JPS6184367A - Formation of organic thin film - Google Patents
Formation of organic thin filmInfo
- Publication number
- JPS6184367A JPS6184367A JP20617984A JP20617984A JPS6184367A JP S6184367 A JPS6184367 A JP S6184367A JP 20617984 A JP20617984 A JP 20617984A JP 20617984 A JP20617984 A JP 20617984A JP S6184367 A JPS6184367 A JP S6184367A
- Authority
- JP
- Japan
- Prior art keywords
- film
- electron beam
- vapor
- vacuum
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は１例えばプラスチックフィルムやプラスチック
シートのような基材の表面に有機薄膜を形成する方法に
関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for forming an organic thin film on the surface of a substrate such as a plastic film or sheet.
従来の技術
最近、プラスチックフィルムのような高温で処理するこ
とができないものの表面硬化処理等に電子ビーム硬化樹
脂のコーティングが多く利用されるようになってきてい
る。ところで、従来用いられてきたコーティング法は、
オリゴマーに溶剤やモノマーを混入して粘性を低下させ
、こうして得たものを基材表面に塗布した後、乾燥させ
、そして電子ビーム照射処理を行なって硬化させること
から成っている。BACKGROUND OF THE INVENTION Recently, electron beam curing resin coatings have been increasingly used for surface hardening of materials such as plastic films that cannot be processed at high temperatures. By the way, the conventionally used coating method is
The method consists of mixing the oligomer with a solvent or a monomer to lower its viscosity, applying the resulting product to the surface of the substrate, drying it, and curing it by performing an electron beam irradiation treatment.
また金紙や銀紙のような装飾用プラスチック製品では。Also in decorative plastic products such as gold paper and silver paper.
透明のプラスチック基材上にＡｔやＯｒ等の金属の薄膜
を真空蒸着法やスｉＲツタリング法によって形成し、そ
の後上述のような方法によって有機保護膜を形成してい
る。また一部の用途には基材と金属薄膜との密着性を向
上させたり、光沢や色調を調節する目的で予じめ基材表
面に有機膜を形成した後金属膜を形成する場合もあり、
さらにその表面に再度有機膜を形成するＳ会もある。A thin film of metal such as At or Or is formed on a transparent plastic substrate by a vacuum evaporation method or an SiR tuttering method, and then an organic protective film is formed by the method described above. In some applications, an organic film is first formed on the surface of the base material and then a metal film is formed in order to improve the adhesion between the base material and the thin metal film, or to adjust the gloss or color tone. ,
Furthermore, there is also an S group that forms an organic film on the surface again.
このような場合には上述のような従来の方法では大気中
で行なう塗布工程と真空中で行なう金属膜形成工程とを
一回以上行なう必要があり、量産性が悪いという問題が
ある。また従来の方法では有機溶剤を用いるので引火性
や毒性があり、火災や公害等の危険性が高い。さらにま
た従来の方法では薄い膜を均一に形成するのが困難であ
るという欠点がある。In such a case, the above-mentioned conventional method requires performing the coating step in the atmosphere and the metal film forming step in vacuum at least once, which poses a problem of poor mass productivity. Furthermore, since conventional methods use organic solvents, they are flammable and toxic, and pose a high risk of fire and pollution. Furthermore, conventional methods have the disadvantage that it is difficult to uniformly form thin films.
発明が解決しようとする問題点
そこで本発明は、従来の方法における（ハ有機溶剤の使
用に伴なう引火性や毒性の問題、（２）均一な薄膜形成
の困難な点、および（３）量産性の悪い点を解消できる
有機薄膜の新規な形成法を提供することにある。Problems to be Solved by the Invention Therefore, the present invention solves the following problems in conventional methods: (c) flammability and toxicity problems associated with the use of organic solvents; The object of the present invention is to provide a new method for forming organic thin films that can overcome the disadvantages of mass production.
問題点を解決するための手段
上記目的を達成するために１本発明による有機薄膜の形
成法は、真空中で基材表面に電子ビーム硬化樹脂のオリ
ゴマーやモノマーを蒸着させた後。Means for Solving the Problems In order to achieve the above objects, a method for forming an organic thin film according to the present invention is to deposit oligomers or monomers of an electron beam cured resin on the surface of a substrate in a vacuum.
電子ビーム照射処理によって硬化させることから成るこ
とを特徴としている。It is characterized by being cured by electron beam irradiation treatment.
本発明による方法において用いることのできる電子ビー
ム硬化樹脂のオリゴマーとしてはエポキシアクリレート
、ウレタンアクリレート、ポリエステルアクリレート、
ポリエーテルアクリレート。Examples of oligomers of electron beam curable resins that can be used in the method according to the present invention include epoxy acrylate, urethane acrylate, polyester acrylate,
Polyether acrylate.
ポリオールアクリレート、メラミンアクリレート。Polyol acrylate, melamine acrylate.
不飽和ポリエステル等を用いるととができ、ま友各種の
アクリレートやメタクリレートのモノマーを使用するこ
ともできる。しかし蒸着の容易さや硬化速度の点から好
ましくはオリゴマーが用いられ得る。Unsaturated polyester or the like can be used, and various acrylate or methacrylate monomers can also be used. However, oligomers can be preferably used from the viewpoint of ease of vapor deposition and curing speed.
作用
以上のように構成することによって本発明の方法におい
ては、電子ビームによる硬化はオリゴマーやモノマーの
みで硬化させることができ、紫外線硬化樹脂のように光
重合開始剤を添加する必要がなく、従って蒸着過程が容
易である。また硬化時間も７秒以下と極めて速いので長
尺フィルム等の表面保護膜の形成には特に有利である。Effect By having the above structure, in the method of the present invention, curing using an electron beam can be performed using only oligomers or monomers, and there is no need to add a photopolymerization initiator unlike ultraviolet curable resins. The deposition process is easy. Furthermore, since the curing time is extremely fast at 7 seconds or less, it is particularly advantageous for forming surface protective films on long films and the like.
さらに全て真空中で行なわれるので電子ビームの発生装
置も容易に設けることができ、またゴミの混入も防止で
きる。Furthermore, since everything is carried out in a vacuum, an electron beam generator can be easily installed, and contamination by dust can also be prevented.
ま九本発明の方法においては、蒸発源を多数個用いて、
２種以上のオリゴマーやモノマーを蒸発させ、これらの
混合物や多層構造の蒸着物を得ることもできる。In the method of the present invention, a large number of evaporation sources are used,
It is also possible to evaporate two or more types of oligomers or monomers to obtain a mixture thereof or a deposited product having a multilayer structure.
さらに本発明による方法では、電子線照射時に。Furthermore, in the method according to the invention, during electron beam irradiation.
適当なマスクを用いるか走査型電子線で図形を描画する
方法を用いることによってＩＯ用レジスト。IO resist by using a suitable mask or by drawing a figure with a scanning electron beam.
層間絶縁膜、ＩＯ用コンデンサ等の形成にも用いること
ができる。It can also be used to form interlayer insulating films, IO capacitors, etc.
実施例
以下添附図面を参照して本発明の方法を実施している装
置の一例について説明する。EXAMPLE An example of an apparatus implementing the method of the present invention will be described below with reference to the accompanying drawings.
図示装置は二つの真空容器／、−２を有し、真空容器ｌ
は金属を蒸着するのに用いられ、一方、真空容器コは本
発明に従って有機薄膜を形成するのに用いられ、そして
両工程を連続して実施できるように構成されている。す
なわち図面において処理すべきプラスチックフィルム３
は真空容器ｌ内に設けられた巻き出しローラーｌと真空
容器λ内に設けられた巻き取りローラーｊとの間で搬送
され、ｔ、７はそれぞれ冷却キャン、！、りは案内ロー
ラー、１０け両真空容器ｌ１．２間の仕切壁ｌ／に設け
られたプラスチックフィルム３の通路開口である。また
各真空容器／、２内は図示し友ように各組合さった冷却
キャンＪ、７に対向してそれぞれ電子ビーム蒸発源７．
２および樹脂オリゴマー蒸発源／３が設けられている。The illustrated device has two vacuum vessels /, -2, vacuum vessels l
The vacuum vessel is used to deposit metals, while the vacuum vessel is used to form organic thin films in accordance with the present invention, and is configured to perform both steps sequentially. i.e. the plastic film 3 to be processed in the drawing
is transported between an unwinding roller l provided in a vacuum container l and a take-up roller j provided in a vacuum container λ, and t and 7 are cooling cans, !, respectively. , is the guide roller and the passage opening in the plastic film 3 provided in the partition wall l/ between the two vacuum vessels l1.2. The inside of each vacuum vessel J, 2 is shown as an electron beam evaporation source 7, facing each combined cooling can J, 7.
2 and a resin oligomer evaporation source/3 are provided.
また真空容器λには電子ビーム銃／μが組合され、電子
ビームを真空容器コ内の冷却キャン７に沿って走行する
フィルム３（（向って照射できるようにされている。さ
らに図示したように各真空容器ｌ１．２はそれぞれ排気
口／ａ 、ｊａを介して図示してない排気系に接続され
る。Further, an electron beam gun/μ is combined with the vacuum container λ, and the electron beam can be irradiated toward the film 3 (() which travels along the cooling can 7 inside the vacuum container. Each vacuum container l1.2 is connected to an exhaust system (not shown) via an exhaust port /a, ja, respectively.
このように構成した装置の動作において、真空容器ｌ内
で行々われる金鵜膜の蒸着は本発明には直接関係ないが
、電子ビーム蒸発源！２の作動によって例えばアルミニ
ウム膜を蒸着されたプラスチックフィルム３は案内ｐ−
ラーｔ１通路開口ＩＯおよび案内ローラータを通って冷
却キャン７の周囲に沿って走行する。蒸発源／３よりオ
リゴマーを蒸発させ、冷却キャン７に沿って走行するフ
ィルム３上に蒸発物を蒸着させる。この場合蒸発速度は
使用するオリゴマー（或いはモノマー）によって異なる
のでそれらを考慮しながら蒸発源／３の温度を制御して
調節する。こうしてプラスチックフィルム３上に蒸発物
を所定の厚さに蒸着させた後、電子ビーム銃１４ｔから
発生される電子ビ−ムを照射し、硬化処理が行なわれる
。In the operation of the apparatus configured as described above, the deposition of gold cormorant film performed in the vacuum container l is not directly related to the present invention, but it is an electron beam evaporation source! 2, the plastic film 3 on which, for example, an aluminum film has been vapor-deposited is guided p-
The roller t1 runs along the circumference of the cooling can 7 through the passage opening IO and the guide roller. The oligomer is evaporated from the evaporation source /3, and the evaporated material is deposited on the film 3 running along the cooling can 7. In this case, since the evaporation rate differs depending on the oligomer (or monomer) used, the temperature of the evaporation source/3 is controlled and adjusted while taking these factors into consideration. After the evaporated material is deposited on the plastic film 3 to a predetermined thickness, it is irradiated with an electron beam generated from the electron beam gun 14t to perform a curing process.
々お図示装置においては、真空容器λ内でまずプラスチ
ックフィルム３に樹脂膜を形成した後。In the illustrated apparatus, a resin film is first formed on the plastic film 3 in a vacuum container λ.
真空容器／内でアルミニウム等の金属膜を形成し。A metal film such as aluminum is formed inside a vacuum container.
その上に再度有機膜を形成するように動作することもで
きさらにこれらの多層膿を形成するようにすることもで
きる。ま７’（図示装置を変形して各成膜層の処理を順
に配列された各処理室内で連続して順次処理できるよう
にインライン式に構成することも可能である。It is possible to operate to form an organic film thereon again, and further to form these multilayered pus. (7') It is also possible to modify the illustrated apparatus to configure it in an in-line manner so that each film formation layer can be processed continuously and sequentially in each processing chamber arranged in sequence.
次に図示装置を用いてポリエステルフィルム上にアルミ
ニウムを蒸着し、その表面に有機膜を形成した実験例に
ついて説明する。Next, an experimental example will be described in which aluminum was vapor-deposited on a polyester film using the illustrated apparatus and an organic film was formed on the surface thereof.
基材 ：厚さ７２μｍのポリエステルフィルム
樹脂オリゴマー：エポキシアクリレート（昭和高分子（
株）ＶＲ−タＯ）
樹脂蒸着膜厚： ｏ３μｍ
真 空 度： ６，７ Ｘ ／ ００−３Ｐフィル
ム走行速度： ／ Ｉｎ／ｒｎｌｎ電子線照射＝ｔｏ
Ｋｖ、ｔθｍＡ 、 ／ ｓｅｅ以上のような条件でポ
リエステルフィルム上に２００Ａの厚さにアルミニウム
を蒸着し友半透明膜の表面に有様膜を形成し、その膜硬
度を試験したところエンピッ硬度試験（荷重ＪＯＯｆ）
で２Ｈであった。一方、有機膜を形成する前のアルミニ
ウム膜の硬度は３Ｂであった。このことから本発明によ
る方法によって形成した有機膜は保護膜として七分機能
し得ることが認められる。Base material: 72 μm thick polyester film Resin oligomer: Epoxy acrylate (Showa Kobunshi)
VR-TaO Co., Ltd.) Resin vapor deposition film thickness: o3μm Vacuum degree: 6,7X / 00-3P film running speed: / In/rnln electron beam irradiation = to
Kv, tθmA, / see Aluminum was evaporated to a thickness of 200A on a polyester film to form a shaped film on the surface of the semi-transparent film, and the film hardness was tested. Load JOOf)
It was 2H. On the other hand, the hardness of the aluminum film before forming the organic film was 3B. This indicates that the organic film formed by the method of the present invention can function as a protective film.
効 果
以上説明］７てきたように１本発明の方法は真空工程で
あるので、金属層を形成する工程と同一の装置により有
機膜を連続して形成することができ。[Effects explained above] 7 As mentioned above, since the method of the present invention is a vacuum process, the organic film can be continuously formed using the same equipment as the process for forming the metal layer.
生産性を大幅に向上させることができ、′また極めて薄
い膜を均一に形成することができる。さらにＭ機溶剤を
用いずしかも真空容器内で処理するので引火や公害等の
危１怜がなく、シかもサミ等の異物の混入を防ぐことが
できる。Productivity can be greatly improved, and extremely thin films can be formed uniformly. Furthermore, since no M solvent is used and the treatment is carried out in a vacuum container, there is no risk of ignition or pollution, and the contamination of foreign substances such as chicks and snails can be prevented.
図面は本発明を実施している装置の一例を示す概略断面
図である。
図中、、２：Ｘ空容器、３：基拐、／３：蒸発源。
／≠：電子ビーム発生源。The drawing is a schematic cross-sectional view showing an example of an apparatus implementing the present invention. In the figure, 2: X empty container, 3: base, /3: evaporation source. /≠: Electron beam source.
Claims (1)
モノマーを蒸着し、そして電子ビームを照射して硬化さ
せることから成ることを特徴とする有機薄膜の形成法。A method for forming an organic thin film, which comprises depositing an oligomer or monomer of an electron beam-curable resin on the surface of a substrate in vacuum, and curing the resin by irradiating it with an electron beam.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20617984A JPS6184367A (en) | 1984-10-03 | 1984-10-03 | Formation of organic thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP20617984A JPS6184367A (en) | 1984-10-03 | 1984-10-03 | Formation of organic thin film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6184367A true JPS6184367A (en) | 1986-04-28 |
Family
ID=16519119
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20617984A Pending JPS6184367A (en) | 1984-10-03 | 1984-10-03 | Formation of organic thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6184367A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0270656A1 (en) * | 1986-06-23 | 1988-06-15 | Spectrum Control Inc | Vapour deposition of monomer fluids. |
| US5097800A (en) * | 1983-12-19 | 1992-03-24 | Spectrum Control, Inc. | High speed apparatus for forming capacitors |
| JP2005319807A (en) * | 1995-04-06 | 2005-11-17 | Three M Innovative Properties Co | Sheet material coated with acrylic acid ester polymer release layer and manufacturing method of it |
| JP2009097043A (en) * | 2007-10-18 | 2009-05-07 | Ulvac Japan Ltd | Resin substrate equipped with decorative metallic film protected by protective film and method of laminating decorative metallic film on the resin substrate |
| CN113354995A (en) * | 2021-05-07 | 2021-09-07 | 中至商贸(杭州)有限公司 | Preparation process of self-cleaning vacuum film |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5226382A (en) * | 1975-08-22 | 1977-02-26 | Bosch Gmbh Robert | Process for forming protective layer on surface of optical reflector |
-
1984
- 1984-10-03 JP JP20617984A patent/JPS6184367A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5226382A (en) * | 1975-08-22 | 1977-02-26 | Bosch Gmbh Robert | Process for forming protective layer on surface of optical reflector |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5097800A (en) * | 1983-12-19 | 1992-03-24 | Spectrum Control, Inc. | High speed apparatus for forming capacitors |
| EP0270656A1 (en) * | 1986-06-23 | 1988-06-15 | Spectrum Control Inc | Vapour deposition of monomer fluids. |
| JP2005319807A (en) * | 1995-04-06 | 2005-11-17 | Three M Innovative Properties Co | Sheet material coated with acrylic acid ester polymer release layer and manufacturing method of it |
| JP2009097043A (en) * | 2007-10-18 | 2009-05-07 | Ulvac Japan Ltd | Resin substrate equipped with decorative metallic film protected by protective film and method of laminating decorative metallic film on the resin substrate |
| CN113354995A (en) * | 2021-05-07 | 2021-09-07 | 中至商贸(杭州)有限公司 | Preparation process of self-cleaning vacuum film |
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