JPH01212763A - Continuous type vacuum deposition device - Google Patents

Abstract

PURPOSE:To stably produce a vapor deposited product having no flaws by providing a connecting chamber between a multi-stage vacuum sealing part and the outside part under the atmospheric pressure and supplying a cleaning gas of the pressure higher than the atmospheric pressure to the connecting chamber. CONSTITUTION:A material 2 which is to be deposited by evaporation and is un-coiled from an un-coiler 1 is carried to the connecting chamber 3 where the pressure slightly higher than the atmospheric pressure is maintained. The material is heated and dehydrated by the heated clean gas in said chamber and is introduced through several stages of the vacuum sealing chambers 6 constituted of plural sealing rolls 5 into a vacuum deposition chamber 7. While the material 2 is wound around a cooling drum 8 in said chamber, said material is passed through the chamber and the vapor 10 deposited by evaporation from a crucible 9 is deposited by evaporation on one face. The material is again passed through several stages of the vacuum sealing chambers 6 and the connecting chamber 3 and is taken up on a coiler 12. The vapor deposited product which has no flaws at all by dust is thereby stably obtd.

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a continuous vacuum evaporation apparatus, and more particularly, to a continuous vacuum evaporation apparatus,
Non-metallic processed materials such as fibers, glass or plastics, gold plate materials, non-metallic materials (including ceramics) 1
- Concerning an apparatus for continuous vapor deposition under vacuum.

[Conventional technology]

Conventionally, plastic films such as polyester A
The vacuum evaporation equipment that evaporates the coiled film in a vacuum chamber while unwinding it, winds it up with a winder, and when one coil evaporation work is completed, the vacuum chamber is opened to the atmosphere and a new coiled film is deposited. Work is being carried out to charge the material, create a vacuum, and perform vapor deposition.

[Problem to be solved by the invention]

The above-mentioned vapor deposition method is said to be a batch method, and since this method involves unwinding and winding in a vacuum chamber, problems such as scratches on the vapor-deposited surface due to dust may occur unless there is dust in the vacuum chamber. Although this does not occur, there was a problem that the work efficiency was low because it was a batch method.

Therefore, attempts have been made to continuously vacuum deposit metallic and nonmetallic materials onto nonmetallic materials.
The following problems occur in continuous vacuum deposition.

■ When vapor deposition is performed using a continuous vacuum device in which non-gold bullion-based materials are led from the atmosphere into a vacuum deposition tank, where they are deposited and then taken out into the atmosphere again, the amount of air in the atmosphere is removed when the materials are introduced into the vacuum device. Since air is sucked in, a problem arises in that dust in the air adheres to the seal roll of the vacuum sealing device and stains the deposition surface.

■ When non-metallic materials are introduced from the atmosphere into a vacuum deposition tank, non-metallic materials, such as plastic films, contain or have moisture attached to them. This causes problems such as meandering in the movement of the processed material and defects such as wrinkles in the vapor deposition material.

In view of the above-mentioned state of the art, it is an object of the present invention to provide a continuous vacuum evaporation apparatus which eliminates the above-mentioned defects when performing continuous vacuum evaporation on non-metallic processed materials.

[Means to solve the problem]

In order to achieve the above-mentioned object, the present invention provides a space between the outside under atmospheric pressure where the non-metallic material to be treated is installed and the multi-stage vacuum seal section of the continuous vacuum evaporation apparatus. - Provide a communication chamber maintained at a high pressure (a pressure several orders of magnitude higher underwater than atmospheric pressure is sufficient), and use purified air or inert gas (hereinafter referred to as clean gas) or gas in the communication chamber. It is designed to heat and supply clean gas. The clean gas can be circulated through the vacuum evacuation system of the multi-stage vacuum seal section, which can particularly improve the economic efficiency of the equipment. It may also be directly heated indoors using a heating roll.

In addition, in addition to this, it is also a preferable embodiment to install a gas purification device in the clean gas circulation path to produce ff clean gas containing impurities and recirculate it69. Before applying the vapor deposition process to the processed material, for example, the material is cooled with a cooling roll and supplied to the cooling drum of the vapor deposition section, so that when the material is received in the vapor deposition section, there are no problems such as wrinkles or breakage due to heat. It is also a preferable embodiment to prevent this from occurring.

[Effect]

Since the continuous vacuum evaporation apparatus of the present invention is constructed as described above, clean gas is ejected into the atmosphere from the communication chamber maintained at a pressure higher than atmospheric pressure, so that the vacuum sealing apparatus is exposed to the atmosphere. There is no risk of dust being introduced.

In addition, since clean gas is heated and used, or the non-metallic material to be treated is heated with a heating roll, moisture contained in or attached to the material to be treated is removed before vapor deposition, so the material to be treated is heated. During vapor deposition, defects such as meandering and wrinkles are eliminated.

Furthermore, since the clean gas can be recycled, the operating cost of the device can be significantly reduced.

〔Example〕

The following is a part of the present invention. lJ' will be explained based on FIG. FIG. 1 shows a continuous vacuum system.

The material to be evaporated 2 uncoiled by the uncoiler 1 has a pressure lower than atmospheric pressure? The particles are transported to a communication chamber 3 maintained at a high pressure, where they are heated and dehydrated using heated clean gas 4, and then guided to a deposition chamber 7 through several stages of vacuum sealing chambers 6 consisting of a plurality of sealing rolls 5. , while the material 1 is being wrapped around a cold E-drum 8 and passing through it, vapor 10 is vapor-deposited from the crucible 9 on one side, and the material 1 is vapor-deposited again after passing through the vacuum sealing chamber 6 and the communication chamber 3.
1 is wound around a coiler 12.

Vacuum is created by a vacuum pump 13 connected to each vacuum seal chamber 6 and deposition chamber 7. When the clean gas 4 supplied to the communication chamber 3 is atmospheric air, it is taken in through an intake port 14, dust is removed by a filter 15, and then supplied by a blower 16. When heating this air, the heat exchanger 17 heats it by 7IO and supplies it. Pressure P of clean gas 4 in communication room 3
, is measured by a pressure gauge 18 and the valve at the intake port 14 is controlled so that the pressure is always several inches higher underwater than atmospheric pressure. By doing so, the clean gas 4 constantly flows out of the atmosphere from the gap 19 where the communication chamber 5 is connected to the outside air, and sucks the atmosphere to prevent dust from entering. In addition, when using inert gas 4 as the clean gas, vacuum pump 1
The gas exhausted from the chamber 3 is sent to the gas refiner 20, where the dew point is adjusted, oxygen is removed, and the gas is recirculated to the communication chamber 3.

When the material to be deposited 2 heated in the communication chamber 3 needs to be cooled before vapor deposition, it is preferable to cool it with the cooling roll 21 and the cooling drum 8 to avoid wrinkles or breakage due to the heat received during vapor deposition. .

In this way, scratches caused by dust are prevented, and by removing moisture, the tension imbalance that causes wrinkles due to moisture (outgas) from the material to be deposited 2 generated during vapor deposition is eliminated, and at the same time, the final Stable steaming 4IIi as it prevents the stage vacuum from deteriorating! Goods can be obtained.

Alternatively, as shown in FIG. 2, a heating roll 30 may be provided in the communication chamber 3 to directly heat the material 2 to be vapor-deposited to remove moisture from the material 2 to be vapor-deposited. Note that in FIG. 2, the same reference numerals as in FIG. 1 indicate the same parts as in FIG. 1.

〔Effect of the invention〕

1) A vacuum-deposited product with no scratches caused by II dust can be obtained.

2) When an inert gas is used via the gas alkaline device ffi, the amount of inert gas consumed can be reduced by circulating it.

3) The heated clean gas removes moisture adhering to or adsorbed on the material to be evaporated to prevent wrinkles or meandering of the material to be evaporated that occur during evaporation or due to tension fluctuations, and at the same time, the degree of vacuum is increased and stabilized. There are effects such as the ability to obtain vapor-deposited products.

[Brief explanation of the drawing]

1 and 2 are schematic diagrams of an embodiment of a continuous vacuum evaporation apparatus of the present invention.

Claims (1)

[Scope of Claims] 1. In a continuous vacuum evaporation apparatus in which a evaporation substrate is introduced from the outside under atmospheric pressure into a evaporation chamber through a multistage vacuum sealing section, and then sent out again under atmospheric pressure through a multistage vacuum sealing section. , a continuous vacuum evaporation apparatus characterized in that a communication chamber is provided between the multi-stage vacuum seal section and the outside under atmospheric pressure, and a clean gas at a pressure higher than atmospheric pressure is supplied to the communication chamber. . 2. Claim 1, characterized in that the clean gas is circulated through a vacuum exhaust system of the multi-stage vacuum seal section.
Continuous vacuum evaporation apparatus described. 3. The continuous vacuum evaporation apparatus according to claim 1 or 2, further comprising means for heating the clean gas to a high temperature. 4. The continuous vacuum evaporation apparatus according to claim 1, wherein the communication chamber is provided with a heating roll for the material to be processed. 5.Claim 4, characterized in that the clean gas is circulated via the vacuum exhaust system of the multi-stage vacuum seal section.
Continuous vacuum evaporation apparatus described.