JPH07302957A - Thick film circuit board and manufacture thereof - Google Patents

Thick film circuit board and manufacture thereof

Info

Publication number
JPH07302957A
JPH07302957A JP6092399A JP9239994A JPH07302957A JP H07302957 A JPH07302957 A JP H07302957A JP 6092399 A JP6092399 A JP 6092399A JP 9239994 A JP9239994 A JP 9239994A JP H07302957 A JPH07302957 A JP H07302957A
Authority
JP
Japan
Prior art keywords
thick film
film
conductor
thick
outer shape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6092399A
Other languages
Japanese (ja)
Inventor
Tooru Oodobashi
徹 大土橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Corp
Original Assignee
Kyocera Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kyocera Corp filed Critical Kyocera Corp
Priority to JP6092399A priority Critical patent/JPH07302957A/en
Publication of JPH07302957A publication Critical patent/JPH07302957A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/0213Electrical arrangements not otherwise provided for
    • H05K1/0263High current adaptations, e.g. printed high current conductors or using auxiliary non-printed means; Fine and coarse circuit patterns on one circuit board
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/09Use of materials for the conductive, e.g. metallic pattern
    • H05K1/092Dispersed materials, e.g. conductive pastes or inks

Landscapes

  • Manufacturing Of Printed Wiring (AREA)
  • Structure Of Printed Boards (AREA)

Abstract

PURPOSE:To provide a thick film circuit board operable with heavy-current and having a thick film conductor which does not generate a short circuit with an adjacent metallization pattern, and manufacture thereof. CONSTITUTION:A thick film circuit board is constituted by a heat resistant base 1, and thick film conductors 2 and 3 of predetermined metallization patterns formed on the base 1. A part of the thick film conductors 2 and 3, for example, the thick film conductor 2 is constituted by a thick film shape film 21 for restricting the shape of the predetermined metallization pattern and a thick film conductor film 22 arranged in a region surrounded by the thick film shape film 21. The thick film conductor film 22 is formed by supplying conductive paste in the region surrounded by the thick film shape film 21, then drying and burning the paste.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、セラミック単板基板、
セラミック積層基板などの耐熱性基体の表面に所定パタ
ーンの厚膜導体を形成した厚膜回路基板に関し、特に低
抵抗又は大電流に対応した厚膜回路基板及びその製造方
法に関するものである。
BACKGROUND OF THE INVENTION The present invention relates to a ceramic single plate substrate,
The present invention relates to a thick film circuit board in which a thick film conductor having a predetermined pattern is formed on the surface of a heat resistant substrate such as a ceramic laminated board, and more particularly to a thick film circuit board compatible with low resistance or large current and a manufacturing method thereof.

【0002】[0002]

【従来の技術】従来、厚膜回路基板は、例えばセラミッ
ク単板基板の表面に、Ag系、Cu系などの導電性ペー
ストをスクリーン印刷でもって所定形状に印刷を行い、
乾燥・焼成して所定パターンの厚膜導体を形成し、その
後、各種電子部品を搭載していた。
2. Description of the Related Art Conventionally, a thick film circuit board is formed by printing a conductive paste such as Ag or Cu on a surface of a ceramic single plate substrate by screen printing in a predetermined shape.
It was dried and fired to form a thick film conductor having a predetermined pattern, and then various electronic parts were mounted.

【0003】このような所定配線パターンの厚膜導体に
おいて、例えば所定回路網における電源ライン、グラン
ドラインなどとなる厚膜導体は、大電流が流れるため
に、厚膜導体の許容電流を大きくする必要がある。
In such a thick film conductor having a predetermined wiring pattern, for example, a thick film conductor serving as a power supply line or a ground line in a predetermined circuit network has a large current flowing therein, and therefore, it is necessary to increase the allowable current of the thick film conductor. There is.

【0004】このように厚膜導体の許容電流を大きくす
る方法としては、厚膜導体幅を広くする、また、導電性
ペーストの印刷を複数回繰り返して膜厚を厚くする、ま
た、厚膜導体の表面に半田コートを施するなどがあっ
た。
As a method for increasing the allowable current of the thick film conductor, the width of the thick film conductor is widened, or the printing of the conductive paste is repeated a plurality of times to increase the film thickness. There was a solder coat on the surface.

【0005】[0005]

【発明が解決しようとする課題】しかし、厚膜導体幅を
広くすることは、高密度配線化の要求に反してしまい、
基板全体が大型化してしまう。
However, widening the thickness of the thick film conductor violates the demand for high-density wiring.
The entire board becomes large.

【0006】また、導電性ペーストの印刷を複数回繰り
返して、厚膜導体の厚みを厚くすることは、印刷回数が
増加してしまい、印刷・乾燥工程が煩雑となってしま
い、また、厚膜導体の幅にもよるが繰り返し印刷する印
刷回数にも限度があり、所定厚みを達成することが困難
であった。さらに、繰り返し印刷を行うとペーストだれ
が発生し、配線パターン間の短絡などの問題が発生する
ためである。
Further, if the printing of the conductive paste is repeated a plurality of times to increase the thickness of the thick film conductor, the number of times of printing increases, the printing / drying process becomes complicated, and the thick film is thick. Although it depends on the width of the conductor, the number of times of repeated printing is limited, and it is difficult to achieve a predetermined thickness. Furthermore, when printing is repeated, sagging of the paste occurs, which causes a problem such as a short circuit between wiring patterns.

【0007】さらに、厚膜導体の表面を半田コートする
ことは、半田コートという異質な工程が必要であり、し
かも、隣接する配線パターン間に半田ブリッジが発生し
易く、その後の熱処理工程に大きな制約を与えてしまう
などの問題があった。
Further, the solder coating of the surface of the thick film conductor requires a different process of solder coating, and moreover, a solder bridge is apt to occur between adjacent wiring patterns, which greatly restricts the subsequent heat treatment process. There was a problem such as giving.

【0008】本発明は上述の問題点に鑑みて案出された
ものであり、その目的は、大電流に対応でき、しかも隣
接する配線パターンとの短絡が起こることがない厚膜導
体を有する厚膜回路基板及びその製造方法を提供するこ
とにある。
The present invention has been devised in view of the above problems, and an object thereof is to provide a thick film conductor having a thick film conductor capable of handling a large current and not causing a short circuit with an adjacent wiring pattern. It is to provide a membrane circuit board and a manufacturing method thereof.

【0009】[0009]

【課題を解決するための手段】第1の発明によれば、耐
熱性基体上に、所定配線パターンの厚膜導体を形成して
成る厚膜回路基板において、前記厚膜導体はその一部に
枠状厚膜外形膜の内側に充填された厚膜導体膜が形成さ
れていることを特徴とする厚膜回路基板である。
According to the first invention, in a thick film circuit board formed by forming a thick film conductor having a predetermined wiring pattern on a heat resistant substrate, the thick film conductor is partially formed. A thick film circuit board having a thick film conductor film formed inside a frame-shaped thick film outer film.

【0010】第2の発明によれば、耐熱性基体上に、絶
縁性ガラスペーストの印刷・焼きつけにより枠状の厚膜
外形膜を形成する工程と、前記枠状の厚膜外形膜の内側
に、導電性ペーストを充填し、焼きつけることによって
厚膜導体膜を形成する工程と、を含む厚膜回路基板の製
造方法である。
According to the second aspect of the present invention, a step of forming a frame-shaped thick film contour film on the heat resistant substrate by printing and baking an insulating glass paste, and a step of forming the frame-shaped thick film contour film inside the frame-shaped thick film contour film. And a step of forming a thick film conductor film by filling with a conductive paste and baking the conductive paste.

【0011】第3の発明によれば、耐熱性基体上に、樹
脂ペーストを印刷するとともに、硬化させることによっ
て枠状の厚膜外形樹脂膜を形成する工程と、前記枠状の
厚膜外形樹脂膜の内側に、導電性ペーストを充填すると
ともに、乾燥することによって厚膜導体膜となる導体を
形成する工程と、前記導体を焼成処理する工程とを含む
厚膜回路基板の製造方法である。
According to the third invention, a step of forming a frame-shaped thick film outer shape resin film by printing and curing a resin paste on the heat resistant substrate, and the frame-shaped thick film outer shape resin. A method for manufacturing a thick film circuit board, comprising: a step of filling a conductive paste inside a film and forming a conductor to be a thick film conductive film by drying; and a step of baking the conductor.

【0012】第4の発明によれば、耐熱性基体上に、樹
脂ペーストを印刷するとともに、硬化させることによっ
て枠状の厚膜外形樹脂膜を形成する工程と、前記枠状の
厚膜外形樹脂膜の内側に、導電性ペーストを充填すると
ともに、乾燥することによって導体膜となる導体を形成
する工程と、前記厚膜外形樹脂膜を溶解除去する工程
と、前記導体を焼成処理する工程と、を含む厚膜回路基
板の製造方法である。
According to the fourth invention, a step of forming a frame-shaped thick film outer shape resin film by printing and curing a resin paste on the heat resistant substrate, and the frame-shaped thick film outer shape resin. Inside the film, a step of filling a conductive paste and forming a conductor to be a conductor film by drying, a step of dissolving and removing the thick film outer shape resin film, and a step of baking the conductor, A method of manufacturing a thick film circuit board including:

【0013】[0013]

【作用】第1の発明によれば、基体上の厚膜導体の中
で、実質的に大きな電流の流れる厚膜導体を、厚みのあ
る厚膜導体膜とその厚膜導体膜の外形を規制するように
枠状に形成された厚膜外形膜とで構成している。従っ
て、厚膜導体膜の厚みを厚くして許容電流を増大させて
も、厚膜外形膜によって導体の幅が規制されているの
で、隣接する厚膜導体との短絡を防止することができ、
高密度配線化が可能となり、しかも、簡単に大電流が流
れる厚膜導体とすることができる。
According to the first aspect of the invention, among the thick film conductors on the substrate, a thick film conductor through which a substantially large current flows is regulated, and a thick film conductor film and the outer shape of the thick film conductor film are regulated. And a thick film outer shape film formed in a frame shape. Therefore, even if the thickness of the thick-film conductor film is increased to increase the allowable current, the width of the conductor is regulated by the thick-film outer shape film, so that it is possible to prevent a short circuit with an adjacent thick-film conductor.
High-density wiring can be realized, and a thick film conductor through which a large current flows can be easily formed.

【0014】第2〜第4の発明によれば、厚膜導体膜
が、厚膜導体膜の形成に先立って形成された枠状の厚膜
外形膜によって囲まれた領域に、導電性ペーストの充填
・乾燥・焼きつけによって形成されるため、導電性ペー
ストの供給にあたり、厚膜外形膜の存在によって、導電
性ペーストだれがなく、隣接する導体に短絡することが
ない安定した厚膜導体を形成することができる。
According to the second to fourth inventions, the thick film conductor film is provided with the conductive paste in the region surrounded by the frame-shaped thick film outer shape film formed prior to the formation of the thick film conductor film. Since it is formed by filling, drying and baking, the supply of the conductive paste forms a stable thick film conductor without the conductive paste dripping due to the presence of the thick film outline film and short-circuiting to the adjacent conductor. be able to.

【0015】また、導電性ペーストの供給量を増大させ
ることにより、実質的に電流の流れる厚膜導電厚膜の膜
厚を簡単に厚くすることができる。
Further, by increasing the supply amount of the conductive paste, it is possible to easily increase the thickness of the thick conductive thick film through which the current flows.

【0016】尚、第2の発明の厚膜外形膜は、焼成後に
も厚膜回路基板上に残存するものである。
The thick film outer shape film of the second invention remains on the thick film circuit board even after firing.

【0017】また、第3〜第4の発明は、厚膜外形膜
は、樹脂ペーストによって形成され、第3の発明では、
この樹脂製の厚膜外形樹脂膜は、厚膜導体膜の焼成と同
時に焼失されるものであり、第4の発明では、この樹脂
製の厚膜外形樹脂膜は、厚膜導体膜となる導電性ペース
トを充填・乾燥した後、溶剤で溶解除去されるものであ
る。即ち、導電厚膜導体膜となる導電性ペーストを最終
的に焼成した時点においては、厚膜外形樹脂膜は厚膜回
路基板上に残存しない。
Further, in the third to fourth inventions, the thick film outer shape film is formed of a resin paste, and in the third invention,
The resin-made thick film outer shape resin film is burned off at the same time as the firing of the thick film conductor film. In the fourth invention, the resin thick film outer shape resin film is a conductive film that becomes a thick film conductor film. After being filled and dried with a conductive paste, it is dissolved and removed with a solvent. That is, when the conductive paste to be the conductive thick film conductor film is finally fired, the thick film outer shape resin film does not remain on the thick film circuit board.

【0018】従って、隣接する厚膜導体との間には、厚
膜外形樹脂膜を形成していた領域に対応する空間が発生
することになり、隣接する厚膜導体との短絡を完全に防
止することができる。
Therefore, a space corresponding to the area where the thick film outer shape resin film was formed is generated between the adjacent thick film conductors, and a short circuit with the adjacent thick film conductors is completely prevented. can do.

【0019】[0019]

【実施例】以下、本発明を図面に基づいて詳説する。
尚、実施例には、単板状のセラミック基板を用いた厚膜
回路基板でもって説明する。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to the drawings.
It should be noted that the embodiments will be described by using a thick film circuit board using a single plate-shaped ceramic substrate.

【0020】図1は第1の発明を説明するための平面図
であり、図2は図1中X−X線断面図である。
FIG. 1 is a plan view for explaining the first invention, and FIG. 2 is a sectional view taken along line XX in FIG.

【0021】図1において、1は耐熱性基体であり、
2、3は、端子パッド、電子部品搭載パッドを含む厚膜
導体である。特に厚膜導体2は、厚膜外形膜21、21
と、厚膜導体膜22とから構成されている。
In FIG. 1, 1 is a heat resistant substrate,
2 and 3 are thick film conductors including terminal pads and electronic component mounting pads. In particular, the thick film conductor 2 includes the thick film outer shape films 21, 21.
And a thick conductor film 22.

【0022】耐熱性基体1は、例えば単板状のアルミ
ナ、窒化アルミニウム、ムライトなどのセラミック基板
などが例示できる。以下、耐熱性基体をセラミック基板
という。
The heat resistant substrate 1 may be, for example, a single plate-shaped ceramic substrate such as alumina, aluminum nitride or mullite. Hereinafter, the heat resistant substrate is referred to as a ceramic substrate.

【0023】厚膜導体2は、比較的大きな電流が流れる
導体、例えば図では、電源供給用の端子パッドと電子部
品搭載パッド間の導体であり、その構成はガラスなどの
厚膜外形膜21、21と、実質的に大電流が流れる厚膜
導体膜22とから成る。厚膜外形膜21、21は、厚膜
導体膜22の外形を規制するように、例えば、互いに対
向して枠状に形成され、この枠状の厚膜外形膜21、2
1によって囲まれた領域に厚膜導体膜22が配置されて
いる。
The thick film conductor 2 is a conductor through which a relatively large current flows, for example, a conductor between a terminal pad for power supply and an electronic component mounting pad in the figure, and the structure thereof is a thick film outer film 21 such as glass. 21 and a thick conductor film 22 through which a large current flows. The thick film outer shape films 21, 21 are formed, for example, in a frame shape so as to face each other so as to regulate the outer shape of the thick film conductor film 22, and the frame-shaped thick film outer shape films 21, 2 are formed.
The thick film conductor film 22 is arranged in a region surrounded by 1.

【0024】厚膜外形膜21、21は、や硼珪酸系のガ
ラス、有機ビヒクルを有する絶縁性ガラスペーストをス
クリーン印刷で印刷し、乾燥した後、焼成処理すること
により形成される。
The thick film outline films 21 and 21 are formed by printing an insulating glass paste containing borosilicate glass or an organic vehicle by screen printing, drying it, and baking it.

【0025】厚膜導体膜22は、枠状の厚膜外形膜2
1、21によって囲まれた領域に、例えば、Ag系(A
g単体、Agを含む合金など)、Cu系(Ag単体、A
gを含む合金など)の導電性材料、有機ビヒクル、必要
に応じてガラスフリットを有する導電性ペースト上述し
たAg系、Cu系の導電性ペーストを充填し、乾燥した
後、焼成処理することにより形成される。
The thick film conductor film 22 is a frame-shaped thick film outer film 2.
In the region surrounded by 1 and 21, for example, Ag-based (A
g simple substance, alloy containing Ag, etc.), Cu-based (Ag simple substance, A
conductive material such as an alloy containing g), an organic vehicle, and a conductive paste having a glass frit as necessary. The above-mentioned Ag-based and Cu-based conductive pastes are filled, dried, and fired to form. To be done.

【0026】この充填方法としては、例えばディスペン
サーによる塗布やメッシュの粗いスクリーン、メタルマ
スクを用いて印刷・塗布したりして行われる。
As the filling method, for example, coating with a dispenser or printing / coating with a screen having a coarse mesh or a metal mask is performed.

【0027】尚、厚膜外形膜21、21に厚膜導体膜2
2の外形状を規制するダム膜となるため、ペーストダレ
が発生しないようにベースト中の有機ビヒクルを調整し
て、粘度を制御する必要がある。
The thick film outer film 21, 21 is formed on the thick film conductor film 2.
Since it becomes a dam film that regulates the outer shape of No. 2, it is necessary to control the viscosity by adjusting the organic vehicle in the base to prevent paste sag.

【0028】厚膜導体3は、通常の電流が流れる導体で
あり、その構成は、Ag系、Cu系の導電性ペーストを
スクリーン印刷で印刷し、乾燥した後、焼成処理するこ
とにより形成される。
The thick film conductor 3 is a conductor through which a normal current flows, and its structure is formed by printing an Ag-based or Cu-based conductive paste by screen printing, drying it, and then firing it. .

【0029】その後、必要に応じて、厚膜導体2、3上
に保護膜を形成し、さらに各種電子部品4を搭載する。
Thereafter, if necessary, a protective film is formed on the thick film conductors 2 and 3, and various electronic components 4 are mounted.

【0030】尚、図1に示すように厚膜導体2、3とは
互いに隣接するため、高密度配線を達成しようとする
と、厚膜導体2と厚膜導体3との間隔が接近しても、厚
膜導体2を構成する厚膜外形膜21、21は、絶縁性を
有するガラスであるため、短絡現象は発生しない。
Since the thick film conductors 2 and 3 are adjacent to each other as shown in FIG. 1, when attempting to achieve high-density wiring, even if the distance between the thick film conductor 2 and the thick film conductor 3 is reduced. Since the thick film outer shape films 21 and 21 forming the thick film conductor 2 are made of glass having an insulating property, the short circuit phenomenon does not occur.

【0031】上述の厚膜回路基板の製造方法を説明す
る。
A method of manufacturing the above-mentioned thick film circuit board will be described.

【0032】まず、セラミック基板1を用意する。例え
ば所定形状の未焼成のセラミック体を焼成処理して形成
する。
First, the ceramic substrate 1 is prepared. For example, it is formed by firing an unfired ceramic body having a predetermined shape.

【0033】次に、厚膜導体3を形成する。具体的に
は、通常の厚膜手法、導電性ペーストを所定配線パター
ンが形成できるスクリーンを介して印刷を行う。これに
より、セラミック基板1上には、厚膜導体3となる所定
配線パターンの導体が印刷・塗布されることになる。こ
の導体を乾燥して、導体中の有機溶剤を除去し、さらに
焼成処理する。これにより、導体中の導電性粉末は焼成
反応し、互いに凝集され、且つセラミック基板1に強固
に密着する。尚、厚膜導体3のパターンにおいて、次の
工程の厚膜導体2が形成される部分にもこの厚膜導体3
を形成しても構わない。
Next, the thick film conductor 3 is formed. Specifically, the usual thick film method is used to print the conductive paste through a screen on which a predetermined wiring pattern can be formed. As a result, a conductor having a predetermined wiring pattern to be the thick film conductor 3 is printed / applied on the ceramic substrate 1. The conductor is dried to remove the organic solvent contained in the conductor and then subjected to firing treatment. As a result, the conductive powder in the conductor undergoes a firing reaction, is agglomerated with each other, and firmly adheres to the ceramic substrate 1. In addition, in the pattern of the thick film conductor 3, the thick film conductor 3 is also formed in a portion where the thick film conductor 2 is formed in the next step.
May be formed.

【0034】次に、厚膜導体2を構成する枠状の厚膜外
形膜21、21を形成する。この厚膜外形膜21、21
は、厚膜導体2の外形の境界を規制するためのものであ
り、厚膜導体3の外形の境界形状に沿って形成される。
具体的には、厚膜外形膜21、21は、硼珪酸系ガラス
ペーストをスクリーンで印刷を施し、その後、乾燥し、
焼成処理することによって形成する。尚、厚膜外形膜2
1、21の厚みが約30〜200μmであり、これを達
成するためには、比較的粘度が高いペーストを用いるな
どする必要がある。
Next, the frame-shaped thick film outer shape films 21 and 21 which form the thick film conductor 2 are formed. This thick film outer shape film 21, 21
Is for controlling the boundary of the outer shape of the thick film conductor 2, and is formed along the boundary shape of the outer shape of the thick film conductor 3.
Specifically, the thick film outer shape films 21 and 21 are printed with a borosilicate glass paste on a screen and then dried,
It is formed by baking treatment. In addition, the thick film outline film 2
The thicknesses of 1 and 21 are about 30 to 200 μm, and in order to achieve this, it is necessary to use a paste having a relatively high viscosity.

【0035】次に、厚膜導体2を構成する厚膜導体膜2
2を形成する。この厚膜導体膜22は実質的に大電流が
流れるため、厚膜導体3に比較して厚みを充分に厚くす
る必要がある。このため、厚膜導体膜22は、厚膜外形
膜21、21によって囲まれた領域を利用して、その領
域に、導電性ペーストを充填・乾燥・焼成することによ
り形成される。具体的には、ディスペンサーを用いて導
電性ペーストを注入供給して、その後、充填した導電性
ペースト中の有機溶剤を除去するために100〜150
℃で乾燥を行い、その後焼成処理を行う。焼成処理は、
導電性ペーストの材料によって異なるが、例えば導電性
粉末がAg系の場合には、大気雰囲気で約850〜90
0℃で焼成し、Cu系の場合には、中性もしくは還元性
雰囲気で約900〜950で焼成する。
Next, the thick film conductor film 2 constituting the thick film conductor 2
Form 2. The thick film conductor film 22 substantially allows a large current to flow, and therefore, it is necessary to make the thickness sufficiently thicker than that of the thick film conductor 3. Therefore, the thick-film conductor film 22 is formed by using a region surrounded by the thick-film outer shape films 21 and 21 and filling, drying and firing the conductive paste in the region. Specifically, the conductive paste is injected and supplied by using a dispenser, and then 100 to 150 to remove the organic solvent in the filled conductive paste.
Drying is carried out at ℃, followed by baking treatment. The firing process is
Depending on the material of the conductive paste, for example, when the conductive powder is Ag-based, it is about 850 to 90 in the air atmosphere.
Firing is performed at 0 ° C., and in the case of Cu-based material, firing is performed at about 900 to 950 in a neutral or reducing atmosphere.

【0036】尚、約850℃以上に達するまでの過程
で、乾燥処理を施した導電性ペースト中に含まれる有機
樹脂成分は完全に焼失することになる。
In the process up to about 850 ° C. or higher, the organic resin component contained in the dried conductive paste is completely burned out.

【0037】この厚膜導体2の厚膜導体膜22は、その
外形が厚膜外形膜21、21で規制されている。このた
め、供給した導電性ペーストが厚膜外形膜21、21の
外に流れでることがなく、厚膜導体膜22の厚みを簡単
に厚くすることができる。
The outer shape of the thick film conductor film 22 of the thick film conductor 2 is restricted by the thick film outer shape films 21 and 21. Therefore, the supplied conductive paste does not flow out of the thick film outer shape films 21 and 21, and the thickness of the thick film conductor film 22 can be easily increased.

【0038】例えば、焼成処理された厚膜外形膜21、
21の厚みが50μmであり、その対向間隔が約2mの
場合、供給し、乾燥した後の厚膜導体膜22の厚みを7
5μm(表面張力によって厚膜外形膜21よりも厚くす
ることができる)、焼成処理された後の厚みが50μm
とすることができる。
For example, the thick film outer shape film 21, which has been baked,
When the thickness of 21 is 50 μm and the facing interval is about 2 m, the thickness of the thick conductor film 22 after being supplied and dried is 7
5 μm (can be made thicker than the thick film outer shape film 21 due to surface tension), and the thickness after firing is 50 μm
Can be

【0039】以上のように、上述の構造、製造方法によ
れば、厚膜導体2、3のうち大電流が流れる特定の厚膜
導体2の厚みを、非常に簡単に厚くすることができ、こ
の大電流に簡単対応することができる。しかも、従来の
ように、厚膜導体幅を広くして、基板の大型化を招いた
り、また、複数印刷による印刷・乾燥工程の煩雑化、ペ
ーストだれによる信頼性の低下を招いたり、半田コート
によるその後の製造工程や熱処理工程に規制を与えるた
りすることが一切ないものとなる。
As described above, according to the above-described structure and manufacturing method, it is possible to increase the thickness of a specific thick film conductor 2 through which a large current flows among the thick film conductors 2 and 3 very easily. It is possible to easily cope with this large current. In addition, as in the past, widening the thick-film conductor leads to an increase in the size of the board, the printing / drying process due to multiple printing is complicated, and the reliability of the solder coating is reduced. There will be no restrictions on the subsequent manufacturing process and heat treatment process.

【0040】また、図1においては、厚膜外形膜21、
21とこれに隣接する厚膜導体3との間には、セラミッ
ク基板1の表面が露出する空間が形成されているが、厚
膜外形膜21を隣接する厚膜導体3に重畳するようにし
て形成することもでき、一層の配線パターンの高密度化
が達成できる。
Further, in FIG. 1, the thick film outer shape film 21,
A space exposing the surface of the ceramic substrate 1 is formed between the thick film conductor 21 and the thick film conductor 3 adjacent thereto. However, the thick film contour film 21 is superposed on the adjacent thick film conductor 3. It can also be formed, and a higher density of the wiring pattern can be achieved.

【0041】尚、上述の製造方法において、厚膜導体膜
22となる導電性ペーストの供給方法として、ディスペ
ンサーの供給の他に、メッシュの粗いスクリーンを用い
て、印刷・塗布しても構わない。
In the above-mentioned manufacturing method, as a method for supplying the conductive paste to be the thick conductor film 22, a screen having a coarse mesh may be used for printing / application in addition to the supply by the dispenser.

【0042】次に、第3の発明について説明する。この
実施例は、厚膜外形膜21としは樹脂材料で形成するも
のであり(以下、厚膜外形樹脂膜21という)、さら
に、枠状の厚膜外形樹脂膜21によって囲まれた領域に
充填した導電性ペーストを焼成して厚膜導体膜22を形
成する際、その厚膜外形樹脂膜21を焼失させるもので
ある。
Next, the third invention will be described. In this embodiment, the thick film outer shape film 21 is formed of a resin material (hereinafter referred to as the thick film outer shape resin film 21), and the region surrounded by the frame-shaped thick film outer shape resin film 21 is filled. When the thick conductive film 22 is formed by firing the above-mentioned conductive paste, the thick outer resin film 21 is burned off.

【0043】上述のように、セラミック基板1を用意
し、厚膜導体3を形成する。
As described above, the ceramic substrate 1 is prepared and the thick film conductor 3 is formed.

【0044】次に、厚膜導体2を構成する枠状の厚膜外
形樹脂膜21、21を形成する。厚膜外形樹脂膜21、
21は、アクリル系、エポキシ系の樹脂ペーストをスク
リーンで印刷を施し、その後、硬化を行う。
Next, the frame-shaped thick-film outer shape resin films 21, 21 constituting the thick-film conductor 2 are formed. Thick film outline resin film 21,
In No. 21, acrylic-based or epoxy-based resin paste is printed on a screen and then cured.

【0045】次に、厚膜導体2を構成する厚膜導体膜2
2を形成する。具体的には、ディスペンサーを用いて、
枠状の厚膜外形樹脂膜21、21によって囲まれた領域
に、導電性ペーストを充填して、その後、100〜15
0℃で乾燥を行う。
Next, the thick film conductor film 2 constituting the thick film conductor 2
Form 2. Specifically, using a dispenser,
The area surrounded by the frame-shaped thick film outer shape resin films 21, 21 is filled with a conductive paste, and then 100 to 15
Dry at 0 ° C.

【0046】次に、供給した導電性ペーストを焼成処理
する。焼成処理は、導電性ペーストの材料によって異な
るが、例えば導電性粉末がAg系の場合には、大気雰囲
気で約850〜900℃で焼成し、Cu系の場合には、
中性もしくは還元性雰囲気で約900〜960℃で焼成
する。
Next, the supplied conductive paste is fired. The firing process varies depending on the material of the conductive paste. For example, when the conductive powder is Ag-based, it is fired at about 850 to 900 ° C. in the air atmosphere, and when it is Cu-based,
Baking is performed at about 900 to 960 ° C. in a neutral or reducing atmosphere.

【0047】これにより、厚膜導体2が達成されるとと
もに、樹脂製の厚膜外形樹脂膜21、21が焼失・除去
される。
As a result, the thick-film conductor 2 is achieved, and the resin-made thick-film exterior resin films 21, 21 are burned and removed.

【0048】この厚膜導体2の厚膜導体膜22は、その
外形は厚膜外形樹脂膜21、21で規制されている。こ
のため、供給した導電性ペーストが厚膜外形樹脂膜2
1、21に流れでることがない。また、導電性ペースト
の供給によって厚膜導体膜22の厚みを簡単に厚くする
ことができ、大電流に簡単に対応できる。
The outer shape of the thick film conductor film 22 of the thick film conductor 2 is regulated by the thick film outer shape resin films 21 and 21. Therefore, the supplied conductive paste is thick resin film 2
It doesn't flow to 1 and 21. Moreover, the thickness of the thick conductor film 22 can be easily increased by supplying the conductive paste, and a large current can be easily accommodated.

【0049】しかも、厚膜外形樹脂膜21、21が焼失
されることになるため、実質的には厚膜導体2は、厚膜
導体膜22のみとなる。従って、回路動作上不要な厚膜
外形樹脂膜21、21がなく、外観上優れたものとな
り、また、隣接する厚膜導体3との間での短絡現象を完
全に抑えることができる。
Moreover, since the thick-film outer shape resin films 21, 21 are burned out, the thick-film conductor 2 is substantially only the thick-film conductor film 22. Therefore, the thick film external resin films 21 and 21 which are unnecessary for the circuit operation are eliminated, and the appearance is excellent, and the short-circuit phenomenon between the adjacent thick film conductors 3 can be completely suppressed.

【0050】次に、第4の発明に発明で説明する。先の
実施例(第3の発明)では、厚膜外形樹脂膜21、21
の除去方法として、厚膜導体膜22の焼成処理時に焼失
させるものであるが、本実施例は、厚膜導体膜22の焼
成処理前に積極的に樹脂製の厚膜外形樹脂膜21、21
の除去するものである。
Next, a fourth invention will be described with reference to the invention. In the previous embodiment (third invention), the thick film outer shape resin films 21, 21
As a method of removing the thick film conductor film 22, the thick film conductor film 22 is burnt off during the baking process. In this embodiment, the thick film outer shape resin films 21, 21 made of resin are positively added before the thick film conductor film 22 is baked.
Is to be removed.

【0051】具体的には、セラミック基板1を用意し、
厚膜導体3を形成する。
Specifically, the ceramic substrate 1 is prepared,
The thick film conductor 3 is formed.

【0052】次に、厚膜導体2を構成する枠状の厚膜外
形樹脂膜21、21を形成する。厚膜外形樹脂膜21、
21は、紫外線硬化材が含有するアクリル系、アクリル
系、エポキシ系の樹脂ペーストをスクリーンで印刷を施
し、その後、紫外線硬化や熱硬化などによって硬化処理
を行う。
Next, the frame-shaped thick film outer shape resin films 21, 21 which constitute the thick film conductor 2 are formed. Thick film outline resin film 21,
In the case of 21, an acrylic, acrylic, or epoxy resin paste contained in the ultraviolet curable material is printed on a screen, and thereafter, a curing treatment is performed by ultraviolet curing or heat curing.

【0053】次に、厚膜導体2を構成する厚膜導体膜2
2を形成する。具体的には、ディスペンサーを用いて、
厚膜外形樹脂膜21、21によって囲まれた領域に、導
電性ペーストを注入供給して、その後、100〜150
℃で乾燥を行う。これにより、供給された導電性ペース
トは有機バンダーによってその供給形状が維持されるこ
とになる。
Next, the thick film conductor film 2 constituting the thick film conductor 2
Form 2. Specifically, using a dispenser,
The conductive paste is injected and supplied into a region surrounded by the thick film outer shape resin films 21 and 21, and then 100 to 150
Dry at ℃. As a result, the supplied shape of the supplied conductive paste is maintained by the organic bander.

【0054】次に、厚膜外形樹脂膜21、21を除去す
る。具体的には、アクリル系、エポキシ系樹脂の厚膜外
形樹脂膜21、21はトリエタノールアミンなどのアル
カリ溶剤、セロソルブ系溶剤を用いて溶解処理を行う。
これにより、セラミック基板1上には、厚膜導体3と厚
膜外形膜22となる導体のみとなる。尚、セラミック基
板1上に残存する溶剤などは、次の工程の焼成処理によ
り完全に焼失するため、厳密な洗浄工程は省略できる。
Next, the thick film outer shape resin films 21 and 21 are removed. Specifically, the thick film outer shape resin films 21 and 21 made of acrylic or epoxy resin are subjected to dissolution treatment using an alkaline solvent such as triethanolamine or a cellosolve solvent.
As a result, only the conductor to be the thick film conductor 3 and the thick film outer shape film 22 is left on the ceramic substrate 1. Note that the solvent and the like remaining on the ceramic substrate 1 are completely burned off by the firing process in the next step, so a strict cleaning step can be omitted.

【0055】次に、厚膜導体膜22となる導体を焼成処
理する。焼成処理は、導電性ペーストの材料によって異
なるが、例えば導電性粉末がAg系の場合には、大気雰
囲気で約850〜900℃で焼成し、Cu系の場合に
は、中性もしくは還元性雰囲気で約900〜950℃で
焼成する。
Next, the conductor to be the thick conductor film 22 is fired. The firing treatment varies depending on the material of the conductive paste. For example, when the conductive powder is Ag-based, it is fired at about 850 to 900 ° C. in the air atmosphere, and when it is Cu-based, a neutral or reducing atmosphere is used. And baking at about 900-950 ° C.

【0056】この厚膜導体2の厚膜導体膜22は、その
外形の境界部分が厚膜外形樹脂膜21、21で規制され
ている。このため、供給した導電性ペーストが厚膜外形
樹脂膜21、21に流れでることがない。また、厚膜導
体膜22の厚みを簡単に厚くすることができ、焼成後の
厚膜導体膜22は大電流に簡単に対応できる。
The thick film conductor film 22 of the thick film conductor 2 is regulated at the boundary portion of its outer shape by the thick film outer shape resin films 21, 21. Therefore, the supplied conductive paste does not flow to the thick film outer shape resin films 21, 21. Further, the thickness of the thick conductor film 22 can be easily increased, and the thick conductor film 22 after firing can easily cope with a large current.

【0057】しかも、厚膜外形樹脂膜21、21が除去
されているため、実質的には厚膜導体は、厚膜導体膜2
2のみとなる。従って、回路動作上不要な厚膜外形樹脂
膜21、21がなく、外観上優れたものとなり、また、
隣接する厚膜導体2との間での短絡現象を完全に抑える
ことができる。
Moreover, since the thick film outer shape resin films 21 and 21 are removed, the thick film conductor is substantially the thick film conductor film 2.
Only 2. Therefore, the thick external resin films 21 and 21 which are unnecessary for the circuit operation are eliminated, and the external appearance is excellent.
It is possible to completely suppress the short circuit phenomenon between the adjacent thick film conductors 2.

【0058】以上のように、本発明は、実質的に大電流
が流れる導体部分の厚みを厚くするための構造(第1の
発明)とその導体を形成するにあたり、先に導体の外形
を規制する厚膜外形膜にガラス材料で形成する製造方法
(第2の発明)、さらに、その製造方法の変形態様(第
3の発明、第4の発明)とからなる。
As described above, according to the present invention, in forming the structure (first invention) for increasing the thickness of the conductor portion through which a large current flows and the conductor, the outer shape of the conductor is first regulated. The manufacturing method (second invention) of forming the thick film outer shape film with a glass material, and the modified modes (third invention, fourth invention) of the manufacturing method.

【0059】尚、上述の各実施例では、基体として単板
状のセラミック基板を用いて説明したが、基体は多層セ
ラミック基板であっても構わない。
In each of the above embodiments, a single plate-shaped ceramic substrate is used as the base, but the base may be a multilayer ceramic substrate.

【0060】また、厚膜導体3は、焼成されたセラミッ
ク基板1に直接焼きつけられているが、多層セラミック
基板の場合、未焼成の基板上に、厚膜導体3となる導体
を形成し、基板と厚膜導体3とを一体的に焼成しても構
わない。
The thick film conductor 3 is directly baked on the fired ceramic substrate 1. However, in the case of a multilayer ceramic substrate, a conductor to be the thick film conductor 3 is formed on an unfired substrate, The thick film conductor 3 and the thick film conductor 3 may be integrally fired.

【0061】[0061]

【発明の効果】以上のように、第1の発明によれば、厚
膜導体幅を広くすることなく、また隣接する厚膜導体と
の短絡を起こすことなく、大電流に簡単に対応できる厚
膜導体を有する厚膜回路基板となる。
As described above, according to the first aspect of the present invention, a thickness that can easily cope with a large current without increasing the width of the thick film conductor and without causing a short circuit with an adjacent thick film conductor. The thick film circuit board has a film conductor.

【0062】また、第2発明〜第4の発明によれば、大
電流に対応できる厚膜導体を、厚膜外形膜を利用して形
成できるため、簡単に、且つ確実に大電流に対応でき、
しかも隣接する配線パターンとの短絡が起こることがな
い厚膜導体を簡単に製造することができる。
Further, according to the second to fourth inventions, since the thick film conductor which can cope with a large current can be formed by utilizing the thick film outer shape film, it is possible to cope with a large current easily and surely. ,
Moreover, it is possible to easily manufacture a thick film conductor that does not cause a short circuit with an adjacent wiring pattern.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の厚膜回路基板の平面図である。FIG. 1 is a plan view of a thick film circuit board according to the present invention.

【図2】図1中X−X線の断面図である。FIG. 2 is a cross-sectional view taken along line XX in FIG.

【図3】第2の発明の製造方法を説明するための工程図
である。
FIG. 3 is a process drawing for explaining the manufacturing method of the second invention.

【図4】第3の発明の製造方法を説明するための工程図
である。
FIG. 4 is a process drawing for explaining the manufacturing method of the third invention.

【図5】第4の発明の製造方法を説明するための工程図
である。
FIG. 5 is a process drawing for explaining the manufacturing method of the fourth invention.

【符号の説明】[Explanation of symbols]

1・・・セラミック基板 2・・・厚膜導体 21・・・厚膜外形膜 22・・・厚膜導体膜 3・・・厚膜導体 DESCRIPTION OF SYMBOLS 1 ... Ceramic substrate 2 ... Thick film conductor 21 ... Thick film external film 22 ... Thick film conductor film 3 ... Thick film conductor

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 耐熱性基体上に、所定配線パターンの厚
膜導体を形成して成る厚膜回路基板において、 前記厚膜導体はその一部に枠状厚膜外形膜の内側に充填
された厚膜導体膜が形成されていることを特徴とする厚
膜回路基板。
1. A thick film circuit board formed by forming a thick film conductor having a predetermined wiring pattern on a heat resistant substrate, wherein the thick film conductor is partially filled inside a frame-shaped thick film outline film. A thick film circuit board having a thick film conductor film formed thereon.
【請求項2】 耐熱性基体上に、絶縁性ガラスペースト
の印刷・焼きつけにより枠状の厚膜外形膜を形成する工
程と、 前記枠状の厚膜外形膜の内側に、導電性ペーストを充填
し、焼きつけることによって厚膜導体膜を形成する工程
と、を含む厚膜回路基板の製造方法。
2. A step of forming a frame-shaped thick film outline film on a heat-resistant substrate by printing and baking an insulating glass paste, and filling a conductive paste inside the frame-shaped thick film outline film. And a step of forming a thick film conductor film by baking, and a method for manufacturing a thick film circuit board.
【請求項3】 耐熱性基体上に、 樹脂ペーストを印刷するとともに、硬化させることによ
って枠状の厚膜外形樹脂膜を形成する工程と、 前記枠状の厚膜外形樹脂膜の内側に、導電性ペーストを
充填するとともに、乾燥することによって厚膜導体とな
る導体を形成する工程と、 前記導体を焼成処理する工程と、を含む厚膜回路基板の
製造方法。
3. A step of forming a frame-shaped thick film outline resin film by printing and curing a resin paste on a heat-resistant substrate, and conducting inside the frame-shaped thick film outline resin film. A method for manufacturing a thick film circuit board, comprising: a step of filling a conductive paste to form a conductor to be a thick film conductor by drying; and a step of firing the conductor.
【請求項4】 耐熱性基体上に、 樹脂ペーストを印刷するとともに、硬化させることによ
って枠状の厚膜外形樹脂膜を形成する工程と、 前記枠状の厚膜外形樹脂膜の内側に、導電性ペーストを
充填するとともに、乾燥することによって導体膜となる
導体を形成する工程と、 前記厚膜外形樹脂膜を溶解除去する工程と、 前記導体を焼成処理する工程と、を含む厚膜回路基板の
製造方法。
4. A step of forming a frame-shaped thick film outer shape resin film by printing and curing a resin paste on a heat-resistant substrate, and conducting inside the frame-shaped thick film outer shape resin film. Thick film circuit board including a step of forming a conductor to be a conductor film by filling with a conductive paste and drying, a step of dissolving and removing the thick film outer shape resin film, and a step of baking the conductor. Manufacturing method.
JP6092399A 1994-04-28 1994-04-28 Thick film circuit board and manufacture thereof Pending JPH07302957A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6092399A JPH07302957A (en) 1994-04-28 1994-04-28 Thick film circuit board and manufacture thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6092399A JPH07302957A (en) 1994-04-28 1994-04-28 Thick film circuit board and manufacture thereof

Publications (1)

Publication Number Publication Date
JPH07302957A true JPH07302957A (en) 1995-11-14

Family

ID=14053345

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6092399A Pending JPH07302957A (en) 1994-04-28 1994-04-28 Thick film circuit board and manufacture thereof

Country Status (1)

Country Link
JP (1) JPH07302957A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003084297A1 (en) * 2002-03-28 2003-10-09 Shinko Electric Industries Co., Ltd. Wiring structure and its manufacturing method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003084297A1 (en) * 2002-03-28 2003-10-09 Shinko Electric Industries Co., Ltd. Wiring structure and its manufacturing method

Similar Documents

Publication Publication Date Title
JPH07302957A (en) Thick film circuit board and manufacture thereof
JPH11273997A (en) Electronic part and its manufacture
JP3147868B2 (en) Electronic component manufacturing method
JP4357792B2 (en) Method for manufacturing printed wiring board
JPH06224538A (en) Manufacture of ceramic circuit board
JP2001298255A (en) Method of manufacturing thick printed board
JPH08250859A (en) Ceramic multilayer wiring board and manufacture thereof
JPH1098244A (en) Thick-film circuit board and its manufacture
JPH05283853A (en) Printed-circuit board
JPH11330693A (en) Thick film multilayer ceramic board, its manufacture, and mounting structure of electronic component thereon
JPH029191A (en) Manufacture of ceramic circuit board with resistor
JP3561635B2 (en) Network resistor and manufacturing method thereof
JP2625203B2 (en) Method of forming solder coat on printed circuit board
JPH1134473A (en) Method for printing pattern
JPH0567882A (en) Multilayer circuit board
JPH0548269A (en) Manufacture of multilayer circuit board
JPS61240667A (en) Thick film electronic circuit forming method
JPH0722737A (en) Method for forming wiring pattern
KR19990059049A (en) Micro Thick Chip Resistor and Manufacturing Method Thereof
JPH04343291A (en) Circuit board
JPH04206594A (en) Printed board surface treatment structure
JPH06244534A (en) Copper-fine-interconnection formation method and copper fine interconnection
JPH05167246A (en) Method of making electrical connection through hole in ceramic board
JPH0380358B2 (en)
JPH0488695A (en) Circuit board provided with resistor in through-hole or viahole and manufacture thereof

Legal Events

Date Code Title Description
A131 Notification of reasons for refusal

Effective date: 20050316

Free format text: JAPANESE INTERMEDIATE CODE: A131

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050614

A02 Decision of refusal

Effective date: 20050831

Free format text: JAPANESE INTERMEDIATE CODE: A02