JPH07138756A - Device for depositing thin film - Google Patents

Abstract

PURPOSE:To form uniform vapor deposited thin films on vapor deposition surfaces by making the distances between the vapor deposition surfaces of respective works to vapor deposition and a vapor deposition source the same at the time of simultaneously subjecting many pieces of the works to vapor deposition. CONSTITUTION:Work holding mechanisms H are provided with rotating members 14 for rotating the works around the vapor deposition surfaces while pressing and holding the non-vapor deposition surfaces of the works 25. A spherical dome 3 having a spherical part 3a formed with plural apertures 9 to be mounted with the work holding mechanisms H in the state of directing the vapor deposition surfaces of the works 25 toward the vapor deposition source 2 is disposed freely rotatably around the vapor deposition source 2. The spherical part 3a is formed to a spherical shape around the vapor deposition source 2 as a spherical center. The spherical dome 3 is rotated by a motor 7, a gear 6 and a driving gear 8. A stationary gear 10 is fixed to a vacuum vapor deposition chamber 1 above the spherical shape part 3a. The stationary member 20 and the rotating member 14 are meshed with each other and the works 25 of the work holding mechanism H are rotated by rotation of the spherical dome 3.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin film deposition apparatus for forming a deposited thin film on the outer peripheral surface of an object to be deposited.

[0002]

2. Description of the Related Art Conventionally, as a thin film deposition apparatus for forming a uniform deposited thin film on the outer peripheral surface of an object to be vapor-deposited, it is practically 4-4435.
A vapor deposition device with a rotation and revolution jig described in Japanese Patent No. 8 is known. This vapor deposition device includes a vacuum container, a vapor deposition source arranged in the vacuum container, a revolving ring member revolvable around a vapor deposition normal of the vapor deposition source as a revolution center, and radially aligned from the revolution center. A stationary shaft that holds an object to be vapor-deposited along the axis of rotation and that is locked at the end of the axis of rotation so that the angle of inclination of the axis of rotation with respect to the plane of revolution can be adjusted, and an annular inclined guide surface is formed on the outer circumference The guide ring is arranged inside the revolving ring member, and a rotation flange that rotatably abuts against the annular inclined guide surface is fixed to the rotation shaft.

In the conventional vapor deposition apparatus, a plurality of objects to be vapor-deposited are inserted through a rotating shaft to be held and fixed at equal intervals.
When the revolving ring member is revolved through the pinion to which the rotational force is transmitted from the motor, the revolving shaft locked by the revolving ring member moves together with the revolving ring and comes into contact with the annular inclined guide surface of the stationary guide ring. The rotating flange rotates. This causes the rotation shaft to rotate,
A thin film is vapor-deposited on the vapor-deposited surface around the periphery of the vapor-deposited object that rotates with the rotation shaft.

[0004]

However, according to the above-described conventional vapor deposition apparatus, the vapor deposition target needs to be inserted into the rotation shaft and held, so that the vapor deposition target has a ring-shaped structure with a hole in the center. However, there is a problem in that an object to be vapor-deposited in a shape without a hole or an object to be vapor-deposited in which a hole cannot be formed cannot be held and cannot be processed. Further, when processing by holding a large number of deposition objects in the axial direction of the rotation shaft, since each deposition object is not held at an equal distance with respect to the evaporation source, each deposition object held in the axial direction of the rotation shaft is In principle, there is a problem in that it is not possible to form a vapor-deposited thin film having the same thickness on an object to be vapor-deposited.
Furthermore, the vapor deposition material scatters from the gap between the vapor deposition objects held on the rotation shaft arranged in a radial pattern, and is easily stacked in the vapor deposition apparatus, and the deposited vapor deposition material becomes dust and dirt in the vacuum chamber. Might adhere to the vapor deposition surface and deteriorate the quality of the vapor deposition thin film.

The present invention has been made in view of the above-mentioned problems of the prior art, and there is no limitation on the shape of the object to be vapor-deposited, and even if vapor deposition is performed on a large number of objects at the same time, the vapor deposition surface of each object to be vapor-deposited is uniform. It is an object of the present invention to provide a thin film deposition apparatus capable of forming a high-quality thin film and capable of forming a thin vapor deposition thin film.

[0006]

In order to solve the above problems, the present invention provides a thin film deposition apparatus for forming a thin film by depositing a deposition substance on a deposition target in a vacuum deposition tank. A work holding mechanism provided with a rotating member for rotating an object to be vapor-deposited around the vapor-deposition surface while pressing and sandwiching the non-vapor-deposited surface,
A plurality of mounting portions for mounting the work holding mechanism with the vapor deposition surface of the vapor deposition object facing the vapor deposition source were provided, and the vapor deposition source had a spherical portion having a spherical core, and the periphery of the vapor deposition source was rotatably provided. The spherical dome, a rotating means for rotating the spherical dome, and a fixed rotating member provided in the vacuum deposition tank for rotating the rotating member of the work holding mechanism by the rotation of the spherical dome.

[0007]

According to the above structure, when the spherical dome rotates around the vapor deposition source, the work holding mechanism moves in the rotational direction of the spherical dome together with the spherical dome, and the deposition target held by the work holding mechanism is deposited by the vapor deposition. It is rotated with the surface facing the vapor deposition source, enabling vapor deposition on a polyhedron. By attaching the evaporation source to the work holding mechanism on a spherical part with a spherical core, the distance between the evaporation surface of the deposition object and the evaporation source, which is rotatably pressed and clamped by multiple work holding mechanisms mounted on the spherical dome, is uniform. Therefore, a uniform thin film can be formed on the deposition surface of the deposition target.

[0008]

[Embodiment 1] FIG. 1 is a schematic diagram showing Embodiment 1 of a thin film deposition apparatus according to the present invention, and FIG. 2 is a sectional view showing a work holding mechanism of the thin film deposition apparatus of this embodiment. [Fig. 3] is a perspective view showing an object to be vapor-deposited. In FIG. 1, reference numeral 1 denotes a vacuum vapor deposition tank of a thin film vapor deposition apparatus S, in which a vapor deposition source 2, a spherical dome 3 and the like are provided.

The spherical dome 3 is composed of a spherical portion (ceiling side) 3a and a side wall portion 3b. The spherical dome 3 is manufactured and arranged so that the distance from the vapor deposition source 2 is equal at any position on the surface of the spherical portion 3a. ing. That is, the vapor deposition source 2 is arranged at the spherical core of the spherical portion 3 a of the spherical dome 3.

The side wall portion 3b is formed in a cylindrical shape, and its lower end portion is held by a ring-shaped support member 4 so as to be rotatable and vertically movable. The support member 4 is provided so as to be vertically movable by an adjusting mechanism using a motor 5. A gear 6 is provided around the outer periphery of the side wall portion 3b, and a drive gear 8 fixed to the rotation shaft of a motor 7 is meshed with the gear 6.

The spherical portion 3a is provided at the upper end of the side wall portion 3b. A plurality of (two are shown in FIG. 1) openings 9 are provided on the spherical surface of the spherical portion 3a.
A work holding mechanism H is detachably attached to the. Although the side wall portion 3b has a cylindrical shape, a plurality of pillars may support the spherical portion 3a, and the space formed between the pillars may be surrounded by a cover.

The work holding mechanism H, as shown in FIG.
A pressing member 1 for pressing and sandwiching the box body 10 and the deposition object 25.
1 and the receiving member 12, and the pressing member 13 of the receiving member 12
And the driven gear 14 and the like.

The box body 10 is formed in a concave shape in cross section having an opening 15 on one side surface (a lower side surface in the drawing).
Further, the box body 10 has a stepped portion 1 that engages with the opening 9.
0a are provided at a plurality of positions on the outer side surface on the side of the opening 15, and the step holding portion 10a and the opening 9 of the spherical portion 3a are engaged with each other so that the work holding mechanism H can reduce the weight of the work holding mechanism H and the box 10 described above. By the engagement, it is positioned at the spherical portion 3a of the spherical dome 3 at that position.

The pressing member 11 and the receiving member 12 have pressing and holding portions 11a and 12a for holding the object to be vapor-deposited 25 and a shaft portion 11.
a bearing 16 in which the shaft portion 11a of the pressing member 11 is provided on the inner side surface of the box body 10
Are rotatably supported by the pressing member 13, and the shaft portion 12a of the receiving member 12 is rotatably opposed inside the box body 10 in a state of being held by the pressing member 13.

The pressing member 13 is the shaft portion 12 of the receiving member 12.
A holding portion 13b having a concave portion 13a for accommodating so as to prevent relative rotation of b is integrally formed with a shaft portion 13c.
A spring member 17 that applies a pressing force for holding the deposition target 25 between the pressing member 11 and the receiving member 12 is arranged in the recess 13a. The shaft portion 13c is formed to have a smaller diameter than the holding portion 13b, and is rotatably supported by a bearing 18 provided on the inner side surface of the box body 10.
The rotation shafts 19 of the receiving member 12 and the pressing member 13 are set so as to coincide with the tangent line of the spherical portion 3a of the spherical dome 3. The end portion of the shaft portion 13c is extended to the outside of the box body 10, and the driven gear 14 is fixed at the center of rotation of the end surface of the shaft portion 13c.

The driven gear 14 provides rotation to the receiving member 12 via the pressing member 13, and engages with and releases the fixed gear 20 provided above the spherical portion 3a of the spherical dome 3. ing. That is, when the spherical dome 3 is lifted by the motor 5 of the support member 4, the driven gear 14 and the fixed gear 20 mesh with each other, and the spherical dome 3
The meshing is released when is lowered.

The fixed gear 20 is formed in a ring shape, is suspended by a plurality of columns 21, and is attached to the upper and lower surfaces of the vacuum vapor deposition tank 1 in a state in which each column 21 is connected by a connecting member 22. ing.

Next, the operation of the thin film deposition apparatus S of this embodiment will be described. First, the deposition object 25 is sandwiched between the pressing holding portion 11 a of the pressing member 11 and the pressing holding portion 12 a of the receiving member 12 such that the deposition surface 25 a of the deposition target object 25 faces the opening 15 of the box 10. The pressing member 11, the material 25 to be vapor-deposited, and the receiving member 12 are held by the pressing force of the spring material 17 so as not to rotate relative to each other.

Next, with the spherical dome 3 lowered, a plurality of work holding mechanisms H for pressing and holding the object to be vapor-deposited 25 are respectively engaged with the openings 9 formed in the spherical portion 3a of the spherical dome 3 for positioning. After that, the spherical dome 3 is moved by the motor 5.
And the driven gear 14 of the work holding mechanism H and the fixed gear 20 are engaged with each other.

Thereafter, the motor 7 is driven to rotate the drive gear 8, and the rotational power of the drive gear 8 is transmitted to the spherical dome 3 via the gear 6 meshing with the drive gear 8 to rotate the spherical dome 3. . By the rotation of the spherical dome 3, the work holding mechanism H moves in the rotation direction together with the spherical dome 3 while being fixed to the spherical dome 3, and the driven gear 14 of the work holding mechanism H moves to the fixed gear 20. It is guided and rotates about the rotary shaft 19. As a result, the object to be vapor-deposited 25 that is pressed and sandwiched between the pressing member 11 and the receiving member 12.
Rotates (spins) by the driven gear 14 with the vapor deposition surface 25a facing the vapor deposition source 2, and revolves around the vapor deposition source 2 by the motor 7.

According to the thin film deposition apparatus S of this embodiment, since the deposition source 2 is arranged on the spherical core of the spherical dome 3, a plurality of objects to be deposited attached to the spherical dome 3 via the work holding mechanism H. The vapor deposition surface 25a of 25 has the same distance with respect to the vapor deposition source 2, and a uniform thin film can be formed, and since the object to be vapor-deposited 25 rotates, simultaneous polyhedron film formation becomes possible.

[0022]

Second Embodiment FIG. 4 is a sectional view showing a work holding mechanism in a thin film deposition apparatus according to a second embodiment of the present invention, and FIG. 5 is a right side view of the work holding mechanism in which a driven gear is omitted. In the figure, the same members, shapes and configurations as those of the first embodiment are designated by the same reference numerals, and the description thereof will be omitted.

Deposition object 2 of the work holding mechanism H of this embodiment
The driven gear 14 that rotates 5 is integrally formed with a pulley 30 having the same rotation center, and is rotatably attached to the side surface of the box body 10. On the other hand, a two-stage pulley 31 is integrally fixed to the end surface of the shaft portion 13c of the pressing member 13, and a transmission belt 32 is stretched between the small-diameter pulley of the two-stage pulley 31 and the pulley 30 of the driven gear 14. The rotation of the driven gear 14 can be transmitted to the pressing member 13.

Further, the work holding mechanism H is provided with the object 25 to be vapor-deposited.
A holding member 11, a receiving member 12, and a two-stage pulley fixed so that a large number (three in the figure) can be held in parallel.
A pressing member 11, a receiving member 12, and a pressing member 13 are provided so as to sandwich the pressing member 13, and these pressing members 13 are provided.
The pulley 33 is integrally fixed to the end surface of the shaft portion 13c. The pulleys 33, 33 are arranged at equal intervals from the two-stage pulley, and the transmission belt 34 is provided between the pulleys 33, 33 so as to come into contact with the outer peripheral surface of the large-diameter pulley of the two-stage pulley 31.
Are stretched, and the rotation of the driven gear 14 causes the pressing members 1 to rotate.
3 can be simultaneously transmitted. Other configurations of the work holding mechanism H and the thin film deposition apparatus S are the same as those in the first embodiment.

According to this embodiment, the transmission belts 32, 34
By using, the object to be vapor-deposited 25 can be smoothly rotated, and a mechanism for holding a plurality of objects to be vapor-deposited 25 can be configured easily, and efficient vapor deposition can be performed.

[0026]

As described above, according to the present invention, a uniform vapor deposition film can be formed on the vapor deposition surface regardless of the shape of the object to be vapor deposited. Further, even if a large number of solid objects to be vapor-deposited are vapor-deposited, the vapor-deposited film having the same thickness can be formed. Further, the deposition film is not laminated to an extra portion other than the spherical dome in the vacuum deposition tank, and the adverse effect of dust is reduced, and a high-quality deposition thin film can be obtained.

[Brief description of drawings]

FIG. 1 is a configuration diagram schematically showing a first embodiment of the present invention.

FIG. 2 is a cross-sectional view showing a work holding mechanism according to the first embodiment of the present invention.

FIG. 3 is a perspective view showing an object to be vapor-deposited.

FIG. 4 is a cross-sectional view showing a work holding mechanism in Embodiment 2 of the present invention.

5 is a right side view showing the work holding mechanism of FIG. 4 with the driven gear omitted. FIG.

[Explanation of symbols]

 1 Vacuum Deposition Tank 2 Deposition Source 3 Spherical Dome 3a Spherical Part 6 Gear 7 Motor 8 Drive Gear 9 Opening 11 Holding Member 12 Receiving Member 13 Pressing Member 14 Gear 20 Fixed Gear 25 Deposition Object 25a Deposition Surface H Work Holding Mechanism S Thin Film Vapor deposition equipment

Claims (1)

[Claims] 1. In a thin film deposition apparatus for forming a thin film by depositing a deposition substance on an object to be vapor-deposited in a vacuum vapor deposition tank, the object to be vapor-deposited around the vapor deposition surface while the non-vapor deposition surface of the object to be vapor-deposited is pressed and sandwiched. A workpiece holding mechanism provided with a rotating member for rotating, and a plurality of mounting portions for mounting the workpiece holding mechanism with the vapor deposition surface of the object to be vapor-deposited facing the vapor deposition source, and a spherical portion having the vapor deposition source as a spherical core are provided. A spherical dome which is provided around the vapor deposition source so as to be rotatable, a rotating means for rotating the spherical dome, and a rotary dome for rotating the rotary member of the work holding mechanism provided by the rotation of the spherical dome. A thin film deposition apparatus comprising a fixed rotating member.