JPH0731497Y2 - イオン質量分析装置 - Google Patents
イオン質量分析装置Info
- Publication number
- JPH0731497Y2 JPH0731497Y2 JP1986030779U JP3077986U JPH0731497Y2 JP H0731497 Y2 JPH0731497 Y2 JP H0731497Y2 JP 1986030779 U JP1986030779 U JP 1986030779U JP 3077986 U JP3077986 U JP 3077986U JP H0731497 Y2 JPH0731497 Y2 JP H0731497Y2
- Authority
- JP
- Japan
- Prior art keywords
- analysis
- magnetic flux
- electromagnet
- flux density
- mass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000004907 flux Effects 0.000 claims description 33
- 238000004458 analytical method Methods 0.000 claims description 29
- 238000005259 measurement Methods 0.000 claims description 6
- 238000001514 detection method Methods 0.000 claims description 5
- 150000002500 ions Chemical class 0.000 description 39
- 238000000605 extraction Methods 0.000 description 6
- 238000004949 mass spectrometry Methods 0.000 description 5
- 238000010884 ion-beam technique Methods 0.000 description 3
- 238000004364 calculation method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000013480 data collection Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Electron Tubes For Measurement (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986030779U JPH0731497Y2 (ja) | 1986-03-03 | 1986-03-03 | イオン質量分析装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986030779U JPH0731497Y2 (ja) | 1986-03-03 | 1986-03-03 | イオン質量分析装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62142151U JPS62142151U (enrdf_load_stackoverflow) | 1987-09-08 |
| JPH0731497Y2 true JPH0731497Y2 (ja) | 1995-07-19 |
Family
ID=30835905
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986030779U Expired - Lifetime JPH0731497Y2 (ja) | 1986-03-03 | 1986-03-03 | イオン質量分析装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0731497Y2 (enrdf_load_stackoverflow) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57130358A (en) * | 1981-02-05 | 1982-08-12 | Nippon Telegr & Teleph Corp <Ntt> | Full automatic ion implantation device |
-
1986
- 1986-03-03 JP JP1986030779U patent/JPH0731497Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62142151U (enrdf_load_stackoverflow) | 1987-09-08 |
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