JPH072829B2 - Laminate - Google Patents
LaminateInfo
- Publication number
- JPH072829B2 JPH072829B2 JP62277446A JP27744687A JPH072829B2 JP H072829 B2 JPH072829 B2 JP H072829B2 JP 62277446 A JP62277446 A JP 62277446A JP 27744687 A JP27744687 A JP 27744687A JP H072829 B2 JPH072829 B2 JP H072829B2
- Authority
- JP
- Japan
- Prior art keywords
- weight
- bis
- resin
- epoxy
- parts
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000011342 resin composition Substances 0.000 claims description 16
- 239000004593 Epoxy Substances 0.000 claims description 11
- FUGYGGDSWSUORM-UHFFFAOYSA-N 4-hydroxystyrene Chemical class OC1=CC=C(C=C)C=C1 FUGYGGDSWSUORM-UHFFFAOYSA-N 0.000 claims description 10
- -1 aromatic maleimide compound Chemical class 0.000 claims description 9
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical group C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 5
- 229920001187 thermosetting polymer Polymers 0.000 claims description 5
- 125000003342 alkenyl group Chemical group 0.000 claims description 2
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims description 2
- 229920001577 copolymer Polymers 0.000 claims 1
- 238000010030 laminating Methods 0.000 claims 1
- 238000001723 curing Methods 0.000 description 18
- 229920005989 resin Polymers 0.000 description 15
- 239000011347 resin Substances 0.000 description 15
- 239000005062 Polybutadiene Substances 0.000 description 13
- 229920002857 polybutadiene Polymers 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 10
- 239000011521 glass Substances 0.000 description 10
- 239000002966 varnish Substances 0.000 description 10
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 8
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 8
- 229910052794 bromium Inorganic materials 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 7
- 239000003795 chemical substances by application Substances 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 229920003192 poly(bis maleimide) Polymers 0.000 description 7
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 239000003063 flame retardant Substances 0.000 description 6
- 239000002648 laminated material Substances 0.000 description 6
- 229920001721 polyimide Polymers 0.000 description 6
- 239000007870 radical polymerization initiator Substances 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 239000003822 epoxy resin Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 229920000647 polyepoxide Polymers 0.000 description 5
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 4
- DMWVYCCGCQPJEA-UHFFFAOYSA-N 2,5-bis(tert-butylperoxy)-2,5-dimethylhexane Chemical compound CC(C)(C)OOC(C)(C)CCC(C)(C)OOC(C)(C)C DMWVYCCGCQPJEA-UHFFFAOYSA-N 0.000 description 4
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 3
- CTMSPXZMYXFREJ-UHFFFAOYSA-N 4-ethenylphenol hydrobromide Chemical compound Br.OC1=CC=C(C=C)C=C1 CTMSPXZMYXFREJ-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 3
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000003118 aryl group Chemical group 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 238000013329 compounding Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 3
- 229920003986 novolac Polymers 0.000 description 3
- 239000009719 polyimide resin Substances 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- 229910000679 solder Inorganic materials 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- XMNIXWIUMCBBBL-UHFFFAOYSA-N 2-(2-phenylpropan-2-ylperoxy)propan-2-ylbenzene Chemical compound C=1C=CC=CC=1C(C)(C)OOC(C)(C)C1=CC=CC=C1 XMNIXWIUMCBBBL-UHFFFAOYSA-N 0.000 description 2
- OWMNWOXJAXJCJI-UHFFFAOYSA-N 2-(oxiran-2-ylmethoxymethyl)oxirane;phenol Chemical group OC1=CC=CC=C1.OC1=CC=CC=C1.C1OC1COCC1CO1 OWMNWOXJAXJCJI-UHFFFAOYSA-N 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 2
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 2
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 125000005396 acrylic acid ester group Chemical group 0.000 description 2
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000011889 copper foil Substances 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 2
- 238000005470 impregnation Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 2
- XOKSLPVRUOBDEW-UHFFFAOYSA-N pinane Chemical compound CC1CCC2C(C)(C)C1C2 XOKSLPVRUOBDEW-UHFFFAOYSA-N 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 230000008054 signal transmission Effects 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- ZSVFYHKZQNDJEV-UHFFFAOYSA-N (2,3,4-tribromophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=C(Br)C(Br)=C1Br ZSVFYHKZQNDJEV-UHFFFAOYSA-N 0.000 description 1
- BUPRYTFTHBNSBD-UHFFFAOYSA-N (2,3,4-tribromophenyl) prop-2-enoate Chemical compound BrC1=CC=C(OC(=O)C=C)C(Br)=C1Br BUPRYTFTHBNSBD-UHFFFAOYSA-N 0.000 description 1
- RXHAESOIONKORJ-UHFFFAOYSA-N (2,5-dioxo-3-phenylpyrrol-1-yl) acetate Chemical compound O=C1N(OC(=O)C)C(=O)C=C1C1=CC=CC=C1 RXHAESOIONKORJ-UHFFFAOYSA-N 0.000 description 1
- UOCLXMDMGBRAIB-UHFFFAOYSA-N 1,1,1-trichloroethane Chemical compound CC(Cl)(Cl)Cl UOCLXMDMGBRAIB-UHFFFAOYSA-N 0.000 description 1
- 125000001781 1,3,4-oxadiazolyl group Chemical group 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- XSZYESUNPWGWFQ-UHFFFAOYSA-N 1-(2-hydroperoxypropan-2-yl)-4-methylcyclohexane Chemical compound CC1CCC(C(C)(C)OO)CC1 XSZYESUNPWGWFQ-UHFFFAOYSA-N 0.000 description 1
- LJDGDRYFCIHDPX-UHFFFAOYSA-N 1-(2-methoxyphenyl)pyrrole-2,5-dione Chemical compound COC1=CC=CC=C1N1C(=O)C=CC1=O LJDGDRYFCIHDPX-UHFFFAOYSA-N 0.000 description 1
- QYOJZFBQEAZNEW-UHFFFAOYSA-N 1-(2-methylphenyl)pyrrole-2,5-dione Chemical compound CC1=CC=CC=C1N1C(=O)C=CC1=O QYOJZFBQEAZNEW-UHFFFAOYSA-N 0.000 description 1
- QDEQBRUNBFJJPW-UHFFFAOYSA-N 1-(3-chlorophenyl)pyrrole-2,5-dione Chemical compound ClC1=CC=CC(N2C(C=CC2=O)=O)=C1 QDEQBRUNBFJJPW-UHFFFAOYSA-N 0.000 description 1
- XAHCEMQKWSQGLQ-UHFFFAOYSA-N 1-(4-methoxyphenyl)pyrrole-2,5-dione Chemical compound C1=CC(OC)=CC=C1N1C(=O)C=CC1=O XAHCEMQKWSQGLQ-UHFFFAOYSA-N 0.000 description 1
- FTFULVSESZARHS-UHFFFAOYSA-N 1-[2-chloro-4-[[3-chloro-4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound C=1C=C(N2C(C=CC2=O)=O)C(Cl)=CC=1CC(C=C1Cl)=CC=C1N1C(=O)C=CC1=O FTFULVSESZARHS-UHFFFAOYSA-N 0.000 description 1
- IPJGAEWUPXWFPL-UHFFFAOYSA-N 1-[3-(2,5-dioxopyrrol-1-yl)phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC(N2C(C=CC2=O)=O)=C1 IPJGAEWUPXWFPL-UHFFFAOYSA-N 0.000 description 1
- MBNMVPPPCZKPIJ-UHFFFAOYSA-N 1-[3-[3-[3-(2,5-dioxopyrrol-1-yl)phenoxy]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC(OC=2C=C(OC=3C=C(C=CC=3)N3C(C=CC3=O)=O)C=CC=2)=C1 MBNMVPPPCZKPIJ-UHFFFAOYSA-N 0.000 description 1
- DSHSEHBLBSCNAV-UHFFFAOYSA-N 1-[4-[2-[4-(2,5-dioxopyrrol-1-yl)phenyl]-1,1,1,3,3,3-hexafluoropropan-2-yl]phenyl]pyrrole-2,5-dione Chemical compound C=1C=C(N2C(C=CC2=O)=O)C=CC=1C(C(F)(F)F)(C(F)(F)F)C(C=C1)=CC=C1N1C(=O)C=CC1=O DSHSEHBLBSCNAV-UHFFFAOYSA-N 0.000 description 1
- SLHJINOEGOLHQE-UHFFFAOYSA-N 1-[4-[4-[2-[4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]-3-methylphenyl]propan-2-yl]-2-methylphenoxy]phenyl]pyrrole-2,5-dione Chemical compound CC1=CC(C(C)(C)C=2C=C(C)C(OC=3C=CC(=CC=3)N3C(C=CC3=O)=O)=CC=2)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O SLHJINOEGOLHQE-UHFFFAOYSA-N 0.000 description 1
- XAZPKEBWNIUCKF-UHFFFAOYSA-N 1-[4-[4-[2-[4-[4-(2,5-dioxopyrrol-1-yl)phenoxy]phenyl]propan-2-yl]phenoxy]phenyl]pyrrole-2,5-dione Chemical compound C=1C=C(OC=2C=CC(=CC=2)N2C(C=CC2=O)=O)C=CC=1C(C)(C)C(C=C1)=CC=C1OC(C=C1)=CC=C1N1C(=O)C=CC1=O XAZPKEBWNIUCKF-UHFFFAOYSA-N 0.000 description 1
- MUSBHZSCJOVTRF-UHFFFAOYSA-N 1-acetyl-3-phenylpyrrole-2,5-dione Chemical compound O=C1N(C(=O)C)C(=O)C=C1C1=CC=CC=C1 MUSBHZSCJOVTRF-UHFFFAOYSA-N 0.000 description 1
- MKRBAPNEJMFMHU-UHFFFAOYSA-N 1-benzylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CC1=CC=CC=C1 MKRBAPNEJMFMHU-UHFFFAOYSA-N 0.000 description 1
- HHVCCCZZVQMAMT-UHFFFAOYSA-N 1-hydroxy-3-phenylpyrrole-2,5-dione Chemical compound O=C1N(O)C(=O)C=C1C1=CC=CC=C1 HHVCCCZZVQMAMT-UHFFFAOYSA-N 0.000 description 1
- AXFVIWBTKYFOCY-UHFFFAOYSA-N 1-n,1-n,3-n,3-n-tetramethylbutane-1,3-diamine Chemical compound CN(C)C(C)CCN(C)C AXFVIWBTKYFOCY-UHFFFAOYSA-N 0.000 description 1
- HIETXQBDOKUUDB-UHFFFAOYSA-N 1-n,4-n-bis[(4-aminophenyl)methyl]benzene-1,4-diamine Chemical compound C1=CC(N)=CC=C1CNC(C=C1)=CC=C1NCC1=CC=C(N)C=C1 HIETXQBDOKUUDB-UHFFFAOYSA-N 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- NNXKHUXDXSVBTB-UHFFFAOYSA-N 1-pyridin-2-ylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=N1 NNXKHUXDXSVBTB-UHFFFAOYSA-N 0.000 description 1
- NOSXUFXBUISMPR-UHFFFAOYSA-N 1-tert-butylperoxyhexane Chemical compound CCCCCCOOC(C)(C)C NOSXUFXBUISMPR-UHFFFAOYSA-N 0.000 description 1
- ODBCKCWTWALFKM-UHFFFAOYSA-N 2,5-bis(tert-butylperoxy)-2,5-dimethylhex-3-yne Chemical compound CC(C)(C)OOC(C)(C)C#CC(C)(C)OOC(C)(C)C ODBCKCWTWALFKM-UHFFFAOYSA-N 0.000 description 1
- XKBHBVFIWWDGQX-UHFFFAOYSA-N 2-bromo-3,3,4,4,5,5,5-heptafluoropent-1-ene Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(Br)=C XKBHBVFIWWDGQX-UHFFFAOYSA-N 0.000 description 1
- YTWBFUCJVWKCCK-UHFFFAOYSA-N 2-heptadecyl-1h-imidazole Chemical compound CCCCCCCCCCCCCCCCCC1=NC=CN1 YTWBFUCJVWKCCK-UHFFFAOYSA-N 0.000 description 1
- WFUGQJXVXHBTEM-UHFFFAOYSA-N 2-hydroperoxy-2-(2-hydroperoxybutan-2-ylperoxy)butane Chemical compound CCC(C)(OO)OOC(C)(CC)OO WFUGQJXVXHBTEM-UHFFFAOYSA-N 0.000 description 1
- MYGMGGHRPDDQCN-UHFFFAOYSA-N 2-methyl-1-(2-methylprop-1-enoxy)prop-1-ene Chemical compound CC(C)=COC=C(C)C MYGMGGHRPDDQCN-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- POYODSZSSBWJPD-UHFFFAOYSA-N 2-methylprop-2-enoyloxy 2-methylprop-2-eneperoxoate Chemical compound CC(=C)C(=O)OOOC(=O)C(C)=C POYODSZSSBWJPD-UHFFFAOYSA-N 0.000 description 1
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 1
- BIISIZOQPWZPPS-UHFFFAOYSA-N 2-tert-butylperoxypropan-2-ylbenzene Chemical compound CC(C)(C)OOC(C)(C)C1=CC=CC=C1 BIISIZOQPWZPPS-UHFFFAOYSA-N 0.000 description 1
- LLEASVZEQBICSN-UHFFFAOYSA-N 2-undecyl-1h-imidazole Chemical compound CCCCCCCCCCCC1=NC=CN1 LLEASVZEQBICSN-UHFFFAOYSA-N 0.000 description 1
- FRIBMENBGGCKPD-UHFFFAOYSA-N 3-(2,3-dimethoxyphenyl)prop-2-enal Chemical compound COC1=CC=CC(C=CC=O)=C1OC FRIBMENBGGCKPD-UHFFFAOYSA-N 0.000 description 1
- UIDDPPKZYZTEGS-UHFFFAOYSA-N 3-(2-ethyl-4-methylimidazol-1-yl)propanenitrile Chemical compound CCC1=NC(C)=CN1CCC#N UIDDPPKZYZTEGS-UHFFFAOYSA-N 0.000 description 1
- HJLLHYNMAUWCNS-UHFFFAOYSA-N 3-[5-(3-aminophenyl)-1,3,4-oxadiazol-2-yl]aniline Chemical compound NC1=CC=CC(C=2OC(=NN=2)C=2C=C(N)C=CC=2)=C1 HJLLHYNMAUWCNS-UHFFFAOYSA-N 0.000 description 1
- LUMIUTGJALTAOY-UHFFFAOYSA-N 3-[5-(3-aminophenyl)-[1,3]thiazolo[4,5-d][1,3]thiazol-2-yl]aniline Chemical compound NC1=CC=CC(C=2SC=3SC(=NC=3N=2)C=2C=C(N)C=CC=2)=C1 LUMIUTGJALTAOY-UHFFFAOYSA-N 0.000 description 1
- ATVJXMYDOSMEPO-UHFFFAOYSA-N 3-prop-2-enoxyprop-1-ene Chemical compound C=CCOCC=C ATVJXMYDOSMEPO-UHFFFAOYSA-N 0.000 description 1
- UNTNRNUQVKDIPV-UHFFFAOYSA-N 3h-dithiazole Chemical compound N1SSC=C1 UNTNRNUQVKDIPV-UHFFFAOYSA-N 0.000 description 1
- KQIKKETXZQDHGE-FOCLMDBBSA-N 4,4'-diaminoazobenzene Chemical compound C1=CC(N)=CC=C1\N=N\C1=CC=C(N)C=C1 KQIKKETXZQDHGE-FOCLMDBBSA-N 0.000 description 1
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 1
- QSSVGISTNVSKKA-UHFFFAOYSA-N 4-[(4-aminophenyl)-methylphosphoryl]aniline Chemical compound C=1C=C(N)C=CC=1P(=O)(C)C1=CC=C(N)C=C1 QSSVGISTNVSKKA-UHFFFAOYSA-N 0.000 description 1
- XECVXFWNYNXCBN-UHFFFAOYSA-N 4-[(4-aminophenyl)-phenylmethyl]aniline Chemical compound C1=CC(N)=CC=C1C(C=1C=CC(N)=CC=1)C1=CC=CC=C1 XECVXFWNYNXCBN-UHFFFAOYSA-N 0.000 description 1
- KTZLSMUPEJXXBO-UHFFFAOYSA-N 4-[(4-aminophenyl)-phenylphosphoryl]aniline Chemical compound C1=CC(N)=CC=C1P(=O)(C=1C=CC(N)=CC=1)C1=CC=CC=C1 KTZLSMUPEJXXBO-UHFFFAOYSA-N 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T442/00—Fabric [woven, knitted, or nonwoven textile or cloth, etc.]
- Y10T442/30—Woven fabric [i.e., woven strand or strip material]
- Y10T442/3472—Woven fabric including an additional woven fabric layer
- Y10T442/3528—Three or more fabric layers
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- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Inorganic Chemistry (AREA)
- Laminated Bodies (AREA)
- Reinforced Plastic Materials (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、積層板に係り、特に難燃性,耐熱性および電
気特性に優れ、硬化時の収縮率の小さい多層プリント回
路板に関する。Description: TECHNICAL FIELD The present invention relates to a laminated board, and more particularly to a multilayer printed circuit board which is excellent in flame retardancy, heat resistance and electrical characteristics and has a small shrinkage factor upon curing.
従来、多層プリント回路板用積層材料として、難燃性を
付与する為にブロム化変性樹脂や添加型難燃剤を用いた
フェノール樹脂,エポキシ樹脂およびポリイミド樹脂等
が主に使用されている。特に大型計算機には高密度化が
望まれ、耐熱性,寸法安定性の優れたポリイミド系樹脂
が用いられている。しかし、近年、大型計算機の高速演
算処理化に伴い、信号伝送速度の向上のため、低誘電率
のプリント回路板が要求されている。このような低誘電
率積層材料として四フツ化エチレン(PTFE)樹脂,ポリ
ブタジエン樹脂から成る積層板が開発されている。この
種の積層板に関するものとして、例えばプロシーデイン
ーグ・エヌ・イー・ピー・シー・オー・エヌ,(1981
年)第160頁から第169頁(Proc.NEPCON(1981)P.P160
−169)および特開昭55−126451号公報等が挙げられ
る。Conventionally, as a laminated material for a multilayer printed circuit board, a brominated modified resin or a phenol resin using an addition type flame retardant, an epoxy resin, a polyimide resin or the like has been mainly used for imparting flame retardancy. In particular, a large computer is required to have a high density, and a polyimide resin having excellent heat resistance and dimensional stability is used. However, in recent years, with the increase in the speed of arithmetic processing of large-scale computers, a printed circuit board having a low dielectric constant is required to improve the signal transmission speed. As such a low dielectric constant laminated material, a laminated plate made of tetrafluoroethylene (PTFE) resin or polybutadiene resin has been developed. Examples of this type of laminated plate include, for example, Proceeding N.G.P.C.O.N., (1981
Year) 160 to 169 (Proc. NEPCON (1981) P.P160
-169) and JP-A-55-126451.
また、難燃性樹脂組成物で低誘電率のものとしては、ポ
リ(p−ヒドロキシスチレン)誘導体とエポキシ化ポリ
ブタジエンとから成るものが特開昭61−33050号公報に
ある。Further, as a flame-retardant resin composition having a low dielectric constant, a composition comprising a poly (p-hydroxystyrene) derivative and epoxidized polybutadiene is disclosed in JP-A-61-33050.
しかしPTFE積層板は、樹脂が熱可塑性であり、ガラス転
移温度が低いため、高温における熱膨張率が大きく寸法
安定性が十分でないなどの問題があり、特に多層化接着
した際のスルーホール信頼性等に不安がある。また、PT
FEには適当な溶媒がないので、一般に加熱溶融圧着によ
る接着法がとられているが、溶融温度が非常に高いとい
う欠点がある。また、ポリブタジエン樹脂は分子構造
上、易燃性であるという欠点があり、難燃性を付与する
為にデカブロモジフエニルエーテル,トリフエニルホス
フエート等の添加型難燃剤やトリブロモフエニルメタク
リレート,トリブロモフエニルアクリレート等の反応型
難燃剤を添加する必要があり、これらを添加することに
よりポリブタジエン樹脂本来と電気特性,耐熱性,寸法
安定性を損うという問題がある。However, the PTFE laminated plate has the problems that the resin is thermoplastic and the glass transition temperature is low, so the coefficient of thermal expansion is large at high temperatures and the dimensional stability is not sufficient. Etc. are worried. Also, PT
Since there is no suitable solvent for FE, the bonding method by heating, melting and pressure bonding is generally used, but it has a drawback that the melting temperature is very high. In addition, the polybutadiene resin has a drawback that it is flammable in terms of its molecular structure, and in order to impart flame retardancy, an additive type flame retardant such as decabromodiphenyl ether, triphenyl phosphate, tribromophenyl methacrylate, It is necessary to add a reactive flame retardant such as tribromophenyl acrylate, and the addition of these causes a problem that the original polybutadiene resin and electrical characteristics, heat resistance and dimensional stability are impaired.
本発明の目的は、従来、大型計算機に使用されているポ
リイミド系多層プリント配線板に代わる材料として、ポ
リイミド積層材料と同程度の高密度配線が可能で難燃性
を有する低誘電率積層材料を溶いた積層板に関するもの
である。An object of the present invention is to provide a flame-retardant low-dielectric-constant laminated material capable of high-density wiring comparable to that of a polyimide laminated material, as a material replacing conventional polyimide-based multilayer printed wiring boards used in large-scale computers. It relates to a molten laminate.
本発明の要旨は、繊維質基材に、(a)一般式 (式中Aは、ハロゲン基,R1は炭素数2〜4のアルケニ
ル基,アルケノイル基であり、,mは1〜4)で示される
繰返し単位からなるポリ(p−ヒドロキシスチレン)誘
導体のプレポリマと、 (b)エポキシ変性ポリブタジエンと、 (c)芳香族マレイミド化合物とからなる熱硬化性樹脂
組成を含有してなるプリプレグが積層成形された積層板
にある。The gist of the present invention resides in that (a) the general formula (Wherein A is a halogen group, R 1 is an alkenyl group having 2 to 4 carbon atoms, an alkenoyl group, and m is 1 to 4), and is a prepolymer of a poly (p-hydroxystyrene) derivative. And (b) an epoxy-modified polybutadiene, and (c) an aromatic maleimide compound in a thermosetting resin composition.
本発明の熱硬化性樹脂組成物は、前記一般式(I)で示
される化合物としては、ポリ(p−ヒドロキシスチレ
ン)のビニルエーテル,イソブテニルエーテル,アリル
エーテルと、アクリル酸エステル,メタクリル酸エステ
ル,エポキシメタクリル酸エステル等の臭化物がある。
これらは所望に応じ1種または2種以上使用される。The thermosetting resin composition of the present invention includes, as the compound represented by the general formula (I), vinyl ether, isobutenyl ether, allyl ether of poly (p-hydroxystyrene), acrylic acid ester and methacrylic acid ester. , Bromides such as epoxy methacrylate.
These may be used alone or in combination of two or more as desired.
エポキシ変性ポリブタジエンにおいて、変性に用いられ
るグリシジルエーテル系のエポキシ樹脂の具体例をあげ
れば、ジグリシジルエーテルビスフエノノールA,ジグリ
シジルエーテル2,2′−ジブロモビスフエノールA,ジグ
リシジルエーテル2,2′,4,4′−テトラブロモビスフエ
ノールA,ジグリシジルエーテル2,2′−ジメチルビスフ
エノールA,ジグリシジルエーテル2,2′,4−トリメチル
ビスフエノールA,フエノールノボラツク型エポキシ樹
脂,オルソクレゾールノボラツク型エポキシ樹脂であ
る。これらは所望に応じ、1種または2種以上使用され
る。In the epoxy-modified polybutadiene, specific examples of the glycidyl ether-based epoxy resin used for modification include diglycidyl ether bisphenonol A, diglycidyl ether 2,2′-dibromobisphenol A, diglycidyl ether 2,2. ′, 4,4′-Tetrabromobisphenol A, diglycidyl ether 2,2′-dimethylbisphenol A, diglycidyl ether 2,2 ′, 4-trimethylbisphenol A, phenol novolak type epoxy resin, orthocresol It is a novolak type epoxy resin. These may be used alone or in combination of two or more, if desired.
又、芳香族マレイミド化合物の具体例をあげれば、N,
N′−m−フエニレンビスマレイミド,N−N′−p−フ
エニレンビスマレイミド,N,N′−4,4′−ジフエニルメ
タンビスマレイミド,N,N′−4,4′−ジフエニルエーテ
ルビスマレイミド,N,N′−メチレンビス(3−クロロ−
p−フエニレン)ビスマレイミド,N,N′−4,4′−ジフ
エニルサルフオンビスマレイミドN,N′−m−キシレン
ビスマレイミド,N,N′−4,4′−ジフエニルシクロヘキ
サンビスマレイミド,N,N′−4,4′−ジフエニルプロパ
ン−ビス−マレイミド,2,2′−ビス〔4−4−マレイミ
ドフエニキシ)フエニル〕プロパン,2,2−ビス〔3−メ
チル−4−(4−マレイミドフエノキシ)フエニル〕プ
ロパン,2,2−ビス〔4−(4−マレイミドフエノキシ)
フエニルヘキサフロロプロパン,2,2−ビス(4−マレイ
ミドフエニル)ヘキサフロロプロパン,1,3−ビス(3−
マレイミドフエノキシ)ベンゼン,3,3′−ビスマレイミ
ドベンゼンフエノン等のビスマレイミド及びN−フエニ
ルマレイミド,N−3−クロロフエニルマレイミド、N−
o−トリルマレイミド,N−m−トリルマレイミド,N−p
−トリルマレイミド,N−o−メトキシフエニルマレイミ
ド,N−m−メトキシフエニルマレイミド,N−p−メトキ
シフエニルマレイミド,N−ベンジルマレイミド,N−ピリ
ジルマレイミド,N−ヒドロキシフエニルマレイミド,N−
アセトキシフエニルマレイミド,N−ジクロロフエニルマ
レイミド,N−ベンゾフエノンマレイミド,N−ジフエニル
エーテルマレイミド,N−アセチルフエニルマレイミド、
等のモノマレイミドがある。これらは所望に応じ、1種
または2種以上使用される。Further, specific examples of the aromatic maleimide compound include N,
N'-m-phenylene bismaleimide, N-N'-p-phenylene bismaleimide, N, N'-4,4'-diphenylmethane bismaleimide, N, N'-4,4'-diphenyl Ether bismaleimide, N, N'-methylenebis (3-chloro-
p-phenylene) bismaleimide, N, N'-4,4'-diphenyl sulfone bismaleimide N, N'-m-xylene bismaleimide, N, N'-4,4'-diphenylcyclohexane bismaleimide, N, N'-4,4'-diphenylpropane-bis-maleimide, 2,2'-bis [4-4-maleimidophenyloxy) phenyl] propane, 2,2-bis [3-methyl-4- ( 4-maleimidophenoxy) phenyl] propane, 2,2-bis [4- (4-maleimidophenoxy)
Phenyl hexafluoropropane, 2,2-bis (4-maleimidophenyl) hexafluoropropane, 1,3-bis (3-
Maleimidophenoxy) benzene, 3,3'-bismaleimide benzenephenone and other bismaleimides and N-phenylmaleimide, N-3-chlorophenylmaleimide, N-
o-Tolylmaleimide, Nm-tolylmaleimide, Np
-Tolylmaleimide, N-o-methoxyphenylmaleimide, Nm-methoxyphenylmaleimide, N-p-methoxyphenylmaleimide, N-benzylmaleimide, N-pyridylmaleimide, N-hydroxyphenylmaleimide, N-
Acetoxyphenylmaleimide, N-dichlorophenylmaleimide, N-benzophenonemaleimide, N-diphenylethermaleimide, N-acetylphenylmaleimide,
Etc. are monomaleimides. These may be used alone or in combination of two or more, if desired.
本発明で、芳香族系マレイミド化合物は、脂肪族系に比
べて耐熱性が優れている。In the present invention, the aromatic maleimide compound is superior in heat resistance to the aliphatic type.
又、前記、一般式(I),(II),(III)を配合した
熱硬化性樹脂組成物には、ラジカル重合開始剤およびエ
ポキシ硬化剤を添加することにより硬化反応を早めるこ
とができる。Further, by adding a radical polymerization initiator and an epoxy curing agent to the thermosetting resin composition containing the above general formulas (I), (II) and (III), the curing reaction can be accelerated.
ラジカル重合剤としての典型的例としては、ベンゾイル
パーオキシド,ジクミルパーオキシド,メチルエチルケ
トンパーオキシド,t−ブチルパーオキシラウエート,ジ
−t−ブチルパーオキシフタレート,ジベンジルオキシ
ド,2,5−ジメチル−2,5−ジ(t−ブチルパーオキシ)
ヘキサン,t−ブチルクミルパーオキシド,t−ブチルハイ
ドロパーオキシド,ジ−t−ブチルパーオキシド,2,5−
ジメチル−2,5−ジ(t−ブチルパーオキシ)ヘキシン
(3),ジイソプロピルベンゼンハイドロパーオキシ
ド,pメンタンハイドロパーオキシド,ピナンハイドロオ
キシド,2,5−ジメチルヘキサン−2,2−ジハイドロパー
オキシド,クメンハイドロパーオキシドなどがある。こ
れらは樹脂組成物100重量部に対して好ましくは0.1〜10
重量部添加する。Typical examples of the radical polymerization agent include benzoyl peroxide, dicumyl peroxide, methyl ethyl ketone peroxide, t-butyl peroxylaurate, di-t-butyl peroxyphthalate, dibenzyl oxide, 2,5-dimethyl. -2,5-di (t-butylperoxy)
Hexane, t-butyl cumyl peroxide, t-butyl hydroperoxide, di-t-butyl peroxide, 2,5-
Dimethyl-2,5-di (t-butylperoxy) hexyne (3), diisopropylbenzene hydroperoxide, p-menthane hydroperoxide, pinane hydroxide, 2,5-dimethylhexane-2,2-dihydroperoxide , Cumene hydroperoxide, etc. These are preferably 0.1 to 10 relative to 100 parts by weight of the resin composition.
Add parts by weight.
エポキシ硬化剤の典型的例としては、4,4′−ジアミノ
ジシクロヘキルメタン、1,4−ジアミノシクイロヘキサ
ン,2,6−ジアミノピリジン,m−ジフエニレンジアミン,p
−フエニレンジアミン,4,4′−ジアミノジフエニルメタ
ン,2,2′−ビス(4−アミノフエニル)プロパン,ベン
ジン,4,4′−ジアミノフエニルオキシド,4,4′−ジアミ
ノフエニルスルホン,ビス(4−アミノフエニル)メチ
ルホスフインオキシド,ビス(4−アミノフエニル)フ
エニルホスフインオキシド,ビス(4−アミノフエニ
ル)メチルアミン,1,5−ジアミノナフタレン,m−キシリ
レンジアミン,1,1′−ビス(p−アミノフエニル)フラ
タン,p−キシリレンジアミン,ヘキサメチレンジアミ
ン,6,6′−ジアミノ−2,2′−ジピリジル,4,4′−ジア
ミノベンゾフエノン,4,4′−ジアミノアゾベンゼン、ビ
ス(4−アミノフエニル)フエニルメタン,1,1′−ビス
(4−アミノフエニル)シクロヘキサン,1,1′−ビス
(4−アミノ−3−メチルフエニル)シクロヘキサン,
2,5−ビス(m−アミノフエニル)−1,3,4−オキサジア
ゾール,2,5−ビス(p−アミノフエニル)−1,3,4−オ
キサジアゾール,2,5−ビス(m−アミノフエニル)チア
ゾロ(4,5−d)チアゾール,5,5′−ジ(m−アミノフ
エニル)−(2−2′)ビス(1,3,4−オキサジアゾリ
ル),4,4′−ジアミノジフエニルエーテル,4,4′−ビス
(b−アミノフエニル)−2,2′ジチアゾール,m−ビス
(4−p−アミノフエニル−2−チアゾリル)ベンゼ
ン,4,4′−ジアミノベンズアニリド,4,4′−ジアミノフ
エニルベンゾエート,N,N′−ビス(4−アミノベンジ
ル)−p−フエニレンジアミン,4,4′−メチレンビス
(2−ジクロロアリン),ベンゾクアナミン,メチルグ
アナミン,テトラメチルブタンジアミン,無水フタル
酸,無水トリメリツト酸,無水ピロメリツト酸,無水ベ
ンゾフエノンテトラカルボン酸,エチレングリコールビ
ス(アンヒドロトリメリテート),グリセロールトリス
(アンヒドロトリメリテート),無水マレイン酸,2−メ
チルイミダゾール,2−フエニルイミダゾール,2−エチル
−4−メチルイミダゾール,1−シアノエチル−2−エチ
ル−4−メチルイミダゾール,2−ウンデシルイミダゾー
ル,2−ヘプタデシルイミダゾールなどがあり、少なくと
も1種以上用いられる。その配合量は、エポキシ変性ポ
リブタジエン100重量部に対し、0.1〜30重量部、好まし
くは0.3〜10重量部の範囲で用いるのが適当である。Typical examples of epoxy curing agents are 4,4'-diaminodicyclohexylmethane, 1,4-diaminocyclohexane, 2,6-diaminopyridine, m-diphenylenediamine, p.
-Phenylenediamine, 4,4'-diaminodiphenylmethane, 2,2'-bis (4-aminophenyl) propane, benzine, 4,4'-diaminophenyloxide, 4,4'-diaminophenylsulfone, Bis (4-aminophenyl) methylphosphine oxide, bis (4-aminophenyl) phenylphosphine oxide, bis (4-aminophenyl) methylamine, 1,5-diaminonaphthalene, m-xylylenediamine, 1,1′- Bis (p-aminophenyl) furatane, p-xylylenediamine, hexamethylenediamine, 6,6'-diamino-2,2'-dipyridyl, 4,4'-diaminobenzophenone, 4,4'-diaminoazobenzene, Bis (4-aminophenyl) phenylmethane, 1,1'-bis (4-aminophenyl) cyclohexane, 1,1'-bis (4-amino-3-methylphenyl) cyclo Hexane,
2,5-bis (m-aminophenyl) -1,3,4-oxadiazole, 2,5-bis (p-aminophenyl) -1,3,4-oxadiazole, 2,5-bis (m- Aminophenyl) thiazolo (4,5-d) thiazole, 5,5'-di (m-aminophenyl)-(2-2 ') bis (1,3,4-oxadiazolyl), 4,4'-diaminodiphenyl ether , 4,4'-bis (b-aminophenyl) -2,2'dithiazole, m-bis (4-p-aminophenyl-2-thiazolyl) benzene, 4,4'-diaminobenzanilide, 4,4'-diamino Phenyl benzoate, N, N'-bis (4-aminobenzyl) -p-phenylenediamine, 4,4'-methylenebis (2-dichloroaline), benzoquanamine, methylguanamine, tetramethylbutanediamine, phthalic anhydride, Trimellitic anhydride, Pyromellitic anhydride, Anhydrous Nzophenone tetracarboxylic acid, ethylene glycol bis (anhydrotrimellitate), glycerol tris (anhydrotrimellitate), maleic anhydride, 2-methylimidazole, 2-phenylimidazole, 2-ethyl-4-methyl There are imidazole, 1-cyanoethyl-2-ethyl-4-methylimidazole, 2-undecylimidazole, 2-heptadecylimidazole and the like, and at least one or more kinds thereof are used. It is appropriate to use the compounding amount in the range of 0.1 to 30 parts by weight, preferably 0.3 to 10 parts by weight, based on 100 parts by weight of the epoxy-modified polybutadiene.
又、ラジカル重合開始剤とエポキシ硬化剤は必要に応じ
て併用することもできる。Further, the radical polymerization initiator and the epoxy curing agent can be used together if necessary.
前記熱硬化性樹脂組成物の配合割合は、必要に応じて種
々変えることができる。一般に、一般式(I)のポリ
(p−ヒドロキシスチレン)誘導体の配合割合が多くな
ると難燃性,機械的強度が向上するが可撓性が低下し、
硬化時の収縮率が大きくなる傾向がある。一般式(II)
のエポキシ変性ポリブタジエンの配合割合が多くなる
と、可撓性,銅箔との接着性が向上するが、耐熱性が低
下する傾向があり、一般式(III)芳香族系マレイミド
の配合割合が多くなると、難燃性,耐熱性が向上し、硬
化時の収縮率が小さくなり、寸法安定性が向上する傾向
がある。The blending ratio of the thermosetting resin composition can be variously changed as necessary. Generally, when the blending ratio of the poly (p-hydroxystyrene) derivative of the general formula (I) is increased, the flame retardancy and the mechanical strength are improved, but the flexibility is lowered,
The shrinkage factor during curing tends to increase. General formula (II)
When the blending ratio of the epoxy-modified polybutadiene of is increased, the flexibility and the adhesiveness to the copper foil are improved, but the heat resistance tends to be lowered, and when the blending ratio of the general formula (III) aromatic maleimide is increased. In addition, flame retardancy and heat resistance are improved, shrinkage upon curing is reduced, and dimensional stability tends to be improved.
上記組成物として好ましい範囲は、 式(I)10〜60重量%、とくに20〜40重量% 〃(II)10〜50重量%、とくに10〜30重量% 〃(III)20〜70重量%、とくに30〜60重量% で、これら3種を上記範囲内で調製する。The preferred range of the composition is 10 to 60% by weight of the formula (I), particularly 20 to 40% by weight (II) 10 to 50% by weight, especially 10 to 30% by weight (III) 20 to 70% by weight, Particularly, 30 to 60% by weight, these three kinds are prepared within the above range.
本発明の組成物には、第4成分として、芳香族アミンを
必要に応じて配合することができる。The composition of the present invention may contain an aromatic amine as a fourth component, if necessary.
芳香族アミンとしては、例えば、 4,4′−ジアミノジフエニルメタン 4,4′−ジアミノジフエニルスルホン 4,4′ジアミノジフエニルエーテル 2,2−ビス〔4−(4−アミノフエノキシ)フエニル〕
プロパン 2,2−ビス〔4−(4−アミノフエノキシ)フエニル〕
ヘキサフロロプロパン 4,4′−ビス(3−アミノフエノキシ)ビフエニル 1,3−ビス(3−アミノフエノキシ)ベンゼン などがある。Examples of aromatic amines include 4,4′-diaminodiphenylmethane 4,4′-diaminodiphenylsulfone 4,4′diaminodiphenyl ether 2,2-bis [4- (4-aminophenoxy) phenyl]
Propane 2,2-bis [4- (4-aminophenoxy) phenyl]
Hexafluoropropane 4,4'-bis (3-aminophenoxy) biphenyl 1,3-bis (3-aminophenoxy) benzene and the like.
次に本発明における積層板の一般的な製造方法について
説明する。Next, a general method for manufacturing a laminated plate in the present invention will be described.
まず、ポリ(P−ヒドロキシスチレン)誘導体,エポキ
シ変性ポリブタジエンおよび芳香族系マレイミドを有機
溶媒に溶解させてワニスを調製する。有機溶媒としては
例えば、トルエン,キシレン,アセトン,メチルエチル
ケトン,メチルイソブチルケトン,N,N−ジメチルホルム
アミド,N−メチリルピロリドン,ジメチルスルホキシ
ド,トリクロロエチレン,トリクロロエタン,塩化メチ
レン,ジオキサン,酢酸エチル等が使用できる。First, a poly (P-hydroxystyrene) derivative, an epoxy-modified polybutadiene, and an aromatic maleimide are dissolved in an organic solvent to prepare a varnish. As the organic solvent, for example, toluene, xylene, acetone, methyl ethyl ketone, methyl isobutyl ketone, N, N-dimethylformamide, N-methylylpyrrolidone, dimethyl sulfoxide, trichloroethylene, trichloroethane, methylene chloride, dioxane, ethyl acetate and the like can be used.
なお、積層板を作製する際の樹脂の流動性,ゲル化時間
等の調整に必要に応じてワニスを加熱して予備反応して
おいてもよい。又、基材との密着性を向上させるためカ
ツプリング剤を添加しても良い。調整したワニスにラジ
カル重合開始剤およびエポキシ硬化剤を添加して含浸用
ワニスとする。次に得られた含浸用ワニスをシート状基
材に含浸塗工し、室温〜170℃で乾燥し、粘着性のない
プリプレグを得る。この時の乾燥温度の設定は用いた溶
媒および開始剤等によつて決まる。最後に得られたプリ
プレグを必要枚数重ね、100〜250℃で1〜100kgf/cm2の
圧力下で加熱硬化反応を行い積層板を得る。If necessary, the varnish may be heated and preliminarily reacted to adjust the fluidity of the resin, the gelation time, and the like when the laminated plate is manufactured. Also, a coupling agent may be added to improve the adhesion to the substrate. A radical polymerization initiator and an epoxy curing agent are added to the prepared varnish to prepare a varnish for impregnation. Next, the obtained varnish for impregnation is impregnated and coated on a sheet-shaped substrate and dried at room temperature to 170 ° C. to obtain a prepreg having no tackiness. The setting of the drying temperature at this time depends on the solvent and the initiator used. Finally, a required number of the obtained prepregs are stacked and a heat curing reaction is performed at 100 to 250 ° C. under a pressure of 1 to 100 kgf / cm 2 to obtain a laminated plate.
シート状基材としては、一般に積層材料に使用されてい
るものはほとんどすべて使用できる。無機繊維として
は、SiO2,Al2O3等を成分とするEガラス,Cガラス,Aガラ
ス,Sガラス,Dガラス,YM−31−Aガラスおよび石英を使
用したQガラス等の各種ガラス繊維及びセラミツクス繊
維がある。また有機繊維としては、芳香族ポリアミドイ
ミド骨格を有する高分子化合物を成分とするアラミド繊
維等がある。As the sheet-shaped substrate, almost all those generally used for laminated materials can be used. As the inorganic fiber, various glass fibers such as E glass, C glass, A glass, S glass, D glass, YM-31-A glass and Q glass using quartz containing SiO 2 , Al 2 O 3 etc. And there are ceramic fibers. Examples of the organic fibers include aramid fibers containing a polymer compound having an aromatic polyamideimide skeleton as a component.
本発明の樹脂組成物の硬化時の収縮率が小さくなる理由
は判らない。マレイミド系化合物の配合によつて生ずる
ものと考える。The reason why the shrinkage rate of the resin composition of the present invention upon curing is small is unknown. It is considered that this is caused by the blending of the maleimide compound.
硬化収縮率が小さいために、硬化時の積層板など硬化物
へのストレスの蓄積も小さく、従つてクラツク等の発生
も少ない。Since the curing shrinkage rate is small, the accumulation of stress on the cured product such as the laminated plate at the time of curing is small, and accordingly, the occurrence of cracks is small.
実施例1 臭素変ポリ(p−ヒドロキシスチレン)のメタクリル酸
エステル(分子量7000〜12000,臭素含有率42%)50重量
部,ジグリシジルエーテルビスフエノールaで変成した
ポリブタジエン30重量部、2,2′−ビス〔4−4(−マ
レイミドフエノキシ)フエニル〕プロパ20重量部をメチ
ルイソブチルケトン100重量部とアセトン150重量部の混
合溶媒に溶解させ50〜70℃で加熱攪拌した。更に、ラジ
カル重合開始剤として2,5−ジメチル−2,5ジ(t−ブチ
ルパーオキシ)ヘキサン(3)を0.5重量部,エポキシ
の硬化剤としてベンゾグアナミン2重量部加えて攪拌し
完全に溶解させてワニスを得る。Example 1 50 parts by weight of methacrylic acid ester of brominated poly (p-hydroxystyrene) (molecular weight 7,000 to 12000, bromine content 42%), 30 parts by weight of polybutadiene modified with diglycidyl ether bisphenol a, 2,2 ' 20 parts by weight of -bis [4-4 (-maleimidophenoxy) phenyl] propa was dissolved in a mixed solvent of 100 parts by weight of methyl isobutyl ketone and 150 parts by weight of acetone, and the mixture was heated and stirred at 50 to 70 ° C. Furthermore, 0.5 parts by weight of 2,5-dimethyl-2,5 di (t-butylperoxy) hexane (3) as a radical polymerization initiator and 2 parts by weight of benzoguanamine as a curing agent for epoxy were added and completely dissolved by stirring. Get a varnish.
次に、上記ワニスをエバポレータで40〜50℃に加熱しな
がら減圧脱気し溶媒を除去し固形の樹脂組成物を得た。
更に、該樹脂組成物を離型処理した金型に入れ130〜150
℃に加熱し液状にして減圧脱気し泡を除いて170℃で120
分,200℃で120分,230℃120分の条件で加熱硬化し樹脂板
を得た。Next, the varnish was degassed under reduced pressure while heating at 40 to 50 ° C. with an evaporator to remove the solvent to obtain a solid resin composition.
Further, the resin composition is put in a mold that has been subjected to a mold release treatment, and 130 to 150
It is heated to ℃ to make it liquid and degassed under reduced pressure to remove bubbles.
Min, 200 ° C for 120 minutes, 230 ° C for 120 minutes to obtain a resin plate.
実施例2〜13及び比較例1〜6 第1表及び第2表で示した配合組成で実施例1とほぼ同
様にして樹脂板を得た。Examples 2 to 13 and Comparative Examples 1 to 6 Resin plates were obtained in substantially the same manner as in Example 1 with the compounding compositions shown in Tables 1 and 2.
実施例10及び比較例4に於て、臭化ポリ(p−ヒドロキ
シスチレン)のアクリル酸エステルは分子量7000〜1200
0,臭素含有率45%,実施例11及び比較例5に於て、臭化
ポリ(p−ヒドロキシスチレン)のアリルは分子量7000
〜12000,臭素含有率43%,実施例12及び比較例6に於て
臭化ポリ(p−ヒドロキシスチレン)のエポキシメタク
リル酸エステルは分子量7000〜12000,臭素含有率35%の
ものをそれぞれ用いた。In Example 10 and Comparative Example 4, the acrylic acid ester of poly (p-hydroxystyrene) bromide has a molecular weight of 7,000-1200.
0, bromine content 45%, in Example 11 and Comparative Example 5, allyl bromide poly (p-hydroxystyrene) has a molecular weight of 7,000
˜12000, bromine content 43%, and epoxy methacrylic acid ester of poly (p-hydroxystyrene) bromide used in Example 12 and Comparative Example 6 had molecular weight of 7,000 to 12000 and bromine content of 35%. .
前記、実施例及び比較例による樹脂板の主な特性を第3
表に示す。The main characteristics of the resin plates according to the above-mentioned Examples and Comparative Examples are described below.
Shown in the table.
実施例14 臭素化ポリ(p−ヒドロキシスチレン)のメタクリル酸
エステル(分子量7000〜12000,臭素含有率42%)50重量
部,ジグリシジルエーテルビスフエノールAで変性した
ポリブタジエン30重量部,2,2′−ビス〔4−(4−マレ
イミドフエノキシ)フエニル〕プロパン20重量部をメチ
ルイソブチルケトン100重量部とジメチルホルムアミド1
50重量部の混合溶媒に溶解させ、100〜120℃で30分間加
熱攪拌した。更に、ラジカル重合開始剤として2,5−ジ
メチル−2,5ジ(t−ブチルパーオキシ)ヘキサン
(3)を0.5重量部,エポキシの硬化剤としてベンゾグ
アナミン2重量部加えて攪拌して完全に溶解させてワニ
スを得た。 Example 14 Methacrylic acid ester of brominated poly (p-hydroxystyrene) (molecular weight 7,000 to 12000, bromine content 42%) 50 parts by weight, polybutadiene modified with diglycidyl ether bisphenol A 30 parts by weight, 2,2 ' 20 parts by weight of bis [4- (4-maleimidophenoxy) phenyl] propane, 100 parts by weight of methyl isobutyl ketone and 1 part of dimethylformamide
It was dissolved in 50 parts by weight of the mixed solvent and heated and stirred at 100 to 120 ° C. for 30 minutes. Furthermore, 0.5 parts by weight of 2,5-dimethyl-2,5 di (t-butylperoxy) hexane (3) as a radical polymerization initiator and 2 parts by weight of benzoguanamine as a curing agent for epoxy were added and completely dissolved by stirring. I got a varnish.
このワニスをガラスクロス(Eガラス,厚さ0.1mm)に
含浸塗工し、室温で風乾燥,150℃で10〜20分間乾燥して
タツクフリーのプリプレグを得た。次に、該プリプレグ
を10枚重ねて圧力40kg・f/cm2,温度130℃で30分間加熱
し、更に170℃で1時間,220℃で2時間プレスを行い積
層板を得た。A glass cloth (E glass, thickness: 0.1 mm) was impregnated with this varnish, and air-dried at room temperature and dried at 150 ° C. for 10 to 20 minutes to obtain a tack-free prepreg. Next, 10 of the prepregs were stacked and heated at a pressure of 40 kg · f / cm 2 and a temperature of 130 ° C. for 30 minutes, and further pressed at 170 ° C. for 1 hour and 220 ° C. for 2 hours to obtain a laminated plate.
実施例15〜21及び比較例7〜12 第4表で示した配合組成で実施例14と同様にして積層板
を得た。Examples 15 to 21 and Comparative Examples 7 to 12 Laminates were obtained in the same manner as in Example 14 with the compounding compositions shown in Table 4.
実施例19に於て、臭化ポリ(p−ヒドロキシスチレン)
のアクリル酸エステルは分子量7000〜12000,臭素含有率
45%,実施例20に於て、臭化ポリ(p−ヒドロキシスチ
レン)のアリルは分子量7000〜12000,臭素含有率43%,
実施例21に於て、臭化ポリ(p−ヒドロキシスチレン)
のエポキシメタクリル酸エステルは分子量7000〜12000,
臭素含有率35%のものを用いた。In Example 19, poly (p-hydroxystyrene) bromide
Acrylic acid ester has a molecular weight of 7,000 to 12,000 and a bromine content
45%, in Example 20, allyl bromide poly (p-hydroxystyrene) has a molecular weight of 7,000 to 12000, bromine content of 43%,
In Example 21, poly (p-hydroxystyrene) bromide
Epoxy methacrylate ester has a molecular weight of 7,000 to 12,000,
A bromine content of 35% was used.
エポキシ樹脂積層板,ポリイミド樹脂積層板を比較例1
1,12とする。Comparative example 1 of epoxy resin laminate and polyimide resin laminate
Set to 1,12.
比較例13 1,2−ポリブタジエンプレポリマ50重量部,クレゾール
ノボラツク型エポキシ変性ポリブタジエン50重量部をキ
シレンに溶解させ、固形分量20〜30重量%のワニスを得
る。更に、ラジカル重合開始剤としてジクミルパーオキ
サイド2重量部,エポキシ硬化剤として2−エチル−4
メチルイミダゾール1重量部を添加し、実施例13と同様
にして積層板を得た。 Comparative Example 13 50 parts by weight of 1,2-polybutadiene prepolymer and 50 parts by weight of cresol novolak type epoxy modified polybutadiene are dissolved in xylene to obtain a varnish having a solid content of 20 to 30% by weight. Furthermore, 2 parts by weight of dicumyl peroxide as a radical polymerization initiator and 2-ethyl-4 as an epoxy curing agent.
A laminate was obtained in the same manner as in Example 13 except that 1 part by weight of methylimidazole was added.
前記、実施例および比較例による積層板の主な特性を第
5表に示す。Table 5 shows the main characteristics of the laminates according to the examples and the comparative examples.
実施例22 第6表で示した樹脂組成で、実施例13で示した方法で得
られたプリプレグを用い、該プリプレグ側を表面粗化し
た銅箔(35μm厚)を両面に積層して、圧力30kg・f/cm
2、温度130℃で30分間加熱し、さらに、170℃で1時間2
00℃で2時間プレスを行い銅張り積層板を得た。この絶
縁層の厚さは約100μmである。得られた銅張り積層板
をフオトエツチング法によつて信号層,電源層,整合層
等の内層回路パターンを形成させ、次の方法によつて回
路パターンの銅表面を処理し、両面配線単位回路シート
を形成した。Example 22 The resin composition shown in Table 6 was used, the prepreg obtained by the method shown in Example 13 was used, and copper foil (35 μm thick) having the surface roughened on the prepreg side was laminated on both sides, and the pressure was applied. 30kgf / cm
2. Heat at 130 ℃ for 30 minutes, and then at 170 ℃ for 1 hour 2
It was pressed at 00 ° C. for 2 hours to obtain a copper-clad laminate. The thickness of this insulating layer is about 100 μm. The obtained copper-clad laminate is formed with an inner layer circuit pattern such as a signal layer, a power supply layer and a matching layer by a photo etching method, and the copper surface of the circuit pattern is processed by the following method to form a double-sided wiring unit circuit. A sheet was formed.
溶液組成: (1)濃塩酸300g,塩化第2銅50g,蒸留水650g(銅表面
の粗化)。 Solution composition: (1) Concentrated hydrochloric acid 300 g, cupric chloride 50 g, distilled water 650 g (copper surface roughening).
(2)水酸化ナトリウム5g,リン酸三ナトリウム10g,亜
塩素酸ナトリウム30g,蒸留水955g(銅表面の安定化)。(2) Sodium hydroxide 5g, trisodium phosphate 10g, sodium chlorite 30g, distilled water 955g (stabilization of copper surface).
上記の処理を終了後、第1図に示すような構成で、前記
のプリプレグ樹脂シートを用いて、回路導体層2として
30層形成し、170℃,圧力40kg/cm2,170℃で90分,220℃
で90分の条件で接着形成を行い、多層プリント回路板を
作成した。After the above processing is completed, the prepreg resin sheet having the structure shown in FIG. 1 is used to form the circuit conductor layer 2.
30 layers are formed, 170 ℃, pressure 40kg / cm 2 , 170 ℃ for 90 minutes, 220 ℃
Adhesion was performed under conditions of 90 minutes to prepare a multilayer printed circuit board.
多層化接着はシートの四方に設けた穴にガイドピンを挿
入する方法で位置ずれを防止して行つた。多層化接着後
穴径0.3mm又は0.6mmの穴をマイクロドリルによつてあ
け、全面に化学銅めつきを行つてスルホール導体4を形
成させた。次に、最外層回路をエツチングにより形成さ
せて多層プリント板を形成した。The multi-layered adhesion was performed by inserting guide pins into the holes provided on all four sides of the sheet to prevent misalignment. After the multi-layered bonding, a hole having a hole diameter of 0.3 mm or 0.6 mm was drilled with a microdrill and plated with chemical copper to form a through-hole conductor 4. Next, the outermost layer circuit was formed by etching to form a multilayer printed board.
本実施例では厚さが約3.5mm×570mm×420mmの大きさ
で、ライン幅70μm及び100μmの2種、(チヤンネル
/グリツド)が2〜3本/1.3mm、層間ずれが約100μm
以下のものを得ることができた。ガラスクロスは絶縁層
の約30体積%であつた。In this embodiment, the thickness is about 3.5 mm × 570 mm × 420 mm, the line width is 70 μm and 100 μm, two types (channel / grid) are 2-3 lines / 1.3 mm, and the gap between layers is about 100 μm.
I got the following: The glass cloth was about 30% by volume of the insulating layer.
1,3は絶縁層、2は回路導体層、4はスルーホールであ
り、1は前述の銅張積層板及び3はプリプレグ樹脂シー
トである。1, 3 are insulating layers, 2 are circuit conductor layers, 4 are through holes, 1 is the above-mentioned copper clad laminate, and 3 is a prepreg resin sheet.
実施例23〜29,比較例14〜17 それぞれ第6表で示した樹脂組成で、実施例22と同様に
して多層プリント回路板を製造した。Examples 23 to 29 and Comparative Examples 14 to 17 Multilayer printed circuit boards were manufactured in the same manner as in Example 22 with the resin compositions shown in Table 6.
第7表に多層プリント回路板の一部分を切り出し、半田
耐熱性及び熱衝撃特性を測定した結果を示した。Table 7 shows the results obtained by cutting out a part of the multilayer printed circuit board and measuring the solder heat resistance and the thermal shock resistance.
なお、熱分解温度は樹脂硬化物を粉砕した試料10mgにつ
いて、空気雰囲気中、昇温速度5℃/minで測定し、5%
減量したときの温度を熱分解温度とした。 In addition, the thermal decomposition temperature was 5% measured for 10 mg of a crushed resin cured product in an air atmosphere at a temperature rising rate of 5 ° C./min.
The temperature when the amount was reduced was defined as the thermal decomposition temperature.
線膨張係数は厚さ方向の熱膨張率を昇温速度2℃/minで
測定し、50℃から200℃までの変化量から求めた。The coefficient of linear expansion was obtained by measuring the coefficient of thermal expansion in the thickness direction at a temperature rising rate of 2 ° C./min and the amount of change from 50 ° C. to 200 ° C.
硬化時の体積収縮率は、硬化前の固形の比重と硬化後の
比重差から求めた。曲げ強度は積層板を25×50mmに切断
し支点間距離30mm、曲げ強度1mm/minの条件で室温、180
℃で測定した。The volumetric shrinkage rate during curing was determined from the difference between the specific gravity of the solid before curing and the specific gravity after curing. The bending strength is 180 mm at room temperature under the condition that the laminated plate is cut into 25 × 50 mm, the distance between fulcrums is 30 mm and the bending strength is 1 mm / min.
It was measured at ° C.
比誘電率の測定はJISC6481に準じて行い周波数1MHzの静
電容量を測定して比誘電率を求めた。The relative permittivity was measured according to JIS C6481 and the capacitance at a frequency of 1 MHz was measured to obtain the relative permittivity.
その他、半田耐熱性,曲げ特性,JISC6481に準じて行
い、半田耐熱性は260℃,300秒で外観の異常の有無を調
べた。In addition, solder heat resistance, bending characteristics, and JIS C6481 were also used. Solder heat resistance was checked at 260 ° C for 300 seconds for abnormal appearance.
難燃性はUL−94垂直法に準じて測定を行つた。熱衝撃試
験は−60℃から+125℃を1サイクル として、クラツクの入るサイクルを測定した。Flame retardancy was measured according to the UL-94 vertical method. Thermal shock test: -60 ℃ to + 125 ℃ 1 cycle As a result, the cycle in which the crack enters is measured.
本発明における樹脂組成物は硬化時の体積収縮率が従来
の低誘電率の樹脂組成物に比べて小さく成型性が良好で
ある。The resin composition of the present invention has a smaller volumetric shrinkage upon curing than a conventional resin composition having a low dielectric constant, and has good moldability.
又本発明における樹脂組成物を用いた積層材料は低誘電
率材料として一般的に知られているポリブタジエンエ系
材料と同様、低誘電率特性を有し、現在、大型計算機の
多層プリント板に適用されているエポキシ系材料やポリ
イミド系材料に比べ比誘電率を4.7から3.5付近にできる
ことから信号伝送遅延時間を15%低減できる。Further, the laminated material using the resin composition of the present invention has a low dielectric constant characteristic like the polybutadiene resin generally known as a low dielectric constant material, and is currently applied to a multilayer printed board of a large computer. Compared with the existing epoxy-based materials and polyimide-based materials, the relative permittivity can be changed from 4.7 to 3.5, so the signal transmission delay time can be reduced by 15%.
更に、多層プリント回路板を本発明の樹脂組成物を用い
て製造することによつて、熱衝撃特性の優れた基板を得
ることができる。Furthermore, by producing a multilayer printed circuit board using the resin composition of the present invention, a substrate having excellent thermal shock characteristics can be obtained.
本発明によれば収縮率の小さい樹脂成形物が得られ、耐
クラツク性の良い耐熱性,難燃性の低誘電率積層板を提
供することができる。According to the present invention, a resin molded product having a small shrinkage ratio can be obtained, and a heat-resistant and flame-retardant low-dielectric-constant laminate having good crack resistance can be provided.
第1図は本発明の一実施例である多層プリント板の断面
斜視図である。 1……基板、2……回路、3……プリプレグシート、4
……スルホール。FIG. 1 is a cross-sectional perspective view of a multilayer printed board which is an embodiment of the present invention. 1 ... Board, 2 ... Circuit, 3 ... Prepreg sheet, 4
…… Through hole.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 永井 晃 茨城県日立市久慈町4026番地 株式会社日 立製作所日立研究所内 (72)発明者 小野 正博 茨城県日立市久慈町4026番地 株式会社日 立製作所日立研究所内 (72)発明者 奈良原 俊和 茨城県日立市久慈町4026番地 株式会社日 立製作所日立研究所内 (56)参考文献 特開 昭55−127425(JP,A) 特開 昭55−126452(JP,A) 特開 昭55−73726(JP,A) 特開 昭55−73728(JP,A) 特開 昭61−243844(JP,A) 特開 昭62−192406(JP,A) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Akira Nagai Akira Nagai 4026 Kuji Town, Hitachi City, Ibaraki Prefecture Hitate Works, Ltd., Hitachi Research Laboratory (72) Inventor Masahiro Ono 4026 Kuji Town Hitachi City, Ibaraki Prefecture Nitate Works Co., Ltd. Hitachi Research Laboratory (72) Inventor Toshikazu Narahara 4026 Kuji Town, Hitachi City, Ibaraki Prefecture Hitachi Research Laboratory, Hitachi, Ltd. (56) References JP-A-55-127425 (JP, A) JP-A-55-126452 (JP) , A) JP-A-55-73726 (JP, A) JP-A-55-73728 (JP, A) JP-A-61-243844 (JP, A) JP-A-62-192406 (JP, A)
Claims (1)
ル基,アルケノイル基であり、,mは1〜4)で示される
繰返し単位からなるポリ(p−ヒドロキシスチレン)誘
導体のプレポリマと、 (b)一般式 (式中、Bはグリシジルエーテル系エポキシコポリマで
あり、nは1〜100の数を示す)で示されるエポキシポ
リブタジエンと、(c)芳香族マレイミド化合物とから
なる熱硬化性樹脂組成物を含有してなるプリプレグが積
層成形された積層板。1. A fibrous base material comprising the general formula (a) (Wherein A is a halogen group, R 1 is an alkenyl group having 2 to 4 carbon atoms, an alkenoyl group, and m is 1 to 4), and is a prepolymer of a poly (p-hydroxystyrene) derivative. And (b) general formula (In the formula, B is a glycidyl ether-based epoxy copolymer, and n is a number of 1 to 100), and a thermosetting resin composition containing (c) an aromatic maleimide compound is contained. A laminated board in which prepregs formed by laminating are formed.
Priority Applications (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62277446A JPH072829B2 (en) | 1987-11-04 | 1987-11-04 | Laminate |
KR1019880014147A KR960007765B1 (en) | 1987-11-04 | 1988-10-29 | Thermosetting resin composition, and prepreg and laminated sheet which use the same |
US07/266,406 US4931507A (en) | 1987-11-04 | 1988-11-02 | Composition comprising poly(p-hydroxystrene) derivative, epoxy-modified polybutadiene and aromatic maleimide |
CN88107546A CN1009006B (en) | 1987-11-04 | 1988-11-03 | Compositions of thermosetting resin reaches by its prepreg that makes and laminated plate material |
EP88118454A EP0315211B1 (en) | 1987-11-04 | 1988-11-04 | Thermosetting resin composition, and prepreg and laminated sheet which use the same |
DE3853868T DE3853868T2 (en) | 1987-11-04 | 1988-11-04 | Thermosetting resin composition and prepreg and laminated laminate using them. |
US07/487,406 US5080965A (en) | 1987-11-04 | 1990-03-26 | Prepreg from poly(p-hydroxystyrene), epoxy-modified polybutadiene and maleimide |
US07/772,846 US5212244A (en) | 1987-11-04 | 1991-10-08 | Thermosetting resin composition, and prepreg and laminated sheet which use the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62277446A JPH072829B2 (en) | 1987-11-04 | 1987-11-04 | Laminate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01121356A JPH01121356A (en) | 1989-05-15 |
JPH072829B2 true JPH072829B2 (en) | 1995-01-18 |
Family
ID=17583686
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62277446A Expired - Lifetime JPH072829B2 (en) | 1987-11-04 | 1987-11-04 | Laminate |
Country Status (6)
Country | Link |
---|---|
US (2) | US4931507A (en) |
EP (1) | EP0315211B1 (en) |
JP (1) | JPH072829B2 (en) |
KR (1) | KR960007765B1 (en) |
CN (1) | CN1009006B (en) |
DE (1) | DE3853868T2 (en) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3750641T2 (en) * | 1986-02-19 | 1995-04-06 | Hitachi Ltd | Thermosetting resin, prepreg and use in laminates. |
JP4080546B2 (en) † | 1997-01-21 | 2008-04-23 | ダウ グローバル テクノロジーズ インコーポレイティド | Latent catalyst for epoxy curing systems |
JP3184485B2 (en) * | 1997-11-06 | 2001-07-09 | 三井金属鉱業株式会社 | Resin composition for copper clad laminate, copper foil with resin, multilayer copper clad laminate and multilayer printed wiring board |
JP2006225484A (en) * | 2005-02-16 | 2006-08-31 | Murata Mfg Co Ltd | Composite dielectric material and electronic component |
CN101443368B (en) * | 2006-05-18 | 2012-08-29 | 弗来克塞斯股份有限公司 | Compositions comprising biscitraconimide, bisitaconimide, and/or citraconimido-itaconimide |
JP5266685B2 (en) * | 2006-09-29 | 2013-08-21 | 日立化成株式会社 | Thermosetting resin composition, prepreg and laminate using the same |
CN102224583B (en) * | 2008-11-25 | 2014-09-10 | 洛德公司 | Methods for protecting a die surface with photocurable materials |
US9093448B2 (en) | 2008-11-25 | 2015-07-28 | Lord Corporation | Methods for protecting a die surface with photocurable materials |
CN101643565B (en) * | 2009-08-24 | 2010-07-21 | 广东生益科技股份有限公司 | Composite material, high frequency circuit board prepared from same and preparation method thereof |
SG11201403955SA (en) * | 2012-01-19 | 2014-08-28 | Isola Usa Corp | Synthesized resins and varnishes, prepregs and laminates made thereform |
JP6303320B2 (en) * | 2013-08-06 | 2018-04-04 | 味の素株式会社 | Manufacturing method of component mounting board |
JP6885000B2 (en) * | 2016-07-19 | 2021-06-09 | 昭和電工マテリアルズ株式会社 | A resin film for forming a semiconductor rewiring layer, a composite film for forming a semiconductor rewiring layer, a semiconductor device using them, and a method for manufacturing the semiconductor device. |
WO2018150771A1 (en) * | 2017-02-20 | 2018-08-23 | Jsr株式会社 | Photosensitive resin composition, cured film and production method therefor, and electronic component |
CN109082020A (en) * | 2017-06-13 | 2018-12-25 | 广东生益科技股份有限公司 | Polymer resin composition and its application in high-frequency circuit board |
CN109082019B (en) * | 2017-06-13 | 2020-04-14 | 广东生益科技股份有限公司 | Polymer resin and application thereof in high-frequency circuit board |
CN109082021B (en) * | 2017-06-13 | 2021-01-01 | 广东生益科技股份有限公司 | Polymer resin composition and application thereof in high-frequency circuit board |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5573728A (en) * | 1978-11-28 | 1980-06-03 | Fujitsu Ltd | Heat-resistant resin composition |
JPS5573726A (en) * | 1978-11-28 | 1980-06-03 | Fujitsu Ltd | Heat-resistant resin composition |
US4229550A (en) * | 1978-12-11 | 1980-10-21 | Trw Inc. | Flexibilized vinyl polybutadiene maleimide resins |
JPS55126455A (en) * | 1979-03-23 | 1980-09-30 | Nippon Baldwin Kk | Circulation replenishment adjustor for printing press wetting water |
JPS6011634B2 (en) * | 1979-03-24 | 1985-03-27 | 富士通株式会社 | heat resistant laminate |
JPS55127425A (en) * | 1979-03-24 | 1980-10-02 | Fujitsu Ltd | Heat-resistant resin composition and heat-resistant laminated sheet |
JPS6133050A (en) * | 1984-07-26 | 1986-02-15 | Ricoh Co Ltd | Loop communication system |
JPS61243844A (en) * | 1985-04-23 | 1986-10-30 | Hitachi Ltd | Thermosetting resin composition, laminated sheet and production thereof |
US4743647A (en) * | 1985-08-02 | 1988-05-10 | Amoco Corporation | Prepreg resin from aromatic bismaleimide and ethylenically unsaturated coreactant |
DE3750641T2 (en) * | 1986-02-19 | 1995-04-06 | Hitachi Ltd | Thermosetting resin, prepreg and use in laminates. |
JPH0680094B2 (en) * | 1986-02-19 | 1994-10-12 | 株式会社日立製作所 | Flame-retardant resin composition |
JPS6356548A (en) * | 1986-08-27 | 1988-03-11 | Hitachi Ltd | Thermosetting resin composition, laminated sheet produced by using same and production thereof |
-
1987
- 1987-11-04 JP JP62277446A patent/JPH072829B2/en not_active Expired - Lifetime
-
1988
- 1988-10-29 KR KR1019880014147A patent/KR960007765B1/en not_active IP Right Cessation
- 1988-11-02 US US07/266,406 patent/US4931507A/en not_active Expired - Fee Related
- 1988-11-03 CN CN88107546A patent/CN1009006B/en not_active Expired
- 1988-11-04 DE DE3853868T patent/DE3853868T2/en not_active Expired - Fee Related
- 1988-11-04 EP EP88118454A patent/EP0315211B1/en not_active Expired - Lifetime
-
1990
- 1990-03-26 US US07/487,406 patent/US5080965A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
KR960007765B1 (en) | 1996-06-12 |
EP0315211B1 (en) | 1995-05-24 |
US5080965A (en) | 1992-01-14 |
EP0315211A1 (en) | 1989-05-10 |
KR890008186A (en) | 1989-07-10 |
JPH01121356A (en) | 1989-05-15 |
DE3853868T2 (en) | 1995-09-21 |
CN1033065A (en) | 1989-05-24 |
DE3853868D1 (en) | 1995-06-29 |
US4931507A (en) | 1990-06-05 |
CN1009006B (en) | 1990-08-01 |
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