JPH07138254A - Episulfide compound and thermosetting resin composition containing the same - Google Patents

Episulfide compound and thermosetting resin composition containing the same

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Publication number
JPH07138254A
JPH07138254A JP5287978A JP28797893A JPH07138254A JP H07138254 A JPH07138254 A JP H07138254A JP 5287978 A JP5287978 A JP 5287978A JP 28797893 A JP28797893 A JP 28797893A JP H07138254 A JPH07138254 A JP H07138254A
Authority
JP
Japan
Prior art keywords
carbon atoms
compound
episulfide compound
group
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5287978A
Other languages
Japanese (ja)
Other versions
JP3230025B2 (en
Inventor
Yoichi Ueda
陽一 上田
Takashi Morimoto
尚 森本
Shinichiro Kitayama
慎一郎 北山
Michio Suzuki
道夫 鈴木
Yoshihide Masuda
芳秀 増田
Kazuo Sakiyama
和夫 崎山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Seika Chemicals Co Ltd
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Seika Chemicals Co Ltd
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Seika Chemicals Co Ltd, Sumitomo Chemical Co Ltd filed Critical Sumitomo Seika Chemicals Co Ltd
Priority to JP28797893A priority Critical patent/JP3230025B2/en
Publication of JPH07138254A publication Critical patent/JPH07138254A/en
Application granted granted Critical
Publication of JP3230025B2 publication Critical patent/JP3230025B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/032Organic insulating material consisting of one material
    • H05K1/0333Organic insulating material consisting of one material containing S

Landscapes

  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

Abstract

PURPOSE:To provide a new compound having a specific structure and low in dielectric constant, thus capable of giving copper-clad laminated boards suitable as multilayer printed wiring boards low in dielectric constant and excellent in heat resistance and low water-absorbency to be used for high-speed operation processing. CONSTITUTION:The objective episulfide compound of formula I (n is 0-10; R and R' are each H, 1-10C alkyl, etc.; R1 to R4 are each 1-10C alkyl, 5-7C cycloalkyl, etc.). The compound of the formula I can be obtained, for example, by dehydrohalogenating reaction of a bisphenol compound of formula II such as 1,1-bis(5-t-butyl-4-hydroxy-2-methylphenyl)butane with an epihalohydrin such as epichlorohydrin in the presence of a base to produce an epoxy compound of formula III which is, in turn, reacted with a thiocyanate such as potassium thiocyanate.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はエピスルフィド化合物お
よびその熱硬化性樹脂組成物に関する。本発明の熱硬化
性樹脂組成物を用いた積層板は低誘電率、低誘電正接で
ありプリント配線板用途、特に銅張り積層板に有用であ
る。
TECHNICAL FIELD The present invention relates to an episulfide compound and a thermosetting resin composition thereof. A laminated board using the thermosetting resin composition of the present invention has a low dielectric constant and a low dielectric loss tangent, and is useful for printed wiring board applications, especially for a copper clad laminated board.

【0002】[0002]

【従来の技術】4〜10層の中多層銅張り積層板には、
従来主としてビスフェノール型エポキシ樹脂とジシアン
ジアミドの組み合わせが用いられている。近年、プリン
ト配線基板の信号速度向上の目的から樹脂の低誘電率化
が要求されてきているが、それに対して従来のエポキシ
樹脂に低誘電率の熱可塑性樹脂を組み合わせる方法が考
案されている。例えば反応性ポリブタジエン樹脂で変性
する方法、ポリテトラフルオロエチレン樹脂の粉末を分
散させる方法、アラミド繊維を基材に用いる方法等であ
る。また基材にこれまでのE- ガラスより誘電率の低い
D−ガラスや石英を用いた例も報告されている。
2. Description of the Related Art A four- to ten-layer medium-layer copper-clad laminate is
Conventionally, a combination of a bisphenol type epoxy resin and dicyandiamide has been mainly used. In recent years, a resin having a low dielectric constant has been demanded for the purpose of improving a signal speed of a printed wiring board, and a method of combining a conventional epoxy resin with a thermoplastic resin having a low dielectric constant has been devised. For example, a method of modifying with a reactive polybutadiene resin, a method of dispersing a powder of polytetrafluoroethylene resin, a method of using aramid fiber as a base material, and the like. There are also reports of examples of using D-glass or quartz, which has a lower dielectric constant than conventional E-glass, as the base material.

【0003】[0003]

【発明が解決しようとする課題】しかし、これら従来の
技術においては、エポキシ樹脂の誘電率が高いため望ま
しい低誘電率を達成するには組み合わせる熱可塑性樹脂
の占める割合が大きくなり、エポキシ樹脂の特長である
耐熱性、寸法安定性、耐薬品性等が損なわれてしまう。
また、基材にアラミド繊維や石英を使用すると銅張り積
層板のドリル穴あけ加工時にドリルの摩耗が激しい欠点
があり、D−ガラスを用いた場合ではドリル加工性の問
題はないがプリント基板の製造コストが高くなる問題が
生じる。そこで従来と全く同様の方法で低誘電率の銅張
り積層板が得られるような低誘電率の熱硬化性樹脂が切
望されていた。本発明の目的は、従来品に比べ耐熱性、
低吸水性等の物性が遜色なく、かつ低誘電率性が優れて
いる銅張り積層板、その原料となる熱硬化性化合物およ
びその組成物を提供することである。
However, in these conventional techniques, since the epoxy resin has a high dielectric constant, the proportion of the thermoplastic resin to be combined is large in order to achieve a desired low dielectric constant. The heat resistance, dimensional stability, chemical resistance, etc. are impaired.
Further, when aramid fiber or quartz is used as the base material, there is a drawback that the wear of the drill is severe during drilling of the copper-clad laminate, and when D-glass is used, there is no problem of drilling workability, but the production of printed circuit boards. There is a problem of high cost. Therefore, there has been a strong demand for a thermosetting resin having a low dielectric constant such that a copper-clad laminate having a low dielectric constant can be obtained by the completely same method as the conventional method. The object of the present invention is to improve heat resistance compared to conventional products,
It is intended to provide a copper clad laminate having excellent physical properties such as low water absorption and excellent low dielectric constant, a thermosetting compound as a raw material thereof, and a composition thereof.

【0004】[0004]

【課題を解決するための手段】本発明者等は、熱硬化性
樹脂の中で比較的低誘電率であるエピスルフィド化合物
に着目し、その骨格構造について鋭意研究を続けた結
果、特定の構造の化合物が、低誘電率性を満足すること
を見出し、本発明を完成させるに至った。即ち、本発明
は、次のとおりである。 (1)下記一般式(1):
Means for Solving the Problems The present inventors have focused their attention on an episulfide compound having a relatively low dielectric constant among thermosetting resins, and as a result of continuing diligent research on its skeletal structure, as a result, The compound was found to satisfy the low dielectric constant, and the present invention was completed. That is, the present invention is as follows. (1) The following general formula (1):

【0005】[0005]

【化2】 (式中、nは平均繰り返し数を表し、0以上10以下の
値をとる。R、R’は、それぞれ独立に水素原子、炭素
数1以上10以下のアルキル基、炭素数5以上7以下の
シクロアルキル基を含む炭素数5以上20以下のアルキ
ル基、炭素数7以上20以下のアラルキル基のいずれか
を示す。R1 、R2 、R3 、R4 は、それぞれ独立に炭
素数1以上10以下のアルキル基、炭素数5以上7以下
のシクロアルキル基、炭素数6以上20以下のアリール
基、炭素数7以上20以下のアラルキル基、炭素数1以
上10以下のアルコキシ基のいずれかを示す。)で表さ
れるエピスルフィド化合物。 (2)(1)のエピスルフィド化合物と硬化剤を必須成
分とする熱硬化性樹脂組成物。 (3)(2)の熱硬化性樹脂組成物を有機溶剤に溶解
し、それを基材に含浸せしめて得られるプリプレグと銅
箔とを加熱成形してなる銅張り積層板。
[Chemical 2] (In the formula, n represents an average number of repetitions and takes a value of 0 or more and 10 or less. R and R ′ each independently represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, and 5 to 7 carbon atoms. Indicates either an alkyl group having a carbon number of 5 to 20 including a cycloalkyl group or an aralkyl group having a carbon number of 7 to 20. R 1 , R 2 , R 3 and R 4 each independently have a carbon number of 1 or more. Any of an alkyl group having 10 or less, a cycloalkyl group having 5 to 7 carbon atoms, an aryl group having 6 to 20 carbon atoms, an aralkyl group having 7 to 20 carbon atoms, and an alkoxy group having 1 to 10 carbon atoms. The episulfide compound represented by. (2) A thermosetting resin composition containing the episulfide compound of (1) and a curing agent as essential components. (3) A copper-clad laminate obtained by dissolving the thermosetting resin composition of (2) in an organic solvent and impregnating it in a base material, and heat-molding a prepreg and a copper foil.

【0006】本発明のエピスルフィド化合物の合成法と
しては、一般式(2):
The episulfide compound of the present invention can be synthesized by the general formula (2):

【化3】 (式中、n、R、R’、R1 、R2 、R3 、R4 ,は、
一般式(1)と同様に定義される。)で表されるエポキ
シ化合物を用いて公知の方法で行うことができる。
[Chemical 3] (In the formula, n, R, R ′, R 1 , R 2 , R 3 and R 4 ,
It is defined similarly to the general formula (1). It can be carried out by a known method using an epoxy compound represented by the formula (1).

【0007】例示するとエポキシ化合物とチオシアン酸
カリウム、チオシアン酸アンモニウム塩等のチオシアン
酸塩類との反応(英国特許968424号)、エポキシ
化合物とチオ尿素類との反応(J.Polym.Sc
i.,Symposium,No.47,155(19
74))等が挙げられるがこの限りではない。さらに一
般式(2)のエポキシ化合物の合成法は、一般式
(3):
For example, a reaction between an epoxy compound and thiocyanates such as potassium thiocyanate and ammonium thiocyanate (British Patent No. 968424) and a reaction between an epoxy compound and thioureas (J. Polym. Sc).
i. , Symposium, No. 47,155 (19
74)) and the like, but not limited thereto. Furthermore, the synthetic method of the epoxy compound of the general formula (2) is as follows.

【0008】[0008]

【化4】 (式中、R、R’、R1 、R2 、R3 、R4 ,は、一般
式(1)と同様に定義される。)で表されるビスフェノ
ール類化合物とエピハロヒドリンとの塩基による脱ハロ
ゲン化水素反応といった公知の方法にて合成することが
できる。上記のビスフェノール類化合物は、米国特許第
4560808号、独国特許第2418975号等に挙
げられた方法の他に、公知のいかなる方法で得られたも
のでも用いることができる。上記ビスフェノールの一般
的な製法としては、二置換フェノール類とカルボニル化
合物とを酸触媒存在下での反応により得られることが例
示されるが、この限りではない。
[Chemical 4] (In the formula, R, R ′, R 1 , R 2 , R 3 , and R 4 are defined in the same manner as in the general formula (1).) The deprotection of the bisphenol compound represented by the general formula (1) and epihalohydrin with a base It can be synthesized by a known method such as a hydrogen halide reaction. The bisphenol compound may be obtained by any known method in addition to the methods described in US Pat. No. 4,560,808 and DE 2418975. As a general method for producing the bisphenol, it is exemplified that it can be obtained by reacting a disubstituted phenol with a carbonyl compound in the presence of an acid catalyst, but it is not limited to this.

【0009】上記ビスフェノールの原料となる二置換フ
ェノール類とは、フェノールのべンゼン環上の水素原子
が2個置換された化合物が該当し、例示するとキシレノ
ール、メチルエチルフェノール、メチルプロピルフェノ
ール、メチルイソプロピルフェノール、メチルブチルフ
ェノール、メチル-t- ブチルフェノール、メチルアミル
フェノール、メチルヘキシルフェノール、ジエチルフェ
ノール、ジプロピルフェノール、ジブチルフェノール、
ジ- t- ブチルフェノール、ジ- t- アミルフェノール
等を代表とするジアルキルフェノールの各種異性体、ま
たは、メトキシクレゾール、エトキシクレゾール、プロ
ポキシクレゾール等を代表とするアルキルアルコキシフ
ェノールの各種異性体、または、シクロぺンチルクレゾ
ール、、シクロヘキシルクレゾール等を代表とするアル
キルシクロアルキルフェノールの各種異性体、あるいは
アルキルアリールフェノール、アルキルアラルキルフェ
ノール等の二置換フェノールが挙げられる。該二置換フ
ェノールのなかでも、低誘電率化のためにより好ましい
ものとして、2−t-ブチル−5−メチルフェノール、
2,6−キシレノール、2−t−ブチル−4−メチルフ
ェノール、2,4−ジ(t−ブチル)フェノール、2,
4−ジ(t−アミル)フェノール、2−シクロヘキシル
−5−メチルフェノール等を例示することができる。
The above-mentioned disubstituted phenols as raw materials of bisphenol are compounds in which two hydrogen atoms on the benzene ring of phenol are substituted, and exemplify xylenol, methylethylphenol, methylpropylphenol and methylisopropyl. Phenol, methylbutylphenol, methyl-t-butylphenol, methylamylphenol, methylhexylphenol, diethylphenol, dipropylphenol, dibutylphenol,
Various isomers of dialkylphenol typified by di-t-butylphenol and di-t-amylphenol, various isomers of alkylalkoxyphenol typified by methoxycresol, ethoxycresol, propoxycresol, and cyclo. Examples thereof include various isomers of alkylcycloalkylphenol typified by pentylcresol, cyclohexylcresol, and disubstituted phenols such as alkylarylphenol and alkylaralkylphenol. Among the disubstituted phenols, 2-t-butyl-5-methylphenol, more preferable one for lowering the dielectric constant,
2,6-xylenol, 2-t-butyl-4-methylphenol, 2,4-di (t-butyl) phenol, 2,
Examples thereof include 4-di (t-amyl) phenol and 2-cyclohexyl-5-methylphenol.

【0010】上記ビスフェノールの原料となるカルボニ
ル化合物とは、カルボニル基を1つ有する化合物が該当
し、例示するとホルムアルデヒド、およびアセトアルデ
ヒド、プロピオンアルデヒド、ブチルアルデヒド、ペン
チルアルデヒド等に代表されるアルキルアルデヒド、シ
クロペンタンカルバルデヒド、シクロヘキサンカルバル
デヒド、メチルシクロヘキサンカルバルデヒド、シクロ
ヘキシルアセトアルデヒド、シクロヘプタンカルバルデ
ヒド等に代表されるシクロアルキルアルデヒド、ベンジ
ルアルデヒド、フェニルプロピオンアルデヒド、2−メ
チル−3−(4−イソプロピルフェニル)プロピオンア
ルデヒド、2−メチル−3−(4−t−ブチルフェニ
ル)プロピオンアルデヒド等に代表されるアラルキルア
ルデヒドまたはアセトン、メチルエチルケトン、メチル
イソブチルケトン、シクロヘキサノン等に代表されるケ
トンが挙げられる。該カルボニル化合物の中でも、低誘
電率化のためにより好ましいものとして、プロピオンア
ルデヒド、ブチルアルデヒド、ペンチルアルデヒド、シ
クロヘキサンカルバルデヒド等を例示することができ
る。また、上記アルデヒドの代わりに、上記のアルデヒ
ドのアセタールを用いることも可能である。
The above-mentioned carbonyl compound as a raw material of bisphenol is a compound having one carbonyl group, for example, formaldehyde and alkyl aldehydes such as acetaldehyde, propionaldehyde, butyraldehyde, pentyl aldehyde, and cyclopentane. Carbaldehyde, cyclohexanecarbaldehyde, methylcyclohexanecarbaldehyde, cyclohexylacetaldehyde, cycloheptanecarbaldehyde, and other cycloalkylaldehydes, benzylaldehyde, phenylpropionaldehyde, 2-methyl-3- (4-isopropylphenyl) propionaldehyde, Aralkyl aldehyde or acetone represented by 2-methyl-3- (4-t-butylphenyl) propionaldehyde Emissions, methyl ethyl ketone, ketones typified by methyl isobutyl ketone, cyclohexanone and the like. Among the carbonyl compounds, propionaldehyde, butyraldehyde, pentylaldehyde, cyclohexanecarbaldehyde and the like can be exemplified as more preferable ones for lowering the dielectric constant. Moreover, it is also possible to use the acetal of the said aldehyde instead of the said aldehyde.

【0011】本発明のエピスルフィド化合物において、
一般式(1)の平均繰り返し数nは0以上10以下の任
意の値をとりえるが、エピスルフィド化合物の操作性や
硬化反応速度を損なわないために、nは、0以上3以下
であることが好ましい。
In the episulfide compound of the present invention,
The average number of repetitions n in the general formula (1) can take any value of 0 or more and 10 or less, but n is 0 or more and 3 or less in order not to impair the operability of the episulfide compound and the curing reaction rate. preferable.

【0012】本発明の熱硬化性樹脂組成物において用い
られる硬化剤としては、公知のエポキシ樹脂硬化剤が使
用可能であり、例えば、フェノールノボラック、クレゾ
ールノボラック、ジシクロペンタジエン−フェノール反
応生成物、フェノール変性ポリブタジエン等の多価フェ
ノール類、芳香族アミン、脂肪族アミン等のアミン系硬
化剤、酸無水物、ジシアンジアミド、ヒドラジド化合物
等が挙げられる。好ましくは、芳香族アミンあるいは多
価フェノール類である。またその配合量についてはエピ
スルフィド基に対して0.01〜1.2当量が好まし
い。
As the curing agent used in the thermosetting resin composition of the present invention, known epoxy resin curing agents can be used. Examples thereof include phenol novolac, cresol novolac, dicyclopentadiene-phenol reaction product, and phenol. Examples thereof include polyhydric phenols such as modified polybutadiene, amine curing agents such as aromatic amines and aliphatic amines, acid anhydrides, dicyandiamide, hydrazide compounds and the like. Aromatic amines and polyphenols are preferred. Further, the blending amount thereof is preferably 0.01 to 1.2 equivalents with respect to the episulfide group.

【0013】また、本発明の効果を損なわない程度に、
従来公知の二官能エポキシ樹脂、多官能エポキシ樹脂、
他の熱硬化性樹脂あるいは官能基を有する熱可塑性樹脂
等を併用することも可能である。具体的には、ビスフェ
ノールAのグリシジルエーテル、テトラブロモビスフェ
ノールAのグリシジルエーテル、フェノールノボラック
のグリシジルエーテル、クレゾールノボラックのグリシ
ジルエーテル、ブロモ化フェノールノボラックのグリシ
ジルエーテル、シアネート樹脂、マレイミド樹脂、グリ
シジル修飾ポリブタジエン、無水マレイン酸修飾ポリエ
チレン等である。
Further, to the extent that the effects of the present invention are not impaired,
Conventionally known bifunctional epoxy resin, polyfunctional epoxy resin,
It is also possible to use another thermosetting resin or a thermoplastic resin having a functional group in combination. Specifically, glycidyl ether of bisphenol A, glycidyl ether of tetrabromobisphenol A, glycidyl ether of phenol novolac, glycidyl ether of cresol novolac, glycidyl ether of brominated phenol novolac, cyanate resin, maleimide resin, glycidyl modified polybutadiene, anhydrous Examples include maleic acid-modified polyethylene.

【0014】本発明では、目的に応じて組成物中に硬化
促進剤、難燃剤、表面処理剤等の公知の添加剤を加えて
も良い。硬化促進剤としてはイミダゾール類、三級アミ
ン類、リン系化合物を、難燃剤としては三酸化アンチモ
ン、水酸化アルミ、赤リン等を、表面処理剤としてはシ
ランカップリング剤を挙げることができる。
In the present invention, known additives such as a curing accelerator, a flame retardant and a surface treatment agent may be added to the composition depending on the purpose. Examples of the curing accelerator include imidazoles, tertiary amines and phosphorus compounds, examples of the flame retardant include antimony trioxide, aluminum hydroxide and red phosphorus, and examples of the surface treatment agent include silane coupling agents.

【0015】本発明の銅張り積層板の作成は公知の方法
に従って行うことができる。即ち、本発明の熱硬化性樹
脂組成物を有機溶剤に溶解した樹脂ワニスを基材に含浸
させ、熱処理してプリプレグとした後に、プリプレグと
銅箔とを積層加熱成形して銅張り積層板とする方法であ
る。
The copper-clad laminate of the present invention can be prepared by a known method. That is, a base material is impregnated with a resin varnish obtained by dissolving the thermosetting resin composition of the present invention in an organic solvent, and after heat treatment to form a prepreg, a prepreg and a copper foil are laminated and heat-molded to form a copper-clad laminate. Is the way to do it.

【0016】使用される有機溶剤はアセトン、メチルエ
チルケトン、メチルイソブチルケトン、エチレングリコ
ールモノメチルエーテル、プロピレングリコールモノメ
チルエーテル、トルエン、キシレン、N,N−ジメチル
ホルムアミド、ジオキサン、テトラヒドロフラン等の中
から単独あるいは二種以上の混合溶媒として選択され
る。
The organic solvent used is acetone, methyl ethyl ketone, methyl isobutyl ketone, ethylene glycol monomethyl ether, propylene glycol monomethyl ether, toluene, xylene, N, N-dimethylformamide, dioxane, tetrahydrofuran, etc., alone or in combination of two or more. Is selected as a mixed solvent of.

【0017】樹脂ワニスを含浸させる基材はガラス繊
維、ポリエステル繊維、ポリアミド繊維等の無機繊維、
有機繊維からなる織布、もしくは不織布またはマット、
紙等でありこれらを単独あるいは組み合わせて用いられ
る。プリプレグの熱処理条件は使用する溶剤、添加触
媒、各種添加剤の種類や使用量に応じて適宜選択される
が通常80℃〜220℃の温度で3分〜30分といった
条件で行われる。加熱成形条件は150℃〜300℃の
温度で10kg/cm2 〜100kg/cm2 の成形圧
で20分〜300分の熱プレス成形が例示される。
The base material impregnated with the resin varnish is an inorganic fiber such as glass fiber, polyester fiber or polyamide fiber,
Woven cloth made of organic fibers, or non-woven cloth or mat,
Paper or the like may be used alone or in combination. The heat treatment conditions for the prepreg are appropriately selected depending on the solvent used, the catalyst added, and the types and amounts of various additives used, but are usually at a temperature of 80 ° C. to 220 ° C. for 3 minutes to 30 minutes. Heat molding conditions are exemplified 20 to 300 minutes of thermal press molding at a molding pressure of 10kg / cm 2 ~100kg / cm 2 at a temperature of 0.99 ° C. to 300 ° C..

【0018】[0018]

【実施例】以下に本発明の実施例を示すが、本発明はこ
れらに限定されるものではない。例中、エポキシ当量と
は、エポキシ基1個あたりのエポキシ樹脂の分子量で定
義され、OH当量とはOH基1個あたりのOH化合物の
分子量で定義される。 合成例1 本合成例は、本発明のエピスルフィド化合物の原料とな
るエポキシ化合物の製法に関するものである。1,1−
ビス(5−t−ブチル−4−ヒドロキシ−2−メチルフ
ェニル)ブタン573g(3OHmol、OH当量19
1g/eq.)、エピクロロヒドリン1942.5g
(21mol)、ジメチルスルホキシド976.5g
を、温度計、攪拌装置、分離管付きコンデンサーを付け
た5リットル4つ口平底フラスコに仕込み、48℃、4
1torrの条件下で8.6%苛性ソーダ水溶液24
6.9g(3mol)を4時間かけて滴下する。この
間、温度は48℃に保ちながら、共沸するエピクロロヒ
ドリンと水を冷却液化し、有機層を反応系内に戻しなが
ら反応させた。反応終了後は、未反応のエピクロロヒド
リンを減圧濃縮により除去し、副生塩とジメチルスルホ
キシドを含むエポキシ化物をメチルイソブチルケトンに
溶解させ、副生塩とジメチルスルホキシドを温水洗浄に
より除去した。減圧下で溶媒を除くことにより、エポキ
シ化合物715.5gを得た。このようにして得られた
エポキシ化合物のエポキシ当量は、260g/eqであ
った。赤外吸収スペクトル測定の結果フェノール性OH
の吸収3200−3600cm-1は消失し、エポキシド
の吸収である1240、910cm-1の吸収を有するこ
とが確認された。また、高速液体クロマトグラフィー測
定により決定された平均繰り返し数nは0.10であっ
た。
EXAMPLES Examples of the present invention will be shown below, but the present invention is not limited thereto. In the examples, the epoxy equivalent is defined as the molecular weight of the epoxy resin per epoxy group, and the OH equivalent is defined as the molecular weight of the OH compound per OH group. Synthesis Example 1 This synthesis example relates to a method for producing an epoxy compound which is a raw material for the episulfide compound of the present invention. 1,1-
573 g of bis (5-t-butyl-4-hydroxy-2-methylphenyl) butane (3 OHmol, OH equivalent 19
1 g / eq. ), Epichlorohydrin 1942.5 g
(21 mol), dimethyl sulfoxide 976.5 g
Was charged into a 5 liter 4-necked flat bottom flask equipped with a thermometer, a stirrer, and a condenser with a separation tube, and the temperature was 48 ° C and 4
8.6% caustic soda solution 24 under 1 torr condition
6.9 g (3 mol) is added dropwise over 4 hours. During this time, while keeping the temperature at 48 ° C., the azeotropically-formed epichlorohydrin and water were cooled and liquefied, and the reaction was performed while returning the organic layer into the reaction system. After the reaction was completed, unreacted epichlorohydrin was removed by concentration under reduced pressure, the epoxidized product containing a byproduct salt and dimethylsulfoxide was dissolved in methyl isobutyl ketone, and the byproduct salt and dimethylsulfoxide were removed by washing with warm water. By removing the solvent under reduced pressure, 715.5 g of an epoxy compound was obtained. The epoxy equivalent of the epoxy compound thus obtained was 260 g / eq. Results of infrared absorption spectrum measurement Phenolic OH
Absorption 3200-3600Cm -1 disappeared, to have absorption 1240,910Cm -1 is the absorption of epoxide was confirmed. The average number of repetitions n determined by high performance liquid chromatography measurement was 0.10.

【0019】実施例1 本実施例は、合成例1で得られたエポキシ化合物とチオ
尿素との反応によりエピスルフィド化合物を得る方法に
関するものである。合成例1で得られたエポキシ化合物
594.0g(2.40mol)、塩化メチレン100
0g、メタノール1000gを、温度計、冷却管および
攪拌装置を付けた5リットル4つ口丸底フラスコに仕込
み、室温で溶解させた。溶解後、チオ尿素274.5g
(3.6mol)を加え4時間撹拌を行い溶解させた。
引き続き3時間撹拌を続けた後、イオン交換水1000
gを仕込んで水洗し、分液後の下層を濃縮して油状物を
得た。さらにトルエン500gを加えて冷却し、析出物
を濾別して白色固体118gを得た。赤外吸収スペクト
ル測定の結果エポキシドの吸収である1240、910
cm-1の吸収はほとんど消失し、エピスルフィドの吸収
である620cm-1の吸収を有することが確認された。
またマススペクトルの測定から526のフラグメントピ
ークが観測された。
Example 1 This example relates to a method for obtaining an episulfide compound by reacting the epoxy compound obtained in Synthesis Example 1 with thiourea. 594.0 g (2.40 mol) of the epoxy compound obtained in Synthesis Example 1, 100 methylene chloride
0 g and 1000 g of methanol were charged into a 5 liter four-necked round bottom flask equipped with a thermometer, a condenser and a stirrer and dissolved at room temperature. After dissolution, thiourea 274.5g
(3.6 mol) was added and stirred for 4 hours to dissolve.
After continuously stirring for 3 hours, deionized water 1000
g was charged and washed with water, and the lower layer after liquid separation was concentrated to obtain an oily substance. Further, 500 g of toluene was added and cooled, and the precipitate was filtered off to obtain 118 g of a white solid. As a result of infrared absorption spectrum measurement, absorption of epoxide 1240 and 910
absorption of cm -1 is almost disappeared, it was confirmed that the absorption of the 620 cm -1 is the absorption of the episulfide.
Further, from the measurement of the mass spectrum, 526 fragment peaks were observed.

【0020】比較合成例 ビスフェノールAのエポキシ化物(商品名スミエポキシ
ELA−128、住友化学工業(株)製、エポキシ当量
187g/eq)500g(2.69mol)、塩化メ
チレン1000g、メタノール1000gを、温度計、
冷却管および攪拌装置を付けた5リットル4つ口丸底フ
ラスコに仕込み、室温で溶解させた。溶解後、チオ尿素
304.0g(4.03mol)を加え5時間撹拌を行
い溶解、反応させた。イオン交換水1000gを仕込ん
で水洗し、分液後の下層を濃縮して油状物を得た。さら
に塩化メチレン275gを加えて再溶解し、n−ヘキサ
ン450gを加えて洗浄し、分液後の上層を濃縮して白
色固体145.7gを得た。赤外吸収スペクトル測定の
結果エポキシドの吸収である1240、910cm -1
吸収はほとんど消失し、エピスルフィドの吸収である6
20cm-1の吸収を有することが確認された。またマス
スペクトルの測定から372、656のフラグメントピ
ークが観測された。
Comparative Synthesis Example Epoxy compound of bisphenol A (trade name Sumiepoxy
ELA-128, Sumitomo Chemical Co., Ltd., epoxy equivalent
187 g / eq) 500 g (2.69 mol), chloride
1000 g of ethylene, 1000 g of methanol, thermometer,
5 liter 4-neck round bottom with cooling tube and stirrer
It was placed in a Rasco and dissolved at room temperature. After dissolution, thiourea
Add 304.0 g (4.03 mol) and stir for 5 hours.
It was dissolved and reacted. Charge 1000g of deionized water
After washing with water and separating the lower layer, the lower layer was concentrated to obtain an oily substance. Furthermore
275 g of methylene chloride was added to and redissolved in n-hexa
450g of water was added for washing, and the upper layer after separation was concentrated to white.
145.7 g of a colored solid was obtained. Infrared absorption spectrum measurement
Result is the absorption of epoxide 1240, 910 cm -1of
Absorption almost disappeared, and it is absorption of episulfide 6
20 cm-1It was confirmed to have absorption of. Again mass
From the spectrum measurement, 372,656 fragment fragments
Was observed.

【0021】実施例2〜5 実施例1で得られたエピスルフィド樹脂と、フェノール
ノボラック樹脂(商品名タマノル758、荒川化学工業
(株)製)またはフェノール変性ポリブタジエン(商品
名PP−700−300、日本石油(株)製)とを表1
に示す割合で配合し、ジメチルホルムアミドに溶解し
た。さらに表1に示す量の2−エチル−4−メチルイミ
ダゾールを添加し、均一に溶解させた後ジメチルホルム
アミドを留去しながら加熱して樹脂単独硬化物を得た。
硬化物のガラス転移温度および室温の誘電率、誘電正接
を測定し、結果を表1に示す。ガラス転移温度(Tg)
は島津製作所製熱分析装置DT−30を用いて熱膨張曲
線の変曲点から求めた。室温の誘電率および誘電正接は
横河ヒューレットパッカード社(株)製、4275AM
ulti−Frequency LCR meterを
用い、誘電率の値はサンプルの静電容量から算出した。
Examples 2 to 5 The episulfide resin obtained in Example 1 and a phenol novolac resin (trade name: TAMANOR 758, manufactured by Arakawa Chemical Industry Co., Ltd.) or phenol-modified polybutadiene (trade name: PP-700-300, Japan) Table 1 with Petroleum Co., Ltd.
Were blended in the proportions shown in and dissolved in dimethylformamide. Further, 2-ethyl-4-methylimidazole in the amount shown in Table 1 was added and uniformly dissolved, and then heated while distilling dimethylformamide to obtain a resin-only cured product.
The glass transition temperature of the cured product and the dielectric constant and dielectric loss tangent at room temperature were measured, and the results are shown in Table 1. Glass transition temperature (Tg)
Was calculated from the inflection point of the thermal expansion curve using a thermal analyzer DT-30 manufactured by Shimadzu Corporation. Room temperature permittivity and loss tangent are 4275AM, manufactured by Yokogawa Hewlett-Packard Co., Ltd.
The value of the dielectric constant was calculated from the capacitance of the sample using an ultra-frequency LCR meter.

【0022】比較例1 比較合成例で得られたエピスルフィド樹脂とフェノール
ノボラック樹脂(前出の商品名タマノル758)とを表
1の割合で配合し、実施例2〜5と同様にして樹脂硬化
物を得た。硬化物のガラス転移温度および室温の誘電
率、誘電正接を実施例2〜5と同様にして測定し、結果
を表1に示す。
Comparative Example 1 The episulfide resin obtained in the comparative synthesis example and the phenol novolac resin (Tamanor 758, trade name mentioned above) were blended in the proportions shown in Table 1, and cured resin products were prepared in the same manner as in Examples 2-5. Got The glass transition temperature of the cured product, the dielectric constant at room temperature, and the dielectric loss tangent were measured in the same manner as in Examples 2 to 5, and the results are shown in Table 1.

【0023】実施例6、7 実施例1で得られたエピスルフィド樹脂と、テトラブロ
モビスフェノールAのエポキシ化物(商品名スミエポキ
シESB−400、住友化学工業(株)製、エポキシ当
量398g/eq)、フェノールノボラック樹脂(前出
の商品名タマノル758)またはフェノール変性ポリブ
タジエン(前出の商品名PP−700−300)、2-エ
チル-4- メチルイミダゾールを表−2に示す割合で配合
しジメチルホルムアミドに溶解して均一な樹脂ワニスと
した。該ワニスをガラスクロス(商品名KS−1600
S962LP,鐘紡(株)製)に含浸し、150℃の熱
風乾燥器で5〜10分処理してプリプレグを得た。プリ
プレグ5枚と銅箔(TTAI処理35μ厚、古河サーキ
ットホイル(株)製)を重ね合わせ、170℃×50k
g/cm2 ×120分熱プレス成形して1mm厚の銅張
り積層板を得た。積層板の半田耐熱性、煮沸吸水率はJ
IS−C−6481に準じて測定した。ガラス転移温度
(Tg)は島津製作所製熱分析装置DT−30を用いて
熱膨張曲線の変曲点から求めた。室温の誘電率および誘
電正接は横河ヒューレットパッカード社(株)製、42
75A Multi−Frequency LCR m
eterを用い、誘電率の値はサンプルの静電容量から
算出した。測定結果を表2に示す。
Examples 6 and 7 The episulfide resin obtained in Example 1 and an epoxidized product of tetrabromobisphenol A (trade name Sumiepoxy ESB-400, manufactured by Sumitomo Chemical Co., Ltd., epoxy equivalent 398 g / eq), phenol Novolak resin (Tamanor 758, trade name above) or phenol-modified polybutadiene (PP-700-300, trade name above) and 2-ethyl-4-methylimidazole were mixed in the proportions shown in Table-2 and dissolved in dimethylformamide. To obtain a uniform resin varnish. Glass varnish (trade name KS-1600)
S962LP, manufactured by Kanebo Co., Ltd., was impregnated and treated with a hot air dryer at 150 ° C. for 5 to 10 minutes to obtain a prepreg. 5 sheets of prepreg and copper foil (TTAI treated 35μ thick, Furukawa Circuit Foil Co., Ltd.) are piled up and 170 ℃ × 50k
Hot press molding was performed for g / cm 2 × 120 minutes to obtain a copper-clad laminate having a thickness of 1 mm. Solder heat resistance and boiling water absorption of laminated board are J
It was measured according to IS-C-6481. The glass transition temperature (Tg) was determined from the inflection point of the thermal expansion curve using a thermal analyzer DT-30 manufactured by Shimadzu Corporation. The room temperature dielectric constant and dielectric loss tangent are 42, manufactured by Yokogawa Hewlett-Packard Co., Ltd.
75A Multi-Frequency LCR m
The value of the dielectric constant was calculated from the capacitance of the sample by using eter. The measurement results are shown in Table 2.

【0024】比較例2 エポキシ樹脂にブロモ化エポキシ樹脂(住友化学工業
(株)製、商品名スミエポキシESB−500、エポキ
シ当量 472g/eq)およびクレゾールノボラック
型エポキシ樹脂(住友化学工業(株)製、商品名スミエ
ポキシESCN−220、エポキシ当量215g/e
q)を用いジシアンジアミドおよび2-エチル−4−メチ
ルイミダゾールを表2に示す割合で配合しメチルエチル
ケトンとエチレングリコールモノメチルエーテルの混合
溶媒に溶解して均一な樹脂ワニスとした。該ワニスをガ
ラスクロス(前出の商品名KS−1600S962L
P)に含浸し、150℃の熱風乾燥器で5〜10分処理
してプリプレグを得た。プリプレグ5枚と銅箔(TTA
I処理35μ厚、古河サーキットホイル(株)製)を重
ね合わせ、170℃×50kg/cm2 ×120分熱プ
レス成形して1mm厚の銅張り積層板を得た。積層板の
物性を実施例6、7と同様に測定し結果を表2に示す。
Comparative Example 2 Epoxy resin with brominated epoxy resin (Sumitomo Chemical Co., Ltd., trade name Sumiepoxy ESB-500, epoxy equivalent 472 g / eq) and cresol novolac type epoxy resin (Sumitomo Chemical Co., Ltd., Product name Sumi Epoxy ESCN-220, Epoxy equivalent 215g / e
q) and dicyandiamide and 2-ethyl-4-methylimidazole were mixed in the proportions shown in Table 2 and dissolved in a mixed solvent of methyl ethyl ketone and ethylene glycol monomethyl ether to form a uniform resin varnish. The varnish is glass cloth (trade name KS-1600S962L mentioned above).
P) was impregnated and treated with a hot air dryer at 150 ° C. for 5 to 10 minutes to obtain a prepreg. 5 sheets of prepreg and copper foil (TTA
I treatment of 35 μm thick, Furukawa Circuit Foil Co., Ltd. was overlaid and subjected to hot press molding at 170 ° C. × 50 kg / cm 2 × 120 minutes to obtain a 1 mm thick copper clad laminate. The physical properties of the laminate were measured in the same manner as in Examples 6 and 7, and the results are shown in Table 2.

【0025】[0025]

【表1】 [Table 1]

【0026】[0026]

【表2】 [Table 2]

【0027】[0027]

【発明の効果】かくして得られた本発明のエピスルフィ
ド化合物を用いた銅張り積層板は、従来のものに比べ低
誘電率であり、かつ耐熱性、低吸水性にも優れるため特
に高速演算処理用の多層プリント配線板に好適である。
The thus obtained copper clad laminate using the episulfide compound of the present invention has a lower dielectric constant than conventional ones, and is also excellent in heat resistance and low water absorption, and is therefore particularly suitable for high speed arithmetic processing. It is suitable for the multilayer printed wiring board.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 北山 慎一郎 茨城県つくば市北原6 住友化学工業株式 会社内 (72)発明者 鈴木 道夫 兵庫県加古郡播磨町宮西346番地の1 住 友精化株式会社内 (72)発明者 増田 芳秀 兵庫県加古郡播磨町宮西346番地の1 住 友精化株式会社内 (72)発明者 崎山 和夫 大阪市中央区北浜4丁目7番28号 住友精 化株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Shinichiro Kitayama 6 Kitahara, Tsukuba-shi, Ibaraki Sumitomo Chemical Co., Ltd. (72) Inventor Michio Suzuki 1 346 Miyanishi, Harima-cho, Kako-gun, Hyogo (72) Inventor Yoshihide Masuda No. 1 346 Miyanishi, Harima-cho, Kako-gun, Hyogo Sumitomo Seika Co., Ltd. (72) Inventor Kazuo Sakiyama 4-7 28 Kitahama, Chuo-ku, Osaka Sumitomo Seika Co., Ltd. Within

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】一般式(1): 【化1】 (式中、nは平均繰り返し数を表し、0以上10以下の
値をとる。R、R’は、それぞれ独立に水素原子、炭素
数1以上10以下のアルキル基、炭素数5以上7以下の
シクロアルキル基を含む炭素数5以上20以下のアルキ
ル基、炭素数7以上20以下のアラルキル基のいずれか
を示す。 R1 、R2 、R3 、R4 は、それぞれ独立に
炭素数1以上10以下のアルキル基、炭素数5以上7以
下のシクロアルキル基、炭素数6以上20以下のアリー
ル基、炭素数7以上20以下のアラルキル基、炭素数1
以上10以下のアルコキシ基のいずれかを示す。)で表
されるエピスルフィド化合物。
1. General formula (1): (In the formula, n represents an average number of repetitions and takes a value of 0 or more and 10 or less. R and R ′ each independently represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms, and 5 to 7 carbon atoms. It represents either an alkyl group having 5 to 20 carbon atoms, including a cycloalkyl group, or an aralkyl group having 7 to 20 carbon atoms, wherein R 1 , R 2 , R 3 , and R 4 are each independently 1 or more carbon atoms. An alkyl group having 10 or less, a cycloalkyl group having 5 to 7 carbon atoms, an aryl group having 6 to 20 carbon atoms, an aralkyl group having 7 to 20 carbon atoms, and 1 carbon atom
It represents any of the above alkoxy groups of 10 or less. ) An episulfide compound represented by.
【請求項2】一般式(1)におけるR1 、R3 がそれぞ
れ独立に炭素数4以上10以下のアルキル基あるいは炭
素数5以上7以下のシクロアルキル基であり、R2 、R
4 がそれぞれ独立に炭素数1以上10以下のアルキル基
あるいは炭素数5以上7以下のシクロアルキル基である
請求項1記載のエピスルフィド化合物。
2. R 1 and R 3 in the general formula (1) are each independently an alkyl group having 4 to 10 carbon atoms or a cycloalkyl group having 5 to 7 carbon atoms, and R 2 and R 3
The episulfide compound according to claim 1, wherein 4 are each independently an alkyl group having 1 to 10 carbon atoms or a cycloalkyl group having 5 to 7 carbon atoms.
【請求項3】一般式(1)におけるR1 、R3 がt−ブ
チル基であり、R2 、R4 が炭素数1以上10以下のア
ルキル基である請求項1記載のエピスルフィド化合物。
3. The episulfide compound according to claim 1 , wherein R 1 and R 3 in the general formula (1) are t-butyl groups, and R 2 and R 4 are alkyl groups having 1 to 10 carbon atoms.
【請求項4】請求項1、2または3記載のエピスルフィ
ド化合物と硬化剤を必須成分とする熱硬化性樹脂組成
物。
4. A thermosetting resin composition comprising the episulfide compound according to claim 1, 2 or 3 and a curing agent as essential components.
【請求項5】請求項4の熱硬化性樹脂組成物を有機溶剤
に溶解し、それを基材に含浸せしめて得られるプリプレ
グと銅箔とを加熱成形してなる銅張り積層板。
5. A copper-clad laminate obtained by heat-molding a prepreg obtained by dissolving the thermosetting resin composition of claim 4 in an organic solvent and impregnating it in a base material and copper foil.
JP28797893A 1993-11-17 1993-11-17 Episulfide compound, thermosetting resin composition containing the same Expired - Fee Related JP3230025B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28797893A JP3230025B2 (en) 1993-11-17 1993-11-17 Episulfide compound, thermosetting resin composition containing the same

Publications (2)

Publication Number Publication Date
JPH07138254A true JPH07138254A (en) 1995-05-30
JP3230025B2 JP3230025B2 (en) 2001-11-19

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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000327677A (en) * 1999-03-16 2000-11-28 Mitsubishi Gas Chem Co Inc Preservation of episulfide compound
JP2000336087A (en) * 1999-03-19 2000-12-05 Mitsubishi Gas Chem Co Inc Purification of episulfide compound
JP2001163876A (en) * 1999-12-09 2001-06-19 Mitsui Chemicals Inc Method for purifying (thio)epoxy compound
JP2001181276A (en) * 1999-12-27 2001-07-03 Nippon Steel Chem Co Ltd New aromatic episulfide compound, composition and cured material containing the same
WO2001077098A1 (en) * 2000-04-07 2001-10-18 Mitsubishi Gas Chemical Company, Inc. Episulfide compound and process for producing the same
JP2002053668A (en) * 2000-08-04 2002-02-19 Yokohama Rubber Co Ltd:The Low temperature curable resin composition
JP2002338564A (en) * 2001-05-22 2002-11-27 Nippon Steel Chem Co Ltd New episulfide compound
JP2004142133A (en) * 2002-10-22 2004-05-20 Japan Epoxy Resin Kk Laminate for electric laminated sheet
JP2005232464A (en) * 1999-02-24 2005-09-02 Mitsubishi Gas Chem Co Inc Episulfide compound and method for producing high refractive index resin by using the same
JP2017048337A (en) * 2015-09-03 2017-03-09 三菱化学株式会社 Epoxy resin, epoxy resin composition, cured product, and electric/electronic component

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005232464A (en) * 1999-02-24 2005-09-02 Mitsubishi Gas Chem Co Inc Episulfide compound and method for producing high refractive index resin by using the same
JP2000327677A (en) * 1999-03-16 2000-11-28 Mitsubishi Gas Chem Co Inc Preservation of episulfide compound
JP2000336087A (en) * 1999-03-19 2000-12-05 Mitsubishi Gas Chem Co Inc Purification of episulfide compound
JP2001163876A (en) * 1999-12-09 2001-06-19 Mitsui Chemicals Inc Method for purifying (thio)epoxy compound
JP2001181276A (en) * 1999-12-27 2001-07-03 Nippon Steel Chem Co Ltd New aromatic episulfide compound, composition and cured material containing the same
WO2001077098A1 (en) * 2000-04-07 2001-10-18 Mitsubishi Gas Chemical Company, Inc. Episulfide compound and process for producing the same
JP2002053668A (en) * 2000-08-04 2002-02-19 Yokohama Rubber Co Ltd:The Low temperature curable resin composition
JP2002338564A (en) * 2001-05-22 2002-11-27 Nippon Steel Chem Co Ltd New episulfide compound
JP2004142133A (en) * 2002-10-22 2004-05-20 Japan Epoxy Resin Kk Laminate for electric laminated sheet
JP2017048337A (en) * 2015-09-03 2017-03-09 三菱化学株式会社 Epoxy resin, epoxy resin composition, cured product, and electric/electronic component

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