JPH0756000A - Micro x-ray target - Google Patents
Micro x-ray targetInfo
- Publication number
- JPH0756000A JPH0756000A JP20341293A JP20341293A JPH0756000A JP H0756000 A JPH0756000 A JP H0756000A JP 20341293 A JP20341293 A JP 20341293A JP 20341293 A JP20341293 A JP 20341293A JP H0756000 A JPH0756000 A JP H0756000A
- Authority
- JP
- Japan
- Prior art keywords
- metal plate
- ray
- light
- electron beam
- rays
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、非破壊検査等に用いる
X線を発生させるためのマイクロX線ターゲットに関す
るものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a micro X-ray target for generating X-rays used for nondestructive inspection and the like.
【0002】[0002]
【従来の技術】非破壊検査等に用いるX線は、10mm
φのタングステンのターゲットに電子ビームを照射する
ことにより発生させる。2. Description of the Related Art X-rays used for nondestructive inspection are 10 mm
It is generated by irradiating a tungsten target of φ with an electron beam.
【0003】このX線発生装置においては、発生するX
線がターゲットを中心に円錐状に広がるため、非破壊検
査の精度をよくするためには、できるだけ広がりを押さ
えるようにするのが望ましい。In this X-ray generator, the generated X
Since the line spreads conically around the target, it is desirable to suppress the spread as much as possible in order to improve the accuracy of the nondestructive inspection.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、ターゲ
ットに照射する電子ビームを絞るには限度があり、また
ターゲットから放出されるX線を絞ることも困難であ
る。However, there is a limit to narrowing down the electron beam with which the target is irradiated, and it is also difficult to narrow down the X-rays emitted from the target.
【0005】そこで、本発明の目的は、上記課題を解決
し、放出されるX線の広がりを押さえることが可能なマ
イクロX線ターゲットを提供することにある。Therefore, an object of the present invention is to solve the above problems and provide a micro X-ray target capable of suppressing the spread of emitted X-rays.
【0006】[0006]
【課題を解決するための手段】上記目的を達成するため
に本発明は、アルミニウムなどの軽金属板の中心に極細
のタングステン棒を埋め込んだものであり、タングステ
ン棒としては直径1〜10μmのものを用いる。In order to achieve the above object, the present invention is a light metal plate of aluminum or the like in which an extremely fine tungsten rod is embedded in the center, and a tungsten rod having a diameter of 1 to 10 μm is used. To use.
【0007】[0007]
【作用】上記構成によれば、軽金属板の中心に極細の1
〜10μmのタングステン棒を埋め込むことで、電子ビ
ームが照射されても極めて細いタングステン棒のみから
X線が放出されるため、点光源のX線が実現できると共
にX線の広がりも押さえることが可能となる。この場
合、直径10μm以上ではX線が拡がり過ぎ、1μm以
下では製作が難しいと共に充分なX線量が得られなく好
ましくない。According to the above construction, a fine metal 1 is formed at the center of the light metal plate.
By embedding a tungsten rod of 10 μm, X-rays are emitted only from an extremely thin tungsten rod even when irradiated with an electron beam, so that X-rays of a point light source can be realized and the spread of X-rays can be suppressed. Become. In this case, if the diameter is 10 μm or more, the X-ray spreads too much, and if the diameter is 1 μm or less, it is difficult to manufacture, and a sufficient X-ray dose cannot be obtained, which is not preferable.
【0008】[0008]
【実施例】以下、本発明の一実施例を添付図面に基づい
て詳述する。An embodiment of the present invention will be described in detail below with reference to the accompanying drawings.
【0009】図1は本発明のマイクロX線ターゲットを
示したものである。FIG. 1 shows a micro X-ray target according to the present invention.
【0010】図において、10はアルミニウムなど厚さ
tを1〜2mmの軽金属板で、内部には図示していない
が冷却通路が形成され、その出入口に冷却水の導入・排
出管11,12が接続される。In the figure, 10 is a light metal plate having a thickness t of 1 to 2 mm, such as aluminum, which has a cooling passage (not shown) formed therein, and cooling water introducing / discharging pipes 11 and 12 at its inlet and outlet. Connected.
【0011】この軽金属板10の中心、すなわち電子ビ
ーム14の照射される位置に1〜10μmのタングステ
ン棒13が埋め込まれる。このタングステン棒13は、
軽金属板10の厚さと同じ長さに形成され、その両端面
が軽金属板10の面と一致するように形成される。この
タングステン棒13の埋め込みは、例えば中心にタング
ステン棒13となるタングステン線の周りにアルミニウ
ムを適宜の径に形成し、このアルミニウムの筒体を金属
板10の厚さと同じ長さに切断した後、軽金属板10に
埋め込むようにして形成することで、タングステン棒1
3を軽金属板10の中心に正確に位置させることができ
る。A tungsten rod 13 of 1 to 10 μm is embedded at the center of the light metal plate 10, that is, at the position where the electron beam 14 is irradiated. This tungsten rod 13
It is formed to have the same length as the thickness of the light metal plate 10, and both end surfaces thereof are formed to match the surface of the light metal plate 10. For embedding the tungsten rod 13, for example, aluminum is formed to have an appropriate diameter around a tungsten wire that becomes the tungsten rod 13 in the center, and the aluminum cylinder is cut to the same length as the thickness of the metal plate 10. The tungsten rod 1 is formed by embedding it in the light metal plate 10.
3 can be accurately positioned in the center of the light metal plate 10.
【0012】次に実施例の作用を述べる。Next, the operation of the embodiment will be described.
【0013】本発明のマイクロX線ターゲットをX線発
生装置に組み込み、電子ビーム14を照射すると、電子
ビーム14は、タングステン棒13に当りそこでX線1
5を放出する。この場合、軽金属板10に当った電子ビ
ーム14は吸収され、1〜10μmのタングステン棒1
3がX線源となるため、常に点光源のX線を放出でき
る。When the micro X-ray target of the present invention is incorporated into an X-ray generator and the electron beam 14 is irradiated, the electron beam 14 hits the tungsten rod 13 and the X-ray 1 is emitted there.
Release 5. In this case, the electron beam 14 hitting the light metal plate 10 is absorbed, and the tungsten rod 1 of 1 to 10 μm is absorbed.
Since 3 serves as an X-ray source, X-rays of a point light source can always be emitted.
【0014】また電子ビーム14の照射により発生した
熱は、軽金属板10内に形成した冷却通路に冷却水を流
すことで除去できる。The heat generated by the irradiation of the electron beam 14 can be removed by flowing cooling water through the cooling passage formed in the light metal plate 10.
【0015】[0015]
【発明の効果】以上要するに本発明によれば、軽金属板
の中心に極細のタングステン棒を埋め込むことで、電子
ビームが照射されても極めて細いタングステン棒のみか
らX線が放出されるため、点光源のX線が実現できると
共にX線の広がりも押さえることが可能となる。In summary, according to the present invention, by embedding an extremely fine tungsten rod in the center of a light metal plate, X-rays are emitted only from an extremely thin tungsten rod even when irradiated with an electron beam. The X-ray can be realized and the spread of the X-ray can be suppressed.
【図1】本発明の一実施例を示す概略斜視図である。FIG. 1 is a schematic perspective view showing an embodiment of the present invention.
10 軽金属板 13 タングステン棒 14 電子ビーム 10 Light metal plate 13 Tungsten rod 14 Electron beam
Claims (2)
細のタングステン棒を埋め込んだことを特徴とするマイ
クロX線ターゲット。1. A micro X-ray target characterized in that a very thin tungsten rod is embedded in the center of a light metal plate such as aluminum.
ある請求項1に記載のマイクロX線ターゲット。2. The micro X-ray target according to claim 1, wherein the tungsten rod has a diameter of 1 to 10 μm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20341293A JPH0756000A (en) | 1993-08-17 | 1993-08-17 | Micro x-ray target |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20341293A JPH0756000A (en) | 1993-08-17 | 1993-08-17 | Micro x-ray target |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0756000A true JPH0756000A (en) | 1995-03-03 |
Family
ID=16473648
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20341293A Pending JPH0756000A (en) | 1993-08-17 | 1993-08-17 | Micro x-ray target |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0756000A (en) |
Cited By (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002039792A3 (en) * | 2000-11-09 | 2002-08-22 | Steris Inc | Target for production of x-rays |
WO2013168468A1 (en) * | 2012-05-11 | 2013-11-14 | 浜松ホトニクス株式会社 | X-ray generation device and x-ray generation method |
JP2013541803A (en) * | 2010-08-25 | 2013-11-14 | ジーエーエムシー バイオテック デベロップメント カンパニー リミテッド | Thick target for transmission X-ray tube |
US20150110252A1 (en) * | 2013-09-19 | 2015-04-23 | Wenbing Yun | X-ray sources using linear accumulation |
CN105396894A (en) * | 2015-11-12 | 2016-03-16 | 中国工程物理研究院激光聚变研究中心 | Preparing method for non-bending ultrathin tungsten wires for Z-pinch torispherical wire array |
US9594036B2 (en) | 2014-02-28 | 2017-03-14 | Sigray, Inc. | X-ray surface analysis and measurement apparatus |
US10247683B2 (en) | 2016-12-03 | 2019-04-02 | Sigray, Inc. | Material measurement techniques using multiple X-ray micro-beams |
US10269528B2 (en) | 2013-09-19 | 2019-04-23 | Sigray, Inc. | Diverging X-ray sources using linear accumulation |
US10295485B2 (en) | 2013-12-05 | 2019-05-21 | Sigray, Inc. | X-ray transmission spectrometer system |
US10297359B2 (en) | 2013-09-19 | 2019-05-21 | Sigray, Inc. | X-ray illumination system with multiple target microstructures |
US10295486B2 (en) | 2015-08-18 | 2019-05-21 | Sigray, Inc. | Detector for X-rays with high spatial and high spectral resolution |
US10304580B2 (en) | 2013-10-31 | 2019-05-28 | Sigray, Inc. | Talbot X-ray microscope |
US10352880B2 (en) | 2015-04-29 | 2019-07-16 | Sigray, Inc. | Method and apparatus for x-ray microscopy |
US10349908B2 (en) | 2013-10-31 | 2019-07-16 | Sigray, Inc. | X-ray interferometric imaging system |
US10401309B2 (en) | 2014-05-15 | 2019-09-03 | Sigray, Inc. | X-ray techniques using structured illumination |
US10416099B2 (en) | 2013-09-19 | 2019-09-17 | Sigray, Inc. | Method of performing X-ray spectroscopy and X-ray absorption spectrometer system |
US10578566B2 (en) | 2018-04-03 | 2020-03-03 | Sigray, Inc. | X-ray emission spectrometer system |
US10658145B2 (en) | 2018-07-26 | 2020-05-19 | Sigray, Inc. | High brightness x-ray reflection source |
US10656105B2 (en) | 2018-08-06 | 2020-05-19 | Sigray, Inc. | Talbot-lau x-ray source and interferometric system |
US10845491B2 (en) | 2018-06-04 | 2020-11-24 | Sigray, Inc. | Energy-resolving x-ray detection system |
US10962491B2 (en) | 2018-09-04 | 2021-03-30 | Sigray, Inc. | System and method for x-ray fluorescence with filtering |
USRE48612E1 (en) | 2013-10-31 | 2021-06-29 | Sigray, Inc. | X-ray interferometric imaging system |
US11056308B2 (en) | 2018-09-07 | 2021-07-06 | Sigray, Inc. | System and method for depth-selectable x-ray analysis |
US11152183B2 (en) | 2019-07-15 | 2021-10-19 | Sigray, Inc. | X-ray source with rotating anode at atmospheric pressure |
-
1993
- 1993-08-17 JP JP20341293A patent/JPH0756000A/en active Pending
Cited By (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6463123B1 (en) | 2000-11-09 | 2002-10-08 | Steris Inc. | Target for production of x-rays |
JP2004514120A (en) * | 2000-11-09 | 2004-05-13 | ステリス インコーポレイテッド | X-ray target for products |
WO2002039792A3 (en) * | 2000-11-09 | 2002-08-22 | Steris Inc | Target for production of x-rays |
JP2013541803A (en) * | 2010-08-25 | 2013-11-14 | ジーエーエムシー バイオテック デベロップメント カンパニー リミテッド | Thick target for transmission X-ray tube |
JPWO2013168468A1 (en) * | 2012-05-11 | 2016-01-07 | 浜松ホトニクス株式会社 | X-ray generator and X-ray generation method |
WO2013168468A1 (en) * | 2012-05-11 | 2013-11-14 | 浜松ホトニクス株式会社 | X-ray generation device and x-ray generation method |
US9390881B2 (en) * | 2013-09-19 | 2016-07-12 | Sigray, Inc. | X-ray sources using linear accumulation |
US10416099B2 (en) | 2013-09-19 | 2019-09-17 | Sigray, Inc. | Method of performing X-ray spectroscopy and X-ray absorption spectrometer system |
US10976273B2 (en) | 2013-09-19 | 2021-04-13 | Sigray, Inc. | X-ray spectrometer system |
US10269528B2 (en) | 2013-09-19 | 2019-04-23 | Sigray, Inc. | Diverging X-ray sources using linear accumulation |
US10297359B2 (en) | 2013-09-19 | 2019-05-21 | Sigray, Inc. | X-ray illumination system with multiple target microstructures |
US20150110252A1 (en) * | 2013-09-19 | 2015-04-23 | Wenbing Yun | X-ray sources using linear accumulation |
USRE48612E1 (en) | 2013-10-31 | 2021-06-29 | Sigray, Inc. | X-ray interferometric imaging system |
US10653376B2 (en) | 2013-10-31 | 2020-05-19 | Sigray, Inc. | X-ray imaging system |
US10304580B2 (en) | 2013-10-31 | 2019-05-28 | Sigray, Inc. | Talbot X-ray microscope |
US10349908B2 (en) | 2013-10-31 | 2019-07-16 | Sigray, Inc. | X-ray interferometric imaging system |
US10295485B2 (en) | 2013-12-05 | 2019-05-21 | Sigray, Inc. | X-ray transmission spectrometer system |
US9594036B2 (en) | 2014-02-28 | 2017-03-14 | Sigray, Inc. | X-ray surface analysis and measurement apparatus |
US10401309B2 (en) | 2014-05-15 | 2019-09-03 | Sigray, Inc. | X-ray techniques using structured illumination |
US10352880B2 (en) | 2015-04-29 | 2019-07-16 | Sigray, Inc. | Method and apparatus for x-ray microscopy |
US10295486B2 (en) | 2015-08-18 | 2019-05-21 | Sigray, Inc. | Detector for X-rays with high spatial and high spectral resolution |
CN105396894A (en) * | 2015-11-12 | 2016-03-16 | 中国工程物理研究院激光聚变研究中心 | Preparing method for non-bending ultrathin tungsten wires for Z-pinch torispherical wire array |
US10247683B2 (en) | 2016-12-03 | 2019-04-02 | Sigray, Inc. | Material measurement techniques using multiple X-ray micro-beams |
US10466185B2 (en) | 2016-12-03 | 2019-11-05 | Sigray, Inc. | X-ray interrogation system using multiple x-ray beams |
US10578566B2 (en) | 2018-04-03 | 2020-03-03 | Sigray, Inc. | X-ray emission spectrometer system |
US10845491B2 (en) | 2018-06-04 | 2020-11-24 | Sigray, Inc. | Energy-resolving x-ray detection system |
US10989822B2 (en) | 2018-06-04 | 2021-04-27 | Sigray, Inc. | Wavelength dispersive x-ray spectrometer |
US10658145B2 (en) | 2018-07-26 | 2020-05-19 | Sigray, Inc. | High brightness x-ray reflection source |
US10991538B2 (en) | 2018-07-26 | 2021-04-27 | Sigray, Inc. | High brightness x-ray reflection source |
US10656105B2 (en) | 2018-08-06 | 2020-05-19 | Sigray, Inc. | Talbot-lau x-ray source and interferometric system |
US10962491B2 (en) | 2018-09-04 | 2021-03-30 | Sigray, Inc. | System and method for x-ray fluorescence with filtering |
US11056308B2 (en) | 2018-09-07 | 2021-07-06 | Sigray, Inc. | System and method for depth-selectable x-ray analysis |
US11152183B2 (en) | 2019-07-15 | 2021-10-19 | Sigray, Inc. | X-ray source with rotating anode at atmospheric pressure |
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