EP0815582B1 - Microfocus x-ray device - Google Patents

Microfocus x-ray device Download PDF

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Publication number
EP0815582B1
EP0815582B1 EP96907493A EP96907493A EP0815582B1 EP 0815582 B1 EP0815582 B1 EP 0815582B1 EP 96907493 A EP96907493 A EP 96907493A EP 96907493 A EP96907493 A EP 96907493A EP 0815582 B1 EP0815582 B1 EP 0815582B1
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Prior art keywords
target
electron beam
layer
retarding
carrier layer
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EP96907493A
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German (de)
French (fr)
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EP0815582A1 (en
Inventor
Alfred Reinhold
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RASCHER GMBH
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Medixtec Medizinische Gerate GmbH
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    • GPHYSICS
    • G21NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21KTECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00Gamma- or X-ray microscopes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/24Tubes wherein the point of impact of the cathode ray on the anode or anticathode is movable relative to the surface thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00X-ray tubes
    • H01J35/02Details
    • H01J35/04Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08Anodes; Anti cathodes
    • H01J35/112Non-rotating anodes
    • H01J35/116Transmissive anodes

Definitions

  • the invention relates to a device according to the Preamble of claim 1.
  • a device is known from U.S. Patent 4,344,013 (Ledley).
  • Every point of the object at different angles, namely from different Producing the radiation source that would be irradiated each object point would result in the projection into the Shadows offset from each other in the image plane, and overall the result would be a washed out contour of the Object, according to its distance from the Image plane is shown enlarged.
  • the exposure time per x-ray is extended, when working with lower power x-rays would what the requirement for short exposure times in the range of tenths to hundredths of a second contradict to an unnecessarily high radiation exposure and Avoid blurring due to object movement.
  • the thermal focal spot on the target anode is smaller is, the lower the electrical Power absorbed by the small target area before it starts to melt. This behavior contradicts the demand for higher density of the target impacting electron beams for higher X-ray power output.
  • DE-OS, A, 33 07 019 (Scanray) is a microfocus X-ray device known where the electron beam Draw perpendicular to the target. As useful radiation the outgoing at an angle of 0 to 10 degrees X-ray related. However, it comes with a solid Target worked. A meltdown transmission target is not intended and not addressed.
  • the invention is therefore based on the object Capture the point in time at which the vertical incidence Electron beam has melted through the target and becomes one other target point must be directed.
  • the microfocus x-ray device 1 consists of a evacuated housing 11, 12 made of glass or non-ferromagnetic metal.
  • the tube 12 has one any, usually round cross-section.
  • By a rear end face 11 of the tube 12 protrude electrically Feed wires 13 for a hairpin-shaped cathode 14 ins Inside of tube 12.
  • the heated cathode 14 acts as an electron source, from whose radiation by means of a cap-shaped grating 15 a narrow divergent Electron beam 16 is hidden.
  • the beam 16 occurs through the central opening of a perforated disk anode 17 through and experiences a bundling into one virtual focal spot 18.
  • Beam 16 passes through the cross-sectional zone outside the tube 12 arranged deflection coil 19 and is in magnetic gap 20 a subsequent Focusing coil 21 bundled.
  • the focusing coil 21 forms as an electromagnetic lens, a reduced image of the virtual focal spot 18 as focal spot 22 on a Transmission target 23 from which is in the outlet opening 24 of the tube 12 is located.
  • the focusing coil 21 is generated an extremely small-area focal spot 22 in the Typical order of magnitude of 0.5 ... 100 ⁇ m.
  • the target 23 consists of a thin brake layer 32 made of a metal high atomic number in the periodic system of elements, such as Tungsten, gold, copper or molybdenum, and one weak X-ray absorbing but good heat conductor Carrier layer 33, preferably made of aluminum or Beryllium.
  • a thin brake layer 32 made of a metal high atomic number in the periodic system of elements, such as Tungsten, gold, copper or molybdenum, and one weak X-ray absorbing but good heat conductor Carrier layer 33, preferably made of aluminum or Beryllium.
  • a suction system 37 for maintaining the vacuum in the tube 12 and for withdrawing vaporous Traces of material from the burning cathode 14 causes at the same time keeping the interior of the tube 12 clean melted material particles from the focal spot hole 31 in target 23.
  • the particularly high yield of X-rays 25 results from the extremely small-area stimulated braking volume 40 ( Figure 4) in the transmission target 23.
  • the high Power density so the high area-specific physical stress with the microfocused Electron beam 16, leads to the burning in of a Focal spot hole 31 in the target 23, so that in Departure direction 28 of the X-rays 25 the remaining Target material and thus its radiation-weakening Self-absorption continuously reduced.
  • the brake layer 32 is targeted by the incident electron beam 16 melted, which is a regarding their physical state dynamically changing x-ray source represents.
  • the brake material as a thin layer 32, approximately from Tungsten, on a thick backing layer 33 made of good heat-conducting material, such as beryllium or aluminum, is stored, then it is hardly avoidable but also not critical that at the bottom of the hole 31 in the brake layer 32 finally from the microfused electron beam 16 also the backing layer behind in the beam direction 28 33 is melted. Then, however, the radiation must of the target 23 are ended at this point, that is in the Application of this X-ray device 1 ends the recording his; because the application of the carrier layer 33 with Electron beams 16 only lead to a very soft one X-ray radiation 25 and thus hardly in the image plane 29 usable diffuse silhouettes of the translucent sample 26.
  • the transmission target 23 must not be used again a spot is irradiated where a hole 31 has been branded because otherwise soon or even immediately the carrier layer 33 instead of the brake line 32 would be melted from brake material.
  • an offset control 34 is provided which is controlled by the The beam deflection described above by means of the deflection coil 19 out of the device axis 10 and / or by displacement of the target 23 relative to the device axis 10 ensures that just along a meandering or spiral arch successive focal spots 22 are caused. This ensures that only unused areas of the target 23 in succession are claimed and thus a destruction of the carrier layer 33 with triggers only a little more useful because it is too low in energy X-rays are avoided.
  • the target 23 is thus by the vertical exposure to electrons in the Transmitted light operation so loaded until an aggregate conversion in the molten phase.
  • a positioning motor 35 placed in the tube, shown in the drawing. Instead, the target 23 together with positioning motor 35 in principle also on the front the outlet opening 24 of the tube 12 held vacuum-tight his; or from an external arrangement of the positioning motor A rod attacks through the wall a rotating or sliding bracket 36 for the target in Inside the tube 12.
  • the relocation must of the target 23 always take place when the electron beam 16 the micro-hole 31 as deep in the brake layer 32 has burned in that it reaches the carrier layer 33.
  • a simple procedure for determining this point in time is after one in terms of performance assessable or easier to determine empirically short exposure time on the order of milli- or microseconds the focal spot generation on the target 23 for what the electron beam, as above already described, switched off, dimmed or off the target area can be pivoted out.
  • the process takes no account of the individual Condition of the micro hole 31. It may well be that the carrier layer 33 has already been irradiated in this method or that on the other hand, the micro-hole 31 is not yet Boundary between brake layer 32 and carrier layer 33 has reached.
  • a much more precise method for determining the point in time t a at which the brake layer 32 has melted and the electrons strike the carrier layer 33 is the measurement of the target current I shown in FIG. 3.
  • the target current I becomes measured as a function of the irradiation time t, then this has the course shown in Figure 3A.
  • the point in time t a is the point in time at which the electron beam has penetrated the braking layer 32 and the micro-hole 31 extends to the carrier layer 33.
  • the X-ray radiation arises within the braking volume 40 described.
  • the extent of the radiation source is thus determined by the size of the braking volume 40. Even if an electron beam diameter d going towards "zero" is assumed, a finite braking volume 40 remains due to the spreading of the electrons. Thus, a minimum radiation source size, which is essentially determined by E o and Z, cannot be fallen below in principle.
  • Target material doping 41 are introduced whose volumes are significantly smaller than that prescribed braking volume 40 of the electrons in one contiguous target material.
  • the usable X-rays are only generated in the target material high atomic number. That from the target material doping 41 in the base material low atomic number penetrated electrons do not contribute to the usable X-ray radiation, as well as that in addition to the doping 41 electrons penetrating directly into the carrier material do not contribute significantly to the usable radiation.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • X-Ray Techniques (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Radiation-Therapy Devices (AREA)

Abstract

PCT No. PCT/EP96/01145 Sec. 371 Date Jan. 8, 1998 Sec. 102(e) Date Jan. 8, 1998 PCT Filed Mar. 16, 1996 PCT Pub. No. WO96/29723 PCT Pub. Date Sep. 26, 1996In microfocus X-ray equipment for enlarging radiographic short-time recordings, a focussed electron beam for the production of X-radiation (16) impinges on the retarding material of a target (23). In this case, the retarding material in the focal spot (22) passes over into the liquid aggregate state due to the high thermal loading. For this reason, the equipment is operated in pulsed operation, wherein the position of the focal spot (22) on the target (23) is, when each loading occurs, displaced relative to the previous position. The retarding material is arranged in a retarding layer (32) on a carrier layer (33) and the electron beam (16) impinges on the retarding layer (32) oriented perpendicularly to the electron beam (16). A control interrupts the irradiation at the latest when the carrier layer (33) starts to melt.

Description

Die Erfindung betrifft eine Einrichtung gemäß dem Oberbegriff des Anspruches 1. Eine derartige Einrichtung ist aus der US-PS 4 344 013 (Ledley) bekannt.The invention relates to a device according to the Preamble of claim 1. Such a device is known from U.S. Patent 4,344,013 (Ledley).

Die Verwendbarkeit sogenannter direkt- und vergrößerungsradiographischer Einrichtungen, insbesondere auf den Gebieten der Materialprüfung und der Medizin, ist in dem Beitrag "Entwicklung und Perspektiven der medizinischen Vergrößerungsradiographie" von G.Reuther, H.-L. Kronholz und K.B. Hüttenbrink in RADIOLOGE Bd.31 (1991) 403-406, näher beschrieben. Die Funktion solcher Einrichtungen beruht auf der strahlengeometrischen Gesetzmäßigkeit, nach welcher eine Strahlungsquelle nur dann zu kontrastreichen Schattenbildern hoher Ortsauflösung führt, wenn die abbildungswirksame Abstrahlfläche sehr klein im Vergleich zur bestrahlten Fläche des abzubildenden Objektes ist. Weil anderenfalls jeder Punkt des Objektes unter verschiedenen Winkeln, nämlich von verschiedenen Stellen der Strahlenquelle her, bestrahlt werden würde, ergäbe jeder Objekt-Punkt bei der Projektion in die Bildebene gegeneinander versetzte Schattenwürfe, und insgesamt wäre das Resultat eine verwaschene Kontur des Objektes, das nach Maßgabe seiner Entfernung von der Bildebene vergrößert dargestellt wird.The usability of so-called direct and magnification radiographic facilities, in particular in the fields of materials testing and medicine in the article "Development and Perspectives of medical enlargement radiography "by G.Reuther, H.-L. Kronholz and K.B. Hüttenbrink in RADIOLOGE Vol.31 (1991) 403-406, described in more detail. The function of such Facilities is based on the geometric geometry Lawfulness, according to which a radiation source only then high-contrast silhouettes of high spatial resolution leads if the effective radiation area is very small compared to the irradiated area of the subject Object. Otherwise, every point of the object at different angles, namely from different Producing the radiation source that would be irradiated each object point would result in the projection into the Shadows offset from each other in the image plane, and overall the result would be a washed out contour of the Object, according to its distance from the Image plane is shown enlarged.

Trotz der damit erreichbaren Verbesserung der Auflösung haben sich Mikrofocus-Röntgeneinrichtungen in der Praxis, insbesondere der medizinischen Diagnostik, nicht so recht durchsetzen können. Das scheint vor allem darauf zurückzuführen zu sein, daß sie nur mit beschränkter Röntgenstrahlungs-Leistung arbeiten können. Denn die sehr enge Fokussierung des Elektronenstrahles auf das Bremstarget ergibt einen Brennfleck (Fokus) sehr kleinen Durchmessers mit dementsprechend sehr hoher Energiedichte. Diese große spezifische Belastung führt schnell dazu, daß das gewöhnlich unter einer Richtung von 10° bis 45° bestrahlte Target eine - für die Umwandlung der auftreffenden Elektronenstrahlenergie in abzugebende Röntgenstrahlenenergie - nachteilige Veränderung seiner Topographie mit baldiger Zuerstörung der Bremsschicht erfährt. Andererseits müßte die Belichtungszeit pro Röntgenaufnahme verlängert werden, wenn mit Röntgenstrahlen geringerer Leistung gearbeitet würde, was aber der Forderung nach kurzen Belichtungszeiten im Bereich von zehntel bis hundertstel Sekunden widerspräche, um eine unnötig hohe Strahlenbelastung und um Unschärfen aufgrund der Objekt-Bewegung zu vermeiden. Je kleiner allerdings der thermische Brennfleck auf der Target-Anode ist, desto niedriger wird auch die elektrische Leistung, die von der kleinen Targetfläche aufgenommen werden kann, ehe sie zu schmelzen beginnt. Dieses Verhalten widerspricht also der Forderung nach höherer Dichte der auf das Target aufprallenden Elektronenstrahlen für höhere Leistung der Röntgenstrahlung. Despite the achievable improvement in resolution have microfocus X-ray devices in practice, especially medical diagnostics, not really can enforce. Above all, that seems to be attributed to being limited X-ray power can work. Because the very narrow focus of the electron beam on the Brake target gives a very small focal spot (focus) Diameter with a correspondingly very high energy density. This large specific load quickly leads to the fact that usually in a direction of 10 ° to 45 ° irradiated target one - for converting the incident Electron beam energy to be emitted in X-ray energy - disadvantageous change of its topography with sooner First experienced brake layer failure. On the other hand, the exposure time per x-ray is extended, when working with lower power x-rays would what the requirement for short exposure times in the range of tenths to hundredths of a second contradict to an unnecessarily high radiation exposure and Avoid blurring due to object movement. Each however, the thermal focal spot on the target anode is smaller is, the lower the electrical Power absorbed by the small target area before it starts to melt. This behavior contradicts the demand for higher density of the target impacting electron beams for higher X-ray power output.

Aus der eingangs genannten US-PS 4 344 013 (Ledley) ist eine Mikrofocus-Röntgeneinrichtung bekannt, die bereits mit einem angeschmolzenen Target arbeitet. Bei dieser Einrichtung fällt der Elektronenstrahl auf ein schräggestelltes Target, so daß die erzeugte Röntgenstrahlung gleichfalls in einem Winkel vom Target abgestrahlt wird. Bei dieser Einrichtung ist jedoch nicht berücksichtigt worden, daß schon vor dem vollständigen Durchbrennen des Targets eine schnell fortschreitende Kraterbildung dazu führt, daß die optische Achse der abgestrahlten Röntgen-Nutzstrahlung eine Abschattung von dem aufquellenden Kraterrand erfährt, der die Röntgenstrahlung weitgehend absorbiert. Es ergibt sich ein diffuses Röntgenlicht, das nicht als von einer punktförmigen Quelle ausgehend angesehen werden kann. Deshalb hat sich eine derartige Einrichtung mit einer zum einfallenden Elektronenstrahl schrägen Stellung des Targets nicht bewährt.From the aforementioned US Pat. No. 4,344,013 (Ledley) known a microfocus X-ray device, which already with a melted target works. At this The electron beam strikes the device inclined target so that the generated X-rays also at an angle from the target is emitted. However, this facility is not been taken into account that even before the complete Blowing the target is a rapidly progressing one Crater formation causes the optical axis of the radiated useful x-rays a shade of the swelling crater rim that experiences the X-rays largely absorbed. It results in a diffuse x-ray light that is not considered by one point source can be viewed starting. Therefore, such a device with a incident electron beam oblique position of the target not proven.

Aus der DE-OS,A,33 07 019 (Scanray) ist eine Mikrofocus-Röntgeneinrichtung bekannt, bei der der Elektronenstrahl senkrecht auf das Target auffält. Als Nutzstrahlung wird die unter einem Winkel von 0 bis 10 Grad abgehende Röntgenstrahlung verwandt. Es wird jedoch mit einem festen Target gearbeitet. Ein Abschmelz-Transmissionstarget ist nicht vorgesehen und auch nicht angesprochen.DE-OS, A, 33 07 019 (Scanray) is a microfocus X-ray device known where the electron beam Draw perpendicular to the target. As useful radiation the outgoing at an angle of 0 to 10 degrees X-ray related. However, it comes with a solid Target worked. A meltdown transmission target is not intended and not addressed.

Der Erfindung liegt daher die Aufgabe zugrunde, genau den Zeitpunkt zu erfassen, an dem der senkrecht einfallende Elektronenstrahl das Target durchschmolzen hat und zu einer anderen Targetstelle gelenkt werden muß.The invention is therefore based on the object Capture the point in time at which the vertical incidence Electron beam has melted through the target and becomes one other target point must be directed.

Diese Aufgabe ist nach der Erfindung dadurch gelöst, daß die gattungsgemäße Mikrofocus-Röntgeneinrichtung auch nach dem Kennzeichnungsteil des Anspruchs 1 ausgelegt ist. This object is achieved according to the invention in that the generic microfocus x-ray device also after the characterizing part of claim 1 is designed.

In dem Unteranspruch wird eine Fortbildung der Erfindung beansprucht. In the subclaim is a development of the invention claimed.

In den Zeichnungen ist ein Ausführungsbeispiel der Erfindung dargestellt. Es zeigen :

Fig. 1
einen schematischen Längsschnitt durch eine Mikrofocus-Röntgeneinrichtung,
Fig. 2
einen Schnitt durch das Target in vergrößertem Maßstab,
Fig. 3
das Target nach Figur 2 mit einer Messung des Targetstroms,
Fig. 3A
den Verlauf des Targetstroms in Abhängigkeit von der Bestrahlungsdauer,
Fig. 4
ein Target mit einem eingezeichneten Bremsvolumen und
Fig. 4A
eine Trägerschicht mit Trägermaterial-Dotierungen.
In the drawings, an embodiment of the invention is shown. Show it :
Fig. 1
2 shows a schematic longitudinal section through a microfocus x-ray device,
Fig. 2
a section through the target on an enlarged scale,
Fig. 3
2 with a measurement of the target current,
Figure 3A
the course of the target current as a function of the irradiation time,
Fig. 4
a target with a marked braking volume and
Figure 4A
a carrier layer with carrier material doping.

Die Mikrofocus-Röntgeneinrichtung 1 besteht aus einem evakuierten Gehäuse 11, 12 aus Glas oder nicht-ferromagnetischem Metall. Die Röhre 12 hat einen beliebigen, in der Regel runden Querschnitt. Durch eine rückwärtige Stirnfläche 11 der Röhre 12 ragen elektrische Speisedrähte 13 für eine haarnadelförmige Kathode 14 ins Innere der Röhre 12 hinein. Die erhitzte Kathode 14 wirkt als Elektronenquelle, aus deren Abstrahlung mittels eines kappenförmigen Gitters 15 ein schmaler divergierender Elektronenstrahl 16 ausgeblendet wird. Der Strahl 16 tritt durch die zentrale Öffnung einer Lochscheibenanode 17 hindurch und erfährt dabei eine Bündelung zu einem virtuellen Brennfleck 18. Der sich danach wieder aufweitende Strahl 16 durchläuft die Querschnittszone einer außerhalb der Röhre 12 angeordneten Ablenkspule 19 und wird im magnetischen Spalt 20 einer sich anschließenden Fokussierspule 21 gebündelt. Die Fokussierspule 21 bildet als elektromagnitische Linse ein verkleinertes Bild des virtuellen Brennflecks 18 als Brennfleck 22 auf einem Transmissionstarget 23 ab, das sich in der Austrittsöffnung 24 der Röhre 12 befindet. Die Fokussierspule 21 erzeugt einen extrem kleinflächigen Brennfleck 22 in der Größenordnung von typisch 0,5 ... 100 µm. Das Target 23 besteht aus einer dünnen Bremsschicht 32 aus einem Metall hoher Ordnungszahl im periodischen System der Elemente, wie Wolfram, Gold, Kupfer oder Molybdän, und einer schwach Röntgenstrahlen absorbierenden aber gut wärmeleitenden Trägerschicht 33, vorzugsweise aus Aluminium oder Beryllium. Infolge der Bremswirkung des Targetmaterials lösen die-auftreffenden Elektronen des Strahls 16 die Röntgenstrahlung 25 aus. Ein Teil der Röntgenstrahlung 25 durchdringt das Target 23 mit der Strahlrichtung 28, die mit der Strahlachse 10 des Elektronenstrahls 16 übereinstimmt und verläßt die Röhre 12 in Richtung auf eine Probe 26 als divergierender Röntgenstrahl 25. Aufgrund der geometrischen Strahlengesetzmäßigkeit wird die Struktur der Probe 26, insoweit sie für die Röntgenstrahlen 25 mehr oder minder undurchlässig ist, entsprechend vergrößert als Schattenriß auf einen in größerem Abstand hinter der Probe 26 parallel zum Transmissionstarget 23 und somit senkrecht zur Strahlrichtung 28 angeordneten Film in der Bildebene 29 projiziert.The microfocus x-ray device 1 consists of a evacuated housing 11, 12 made of glass or non-ferromagnetic metal. The tube 12 has one any, usually round cross-section. By a rear end face 11 of the tube 12 protrude electrically Feed wires 13 for a hairpin-shaped cathode 14 ins Inside of tube 12. The heated cathode 14 acts as an electron source, from whose radiation by means of a cap-shaped grating 15 a narrow divergent Electron beam 16 is hidden. The beam 16 occurs through the central opening of a perforated disk anode 17 through and experiences a bundling into one virtual focal spot 18. The widening afterwards Beam 16 passes through the cross-sectional zone outside the tube 12 arranged deflection coil 19 and is in magnetic gap 20 a subsequent Focusing coil 21 bundled. The focusing coil 21 forms as an electromagnetic lens, a reduced image of the virtual focal spot 18 as focal spot 22 on a Transmission target 23 from which is in the outlet opening 24 of the tube 12 is located. The focusing coil 21 is generated an extremely small-area focal spot 22 in the Typical order of magnitude of 0.5 ... 100 µm. The target 23 consists of a thin brake layer 32 made of a metal high atomic number in the periodic system of elements, such as Tungsten, gold, copper or molybdenum, and one weak X-ray absorbing but good heat conductor Carrier layer 33, preferably made of aluminum or Beryllium. As a result of the braking effect of the target material solve the beam 16's incident electrons X-ray radiation 25 off. Part of the X-ray radiation 25 penetrates the target 23 with the beam direction 28 which coincides with the beam axis 10 of the electron beam 16 and leaves tube 12 toward sample 26 as divergent x-ray beam 25. Due to the geometric The structure of the sample 26, insofar as they are more or less for the X-rays 25 is impermeable, enlarged accordingly as a silhouette parallel to a larger distance behind the sample 26 to the transmission target 23 and thus perpendicular to the Beam direction 28 arranged film in the image plane 29th projected.

Eine Absauganlage 37 zur Aufrechterhaltung des Vakuums in der Röhre 12 und zum Abziehen von dampfförmigen Materialspuren der verbrennenden Kathode 14 bewirkt zugleich ein Reinhalten des Innenraums der Röhre 12 von abgeschmolzenen Materialpartikeln aus dem Brennfleckloch 31 im Target 23. A suction system 37 for maintaining the vacuum in the tube 12 and for withdrawing vaporous Traces of material from the burning cathode 14 causes at the same time keeping the interior of the tube 12 clean melted material particles from the focal spot hole 31 in target 23.

Die besonders hohe Ausbeute an Röntgenstrahlen 25 ergibt sich aus dem extrem kleinflächig angeregten Bremsvolumen 40 (Figur 4) im Transmissionstarget 23. Die hohe Leistungsdichte, also die hohe flächenspezifische physikalische Beanspruchung mit dem mikrofokussierten Elektronenstrahl 16, führt zum Einbrennen eines Brennfleckloches 31 in das Target 23, so daß sich in Abgangsrichtung 28 der Röntgenstrahlen 25 das verbleibende Targetmaterial und damit dessen strahlenschwächende Eigenabsorption fortlaufend verringert. Die Bremsschicht 32 wird durch den auftreffenden Elektronenstrahl 16 gezielt abgeschmolzen, was hinsichtlich ihres Aggregatzustandes eine dynamisch sich verändernde Röntgenstrahlungsquelle darstellt.The particularly high yield of X-rays 25 results from the extremely small-area stimulated braking volume 40 (Figure 4) in the transmission target 23. The high Power density, so the high area-specific physical stress with the microfocused Electron beam 16, leads to the burning in of a Focal spot hole 31 in the target 23, so that in Departure direction 28 of the X-rays 25 the remaining Target material and thus its radiation-weakening Self-absorption continuously reduced. The brake layer 32 is targeted by the incident electron beam 16 melted, which is a regarding their physical state dynamically changing x-ray source represents.

Wenn das Bremsmaterial als dünne Schicht 32, etwa aus Wolfram, auf einer dagegen dicken Trägerschicht 33 aus gut wärmeleitendem Material, wie Beryllium oder Aluminium, gelagert ist, dann ist es kaum vermeidbar aber auch unkritisch, daß am Boden des Loches 31 in der Bremsschicht 32 schließlich vom mikrofckussierten Elektronenstrahl 16 auch die in Strahlrichtung 28 dahinterliegende Trägerschicht 33 angeschmolzen wird. Dann allerdings muß die Bestrahlung des Targets 23 an dieser Stelle beendet werden, also in der Anwendung dieser Röntgeneinrichtung 1 die Aufnahme beendet sein; denn die Beaufschlagung der Trägerschicht 33 mit Elektronenstrahlen 16 führt nur noch zu einer sehr weichen Röntgenstrahlung 25 und damit in der Bildebene 29 zu kaum verwertbaren diffusen Schattenbildern der zu durchleuchtenden Probe 26.If the brake material as a thin layer 32, approximately from Tungsten, on a thick backing layer 33 made of good heat-conducting material, such as beryllium or aluminum, is stored, then it is hardly avoidable but also not critical that at the bottom of the hole 31 in the brake layer 32 finally from the microfused electron beam 16 also the backing layer behind in the beam direction 28 33 is melted. Then, however, the radiation must of the target 23 are ended at this point, that is in the Application of this X-ray device 1 ends the recording his; because the application of the carrier layer 33 with Electron beams 16 only lead to a very soft one X-ray radiation 25 and thus hardly in the image plane 29 usable diffuse silhouettes of the translucent sample 26.

Für das nächste aufzunehmende Röntgenschattenbild erfolgt wiederum die sehr kurzzeitige Bestrahlung des Transmissionstargets 23 mit einem mikrofokussierten Elektronenstrahl 16, wofür wiederum die Kathode 14 nur kurzzeitig betrieben und/oder der Strahl 16 über eine verschwenkbare, in der Zeichnung nicht dargestellte, Blende nur kurzzeitig freigegeben oder der Strahl 16 über eine entsprechende Ansteuerung der Ablenkspule 19 kurzzeitig aus einer funktionslosen Warterichtung in die Geräte- und Wirkachse 10 der Strahlrichtung 28 verschwenkt wird. Allerdings darf beim Transmissionstarget 23 nicht wieder eine Stelle bestrahlt werden, an der zuvor schon ein Loch 31 eingebrannt worden ist, weil sonst alsbald oder sogar unmittelbar die Trägerschicht 33 anstatt der Bremsschnicht 32 aus Bremsmaterial angeschmolzen werden würde. Deshalb ist eine Versatzsteuerung 34 vorgesehen, die durch die vorbeschriebene Strahlablenkung mittels der Ablenkspule 19 aus der Geräteachse 10 heraus und/oder durch Verlagerung des Targets 23 relativ zur Geräteachse 10 dafür sorgt, daß nur entlang eines mäandrisch oder spiralbogenförmig verlaufenden Weges aufeinanderfolgende Brennflecke 22 hervorgerufen werden. Dadurch ist sichergestellt, daß nur unverbrauchte Bereiche des Targets 23 nacheinander beansprucht werden und so eine Zerstörung der Trägerschicht 33 mit Auslösen nur wenig nützlicher da zu energiearmer Röntgenstrahlung vermieden wird. Das Target 23 wird also durch die senkrechte Beaufschlagung mit Elektronen im Durchlichtbetrieb so belastet, bis eine Aggregatumwandlung in die schmelzflüssige Phase einsetzt.For the next x-ray silhouette to be taken again the very short-term radiation of the Transmission targets 23 with a microfocused Electron beam 16, for which in turn the cathode 14 only operated for a short time and / or the beam 16 via a pivotable aperture, not shown in the drawing only released for a short time or the beam 16 via a corresponding control of the deflection coil 19 briefly from a non-functional waiting direction in the device and Active axis 10 of the beam direction 28 is pivoted. However, the transmission target 23 must not be used again a spot is irradiated where a hole 31 has been branded because otherwise soon or even immediately the carrier layer 33 instead of the brake line 32 would be melted from brake material. Therefore an offset control 34 is provided which is controlled by the The beam deflection described above by means of the deflection coil 19 out of the device axis 10 and / or by displacement of the target 23 relative to the device axis 10 ensures that just along a meandering or spiral arch successive focal spots 22 are caused. This ensures that only unused areas of the target 23 in succession are claimed and thus a destruction of the carrier layer 33 with triggers only a little more useful because it is too low in energy X-rays are avoided. The target 23 is thus by the vertical exposure to electrons in the Transmitted light operation so loaded until an aggregate conversion in the molten phase.

Zur Veranschaulichung der Verlagerung des Targets 23 relativ zur Röhre 12 bzw. ihrer Achse 10 ist in der Zeichnung ein Positioniermotor 35 in die Röhre hineinverlegt, zeichnerisch dargestellt. Stattdessen kann das Target 23 samt Positioniermotor 35 grundsätzlich auch stirnseitig vor der Austrittsöffnung 24 der Röhre 12 vakuumdicht gehaltert sein; oder von einer externen Anordnung des Positioniermotors 35 her greift durch die Wandung hindurch ein Gestänge an einer Dreh- oder Schiebehalterung 36 für das Target im Inneren der Röhre 12 an. To illustrate the displacement of the target 23 relative to the tube 12 or its axis 10 is in the Drawing a positioning motor 35 placed in the tube, shown in the drawing. Instead, the target 23 together with positioning motor 35 in principle also on the front the outlet opening 24 of the tube 12 held vacuum-tight his; or from an external arrangement of the positioning motor A rod attacks through the wall a rotating or sliding bracket 36 for the target in Inside the tube 12.

Wie vorstehend dargelegt worden ist, muß die Verlagerung des Targets 23 immer dann erfolgen, wenn der Elektronenstrahl 16 das Mikro-Loch 31 so tief in die Bremsschicht 32 eingebrannt hat, daß es die Trägerschicht 33 erreicht.As stated above, the relocation must of the target 23 always take place when the electron beam 16 the micro-hole 31 as deep in the brake layer 32 has burned in that it reaches the carrier layer 33.

Ein einfaches Verfahren zur Bestimmung dieses Zeitpunktes besteht darin, nach einer hinsichtlich der Leistung abschätzbaren oder leichter noch empirisch bestimmbaren kurzen Bestrahlungszeit in der Größenordnung von Milli- oder Mikrosekunden die Brennfleckerzeugung auf dem Target 23 zu beenden, wofür der Elektronenstrahl, wie vorstehend bereits beschrieben, abgeschaltet, abgeblendet oder aus dem Targetbereich herausgeschwenkt werden kann. Dieses Verfahren nimmt jedoch keine Rücksicht auf den individuellen Zustand des Mikro.Lochs 31. Es kann also durchaus sein, daß bei diesem Verfahren die Trägerschicht 33 bereits bestrahlt wird oder daß andererseits der Mikro-Loch 31 noch nicht die Grenze zwischen Bremsschicht 32 und Trägerschicht 33 erreicht hat.A simple procedure for determining this point in time is after one in terms of performance assessable or easier to determine empirically short exposure time on the order of milli- or microseconds the focal spot generation on the target 23 for what the electron beam, as above already described, switched off, dimmed or off the target area can be pivoted out. This However, the process takes no account of the individual Condition of the micro hole 31. It may well be that the carrier layer 33 has already been irradiated in this method or that on the other hand, the micro-hole 31 is not yet Boundary between brake layer 32 and carrier layer 33 has reached.

Ein wesentlich genaueres Verfahren zur Bestimmung des Zeitpunktes ta, an dem die Bremsschicht 32 durchgeschmolzen ist und die Elektronen auf die Trägerschicht 33 auftreffen, ist die in Figur 3 wiedergegebene Messung des Targetstromes I. Wird, wie in Figur 3 dargestellt ist, der Targetstrom I als Funktion der Bestrahlungszeit t gemessen, dann hat dieser den in Figur 3A dargestellten Verlauf. Im Zeitpunkt ta erfolgt eine sprunghafte Erhöhung des Targetstromes. Der Zeitpunkt ta ist derjenige Zeitpunkt, an dem der Elektronenstrahl die Bremsschicht 32 durchstoßen hat und das Mikro-Loch 31 bis auf die Trägerschicht 33 reicht. Durch Messung des Targetstroms I kann also sehr leicht durch die Steuerung ein Befehl für die Umlenkung des Elektronenstrahls 16 gewonnen werden. Hierbei werden automatisch sämtliche lokalen Besonderheiten von Bremsschicht 32 und Trägerschicht 33 berücksichtigt.A much more precise method for determining the point in time t a at which the brake layer 32 has melted and the electrons strike the carrier layer 33 is the measurement of the target current I shown in FIG. 3. As shown in FIG. 3, the target current I becomes measured as a function of the irradiation time t, then this has the course shown in Figure 3A. At time t a there is a sudden increase in the target current. The point in time t a is the point in time at which the electron beam has penetrated the braking layer 32 and the micro-hole 31 extends to the carrier layer 33. By measuring the target current I, a command for the deflection of the electron beam 16 can thus very easily be obtained by the control. All local special features of brake layer 32 and carrier layer 33 are automatically taken into account here.

Dringt ein in einem Hochspannungsfeld beschleunigtes Elektron in die Oberfläche von Materie ein, so erfährt es in Wechselwirkung mit der Materie eine Folge elastischer Stöße, bei denen es jeweils einen Teil seiner kinetischen Energie verliert, die sich in Strahlung umwandelt. Ein Teil dieser Strahlung besteht aus Röntgenstrahlung. Während der Folge der elastischen Stöße durchläuft das Elektron innerhalb des Targetmaterials ein Bremsvolumen 40 (Figur 4), dessen Ausdehnung in erster Linie durch die Ordnungszahl Z des Targetmaterials, die Energie Eo der Elektronen und durch den Elektronenstrahldurchmesser d bestimmt ist.If an electron accelerated in a high-voltage field penetrates the surface of matter, it experiences in interaction with the matter a series of elastic collisions, each of which loses some of its kinetic energy, which is converted into radiation. Part of this radiation consists of X-rays. During the sequence of elastic impacts, the electron passes through a braking volume 40 (FIG. 4) within the target material, the expansion of which is primarily determined by the atomic number Z of the target material, the energy E o of the electrons and the electron beam diameter d.

Die Röntgenstrahlung entsteht innerhalb des beschriebenen Bremsvolumens 40. Die Ausdehnung der Strahlenquelle ist somit bestimmt durch die Größe des Bremsvolumens 40. Selbst dann, wenn ein gegen "Null" gehender Elektronenstrahldurchmesser d angenommen wird, bleibt infolge der Ausbreitung der Elektronen ein endliches Bremsvolumen 40 bestehen. Somit kann eine, im wesentlichen durch Eo und Z bestimmte minimale Strahlenquellengröße grundsätzlich nicht unterschritten werden.The X-ray radiation arises within the braking volume 40 described. The extent of the radiation source is thus determined by the size of the braking volume 40. Even if an electron beam diameter d going towards "zero" is assumed, a finite braking volume 40 remains due to the spreading of the electrons. Thus, a minimum radiation source size, which is essentially determined by E o and Z, cannot be fallen below in principle.

Soll nun eine weitere Verkleinerung der Strahlenquelle erreicht werden, so müssen in das Trägermaterial Targetmaterial-Dotierungen 41 (Figur 4A) eingebracht werden deren Volumina jeweils deutlich kleiner sind als das vorbeschriebene Bremsvolumen 40 der Elektronen in einem zusammenhängenden Targetmaterial.Now, a further reduction in the radiation source must be achieved in the carrier material Target material doping 41 (Figure 4A) are introduced whose volumes are significantly smaller than that prescribed braking volume 40 of the electrons in one contiguous target material.

Die nutzbare Röntgenstrahlung entsteht nur im Targetmaterial hoher Ordnungszahl. Die aus den Targetmaterial-Dotierungen 41 in das Trägermaterial geringer Ordnungszahl eingedrungenen Elektronen tragen nicht zur nutzbaren Röntgenstrahlung bei, wie auch die neben den Dotierungen 41 direkt in das Trägermaterial eindringenden Elektronen nicht wesentlich zur nutzbaren Strahlung beitragen.The usable X-rays are only generated in the target material high atomic number. That from the target material doping 41 in the base material low atomic number penetrated electrons do not contribute to the usable X-ray radiation, as well as that in addition to the doping 41 electrons penetrating directly into the carrier material do not contribute significantly to the usable radiation.

Da in den kleinen Dotierungsvolumina gemäß Figur 4A bei gleicher Elektronenstrahldichte somit weniger Röntgenphotonen pro Zeit entstehen als in dem größeren Bremsvolumina 40 in einer Bremsschicht 32 (Figur 2), muß die Elektronenstrahldichte (Strom) erhöht werden. Das führt zwar zum schnelleren Abschmelzen der Targetmaterial-Dotierungen 41 und deren Trägermaterialumgebung, jedoch kann auch die während des Schmelzvorganges entstehende Röntgenstrahlung genutzt werden. Für die nächste Röntgenaufnahme wird der Elektronenstrahl 16 in bekannter Weise auf eine noch unbenutzte Dotierungsstelle 41 gelenkt, usw.. Die Dotierungen 41 können zum Beispiel in einem definierten Raster angeordnet sein. Since in the small doping volumes according to FIG. 4A same electron beam density less X-ray photons are generated per time than in the larger one Brake volumes 40 in a brake layer 32 (Figure 2), must the electron beam density (current) can be increased. The leads to faster melting of the target material dopings 41 and their substrate environment, however can also arise during the melting process X-rays can be used. For the next X-ray image of the electron beam 16 is known Directed to a still unused doping point 41, etc. The doping 41 can for example in one defined grid can be arranged.

BezugszeichenlisteReference list

11
Mikrofocus-RöntgeneinrichtungMicrofocus X-ray device
1010th
Geräte- und StrahlachseDevice and beam axis
1111
StirnflächeFace
1212th
Röhretube
1313
SpeisedrähteEdging wires
1414
Kathodecathode
1515
GitterGrid
1616
ElektronenstrahlElectron beam
1717th
LochscheibePerforated disc
1818th
virtueller Brennfleckvirtual focal spot
1919th
AblenkspuleDeflection coil
2020th
magnetischer Spaltmagnetic gap
2121
FokussierspuleFocusing coil
2222
BrennfleckFocal spot
2323
TransmissionstargetTransmission target
2424th
AustrittsöffnungOutlet opening
2525th
RöntgenstrahlungX-rays
2626
Probesample
2828
Strahlrichtung der RöntgenstrahlenX-ray beam direction
2929
BildebeneImage plane
3131
MikrolochMicro hole
3232
BremsschichtBrake layer
3333
TrägerschichtCarrier layer
3434
VersatzsteuerungOffset control
3535
PositioniermotorPositioning motor
3636
Dreh- oder schiebehalterungSwivel or sliding bracket
3737
AbsauganlageExtraction system
4040
BremsvolumenBraking volume
4141
DotierungenEndowments

Claims (2)

  1. Microfocus X-ray device, wherein a focussed electron beam for generation of the X-ray radiation is incident perpendicularly on a retarding material of a target (23), the retarding material is converted at the focal point (22) at least into the liquid state of aggregation by the high thermal loading and the position of focal point (22) on the target (23) is displaced with each loading relative to the previous position, wherein the retarding material is arranged in a retarding layer (32) on a carrier layer (33), the retarding layer (32) is arranged at the side of the carrier layer (33) oriented towards the electron beam (16), and a control (34) is provided which interrupts the electron beam (16) at the latest or melting of the carrier layer (33), characterised in that the control (34) is a target current measuring apparatus, which ascertains the instant (ta), at which the electron beam (16) begins to melt the carrier layer (33), by measurement of the target current (I).
  2. X-ray device according to claim 1, characterised in that the retarding material is arranged in the form of dopings (41) in the carrier layer (33).
EP96907493A 1995-03-20 1996-03-16 Microfocus x-ray device Expired - Lifetime EP0815582B1 (en)

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DE19509516 1995-03-20
DE19509516A DE19509516C1 (en) 1995-03-20 1995-03-20 Microfocus X-ray device
PCT/EP1996/001145 WO1996029723A1 (en) 1995-03-20 1996-03-16 Microfocus x-ray device

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EP0815582A1 EP0815582A1 (en) 1998-01-07
EP0815582B1 true EP0815582B1 (en) 1999-09-22

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JP (1) JP3150703B2 (en)
AT (1) ATE185021T1 (en)
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DE19509516C1 (en) 1996-09-26
US5857008A (en) 1999-01-05
JP3150703B2 (en) 2001-03-26
EP0815582A1 (en) 1998-01-07
DE59603163D1 (en) 1999-10-28
ATE185021T1 (en) 1999-10-15
WO1996029723A1 (en) 1996-09-26

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