JPH07270499A - Inspection method for semiconductor device - Google Patents

Inspection method for semiconductor device

Info

Publication number
JPH07270499A
JPH07270499A JP6057515A JP5751594A JPH07270499A JP H07270499 A JPH07270499 A JP H07270499A JP 6057515 A JP6057515 A JP 6057515A JP 5751594 A JP5751594 A JP 5751594A JP H07270499 A JPH07270499 A JP H07270499A
Authority
JP
Japan
Prior art keywords
transistor
semiconductor device
current
signal
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6057515A
Other languages
Japanese (ja)
Other versions
JP3173274B2 (en
Inventor
Yasuhiro Tokumaru
泰博 徳丸
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsumi Electric Co Ltd
Original Assignee
Mitsumi Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsumi Electric Co Ltd filed Critical Mitsumi Electric Co Ltd
Priority to JP05751594A priority Critical patent/JP3173274B2/en
Publication of JPH07270499A publication Critical patent/JPH07270499A/en
Application granted granted Critical
Publication of JP3173274B2 publication Critical patent/JP3173274B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Testing Of Individual Semiconductor Devices (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Logic Circuits (AREA)

Abstract

PURPOSE:To provide a convenient and highly accurate inspection method by reducing operating current fed to a semiconductor device by a prescribed amount from a normal value, and making judgement as to whether an output signal from the semiconductor device shows a logical value corresponding to a logical binarized signal. CONSTITUTION:A signal source 1 generates a logical binarized signal having a prescribed timing, and this signal is sent to the base of a transistor Q11. Also, the emitter of the transistor Q11 is grounded. Furthermore, a current source 2 is connected to the emitter of another transistor Q21 and the current from the source 2 is variably controlled. Operating current IINJ is fed from the source 2 to the base of the transistor Q11 through the transistor Q12, and the transistor Q11 operates as the inverter. In a normal operation condition, the operating current IINJ is set as approximately equal to I gamma A, but in this inspection method, the current IINJ from the source 2 is variably controlled at normal temperature and reduced by a prescribed amount.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体装置の検査方法に
係り、特に論理回路を形成してなる半導体装置に用いて
好適な半導体装置の検査方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device inspection method, and more particularly to a semiconductor device inspection method suitable for use in a semiconductor device having a logic circuit formed therein.

【0002】[0002]

【従来の技術】例えばIILなどのように、インバータ
を多数縦続接続して論理回路を形成する半導体装置が従
来より知られている。このような半導体装置は、製造時
に1段でも素子に欠陥が発生すると、入力論理2値信号
に応じた正しい出力信号を得ることができない。
2. Description of the Related Art A semiconductor device, such as an IIL, which has a large number of inverters connected in cascade to form a logic circuit, has been conventionally known. Such a semiconductor device cannot obtain a correct output signal according to an input logic binary signal if a defect occurs in an element even in one stage during manufacturing.

【0003】そこで従来は、拡散を浮き出させた上で人
間が顕微鏡を使用して肉眼により結晶の欠陥を検査して
いた。この方法では、結晶の不均一を気泡状態を見つけ
ることにより識別することができ、良品と不良品の判定
をおこなっていた。
Therefore, conventionally, a person has inspected a crystal defect visually by using a microscope after emphasizing the diffusion. In this method, the non-uniformity of crystals can be identified by finding the bubble state, and the good product and the defective product are determined.

【0004】あるいは、半導体装置を低温または高温状
態にすることでリーク電流を常温時よりも増大させてお
いて半導体装置に入力論理2値信号を付与し、入力論理
2値信号に応じた正しい出力信号が得られるかを検査し
ていた。このように出力信号を見て、良品か不良品かの
判定をおこなっていた。なお、低温状態よりも高温状態
の方がリーク電流は増大するので検査精度は上がるが、
高温にし過ぎると信頼性の点で問題となる。
Alternatively, the semiconductor device is brought into a low temperature or high temperature state to increase the leak current as compared with that at the normal temperature, and an input logic binary signal is given to the semiconductor device, and a correct output corresponding to the input logic binary signal is given. I was checking if I could get a signal. In this way, the output signal is checked to determine whether it is a good product or a defective product. Although the leak current increases in the high temperature state than in the low temperature state, the inspection accuracy increases,
If the temperature is too high, reliability will be a problem.

【0005】[0005]

【発明が解決しようとする課題】しかしながら前者の方
法によれば、肉眼による検査であるために検査精度に限
度があると共に検査精度に個人差によるばらつきがあっ
た。一方後者の方法では、検査精度にばらつきは生じる
ことがなく環境温度によっては検査精度を向上させるこ
とができるものの、半導体装置を低温または高温状態に
するための設備が必要であり大がかりな検査方法となっ
てしまう問題があった。
However, according to the former method, the inspection accuracy is limited because it is an inspection by the naked eye, and the inspection accuracy varies depending on individual differences. On the other hand, in the latter method, there is no variation in the inspection accuracy and the inspection accuracy can be improved depending on the environmental temperature, but a facility for bringing the semiconductor device into a low temperature or high temperature state is required and a large-scale inspection method. There was a problem that became.

【0006】そこで本発明は上記の点に鑑みてなされた
ものであって、簡便で精度の良い半導体装置の検査方法
を提供することを目的とする。
Therefore, the present invention has been made in view of the above points, and it is an object of the present invention to provide a simple and accurate method for inspecting a semiconductor device.

【0007】[0007]

【課題を解決するための手段】上記の問題を解決するた
めに、本発明では次の通り構成した。
In order to solve the above problems, the present invention has the following configuration.

【0008】すなわち、論理回路を形成してなる半導体
装置に論理2値信号を入力すると共に半導体装置に動作
電流を供給し、半導体装置の出力信号に基づいて半導体
装置の良不良を判定する半導体装置の検査方法におい
て、半導体装置に供給する動作電流を通常の値よりも所
定量低減し、半導体装置の出力信号が論理2値信号に応
じた論理値を示すがどうかを判別して半導体装置の良不
良を判定するように構成した。
That is, a semiconductor device formed with a logic circuit is supplied with a logic binary signal and at the same time an operating current is supplied to the semiconductor device, and the semiconductor device is judged as good or bad based on the output signal of the semiconductor device. In the inspection method, the operating current supplied to the semiconductor device is reduced by a predetermined amount from a normal value, and it is determined whether the output signal of the semiconductor device shows a logical value according to the logical binary signal to judge whether the semiconductor device is good or bad. It is configured to judge a defect.

【0009】[0009]

【作用】上記構成の本発明によれば、半導体装置に供給
する動作電流を通常の値よりも所定量低減することで出
力電流中のリーク電流の割合が増大するため、結晶欠陥
当によりリーク電流が元々多い不良品では、リーク電流
の影響によりhfeが良品よりも低下するように作用す
る。
According to the present invention having the above structure, the ratio of the leak current in the output current is increased by reducing the operating current supplied to the semiconductor device by a predetermined amount from the normal value. In a defective product, which has a large number of defects, h fe acts so as to be lower than that in a non-defective product due to the influence of leak current.

【0010】[0010]

【実施例】次に、図面を参照して本発明の実施例につい
て説明する。図1は本発明の一実施例を説明するための
回路図である。図1に示される回路はIIL(Inte
grated Injection Logic)と称
される論理回路ICからなり、通常同一半導体チップ上
にリニヤICと共通のプロセスにより共存して形成され
る。
Embodiments of the present invention will now be described with reference to the drawings. FIG. 1 is a circuit diagram for explaining one embodiment of the present invention. The circuit shown in FIG.
The logic circuit IC is called a gated injection logic) and is usually formed on the same semiconductor chip in coexistence with the linear IC by a common process.

【0011】信号源1は所定のタイミングの論理2値信
号を生成する。この論理2値信号はトランジスタQ11
ベースに供給されている。トランジスタQ11のエミッタ
は接地されている。
The signal source 1 generates a logic binary signal at a predetermined timing. This logical binary signal is supplied to the base of the transistor Q 11 . The emitter of the transistor Q 11 is grounded.

【0012】また、トランジスタQ21のコレクタはトラ
ンジスタQ11のベースに接続されており、トランジスタ
21のベースは接地されている。一方、トランジスタQ
21のエミッタには電流源2が接続されており、電流源2
からの電流は可変制御されるようになっている。
The collector of the transistor Q 21 is connected to the base of the transistor Q 11 , and the base of the transistor Q 21 is grounded. On the other hand, transistor Q
The current source 2 is connected to the emitter of 21.
The current from is variably controlled.

【0013】このような構成により、電流源2からトラ
ンジスタQ21を介してトランジスタQ11のベースに動作
電流IINJ が注入され、トランジスタQ11はインバータ
として動作する。さらに、トランジスタQ11のコレクタ
には次段のインバータが接続される。
[0013] With this configuration, the base operating current I INJ of the transistor Q 11 from the current source 2 via the transistor Q 21 is injected, the transistor Q 11 operates as an inverter. Further, the collector of the transistor Q 11 is connected to the next inverter.

【0014】すなわち、トランジスタQ11のコレクタに
トランジスタQ12のベースが接続されている。トランジ
スタQ12のエミッタは接地されている。また、トランジ
スタQ12のベースにはトランジスタQ22のコレクタが接
続されており、トランジスタQ22のベースは接地されて
いる。一方、トランジスタQ22のエミッタにはトランジ
スタQ21のエミッタと同様に動作電流IINJ 注入用の電
流源2が接続されている。
That is, the base of the transistor Q 12 is connected to the collector of the transistor Q 11 . The emitter of the transistor Q 12 is grounded. Moreover, the base of the transistor Q 12 is the collector of the transistor Q 22 is connected, the base of the transistor Q 22 is grounded. On the other hand, the emitter of the transistor Q 22 is connected to the current source 2 for injecting the operating current I INJ, like the emitter of the transistor Q 21 .

【0015】さらに、トランジスタQ12のコレクタには
後段のインバータが複数段縦続接続される。最終段のイ
ンバータは、トランジスタQ1nとトランジスタQ2nとで
構成されている。nの値を奇数とすれば、全体としてイ
ンバータ回路を構成する。nの値を偶数とすれば、全体
としてバッファ回路を構成する。
Further, the collector of the transistor Q 12 is connected to a plurality of stages of inverters in the subsequent stage. The final stage inverter is composed of a transistor Q 1n and a transistor Q 2n . If the value of n is an odd number, the inverter circuit is configured as a whole. If the value of n is an even number, a buffer circuit is configured as a whole.

【0016】本実施例ではインバータを複数段縦続接続
しているのでインバータ回路またはバッファ回路が構成
されるが、各インバータトランジスタの接続方法はこれ
に限るものでなく、その他の論理回路を構成することも
考えられる。最終段のトランジスタQ1nのコレクタには
例えばテスタ3が接続される。テスタ3の代わりに、オ
シロスコープ等の波形モニタを接続しても勿論構わな
い。
In the present embodiment, the inverter circuit or the buffer circuit is formed because the inverters are connected in cascade, but the connection method of each inverter transistor is not limited to this, and other logic circuits may be formed. Can also be considered. A tester 3, for example, is connected to the collector of the transistor Q 1n at the final stage. A waveform monitor such as an oscilloscope may be connected instead of the tester 3.

【0017】図2は動作電流IINJ を可変したときのコ
レクタ出力電流IC と動作電流IIN J との比(IC /I
INJ )を結晶欠陥のない良品のトランジスタについて示
す図である。
FIG. 2 shows a ratio (I C / I) between the collector output current I C and the operating current I IN J when the operating current I INJ is varied.
FIG. 7 is a diagram showing INJ ) of a non-defective transistor without crystal defects.

【0018】通常の動作ではIINJ =1μA程度に設定
されているが、本実施例になる半導体装置の検査方法で
は、常温(すなわち室温)において電流源2からの電流
IN J を可変制御してこれを所定量低減させる。すなわ
ち、図示の如く1nAまで低減させている。
In a normal operation, I INJ = 1 μA is set, but in the semiconductor device inspection method according to this embodiment, the current I IN J from the current source 2 is variably controlled at room temperature (that is, room temperature). This is reduced by a predetermined amount. That is, it is reduced to 1 nA as shown.

【0019】コレクタ出力電流IC と動作電流IINJ
の比(IC /IINJ )はエミッタ接地の電流増幅率に他
ならず、図示の如くIINJ が数μAでピーク値を示し、
ピークの両側で直線的に減少している。通常動作のI
INJ =1μAでは約20とされている。
The ratio (I C / I INJ ) between the collector output current I C and the operating current I INJ is nothing but the current amplification factor of the grounded emitter, and I INJ shows a peak value at several μA as shown in the figure,
It decreases linearly on both sides of the peak. Normal operation I
It is about 20 at INJ = 1 μA.

【0020】IINJ を例えば数10nAまで低減させた
ときには、コレクタ出力電流IC と動作電流IINJ との
比(IC /IINJ )は14乃至18とされ、トランジス
タは充分な電流駆動能力を有する。
When I INJ is reduced to, for example, several tens of nA, the ratio (I C / I INJ ) between the collector output current I C and the operating current I INJ is set to 14 to 18, and the transistor has sufficient current driving capability. Have.

【0021】したがって、次段のトランジスタを駆動す
ることができるので、入力論理2値信号に応じた正しい
信号を最終段のトランジスタQ1nのコレクタに接続され
たテスタ3で観測することができる。なお、入力論理2
値信号は、これに応じた出力信号をテスタ3で観測する
ことができる程度の比較的長い周期で論理値が切り換え
られる。
Therefore, since the transistor in the next stage can be driven, a correct signal corresponding to the input logic binary signal can be observed by the tester 3 connected to the collector of the transistor Q 1n in the final stage. Input logic 2
The logical value of the value signal is switched at a relatively long cycle such that the output signal corresponding to the value signal can be observed by the tester 3.

【0022】図3は動作電流IINJ を可変したときのコ
レクタ出力電流IC と動作電流IIN J との比(IC /I
INJ )を結晶欠陥のある不良品のトランジスタについて
示す図である。
FIG. 3 shows a ratio (I C / I) between the collector output current I C and the operating current I IN J when the operating current I INJ is varied.
FIG. 3 is a diagram showing INJ ) of a defective transistor having crystal defects.

【0023】通常の動作ではIINJ =1μA程度に設定
されているが、本実施例になる半導体装置の検査方法で
は、常温(すなわち室温)において電流源2からの電流
IN J を可変制御してこれを所定量低減させる。すなわ
ち、図示の如く1nAまで低減させている。
In normal operation, I INJ = 1 μA is set, but in the semiconductor device inspection method of this embodiment, the current I IN J from the current source 2 is variably controlled at room temperature (that is, room temperature). This is reduced by a predetermined amount. That is, it is reduced to 1 nA as shown.

【0024】コレクタ出力電流IC と動作電流IINJ
の比(IC /IINJ )はエミッタ接地の電流増幅率に他
ならず、図示の如くIINJ は良品のトランジスタと同様
数μAでピーク値を示し(ピーク値はやや小さい)、ピ
ークの右側の増大方向では直線的に減少している。一
方、ピークの左側の減少方向では曲線的に減少してい
る。通常動作のIINJ =1μAでは約16とされてお
り、充分な駆動能力を有している。
The ratio of the collector output current I C to the operating current I INJ (I C / I INJ ) is nothing but the current amplification factor of the grounded emitter, and as shown in the figure, I INJ peaks at several μA as in a good transistor. The value is shown (peak value is a little small), and it decreases linearly in the increasing direction on the right side of the peak. On the other hand, it decreases in a curve in the decreasing direction on the left side of the peak. The value is about 16 at I INJ = 1 μA in the normal operation, and has a sufficient driving capability.

【0025】IINJ を例えば数10nAまで低減させた
ときには、コレクタ出力電流IC と動作電流IINJ との
比(IC /IINJ )は4乃至10とされ、良品のトラン
ジスタ場合の約半分の電流駆動能力しか有さない。
When I INJ is reduced to, for example, several tens of nA, the ratio (I C / I INJ ) between the collector output current I C and the operating current I INJ is set to 4 to 10, which is about half that of a non-defective transistor. It has only current drive capability.

【0026】したがって、次段のトランジスタを駆動す
ることが不可能で正常動作を行えなくなり、不良品がど
の段かに1個だけあったとしても、入力論理2値信号に
応じた正しい信号を最終段のトランジスタQ1nのコレク
タに接続されたテスタ3で観測することができず、最終
段の出力はハイレベルに固定されて変化することのない
信号となる。
Therefore, it is impossible to drive the transistor of the next stage and normal operation cannot be performed, and even if there is only one defective product in any stage, the correct signal corresponding to the input logic binary signal is finally given. The output of the final stage cannot be observed by the tester 3 connected to the collector of the transistor Q 1n of the stage, and the output of the final stage is a high level signal which does not change.

【0027】このように本実施例によれば、半導体装置
に供給する動作電流を通常の値よりも所定量低減するこ
とで出力電流中のリーク電流の割合が増大するため、結
晶欠陥当によりリーク電流が元々多い不良品では、リー
ク電流の影響によりhfeが良品よりも低下して次の段の
トランジスタを駆動できなくなる。
As described above, according to this embodiment, since the ratio of the leak current in the output current increases by reducing the operating current supplied to the semiconductor device by a predetermined amount from the normal value, the leakage due to the crystal defect. In a defective product that originally has a large current, h fe is lower than that in a non-defective product due to the influence of leakage current, and the transistor in the next stage cannot be driven.

【0028】したがって、常温において大がかりな設備
を必要とすることなく、電流を可変する簡便な方法で、
良品と不良品とを判別して検査することができる。ま
た、肉眼によらない検査方法であるので、検査精度も電
流源からの電流に応じて決まり、安定して良好な検査精
度が得られることとなる。
Therefore, at room temperature, a simple method of varying the current without the need for large-scale equipment,
A good product and a defective product can be distinguished and inspected. Further, since the inspection method does not depend on the naked eye, the inspection accuracy is determined according to the current from the current source, and stable and good inspection accuracy can be obtained.

【0029】[0029]

【発明の効果】上述の如く本発明によれば、半導体装置
に供給する動作電流を通常の値よりも所定量低減する
と、不良品ではリーク電流の影響によりhfeが良品より
も低下するため、次段の論理回路を駆動できなくなる。
したがって、温度を可変する設備等を必要とすることな
く、常温においても、出力信号が入力論理2値信号に応
じた論理値を示さなくなるので簡便な方法で精度良く不
良品を良品と判別することができる特徴がある。
As described above, according to the present invention, when the operating current supplied to the semiconductor device is reduced by a predetermined amount from the normal value, h fe becomes lower than that of a non-defective product due to the influence of the leak current. The next-stage logic circuit cannot be driven.
Therefore, the output signal does not show a logical value according to the input logical binary signal even at room temperature without requiring a facility for changing the temperature, so that a defective product can be accurately and accurately determined as a good product. There is a feature that can be.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を説明するための回路図であ
る。
FIG. 1 is a circuit diagram for explaining an embodiment of the present invention.

【図2】動作電流IINJ を可変したときのコレクタ出力
電流IC と動作電流IINJ との比(IC /IINJ )を結
晶欠陥のない良品のトランジスタについて示す図であ
る。
2 is a diagram showing a transistor of a non-defective without crystal defects ratio (I C / I INJ) the collector output current I C and the operating current I INJ when the variable operating current I INJ.

【図3】動作電流IINJ を可変したときのコレクタ出力
電流IC と動作電流IINJ との比(IC /IINJ )を結
晶欠陥のある不良品のトランジスタについて示す図であ
る。
3 is a diagram showing the ratio (I C / I INJ) transistors defective in crystal defects of the collector output current I C and the operating current I INJ when the variable operating current I INJ.

【符号の説明】[Explanation of symbols]

1 信号源 2 電流源 3 テスタ Q11,Q12,〜Q1n,Q21,Q22,〜Q2n トランジス
1 signal source 2 current source 3 tester Q 11 , Q 12 , ~ Q 1n , Q 21 , Q 22 , ~ Q 2n transistor

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 論理回路を形成してなる半導体装置に論
理2値信号を入力すると共に半導体装置に動作電流を供
給し、 該半導体装置の出力信号に基づいて該半導体装置の良不
良を判定する半導体装置の検査方法において、 該半導体装置に供給する該動作電流を通常の値よりも所
定量低減し、 該半導体装置の出力信号が該論理2値信号に応じた論理
値を示すがどうかを判別して該半導体装置の良不良を判
定することを特徴とする半導体装置の検査方法。
1. A logic binary signal is input to a semiconductor device formed with a logic circuit, an operating current is supplied to the semiconductor device, and a pass / fail of the semiconductor device is determined based on an output signal of the semiconductor device. In a method of inspecting a semiconductor device, it is determined whether the operating current supplied to the semiconductor device is reduced by a predetermined amount from a normal value and an output signal of the semiconductor device shows a logical value according to the logical binary signal. Then, a method for inspecting a semiconductor device is characterized by determining whether the semiconductor device is good or bad.
JP05751594A 1994-03-28 1994-03-28 Inspection method for semiconductor device Expired - Lifetime JP3173274B2 (en)

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