JPH07133278A - Production of 1h-pyrazolo(3,2-c)1,2,4-triazole-based compound - Google Patents

Production of 1h-pyrazolo(3,2-c)1,2,4-triazole-based compound

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Publication number
JPH07133278A
JPH07133278A JP28142193A JP28142193A JPH07133278A JP H07133278 A JPH07133278 A JP H07133278A JP 28142193 A JP28142193 A JP 28142193A JP 28142193 A JP28142193 A JP 28142193A JP H07133278 A JPH07133278 A JP H07133278A
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JP
Japan
Prior art keywords
group
compound
formula
general formula
represented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28142193A
Other languages
Japanese (ja)
Inventor
Takashi Suzuki
隆嗣 鈴木
Hidenobu Oya
秀信 大屋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
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Konica Minolta Inc
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Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP28142193A priority Critical patent/JPH07133278A/en
Publication of JPH07133278A publication Critical patent/JPH07133278A/en
Pending legal-status Critical Current

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  • Nitrogen Condensed Heterocyclic Rings (AREA)

Abstract

PURPOSE:To obtain the subject compound useful as a coupler for photograph in a high yield by reacting a triazole-based compound substituted by a specific phenyl group substituted with a halogen at an ortho position with an amine compound or a thiol compound. CONSTITUTION:A compound of formula I [R1 and R2 are each a substituent group and either one of R1 and R2 is formula II (Z is a halogen; R3 and R6 are each H or a substituent group and either one of R3 and R5 is nitro; *is bonded to a pyrazolotriazole ring)] is reacted with a compound of the formula R7-NH2 [R7 is an alkyl or a cycloalkyl] in the presence of a base (e.g. potassium carbonate) in a solvent (e.g. DMF) at -10 to 150 deg.C to provide the objective compound of formula III (R8 and R9 are substituent groups and either one of R8 and R9 is formula IV). A compound of formula III substituted by a phenyl substituted with nitrogen or sulfur at an ortho position and useful as a coupler for photograph, especially Magenta coupler or its intermediate is obtained by this method.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、写真用カプラー、特に
マゼンタカプラー又はその中間体として有用な1H-ピラ
ゾロ[3,2-c]1,2,4-トリアゾール系化合物の製造方法に
関し、更に詳しくは、オルト位ハロゲン置換フェニル基
が置換した1H-ピラゾロ[3,2-c]1,2,4-トリアゾール系化
合物と一般式〔III〕で表されるアミン化合物又は一般
式〔VIII〕で表されるチオール化合物を反応させること
により、高収率で、オルト位窒素原子又は硫黄原子置換
フェニル基が置換した1H-ピラゾロ[3,2-c]1,2,4-トリア
ゾール系化合物を製造する方法に関するものである。
FIELD OF THE INVENTION The present invention relates to a method for producing a 1H-pyrazolo [3,2-c] 1,2,4-triazole compound useful as a photographic coupler, especially a magenta coupler or an intermediate thereof. Specifically, a 1H-pyrazolo [3,2-c] 1,2,4-triazole compound substituted with an ortho-halogenated phenyl group and an amine compound represented by the general formula [III] or a general formula [VIII] By reacting the thiol compound represented by the above, in high yield, a 1H-pyrazolo [3,2-c] 1,2,4-triazole compound substituted with a nitrogen atom or a sulfur atom-substituted phenyl group at the ortho position is produced. It is about how to do it.

【0002】[0002]

【従来の技術】1H-ピラゾロ[3,2-c]1,2,4-トリアゾール
系化合物は、写真用カプラー特にマゼンタカプラー又は
その中間体として有用な化合物であり、種々の製造方法
が開示されている。
2. Description of the Related Art 1H-pyrazolo [3,2-c] 1,2,4-triazole compounds are compounds useful as photographic couplers, particularly magenta couplers or intermediates thereof, and various production methods are disclosed. ing.

【0003】この系の化合物は、例えば英国特許1,252,
418号、米国特許3,725,067号あるいはジャーナル・オブ
・ザ・ケミカル・ソサイアティー・パーキンI(1977
年)2047〜2052頁に記載された方法で製造することがで
きる。
Compounds of this system are described, for example, in British Patent 1,252,
418, U.S. Pat. No. 3,725,067 or Journal of the Chemical Society Perkin I (1977
Years) 2047-2052 can be manufactured by the method described.

【0004】すなわち、5-アシルヒドラジノ-1H-ピラゾ
ール-4-カルボキシレート系化合物をベンゼン中オキシ
塩化リンとともに長時間還流することによって1H-ピラ
ゾロ[3,2-c]1,2,4-トリアゾール-7-カルボキシレート系
化合物を得た後、これを硫酸酸性下で加熱することによ
り、1H-ピラゾロ[3,2-c]1,2,4-トリアゾール系化合物を
製造することができる。
That is, a 5-acylhydrazino-1H-pyrazole-4-carboxylate compound is refluxed with phosphorus oxychloride in benzene for a long time to give 1H-pyrazolo [3,2-c] 1,2,4-triazole-. After the 7-carboxylate compound is obtained, the 1H-pyrazolo [3,2-c] 1,2,4-triazole compound can be produced by heating it under sulfuric acid acidity.

【0005】しかしながら、これらの方法においては上
記のように工程中に強酸性下で加熱する条件が存在する
ために、分子内に一般式〔X〕に示すようなチオエーテ
ル結合が存在すると該条件下においてチオエーテル結合
が切断される等の分解反応が併発し、1H-ピラゾロ[3,2-
C]1,2,4-トリアゾール系化合物の収率が低下する等の問
題点を有している。
However, in these methods, since there is a condition of heating under strong acidity during the process as described above, the presence of a thioether bond as represented by the general formula [X] in the molecule is satisfied under the condition. In 1H-pyrazolo [3,2-
There are problems such as a decrease in the yield of the C] 1,2,4-triazole compound.

【0006】又、特開昭63-231341号には1,2,4-トリア
ゾロ[3,4-b]1,3,4-チアジアジン系化合物を無水酢酸中
で還流を行ってジアセチル体を得た後、濃塩酸で処理し
て1H-ピラゾロ[3,2-c]1,2,4-トリアゾール系化合物を製
造することができることが記載されている。
Further, in JP-A-63-231341, a 1,2,4-triazolo [3,4-b] 1,3,4-thiadiazine compound is refluxed in acetic anhydride to obtain a diacetyl compound. After that, it is described that 1H-pyrazolo [3,2-c] 1,2,4-triazole-based compound can be produced by treatment with concentrated hydrochloric acid.

【0007】しかしながら、この方法においては反応に
より硫化水素ガスが生じるので環境公害上問題であり、
工業化の際、硫化水素ガスの処理が大きな負担となるの
で好ましくなく、新たな製造方法の開発が望まれてい
た。
However, in this method, hydrogen sulfide gas is generated by the reaction, which is a problem in terms of environmental pollution.
In industrialization, the treatment of hydrogen sulfide gas imposes a heavy burden, which is not preferable, and the development of a new production method has been desired.

【0008】更には、これらいずれの方法においても1H
-ピラゾロ[3,2-c]1,2,4-トリアゾール環を形成する過程
においてアシル化剤を使用するため、1H-ピラゾロ[3,2-
c]1,2,4-トリアゾール環を形成する以前に分子内に一般
式〔V〕に示すようなアミノ結合が存在すると、その部
位においてアシル化等の副反応が併発してしまい収率が
低下するので、新たな製造方法の開発が望まれていた。
Furthermore, in any of these methods, 1H
-Pyrazolo [3,2-c] 1,2,4-triazole 1H-pyrazolo [3,2-
c] If an amino bond as shown in the general formula [V] is present in the molecule before the formation of the 1,2,4-triazole ring, side reactions such as acylation will occur at that site and the yield Therefore, the development of a new manufacturing method has been desired.

【0009】[0009]

【発明が解決しようとする課題】本発明の目的は、前記
欠点を解決することにあり、写真用カプラー、特にマゼ
ンタカプラー又はその中間体として有用な一般式〔IV〕
又は〔IX〕で示されるオルト位窒素原子又は硫黄原子置
換フェニル基が置換した1H-ピラゾロ[3,2-c]1,2,4-トリ
アゾール系化合物を簡更かつ高収率で合成することがで
きる製造方法を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned drawbacks, and a general formula [IV] useful as a photographic coupler, particularly a magenta coupler or an intermediate thereof.
Or to synthesize a 1H-pyrazolo [3,2-c] 1,2,4-triazole compound substituted by a phenyl group substituted with an ortho nitrogen atom or a sulfur atom represented by [IX] in a high yield It is to provide a manufacturing method capable of

【0010】[0010]

【課題を解決するための手段】本発明の上記目的は、下
記構成又はによって達成される。
The above object of the present invention can be achieved by the following constitution or.

【0011】下記一般式〔I〕で示される化合物と下
記一般式〔III〕で示される化合物を塩基性条件下で反
応させることを特徴とする下記一般式〔IV〕で示される
1H-ピラゾロ[3,2-c]1,2,4-トリアゾール系化合物の製造
方法。
A compound represented by the following general formula [IV] characterized by reacting a compound represented by the following general formula [I] with a compound represented by the following general formula [III] under basic conditions.
Process for producing 1H-pyrazolo [3,2-c] 1,2,4-triazole compound.

【0012】[0012]

【化11】 [Chemical 11]

【0013】〔式中、R1又はR2は置換基を表すが、R
1とR2のいずれか1つは下記一般式〔II〕
[In the formula, R 1 or R 2 represents a substituent,
Any one of 1 and R 2 is represented by the following general formula [II]

【0014】[0014]

【化12】 [Chemical 12]

【0015】〔式中、Zはハロゲン原子を表し、R3
4,R5,R6は水素原子又は置換基を表すが、R3とR
5のいずれか1つはニトロ基を表す。*はその位置でピ
ラゾロトリアゾール環に結合していることを意味す
る。〕で表される基を表す。〕
[In the formula, Z represents a halogen atom, and R 3 ,
R 4 , R 5 and R 6 represent a hydrogen atom or a substituent, but R 3 and R
Any one of 5 represents a nitro group. * Means attached to the pyrazolotriazole ring at that position. ] Represents the group represented by. ]

【0016】[0016]

【化13】 [Chemical 13]

【0017】〔式中、R7はアルキル基又はシクロアル
キル基を表す。〕
[In the formula, R 7 represents an alkyl group or a cycloalkyl group. ]

【0018】[0018]

【化14】 [Chemical 14]

【0019】〔式中、R8又はR9は置換基を表すが、R
8とR9のいずれか1つは下記一般式〔V〕
[In the formula, R 8 or R 9 represents a substituent,
One of 8 and R 9 is the following general formula [V]

【0020】[0020]

【化15】 [Chemical 15]

【0021】〔式中、R3,R4,R5,R6は前記一般式
〔II〕のR3,R4,R5,R6と同義であり、R7は一般
式〔III〕のR7と同義である。*はその位置でピラゾロ
トリアゾール環に結合していることを意味する。〕で表
される基を表す。〕 下記一般式〔I〕で示される化合物と下記一般式〔VII
I〕で示される化合物を塩基性条件下で反応させること
を特徴とする下記一般式〔IX〕で示される1H-ピラゾロ
[3,2-c]1,2,4-トリアゾール系化合物の製造方法。
[0021] wherein, R 3, R 4, R 5, R 6 has the same meaning as R 3, R 4, R 5 , R 6 in the general formula (II), R 7 is the formula [III] Synonymous with R 7 of. * Means attached to the pyrazolotriazole ring at that position. ] Represents the group represented by. ] The compound represented by the following general formula [I] and the following general formula [VII
1H-pyrazolo represented by the following general formula [IX], characterized by reacting the compound represented by I] under basic conditions
A method for producing a [3,2-c] 1,2,4-triazole compound.

【0022】[0022]

【化16】 [Chemical 16]

【0023】〔式中、R1又はR2は置換基を表すが、R
1とR2のいずれか1つは下記一般式〔II〕
[In the formula, R 1 or R 2 represents a substituent,
Any one of 1 and R 2 is represented by the following general formula [II]

【0024】[0024]

【化17】 [Chemical 17]

【0025】〔式中、Zはハロゲン原子を表し、R3
4,R5,R6は水素原子又は置換基を表すが、R3とR
5のいずれか1つはニトロ基を表す。*はその位置でピ
ラゾロトリアゾール環に結合していることを意味す
る。〕で表される基を表す。〕
[In the formula, Z represents a halogen atom, and R 3 ,
R 4 , R 5 and R 6 represent a hydrogen atom or a substituent, but R 3 and R
Any one of 5 represents a nitro group. * Means attached to the pyrazolotriazole ring at that position. ] Represents the group represented by. ]

【0026】[0026]

【化18】 [Chemical 18]

【0027】〔式中、R27はアルキル基、シクロアルキ
ル基又はアリール基を表す。〕
[In the formula, R 27 represents an alkyl group, a cycloalkyl group or an aryl group. ]

【0028】[0028]

【化19】 [Chemical 19]

【0029】〔式中、R28又はR29は置換基を表すが、
28とR29のいずれか1つは下記一般式〔X〕
[In the formula, R 28 or R 29 represents a substituent,
One of R 28 and R 29 is represented by the following general formula [X]

【0030】[0030]

【化20】 [Chemical 20]

【0031】〔式中、R3,R4,R5,R6は前記一般式
〔II〕のR3,R4,R5,R6と同義であり、R27は一般
式〔VIII〕のR27と同義である。*はその位置でピラゾ
ロトリアゾール環に結合していることを意味する。〕で
表される基を表す。〕以下、本発明を詳細に説明する。
[0031] wherein, R 3, R 4, R 5, R 6 has the same meaning as R 3, R 4, R 5 , R 6 in the general formula [II], R 27 is the formula [VIII] It is synonymous with R 27 of. * Means attached to the pyrazolotriazole ring at that position. ] Represents the group represented by. The present invention will be described in detail below.

【0032】一般式〔I〕においてR1又はR2が表す置
換基は、アルキル基、シクロアルキル基、アリール基又
はヘテロ環基を表すが、R1又はR2で表されるアルキル
基としては、例えば、メチル基、エチル基、イソプロピ
ル基、t-ブチル基、デシル基、ドデシル基等を挙げるこ
とができる。
The substituent represented by R 1 or R 2 in the general formula [I] represents an alkyl group, a cycloalkyl group, an aryl group or a heterocyclic group. As the alkyl group represented by R 1 or R 2 , Examples thereof include methyl group, ethyl group, isopropyl group, t-butyl group, decyl group and dodecyl group.

【0033】R1又はR2で表されるシクロアルキル基と
しては、例えばシクロプロピル基、シクロペンチル基、
シクロヘキシル基、1-メチルシクロプロピル基、1-メチ
ルシクロヘキシル基等を挙げることができる。
Examples of the cycloalkyl group represented by R 1 or R 2 include a cyclopropyl group, a cyclopentyl group,
Examples thereof include cyclohexyl group, 1-methylcyclopropyl group, 1-methylcyclohexyl group and the like.

【0034】R1又はR2で表されるアリール基として
は、フェニル基、ナフチル基等が挙げられる。
Examples of the aryl group represented by R 1 or R 2 include a phenyl group and a naphthyl group.

【0035】又、R1又はR2で表されるヘテロ環基とし
ては、例えばピリジル基、チエニル基、フリル基等を挙
げることができる。
Examples of the heterocyclic group represented by R 1 or R 2 include pyridyl group, thienyl group and furyl group.

【0036】これらのR1又はR2で表されるアルキル
基、シクロアルキル基、アリール基又はヘテロ環基は置
換基を有することができ、置換基としてはニトロ基、シ
アノ基、アルキル基、アリール基、アルキルスルホニル
基、アリールスルホニル基等を挙げることができる。
The alkyl group, cycloalkyl group, aryl group or heterocyclic group represented by R 1 or R 2 may have a substituent, and the substituent may be a nitro group, a cyano group, an alkyl group, an aryl group. Group, alkylsulfonyl group, arylsulfonyl group and the like.

【0037】R1又はR2で表される置換基としては、ア
ルキル基又はアリール基が好ましい。
The substituent represented by R 1 or R 2 is preferably an alkyl group or an aryl group.

【0038】一般式〔II〕においてR3,R4,R5,R6
が表す置換基は、一般式〔I〕のR1又はR2が表す置換
基と同義である。
In the general formula [II], R 3 , R 4 , R 5 and R 6
The substituent represented by is synonymous with the substituent represented by R 1 or R 2 in the general formula [I].

【0039】R3,R4,R5,R6としては、水素原子又
はアルキル基が好ましい。
As R 3 , R 4 , R 5 and R 6 , a hydrogen atom or an alkyl group is preferable.

【0040】一般式〔II〕においてZはハロゲン原子を
表すが、その中で塩素原子又は臭素原子が好ましい。
In the general formula [II], Z represents a halogen atom, of which a chlorine atom or a bromine atom is preferable.

【0041】一般式〔III〕,〔VIII〕において各々
7,R27で表されるアルキル基は、例えばメチル基、
エチル基、イソプロピル基、ブチル基、sec-ブチル基、
デシル基、ドデシル基等を表し、各々R7,R27で表さ
れるシクロアルキル基としては、例えば、シクロプロピ
ル基、シクロペンチル基、シクロヘキシル基、1-メチル
シクロプロピル基、1-メチルシクロヘキシル基等を挙げ
ることができる。
The alkyl groups represented by R 7 and R 27 in the general formulas [III] and [VIII] are, for example, methyl group,
Ethyl group, isopropyl group, butyl group, sec-butyl group,
Examples of the cycloalkyl group represented by R 7 and R 27, which represents a decyl group, a dodecyl group or the like, include, for example, cyclopropyl group, cyclopentyl group, cyclohexyl group, 1-methylcyclopropyl group, 1-methylcyclohexyl group, etc. Can be mentioned.

【0042】一般式〔VIII〕において、R27で表される
アリール基は、フェニル基、ナフチル基等を挙げること
ができる。
In the general formula [VIII], examples of the aryl group represented by R 27 include a phenyl group and a naphthyl group.

【0043】一般式〔III〕,〔VIII〕においてR7,R
27が表すアルキル基、シクロアルキル基またはアリール
基は置換基を有することができ、置換基としては、ニト
ロ基、シアノ基、ヒドロキシル基、アルキル基、アリー
ル基、スルホニル基、アリールスルホニル基、アルキル
オキシ基、アリールオキシ基等を挙げることができる。
In the general formulas [III] and [VIII], R 7 , R
The alkyl group, cycloalkyl group or aryl group represented by 27 may have a substituent, and examples of the substituent include a nitro group, a cyano group, a hydroxyl group, an alkyl group, an aryl group, a sulfonyl group, an arylsulfonyl group and an alkyloxy group. Group, aryloxy group and the like.

【0044】一般式〔IV〕において、R8又はR9が表す
置換基はアルキル基、シクロアルキル基、アリール基又
はヘテロ環基を表すが、一般式〔I〕のR1又はR2が表
す置換基のアルキル基、シクロアルキル基、アリール基
又はヘテロ環基と同義である。
In the general formula [IV], the substituent represented by R 8 or R 9 represents an alkyl group, a cycloalkyl group, an aryl group or a heterocyclic group, and R 1 or R 2 in the general formula [I] represents It has the same meaning as the alkyl group, cycloalkyl group, aryl group or heterocyclic group of the substituent.

【0045】一般式〔IX〕において、R28又はR29が表
す置換基は、アルキル基、シクロアルキル基、アリール
基又はヘテロ環基を表すが、一般式〔I〕のR1又はR2
が表す置換基のアルキル基、シクロアルキル基、アリー
ル基又はヘテロ環基と同義である。
In the general formula [IX], the substituent represented by R 28 or R 29 represents an alkyl group, a cycloalkyl group, an aryl group or a heterocyclic group, and R 1 or R 2 in the general formula [I] is
It has the same meaning as the alkyl group, cycloalkyl group, aryl group or heterocyclic group of the substituent represented by.

【0046】一般式〔V〕において、R3,R4,R5,R
6は一般式〔II〕のR3,R4,R5,R6と同義であり、
7は一般式〔III〕のR7と同義である。
In the general formula [V], R 3 , R 4 , R 5 , R
6 is R 3, R 4, synonymous with R 5, R 6 of Formula II,
R 7 has the same meaning as R 7 in formula [III].

【0047】一般式〔X〕において、R3,R4,R5,R
6は一般式〔II〕のR3,R4,R5,R6と同義であり、
27は一般式〔VIII〕のR27と同義である。
In the general formula [X], R 3 , R 4 , R 5 , R
6 is R 3, R 4, synonymous with R 5, R 6 of Formula II,
R 27 has the same meaning as R 27 in formula [VIII].

【0048】本発明で用いられる一般式〔I〕で示され
る化合物の具体例を以下に示すが、本発明はこれに限定
されない。
Specific examples of the compound represented by the general formula [I] used in the present invention are shown below, but the present invention is not limited thereto.

【0049】[0049]

【化21】 [Chemical 21]

【0050】[0050]

【化22】 [Chemical formula 22]

【0051】[0051]

【化23】 [Chemical formula 23]

【0052】[0052]

【化24】 [Chemical formula 24]

【0053】[0053]

【化25】 [Chemical 25]

【0054】一般式〔I〕で表される上記のこれら化合
物は、例えば英国特許1,252,418号、米国特許3,725,067
号あるいはジャーナル・オブ・ザ・ケミカル・ソサイア
ティー・パーキンI(1977年)2047〜2052頁に記載され
た方法で製造することができる。
The above-mentioned compounds represented by the general formula [I] are described in, for example, British Patent 1,252,418 and US Patent 3,725,067.
No. or Journal of the Chemical Society Perkin I (1977), pages 2047-2052.

【0055】本発明で用いられる一般式〔III〕で示さ
れる化合物の具体例を以下に示すが、本発明はこれに限
定されない。
Specific examples of the compound represented by the general formula [III] used in the present invention are shown below, but the present invention is not limited thereto.

【0056】[0056]

【化26】 [Chemical formula 26]

【0057】本発明で用いられる一般式〔VIII〕で示さ
れる化合物の具体例を以下に示すが、本発明はこれに限
定されない。
Specific examples of the compound represented by the general formula [VIII] used in the present invention are shown below, but the present invention is not limited thereto.

【0058】[0058]

【化27】 [Chemical 27]

【0059】本反応において、一般式〔III〕又は〔VII
I〕の化合物は一般式〔I〕の化合物1モルあたり1.0〜
3.0モルの範囲で用いられ、好ましくは1.0〜1.5モルの
範囲である。
In this reaction, in the general formula [III] or [VII]
The compound of I] is 1.0 to 1 mol per mol of the compound of general formula [I].
It is used in the range of 3.0 mol, preferably in the range of 1.0 to 1.5 mol.

【0060】本発明において、反応に用いられる溶媒と
しては、メタノール、エタノール、イソプロパノール、
テトラヒドロフラン、1,4-ジオキサン、アセトニトリ
ル、N,N-ジメチルホルムアミド(DMF)、N,N-ジメチ
ルアセトアミド(DMAC),ジメチルスルホキシド
(DMSO)等が好ましいが、その中でDMF、DMA
C、DMSOが特に好ましい。
In the present invention, the solvent used in the reaction includes methanol, ethanol, isopropanol,
Tetrahydrofuran, 1,4-dioxane, acetonitrile, N, N-dimethylformamide (DMF), N, N-dimethylacetamide (DMAC), dimethylsulfoxide (DMSO) and the like are preferable, but among them, DMF and DMA
C and DMSO are particularly preferable.

【0061】用いられる溶媒の量は、本発明の重要な要
件ではないので特に規定されないが、原料に対し容量で
100倍までの範囲で用いることができ、1〜10倍の範囲
で用いることが好ましい。
The amount of the solvent to be used is not particularly specified because it is not an important requirement of the present invention, but the amount by volume with respect to the raw material is used.
It can be used in a range of up to 100 times, and is preferably used in a range of 1 to 10 times.

【0062】本発明で用いられる塩基は無機塩基でも有
機塩基でもよいが、無機塩基が好ましい。
The base used in the present invention may be an inorganic base or an organic base, but an inorganic base is preferred.

【0063】無機塩基としては、水酸化カリウム、水酸
化ナトリウム、ナトリウムメトキシド、ナトリウムエト
キシド、カリウム-t-ブトキシド、炭酸カリウム、炭酸
ナトリウム、水素化ナトリウムが好ましい。
As the inorganic base, potassium hydroxide, sodium hydroxide, sodium methoxide, sodium ethoxide, potassium t-butoxide, potassium carbonate, sodium carbonate and sodium hydride are preferable.

【0064】有機塩基としては、トリエチルアミン、N,
N-ジメチルベンジルアミン等が挙げられる。
As the organic base, triethylamine, N,
Examples thereof include N-dimethylbenzylamine.

【0065】本反応で用いられる塩基は、一般式〔I〕
の化合物1モルあたり1.0〜10.0モルの範囲で用いら
れ、好ましくは1.0〜3.0モルの範囲である。
The base used in this reaction has the general formula [I]
The compound is used in an amount of 1.0 to 10.0 mol, preferably 1.0 to 3.0 mol, per mol of the compound.

【0066】反応温度は、−10〜150℃で行うのが好ま
しく、0〜100℃で行うことがより好ましい。
The reaction temperature is preferably -10 to 150 ° C, more preferably 0 to 100 ° C.

【0067】次に、本発明によって得られる一般式〔I
V〕で示される化合物の代表的なものを以下に示すが、
本発明はこれに限定されない。
Next, the general formula [I
Representative compounds of V] are shown below,
The present invention is not limited to this.

【0068】[0068]

【化28】 [Chemical 28]

【0069】[0069]

【化29】 [Chemical 29]

【0070】[0070]

【化30】 [Chemical 30]

【0071】[0071]

【化31】 [Chemical 31]

【0072】次に本発明によって得られる一般式〔IX〕
で示される化合物の代表的なものを以下に示すが、本発
明はこれに限定されない。
Next, the general formula [IX] obtained by the present invention
Typical compounds represented by are shown below, but the present invention is not limited thereto.

【0073】[0073]

【化32】 [Chemical 32]

【0074】[0074]

【化33】 [Chemical 33]

【0075】[0075]

【化34】 [Chemical 34]

【0076】[0076]

【化35】 [Chemical 35]

【0077】[0077]

【化36】 [Chemical 36]

【0078】[0078]

【実施例】以下に、本発明の具体的実施例の一部を示す
が、本発明はこれらによって限定されるものではない。
EXAMPLES Some specific examples of the present invention will be shown below, but the present invention is not limited thereto.

【0079】比較例1 本発明によらない1H-ピラゾロ[3,2-c]1,2,4-トリアゾー
ル系化合物の合成。
Comparative Example 1 Synthesis of 1H-pyrazolo [3,2-c] 1,2,4-triazole compound not according to the present invention.

【0080】例示化合物IV−2を下記の方法で合成しよ
うとしたが、化合物(C)の収率は低く、又化合物
(D)を得る反応においては、高速液体クロマトグラフ
ィーより目的とする化合物(D)は認められなかった。
The compound IV-2 was tried to be synthesized by the following method, but the yield of the compound (C) was low, and in the reaction for obtaining the compound (D), the target compound ( D) was not observed.

【0081】[0081]

【化37】 [Chemical 37]

【0082】実施例1(例示化合物IV−2の合成) 例示化合物IV−2は下記の方法で合成した。Example 1 (Synthesis of Exemplified Compound IV-2) Exemplified Compound IV-2 was synthesized by the following method.

【0083】[0083]

【化38】 [Chemical 38]

【0084】(1)化合物(F)の合成 化合物(E)50.0gを塩化チオニル90ml中、2時間加熱
還流した。反応終了後、減圧下にて塩化チオニルを留去
し、酸クロライドを得た。
(1) Synthesis of compound (F) 50.0 g of compound (E) was heated under reflux for 2 hours in 90 ml of thionyl chloride. After completion of the reaction, thionyl chloride was distilled off under reduced pressure to obtain acid chloride.

【0085】一方、化合物(B)45.7gを酢酸エチル40
0ml中に分散し、更に酢酸カリウム水溶液(酢酸カリウ
ム48.7g/水98ml)を加え、激しく撹拌し、そこへ上記
酸クロライド250mlの酢酸エチルに溶解したものを1時
間で滴下した。滴下終了後、更に室温にて2時間撹拌
し、析出している固体を濾取した。この固体を十分に水
洗し、少量の冷酢酸エチルで洗浄し、化合物(F)77.9
g(収率85.4%)を得た。
On the other hand, 45.7 g of compound (B) was mixed with 40% of ethyl acetate.
The mixture was dispersed in 0 ml, and an aqueous solution of potassium acetate (potassium acetate 48.7 g / water 98 ml) was further added, and the mixture was vigorously stirred, to which 250 ml of the above acid chloride dissolved in ethyl acetate was added dropwise over 1 hour. After completion of dropping, the mixture was further stirred at room temperature for 2 hours, and the precipitated solid was collected by filtration. This solid was washed thoroughly with water and then with a small amount of cold ethyl acetate to give compound (F) 77.9
g (yield 85.4%) was obtained.

【0086】(2)化合物(G)の合成 化合物(F)75.0gを400mlのオキシ塩化リン中4時間
加熱還流した後、オキシ塩化リンを減圧で留去した。こ
の残渣を氷水1リットルに投入した後、炭酸ナトリウム
で中和し、酢酸エチルで抽出した。この酢酸エチル層を
飽和食塩水で洗浄後、無水硫酸マグネシウムで乾燥し、
更に溶媒を留去し、残渣を得た。この残渣をメタノール
中で結晶化させ、化合物(G)61.3g(収率85.9%)を
得た。
(2) Synthesis of compound (G) After 75.0 g of compound (F) was refluxed under heating in 400 ml of phosphorus oxychloride for 4 hours, phosphorus oxychloride was distilled off under reduced pressure. The residue was poured into 1 liter of ice water, neutralized with sodium carbonate, and extracted with ethyl acetate. The ethyl acetate layer was washed with saturated brine and dried over anhydrous magnesium sulfate,
Further, the solvent was distilled off to obtain a residue. The residue was crystallized in methanol to obtain 61.3 g of compound (G) (yield 85.9%).

【0087】(3)例示化合物I−1の合成 化合物(G)30.0gを60mlの酢酸中、30mlの濃硫酸と30
mlの水を加え、7時間加熱還流した。放冷後、1リット
ルの氷水中に投入し、炭酸カリウムで中和した。析出し
た固体を濾取し、水洗後、メタノールより再結晶して例
示化合物I−1を22.3g(収率93.6%)得た。
(3) Synthesis of Exemplified Compound I-1 30.0 g of compound (G) was added to 30 ml of concentrated sulfuric acid and 30 ml in 60 ml of acetic acid.
Water (ml) was added, and the mixture was heated under reflux for 7 hours. After cooling, the mixture was poured into 1 liter of ice water and neutralized with potassium carbonate. The precipitated solid was collected by filtration, washed with water, and recrystallized from methanol to obtain 22.3 g (yield 93.6%) of Exemplified Compound I-1.

【0088】(4)例示化合物IV−2の合成 I−1 10.0gをN,N-ジメチルホルムアミド(DMF)10
0mlに溶解し、n-ブチルアミン3.9gを加え室温で30分撹
拌した後、ナトリウムメトキシド5.8gを加え80〜90℃
で3時間撹拌した。反応終了後、室温まで冷却してから
内容物を氷水2リットル中に投入し、析出した固体を濾
取した。得られた固体を酢酸エチルで再結晶して例示化
合物IV−2を9.2g(収率81.3%)得た。
(4) Synthesis of Exemplified Compound IV-2 I-1 10.0 g was added to N, N-dimethylformamide (DMF) 10
Dissolve in 0 ml, add 3.9 g of n-butylamine and stir at room temperature for 30 minutes, then add 5.8 g of sodium methoxide at 80-90 ° C.
And stirred for 3 hours. After the reaction was completed, the contents were cooled to room temperature, the contents were put into 2 liters of ice water, and the precipitated solid was collected by filtration. The obtained solid was recrystallized from ethyl acetate to obtain 9.2 g of Exemplified compound IV-2 (yield 81.3%).

【0089】FAB−MASS m/e=315(M+)、I
R、NMRはIV−2の構造を支持した。
FAB-MASS m / e = 315 (M + ), I
R, NMR supported the structure of IV-2.

【0090】以上、比較例1(比較)及び実施例1(本
発明)で示したように、従来公知の製造方法に比較し
て、本発明では、オルト位窒素原子置換フェニル基が置
換した1H-ピラゾロ[3,2-c]1,2,4-トリアゾール系化合物
を収率良く製造することができることがわかる。
As described above in Comparative Example 1 (Comparative) and Example 1 (Invention), in comparison with the conventionally known production method, in the present invention, 1H substituted with ortho-position nitrogen atom-substituted phenyl group was used. It can be seen that the -pyrazolo [3,2-c] 1,2,4-triazole compound can be produced in good yield.

【0091】比較例2 本発明によらない1H-ピラゾロ[3,2-c]1,2,4-トリアゾー
ル系化合物の合成。
Comparative Example 2 Synthesis of 1H-pyrazolo [3,2-c] 1,2,4-triazole compound not according to the present invention.

【0092】例示化合物IX−12を以下の方法で合成しよ
うとしたが、化合物(B')を得る反応において高速液
体クロマトグラフィーより目的とする化合物(B')は
認められなかった。
The Exemplified Compound IX-12 was attempted to be synthesized by the following method, but the desired compound (B ′) was not found by high performance liquid chromatography in the reaction for obtaining the compound (B ′).

【0093】[0093]

【化39】 [Chemical Formula 39]

【0094】実施例2(例示化合物IX−12の合成) 例示化合物IX−12は下記の方法で合成した。Example 2 (Synthesis of Exemplified Compound IX-12) Exemplified Compound IX-12 was synthesized by the following method.

【0095】[0095]

【化40】 [Chemical 40]

【0096】(1)例示化合物IX−12の合成 実施例1と同様にして合成した例示化合物I−1 10.0g
をN,N-ジメチルホルムアミド(DMF)100mlに溶解
し、ベンゼンチオール4.0gを加え、氷浴で冷却した
後、内温5℃以下でナトリウムメトキシド4.3gを加え
5℃以下で10分間撹拌した後、氷浴を外し室温で2時間
撹拌した。反応終了後、内容物を氷水1リットル中に投
入し、析出した固体を濾取した。得られた固体をアセト
ンで再結晶して例示化合物IX−12を11.1g(収率87.7
%)得た。
(1) Synthesis of Exemplified Compound IX-12 10.0 g of Exemplified Compound I-1 synthesized in the same manner as in Example 1.
Was dissolved in 100 ml of N, N-dimethylformamide (DMF), 4.0 g of benzenethiol was added, and after cooling with an ice bath, 4.3 g of sodium methoxide was added at an internal temperature of 5 ° C or lower and stirred at 5 ° C or lower for 10 minutes. After that, the ice bath was removed and the mixture was stirred at room temperature for 2 hours. After completion of the reaction, the content was put into 1 liter of ice water, and the precipitated solid was collected by filtration. The obtained solid was recrystallized from acetone to give 11.1 g (yield 87.7) of Exemplified Compound IX-12.
%)Obtained.

【0097】FAB−MASS m/e=352(M+)、I
R、NMRはIX−12の構造を支持した。
FAB-MASS m / e = 352 (M + ), I
R, NMR supported the structure of IX-12.

【0098】以上、比較例2(比較)及び実施例2(本
発明)で示したように、従来公知の製造方法に比較し
て、本発明では、オルト位硫黄原子置換フェニル基が置
換した1H-ピラゾロ[3,2-c]1,2,4-トリアゾール系化合物
を収率良く製造することができることがわかる。
As described above in Comparative Example 2 (Comparative) and Example 2 (Invention), in comparison with the conventionally known production method, in the present invention, 1H substituted with the ortho-position sulfur atom-substituted phenyl group was used. It can be seen that the -pyrazolo [3,2-c] 1,2,4-triazole compound can be produced in good yield.

【0099】[0099]

【発明の効果】本発明により、写真用カプラー、特にマ
ゼンタカプラー又はその中間体として有用なオルト位窒
素原子又は硫黄原子置換フェニル基が置換した1H-ピラ
ゾロ[3,2-c]1,2,4-トリアゾール系化合物を簡更かつ高
収率で合成することができる製造方法を提供することが
できる。
INDUSTRIAL APPLICABILITY According to the present invention, 1H-pyrazolo [3,2-c] 1,2, substituted with a phenyl group substituted with an ortho nitrogen atom or a sulfur atom, which is useful as a photographic coupler, particularly a magenta coupler or an intermediate thereof, It is possible to provide a production method capable of synthesizing a 4-triazole compound in a simple and high yield.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 下記一般式〔I〕で示される化合物と下
記一般式〔III〕で示される化合物を塩基性条件下で反
応させることを特徴とする下記一般式〔IV〕で示される
1H-ピラゾロ[3,2-c]1,2,4-トリアゾール系化合物の製造
方法。 【化1】 〔式中、R1又はR2は置換基を表すが、R1とR2のいず
れか1つは下記一般式〔II〕 【化2】 〔式中、Zはハロゲン原子を表し、R3,R4,R5,R6
は水素原子又は置換基を表すが、R3とR5のいずれか1
つはニトロ基を表す。*はその位置でピラゾロトリアゾ
ール環に結合していることを意味する。〕で表される基
を表す。〕 【化3】 〔式中、R7はアルキル基又はシクロアルキル基を表
す。〕 【化4】 〔式中、R8又はR9は置換基を表すが、R8とR9のいず
れか1つは下記一般式〔V〕 【化5】 〔式中、R3,R4,R5,R6は前記一般式〔II〕の
3,R4,R5,R6と同義であり、R7は一般式〔III〕
のR7と同義である。*はその位置でピラゾロトリアゾ
ール環に結合していることを意味する。〕で表される基
を表す。〕
1. A compound represented by the following general formula [IV] characterized by reacting a compound represented by the following general formula [I] with a compound represented by the following general formula [III] under basic conditions.
Process for producing 1H-pyrazolo [3,2-c] 1,2,4-triazole compound. [Chemical 1] [In the formula, R 1 or R 2 represents a substituent, and any one of R 1 and R 2 is represented by the following general formula [II] [In the formula, Z represents a halogen atom, and R 3 , R 4 , R 5 , R 6
Represents a hydrogen atom or a substituent, and any one of R 3 and R 5
One represents a nitro group. * Means attached to the pyrazolotriazole ring at that position. ] Represents the group represented by. ] [Chemical 3] [In the formula, R 7 represents an alkyl group or a cycloalkyl group. ] [Chemical 4] [In the formula, R 8 or R 9 represents a substituent, and any one of R 8 and R 9 is represented by the following general formula [V] Wherein, R 3, R 4, R 5, R 6 has the same meaning as R 3, R 4, R 5 , R 6 in the general formula (II), R 7 is the formula [III]
Synonymous with R 7 of. * Means attached to the pyrazolotriazole ring at that position. ] Represents the group represented by. ]
【請求項2】 下記一般式〔I〕で示される化合物と下
記一般式〔VIII〕で示される化合物を塩基性条件下で反
応させることを特徴とする下記一般式〔IX〕で示される
1H-ピラゾロ[3,2-c]1,2,4-トリアゾール系化合物の製造
方法。 【化6】 〔式中、R1又はR2は置換基を表すが、R1とR2のいず
れか1つは下記一般式〔II〕 【化7】 〔式中、Zはハロゲン原子を表し、R3,R4,R5,R6
は水素原子又は置換基を表すが、R3とR5のいずれか1
つはニトロ基を表す。*はその位置でピラゾロトリアゾ
ール環に結合していることを意味する。〕で表される基
を表す。〕 【化8】 〔式中、R27はアルキル基、シクロアルキル基又はアリ
ール基を表す。〕 【化9】 〔式中、R28又はR29は置換基を表すが、R28とR29
いずれか1つは下記一般式〔X〕 【化10】 〔式中、R3,R4,R5,R6は前記一般式〔II〕の
3,R4,R5,R6と同義であり、R27は一般式〔VII
I〕のR27と同義である。*はその位置でピラゾロトリ
アゾール環に結合していることを意味する。〕で表され
る基を表す。〕
2. A compound represented by the following general formula [IX] characterized by reacting a compound represented by the following general formula [I] with a compound represented by the following general formula [VIII] under basic conditions.
Process for producing 1H-pyrazolo [3,2-c] 1,2,4-triazole compound. [Chemical 6] [In the formula, R 1 or R 2 represents a substituent, and any one of R 1 and R 2 is represented by the following general formula [II]: [In the formula, Z represents a halogen atom, and R 3 , R 4 , R 5 , R 6
Represents a hydrogen atom or a substituent, and any one of R 3 and R 5
One represents a nitro group. * Means attached to the pyrazolotriazole ring at that position. ] Represents the group represented by. ] [Chemical 8] [In the formula, R 27 represents an alkyl group, a cycloalkyl group or an aryl group. ] [Chemical 9] [In the formula, R 28 or R 29 represents a substituent, and one of R 28 and R 29 is represented by the following general formula [X] [In the formula, R 3 , R 4 , R 5 and R 6 have the same meanings as R 3 , R 4 , R 5 and R 6 in the general formula [II], and R 27 represents the general formula [VII].
It is synonymous with R 27 of [ I]. * Means attached to the pyrazolotriazole ring at that position. ] Represents the group represented by. ]
JP28142193A 1993-11-10 1993-11-10 Production of 1h-pyrazolo(3,2-c)1,2,4-triazole-based compound Pending JPH07133278A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28142193A JPH07133278A (en) 1993-11-10 1993-11-10 Production of 1h-pyrazolo(3,2-c)1,2,4-triazole-based compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28142193A JPH07133278A (en) 1993-11-10 1993-11-10 Production of 1h-pyrazolo(3,2-c)1,2,4-triazole-based compound

Publications (1)

Publication Number Publication Date
JPH07133278A true JPH07133278A (en) 1995-05-23

Family

ID=17638931

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPH07133278A (en)

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