JPH0718442A - Vacuum deposition device - Google Patents
Vacuum deposition deviceInfo
- Publication number
- JPH0718442A JPH0718442A JP16107293A JP16107293A JPH0718442A JP H0718442 A JPH0718442 A JP H0718442A JP 16107293 A JP16107293 A JP 16107293A JP 16107293 A JP16107293 A JP 16107293A JP H0718442 A JPH0718442 A JP H0718442A
- Authority
- JP
- Japan
- Prior art keywords
- heater
- insulator
- evaporation source
- film
- radiant heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、フィルムコンデンサや
パッケージング用の蒸着フィルムを製造する真空蒸着装
置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a vacuum vapor deposition apparatus for producing vapor deposited films for film capacitors and packaging.
【0002】[0002]
【従来の技術】従来の真空蒸着装置の蒸発源はヒータチ
ューブの外周にヒータ及びヒータ碍子を配し遠赤外線に
よる輻射加熱により被蒸発物を加熱蒸発させる方式が用
いられている。2. Description of the Related Art As a vaporization source of a conventional vacuum vapor deposition apparatus, a system is used in which a heater and a heater insulator are arranged around a heater tube to heat and vaporize an object to be vaporized by radiant heating by far infrared rays.
【0003】図5は従来の輻射加熱方式の蒸発源を示す
ものであり、図5においてbは亜鉛等の被蒸発物で8の
ルツボに収納される。6は蒸発源ヒータであり、この蒸
発源ヒータ6が複数本1組として複雑な形状のヒータ碍
子9に配され、蒸発源ヒータ6の輻射熱によりルツボ8
内の被蒸発物bが溶融、図示しないフィルム等に飛翔蒸
着する構成となっていた。FIG. 5 shows a conventional radiant heating type evaporation source. In FIG. 5, b is an evaporated material such as zinc, which is housed in a crucible 8. Reference numeral 6 denotes an evaporation source heater. A plurality of evaporation source heaters 6 are arranged on a heater insulator 9 having a complicated shape as a set, and the radiant heat of the evaporation source heater 6 causes the crucible 8 to be heated.
The material b to be evaporated therein is melted and is vapor-deposited on a film (not shown) or the like.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、この種
の真空蒸着装置に蒸発源は、ヒータチューブの外周に配
したヒータ碍子が特に機械的強度の弱い薄肉部分で破損
しやすく、このヒータ碍子の破損により蒸発源ヒータと
ヒータチューブ等の接触により、電気的ショートサーキ
ットが発生し、蒸発源ヒータが断線し、被蒸発物が十分
に加熱出来ずスプラッシュや蒸着膜厚不良発生の要因と
なっていた。また、この従来のヒータ碍子は、円筒状の
ヒータチューブ5の外周に配置させるため、形状が複雑
で設備コストアップの要因にもなっていた。However, in the evaporation source of this type of vacuum vapor deposition apparatus, the heater insulator arranged on the outer circumference of the heater tube is easily damaged at a thin portion having a particularly weak mechanical strength, and the heater insulator is damaged. Due to the contact between the evaporation source heater and the heater tube or the like, an electrical short circuit occurs, the evaporation source heater is disconnected, and the evaporation target cannot be heated sufficiently, causing a splash or defective deposition film thickness. Further, since this conventional heater insulator is arranged on the outer periphery of the cylindrical heater tube 5, it has a complicated shape and causes an increase in equipment cost.
【0005】本発明は上記の問題点を解決し、ヒータ碍
子寿命の長期化、蒸着フィルムの蒸着品質の向上を目的
とする。An object of the present invention is to solve the above problems, prolong the life of the heater insulator, and improve the vapor deposition quality of the vapor deposited film.
【0006】[0006]
【課題を解決するための手段】この目的を達成するため
に本発明の真空蒸着装置は、ヒータ碍子形状を円筒形状
とすると共に、少なくともこのヒータ碍子および蒸発源
ヒータを含む蒸発源を一式以上配設した構成としたもの
である。In order to achieve this object, the vacuum vapor deposition apparatus of the present invention has a heater insulator having a cylindrical shape, and at least one evaporation source including at least the heater insulator and the evaporation source heater is arranged. It has a set configuration.
【0007】[0007]
【作用】この構成によれば、ヒータ碍子形状を円筒状に
することでヒータ碍子の機械的強度が増し、熱収縮歪み
に対しても強い構造となり、ヒータ碍子の寿命が大幅に
延命化できることとなる。またヒータ碍子の破壊の激減
により蒸発源ヒータの断線の機会が低下し、被蒸発物の
スプラッシュや蒸着膜厚不良が低減して蒸着品質の向上
が達成されることとなる。According to this structure, by making the shape of the heater insulator cylindrical, the mechanical strength of the heater insulator is increased, and the structure is resistant to heat shrinkage distortion, and the life of the heater insulator can be greatly extended. Become. In addition, the chance of disconnection of the evaporation source heater is reduced due to the drastic reduction of the destruction of the heater insulator, and the splash of the evaporation target and the deposition thickness defect are reduced, and the deposition quality is improved.
【0008】[0008]
(実施例1)以下本発明の一実施例について、図面を参
照しながら説明する。(Embodiment 1) An embodiment of the present invention will be described below with reference to the drawings.
【0009】図1は本発明のヒータ碍子形状を円筒状に
変更した蒸発源4の構造図である。ヒータチューブ5の
外周に蒸発源ヒータ6及びヒータ碍子7を配する構造と
なっている。ヒータチューブ5の内部には被蒸発物bお
よびその容器であるルツボ8を配している。蒸発源4は
主に亜鉛等の金属を真空蒸着するために遠赤外線輻射加
熱するものであり、蒸発温度にあわせ数個の蒸発源ヒー
タ6およびヒータ碍子7を設置できる構造としている。FIG. 1 is a structural diagram of an evaporation source 4 in which the heater insulator shape of the present invention is changed to a cylindrical shape. The evaporation source heater 6 and the heater insulator 7 are arranged on the outer circumference of the heater tube 5. Inside the heater tube 5, a substance b to be evaporated and a crucible 8 which is a container thereof are arranged. The evaporation source 4 mainly heats far infrared rays in order to vacuum-deposit metal such as zinc, and has a structure in which several evaporation source heaters 6 and heater insulators 7 can be installed according to the evaporation temperature.
【0010】図2は本蒸発源の断面図である。図3は本
発明の蒸発源を真空蒸着機に設置した実施例である。巻
出し部1に取り付けられたフィルム等のウエブaは搬送
ロールによりクーリングロール2に連続して搬送され
る。クーリングロール2の下部には輻射加熱方式の蒸発
源4を設置しており、フィルム等の表面に被蒸発物bが
蒸着されたあと巻取り部3でロール状に巻取る構造とな
っている。FIG. 2 is a sectional view of the present evaporation source. FIG. 3 shows an embodiment in which the evaporation source of the present invention is installed in a vacuum vapor deposition machine. The web a such as a film attached to the unwinding unit 1 is continuously conveyed to the cooling roll 2 by the conveying roll. A radiant heating type evaporation source 4 is installed below the cooling roll 2 and has a structure in which an object b to be evaporated is vapor-deposited on the surface of a film or the like and then wound into a roll shape by a winding unit 3.
【0011】本発明ではヒータ碍子形状を従来の複雑形
状から円筒形状に改良することにより、ヒータ碍子の機
械的強度を向上させ、ヒータ碍子破損およびそれに伴う
蒸発源ヒータの断線を防止することができる。In the present invention, by improving the shape of the heater insulator from the conventional complicated shape to the cylindrical shape, it is possible to improve the mechanical strength of the heater insulator and prevent damage to the heater insulator and disconnection of the evaporation source heater due to the damage. .
【0012】(実施例2)図4はフィルム等の裏表両面
に被蒸発物を蒸着する為、本発明の輻射加熱方式の蒸発
源4を2式装着した実施例である。(Embodiment 2) FIG. 4 shows an embodiment in which two radiant heating type evaporation sources 4 of the present invention are mounted in order to evaporate substances to be evaporated on both front and back surfaces of a film or the like.
【0013】[0013]
【発明の効果】以上のように本発明は、ヒータ碍子をシ
ンプルで機械的強度の強い円筒状とすることによりヒー
タ碍子寿命を大幅に延命化でき、蒸着品質を向上させる
と共に安価な蒸発源を得ることが出来る。As described above, according to the present invention, the life of the heater insulator can be greatly extended by forming the heater insulator into a cylindrical shape having a simple and strong mechanical strength, and the evaporation quality can be improved and an inexpensive evaporation source can be provided. You can get it.
【図1】本発明の一実施例における輻射加熱方式の蒸発
源の詳細図FIG. 1 is a detailed view of a radiation heating type evaporation source in one embodiment of the present invention.
【図2】本発明の一実施例における輻射加熱方式の蒸発
源の断面図FIG. 2 is a sectional view of a radiant heating type evaporation source in one embodiment of the present invention.
【図3】本発明の第1の実施例における真空蒸着装置の
内部構造図FIG. 3 is an internal structure diagram of a vacuum vapor deposition apparatus in the first embodiment of the present invention.
【図4】本発明の第2の実施例における両面真空蒸着装
置の内部構造図FIG. 4 is an internal structure diagram of a double-sided vacuum vapor deposition apparatus in a second embodiment of the present invention.
【図5】従来の輻射加熱方式の蒸発源の詳細図FIG. 5 is a detailed view of a conventional radiant heating type evaporation source.
a フィルム等のウエブ b 被蒸発物 1 巻出し部 2 クーリングロール 3 巻取り部 4 蒸発源 5 ヒータチューブ 6 蒸発源ヒータ 7 ヒータ碍子 8 ルツボ 9 従来のヒータ碍子 a web of film or the like b evaporation object 1 unwinding section 2 cooling roll 3 winding section 4 evaporation source 5 heater tube 6 evaporation source heater 7 heater insulator 8 crucible 9 conventional heater insulator
Claims (3)
より蒸発させ、フィルム等に被蒸発物を蒸着させる装置
において、上記輻射加熱方式に用いられる蒸発源ヒータ
のヒータ碍子形状を円筒形状とした事を特徴とする真空
蒸着装置。1. In a device for evaporating a substance to be evaporated by a radiant heating method in a vacuum chamber to deposit the substance to be evaporated on a film or the like, the heater insulator shape of the evaporation source heater used in the radiant heating method is a cylindrical shape. Vacuum deposition equipment characterized by
源ヒータおよびヒータ碍子をそれぞれ一個以上設けたこ
とを特徴とする請求項1記載の真空蒸着装置。2. The vacuum vapor deposition apparatus according to claim 1, wherein one or more evaporation source heaters and heater insulators are provided for vacuum vapor deposition on a film or the like.
空蒸着する為、少なくとも前記蒸発源ヒータとヒータ碍
子とからなる蒸発源を一式以上設けたことを特徴とする
請求項1記載の真空蒸着装置。3. The vacuum vapor deposition apparatus according to claim 1, wherein at least one vaporization source including at least the vaporization source heater and the heater insulator is provided in order to perform vacuum vapor deposition on both front and back surfaces or one surface of a film or the like.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16107293A JPH0718442A (en) | 1993-06-30 | 1993-06-30 | Vacuum deposition device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16107293A JPH0718442A (en) | 1993-06-30 | 1993-06-30 | Vacuum deposition device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0718442A true JPH0718442A (en) | 1995-01-20 |
Family
ID=15728095
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16107293A Pending JPH0718442A (en) | 1993-06-30 | 1993-06-30 | Vacuum deposition device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0718442A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2339800A (en) * | 1998-07-24 | 2000-02-09 | Gen Vacuum Equip Ltd | Vacuum deposition on a moving web using a radiant heat supply |
EP1662017A1 (en) * | 2004-11-20 | 2006-05-31 | Applied Films GmbH & Co. KG | Apparatus for evaporation of materials |
JP6205028B1 (en) * | 2016-07-22 | 2017-09-27 | マシン・テクノロジー株式会社 | Evaporator and fixing device used therefor |
-
1993
- 1993-06-30 JP JP16107293A patent/JPH0718442A/en active Pending
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2339800A (en) * | 1998-07-24 | 2000-02-09 | Gen Vacuum Equip Ltd | Vacuum deposition on a moving web using a radiant heat supply |
GB2339800B (en) * | 1998-07-24 | 2003-04-09 | Gen Vacuum Equipment Ltd | A vacuum process for depositing zinc sulphide and other coatings on flexible moving web |
EP1662017A1 (en) * | 2004-11-20 | 2006-05-31 | Applied Films GmbH & Co. KG | Apparatus for evaporation of materials |
JP2006144113A (en) * | 2004-11-20 | 2006-06-08 | Applied Films Gmbh & Co Kg | Apparatus for evaporation of material |
JP6205028B1 (en) * | 2016-07-22 | 2017-09-27 | マシン・テクノロジー株式会社 | Evaporator and fixing device used therefor |
JP2018012872A (en) * | 2016-07-22 | 2018-01-25 | マシン・テクノロジー株式会社 | Evaporator, and fastener to be used in the evaporator |
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