JPH07210869A - Equipment for continuously producing magnetic tape - Google Patents

Abstract

PURPOSE:To obtain equipment for continuously producing a magnetic tape by vacuum-depositing a magnetic material on a substrate such as a plastic film or paper. CONSTITUTION:In equipment in which a substrate 11 is continuously carried in a vacuum chamber from a part in the air and a magnetic material is vacuum- deposited on the front side of the substrate 11 in the vacuum chamber to continuously produce a magnetic tape, a back coating part C for treating the rear side of the substrate and a top coating part D for treating the vacuum-deposited side of the substrate are arranged at the rear step of a vacuum deposition part A for vacuum-depositing the magnetic material on the substrate and sending the substrate to a part in the air.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to equipment for continuously producing magnetic tape by vacuum-depositing a magnetic material on a substrate such as paper or plastic film.

[0002]

2. Description of the Related Art Generally, a magnetic tape manufactured by a vacuum vapor deposition method includes a substrate 11 and an anchor coat layer 12 having a surface (deposited surface) of the substrate 11 coated with a treatment agent as shown in FIG. A magnetic layer 13 in which a magnetic material is vacuum-deposited on the anchor coat layer 12, a top coat layer 14 in which a lubricant is applied on the magnetic layer 13, and the substrate 11
The back coat layer 15 has a back surface coated with a treatment agent.

Conventionally, vacuum deposition for forming a magnetic layer on the substrate has been performed in a batch system. That is, a substrate wound in a coil shape in advance was loaded into a vacuum container, the interior of the vacuum container was evacuated to a pressure suitable for vapor deposition, and then the substrate was run and vapor deposited.

FIG. 5 shows an example of such a conventional vacuum vapor deposition apparatus. In the vapor deposition chamber 102, the electron gun 1
Crucible 10 by electron beam 107 emitted from 10
9 heats the magnetic material 108 and is sent from the winding roll 106 through the guide roll 103, and the cooling roll 10
After the magnetic material 108 is vapor-deposited on the surface of the substrate 101 passing over the surface 4, it is wound by a winding roll 105. The vapor deposition chamber 102 is subjected to vapor deposition by an exhaust pump unit 113 to a vacuum degree suitable for vapor deposition.

On the other hand, the layers other than the magnetic layer 13 shown in FIG. 4, that is, the anchor coat layer 12 and the back coat layer 15 are shown.
The same coating method using a coating roller is used for forming the top coat layer 14 and the top coat layer 14, and the top coat layer 14 is applied in a separate process under atmospheric pressure.

[0006]

By the way, as described above, a batch-type vacuum vapor deposition apparatus is employed for vacuum vapor deposition of a magnetic material on a substrate. Accordingly, before and after the vacuum vapor deposition, a batch type vacuum vapor deposition apparatus is used. Each process performed on the vapor-deposited film surface is performed in a different process.

For this reason, an unwinding and winding facility for the substrate and its associated equipment are required for each processing step, and a facility for transporting the substrate is required between each step. However, there were problems such as poor productivity and poor productivity.

[0008]

The structure of continuous magnetic tape manufacturing equipment of the present invention for solving the above-mentioned problems is such that a substrate is continuously carried into the vacuum chamber from the atmosphere, and the surface of the substrate is magnetized in the vacuum chamber. In a facility for continuously vapor-depositing a material and producing a magnetic tape, a back coater and a substrate vaporizer for treating the back surface of the substrate on the subsequent stage of a vacuum vapor deposition device that vaporizes the magnetic material and then carries it out into the atmosphere again. It is characterized in that a top coat device for treating the surface is arranged.

Further, in the above-mentioned structure, an anchor coat device for arranging a treatment on the vapor deposition surface side of the substrate before vapor deposition is arranged.

[0010]

The substrate successively passes through the vacuum vapor deposition device, the back coat device and the top coat device in succession, or the anchor coat device, the vacuum vapor deposition device, the back coat device and the top coat device in succession. During the process, the front and back surfaces of the substrate and the deposited film surface are sequentially processed.

[0011]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A preferred embodiment of a continuous magnetic tape manufacturing facility according to the present invention will be described below with reference to the drawings.

FIGS. 1 and 2 are block diagrams showing the construction of the continuous magnetic tape manufacturing facility of this embodiment, and FIG. 3 is a diagram showing the details of the essential parts thereof.

As shown in FIG. 1, in the first embodiment, a vapor deposition section A is provided, and a backcoat section C and a topcoat section D are provided in a row on the rear side thereof, and they are unwound to the front side thereof. Substrate 1 in which a part E and a winding part F are arranged on the rear side, and the surface of which is anchor-coated by a separate means in advance
No. 1 is fed from the unwinding section E and successively passes through each of the above-mentioned sections in succession, and is subjected to a predetermined treatment on the front and back surfaces and the vapor deposition film surface during one step thereof, and then is wound on the winding section F. It is supposed to be taken.

Further, as shown in FIG. 2, in the second embodiment, the anchor coat portion B is provided on the front side of the vapor deposition section A, and the back coat side is provided on the rear side of the vapor deposition section A as in the first embodiment. The coat section C and the top coat section D are arranged in a row, and the unwinding section E is arranged on the front side of these and the winding section F is arranged on the rear side thereof, and the substrate 11 sent out from the unwinding section E is the above-mentioned sections. Are successively passed through, and during one process, the front and back surfaces and the vapor-deposited film surface are subjected to a predetermined treatment and then wound up by the winding section F.

FIG. 3 shows an example of a device configuration between the unwinding section E, the anchor coat section B and the vapor deposition section A. As shown in the figure, the substrate 11 sent out from the unwinding section E is configured to continuously travel between each section (each device) via a plurality of guide rolls 3.

The operation of the present manufacturing facility will be described below with reference to FIGS. 3 and 1 and 2.

The substrate 11 wound around the coiler 20 is sent out from the unwinding portion E, and is first sent into the anchor coat chamber 34 of the anchor coat portion B through the guide roll 3 and then inside the container 32 in the same chamber. The anchor coating agent 31 is applied to the substrate surface through the scraping roll 33, and the drying chamber 40
After being dried inside, it is sent to the vapor deposition section A through the guide roll 3. In the vapor deposition section A, the substrate 11 is sent to the vapor deposition chamber 2 through a sealing device G composed of a plurality of seal rolls 14 and 15, and an electron beam emitted from an electron gun 10 in the same chamber kept at a predetermined vacuum degree. The vapor deposition material (magnetic material) 8 in the crucible 9 is heated by 7 and vacuum-deposited while passing through the cooling roll 4. Therefore, as shown in FIG. 4, the magnetic layer 13 is formed on the anchor coat layer on the surface of the substrate 11.

After this, the substrate 11 is similarly guided by the guide roller 3
To the back coat portion C of the next step to form a back coat layer 15 on the back surface, and then to the top coat portion D via a guide roller (not shown), and on the vapor deposition layer (magnetic layer) 13. After the top coat layer 14 is formed on the sheet, it is sent to the winding section F and wound up, but the device configurations of the back coat section C and the top coat section D are omitted.

[0019]

As described above in detail, according to the magnetic tape manufacturing equipment of the present invention, a back coat device and a top coat device are arranged in a row behind the vacuum vapor deposition device for vacuum depositing the magnetic material on the substrate surface. Alternatively, an anchor coater is provided on the front side of the vacuum evaporation apparatus, and a back coater and a top coater are provided on the rear side in the same manner as above, and the substrate is continuously and sequentially passed through each of these apparatuses, and Between,
Predetermined processing is performed on the front and back surfaces of the substrate and the vapor-deposited film surface, so one set of substrate unwinding and winding equipment and its ancillary equipment is required per production line, and there is also substrate transfer equipment between each device. It becomes unnecessary and the equipment cost is greatly reduced.
This has the effect of improving productivity.

[Brief description of drawings]

FIG. 1 is a block diagram of a magnetic tape manufacturing facility according to a first embodiment of the present invention.

FIG. 2 is a block diagram of a magnetic tape manufacturing facility according to a second embodiment of the present invention.

FIG. 3 is a diagram showing details of essential parts of a magnetic tape manufacturing facility according to the present invention.

FIG. 4 is a diagram showing a cross-sectional structure of a magnetic tape to which the present invention is applied.

FIG. 5 is a diagram showing a vacuum vapor deposition apparatus applied to a conventional magnetic tape manufacturing facility.

[Explanation of symbols]

 2 Vapor deposition chamber 3 Guide roll 4 Cooling roll 7 Electron beam 8 Vapor deposition material (magnetic material) A Vapor deposition portion B Anchor coat portion C Back coat portion D Top coat portion 11 Substrate 12 Anchor coat layer 13 Magnetic layer 14 Top coat layer 15 Back coat layer

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Kenji Shinya 4-6-22 Kannon Shinmachi, Nishi-ku, Hiroshima City, Hiroshima Prefecture Mitsubishi Heavy Industries, Ltd. Hiroshima Research Institute (72) Hajime Okita 4-chome, Kannon Shinmachi, Nishi-ku, Hiroshima Prefecture 6-22 No. 22 Hiroshima Research Laboratory, Mitsubishi Heavy Industries, Ltd.

Claims (2)

[Claims] 1. A facility for continuously loading a substrate from the atmosphere into a vacuum chamber, depositing a magnetic material on the surface of the substrate in the vacuum chamber, and continuously producing a magnetic tape, depositing the magnetic material. The continuous magnetic tape is characterized in that a back coat device for treating the back surface of the substrate and a top coat device for treating the vapor deposition surface of the substrate are arranged on the subsequent stage side of the vacuum vapor deposition device that is carried out again into the atmosphere. production equipment. 2. The continuous magnetic tape manufacturing facility according to claim 1, wherein an anchor coat device for treating the deposition surface side of the substrate before deposition is arranged in front of the vacuum deposition device. Continuous magnetic tape manufacturing equipment.