JPH07161699A - 処理装置 - Google Patents

処理装置

Info

Publication number
JPH07161699A
JPH07161699A JP34135693A JP34135693A JPH07161699A JP H07161699 A JPH07161699 A JP H07161699A JP 34135693 A JP34135693 A JP 34135693A JP 34135693 A JP34135693 A JP 34135693A JP H07161699 A JPH07161699 A JP H07161699A
Authority
JP
Japan
Prior art keywords
semiconductor wafer
lower electrode
processed
pressing
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP34135693A
Other languages
English (en)
Japanese (ja)
Inventor
Shigeki Tozawa
茂樹 戸澤
Norisuke Endou
昇佐 遠藤
Hiroshi Tariki
浩 他力
Shozo Hosoda
正蔵 細田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Tokyo Electron Yamanashi Ltd
Original Assignee
Tokyo Electron Ltd
Tokyo Electron Yamanashi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd, Tokyo Electron Yamanashi Ltd filed Critical Tokyo Electron Ltd
Priority to JP34135693A priority Critical patent/JPH07161699A/ja
Priority to KR1019940033373A priority patent/KR950021174A/ko
Priority to TW083111516A priority patent/TW273629B/zh
Publication of JPH07161699A publication Critical patent/JPH07161699A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32715—Workpiece holder
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32853—Hygiene
    • H01J37/32871—Means for trapping or directing unwanted particles
    • H10P72/0402—
    • H10P72/7606—

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP34135693A 1993-12-10 1993-12-10 処理装置 Pending JPH07161699A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP34135693A JPH07161699A (ja) 1993-12-10 1993-12-10 処理装置
KR1019940033373A KR950021174A (ko) 1993-12-10 1994-12-09 처리장치
TW083111516A TW273629B (enExample) 1993-12-10 1994-12-10

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP34135693A JPH07161699A (ja) 1993-12-10 1993-12-10 処理装置

Publications (1)

Publication Number Publication Date
JPH07161699A true JPH07161699A (ja) 1995-06-23

Family

ID=18345438

Family Applications (1)

Application Number Title Priority Date Filing Date
JP34135693A Pending JPH07161699A (ja) 1993-12-10 1993-12-10 処理装置

Country Status (3)

Country Link
JP (1) JPH07161699A (enExample)
KR (1) KR950021174A (enExample)
TW (1) TW273629B (enExample)

Also Published As

Publication number Publication date
KR950021174A (ko) 1995-07-26
TW273629B (enExample) 1996-04-01

Similar Documents

Publication Publication Date Title
EP1008674B1 (en) Elecrode unit and processor
KR102653085B1 (ko) 클리닝 방법 및 기판 처리 장치
KR101265827B1 (ko) 웨이퍼의 베벨 에지 및 이면상의 필름들을 제거하는 장치및 방법들
JP3535309B2 (ja) 減圧処理装置
JPH06163467A (ja) エッチング装置
JP2879887B2 (ja) プラズマ処理方法
JPH10321605A (ja) プラズマ処理装置
JPH09326385A (ja) 基板冷却方法
JPH08335568A (ja) エッチング装置
JP2869384B2 (ja) プラズマ処理方法
US20040139917A1 (en) Plasma processing apparatus
JPH11283940A (ja) プラズマ処理方法
JPH10326772A (ja) ドライエッチング装置
JP3118497B2 (ja) プラズマ処理装置及びプラズマ処理方法
JPH07201829A (ja) プラズマ処理装置の洗浄方法
JP3113786B2 (ja) プラズマ処理装置及びその制御方法
JPH06168914A (ja) エッチング処理方法
JPH07161699A (ja) 処理装置
JP3162272B2 (ja) プラズマ処理方法
JP3002496B2 (ja) 半導体ウェハのドライエッチング方法
JP2001144076A (ja) ウェハのドライエッチング装置およびドライエッチング方法
KR0156244B1 (ko) 플라즈마 처리방법
JP7702639B2 (ja) プラズマ処理装置およびプラズマ処理方法
JPH08162292A (ja) プラズマ処理装置及びその制御方法
JP2548164B2 (ja) ドライエッチング方法