear motion within a minute range, both blocks B ₁ and B ₂ during motion The magnitude of the inertial force is always the same, and the directions are opposite. Therefore, the inertial force generated by the reciprocating linear motion of both blocks B ₁ and B ₂ is canceled out, and almost no vibration is generated in the portion of the polishing head H.

A polishing tape 9 is wound around the pressure contact roller 8, and the polishing tape 9 is fed from a feeding roller 11 and wound on a winding roller 12. The polishing tape 9 is running at a low speed, and the object W to be polished is always polished flat by the new polishing tape 9.

As shown in FIG. 4, the polishing tape 9 is wound,
When the pressure contact roller 8 performing a high-cycle reciprocating linear motion within a minute range is pressed against the object W to be polished and the object W to be polished is slowly fed in the direction of arrow P, most of the vibration occurs in the polishing head H. Therefore, the surface to be polished Wa of the object to be polished W is flatly polished with high accuracy.

In the above embodiment, the tuning drive mechanism for synchronizing the two blocks B ₁ and B ₂ fitted in the common slide rail 1 to perform the reciprocating linear motion in the opposite direction is provided with the lever 3 and the crank rod. However, the present invention is not limited to this.

〔The invention's effect〕

The present invention is a pressure contact roller mounting block of equal mass,
Two blocks, a damping block, are slidably fitted to a common slide rail, and a tuning drive mechanism has a polishing head with a structure in which both blocks are synchronized to perform reciprocating linear motion in opposite directions within a minute range. Therefore, the inertial forces of the two broke generated during the movement are canceled out, and the vibration of the polishing head portion is hardly generated.

Therefore, even if the pressure roller mounting block to which the pressure roller is mounted is moved back and forth in a straight line in a high cycle, the vibration in the polishing head portion is almost eliminated, and the polishing tape with a small amount of polishing enables highly efficient flat surface polishing. And it becomes possible to perform it with high precision.

[Brief description of drawings]

1 to 6 are views for explaining the present invention, and FIGS. 1 to 3 are respectively a front view, a side view and a plan view of a flat surface polishing apparatus according to the present invention, and FIG. The figure is
The perspective view of the portion of the polishing head H, and FIGS. 5 and 6 are a front view and a plan view of the portion of the polishing head H, respectively. FIG. 7 shows a polishing head H'in a conventional flat polishing apparatus.
It is a front view of the part. The explanation of the reference numerals of the main parts constituting the present invention is as follows. B ₁ : Pressure contact roller mounting block B ₂ : Vibration suppression block, H: Abrasive head W: Object to be abraded, Wa: Surface to be abraded 1: Slide rail 3: Lever (tuning drive mechanism) 4,21: Connecting rod (tuning drive) Mechanism) 7: Crank rod (tuning drive mechanism) 8: Pressure roller, 9: Abrasive tape

Claims (1)

[Claims] 1. A pressure roller mounting block having a pressure roller mounted thereon is slidably fitted to a slide rail.
The pressure contact roller mounting block has a polishing head configured to perform high-cycle reciprocating linear motion within a minute range by the drive mechanism, and while polishing tape wound around the pressure contact roller runs at low speed, the pressure contact roller is polished. In a flat polishing device that uses a polishing tape to perform flat polishing by pressing against an object, two blocks, a pressure roller mounting block and a damping block, which have the same mass, are slidably fitted to a common slide rail. A planar polishing apparatus using a polishing tape, characterized in that it has a polishing head configured such that two blocks are synchronized with each other by a tuning drive mechanism to perform reciprocating linear movements in opposite directions within a minute range.