JPH0758534B2 - Manufacturing method of thin film magnetic head element - Google Patents
Manufacturing method of thin film magnetic head elementInfo
- Publication number
- JPH0758534B2 JPH0758534B2 JP29535985A JP29535985A JPH0758534B2 JP H0758534 B2 JPH0758534 B2 JP H0758534B2 JP 29535985 A JP29535985 A JP 29535985A JP 29535985 A JP29535985 A JP 29535985A JP H0758534 B2 JPH0758534 B2 JP H0758534B2
- Authority
- JP
- Japan
- Prior art keywords
- head element
- thin film
- magnetic head
- film magnetic
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3176—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps
- G11B5/3179—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes
- G11B5/3183—Structure of heads comprising at least in the transducing gap regions two magnetic thin films disposed respectively at both sides of the gaps the films being mainly disposed in parallel planes intersecting the gap plane, e.g. "horizontal head structure"
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、ハードディスク用の薄膜磁気ヘッド素子の製
法に関する。The present invention relates to a method for manufacturing a thin film magnetic head element for a hard disk.
本発明は、薄膜磁気ヘッド素子の製法において、基板上
の一面に複数の薄膜磁気ヘッド素子部分を、各薄膜磁気
ヘッド素子の巻き線が薄膜磁気ヘッド素子部分の一辺側
に延在する様に形成し、共通する上記一辺に沿って基板
を切断して複数のブロックを形成し、この複数のブロッ
クを上記一辺側の切断面で共通の他面を形成するように
配列固定すると共に、この他面上に巻き線の端面を露呈
させ、次いで端面に露呈した夫々の巻き線端末に接続用
導体を上記他面上に形成して後、個々の薄膜磁気ヘッド
素子を分離し、分離された薄膜磁気ヘッド素子が形成さ
れた面をスライダーの浮上面とすることによって、例え
ばハードディスク用の磁気ヘッド素子の量産化を可能に
したものである。According to the present invention, in a method for manufacturing a thin film magnetic head element, a plurality of thin film magnetic head element portions are formed on one surface of a substrate such that windings of each thin film magnetic head element extend to one side of the thin film magnetic head element portion. Then, the substrate is cut along the one common side to form a plurality of blocks, and the plurality of blocks are arrayed and fixed so that the cut surface on the one side forms a common other surface. After exposing the end face of the winding wire on top, and then forming a connecting conductor on the other face on each winding end exposed on the end face, separate the thin film magnetic head elements and separate the thin film magnetic By making the surface on which the head element is formed the air bearing surface of the slider, it is possible to mass-produce a magnetic head element for a hard disk, for example.
薄膜磁気ヘッド素子は、第９図に示す構造（以下、縦型
構造という）と、第10図及び第11図に示す構造（以下平
型構造という）の２種類に分類できる。第９図の磁気ヘ
ッド素子は、磁性基体（１）上に絶縁層（２）を介して
巻線としての導体層（３）が形成され、さらにその上に
絶縁層（２）を介して一部が磁性基体（１）に磁気的に
結合した磁気ヨーク（４）が形成され、側面に臨む磁性
基体（１）と磁気ヨーク（４）間で磁気ギャップｇが形
成されて構成される。なお、（５）は保護層、（６）は
磁気記録媒体である。又、第10図及び第11図の磁気ヘッ
ド素子は、同様の磁性基体（１）上に絶縁層（２）を介
して巻線としての導体層（３）が形成され、さらにその
上に絶縁層（２）を介して夫々一部が磁性基体（１）に
磁気的に結合された一対の磁気ヨーク（7A）及び（7B）
が形成され、この一対の磁気ヨーク（7A）及び（7B）に
よって導体層（３）に対して磁性基体（１）と反対側の
平面に磁気ギャップｇが形成されて構成される。The thin film magnetic head element can be classified into two types, a structure shown in FIG. 9 (hereinafter referred to as a vertical structure) and a structure shown in FIGS. 10 and 11 (hereinafter referred to as a flat structure). In the magnetic head element of FIG. 9, a conductor layer (3) as a winding is formed on a magnetic substrate (1) via an insulating layer (2), and further, a conductive layer (3) is formed on the magnetic substrate (1) via an insulating layer (2). A magnetic yoke (4) whose part is magnetically coupled to the magnetic base (1) is formed, and a magnetic gap g is formed between the magnetic base (1) and the magnetic yoke (4) facing the side surface. Incidentally, (5) is a protective layer, and (6) is a magnetic recording medium. Further, in the magnetic head element of FIGS. 10 and 11, a conductor layer (3) as a winding is formed on the same magnetic substrate (1) via an insulating layer (2), and an insulating layer is further formed thereon. A pair of magnetic yokes (7A) and (7B), each part of which is magnetically coupled to the magnetic substrate (1) through the layer (2).
Is formed, and a magnetic gap g is formed on the plane opposite to the magnetic base (1) with respect to the conductor layer (3) by the pair of magnetic yokes (7A) and (7B).
縦型構造の薄膜磁気ヘッド素子は既に実用化レベルに達
しているが、平型構造の薄膜磁気ヘッド素子は未だ実用
化されていない。しかし、平型構造の薄膜磁気ヘッド素
子はいくつかの点で縦型構造より優れている。即ち、平
型構造の磁気ヘッド素子は磁気効率が極めて高いこと、
又さまざまな複合ヘッドが可能となることである。Although the vertical type thin film magnetic head element has already reached the level of practical use, the flat type thin film magnetic head element has not yet been put to practical use. However, the flat type thin film magnetic head element is superior to the vertical type structure in several respects. That is, the magnetic head element having a flat structure has extremely high magnetic efficiency,
Also, various composite heads are possible.
しかし、この平型構造の薄膜磁気ヘッド素子について
は、製造上の問題と、保護層の信頼性に欠けることなど
により、研究が遅れている。However, research on this thin film magnetic head element having a flat structure has been delayed due to manufacturing problems and lack of reliability of the protective layer.
平型構造の薄膜磁気ヘッド素子において、上述の製造上
の問題の１つに、リード線の引き出しの問題がある。ハ
ードディスク用の平型構造の薄膜磁気ヘッド素子では第
12図に示すようにスライダー（８）の浮上面（8a）にヘ
ッド素子（９）が形成されることになる。このような位
置からリード線を引き出すためには、何らかの手段によ
り、スライダー側面（8b）又は上面（8c））にリード線
を引き出す必要がある。In the thin-film magnetic head element having the flat structure, one of the above-mentioned manufacturing problems is the problem of lead wire extraction. It is the first thin-film magnetic head element with a flat structure for hard disks.
As shown in FIG. 12, the head element (9) is formed on the air bearing surface (8a) of the slider (8). In order to pull out the lead wire from such a position, it is necessary to pull out the lead wire to the slider side surface (8b) or the upper surface (8c) by some means.
本発明は、上述の点に鑑み、接続用導体（リード線）を
浮上面より他の面に導出するようにして成る磁気ヘッド
素子を量産化できるようにした薄膜磁気ヘッド素子の製
法を提供するものである。In view of the above points, the present invention provides a method of manufacturing a thin film magnetic head element, which enables mass production of a magnetic head element in which a connecting conductor (lead wire) is led out from an air bearing surface to another surface. It is a thing.
本発明は、基板（11）上の一面（11a）に複数の薄膜磁
気ヘッド素子部分（13）を、各薄膜磁気ヘッド素子（1
2）の巻き線（14）が薄膜磁気ヘッド素子部分（13）の
一辺（15）側に延在する様に形成する工程と、共通する
上記一辺（15）に沿って基板（11）を切断し、複数の薄
膜磁気ヘッド素子部分（13）を有する複数のブロック
（23）を形成する工程と、一辺（15）側の切断面（23
a）により共通の他面（24）を形成するように複数のブ
ロック（23）を配列固定するとともに巻き線（14）の端
面（14A）を他面（24）上に露呈させる工程と、端面に
露呈したそれぞれの巻き線端末に接続する接続用導体
（26）を他面（24）上に形成する工程と、個々の薄膜磁
気ヘッド素子（27）を分離する工程と、分離された薄膜
磁気ヘッド素子（27）、従ってその磁気ヘッド素子（1
2）が形成された面（11a）をスライダーの浮上面となす
工程を有することを特徴とする。According to the present invention, a plurality of thin film magnetic head element portions (13) are provided on one surface (11a) of a substrate (11) and each thin film magnetic head element (1
The step (2) of forming the winding (14) so as to extend to the side (15) of the thin film magnetic head element portion (13), and cutting the substrate (11) along the common side (15). Then, a step of forming a plurality of blocks (23) having a plurality of thin film magnetic head element portions (13) and a cutting surface (23) on one side (15) side.
a) a step of aligning and fixing a plurality of blocks (23) so as to form a common other surface (24) and exposing the end surface (14A) of the winding (14) on the other surface (24); The step of forming the connection conductor (26) connected to each winding terminal exposed on the other surface (24), the step of separating the individual thin film magnetic head elements (27), and the separated thin film magnetic The head element (27) and thus its magnetic head element (1
The method is characterized by including a step (2) of forming the surface (11a) on which the air bearing surface of the slider is formed.
上述の製法によれば、基板（11）上の一面（11a）に薄
膜磁気ヘッド素子（12）を形成して後、その巻き線（1
4）の端面（14A）が側面に露出するように基板（11）を
切断し、その切断面（23a）上に露呈した巻き線端末に
接続するように接続用導体（26）を形成することによ
り、薄膜磁気ヘッド素子（12）が形成された基板（1
1′）の一の面（11a′）をスライダーの浮上面とし、こ
の面（11a′）とは異なる他の面（11b′）に接続用導体
（26）を有する目的とした平型構造の薄膜磁気ヘッド素
子（27）が容易に製造される。According to the above-mentioned manufacturing method, the thin film magnetic head element (12) is formed on one surface (11a) of the substrate (11), and then the winding (1
Cutting the substrate (11) so that the end surface (14A) of 4) is exposed on the side surface, and forming a connecting conductor (26) on the cut surface (23a) so as to connect to the exposed winding terminal. The thin film magnetic head element (12) is formed on the substrate (1
1 ') one surface (11a') is used as the air bearing surface of the slider, and the other surface (11b ') different from this surface (11a') has a connecting conductor (26) The thin film magnetic head element (27) is easily manufactured.
しかも、製造に際しては基板（11）上に複数の薄膜磁気
ヘッド素子部分（13）を形成し、これを各ブロック（2
3）毎に切断してその切断面（23a）が共通の他面（24）
を形成する様に、各ブロック（23）を再結合し、基板の
形に変えて接続用導体（26）を形成し、しかる後、各薄
膜磁気ヘッド素子（27）を分離するようになしているた
め、目的とする薄膜磁気ヘッド素子（27）が同時に多量
に製造される。Moreover, at the time of manufacturing, a plurality of thin film magnetic head element portions (13) are formed on the substrate (11) and each of these blocks (2
The other surface (24) with the same cut surface (23a)
So that each block (23) is recombined to form a connection conductor (26) in the form of a substrate, and then each thin film magnetic head element (27) is separated. Therefore, the target thin film magnetic head element (27) is manufactured in large quantities at the same time.
以下、第１図乃至第８図を参照して本発明による薄膜磁
気ヘッド素子の製法の一実施例を説明する。An embodiment of the method of manufacturing the thin film magnetic head element according to the present invention will be described below with reference to FIGS.
本例においては、先ず第１図に示すように所定の基板例
えばチタン酸カルシウムの如きセラミック基板（11）の
一面、すなわち爾後スライダーの浮上面となる一面（11
a）上に、後述のプロセスによって複数の平型構造の薄
膜ヘッド素子（12）を所定の配列をもって形成する。こ
の場合、切断線ａ及びｂで区画される１個のスライダー
に対応してその浮上面に２個のヘッド素子（12）を形成
するものであり、この２個１組のヘッド素子部分（13）
が複数個縦横に配列形成される。そして、この複数のヘ
ッド素子部分（13）は、各ヘッド素子（12）の巻き線と
なる導体層（14）がヘッド素子部分（13）の一辺側（即
ち切断線ａ）に延在するように、従って、第２図に示す
ように後の切断工程における切りしろ（15）内に延在す
るように、形成される。In this example, first, as shown in FIG. 1, one surface of a predetermined substrate, for example, a ceramic substrate (11) such as calcium titanate, that is, one surface (11
A plurality of flat-structured thin film head elements (12) are formed in a predetermined array on a) by the process described later. In this case, two head elements (12) are formed on the air bearing surface corresponding to one slider sectioned by the cutting lines a and b. )
Are vertically and horizontally arrayed. In the plurality of head element portions (13), the conductor layer (14) forming the winding of each head element (12) extends to one side of the head element portion (13) (that is, the cutting line a). Therefore, it is formed so as to extend into the cutting margin (15) in the subsequent cutting step as shown in FIG.
各薄膜ヘッド素子（12）は次の様にして形成する（第８
図参照）。セラミック基板（11）上の各ヘッド素子を形
成する領域に選択的に磁性層（16）を形成し、この上に
SiO2等による絶縁層（17）を形成して後、巻き線となる
導体層（14）を形成し、さらにこの上に絶縁層（17）を
形成する（第８図Ａ）。次に一部磁性層（16）に磁気的
に結合する磁性薄膜（19）を形成し、磁気ギャップｇを
形成して後（第８図Ｂ）、全面に例えばSiO2等による保
護層（20）を形成する（第８図Ｃ）。次で磁気ギャップ
ｇを形成する両磁気ヨーク（19A）（19B）の磁気媒体対
向面（21）が臨むように平坦化して薄膜ヘッド素子（1
2）を形成する（第８図Ｄ）。Each thin film head element (12) is formed as follows (eighth)
See figure). A magnetic layer (16) is selectively formed in a region where each head element is formed on the ceramic substrate (11), and a magnetic layer (16) is formed on the magnetic layer (16).
After forming an insulating layer (17) made of SiO 2 or the like, a conductor layer (14) to be a winding is formed, and an insulating layer (17) is further formed thereon (FIG. 8A). Next, a magnetic thin film (19) which is magnetically coupled to a part of the magnetic layer (16) is formed, and after forming a magnetic gap g (FIG. 8B), a protective layer (20) made of, for example, SiO 2 is formed on the entire surface. ) Is formed (FIG. 8C). Next, the thin film head element (1) is flattened so that the magnetic medium facing surfaces (21) of both magnetic yokes (19A) (19B) that form the magnetic gap g are exposed.
2) is formed (Fig. 8D).
しかして、上記の様にしてセラミック基板（11）上に各
ヘッド素子（12）を形成した後、基板（11）に対して、
そのヘッド素子部分（13）の両ヘッド素子（12）及び
（13）間に沿うように溝（22）を形成する（第１図参
照）。Then, after forming each head element (12) on the ceramic substrate (11) as described above, with respect to the substrate (11),
A groove (22) is formed so as to extend between both head elements (12) and (13) of the head element portion (13) (see FIG. 1).
次に、第１図において各切断線ａに沿って基板（11）を
切断して複数のヘッド素子部分（13）を有する複数のブ
ロック（23）を形成する。この切断によって各ブロック
（23）の一方の切断面（23a）にはヘッド素子（12）は
導体層（14）の端面（14A）が露呈する。次で、この複
数のブロック（23）を各導体層（14）の端面（14A）が
露出する切断面（23a）によって共通の他面（24）が形
成される様に、且つ、ブロック（23）間でヘッド素子
（12）が整然と並ぶ様にして、接着剤により配列固定す
る（第３図及び第４図参照）。この時の接着剤として
は、後工程において有機溶剤して溶解し、加熱等により
分離できるものを選ぶ。Next, in FIG. 1, the substrate (11) is cut along each cutting line a to form a plurality of blocks (23) having a plurality of head element portions (13). By this cutting, the end surface (14A) of the conductor layer (14) of the head element (12) is exposed on one cutting surface (23a) of each block (23). Next, the plurality of blocks (23) are formed so that a common other surface (24) is formed by a cut surface (23a) where the end surface (14A) of each conductor layer (14) is exposed, and the block (23). ), The head elements (12) are arranged in an orderly manner, and the head elements (12) are arrayed and fixed by an adhesive (see FIGS. 3 and 4). As the adhesive at this time, an adhesive which can be dissolved in an organic solvent in a subsequent step and can be separated by heating or the like is selected.
この後に、切断面（23a）で形成された他面（24）を研
磨する。研磨の目的は切断時のチッピングによって荒れ
た端部を修正するためと、導体層（14）の端面（14A）
をきれいにするためである。このように各ブロック（2
3）を再接合し、研磨したものは１つの基板として扱う
ことができる。After this, the other surface (24) formed by the cut surface (23a) is polished. The purpose of polishing is to correct the rough edge due to chipping during cutting, and the end surface (14A) of the conductor layer (14).
Is to clean the. Each block (2
The product obtained by re-bonding and polishing 3) can be treated as one substrate.
次に第５図に示すように、この複数のブロック（23）を
固定して成る基板（25）の一面（24）上に各ヘッド素子
（12）の導体層（14）の端末に接続する接続用導体（2
6）を形成する。この接続用導体（26）の形成法は、蒸
着又はスパッタリングした後、パターニングする方法、
或は所定パターンのレジスト層を形成し、蒸着又はスパ
ッタリングして後、リフトオフする方法ある。この後、
電着することもできる。Next, as shown in FIG. 5, the end of the conductor layer (14) of each head element (12) is connected to one end (24) of the substrate (25) formed by fixing the plurality of blocks (23). Connection conductor (2
6) to form. This connection conductor (26) is formed by a method of patterning after vapor deposition or sputtering,
Alternatively, there is a method of forming a resist layer having a predetermined pattern, performing vapor deposition or sputtering, and then lifting off. After this,
It can also be electrodeposited.
次に、第３図の切断線ｂに沿って切断し（第６図参
照）、さらに先に固定した接着剤を溶解して各チップに
分離し、洗浄する。そして最終的に第７図に示す磁気ヘ
ッド素子（27）を得る。この場合、セラミック基体（1
1′）がスライダーとなり、この浮上面（11a′）に平型
構造のヘッド素子（12）が形成され、その巻き線となる
導体層（14）の端子即ち接続用導体（26）が側面（11
b′）に形成されることになる。Next, cutting is performed along the cutting line b in FIG. 3 (see FIG. 6), and the adhesive agent fixed earlier is melted to be separated into each chip and washed. Finally, the magnetic head element (27) shown in FIG. 7 is obtained. In this case, the ceramic substrate (1
1 ') serves as a slider, the head element (12) having a flat structure is formed on the air bearing surface (11a'), and the terminal of the conductor layer (14) forming the winding, that is, the connecting conductor (26) is located on the side surface ( 11
b ').
なお、基板（11）としては、接続用導体（14）の形成の
際に特別な絶縁手段を不要とする絶縁基板が望ましい。
しかし、絶縁手段を考慮すれば絶縁基板以外の他の基板
を用いることも可能である。As the substrate (11), an insulating substrate that does not require a special insulating means when forming the connection conductor (14) is desirable.
However, it is possible to use a substrate other than the insulating substrate in consideration of the insulating means.
このように、本製法によれば、スライダー（11′）の浮
上面（11a′）にヘッド素子（12）を形成すると共に、
その導体層（14）の端子即ち接続用導体（26）をスライ
ダー（11′）の側面（11b′）に形成することができ
る。しかも、かかる磁気ヘッド素子（27）は精度よく且
つ一度に大量に製造される。従って、本製法は平型構造
の薄膜磁気ヘッドをハードディスク用の磁気ヘッドとし
て実用可能にするものである。Thus, according to this manufacturing method, the head element (12) is formed on the air bearing surface (11a ′) of the slider (11 ′), and
The terminal of the conductor layer (14), that is, the connecting conductor (26) can be formed on the side surface (11b ') of the slider (11'). Moreover, such a magnetic head element (27) is manufactured accurately and in large quantities at one time. Therefore, this manufacturing method makes the thin film magnetic head having the flat structure practically usable as a magnetic head for a hard disk.
上述せる本発明によれば、スライダーの如き基体の一の
面にヘッド素子を形成し、他の面にヘッド素子の巻き線
の端子即ち接続用導体を形成して成る薄膜磁気ヘッド素
子を精度よく製造することができる。又、かかる薄膜磁
気ヘッド素子を量産化できる。従って、平型構造による
ハードディスク用磁気ヘッドの実用化が可能となるもの
である。According to the present invention described above, a thin-film magnetic head element in which a head element is formed on one surface of a substrate such as a slider and terminals or connecting conductors of windings of the head element are formed on the other surface with high accuracy. It can be manufactured. Further, such a thin film magnetic head element can be mass-produced. Therefore, it becomes possible to put a magnetic head for a hard disk having a flat structure into practical use.
第１図〜第７図は本発明による製法の一実施例を示す工
程図、第８図Ａ〜Ｄはヘッド素子の製法例を示す工程
図、第９図は縦型構造の薄膜磁気ヘッド素子の断面図、
第10図及び第11図は平型構造の薄膜磁気ヘッド素子の断
面図及び斜視図、第12図はハードディスク用の磁気ヘッ
ド素子の斜視図である。 （11）は基板、（12）はヘッド素子、（13）はヘッド素
子部分、（14）は巻き線としての導体層、（23）はブロ
ック、（26）は接続用導体、（27）は磁気ヘッド素子で
ある。1 to 7 are process drawings showing one embodiment of the manufacturing method according to the present invention, FIGS. 8A to 8D are process drawings showing an example of the manufacturing method of the head element, and FIG. 9 is a thin film magnetic head element having a vertical structure. Cross section of
10 and 11 are a sectional view and a perspective view of a thin film magnetic head element having a flat structure, and FIG. 12 is a perspective view of a magnetic head element for a hard disk. (11) is a substrate, (12) is a head element, (13) is a head element portion, (14) is a conductor layer as a winding wire, (23) is a block, (26) is a connecting conductor, and (27) is It is a magnetic head element.
Claims (1)
子部分を、各薄膜磁気ヘッド素子の巻き線が上記薄膜磁
気ヘッド素子部分の一辺側に延在する様に形成する工
程、 b.共通する上記一辺に沿って基板を切断し、複数の薄膜
磁気ヘッド素子部分を有する複数のブロックを形成する
工程、 c.上記一辺側の切断面により共通の他面を形成するよう
に上記複数のブロックを配列固定するとともに上記巻き
線の端面を上記他面上に露呈させる工程、 d.上記端面に露呈したそれぞれの巻き線端末に接続する
接続用導体を上記他面上に形成する工程、 e.個々の薄膜磁気ヘッド素子を分離する工程、 f.上記分離された薄膜磁気ヘッド素子が形成された面を
スライダーの浮上面となす工程、を有する薄膜磁気ヘッ
ド素子の製法。1. A step of forming a plurality of thin film magnetic head element portions on one surface of a substrate such that windings of each thin film magnetic head element extend to one side of the thin film magnetic head element portion, b. . A step of cutting the substrate along the common one side to form a plurality of blocks having a plurality of thin film magnetic head element portions, c. The plurality of the plurality of blocks so that the cut surface on the one side forms a common other surface Exposing the end surface of the winding on the other surface while fixing and fixing the blocks of, d. The step of forming on the other surface a connecting conductor connected to each winding terminal exposed on the end surface, e. A method of manufacturing a thin film magnetic head element, which comprises a step of separating individual thin film magnetic head elements, and f. a step of forming the surface on which the separated thin film magnetic head elements are formed as an air bearing surface of a slider.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29535985A JPH0758534B2 (en) | 1985-12-25 | 1985-12-25 | Manufacturing method of thin film magnetic head element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP29535985A JPH0758534B2 (en) | 1985-12-25 | 1985-12-25 | Manufacturing method of thin film magnetic head element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62150512A JPS62150512A (en) | 1987-07-04 |
| JPH0758534B2 true JPH0758534B2 (en) | 1995-06-21 |
Family
ID=17819596
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP29535985A Expired - Fee Related JPH0758534B2 (en) | 1985-12-25 | 1985-12-25 | Manufacturing method of thin film magnetic head element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0758534B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2687497B1 (en) * | 1992-02-13 | 1995-10-13 | Commissariat Energie Atomique | METHOD FOR PRODUCING A MAGNETIC HEAD IN THIN FILMS. |
-
1985
- 1985-12-25 JP JP29535985A patent/JPH0758534B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62150512A (en) | 1987-07-04 |
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