JPH07153797A - Bump of circuit board and manufacturing method of it - Google Patents
Bump of circuit board and manufacturing method of itInfo
- Publication number
- JPH07153797A JPH07153797A JP29684393A JP29684393A JPH07153797A JP H07153797 A JPH07153797 A JP H07153797A JP 29684393 A JP29684393 A JP 29684393A JP 29684393 A JP29684393 A JP 29684393A JP H07153797 A JPH07153797 A JP H07153797A
- Authority
- JP
- Japan
- Prior art keywords
- bump
- polyimide layer
- circuit board
- bumps
- polyimide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Wire Bonding (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明は、電子部品を回路基板
の導体に接続するための回路基板のバンプ及びその製造
方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a bump of a circuit board for connecting an electronic component to a conductor of the circuit board and a method for manufacturing the bump.
【0002】[0002]
【従来の技術】周知のように、回路基板の導体に金属の
バンプを予め形成しておき、このバンプに電子部品の端
子を突き合わせて、このバンプを加熱溶融し、これによ
り電子部品の端子を接続するという方法がある。2. Description of the Related Art As is well known, metal bumps are formed in advance on a conductor of a circuit board, terminals of electronic parts are butted against the bumps, and the bumps are heated and melted, whereby terminals of the electronic parts are fixed. There is a method of connecting.
【0003】このバンプを形成するには、例えば図2
(a)に示すようにポリイミドフィルム11と銅箔導体
12からなるフレキシブル基板13に接着剤層14を介
してポリイミドフィルム15を積層し、このポリイミド
フィルム15に孔16を形成し、この後に電気半田メッ
キを行う。これにより、図2(b)に示すようにポリイ
ミドフィルム15の孔16に半田のバンプ17が形成さ
れる。To form this bump, for example, as shown in FIG.
As shown in (a), a polyimide film 15 is laminated on a flexible substrate 13 composed of a polyimide film 11 and a copper foil conductor 12 via an adhesive layer 14, holes 16 are formed in the polyimide film 15, and then electric soldering is performed. Plating. As a result, solder bumps 17 are formed in the holes 16 of the polyimide film 15 as shown in FIG.
【0004】[0004]
【発明が解決しようとする課題】しかしながら、接着剤
層14は、電気半田メッキの前処理、あるいは処理中に
劣化するので、この接着剤層14の接着力が低下するこ
とがある。この場合、メッキ液がポリイミドフィルム1
5の下に回り込み、孔16だけでなく、この孔16の周
辺に半田メッキが浸入し、これがバンプの形状不良の原
因になることが研究検討により判明した。However, since the adhesive layer 14 deteriorates during the pretreatment of the electric solder plating or during the treatment, the adhesive force of the adhesive layer 14 may be lowered. In this case, the plating solution is polyimide film 1
It has been found by research and study that the solder plating penetrates under the holes 5 and penetrates not only into the holes 16 but also around the holes 16, which causes defective bump shape.
【0005】なお、ここでは、半田メッキを例示してい
るが、金メッキや銀メッキによってバンプを形成するこ
ともある。金メッキや銀メッキの場合でも、半田メッキ
と同様な理由で、バンプの形状不良が発生する。Although solder plating is exemplified here, bumps may be formed by gold plating or silver plating. In the case of gold plating or silver plating, bump shape defects occur due to the same reason as solder plating.
【0006】そこで、この発明の課題は、均一な形状の
バンプを安定に製造する方法と、この方法によって形成
されるバンプを提供することにある。Therefore, an object of the present invention is to provide a method for stably manufacturing a bump having a uniform shape, and a bump formed by this method.
【0007】[0007]
【課題を解決するための手段】上記課題を解決するため
に、特許請求の範囲の請求項1に係わる製造方法は、ポ
リイミド樹脂の溶液を回路基板に塗布し、このポリイミ
ド樹脂を硬化させて、回路基板の導体を覆うポリイミド
層を形成する工程と、回路基板の導体に達する孔をポリ
イミド層に形成する工程と、回路基板の導体上に成長
し、ポリイミド層から突出するバンプを金属メッキによ
ってポリイミド層の孔に形成する工程とからなる。In order to solve the above-mentioned problems, the manufacturing method according to claim 1 of the claims is to apply a solution of a polyimide resin to a circuit board and to cure the polyimide resin, A step of forming a polyimide layer covering the conductor of the circuit board, a step of forming a hole reaching the conductor of the circuit board in the polyimide layer, a bump that grows on the conductor of the circuit board and protrudes from the polyimide layer by metal plating Forming a hole in the layer.
【0008】また、特許請求の範囲の請求項2に係わる
回路基板のバンプは、上記請求項1に記載の製造方法に
よって形成されるものであって、回路基板上の導体に直
に被着したポリイミド層の孔に形成され、回路基板の導
体に接続し、ポリイミド層から突出している。Further, the bumps of the circuit board according to claim 2 are formed by the manufacturing method according to claim 1, and are directly applied to the conductor on the circuit board. It is formed in the hole of the polyimide layer, is connected to the conductor of the circuit board, and protrudes from the polyimide layer.
【0009】[0009]
【作用】上記請求項1に係わる製造方法によれば、ポリ
イミド樹脂の溶液を回路基板に塗布して、ポリイミド層
を形成し、このポリイミド層に孔を開け、この後に金属
メッキを行って、このポリイミド層の孔にバンプを形成
している。ポリイミド層は、金属メッキによって劣化し
たり、メッキ液に侵されることがないので、このポリイ
ミド層の孔には、所定の形状のバンプが安定に形成され
る。According to the manufacturing method of the first aspect, the solution of the polyimide resin is applied to the circuit board to form the polyimide layer, the polyimide layer is perforated, and then the metal plating is performed. Bumps are formed in the holes of the polyimide layer. Since the polyimide layer is not deteriorated by metal plating and is not attacked by the plating solution, bumps having a predetermined shape are stably formed in the holes of the polyimide layer.
【0010】また、上記請求項2に係わる回路基板のバ
ンプは、上記請求項1に記載の製造方法によって形成さ
れるものであるから、所定の形状であって、不規則に変
形しない。このため、このバンプと電子部品の端子を正
確に突き合わせて、このバンプを溶融し、電子部品の端
子を確実に接続できる。Further, since the bump of the circuit board according to claim 2 is formed by the manufacturing method according to claim 1, it has a predetermined shape and does not deform irregularly. Therefore, the bump and the terminal of the electronic component can be accurately brought into contact with each other, the bump can be melted, and the terminal of the electronic component can be reliably connected.
【0011】[0011]
【実施例】図1は、この発明に係わるバンプの製造方法
の一実施例を示している。この図1を参照して、この実
施例のバンプの製造方法を次に述べる。FIG. 1 shows an embodiment of a bump manufacturing method according to the present invention. With reference to FIG. 1, a method of manufacturing the bump of this embodiment will be described below.
【0012】(工程1) 図1(a)に示すようにフレ
キシブルプリント基板(以下FPCと称す)1は、ポリ
イミドフィルム2と銅箔導体3を積層してなる。このF
PC1の銅箔導体3上にポリイミド樹脂の溶液を塗布
し、このポリイミド樹脂を硬化して、ポリイミド層4を
形成する。(Step 1) As shown in FIG. 1A, a flexible printed circuit board (hereinafter referred to as FPC) 1 is formed by laminating a polyimide film 2 and a copper foil conductor 3. This F
A solution of a polyimide resin is applied onto the copper foil conductor 3 of the PC 1 and the polyimide resin is cured to form the polyimide layer 4.
【0013】(工程2) 図1(b)に示すようにポリ
イミド層4に孔5を形成する。この孔5は、銅箔導体3
に達している。この孔5を形成するために、例えばエキ
シマレーザを利用すれば良い。(Step 2) As shown in FIG. 1B, holes 5 are formed in the polyimide layer 4. This hole 5 is for the copper foil conductor 3
Has reached. An excimer laser, for example, may be used to form the hole 5.
【0014】(工程3) 電気半田メッキによって、図
1(c)に示すようにポリイミド層4の孔5にバンプ6
を形成する。このとき、ポリイミド層4がメッキ液に侵
されないので、バンプ6は、ポリイミド層4の孔5の内
側にだけ形成され、所定の形状となる。(Step 3) The bumps 6 are formed in the holes 5 of the polyimide layer 4 by electric solder plating as shown in FIG.
To form. At this time, since the polyimide layer 4 is not attacked by the plating solution, the bumps 6 are formed only inside the holes 5 of the polyimide layer 4 and have a predetermined shape.
【0015】また、バンプ6がポリイミド層4から突出
するように、電気半田メッキを行う。これにより、この
バンプ6と、電子部品の端子との突き合わせが容易にな
り、このバンプ6を加熱溶融したときには、電子部品の
端子が確実に半田付けされることとなる。Further, electric solder plating is performed so that the bumps 6 project from the polyimide layer 4. This facilitates abutting of the bumps 6 with the terminals of the electronic component, and when the bumps 6 are heated and melted, the terminals of the electronic component are reliably soldered.
【0016】ところで、この実施例の製造方法によって
複数のバンプを形成し、これらのバンプの高さを測定し
て、バラツキを求めたので、この結果を表1に示す。By the way, a plurality of bumps were formed by the manufacturing method of this embodiment, and the heights of these bumps were measured to determine the variations. The results are shown in Table 1.
【0017】また、この実施例の製造方法によって形成
されたバンプと比較するために、図2に示す従来の方法
によって複数のバンプを形成し、これらのバンプについ
てもバラツキを求めて、この結果を表1に示している。
勿論、この比較を正確に行うために、この実施例の製造
方法による回路基板と、従来の方法による回路基板は、
接着剤層14を除いて、ほぼ同等にされている。In order to compare with the bump formed by the manufacturing method of this embodiment, a plurality of bumps are formed by the conventional method shown in FIG. It is shown in Table 1.
Of course, in order to make this comparison accurately, the circuit board by the manufacturing method of this embodiment and the circuit board by the conventional method are
Except for the adhesive layer 14, they are made substantially the same.
【0018】なお、この実施例の製造方法、および従来
の方法のいずれについても、バンプの高さが50μmと
なるように、電気半田メッキの電流密度と処理時間を計
算上で求めて、これらの電流密度と処理時間を設定し
た。In both the manufacturing method of this embodiment and the conventional method, the current density and processing time of the electric solder plating were calculated so that the bump height would be 50 μm. The current density and processing time were set.
【0019】[0019]
【表1】 [Table 1]
【0020】この表1から明らかなように、この実施例
の製造方法によって形成されたバンプは、予測された高
さを持っており、バラツキも小さい。これに対して、従
来の方法によって形成されたバンプは、予測された高さ
を大きく下回り、バラツキも大きい。As is clear from Table 1, the bumps formed by the manufacturing method of this embodiment have the predicted height and the variation is small. On the other hand, the bumps formed by the conventional method are much lower than the predicted height and have large variations.
【0021】[0021]
【効果】以上説明したように、この発明によれば、ポリ
イミド層を回路基板の導体に直に被着して、このポリイ
ミド層に孔を形成し、金属メッキによって、ポリイミド
層の孔にバンプを形成している。ポリイミド層は、金属
メッキによって劣化したり、メッキ液に侵されることが
ないので、このポリイミド層の孔には、所定の形状のバ
ンプが安定に形成される。As described above, according to the present invention, the polyimide layer is directly applied to the conductor of the circuit board, the holes are formed in the polyimide layer, and the bumps are formed in the holes of the polyimide layer by metal plating. Is forming. Since the polyimide layer is not deteriorated by metal plating and is not attacked by the plating solution, bumps having a predetermined shape are stably formed in the holes of the polyimide layer.
【図1】この発明に係わるバンプの製造方法の一実施例
を示す図FIG. 1 is a diagram showing an embodiment of a bump manufacturing method according to the present invention.
【図2】従来のバンプの製造方法を示す図FIG. 2 is a diagram showing a conventional bump manufacturing method.
1 フレキシブルプリント基板 2 ポリイミドフィルム 3 銅箔導体 4 ポリイミド層 5 孔 6 バンプ 1 Flexible Printed Circuit Board 2 Polyimide Film 3 Copper Foil Conductor 4 Polyimide Layer 5 Hole 6 Bump
Claims (2)
し、このポリイミド樹脂を硬化させて、回路基板の導体
を覆うポリイミド層を形成する工程と、 回路基板の導体に達する孔をポリイミド層に形成する工
程と、 回路基板の導体上に成長し、ポリイミド層から突出する
バンプを金属メッキによってポリイミド層の孔に形成す
る工程とからなる回路基板のバンプの製造方法。1. A step of applying a solution of a polyimide resin to a circuit board and curing the polyimide resin to form a polyimide layer covering a conductor of the circuit board, and forming a hole reaching the conductor of the circuit board in the polyimide layer. And a step of forming bumps that grow on the conductor of the circuit board and project from the polyimide layer in the holes of the polyimide layer by metal plating.
される回路基板のバンプであって、回路基板の導体に直
に被着したポリイミド層の孔に形成され、回路基板の導
体に接続し、ポリイミド層より突出する回路基板のバン
プ。2. A bump of a circuit board formed by the manufacturing method according to claim 1, wherein the bump is formed in a hole of a polyimide layer directly attached to the conductor of the circuit board and connected to the conductor of the circuit board. , Bumps on the circuit board protruding from the polyimide layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29684393A JPH07153797A (en) | 1993-11-26 | 1993-11-26 | Bump of circuit board and manufacturing method of it |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP29684393A JPH07153797A (en) | 1993-11-26 | 1993-11-26 | Bump of circuit board and manufacturing method of it |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH07153797A true JPH07153797A (en) | 1995-06-16 |
Family
ID=17838883
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP29684393A Pending JPH07153797A (en) | 1993-11-26 | 1993-11-26 | Bump of circuit board and manufacturing method of it |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH07153797A (en) |
-
1993
- 1993-11-26 JP JP29684393A patent/JPH07153797A/en active Pending
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