JPH0737743A - Manufacture of chip type coil - Google Patents
Manufacture of chip type coilInfo
- Publication number
- JPH0737743A JPH0737743A JP17646693A JP17646693A JPH0737743A JP H0737743 A JPH0737743 A JP H0737743A JP 17646693 A JP17646693 A JP 17646693A JP 17646693 A JP17646693 A JP 17646693A JP H0737743 A JPH0737743 A JP H0737743A
- Authority
- JP
- Japan
- Prior art keywords
- printing
- conductor
- film
- manufacturing
- coil
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Manufacturing Cores, Coils, And Magnets (AREA)
- Coils Or Transformers For Communication (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、電子回路に用いられ、
基板上にコイル導体を形成したチップ型コイルの製造方
法に関する。The present invention is used in electronic circuits,
The present invention relates to a method for manufacturing a chip coil in which a coil conductor is formed on a substrate.
【0002】[0002]
【従来の技術】従来、この種のチップ型コイルの製造方
法には特開平2−54903号公報に示すような製造方
法があった。以下その製造方法について図2(a)〜
(j)を参照しながら説明する。2. Description of the Related Art Conventionally, as a method of manufacturing a chip type coil of this type, there has been a manufacturing method as disclosed in Japanese Patent Application Laid-Open No. 2-54903. The manufacturing method will be described below with reference to FIGS.
This will be described with reference to (j).
【0003】図に示すように、絶縁性ガラスからなる基
板1の表裏に蒸着、スパッタリングまたはイオンプレー
ティング法等の薄膜技術によりAg導体膜2を形成した
後、表面、裏面にレジスト膜3をコーティングし、端子
電極4a,4bおよびコイル導体5以外の部分をエッチ
ング法により除去する。As shown in the figure, after forming an Ag conductor film 2 on the front and back of a substrate 1 made of insulating glass by a thin film technique such as vapor deposition, sputtering or ion plating, a resist film 3 is coated on the front and back surfaces. Then, the portions other than the terminal electrodes 4a and 4b and the coil conductor 5 are removed by an etching method.
【0004】次に、基板1の表面にポリイミドあるいは
ポリアミドからなる絶縁膜6をコーティングした後、エ
ッチング(露光−現像)により端子電極4a,4bおよ
びコイル導体5の内端部分の絶縁膜6を除去する。これ
により、コイル導体の内端部分5aの上にスルーホール
7が形成される。Next, after the insulating film 6 made of polyimide or polyamide is coated on the surface of the substrate 1, the insulating film 6 at the inner end portions of the terminal electrodes 4a and 4b and the coil conductor 5 is removed by etching (exposure-development). To do. As a result, the through hole 7 is formed on the inner end portion 5a of the coil conductor.
【0005】次に、コイル導体5の内端部分5aから一
方の端子電極4bに延びるリード導体8をコイル導体5
と同様の方法にて形成する。つぎに、基板1の表面に保
護膜として絶縁膜9をコーティングした後、エッチング
により端子電極4a,4bの絶縁膜6を除去する。つぎ
に、基板1を格子状にダイシングカットして多数の基板
1を形成する。Next, the lead conductor 8 extending from the inner end portion 5a of the coil conductor 5 to the one terminal electrode 4b is attached to the coil conductor 5.
It is formed by the same method as. Next, after the insulating film 9 is coated on the surface of the substrate 1 as a protective film, the insulating film 6 of the terminal electrodes 4a and 4b is removed by etching. Next, the substrate 1 is dicing-cut into a lattice shape to form a large number of substrates 1.
【0006】次に、切断された各基板1の左右側面1
a,1bにスパッタリング法により側面電極を形成し
て、基板1の両面の端子電極4aどうしおよび4bどう
しを接続する。そして最後に、端子電極の外表面に電解
めっきにより、Niめっき膜10およびはんだめっき膜
11を形成してチップ型コイルを形成していた。Next, the left and right side faces 1 of each of the cut substrates 1
Side electrodes are formed on a and 1b by a sputtering method to connect the terminal electrodes 4a and 4b on both surfaces of the substrate 1 to each other. Finally, the Ni-plated film 10 and the solder-plated film 11 were formed on the outer surface of the terminal electrode by electrolytic plating to form a chip coil.
【0007】[0007]
【発明が解決しようとする課題】しかしながら上記従来
のチップ型コイルの製造方法では、スパッタリング法等
の薄膜技術によりAg導体膜2および絶縁膜6を形成し
ているので、連続処理が難しく、量産するためには多く
のスパッタリング装置を必要とし、また薄膜技術および
エッチング法を数回行う必要があるので、工程が複雑と
なり生産コストが高くなるという問題があった。However, since the Ag conductor film 2 and the insulating film 6 are formed by a thin film technique such as a sputtering method in the above-described conventional method for manufacturing a chip coil, continuous processing is difficult and mass production is performed. Therefore, many sputtering devices are required, and the thin film technology and the etching method need to be performed several times, resulting in a complicated process and a high production cost.
【0008】本発明は上記従来の問題を解決するもの
で、スパッタリング装置を使用しなく、安価に製造でき
るチップ型コイルの製造方法を提供することを目的とす
る。The present invention solves the above conventional problems, and an object of the present invention is to provide a method for manufacturing a chip-type coil which can be manufactured at low cost without using a sputtering apparatus.
【0009】[0009]
【課題を解決するための手段】上記目的を達成するため
に、本発明は表面から裏面へ貫通するスルーホールを有
するセラミック材料からなる絶縁基板の表面およびスル
ーホールに金属有機物からなる導体材料をスクリーン印
刷およびスルーホール印刷により印刷し焼成して導体膜
を形成する工程と、導体膜の不要部分をエッチング法に
より除去して一対の端子電極と帯状のコイル導体とを形
成する工程と、端子電極とコイル導体の上面を覆うよう
に絶縁基板の表面に樹脂系の絶縁膜をコーティングする
工程とを備えたものである。In order to achieve the above object, the present invention is to screen a conductor material made of a metal organic material on the surface and the through hole of an insulating substrate made of a ceramic material having a through hole penetrating from the front surface to the back surface. A step of printing by printing and through-hole printing and baking to form a conductor film; a step of removing unnecessary portions of the conductor film by an etching method to form a pair of terminal electrodes and a strip-shaped coil conductor; And a step of coating the surface of the insulating substrate with a resin-based insulating film so as to cover the upper surface of the coil conductor.
【0010】[0010]
【作用】本発明によれば、導体膜を印刷機とベルト式連
続焼成炉によって連続的に形成でき、またエッチング工
程が1回のみとなり、製造工程を簡略化できる。According to the present invention, the conductor film can be continuously formed by the printing machine and the belt type continuous firing furnace, and the etching process is performed only once, so that the manufacturing process can be simplified.
【0011】[0011]
【実施例】以下、本発明の一実施例について、図面を参
照しながら説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.
【0012】図1(a)において、12は絶縁基板であ
り、カッティングされる前にスルーホール13を有し、
ガラス、結晶化ガラスあるいはアルミナ等によって構成
され洗浄した後両面に鏡面研磨が施されている。In FIG. 1A, reference numeral 12 is an insulating substrate having a through hole 13 before being cut,
It is made of glass, crystallized glass, alumina or the like, and after cleaning, both surfaces are mirror-polished.
【0013】次に、絶縁基板12の上面、裏面およびス
ルーホール13をAuを主成分とする金属有機物からな
る導体材料をスクリーン印刷およびスルーホール印刷等
の印刷技術により印刷し、乾燥した後、金属有機物から
なる電極ペーストの有機成分だけを飛ばし、ベルト式連
続焼成炉によって850℃の温度(ピーク時間6分、I
N−OUT時間45分のプロファイル)によって焼成す
ることにより、金属成分だけを絶縁基板12上に焼き付
けて導体膜14を形成する(図1(b)参照)。Next, the upper surface and the back surface of the insulating substrate 12 and the through holes 13 are printed with a printing material such as a screen printing method and a through hole printing method using a conductive material made of a metal organic material containing Au as a main component, dried, and then dried. Only the organic component of the electrode paste consisting of organic matter was blown off, and a belt type continuous firing furnace was used to obtain a temperature of 850 ° C. (peak time 6 minutes, I
By firing with a profile of N-OUT time 45 minutes), only the metal component is baked on the insulating substrate 12 to form the conductor film 14 (see FIG. 1B).
【0014】次に導体膜14の不要部分を除去するため
に、上面および裏面にレジスト膜15をコーティングし
たあと、一対の端子電極16a,16b、帯状のコイル
導体17、裏面のスルーホール13および端子電極を結
ぶ導体18を残すようにエッチング処理を行う(図1
(c),(d)参照)。Next, in order to remove unnecessary portions of the conductor film 14, a resist film 15 is coated on the upper surface and the back surface, and then a pair of terminal electrodes 16a and 16b, a strip-shaped coil conductor 17, a through hole 13 on the back surface and terminals. Etching is performed so as to leave the conductor 18 connecting the electrodes (FIG. 1).
(See (c) and (d)).
【0015】次に、端子電極16a,16bは除き、コ
イル導体17の上面を覆うように絶縁基板12の表面に
ポリイミドまたはポリアミドからなる絶縁膜19をスク
リーン印刷し、熱硬化してコーティングする(図1
(e)参照)。Next, except for the terminal electrodes 16a and 16b, an insulating film 19 made of polyimide or polyamide is screen-printed on the surface of the insulating substrate 12 so as to cover the upper surface of the coil conductor 17, and is thermally cured and coated (see FIG. 1
(See (e)).
【0016】次に、絶縁基板12を格子状にダイシング
カットして多数の絶縁基板12を形成し、切断された絶
縁基板12の左右側面20a,20bに、スパッタによ
りNiの側面電極を形成して、絶縁基板12の両面の端
子電極16a,16bどうしを接続する(図1(f)参
照)。Next, the insulating substrate 12 is diced and cut into a lattice pattern to form a large number of insulating substrates 12, and Ni side electrodes are formed on the left and right side surfaces 20a and 20b of the cut insulating substrate 12 by sputtering. , The terminal electrodes 16a and 16b on both surfaces of the insulating substrate 12 are connected to each other (see FIG. 1 (f)).
【0017】そして最後に、はんだ付け時の電極食われ
の防止およびはんだ付け時の信頼性を確保するため、露
出している端子電極16a,16bの表面に、電解めっ
きによってNiめっき膜21およびSn−Pbめっき膜
22を形成する(図1(g)参照)。Finally, in order to prevent electrode erosion during soldering and to ensure reliability during soldering, the exposed surfaces of the terminal electrodes 16a and 16b are plated with Ni plating film 21 and Sn. -Pb plating film 22 is formed (see FIG. 1 (g)).
【0018】このように本実施例のチップ型コイルの製
造方法によれば、コイル導体17をスパッタ等の薄膜技
術と同様に金属有機物からなる導体材料をスクリーン印
刷技術によって薄膜を形成し、エッチングして形成する
ため、従来と同様に微細なパターンを形成することが可
能であるとともに、印刷機とベルト式連続焼成炉によっ
て連続的に導体膜14を形成するので生産性を向上でき
る。As described above, according to the method of manufacturing the chip type coil of this embodiment, the coil conductor 17 is formed by etching a conductive material made of a metal organic material by a screen printing technique as in the thin film technique such as sputtering. Since it is formed as described above, it is possible to form a fine pattern as in the conventional case, and since the conductor film 14 is continuously formed by a printing machine and a belt type continuous firing furnace, productivity can be improved.
【0019】なお、上記実施例ではスルーホール13を
有する絶縁基板12に金属有機物からなる導体材料をス
クリーン印刷等の印刷技術により形成したが、これは絶
縁基板12に限定するものではなく、例えば従来のチッ
プ型コイルの製造方法においても、導体パターンを薄膜
技術により形成したものでもこの方法を適用することに
より、大幅に生産効率を向上させることができることは
いうまでもない。In the above embodiment, the conductive material made of a metal organic material is formed on the insulating substrate 12 having the through holes 13 by a printing technique such as screen printing. However, the insulating material is not limited to the insulating substrate 12 and may be, for example, a conventional one. It goes without saying that the production efficiency of the chip-type coil can be significantly improved by applying this method even if the conductor pattern is formed by the thin film technique.
【0020】また、金属有機物電極ペーストの焼成温度
を850℃としたが、焼成温度は850℃に限定するも
のではない。Although the firing temperature of the metal organic electrode paste is 850 ° C., the firing temperature is not limited to 850 ° C.
【0021】また、金属有機物電極ペーストはAuを主
成分とする導体材料を用いたが、Ni系や他の貴金属系
でもよく、金属有機物導体材料なら何でも良い。Further, although the metal-organic electrode paste uses a conductor material containing Au as a main component, it may be Ni-based or other noble metal-based material, and any metal-organic conductor material may be used.
【0022】[0022]
【発明の効果】上記実施例から明らかなように本発明の
チップ型コイルの製造方法は、絶縁基板の表面およびス
ルーホールに導体材料をスクリーン印刷およびスルーホ
ール印刷により印刷し焼成して導体膜を形成する工程
と、導体膜の不要部分をエッチング法により除去して一
対の端子電極と帯状のコイル導体とを形成する工程と、
端子電極とコイル導体の上面を覆うように絶縁基板の表
面に樹脂系の絶縁膜をコーティングする工程とを備えた
ものであり、この製造方法によりスパッタリング装置を
用いず、印刷機とベルト式連続焼成炉によって連続的に
薄膜導体膜を形成でき、またエッチング工程が1回のみ
で良く、製造工程を簡略化でき、製造コストの引下げが
可能である。As is apparent from the above embodiments, in the method for manufacturing the chip coil of the present invention, the conductor material is printed on the surface of the insulating substrate and the through holes by screen printing and through hole printing and baked to form a conductor film. A step of forming, a step of removing an unnecessary portion of the conductor film by an etching method to form a pair of terminal electrodes and a strip-shaped coil conductor,
And a step of coating a resin-based insulating film on the surface of the insulating substrate so as to cover the upper surfaces of the terminal electrodes and the coil conductors. This manufacturing method does not use a sputtering device, but a printer and a belt-type continuous firing. A thin film conductor film can be continuously formed by a furnace, and the etching process only needs to be performed once, so that the manufacturing process can be simplified and the manufacturing cost can be reduced.
【図1】本発明の一実施例におけるチップ型コイルの製
造方法を示す工程図FIG. 1 is a process diagram showing a method for manufacturing a chip coil according to an embodiment of the present invention.
【図2】従来のチップ型コイルの製造方法を示す工程図FIG. 2 is a process diagram showing a conventional method for manufacturing a chip coil.
12 絶縁基板 13 スルーホール 14 導体膜 16a,16b 端子電極 17 コイル導体 19 絶縁膜 12 Insulating Substrate 13 Through Hole 14 Conductor Film 16a, 16b Terminal Electrode 17 Coil Conductor 19 Insulating Film
Claims (1)
有するセラミック材料からなる絶縁基板の表面およびス
ルーホールに金属有機物からなる導体材料をそれぞれス
クリーン印刷およびスルーホール印刷により印刷し焼成
して導体膜を形成する工程と、前記導体膜の不要部分を
エッチング法により除去して一対の端子電極と帯状のコ
イル導体とを形成する工程と、前記端子電極とコイル導
体の上面を覆うように前記絶縁基板の表面に樹脂系の絶
縁膜をコーティングする工程とを備えたチップ型コイル
の製造方法。1. A conductor film is formed by printing a conductor material made of a metal organic material on the surface and a through hole of a ceramic material having a through hole penetrating from the front surface to the back surface by screen printing and through hole printing, respectively, and firing the conductive material. A step of forming, a step of removing an unnecessary portion of the conductor film by an etching method to form a pair of terminal electrodes and a strip-shaped coil conductor, and a step of forming the pair of terminal electrodes and the coil conductor so as to cover the upper surfaces of the insulating substrate. A method for manufacturing a chip coil, comprising a step of coating a resin-based insulating film on the surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17646693A JPH0737743A (en) | 1993-07-16 | 1993-07-16 | Manufacture of chip type coil |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17646693A JPH0737743A (en) | 1993-07-16 | 1993-07-16 | Manufacture of chip type coil |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0737743A true JPH0737743A (en) | 1995-02-07 |
Family
ID=16014180
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17646693A Pending JPH0737743A (en) | 1993-07-16 | 1993-07-16 | Manufacture of chip type coil |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0737743A (en) |
-
1993
- 1993-07-16 JP JP17646693A patent/JPH0737743A/en active Pending
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