JPH0762592A - Production of thin-film magnetic head - Google Patents
Production of thin-film magnetic headInfo
- Publication number
- JPH0762592A JPH0762592A JP5235399A JP23539993A JPH0762592A JP H0762592 A JPH0762592 A JP H0762592A JP 5235399 A JP5235399 A JP 5235399A JP 23539993 A JP23539993 A JP 23539993A JP H0762592 A JPH0762592 A JP H0762592A
- Authority
- JP
- Japan
- Prior art keywords
- product
- film
- magnetic
- ceramic substrate
- electroplating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electroplating Methods And Accessories (AREA)
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
- Hall/Mr Elements (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、薄膜磁気ヘッドの製造
方法に関し、更に詳しく述べると、薄膜磁気ヘッドを製
造する際に、セラミック基板上の製品部の外周にそれと
同等の形状のダミー部を形成することによって、電気め
っき法による磁性膜成膜の膜厚分布を良好にする方法に
関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a thin film magnetic head. More specifically, when manufacturing a thin film magnetic head, a dummy part having the same shape as the dummy part is formed on the outer periphery of a product part on a ceramic substrate. The present invention relates to a method for improving the film thickness distribution of a magnetic film formed by electroplating by forming the film.
【0002】[0002]
【従来の技術】ハードディスク用薄膜磁気ヘッドは、セ
ラミック基板(ウエハー:切断分離後にスライダとな
る)上に設ける上下2層の磁性膜(磁極パターン)をギ
ャップ膜で分離し、その間に磁界発生及び誘導電流ピッ
クアップ用のコイル膜を設ける構成となっている。セラ
ミック基板には、硬度が高く、セラミックスとしては電
気伝導度が高いAl2 O3 (酸化アルミニウム)とTi
C(炭化チタン)との混合セラミックスを用い、その表
面にAl2 O3 の保護層を設けたものを使用する。磁性
膜にはパーマロイ(FeNi合金)の薄膜が用いられ
る。薄膜形成方法としては、スパッタリング法あるいは
電気めっき法があるが、電気めっき法は室温付近の温度
で成膜できる利点がある。2. Description of the Related Art In a thin film magnetic head for a hard disk, two upper and lower magnetic films (magnetic pole patterns) provided on a ceramic substrate (wafer: a slider after cutting and separating) are separated by a gap film, and a magnetic field is generated and induced between them. A coil film for current pickup is provided. The ceramic substrate has high hardness, and Al 2 O 3 (aluminum oxide) and Ti which have high electric conductivity as ceramics.
A mixed ceramic with C (titanium carbide) is used, on the surface of which a protective layer of Al 2 O 3 is provided. A thin film of permalloy (FeNi alloy) is used for the magnetic film. As a thin film forming method, there are a sputtering method and an electroplating method, and the electroplating method has an advantage that a film can be formed at a temperature near room temperature.
【0003】電気めっき法では、次のようなウエハー処
理により磁極パターンを形成する。Al2 O3 −TiC
基板の表面にAl2 O3 の保護層を設けたセラミック基
板上に、蒸着法によって導電膜を形成し、主要磁性膜の
部分を形成すべくフォトレジストパターンを設ける。次
いで、電気めっき法により磁性膜(パーマロイ等)を形
成する。成膜した各製品部の磁性膜は、中央に薄膜磁気
ヘッドの磁極パターンとなる主要磁性膜があり、その両
側に電気めっき工程でヨークの機能を果たす不要磁性膜
がある形状である。フォトレジストパターンを除去し、
イオンミリング法(イオンビームエッチング法)により
磁性膜の無い部分の導電膜を除去する。そして、主要磁
性膜をフォトレジストパターンで覆って保護し、ウエッ
トエッチング法により不要磁性膜を除去する。その後、
フォトレジストパターンを除去する。In the electroplating method, a magnetic pole pattern is formed by the following wafer processing. Al 2 O 3 -TiC
A conductive film is formed by a vapor deposition method on a ceramic substrate having an Al 2 O 3 protective layer provided on the surface of the substrate, and a photoresist pattern is provided so as to form a main magnetic film portion. Then, a magnetic film (permalloy or the like) is formed by electroplating. The formed magnetic film of each product portion has a main magnetic film that serves as a magnetic pole pattern of the thin film magnetic head in the center, and has unnecessary magnetic films that function as a yoke in the electroplating process on both sides thereof. Remove the photoresist pattern,
The conductive film in the portion without the magnetic film is removed by the ion milling method (ion beam etching method). Then, the main magnetic film is covered with a photoresist pattern to be protected, and the unnecessary magnetic film is removed by a wet etching method. afterwards,
The photoresist pattern is removed.
【0004】図2に示すように、このような磁極パター
ンを有する製品部12が、1枚のほぼ円形状のセラミッ
ク基板10上に多数(例えば千個程度)規則的に配列形
成される。最終的には1行ずつダイシング・マシーンで
切断し、切断したバーにスライダとしての形状加工を施
した後、1個ずつに分離加工する。そのため、切断作業
及びスライダとしての形状加工作業が容易なように、図
示の如く、同じ形状の大きな矩形状のブロックでまとま
り、且つ切断した1本のバーに同数の製品部が存在する
ように製品部群を配置する。As shown in FIG. 2, a large number (for example, about 1,000) of product parts 12 having such a magnetic pole pattern are regularly arranged and formed on one substantially circular ceramic substrate 10. Finally, it is cut line by line with a dicing machine, and the cut bars are shaped as sliders, and then separated into individual pieces. Therefore, in order to facilitate the cutting work and the shape working work as a slider, as shown in the figure, the product is formed by a large rectangular block having the same shape, and the same number of product parts are present in one cut bar. Place groups.
【0005】従来技術では、セラミック基板上で、最終
的に製品部として切り出す部分のみに、磁極パターンを
有する製品部を形成していた。上記のように、切断作業
の効率を向上するため、同じ形状の大きな矩形状のブロ
ックでまとまるように製品部群を配置しているので、当
然、不要な部分として切り落とすそれら外周部分は、磁
極パターンの無い空白領域であった。In the prior art, the product portion having the magnetic pole pattern was formed only on the portion which is finally cut out as the product portion on the ceramic substrate. As described above, in order to improve the efficiency of the cutting work, the product groups are arranged so as to be grouped by a large rectangular block of the same shape. There was no blank area.
【0006】[0006]
【発明が解決しようとする課題】セラミック基板上に形
成した磁性膜の膜厚は、各磁極パターン(各製品部)で
均一にする必要がある。膜厚のばらつきは、製品部の品
質(特性)に直接影響を与えるからである。非常に大き
なセラミック基板に、電気めっき法によって多数の磁極
パターンを形成すると、どうしても周辺部と中央部で電
気めっきの条件が異なり、注意深く条件を設定しても、
磁性膜の膜厚分布のばらつきを小さくするのは難しい。The thickness of the magnetic film formed on the ceramic substrate must be uniform for each magnetic pole pattern (each product part). This is because the variation in film thickness directly affects the quality (characteristics) of the product part. If a large number of magnetic pole patterns are formed on a very large ceramic substrate by electroplating, the electroplating conditions will inevitably differ between the peripheral part and the central part, and even if the conditions are carefully set,
It is difficult to reduce the variation in the film thickness distribution of the magnetic film.
【0007】本発明の目的は、薄膜磁気ヘッドの製造に
おいて、電気めっき法による磁性膜の成膜をセラミック
基板上の全ての製品部について良好に行うことができ、
且つ各製品部の膜厚分布をより均一化できる方法を提供
することである。An object of the present invention is to enable good magnetic film formation by electroplating for all product parts on a ceramic substrate in the manufacture of a thin film magnetic head.
Further, it is to provide a method capable of making the film thickness distribution of each product part more uniform.
【0008】[0008]
【課題を解決するための手段】本発明は、セラミック基
板上に導電膜を形成し、その上にフォトレジストパター
ンを設けて電気めっき法により磁性膜を形成した後、不
要磁性膜の部分をウエットエッチング法により除去して
製品部となる多数の磁極パターンを配列形成する方法に
おいて、セラミック基板の外周近傍を除く部分に製品部
として切り出す部分を形成し、その全外周にわたって、
製品部と同等の形状のダミー部を形成する薄膜磁気ヘッ
ドの製造方法である。According to the present invention, a conductive film is formed on a ceramic substrate, a photoresist pattern is provided on the conductive film to form a magnetic film by electroplating, and then the unnecessary magnetic film is wetted. In a method of arraying and forming a large number of magnetic pole patterns to be a product portion by removing by etching, a portion to be cut out as a product portion is formed in a portion except the vicinity of the outer periphery of the ceramic substrate, and the entire outer periphery thereof is
This is a method of manufacturing a thin film magnetic head in which a dummy part having a shape similar to that of a product part is formed.
【0009】[0009]
【作用】従来技術で電気めっき法により磁性膜を形成す
る際の膜厚分布を調べると、外周側の製品部で膜厚変動
が大きいことが認められた。これは隣接部分に磁性膜パ
ターンの乱れている箇所を有する外周側の製品部と、隣
接部分全てに磁性膜パターンが規則的に配列されている
箇所の製品部(中央寄りの製品部)を比べると、電気め
っきを行う際の電流密度が異なるためと考えられる。そ
こで本発明のように、薄膜磁気ヘッドの製品部の外周部
分にも、製品部と同等の形状の磁極パターンをダミー部
として形成しておくと、このダミー部が製品部に対して
緩衝機能を果たし、製品部の膜厚分布は均一化される。When the film thickness distribution when the magnetic film is formed by the electroplating method according to the prior art is examined, it has been found that the film thickness variation is large in the product portion on the outer peripheral side. This compares the product part on the outer peripheral side that has a part where the magnetic film pattern is disturbed in the adjacent part with the product part (the part near the center) where the magnetic film pattern is regularly arranged in all the adjacent parts. And the current density when performing electroplating is different. Therefore, as in the present invention, when a magnetic pole pattern having a shape similar to that of the product portion is formed as a dummy portion also on the outer peripheral portion of the product portion of the thin film magnetic head, the dummy portion has a buffer function for the product portion. As a result, the film thickness distribution of the product part is made uniform.
【0010】[0010]
【実施例】図1は、本発明に係る製品部(磁極パター
ン)の配列状態の一実施例を示す説明図である。薄膜磁
気ヘッドの製造は、基本的には従来と同様の工程で行っ
てよい。Al2 O3 −TiC基板の表面にAl2 O3 の
保護層を設けたセラミック基板上に、蒸着法によって導
電膜を形成し、主要磁性膜の部分を形成すべくフォトレ
ジストパターンを設ける。次いで電気めっき法により磁
性膜(パーマロイ等)を形成する。成膜した各製品部の
磁性膜は、中央が薄膜磁気ヘッドの磁極パターンとなる
主要磁性膜であり、その両側が電気めっき工程でヨーク
の機能を果たす不要磁性膜となる形状である。フォトレ
ジストパターンを除去し、イオンミリング法(イオンビ
ームエッチング法)によって磁性膜の無い部分の導電膜
を除去する。そして、主要磁性膜をフォトレジストパタ
ーンで覆って保護し、ウエットエッチング法により不要
磁性膜を除去する。その後、フォトレジストパターンを
除去する。DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is an explanatory view showing an embodiment of the arrangement of product parts (magnetic pole patterns) according to the present invention. The manufacturing of the thin film magnetic head may be basically performed by the same process as the conventional process. A conductive film is formed by vapor deposition on a ceramic substrate having a protective layer of Al 2 O 3 on the surface of an Al 2 O 3 —TiC substrate, and a photoresist pattern is provided to form a main magnetic film portion. Then, a magnetic film (permalloy or the like) is formed by electroplating. The formed magnetic film of each product portion has a shape in which the center is a main magnetic film that serves as a magnetic pole pattern of the thin film magnetic head, and both sides thereof are unnecessary magnetic films that function as a yoke in the electroplating process. The photoresist pattern is removed, and the conductive film in the portion without the magnetic film is removed by the ion milling method (ion beam etching method). Then, the main magnetic film is covered with a photoresist pattern for protection, and the unnecessary magnetic film is removed by a wet etching method. Then, the photoresist pattern is removed.
【0011】本発明では、図1に示すように、このよう
な磁極パターンを有する製品部12が、1枚のほぼ円形
状のセラミック基板10上に多数(例えば千個程度)規
則的に配列形成される。最終的には1行ずつダイシング
・マシーンで切断し、切断したバーにスライダとしての
形状加工を施した後、1個ずつに分離加工する。そのた
め、切断作業及びスライダとしての形状加工作業が容易
なように、同じ形状の大きな矩形状のブロックでまとま
り、且つ切断した1本のバーに同数の製品部が存在する
ように製品部群を配置する。ここで本発明の特徴は、そ
の製品部12の更に外側に、その全外周にわたって、製
品部と同等の形状のダミー部14を配置形成する点にあ
る。ここでは、製品部12の全外周に、ダミー部14を
1個ずつ並べるように設けている。In the present invention, as shown in FIG. 1, a large number (for example, about 1,000) of product parts 12 having such a magnetic pole pattern are regularly arranged on one substantially circular ceramic substrate 10. To be done. Finally, it is cut line by line with a dicing machine, and the cut bars are shaped as sliders, and then separated into individual pieces. Therefore, in order to facilitate cutting work and shape working work as a slider, product group groups are arranged so that a single rectangular bar has the same number of product parts that are grouped together in a large rectangular block of the same shape. To do. Here, the feature of the present invention resides in that the dummy portion 14 having the same shape as the product portion is arranged and formed further outside the product portion 12 over the entire outer circumference thereof. Here, the dummy parts 14 are arranged one by one on the entire outer circumference of the product part 12.
【0012】ダミー部14は、必ずしも完全な磁極パタ
ーンである必要はなく、セラミック基板で製品部12の
外周の面積が少ない場合には、磁極パターンの一部であ
ってもよい。また面積が広い場合には、ダミー部14を
複数個並べる構成であってもよい。いずれにしても、上
記のように、製品部12をできるだけ多く且つ容易に切
断でき、且つ切断したバーの形状加工も容易に行えるよ
うに配置すると共に、その全外周を、できるだけ多くの
ダミー部14が取り囲むように配列するのが望ましい。The dummy portion 14 does not necessarily have to be a complete magnetic pole pattern, and may be a part of the magnetic pole pattern when the area of the outer periphery of the product portion 12 is small on a ceramic substrate. If the area is large, a plurality of dummy parts 14 may be arranged. In any case, as described above, the product portion 12 is arranged so that it can be easily and easily cut, and the shape of the cut bar can be easily processed. It is desirable to arrange so as to surround.
【0013】1枚のセラミック基板について各製品部の
膜厚を測定し、その平均値、標準偏差、最大値、最小
値、及びR値(最大値−最小値)を求めた結果を表1に
示す。同一形状・同一寸法のセラミック基板を使用し、
同一条件で、同一個数の製品部が形成されるようにし
て、従来方法と本発明方法とを比較した。本発明方法
は、製品部の全外周にダミー部を設けるものである。な
お測定箇所は、全ての製品部についてであり、合計10
65箇所である。The film thickness of each product portion of one ceramic substrate was measured, and the average value, standard deviation, maximum value, minimum value, and R value (maximum value-minimum value) were obtained. Show. Use the same shape and same size ceramic substrate,
The conventional method and the method of the present invention were compared under the same conditions so that the same number of product parts were formed. According to the method of the present invention, a dummy part is provided on the entire outer circumference of the product part. The measurement points are for all product parts, totaling 10
There are 65 locations.
【0014】[0014]
【表1】 [Table 1]
【0015】この結果から、従来方法ではR/X=2
7.8%、それに対して本発明方法ではR/X=17.
4%であり、約10%の膜厚分布の改善がなされている
ことが認められた。From this result, R / X = 2 in the conventional method.
7.8%, whereas in the method of the invention R / X = 17.
It was 4%, and it was confirmed that the film thickness distribution was improved by about 10%.
【0016】[0016]
【発明の効果】本発明は上記のように、セラミック基板
の外周近傍を除く部分に製品部として切り出す部分を形
成し、その全外周にわたって、製品部と同等の形状のダ
ミー部を形成する方法であるから、電気めっきによる磁
性膜成膜の際に、外周部のダミー部が製品部に対して緩
衝作用をし、少なくとも各製品部は、隣接する周囲部分
に同等の磁極パターンを有するため、電気めっきの電流
密度のばらつきが少なくなり、膜厚分布が一定し、セラ
ミック基板の製品部全体にわたって成膜した磁性膜の膜
厚がより均一化される。このため、製品の特性のばらつ
きも抑えられ、製造の歩留りも向上する。As described above, the present invention is a method of forming a portion to be cut out as a product portion in a portion excluding the vicinity of the outer periphery of the ceramic substrate and forming a dummy portion having the same shape as the product portion over the entire outer periphery. Therefore, when the magnetic film is formed by electroplating, the dummy portion of the outer peripheral portion acts as a buffer against the product portion, and at least each product portion has the same magnetic pole pattern in the adjacent peripheral portion, so that the electric The variation in current density of plating is reduced, the film thickness distribution is made uniform, and the film thickness of the magnetic film formed over the entire product portion of the ceramic substrate is made more uniform. Therefore, variations in product characteristics are suppressed, and the manufacturing yield is improved.
【図1】本発明方法による製品部の配列状態の説明図。FIG. 1 is an explanatory view of an arrangement state of product parts according to the method of the present invention.
【図2】従来方法による製品部の配列状態の説明図。FIG. 2 is an explanatory diagram of an arrangement state of product parts according to a conventional method.
10 セラミック基板 12 製品部 14 ダミー部 10 Ceramic substrate 12 Product part 14 Dummy part
Claims (1)
の上にフォトレジストパターンを設けて電気めっき法に
より磁性膜を形成した後、不要磁性膜の部分をウエット
エッチング法により除去して製品部となる多数の磁極パ
ターンを配列形成する方法において、セラミック基板の
外周近傍を除く部分に製品部として切り出す部分を形成
し、その全外周にわたって、製品部と同等の形状のダミ
ー部を形成することを特徴とする薄膜磁気ヘッドの製造
方法。1. A product part obtained by forming a conductive film on a ceramic substrate, providing a photoresist pattern on the conductive film, forming a magnetic film by an electroplating method, and then removing an unnecessary magnetic film part by a wet etching method. In a method of forming a large number of magnetic pole patterns in an array, a portion to be cut out as a product portion is formed in a portion except the vicinity of the outer periphery of the ceramic substrate, and a dummy portion having the same shape as the product portion is formed over the entire outer periphery. A method of manufacturing a thin film magnetic head characterized by the above.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5235399A JPH0762592A (en) | 1993-08-27 | 1993-08-27 | Production of thin-film magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5235399A JPH0762592A (en) | 1993-08-27 | 1993-08-27 | Production of thin-film magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0762592A true JPH0762592A (en) | 1995-03-07 |
Family
ID=16985519
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5235399A Pending JPH0762592A (en) | 1993-08-27 | 1993-08-27 | Production of thin-film magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0762592A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6973712B2 (en) * | 2002-03-07 | 2005-12-13 | Headway Technologies, Inc. | Lead plating method for GMR head manufacture |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5780795A (en) * | 1980-11-07 | 1982-05-20 | Fujitsu Ltd | Method of producing printed board |
JPH01176089A (en) * | 1987-12-28 | 1989-07-12 | Sumitomo Metal Ind Ltd | Formation of plating pattern |
-
1993
- 1993-08-27 JP JP5235399A patent/JPH0762592A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5780795A (en) * | 1980-11-07 | 1982-05-20 | Fujitsu Ltd | Method of producing printed board |
JPH01176089A (en) * | 1987-12-28 | 1989-07-12 | Sumitomo Metal Ind Ltd | Formation of plating pattern |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6973712B2 (en) * | 2002-03-07 | 2005-12-13 | Headway Technologies, Inc. | Lead plating method for GMR head manufacture |
US7111386B2 (en) * | 2002-03-07 | 2006-09-26 | Headway Technologies, Inc. | Lead plating method for GMR head manufacture |
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