JPS60136025A - Working method of slider for thin film magnetic head - Google Patents

Abstract

PURPOSE:To prevent the surface of a slider for a thin film magnetic head from being etched except a surface to be etched and improve the efficiency of etching operation by forming a protection film for etching prevention which is removed easily after the etching treatment on the surface of the slider except on the worked surface when the slider is worked by etching. CONSTITUTION:A mask for etching is formed after a film of metal such as aluminum, copper, nickel, and iron or resin such as photoresist is formed by vapor deposition, sputtering, or spin coating as a protection film 5 for turnaround etching prevention on the surface of a slider plate 1 except on the surface to be etched. Then, when the slider plate 1 is treated by ion milling, sputter etching, etc., the slider substrate and protection film 5 are etched and part of the protection film 5 is removed into the shape of an etched-away part 6. The protection film 5 is removed by waist etching, oxygen plasma treatment, etc., after the etching to obtain the slider part 1 having only the desired part etched.

Description

DETAILED DESCRIPTION OF THE INVENTION Technical Field of the Invention The present invention relates to an improvement in a method of molding a slider for a thin film magnetic head used in a magnetic disk drive.

佽) Conventional technology and problems Recently, magnetic disk drives are required to have higher recording densities as the amount of information increases, and as a result, thin-film magnetic head sliders that record on and read from recording media have become popular. High precision of slider processing is required due to the demand for volume reduction.
Complexity is required.

As described above, the molding process of the slider of a thin film magnetic head, which requires dimensional accuracy, is inconvenient with the mechanical molding process performed on old magnetic heads, and a dry process such as ion etching is used.

An example is shown in FIG.

That is, as shown in FIG. 1, the slider plate l of the thin film magnetic head is made of glass or ceramic plate, etc., and the thin film magnetic head is a thin film magnetic head in which a magnetic material and a coil around which the magnetic material is wound are formed in a thin film shape on the plate. A head 2 is provided. In order to form the slider plate 1 into a predetermined size, it is microfabricated into a predetermined size using an ion milling method or a sputter etching method.

In processing using the ion milling method or the sputter etching method, the etching goes around to surfaces other than the surface to be etched, resulting in unnecessary removal of the slider plate l.

Therefore, as shown in the figure, the slider plates 1 are arranged in a horizontal line without gaps to prevent etching on surfaces other than the surface to be etched and etching on the side surface 4. However, in this method, it is incomplete to prevent the etching from going around to the side surface 4, and the corner B of the surface corresponding to the etching direction is etched, as shown at f8+ in FIG. Therefore, as the second molding process,
As shown in Figure (b), the uneven surface created by etching is flattened by lapping C or the like and formed into a predetermined size.

As mentioned above, the conventional method has the disadvantage that it is difficult to completely prevent etching on surfaces other than the surface to be etched, and that the work of flattening the uneven surface caused by etching is complicated and time-consuming.

to+ Purpose of the Invention The present invention was devised in view of the above-mentioned drawbacks of the conventional art.
The purpose is to create a thin film magnetic head slider that can prevent etching of surfaces other than the surface to be etched and improve the efficiency of etching by providing an easily removable metal or resin film on the surface other than the surface to be etched. - To provide a method for processing a gutter slider.

+d+ Structure and object of the invention According to the present invention, when a slider for a thin film magnetic head is etched by an ion etching method or a sputter etching method, a surface other than the surface to be processed of the slider is removed after the etching process is completed. This is achieved by a method for processing a slider for a thin film magnetic head, which is characterized in that a protective film for preventing etching is formed.

te+ Example of invention An embodiment of the present invention will be described below with reference to the drawings.

FIGS. 3(al), (b), and tc+ are diagrams for explaining the method of processing a slider for a thin film magnetic head of the present invention,
The same reference numerals as in FIGS. 1 and 2 (a) and (bl) indicate the same parts.

That is, as shown in FIG. 3, aluminum (AI), copper (Cu),
After a film of metal such as nickel/iron (Ni, Fe 2 ) or resin film such as photoresist is formed by a method such as vapor deposition sputtering or spin code, an etching mask is formed. Next, as shown in FIG.
While etching the surface to be etched, (J[I
lI! 5 is removed in the shape of an etching removal section 6. Therefore, with this protective film 5, the slider plate 1
The surface other than the surface to be etched is protected.

Next, after the etching is completed, the protective film 5 is removed by wet etching, oxygen plasma treatment, etc., to obtain the slider plate 1 in which only the desired portions are etched, as shown in FIG. 3 (C1).

(f) Effects of the Invention As is clear from the above description, in short, the present invention etches the surface of the slider other than the surface to be etched.

Covering with a protective film made of a metal such as Ni/Fe or a resin film such as photoresist has the effect of facilitating the etching process of the thin film magnetic head slider.

[Brief explanation of drawings]

Figures 1 and 2 are tags, (BL is a diagram for explaining the etching process of a slider for a conventional thin film magnetic head, and Figure 3 is a diagram for explaining the etching process of a slider for a thin film magnetic head of the present invention. In the figure, 1 is the slider plate, 2 is the magnetic throat, and 3 is the slider plate.
4 indicates a protective tape, 4 indicates a side portion, 5 indicates a protective film, and 6 indicates an etching removed portion.

Claims (1)

[Claims] When etching a slider for a thin film magnetic head using an ion etching method or a sputter etching method, a protective film for preventing etching is formed on a surface other than the surface to be processed of the slider, which is easy to remove after the etching process is completed. Features: Processing method of slider for thin film magnetic head.