JPH07240578A - Manufacture of substrate for high-frequency circuit - Google Patents

Manufacture of substrate for high-frequency circuit

Info

Publication number
JPH07240578A
JPH07240578A JP6029296A JP2929694A JPH07240578A JP H07240578 A JPH07240578 A JP H07240578A JP 6029296 A JP6029296 A JP 6029296A JP 2929694 A JP2929694 A JP 2929694A JP H07240578 A JPH07240578 A JP H07240578A
Authority
JP
Japan
Prior art keywords
resin
substrate
heated
molecular weight
frequency circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6029296A
Other languages
Japanese (ja)
Inventor
Hidenori Eriguchi
秀紀 江里口
Yoshinori Sato
義則 佐藤
Shinichi Kamoshita
真一 鴨志田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP6029296A priority Critical patent/JPH07240578A/en
Publication of JPH07240578A publication Critical patent/JPH07240578A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To improve the dimensional stability of a substrate for high-frequency circuit by forming it from a porous sheet of ultrahigh molecular weight sandwiched between resin-impregnated reinforcing sheets and hardened by heat under pressure. CONSTITUTION:A reinforcing sheet having a fiber base 2 impregnated with thermosetting resin 3 is attached to each side of a porous sheet 1 of ultrahigh molecular weight polyethylene. This laminate is heated and pressed to cure the resin, is cooled to a room temperature, and is heated to a temperature above Tg point of the resin without applying pressure and then cooled. Then, a metal conductor 4 with an adhesive layer 5 is laminated, heated, and pressed.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、電子機器用の基板、特
に高周波領域での使用に好適な高周波回路用基板に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate for electronic equipment, and more particularly to a substrate for high frequency circuits suitable for use in a high frequency region.

【0002】[0002]

【従来の技術】最近の電子工業、通信工業で使用される
信号の周波数は、キロヘルツの領域から、メガヘルツや
ギガヘルツの領域まで拡がっている。一般に、高周波回
路用基板は信号速度の向上を図るためには、基板の比誘
電率εrを低くし、さらに損失を低減するために誘電正
接tanδを低くしたものが要求され、比誘電率εr
誘電正接tanδの低い誘電体としてポリテトラフルオ
ロエチレンやポリエチレンなどの樹脂をガラスクロスに
含浸させたものが用いられ、これに銅はくを積層させた
高周波用基板が一般的に使用されている。
2. Description of the Related Art The frequency of signals used in the recent electronics industry and communication industry has spread from the kilohertz region to the megahertz and gigahertz regions. In general, a high frequency circuit substrate is required to have a low relative dielectric constant ε r in order to improve the signal speed, and a low dielectric loss tangent tan δ in order to reduce loss. A glass cloth impregnated with a resin such as polytetrafluoroethylene or polyethylene is used as a dielectric material having a low r or a low dielectric loss tangent tan δ, and a high frequency substrate in which copper foil is laminated is generally used. There is.

【0003】ガラスクロスにポリテトラフルオロエチレ
ンを含浸させ、加熱加圧成形したポリテトラフルオロエ
チレン−ガラスクロス基板は、ポリテトラフルオロエチ
レンが高融点、低流動性であるため、その製造に高温度
で長時間の成形を要しコスト高となるという問題点があ
った。一方、ガラスクロスにポリエチレンを含浸させた
ポリエチレン−ガラスクロス基板はポリエチレンの融点
が低いため、はんだ耐熱性に劣る欠点があった。
A polytetrafluoroethylene-glass cloth substrate obtained by impregnating glass cloth with polytetrafluoroethylene and molding under heat and pressure is manufactured at high temperature because polytetrafluoroethylene has a high melting point and low fluidity. There is a problem that molding is required for a long time and the cost becomes high. On the other hand, the polyethylene-glass cloth substrate obtained by impregnating glass cloth with polyethylene has a drawback that the heat resistance of solder is poor because the melting point of polyethylene is low.

【0004】これらの欠点を改良するため、特開平3−
109791号公報及び、特開平3−109792号公
報において超高分子ポリエレンの多孔質シートと未硬化
の硬化性樹脂が含浸された樹脂含浸補強層を積層し、加
熱加圧して多孔質を消失させると同時に硬化性樹脂の硬
化を行う高周波回路用基板の製造方法が提案されてお
り、耐熱性の改良と成形加工の難点を克服した。
In order to improve these drawbacks, JP-A-3-
In Japanese Patent Application Laid-Open No. 109791 and Japanese Patent Application Laid-Open No. 3-109792, a porous sheet of ultra-high molecular polyethylene and a resin-impregnated reinforcing layer impregnated with an uncured curable resin are laminated, and heated and pressed to eliminate the porosity. At the same time, a method of manufacturing a substrate for a high frequency circuit has been proposed in which a curable resin is cured, and it has improved the heat resistance and overcomes the problems of molding.

【0005】[0005]

【発明が解決しようとする課題】特開平6−10979
1号公報及び特開平3−109792号公報に示される
方法は、高周波回路用基板の耐熱性と成形加工の難点が
改善されるものの、加熱、冷却後の寸法収縮が大きいと
いう問題点があった。本発明は、加熱、冷却後の寸法収
縮の小さい高周波回路用基板を提供するものである。
DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention
The methods disclosed in Japanese Patent Laid-Open No. 1-109792 and Japanese Patent Laid-Open No. 3-109792 improve the heat resistance of the high-frequency circuit board and the difficulty of molding, but have a problem of large dimensional shrinkage after heating and cooling. . The present invention provides a substrate for a high frequency circuit, which has a small dimensional shrinkage after heating and cooling.

【0006】[0006]

【課題を解決するための手段】本発明は、超高分子量ポ
リエチレンの多孔質シート1の両面に、繊維基材2に未
硬化の硬化性樹脂3を含浸した補強シートを重ね、加熱
加圧して未硬化の硬化性樹脂を硬化させ、室温まで冷却
後、加圧せずに硬化樹脂のTg点以上の温度まで再加熱
して冷却し、その後、接着剤層5を設けた付金属導体4
を積層し、加熱加圧することを特徴とする高周波回路用
基板の製造方法である(図1参照)。
According to the present invention, a reinforcing sheet obtained by impregnating an uncured curable resin 3 on a fiber base material 2 is placed on both sides of a porous sheet 1 of ultra high molecular weight polyethylene, and heated and pressed. After curing the uncured curable resin and cooling it to room temperature, it is reheated to a temperature not lower than the Tg point of the cured resin without being pressurized and cooled, and then the attached metal conductor 4 provided with the adhesive layer 5 is provided.
Is laminated and heated and pressed, which is a method for manufacturing a high-frequency circuit substrate (see FIG. 1).

【0007】超高分子量ポリエチレン多孔質シート中の
孔は、未硬化の硬化性樹脂が含浸された補強シート(以
下、プリプレグと称することがある)を積層し、これを
加熱加圧するときに、樹脂が浸透して消失すると同時に
一体化する。
The pores in the ultra high molecular weight polyethylene porous sheet are formed by laminating a reinforcing sheet impregnated with an uncured curable resin (hereinafter sometimes referred to as a prepreg), and heating and pressurizing the reinforcing sheet. Permeates and disappears, and at the same time becomes integrated.

【0008】次に、硬化させた基板を加圧せずに硬化性
樹脂のTg以上の温度まで加熱し、冷却する。その後接
着剤付金属導体層を更に両面に積層し、加熱加圧する。
本発明で用いる超高分子量ポリエチレン多孔質シートは
超高分子量ポリエチレン粉末粒子を焼結させ、粒子同志
士を融着により接合し、厚み0.5〜5mmのシートに
成形したものである。接合した粒子の外側には空気の連
続層が存在する。
Next, the cured substrate is heated to a temperature not lower than the Tg of the curable resin without being pressed and then cooled. After that, a metal conductor layer with an adhesive is further laminated on both sides and heated and pressed.
The ultra-high-molecular-weight polyethylene porous sheet used in the present invention is obtained by sintering ultra-high-molecular-weight polyethylene powder particles, joining the particles with each other by fusion bonding, and forming a sheet having a thickness of 0.5 to 5 mm. There is a continuous layer of air outside the bonded particles.

【0009】超高分子量ポリエチレンは、平均分子量1
00万〜500万のものがよく、例えば、ハイゼックス
ミリオン、ミペロン(三井石油化学工業株式会社の商品
名)、サンテック(旭化成工業株式会社の商品名)、H
OSTALEN,GUR(西独ヘキスト社の商品名)、
HIFLEX,1000(米国ハーキュレス社の商品
名)などが好適である。
Ultrahigh molecular weight polyethylene has an average molecular weight of 1
It is preferably from 1,000,000 to 5,000,000, for example, Hi-Zex Million, Miperon (trade name of Mitsui Petrochemical Industry Co., Ltd.), Suntec (trade name of Asahi Kasei Kogyo Co., Ltd.), H.
OSTALEN, GUR (trade name of Hoechst GmbH in Germany),
HIFLEX, 1000 (trade name of Hercules Company, USA) and the like are suitable.

【0010】超高分子量ポリエチレンの多孔質シートの
製造法としては、例えばフィルム、金属ベルトなどの基
材上に充填剤を混合した超高分子量ポリエチレンの粉末
粒子を供給し、これをロールやバーにより一定の厚みに
なるように賦形し、加熱炉に通し、粒子同士を加熱焼結
させて、超高分子量ポリエチレンの多孔質シートを連続
して成形する方法がある。超高分子量ポリエチレンの多
孔質シートの表面が平滑になるためには、超高分子量ポ
リエチレン粉末は、平均粒子径が0.001〜0.1m
mであるものが特に好ましい。
As a method for producing a porous sheet of ultrahigh molecular weight polyethylene, powder particles of ultrahigh molecular weight polyethylene prepared by mixing a filler on a base material such as a film or a metal belt are supplied, and the powder particles are fed by a roll or a bar. There is a method in which a porous sheet of ultra-high molecular weight polyethylene is continuously molded by shaping the particles into a uniform thickness, passing them through a heating furnace, and heating and sintering the particles. To make the surface of the porous sheet of ultra high molecular weight polyethylene smooth, the ultra high molecular weight polyethylene powder has an average particle size of 0.001 to 0.1 m.
Particularly preferred is m.

【0011】プリプレグとしては、印刷回路用基板の製
造に通常用いられているガラス布、ガラス不織布、プラ
スチック繊維の織布、不織布の補強基材に硬化性樹脂ワ
ニスを含浸乾燥させたものが挙げられる。含浸させる硬
化性樹脂としては、ポリエステル樹脂、エポキシ樹脂、
フェノール樹脂、メラミン樹脂、ジアリルフタレート樹
脂、ポリイミド樹脂、ビスマレイミド・トリアジン樹
脂、ポリフェニレンオキサイド樹脂又はポリフェニレン
スルフィドPPS樹脂と架橋性モノマーとの樹脂組成物
が挙げられる。これらの樹脂のうち、εrやtanδが
比較的低いポリエステル樹脂、エポキシ樹脂、ポリイミ
ド樹脂が好ましい。コストの面からエポキシ樹脂が更に
好ましい。プリプレグの使用量は50〜200g/m2
が好ましく、補強層の厚みは30〜200μmが好まし
い。
Examples of the prepreg include glass cloth, glass non-woven cloth, plastic fiber woven cloth, and non-woven cloth reinforcing material impregnated with a curable resin varnish and dried, which are usually used in the production of printed circuit boards. . As the curable resin to be impregnated, polyester resin, epoxy resin,
Examples thereof include a resin composition of a phenol resin, a melamine resin, a diallyl phthalate resin, a polyimide resin, a bismaleimide / triazine resin, a polyphenylene oxide resin or a polyphenylene sulfide PPS resin, and a crosslinkable monomer. Among these resins, polyester resins, epoxy resins, and polyimide resins having relatively low ε r and tan δ are preferable. Epoxy resin is more preferable in terms of cost. The amount of prepreg used is 50 to 200 g / m 2.
Is preferable, and the thickness of the reinforcing layer is preferably 30 to 200 μm.

【0012】接着剤付金属導体の金属は、銅、アルミニ
ウム、ニッケル、金、銀、白金等のはく又は板である。
接着剤としてはエポキシ樹脂、ポリエステル樹脂系の接
着剤であり、銅張積層板用の接着剤付銅はくが好まし
い。
The metal of the adhesive-attached metal conductor is a foil or plate of copper, aluminum, nickel, gold, silver, platinum or the like.
The adhesive is an epoxy resin or polyester resin adhesive, and a copper foil with an adhesive for a copper-clad laminate is preferred.

【0013】超高分子量ポリエチレンの多孔質シートと
プリプレグを加熱加圧するときの条件は、通常130〜
250℃、印加圧力2〜7.8MPa、印加時間20〜
120分で行われ、超高分子量ポリエチレン多孔質シー
ト、プリプレグ、離型フィルムを鏡板に挟み、均一な条
件で加熱加圧する。冷却後、離型フィルムを剥離して、
超高分子量ポリエチレンの多孔質シートとプリプレグが
硬化して一体化した基板を得る。
Conditions for heating and pressing the porous sheet of ultra high molecular weight polyethylene and the prepreg are usually 130 to
250 ° C., applied pressure 2 to 7.8 MPa, applied time 20 to
It is carried out for 120 minutes, and the ultrahigh molecular weight polyethylene porous sheet, the prepreg and the release film are sandwiched between the end plates and heated and pressed under uniform conditions. After cooling, peel off the release film,
A porous sheet of ultrahigh molecular weight polyethylene and a prepreg are cured to obtain an integrated substrate.

【0014】えられた基板を、硬化性樹脂のTg点以上
で15〜30分間加熱することにより加熱加圧によって
生じた歪みをなくす。次に、エポキシ樹脂系またはポリ
エステル樹脂系の銅張積層板用の接着剤付銅はくを歪み
をなくした基板の両面に積層し、130〜180℃、印
加圧力2〜7、8MPa、印加時間20〜120分で加
熱加圧して一体化する。
By heating the obtained substrate at a temperature not lower than the Tg point of the curable resin for 15 to 30 minutes, the strain caused by heating and pressing is eliminated. Next, an epoxy resin-based or polyester resin-based copper foil with an adhesive for a copper-clad laminate is laminated on both sides of a substrate without distortion, and the temperature is 130 to 180 ° C., the applied pressure is 2 to 7 and 8 MPa, and the application time is It is heated and pressed for 20 to 120 minutes to be integrated.

【0015】[0015]

【作用】本発明では、超高分子量ポリエチレンの多孔質
シートとプリプレグが加熱加圧することにより硬化して
できた基板の歪みを、硬化性樹脂のTg点以上の温度に
加熱することによって取り除くことができる。従って、
歪みを除いた基板はもう一度加熱冷却を行っても寸法が
収縮することがなくなる。
In the present invention, the distortion of the substrate formed by heating and pressing the ultrahigh molecular weight polyethylene porous sheet and the prepreg can be removed by heating the substrate to a temperature not lower than the Tg point of the curable resin. it can. Therefore,
The size of the strain-free substrate will not shrink even if it is heated and cooled again.

【0016】[0016]

【実施例】以下、本発明を実施例に基づいて詳細に説明
するが、本発明はこれに限定されるものではない。ミペ
ロンXM220(三井石油化学工業株式会社製の超高分
子量ポリエチレン商品名)を原料として多孔質ポリエチ
レンシートを以下に説明するようにして製造した。ミペ
ロンXM220は、平均粒子径0.03mm、融点13
6℃、嵩密度0.4g/cm3 、真密度0.94/cm
3 である。ミペロンXM220100重量部と、デクロ
ランプラス−25(1,2,3,4,7,8,9,1
0,13,13,14,14−ドデカクロロ−1,4,
4a,5,6,6a,7,10,10a,11,12,
12a−ドデカヒドロ−1,4,7,10−ジメタノジ
ベンゾノ(a,e)シクロオクテノンの米国オキシデン
タルケミカル社の商品名、塩素含有率65重量%、平均
粒子径0.003mm、嵩密度0.67g/cm3 、真
密度1.9g/cm3 、)100重量部とをミキサーに
より混合して、ステンレスベルト上に1.3mm厚みに
賦形し、180℃の加熱炉中で15分間加熱焼結を行
い、見かけ密度0.55g/cm3 の充填剤混合樹脂多
孔質シートを得た。
EXAMPLES The present invention will now be described in detail based on examples, but the present invention is not limited thereto. A porous polyethylene sheet was produced from Miperon XM220 (trade name of ultra high molecular weight polyethylene manufactured by Mitsui Petrochemical Co., Ltd.) as a raw material as described below. Miperon XM220 has an average particle size of 0.03 mm and a melting point of 13
6 ° C, bulk density 0.4 g / cm 3 , true density 0.94 / cm
Is 3 . 100 parts by weight of Miperon XM220 and dechlorane plus-25 (1, 2, 3, 4, 7, 8, 9, 1
0,13,13,14,14-dodecachloro-1,4,4
4a, 5, 6, 6a, 7, 10, 10a, 11, 12,
12a-dodecahydro-1,4,7,10-dimethanodibenzono (a, e) cyclooctenone, a trade name of US Occidental Chemical Company, chlorine content 65% by weight, average particle size 0.003 mm, bulk density 0.67 g / cm 3 , true density 1.9 g / cm 3 , and 100 parts by weight are mixed by a mixer and shaped into a 1.3 mm thickness on a stainless belt, and heated in a heating furnace at 180 ° C. for 15 minutes. Heat sintering was performed to obtain a filler-mixed resin porous sheet having an apparent density of 0.55 g / cm 3 .

【0017】このシートの両面に厚さ50μmのガラス
布に臭素化ビスフェノールA型エポキシ樹脂(Tg13
0℃)を含浸させたプリプレグ(樹脂分60重量%)を
介して厚さ38μmのトリアセテートフィルムを積層
し、ステンレス製の鏡板を用い、175℃、2MPaの
条件で、90分間加熱加圧後、加圧したまま冷却し、ト
リアセテートフィルムを剥がした。次に、140℃で3
0分間加熱炉で加熱し、室温に冷却した。その後、厚さ
35μmの電解銅はくにエポキシ樹脂系接着剤を40g
/m2 塗布した銅張積層板用エポキシ樹脂系接着剤付銅
はくを両面に積層し、ステンレス製の鏡板を用い、17
5℃、2MPaの条件で30分間加熱加圧し、厚さ0.
9mmの高周波回路用基板を得た。
A glass cloth having a thickness of 50 μm was coated on both sides of this sheet with a brominated bisphenol A type epoxy resin (Tg13).
(0 ° C.) through a prepreg impregnated with (resin content of 60% by weight), a triacetate film having a thickness of 38 μm is laminated, and a stainless steel end plate is used, and after heating and pressing for 90 minutes at 175 ° C. and 2 MPa, The triacetate film was peeled off by cooling while applying pressure. Then at 140 ° C for 3
It was heated in a heating furnace for 0 minutes and cooled to room temperature. After that, 40g of epoxy resin adhesive is applied to electrolytic copper foil with a thickness of 35 μm.
/ M 2 Coated copper foil with epoxy resin adhesive for copper-clad laminates is laminated on both sides and a stainless steel end plate is used.
It is heated and pressurized for 30 minutes under the conditions of 5 ° C. and 2 MPa, and the thickness is 0.
A 9 mm high frequency circuit substrate was obtained.

【0018】比較例1 実施例と同様にして充填剤混合樹脂多孔質シートを得、
このシートの両面に実施例と同じプリプレグを介して厚
さ35μmの電解銅はくを積層し、ステンレス製の鏡板
を用い、175℃、2MPaの条件で90分間加熱加圧
し、厚さ0.9mmの高周波回路用基板を得た。
Comparative Example 1 A filler-mixed resin porous sheet was obtained in the same manner as in the Example.
Electrolytic copper foil having a thickness of 35 μm was laminated on both sides of this sheet through the same prepreg as in the example, and a stainless steel end plate was used, and heated and pressed for 90 minutes under the conditions of 175 ° C. and 2 MPa to obtain a thickness of 0.9 mm. A high frequency circuit substrate of was obtained.

【0019】比較例2 比較例1で作成した基板を140℃、30分間加熱炉で
加熱し、室温に冷却し、厚さ0.9mmの高周波回路用
基板を得た。実施例、比較例1、2の基板について、ε
r,tanδ、寸法変化率、そり特性を調べた。εr,t
anδは、銅はくをエッチング除去し、12GHzの空
胴共振器法で測定した。
Comparative Example 2 The substrate prepared in Comparative Example 1 was heated in a heating furnace at 140 ° C. for 30 minutes and cooled to room temperature to obtain a high frequency circuit substrate having a thickness of 0.9 mm. For the substrates of Examples and Comparative Examples 1 and 2, ε
The r , tan δ, the dimensional change rate, and the warpage characteristics were examined. ε r , t
An δ was measured by a cavity resonator method at 12 GHz after removing the copper foil by etching.

【0020】そりは、330mm×250mmに切断し
た試料を定盤の上に静置し、定盤からのへだたりが最大
の部分を測定した。寸法変化率は、330mm×250
mmに切断した試料に、基準穴を四隅から10mm内側
に穴明けし、穴間距離を測定し、次に、銅はくをエッチ
ング除去し、140℃で20分間加熱し、室温に冷却
後、再び穴間距離を測定し、穴間距離の収縮量(単位長
さあたりの変位量)を測定し、寸法変化率を算出した。
その結果を表1に示す。
As for the sled, a sample cut into 330 mm × 250 mm was allowed to stand still on a surface plate, and the portion where the sag from the surface plate was the largest was measured. Dimensional change rate is 330mm x 250
In the sample cut into mm, the reference holes were drilled inward from the four corners by 10 mm, the distance between the holes was measured, and then the copper foil was removed by etching, heated at 140 ° C. for 20 minutes, and cooled to room temperature. The interhole distance was measured again, the shrinkage amount of the interhole distance (the displacement amount per unit length) was measured, and the dimensional change rate was calculated.
The results are shown in Table 1.

【0021】[0021]

【表1】 ────────────────────────────── 実施例 比較例1 比較例2 ────────────────────────────── εr 2.75 2.65 2.65 tanδ(×10-4) 70 65 65 寸法変化率(%) 0.04 0.12 0.05 そり(mm) 1.0 2.3 6.8 ──────────────────────────────[Table 1] ────────────────────────────── Example Comparative Example 1 Comparative Example 2 ──────── ────────────────────── ε r 2.75 2.65 2.65 tan δ (× 10 -4 ) 70 65 65 65 Dimensional change rate (%) 0 .04 0.12 0.05 Warp (mm) 1.0 2.3 6.8 ────────────────────────────── ─

【0022】[0022]

【発明の効果】本発明によれば、超高分子量ポリエチレ
ンの多孔質シートと硬化性樹脂のプリプレグを加熱加圧
することによって基板に生じた歪みを、硬化性樹脂のT
g点以上の温度に加熱することにより取り除き、その
後、接着剤付銅はくを加熱加圧して貼り合わせた基板と
しても寸法収縮が減少し、寸法安定性が良好な高周波回
路用基板を得ることができる。
According to the present invention, the strain generated in the substrate by heating and pressurizing the porous sheet of ultra-high molecular weight polyethylene and the prepreg of the curable resin is reduced by the T of the curable resin.
To obtain a high-frequency circuit board with good dimensional stability, in which dimensional shrinkage is reduced even when the copper foil with adhesive is removed by heating it to a temperature of point g or higher and then bonded by heating and pressurizing. You can

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の高周波回路用基板の構成を示す断面図
である。
FIG. 1 is a cross-sectional view showing a configuration of a high-frequency circuit substrate of the present invention.

【符号の説明】[Explanation of symbols]

1 超高分子量ポリエチレンの多孔質シート 2 繊維基材 3 硬化性樹脂 4 金属導体 5 接着剤層 1 Porous Sheet of Ultra High Molecular Weight Polyethylene 2 Fiber Substrate 3 Curable Resin 4 Metal Conductor 5 Adhesive Layer

─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成6年3月7日[Submission date] March 7, 1994

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0005[Name of item to be corrected] 0005

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0005】[0005]

【発明が解決しようとする課題】特開平−10979
1号公報及び特開平3−109792号公報に示される
方法は、高周波回路用基板の耐熱性と成形加工の難点が
改善されるものの、加熱、冷却後の寸法収縮が大きいと
いう問題点があった。本発明は、加熱、冷却後の寸法収
縮の小さい高周波回路用基板を提供するものである。
The object of the invention is to be Solved by Hei 3 -10979
The methods disclosed in Japanese Patent Laid-Open No. 1-109792 and Japanese Patent Laid-Open No. 3-109792 improve the heat resistance of the high-frequency circuit board and the difficulty of molding, but have a problem of large dimensional shrinkage after heating and cooling. . The present invention provides a substrate for a high frequency circuit, which has a small dimensional shrinkage after heating and cooling.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 B32B 27/32 Z 8115−4F H05K 1/03 J 7011−4E ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 6 Identification code Office reference number FI technical display location B32B 27/32 Z 8115-4F H05K 1/03 J 7011-4E

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 超高分子量ポリエチレンの多孔質シート
の両面に、繊維基材に未硬化の硬化性樹脂を含浸した補
強シートを重ね、加熱加圧して未硬化の硬化性樹脂を硬
化させ、室温まで冷却後、加圧せずに硬化樹脂のTg点
以上の温度まで再加熱して冷却し、その後、接着剤付金
属導体を積層し、加熱加圧することを特徴とする高周波
回路用基板の製造方法。
1. A reinforcing sheet in which an uncured curable resin is impregnated in a fiber substrate is placed on both sides of a porous sheet of ultra-high molecular weight polyethylene, and the uncured curable resin is cured by heating and pressing at room temperature. After cooling, the substrate is reheated to a temperature not lower than the Tg point of the cured resin without being pressed and cooled, and then a metal conductor with an adhesive is laminated and heated and pressed to produce a substrate for high frequency circuit. Method.
JP6029296A 1994-02-28 1994-02-28 Manufacture of substrate for high-frequency circuit Pending JPH07240578A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6029296A JPH07240578A (en) 1994-02-28 1994-02-28 Manufacture of substrate for high-frequency circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6029296A JPH07240578A (en) 1994-02-28 1994-02-28 Manufacture of substrate for high-frequency circuit

Publications (1)

Publication Number Publication Date
JPH07240578A true JPH07240578A (en) 1995-09-12

Family

ID=12272286

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6029296A Pending JPH07240578A (en) 1994-02-28 1994-02-28 Manufacture of substrate for high-frequency circuit

Country Status (1)

Country Link
JP (1) JPH07240578A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015074089A (en) * 2013-10-04 2015-04-20 三井化学東セロ株式会社 High-frequency substrate material
KR20210055022A (en) * 2019-11-06 2021-05-14 주식회사 아모그린텍 Heat radiation sheet, method for manufacturing thereof, and electronic device comprising the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015074089A (en) * 2013-10-04 2015-04-20 三井化学東セロ株式会社 High-frequency substrate material
KR20210055022A (en) * 2019-11-06 2021-05-14 주식회사 아모그린텍 Heat radiation sheet, method for manufacturing thereof, and electronic device comprising the same

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