JPH07149589A - Method for forming metallic layer on surface of alumina ceramics - Google Patents
Method for forming metallic layer on surface of alumina ceramicsInfo
- Publication number
- JPH07149589A JPH07149589A JP33911293A JP33911293A JPH07149589A JP H07149589 A JPH07149589 A JP H07149589A JP 33911293 A JP33911293 A JP 33911293A JP 33911293 A JP33911293 A JP 33911293A JP H07149589 A JPH07149589 A JP H07149589A
- Authority
- JP
- Japan
- Prior art keywords
- alumina ceramics
- ceramics
- forming
- metal layer
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 40
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 title claims abstract description 31
- 238000000034 method Methods 0.000 title claims abstract description 19
- 229910052751 metal Inorganic materials 0.000 claims abstract description 43
- 239000002184 metal Substances 0.000 claims abstract description 42
- 239000010936 titanium Substances 0.000 claims abstract description 13
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 11
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 11
- 238000005219 brazing Methods 0.000 claims abstract description 9
- NFMHSPWHNQRFNR-UHFFFAOYSA-N hyponitrous acid Chemical compound ON=NO NFMHSPWHNQRFNR-UHFFFAOYSA-N 0.000 claims abstract description 9
- 150000004767 nitrides Chemical class 0.000 claims abstract description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910052802 copper Inorganic materials 0.000 claims abstract description 4
- 239000010949 copper Substances 0.000 claims abstract description 4
- 229910052709 silver Inorganic materials 0.000 claims abstract description 4
- 239000004332 silver Substances 0.000 claims abstract description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 3
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 3
- 229910052737 gold Inorganic materials 0.000 claims abstract description 3
- 239000010931 gold Substances 0.000 claims abstract description 3
- 229910052735 hafnium Inorganic materials 0.000 claims abstract description 3
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims abstract description 3
- 239000011159 matrix material Substances 0.000 claims abstract description 3
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 3
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 3
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 4
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 3
- 239000012298 atmosphere Substances 0.000 abstract description 2
- 150000003839 salts Chemical class 0.000 abstract description 2
- 238000010438 heat treatment Methods 0.000 description 5
- 229910000679 solder Inorganic materials 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000011224 oxide ceramic Substances 0.000 description 3
- 229910052574 oxide ceramic Inorganic materials 0.000 description 3
- HLJWMCUZPYEUDI-UHFFFAOYSA-L sodium hyponitrite Chemical compound [Na+].[Na+].[O-]N=N[O-] HLJWMCUZPYEUDI-UHFFFAOYSA-L 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910000833 kovar Inorganic materials 0.000 description 2
- 229910052575 non-oxide ceramic Inorganic materials 0.000 description 2
- 239000011225 non-oxide ceramic Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- IOVCWXUNBOPUCH-UHFFFAOYSA-M Nitrite anion Chemical compound [O-]N=O IOVCWXUNBOPUCH-UHFFFAOYSA-M 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Organic Chemistry (AREA)
- Ceramic Products (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、セラミックス表面に金
属層を形成する方法に関し、特にアルミナセラミックス
表面に金属層を形成する方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for forming a metal layer on the surface of ceramics, and more particularly to a method for forming a metal layer on the surface of alumina ceramics.
【０００２】[0002]
【従来の技術】アルミナセラミックスは、特性が優れて
おりしかも安価であるなどの利点から現在最も一般的に
使われているセラミックスであるが、アルミナセラミッ
クスの表面に形成された金属層は、導体として、或いは
該セラミックスと異種金属との接合のためによく用いら
れる。そのため、形成された金属層は、セラミックス表
面に対して高強度で接合されていることが必要となる。2. Description of the Related Art Alumina ceramics are the most commonly used ceramics at present due to their advantages such as excellent characteristics and low cost. However, the metal layer formed on the surface of alumina ceramics is used as a conductor. Alternatively, it is often used for joining the ceramics and dissimilar metals. Therefore, the formed metal layer needs to be bonded to the ceramic surface with high strength.
【０００３】従来のアルミナセラミックス表面への金属
層の形成方法は、高強度で接合する必要があるため、例
えば高融点金属であるＭｏ−ＭｎやＮｉ−Ｗなどから成
る金属を１５００℃程度の高温でセラミックス表面に焼
き付けて金属層を形成する方法が採られている。しかし
この方法では、製造に高温を要するため、生産効率が悪
く、歩留りを悪くしたり、製造原価を高くしたりなどの
問題があった。In the conventional method for forming a metal layer on the surface of alumina ceramics, it is necessary to bond the metal layer with high strength. Therefore, for example, a metal having a high melting point such as Mo--Mn or Ni--W is heated at a high temperature of about 1500.degree. The method of forming a metal layer by baking on a ceramic surface is adopted. However, in this method, since high temperature is required for manufacturing, there are problems such as poor production efficiency, poor yield, and high manufacturing cost.
【０００４】また、近年においては、金属層を形成する
安価で簡便な方法として、従来より使用されている銀と
銅との共晶組成から成るロウ中に、活性金属であるチタ
ンを含んだ金属ロウを使用して、８００℃前後の低い温
度でセラミックスにロウ付けする方法も採られている。Further, in recent years, as an inexpensive and simple method for forming a metal layer, a metal containing titanium as an active metal in a wax having a eutectic composition of silver and copper which has been conventionally used. A method of brazing ceramics at a low temperature of around 800 ° C. is also adopted.
【０００５】[0005]
【発明が解決しようとする課題】しかしこの方法では、
窒化珪素や炭化珪素などの非酸化物セラミックスに対し
ては、セラミックスとロウとの界面でロウ中に存在する
チタン（Ｔｉ）と、セラミックス中の窒素（Ｎ）や炭素
（Ｃ）とが、反応してＴｉＮやＴｉＣとなって強く結合
するため、高い接合強度を有する金属層が得られるが、
酸化物セラミックスに対しては、ロウ中のチタンと酸化
物セラミックス中の酸素（Ｏ）とが反応して、脆い酸化
物であるＴｉＯ及びＴｉＯ２が生成してしまい、また、
非酸化物セラミックスに比べロウの濡れ性が悪いなどの
理由のため、高い接合強度を有する金属層を得るのは難
しかった。However, in this method,
For non-oxide ceramics such as silicon nitride and silicon carbide, titanium (Ti) present in the solder at the interface between the ceramic and the solder reacts with nitrogen (N) and carbon (C) in the ceramic. Then, TiN and TiC are strongly bonded to each other, so that a metal layer having high bonding strength can be obtained.
For oxide ceramics, titanium in the wax reacts with oxygen (O) in the oxide ceramics to produce brittle oxides TiO and TiO 2 , and
It was difficult to obtain a metal layer having high bonding strength because the wettability of wax was poorer than that of non-oxide ceramics.
【０００６】この酸化物セラミックスの中でもアルミナ
セラミックスは、チタンを含んだロウの濡れ性が特に悪
く、そのため、チタンを含んだロウを用いて金属層を形
成することに対しては、実用に耐える接合強度を持つ金
属層を得るには非常に難しいという問題があった。Among these oxide ceramics, alumina ceramics has a particularly poor wettability of the titanium-containing solder, and therefore, it is practically practical to form a metal layer using the titanium-containing solder. There is a problem that it is very difficult to obtain a metal layer having strength.
【０００７】本発明は、上述した従来技術が有する課題
に鑑みなされたものであって、その目的は、アルミナセ
ラミックスに対し、チタンを含んだ金属ロウを、セラミ
ックス表面に強固にロウ付けすることができる安価で簡
便な金属層を形成する方法を提供することにある。The present invention has been made in view of the above problems of the prior art, and an object thereof is to firmly braze a metal braze containing titanium to alumina ceramics on the surface of the ceramics. An object of the present invention is to provide a method of forming a metal layer that is inexpensive and simple and that can be formed easily.
【０００８】[0008]
【課題を解決するための手段】本発明者等は、上記目的
を達成するため鋭意研究した結果、アルミナセラミック
ス表面に金属層を形成する方法として、アルミナセラミ
ックスの表面に窒化層を形成し、その面上に活性金属を
含有するロウで金属層を形成する方法を採れば目的を達
成することができるとの知見を得て、本発明を完成し
た。Means for Solving the Problems The inventors of the present invention have conducted extensive studies to achieve the above-mentioned object, and as a result, as a method of forming a metal layer on the surface of alumina ceramics, a nitride layer was formed on the surface of alumina ceramics. The present invention has been completed based on the finding that the object can be achieved by adopting a method of forming a metal layer with a wax containing an active metal on the surface.
【０００９】上記アルミナセラミックス表面に窒化層を
形成する方法としては、該セラミックスの表面に次亜硝
酸塩を塗布した後、窒素雰囲気中にて１１００〜１４５
０℃で加熱処理するものとした。A method for forming a nitride layer on the surface of the alumina ceramics is to coat the surface of the ceramics with nitrite, and then 1100 to 145 in a nitrogen atmosphere.
Heat treatment was performed at 0 ° C.
【００１０】アルミナセラミックスの表面に次亜硝酸塩
（次亜硝酸（ＨＯＮ＝ＮＯＨ）の塩〕を塗布して窒素雰
囲気中にて加熱処理することにより、アルミナ（Ａｌ２
Ｏ３）中のアルミニウム（Ａｌ）と、次亜硝酸塩中の窒
素（Ｎ）とが反応して結合し、窒化物であるＡｌＮの被
膜、即ち窒化層が形成される。By applying hyponitrite (a salt of hyponitrite (HON = NOH)) on the surface of alumina ceramics and heat-treating it in a nitrogen atmosphere, alumina (Al 2
Aluminum (Al) in O 3 ) and nitrogen (N) in hyponitrite react with each other to bond with each other to form a film of nitride AlN, that is, a nitride layer.
【００１１】また、上記次亜硝酸塩としては、例えば次
亜硝酸アンモニア、次亜硝酸ナトリウムなどがあるが、
それらをペースト状などにしてセラミックスの表面に塗
布すればよい。Examples of the above-mentioned hyponitrite include ammonia hyponitrite and sodium hyponitrite.
They may be applied in the form of paste on the surface of the ceramic.
【００１２】さらに、加熱処理する温度としては、１１
００〜１４５０℃が好ましく、１１００℃よりも低いと
アルミナセラミックス中のＡｌと次亜硝酸塩中のＮとが
反応しないので、ＡｌＮ層が形成されず、また、１４５
０℃より高いとアルミナセラミックス中の焼結助剤が滲
み出してしまうので、これ以上高くできない。Further, the heat treatment temperature is 11
The temperature is preferably from 0 to 1450 ° C., and when the temperature is lower than 1100 ° C., Al in the alumina ceramic and N in the hyponitrite do not react with each other, so that the AlN layer is not formed and 145
If the temperature is higher than 0 ° C., the sintering aid in the alumina ceramics will exude, so the temperature cannot be further increased.
【００１３】上記活性金属を含有する金属ロウとして
は、銀と銅、或いは金とニッケルから成るマトリックス
中に、チタンまたは同様の働きを持つジルコニウム、ハ
フニウム等の活性金属を含むロウであるとした。The metal wax containing the above-mentioned active metal is a wax containing titanium or an active metal such as zirconium or hafnium having a similar function in a matrix composed of silver and copper or gold and nickel.
【００１４】このロウをアルミナセラミックス表面に形
成されたＡｌＮの室化層の面上に、８００℃程度の温度
でロウ付けすると、セラミックス面に良くロウが濡れ、
さらに窒化層中のＮとロウ中のＴｉ等とが反応してその
界面にＴｉＮ等を形成し、強固に接合して金属層が形成
される。When this brazing is brazed on the surface of the AlN chambering layer formed on the surface of the alumina ceramics at a temperature of about 800 ° C., the ceramic surface is well wetted with the wax.
Further, N in the nitrided layer reacts with Ti or the like in the brazing material to form TiN or the like at the interface and firmly joins to form a metal layer.
【００１５】以上の方法を採ることにより、低温度で使
用されるチタン等を含んだ金属ロウを、アルミナセラミ
ックスに強固にロウ付けすることが出来、その結果、安
価で簡便にアルミナセラミックス表面に金属層を形成す
ることが出来る。By adopting the above method, it is possible to firmly braze the metal braze containing titanium or the like used at a low temperature to the alumina ceramics. As a result, the metal braze on the surface of the alumina ceramics is inexpensive and simple. Layers can be formed.
【００１６】[0016]
【実施例】以下、本発明の実施例を比較例と共に挙げ、
本発明をより詳細に説明する。EXAMPLES Examples of the present invention will be given below together with comparative examples.
The present invention will be described in more detail.
【００１７】（実施例１〜５）セラミックスとして１０
ｍｍ角で、厚さ３ｍｍのアルミナセラミックス〔（株）
日本セラテック社製〕を用い、その表面にスクリーン印
刷で次亜硝酸ナトリウムを塗布し、１１００〜１４５０
℃の窒素雰囲気中で加熱処理した。加熱処理後、直径３
ｍｍ、厚さ０．０５ｍｍの活性金属を含有するロウ（７
１Ａｇ−２７Ｃｕ−２Ｔｉｗｔ％）を介して、直径３ｍ
ｍのコバール〔住友特殊金属（株）社製ＫＶ−２〕を接
合し、それを引っ張ることによりアルミナセラミックス
に接合した金属層の接合強度を求めた。(Examples 1 to 5) Ceramics 10
Alumina ceramics with 3 mm thickness and 3 mm square [(Ltd.)
Nihon Ceratech Co., Ltd.] is used, and sodium hyponitrite is applied to the surface by screen printing, and 1100 to 1450
It heat-processed in the nitrogen atmosphere of (degree C). After heat treatment, diameter 3
mm and a thickness of 0.05 mm, which contains an active metal (7
1Ag-27Cu-2Tiwt%), diameter 3m
m Kovar [KV-2 manufactured by Sumitomo Special Metals Co., Ltd.] was joined, and the joint strength of the metal layer joined to the alumina ceramics was determined by pulling the joint.
【００１８】なお、この時のロウ付けは、真空雰囲気中
で８００℃に加熱処理することにより行った。また、接
合したコバールを垂直方向に引っ張り、破壊に至るまで
の引っ張り強度を測定し、その強度をロウ（金属層）の
接合強度とした。その結果を表１に示す。The brazing at this time was performed by heating at 800 ° C. in a vacuum atmosphere. Further, the joined Kovar was pulled in the vertical direction, and the tensile strength up to the fracture was measured, and the strength was taken as the brazing strength (metal layer). The results are shown in Table 1.
【００１９】（比較例１〜３）また、比較のため、実施
例と同一の材料を用い、次亜硝酸ナトリウムを塗布した
アルミナセラミックスを表１に示す温度で加熱処理した
後、実施例と同様に接合した。得られた接合体に対し
て、同じく実施例と同様に接合強度を求めた。その結果
を表１に示す。(Comparative Examples 1 to 3) For comparison, the same material as in Example was used and the alumina ceramics coated with sodium hyponitrite were heat-treated at the temperature shown in Table 1 and then the same as in Example. Joined to. The bonding strength of the obtained bonded body was determined in the same manner as in the example. The results are shown in Table 1.
【００２０】[0020]
【表１】 [Table 1]
【００２１】表１から明らかなように、実施例において
は、いずれも実用強度（５０ＭＰａ）を満たす接合体が
得られた。これに対して比較例では、加熱処理温度が規
定範囲外にあるので、満足な結果が得られなかった。As is clear from Table 1, in each of the examples, a joined body satisfying the practical strength (50 MPa) was obtained. On the other hand, in the comparative example, the heat treatment temperature was out of the specified range, so that a satisfactory result was not obtained.
【００２２】[0022]
【発明の効果】以上、説明した本発明にかかるアルミナ
セラミックス表面への金属層形成方法によれば、アルミ
ナセラミックスの表面に接合強度の高い金属層を接合す
ることが出来、その結果、アルミナセラミックス表面に
安価で簡便に金属層を形成することが出来る。As described above, according to the method for forming a metal layer on the surface of alumina ceramics according to the present invention, a metal layer having a high bonding strength can be bonded to the surface of alumina ceramics. In addition, the metal layer can be formed easily at low cost.
Claims (3)
成し、その面上に活性金属を含有する金属ロウをロウ付
けして金属層を形成することを特徴とするアルミナセラ
ミックス表面への金属層形成方法。1. A method for forming a metal layer on the surface of an alumina ceramic, comprising forming a nitride layer on the surface of the alumina ceramic and brazing a metal braze containing an active metal on the surface to form a metal layer. .
成する方法が、該セラミックスの表面に次亜硝酸塩を塗
布した後、窒素雰囲気中にて１１００〜１４５０℃で加
熱処理するものであることを特徴とする請求項１記載の
アルミナセラミックス表面への金属層形成方法。2. A method for forming a nitride layer on the surface of alumina ceramics is to apply a hyponitrite on the surface of the ceramics and then heat-treat at 1100 to 1450 ° C. in a nitrogen atmosphere. The method for forming a metal layer on the surface of an alumina ceramic according to claim 1.
いは金とニッケルから成るマトリックス中に、チタン、
ジルコニウム、ハフニウムの活性金属を含むロウである
ことを特徴とする請求項１又は２記載のアルミナセラミ
ックス表面への金属層形成方法。3. An active metal containing wax comprises titanium in a matrix of silver and copper or gold and nickel.
The method for forming a metal layer on the surface of an alumina ceramics according to claim 1 or 2, wherein the wax is a wax containing an active metal of zirconium or hafnium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33911293A JPH07149589A (en) | 1993-11-25 | 1993-11-25 | Method for forming metallic layer on surface of alumina ceramics |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP33911293A JPH07149589A (en) | 1993-11-25 | 1993-11-25 | Method for forming metallic layer on surface of alumina ceramics |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH07149589A true JPH07149589A (en) | 1995-06-13 |
Family
ID=18324379
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP33911293A Pending JPH07149589A (en) | 1993-11-25 | 1993-11-25 | Method for forming metallic layer on surface of alumina ceramics |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH07149589A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998015337A3 (en) * | 1996-10-10 | 1998-06-11 | Marcel Huder | Solid filter |
-
1993
- 1993-11-25 JP JP33911293A patent/JPH07149589A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998015337A3 (en) * | 1996-10-10 | 1998-06-11 | Marcel Huder | Solid filter |
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