JPH07197001A - Anisotropically conductive thermosetting adhesive - Google Patents
Anisotropically conductive thermosetting adhesiveInfo
- Publication number
- JPH07197001A JPH07197001A JP33726093A JP33726093A JPH07197001A JP H07197001 A JPH07197001 A JP H07197001A JP 33726093 A JP33726093 A JP 33726093A JP 33726093 A JP33726093 A JP 33726093A JP H07197001 A JPH07197001 A JP H07197001A
- Authority
- JP
- Japan
- Prior art keywords
- insulating resin
- conductive particles
- particles
- adhesive
- anisotropic conductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29499—Shape or distribution of the fillers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/81—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
- H01L2224/8119—Arrangement of the bump connectors prior to mounting
- H01L2224/81191—Arrangement of the bump connectors prior to mounting wherein the bump connectors are disposed only on the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/8319—Arrangement of the layer connectors prior to mounting
- H01L2224/83193—Arrangement of the layer connectors prior to mounting wherein the layer connectors are disposed on both the semiconductor or solid-state body and another item or body to be connected to the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
- H01L2224/838—Bonding techniques
- H01L2224/8385—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester
- H01L2224/83851—Bonding techniques using a polymer adhesive, e.g. an adhesive based on silicone, epoxy, polyimide, polyester being an anisotropic conductive adhesive
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/06—Polymers
- H01L2924/078—Adhesive characteristics other than chemical
- H01L2924/0781—Adhesive characteristics other than chemical being an ohmic electrical conductor
- H01L2924/07811—Extrinsic, i.e. with electrical conductive fillers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/30—Assembling printed circuits with electric components, e.g. with resistor
- H05K3/32—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
- H05K3/321—Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、例えばTAB(Tap
e Automated Bonding)と液晶ディ
スプレイなど高ファインピッチの接続に用いられる熱硬
化型異方性導電性接着剤、特に再生可能な熱硬化型異方
性導電性接着剤に関する。BACKGROUND OF THE INVENTION The present invention relates to, for example, TAB (Tap).
(e) Automated Bonding) and a thermosetting anisotropic conductive adhesive used for high-fine-pitch connection such as a liquid crystal display, and particularly to a regenerable thermosetting anisotropic conductive adhesive.
【0002】[0002]
【従来の技術】一般に液晶ディスプレイ装置において
は、例えば図3に示すように、液晶ディスプレイ本体1
1の周辺に導出された端子12に対し、導電粒子13を
含む異方性導電性接着剤14を用いて複数のTAB15
の端子16が電気的に接続されている。この場合、異方
性導電性接着剤14の絶縁性接着剤物質17としては、
熱可塑性のものでは電気的な接続信頼性に欠けることか
ら、最近は主として熱硬化型のものが用いられている。
熱硬化型の異方性導電性接着剤14を用いれば、耐熱性
や耐湿性が向上するが、その反面、新たな問題が発生す
る。すなわち、通常、液晶ディスプレイ本体11とTA
B15とを接続する際には数多くのTAB15を液晶デ
ィスプレイ本体11に圧着するため、位置合わせのずれ
などにより接続不良を生ずる場合がある。このような場
合には液晶ディスプレイ本体11からTAB15を剥離
し、さらに端子部に残存した熱硬化型の異方性導電性接
着剤14を除去して、再度熱硬化型の異方性導電性接着
剤14を用いてその液晶ディスプレイ本体11とTAB
15とを接続する必要がある。2. Description of the Related Art Generally, in a liquid crystal display device, as shown in FIG.
1. A plurality of TABs 15 are formed by using an anisotropic conductive adhesive 14 containing conductive particles 13 with respect to the terminals 12 led out around 1.
The terminal 16 of is electrically connected. In this case, as the insulating adhesive substance 17 of the anisotropic conductive adhesive 14,
Thermosetting resins are mainly used in recent years because they lack electrical connection reliability.
If the thermosetting anisotropic conductive adhesive 14 is used, heat resistance and moisture resistance are improved, but on the other hand, a new problem occurs. That is, normally, the liquid crystal display body 11 and the TA
When connecting to B15, a large number of TABs 15 are pressure-bonded to the liquid crystal display body 11, so that a connection failure may occur due to misalignment or the like. In such a case, the TAB 15 is peeled off from the liquid crystal display body 11, the thermosetting anisotropic conductive adhesive 14 remaining on the terminals is removed, and the thermosetting anisotropic conductive adhesive is removed again. Liquid crystal display body 11 and TAB using agent 14
It is necessary to connect with 15.
【0003】[0003]
【発明が解決しようとする課題】このため、従来より以
下のような種々の方法による再度の接続(再生)が行な
われているが、いずれも種々の問題を有している。For this reason, reconnection (reproduction) has been conventionally performed by the following various methods, but each of them has various problems.
【0004】まず、第一の方法として、溶剤を用いて液
晶ディスプレイ本体11に残存した異方性導電性接着剤
14を除去する方法がある。この場合、溶剤としてはア
セトン、トルエン、リグロイン、エポキシ剥離溶剤(太
陽化工社製 サンエコンG430等)、塩素系溶剤界面
活性剤等がある。しかし、これらは何れも低粘度であ
り、再生を必要としないTAB15にも浸透して接続信
頼性を低下させてしまう。また、有機溶剤を使用するた
めに特殊な排気装置を取りつける必要があるなどの欠点
がある。The first method is to remove the anisotropic conductive adhesive 14 remaining on the liquid crystal display body 11 using a solvent. In this case, examples of the solvent include acetone, toluene, ligroin, an epoxy stripping solvent (San-Econ G430 manufactured by Taiyo Kako Co., Ltd.), and a chlorine-based solvent surfactant. However, all of them have low viscosities, and penetrate into the TAB 15 which does not need to be regenerated, thus lowering the connection reliability. Further, there is a defect that a special exhaust device needs to be attached because the organic solvent is used.
【0005】第二の方法として、剥離ペーストを用いて
液晶ディスプレイ本体11に残存した異方性導電性接着
剤14を除去する方法がある。すなわち、剥離ペースト
としてテトラヒドロフラン(THF)/メタノールの混
合溶媒中にフエノキシ樹脂を混入したものを用い、フエ
ノキシ樹脂の成膜性を利用し残存物を溶かして除去する
方法である。この方法の場合、溶剤の浸透を防ぐ点では
効果があるが、10〜15分放置しておく必要があるた
めに時間がかかってしまう。A second method is to remove the anisotropic conductive adhesive 14 remaining on the liquid crystal display body 11 by using a peeling paste. That is, this is a method in which a mixture of a phenoxy resin in a mixed solvent of tetrahydrofuran (THF) / methanol is used as a peeling paste, and the residue is dissolved and removed by utilizing the film forming property of the phenoxy resin. This method is effective in preventing the penetration of the solvent, but it takes time because it needs to be left for 10 to 15 minutes.
【0006】第三の方法として、図4に示すように、導
電粒子19にNi等の硬い粒子を用いた熱硬化型の異方
性導電性接着剤20を用い、液晶ディスプレイ本体11
に残存した異方性導電性接着剤14の上から再度圧着す
る方法がある。この方法は簡便に行なうことができる
が、再生専用の異方性導電性接着剤20を使用すること
になるため、2種類の異方性導電性接着剤14,20を
用意しなければならず、在庫の面で煩雑になる。また使
用頻度の面でライフ等に問題がある。また2〜3回再圧
着すると液晶ディスプレイ本体11に残存した異方性導
電性接着剤14,20の導電粒子13,19が増えて図
5に示すようにショートする危険がある。As a third method, as shown in FIG. 4, a thermosetting anisotropic conductive adhesive 20 in which hard particles such as Ni are used as the conductive particles 19 is used, and the liquid crystal display main body 11 is used.
There is a method of pressing again from above the anisotropic conductive adhesive 14 remaining. This method can be performed easily, but since the anisotropic conductive adhesive 20 for reproduction only is used, two types of anisotropic conductive adhesives 14 and 20 must be prepared. , It becomes complicated in terms of inventory. Moreover, there is a problem in life in terms of frequency of use. Further, if the re-compression bonding is performed two or three times, the conductive particles 13, 19 of the anisotropic conductive adhesives 14, 20 remaining on the liquid crystal display body 11 increase and there is a risk of short-circuiting as shown in FIG.
【0007】第四の方法として、液晶ディスプレイ本体
11に残存した異方性導電性接着剤14を機械的に削り
とって新しい異方性導電性接着剤14を圧着する方法が
ある。しかし、これは接続パターンを傷つけ易いし、剥
離カスが発生して異物となり不良が発生する。このよう
に上記いずれの方法も一長一短があり、安全で接続信頼
性が高く、簡単に再生できる方法が望まれている。As a fourth method, there is a method in which the anisotropic conductive adhesive 14 remaining on the liquid crystal display body 11 is mechanically shaved and a new anisotropic conductive adhesive 14 is pressure bonded. However, this easily damages the connection pattern, and peeling debris is generated to become a foreign substance, causing a defect. As described above, each of the above methods has advantages and disadvantages, and there is a demand for a method that is safe, has high connection reliability, and can be easily reproduced.
【0008】本発明は従来例のかかる点に鑑みてなされ
たもので、その目的とするところは、安全で接続信頼性
が高く、簡単に再生を行うことができる熱硬化型異方性
導電性接着剤を提供することにある。The present invention has been made in view of the above points of the prior art, and an object thereof is to provide a thermosetting anisotropic conductive material which is safe, has high connection reliability, and can be easily reproduced. It is to provide an adhesive.
【0009】[0009]
【課題を解決するための手段】本発明は、エポキシ樹
脂、硬化剤を主成分とする絶縁性樹脂とこの絶縁性樹脂
中に導電粒子を含んでなる熱硬化型異方性接着剤におい
て、圧着温度における弾性率がこの絶縁性樹脂より高い
導電粒子を含むことを特徴とするものである。この場
合、導電粒子の表面に絶縁性樹脂を被覆することも効果
的である。The present invention is a thermosetting anisotropic adhesive comprising an epoxy resin, an insulating resin containing a curing agent as a main component, and conductive particles in the insulating resin. It is characterized in that it contains conductive particles whose elastic modulus at temperature is higher than that of the insulating resin. In this case, it is also effective to coat the surface of the conductive particles with an insulating resin.
【0010】[0010]
【作用】かかる構成を有する本発明にあっては、圧着温
度における弾性率が絶縁性樹脂より高い導電粒子を含む
ことから、熱圧着時において絶縁性樹脂が軟化する場合
でも導電粒子は変形しない。従って、接着剥離後に再び
本発明を用いて端子間の熱圧着(再生)を行えば、端子
間に残っている絶縁性樹脂が導電粒子によって押しのけ
られ、その結果、端子間の接続が確実に行われる。この
場合、導電粒子の表面に絶縁性樹脂を被覆すれば、再生
をくり返して導電粒子が増加した場合であっても、導電
粒子間のショートが起こりにくく、隣接する端子間のシ
ョートが防止される。In the present invention having such a constitution, since the conductive particles having a higher elastic modulus at the pressure bonding temperature than the insulating resin are contained, the conductive particles are not deformed even when the insulating resin is softened during thermocompression bonding. Therefore, if thermocompression bonding (regeneration) is performed again between the terminals using the present invention after peeling the adhesive, the insulating resin remaining between the terminals is pushed away by the conductive particles, and as a result, the connection between the terminals is surely performed. Be seen. In this case, if the surface of the conductive particles is coated with an insulating resin, short-circuiting between the conductive particles is unlikely to occur even when the number of conductive particles increases due to repeated regeneration, and a short-circuit between adjacent terminals is prevented. .
【0011】[0011]
【実施例】以下、本発明に係る熱硬化型異方性導電性接
着剤を具体的な実施例を参照して説明する。EXAMPLES The thermosetting anisotropic conductive adhesive according to the present invention will be described below with reference to specific examples.
【0012】熱硬化型異方性導電性接着剤1の作成 まず、以下の組成からなるバインダーとしての絶縁性樹
脂2を調製した。 エポキシ樹脂 エピコート1009 (油化シェルエポキシ社製) 100重量部 硬化剤 HX3941HP(旭化成社製) 170重量部 トルエン 80重量部Preparation of Thermosetting Anisotropic Conductive Adhesive 1 First, an insulating resin 2 as a binder having the following composition was prepared. Epoxy resin Epicoat 1009 (made by Yuka Shell Epoxy Co., Ltd.) 100 parts by weight Curing agent HX3941HP (made by Asahi Kasei) 170 parts by weight Toluene 80 parts by weight
【0013】かかる絶縁性樹脂2の170℃における弾
性率は、2×108 dyn/cm2であった。この場
合、弾性率の測定は、オリエンテック社製のレオ・バイ
ブロンDDV−01FPを用い、周波数60Hz、昇温
スピード3℃/分の条件で測定した。The elastic modulus of the insulating resin 2 at 170 ° C. was 2 × 10 8 dyn / cm 2 . In this case, the elastic modulus was measured by using Rheo Vibron DDV-01FP manufactured by Orientec Co., Ltd. under the conditions of a frequency of 60 Hz and a temperature rising speed of 3 ° C./min.
【0014】次に、この絶縁性樹脂2中に以下の各導電
粒子3を混入して厚み25μmのフィルムを形成した。Next, the following conductive particles 3 were mixed into this insulating resin 2 to form a film having a thickness of 25 μm.
【0015】 A:平均粒径7μmのNi粒子(実施例4) 54重量部 B:下記*の方法によりAの粒子にアクリル/スチレン樹脂を0.1〜0.2 μm被覆した粒子(実施例1) 54重量部 C:平均粒径5μmのシリカにNi/Auめっきを施した粒子(実施例5) 14重量部 D:Cの粒子に下記*の方法によりアクリル/スチレン樹脂を0.1〜0.2 μm被覆した粒子(実施例2) 14重量部 E:平均粒径5μmのベンゾグアナミン樹脂にNi/Auめっきを施した粒子 (日本化学社製 ブライト 20GNRY4.6EH 実施例6) 14重量部 F:下記*の方法によりEの粒子にアクリル/スチレン樹脂を0.1〜0.2 μm被覆した粒子(実施例3) 14重量部 G:平均粒径5μmの架橋ポリスチレンにNi/Auめっきを施した粒子(比 較例1) 14重量部 H:下記*の方法によりGの粒子に架橋ポリスチレン樹脂を0.1〜0.2μ m被覆した粒子(比較例2) 14重量部A: Ni particles having an average particle size of 7 μm (Example 4) 54 parts by weight B: Particles obtained by coating the particles of A with an acrylic / styrene resin in an amount of 0.1 to 0.2 μm by the method of the following * (Example) 1) 54 parts by weight C: Particles obtained by plating Ni / Au on silica having an average particle size of 5 μm (Example 5) 14 parts by weight D: C particles having an acrylic / styrene resin content of 0.1 to 0.1 by the method described below. Particles coated with 0.2 μm (Example 2) 14 parts by weight E: Particles obtained by applying Ni / Au plating to a benzoguanamine resin having an average particle size of 5 μm (Nippon Kagaku Co., Ltd. Bright 20GNRY4.6EH Example 6) 14 parts by weight F : Particles obtained by coating the particles of E with acrylic / styrene resin in an amount of 0.1 to 0.2 μm by the method described below (Example 3) 14 parts by weight G: Ni / Au plating on crosslinked polystyrene having an average particle size of 5 μm Particles (Comparative Example 1) 14 parts by weight H: Particles obtained by coating the particles of G with a crosslinked polystyrene resin in an amount of 0.1 to 0.2 μm by the following method * (Comparative Example 2) 14 parts by weight
【0016】*:ハイブリタイゼーションシステム(奈
良機械社製)を用いてアクリル/スチレン樹脂を導電粒
子3に5:100の割合で混合し、回転数16200r
pmで10分間処理した。*: Acrylic / styrene resin was mixed with conductive particles 3 at a ratio of 5: 100 using a hybridization system (manufactured by Nara Machinery Co., Ltd.), and the rotation speed was 16200 r.
It was treated with pm for 10 minutes.
【0017】尚、上記各導電粒子3の170℃における
弾性率は次の通りであった。この場合、弾性率の測定は
上記絶縁性樹脂2と同様の条件で行った。 A,B:2×1012dyn/cm2 C,D:6×1011dyn/cm2 E,F:4×108 dyn/cm2 G,H:9×107 dyn/cm2 The elastic moduli of the above conductive particles 3 at 170 ° C. were as follows. In this case, the elastic modulus was measured under the same conditions as the insulating resin 2. A, B: 2 × 10 12 dyn / cm 2 C, D: 6 × 10 11 dyn / cm 2 E, F: 4 × 10 8 dyn / cm 2 G, H: 9 × 10 7 dyn / cm 2
【0018】TAB4の作成 次に、厚み75μmのポリイミドフィルム5(宇部興産
社製 ユーピレックス)上に厚み35μmの銅箔を接着
剤で貼り付け、50μmの導体幅でピッチが100μm
となるようにエッチングし、これにより得られた130
ピンの端子6に半田めっきを施してTAB4を作成し
た。Preparation of TAB 4 Next, a copper foil having a thickness of 35 μm is attached to a polyimide film 5 having a thickness of 75 μm (Upilex manufactured by Ube Industries, Ltd.) with an adhesive, and a conductor width of 50 μm and a pitch of 100 μm.
To obtain 130
Solder plating was applied to the terminal 6 of the pin to prepare the TAB 4.
【0019】液晶ディスプレイ本体7 一方、液晶ディスプレイ用として、50μmの導体幅で
ピッチが100μmのITOパターン8を形成したガラ
ス9を用意した。 Liquid Crystal Display Main Body 7 On the other hand, for a liquid crystal display, a glass 9 having an ITO pattern 8 having a conductor width of 50 μm and a pitch of 100 μm was prepared.
【0020】接続 そして、上述の実施例及び比較例のフィルムを用い、温
度170℃、圧力40Kgf/cm2 、時間20秒の条
件で図2Aに示すように上記ガラス9とTAB4とを熱
圧着により接続してサンプルを作成し、その初期特性及
びエージング特性を測定した。 Connection Using the films of the above-mentioned Examples and Comparative Examples, the glass 9 and the TAB 4 were subjected to thermocompression bonding under the conditions of a temperature of 170 ° C., a pressure of 40 Kgf / cm 2 and a time of 20 seconds as shown in FIG. 2A. A sample was prepared by connecting and the initial characteristics and aging characteristics were measured.
【0021】再生 さらに、上述の熱圧着した状態のサンプルを用い、ガラ
ス9側から130〜140℃の熱を加えながらTAB4
を引き剥がした後(図2B参照)、同じ異方性導電性接
着剤1を用い上述の条件で再度新しいTAB4を熱圧着
し(図2C参照)、再生後の初期導通抵抗及びエージン
グ後の導通抵抗を測定した。そして、この工程をくり返
した。これらの測定結果を表1に示す。 Regeneration Furthermore, using the sample in the above thermocompression bonded state, TAB4 was applied while applying heat of 130 to 140 ° C. from the glass 9 side.
After peeling off (see FIG. 2B), a new TAB4 was thermocompression-bonded again using the same anisotropic conductive adhesive 1 under the above-mentioned conditions (see FIG. 2C), and the initial conduction resistance after reproduction and the conduction after aging were conducted. The resistance was measured. And this process was repeated. The results of these measurements are shown in Table 1.
【0022】[0022]
【表1】 [Table 1]
【0023】表1から理解されるように、圧着温度(1
70℃)における導電粒子3の弾性率がバインダーの絶
縁性樹脂2より高い実施例1〜3のものは、再生後の導
通特性が良好であった。これは、図1Aに示すように、
再生圧着時に導通粒子3a,3bが変形せず、絶縁性樹
脂2がこれによって押しのけられ端子6及びITOパタ
ーン8間の接続が確実に行なわれるからである。また、
導電粒子3が絶縁性樹脂により被覆されていることか
ら、再生3回後においても隣接する端子間にショートは
生じなかった。As can be seen from Table 1, the crimping temperature (1
In Examples 1 to 3 in which the elastic modulus of the conductive particles 3 at 70 ° C.) is higher than that of the insulating resin 2 as the binder, the conduction characteristics after regeneration were good. This is as shown in FIG.
This is because the conductive particles 3a and 3b are not deformed at the time of reproducing and pressure bonding, and the insulating resin 2 is pushed away by this and the connection between the terminal 6 and the ITO pattern 8 is surely made. Also,
Since the conductive particles 3 were covered with the insulating resin, a short circuit did not occur between the adjacent terminals even after 3 times of reproduction.
【0024】一方、上記圧着温度における導電粒子3の
弾性率がバインダーの絶縁性樹脂2より高く、かつ絶縁
性皮膜を施していない実施例4〜6の場合、再生後の導
通抵抗が良好で、再生1,2回後において隣接する端子
間にショートが生じなかった。しかし、再生3回後にお
いて隣接する端子間にショートが生じた。On the other hand, in Examples 4 to 6 in which the elastic modulus of the conductive particles 3 at the above-mentioned pressure bonding temperature is higher than that of the insulating resin 2 of the binder and the insulating film is not applied, the conduction resistance after regeneration is good, A short circuit did not occur between the adjacent terminals after the first and second reproduction. However, a short circuit occurred between the adjacent terminals after three times of reproduction.
【0025】また、上記圧着温度における導電粒子3の
弾性率がバインダーの絶縁性樹脂2より低い比較例1の
場合、再生後の導通抵抗が悪化した。これは、例えば図
1Bに示すように、圧着工程において絶縁性樹脂2が軟
化する際に導電粒子3c,3dも変形し、ITOパター
ン8上の絶縁性樹脂3を押しのけられないからである。
また、比較例1の場合、導電粒子3に絶縁性皮膜を施し
ていないため、再生3回後に隣接する端子間のショート
が発生した。Further, in the case of Comparative Example 1 in which the elastic modulus of the conductive particles 3 at the above-mentioned pressure bonding temperature is lower than that of the insulating resin 2 as the binder, the conduction resistance after reproduction deteriorated. This is because, for example, as shown in FIG. 1B, when the insulating resin 2 is softened in the pressure bonding step, the conductive particles 3c and 3d are also deformed, and the insulating resin 3 on the ITO pattern 8 cannot be pushed away.
Further, in the case of Comparative Example 1, since the conductive particles 3 were not coated with an insulating film, a short circuit occurred between adjacent terminals after three times of reproduction.
【0026】さらに、上記圧着温度における導電粒子3
の弾性率がバインダーの絶縁性樹脂2より低く、かつ絶
縁性皮膜を施した比較例2の場合、再生3回後における
隣接する端子間のショートは生じなかったが、比較例1
と同様の理由により再生後の導通抵抗が上昇した。Further, the conductive particles 3 at the above-mentioned pressure bonding temperature
In the case of Comparative Example 2 in which the elastic modulus of is lower than that of the insulating resin 2 as the binder and the insulating film is applied, a short circuit between adjacent terminals did not occur after 3 times of regeneration, but Comparative Example 1
For the same reason as above, the conduction resistance after regeneration increased.
【0027】尚、本発明は上述の実施例に限られること
なく、種々の変更を行うことができる。例えば絶縁性樹
脂及び導通粒子として種々のものを用いることができ
る。また、最初の圧着と再生時の圧着に際し別の異方性
導電性接着剤を用いることもできる。ただし、再生時に
用いる異方性導電性接着剤の導電粒子の圧着温度におけ
る弾性率が、最初の異方性導電性接着剤の絶縁性樹脂の
圧着温度における弾性率より大きくなければならないこ
とはもちろんである。The present invention is not limited to the above-mentioned embodiment, but various modifications can be made. For example, various materials can be used as the insulating resin and the conductive particles. In addition, different anisotropic conductive adhesives can be used for the initial pressure bonding and the pressure bonding during reproduction. However, it is of course necessary that the elastic modulus at the crimping temperature of the conductive particles of the anisotropic conductive adhesive used at the time of regeneration must be higher than the elastic modulus at the crimping temperature of the insulating resin of the first anisotropic conductive adhesive. Is.
【0028】[0028]
【発明の効果】以上述べたように本発明によれば、圧着
温度における弾性率が絶縁性樹脂より高い導電粒子を含
むようにしたことから、安全で接続信頼性が高く、かつ
簡単に端子間接続の再生を行うことができる。この場
合、導電粒子の表面に絶縁性樹脂を被覆することによ
り、より一層接続信頼性を高めることができる。As described above, according to the present invention, since conductive particles having a higher elastic modulus at the crimping temperature than that of the insulating resin are contained, the connection between the terminals can be performed easily and with high reliability. Connection playback can be performed. In this case, the connection reliability can be further improved by coating the surface of the conductive particles with an insulating resin.
【0029】しかも、本発明によれば、端子上に残った
異方性導電性接着剤を取り除く必要がないことから、再
生工程を短縮できる。また、接着時と同じ異方性導電性
接着剤を用いて再生を行うことができるため、異方性導
電性接着剤の間違い等を防ぐことができる。さらに、本
発明によれば、他の部分への悪影響を与えることなく再
生を行いうるものである。Moreover, according to the present invention, it is not necessary to remove the anisotropic conductive adhesive remaining on the terminals, so that the recycling process can be shortened. Further, since the same anisotropic conductive adhesive as that used for the adhesion can be used for the reproduction, it is possible to prevent the anisotropic conductive adhesive from being mistaken. Furthermore, according to the present invention, reproduction can be performed without adversely affecting other parts.
【図1】A 本発明の実施例1〜3の作用を示す断面説
明図である。 B 本発明の比較例4,5の作用を示す説明図である。FIG. 1A is an explanatory cross-sectional view showing the action of Examples 1 to 3 of the present invention. B is an explanatory view showing the action of Comparative Examples 4 and 5 of the present invention.
【図2】本発明を用いた再生方法の一例を示す断面図で
ある。FIG. 2 is a sectional view showing an example of a reproducing method using the present invention.
【図3】A 液晶ディスプレイ本体とTABとの接続方
法を示す概略斜視図である。 B 液晶ディスプレイ本体とTABとの接続方法を示す
断面図である。FIG. 3 is a schematic perspective view showing a method of connecting the A liquid crystal display main body and the TAB. B is a cross-sectional view showing a method of connecting the liquid crystal display body and the TAB.
【図4】従来の再生方法を示す断面図である。FIG. 4 is a sectional view showing a conventional reproducing method.
【図5】従来の再生方法においてショートが発生した状
態を示す断面図である。FIG. 5 is a cross-sectional view showing a state in which a short circuit has occurred in the conventional reproducing method.
1 異方性導電性接着剤 2 絶縁性樹脂 3(3a,3b) 導電粒子 4 TAB 5 ポリイミドフィルム 6 端子 7 液晶ディスプレイ本体 8 ITOパターン 9 ガラス 1 Anisotropic Conductive Adhesive 2 Insulating Resin 3 (3a, 3b) Conductive Particles 4 TAB 5 Polyimide Film 6 Terminal 7 Liquid Crystal Display Main Body 8 ITO Pattern 9 Glass
Claims (2)
縁性樹脂と該絶縁性樹脂中に導電粒子を含んでなる熱硬
化型異方性接着剤において、 圧着温度における弾性率が上記絶縁性樹脂より高い導電
粒子を含むことを特徴とする熱硬化型異方性導電性接着
剤。1. A thermosetting anisotropic adhesive comprising an epoxy resin, an insulating resin containing a curing agent as a main component, and conductive particles contained in the insulating resin, wherein the elastic modulus at the pressure bonding temperature is the above-mentioned insulating property. A thermosetting anisotropic conductive adhesive containing conductive particles higher than a resin.
なることを特徴とする請求項1記載の熱硬化型異方性導
電性接着剤。2. The thermosetting anisotropic conductive adhesive according to claim 1, wherein the surface of the conductive particles is coated with an insulating resin.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33726093A JP3364695B2 (en) | 1993-12-28 | 1993-12-28 | Circuit connection regeneration method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33726093A JP3364695B2 (en) | 1993-12-28 | 1993-12-28 | Circuit connection regeneration method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH07197001A true JPH07197001A (en) | 1995-08-01 |
JP3364695B2 JP3364695B2 (en) | 2003-01-08 |
Family
ID=18306953
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP33726093A Expired - Lifetime JP3364695B2 (en) | 1993-12-28 | 1993-12-28 | Circuit connection regeneration method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP3364695B2 (en) |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6190578B1 (en) | 1996-02-08 | 2001-02-20 | Asahi Kasei Kogyo Kabushiki Kaisha | Anisotropic conductive composition |
JP2003045230A (en) * | 2001-08-01 | 2003-02-14 | Hayakawa Rubber Co Ltd | Synthetic resin particulate, conductive particulate and anisotropy conductive material composite |
US6583834B1 (en) * | 1997-02-27 | 2003-06-24 | Seiko Epson Corporation | Adhesive, liquid crystal device, process for manufacturing liquid crystal device, and electronic equipment |
US6632532B1 (en) | 1999-11-05 | 2003-10-14 | Sony Chemicals Corp. | Particle material anisotropic conductive connection and anisotropic conductive connection material |
US6671024B1 (en) | 1997-02-27 | 2003-12-30 | Seiko Epson Corporation | Connecting structure, liquid crystal device, electronic equipment, and anisotropic conductive adhesive agent and a manufacturing method thereof |
US6903463B1 (en) * | 1999-09-14 | 2005-06-07 | Sony Chemicals Corporation | COG-assembly and connecting material to be used therein |
WO2008012886A1 (en) * | 2006-07-26 | 2008-01-31 | Panasonic Corporation | Structure for connecting circuit boards, method for connecting circuit boards and electronic apparatus |
JP2009182365A (en) * | 2009-05-21 | 2009-08-13 | Hitachi Chem Co Ltd | Manufacturing method of circuit board, and circuit connection material |
JP2013509620A (en) * | 2009-10-30 | 2013-03-14 | リサーチ フロンティアーズ インコーポレイテッド | SPD membrane and light valve laminate with improved bus bar connection |
WO2014162394A1 (en) * | 2013-04-01 | 2014-10-09 | パイオニア株式会社 | Connection structure for electrical component |
-
1993
- 1993-12-28 JP JP33726093A patent/JP3364695B2/en not_active Expired - Lifetime
Cited By (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6190578B1 (en) | 1996-02-08 | 2001-02-20 | Asahi Kasei Kogyo Kabushiki Kaisha | Anisotropic conductive composition |
US6671024B1 (en) | 1997-02-27 | 2003-12-30 | Seiko Epson Corporation | Connecting structure, liquid crystal device, electronic equipment, and anisotropic conductive adhesive agent and a manufacturing method thereof |
US6583834B1 (en) * | 1997-02-27 | 2003-06-24 | Seiko Epson Corporation | Adhesive, liquid crystal device, process for manufacturing liquid crystal device, and electronic equipment |
US6903463B1 (en) * | 1999-09-14 | 2005-06-07 | Sony Chemicals Corporation | COG-assembly and connecting material to be used therein |
KR100554925B1 (en) * | 1999-11-05 | 2006-03-03 | 소니 케미카루 가부시키가이샤 | Particle material for anisotropic conductive connection and anisotropic conductive connection material |
US6632532B1 (en) | 1999-11-05 | 2003-10-14 | Sony Chemicals Corp. | Particle material anisotropic conductive connection and anisotropic conductive connection material |
JP2003045230A (en) * | 2001-08-01 | 2003-02-14 | Hayakawa Rubber Co Ltd | Synthetic resin particulate, conductive particulate and anisotropy conductive material composite |
JP4642286B2 (en) * | 2001-08-01 | 2011-03-02 | 早川ゴム株式会社 | Synthetic resin fine particles, conductive fine particles, and anisotropic conductive material composition |
WO2008012886A1 (en) * | 2006-07-26 | 2008-01-31 | Panasonic Corporation | Structure for connecting circuit boards, method for connecting circuit boards and electronic apparatus |
JP2009182365A (en) * | 2009-05-21 | 2009-08-13 | Hitachi Chem Co Ltd | Manufacturing method of circuit board, and circuit connection material |
JP2013509620A (en) * | 2009-10-30 | 2013-03-14 | リサーチ フロンティアーズ インコーポレイテッド | SPD membrane and light valve laminate with improved bus bar connection |
WO2014162394A1 (en) * | 2013-04-01 | 2014-10-09 | パイオニア株式会社 | Connection structure for electrical component |
JPWO2014162394A1 (en) * | 2013-04-01 | 2017-02-16 | パイオニア株式会社 | Connection structure for electrical equipment and components |
US9705105B2 (en) | 2013-04-01 | 2017-07-11 | Pioneer Corporation | Connection structure for electrical component |
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