JPH0714874Y2 - 真空用ｘ線定在波測定装置 - Google Patents
真空用ｘ線定在波測定装置Info
- Publication number
- JPH0714874Y2 JPH0714874Y2 JP1988113075U JP11307588U JPH0714874Y2 JP H0714874 Y2 JPH0714874 Y2 JP H0714874Y2 JP 1988113075 U JP1988113075 U JP 1988113075U JP 11307588 U JP11307588 U JP 11307588U JP H0714874 Y2 JPH0714874 Y2 JP H0714874Y2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- exhaust system
- ray
- sample
- standing wave
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988113075U JPH0714874Y2 (ja) | 1988-08-29 | 1988-08-29 | 真空用ｘ線定在波測定装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988113075U JPH0714874Y2 (ja) | 1988-08-29 | 1988-08-29 | 真空用ｘ線定在波測定装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0233350U JPH0233350U (cg-RX-API-DMAC7.html) | 1990-03-02 |
| JPH0714874Y2 true JPH0714874Y2 (ja) | 1995-04-10 |
Family
ID=31352594
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988113075U Expired - Lifetime JPH0714874Y2 (ja) | 1988-08-29 | 1988-08-29 | 真空用ｘ線定在波測定装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0714874Y2 (cg-RX-API-DMAC7.html) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62226048A (ja) * | 1986-03-28 | 1987-10-05 | Toshiba Corp | 結晶固体の分光分析方法 |
| JPS63142811A (ja) * | 1986-12-05 | 1988-06-15 | Nec Corp | 界面超構造の製造方法 |
-
1988
- 1988-08-29 JP JP1988113075U patent/JPH0714874Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0233350U (cg-RX-API-DMAC7.html) | 1990-03-02 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4169228A (en) | X-ray analyzer for testing layered structures | |
| US6041098A (en) | X-ray reflectometer | |
| US6359964B1 (en) | X-ray analysis apparatus including a parabolic X-ray mirror and a crystal monochromator | |
| JPH05188019A (ja) | Ｘ線複合分析装置 | |
| JPH05291152A (ja) | Ｘ線分析装置及びこれを用いた半導体製造装置 | |
| JPH0714874Y2 (ja) | 真空用ｘ線定在波測定装置 | |
| JP2507484B2 (ja) | 偏光全反射蛍光ｘ線構造解析装置 | |
| JPH02168149A (ja) | 光電子利用ｘ線定在波測定装置 | |
| JP2728627B2 (ja) | 波長分散型ｘ線分光装置 | |
| JP2905659B2 (ja) | Ｘ線装置と該装置を用いた評価解析方法 | |
| JPH0712763A (ja) | 表面分析方法及び表面分析装置 | |
| JPH0798285A (ja) | Ｘ線評価装置 | |
| Malhotra et al. | An in situ/ex situ X-ray analysis system for thin sputtered films | |
| JP2779525B2 (ja) | 真空成膜中の膜表面の元素組成分析方法、及び真空成膜方法 | |
| JP3004388B2 (ja) | 反射高速電子回折・軟ｘ線放射分光分析装置 | |
| JPH06160312A (ja) | Ｘ線評価装置 | |
| JPH05332958A (ja) | Ｘ線回折装置及びそれに用いる位置敏感型ガス入りｘ線計数器 | |
| SU1133519A1 (ru) | Способ определени структурных характеристик монокристаллов | |
| Eng et al. | The SUNY X21B beamline at NSLS: Spectroscopy and versatile surface science facility | |
| Gur’eva et al. | A Spectrometer for Studying Single Crystals Using the Method of Synchrotron Radiation Diffraction at Near-Backscattering Angles | |
| Engelmohr et al. | A positive ion camera for blocking and channeling studies | |
| Hoonhout et al. | Surface layer analysis by MEIS using a solid state detector | |
| JPH08178874A (ja) | 表面分析装置 | |
| JPH0599863A (ja) | Ｘ線分光装置 | |
| Yin et al. | A new mobile grazing-incidence X-ray absorption fine spectroscopy endstation at Beijing Synchrotron Radiation Facility |