JPH07130795A - Semiconductor element connecting method and apparatus therefor - Google Patents

Semiconductor element connecting method and apparatus therefor

Info

Publication number
JPH07130795A
JPH07130795A JP27572893A JP27572893A JPH07130795A JP H07130795 A JPH07130795 A JP H07130795A JP 27572893 A JP27572893 A JP 27572893A JP 27572893 A JP27572893 A JP 27572893A JP H07130795 A JPH07130795 A JP H07130795A
Authority
JP
Japan
Prior art keywords
temperature
liquid crystal
crystal panel
semiconductor element
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP27572893A
Other languages
Japanese (ja)
Inventor
Takafumi Kashiwagi
隆文 柏木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP27572893A priority Critical patent/JPH07130795A/en
Publication of JPH07130795A publication Critical patent/JPH07130795A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/36Assembling printed circuits with other printed circuits
    • H05K3/361Assembling flexible printed circuits with other printed circuits

Landscapes

  • Wire Bonding (AREA)

Abstract

PURPOSE:To eliminate the positional discrepancy between a semiconductor element and a board, by making the temperature of the board to be connected with the semiconductor element and the temperature of a pressing device equal substantially to each other after the temperature of the board is increased up to a constant value not lower than the hardening starting temperature of an anisotropic conduction bonding sheet, and by pressing downward the semiconductor element with the pressing device during a predetermined time. CONSTITUTION:A stage 1 is electrically energized to heat a terminal 11 of a liquid crystal panel. When an anisotropic conductive bonding sheet higher than 150 deg.C in curing temperature is used, the current flowing through the stage 1 is so adjusted that the terminal temperature of the liquid crystal panel is maintained 160 deg.C after it is heated to that temperature. A pressing device 2 which is preheated to 160 deg.C is moved downward, and a TCP 10 is pressed downward by the pressing device 2, and further, this pressing-downward is continued about 30 seconds until a bonding agent is hardened in the state wherein conductive particles present in the anisotropic conduction bonding sheet are deformed by the pressure of the pressing device 2. Thereby, the temperature difference between the liquid crystal panel and the pressing device 2 is eliminated, and in its turn, the positional discrepancy between the liquid crystal panel and a board can be eliminated essentially when they are thermocompression-bonded to each other.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体素子の基板上へ
の実装方法に関し、特に高精度が得られる半導体素子接
続方法および接続装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for mounting a semiconductor element on a substrate, and more particularly to a semiconductor element connecting method and a connecting device which can obtain high accuracy.

【0002】[0002]

【従来の技術】異方導電性接着シートを用いて半導体素
子を基板に接続する技術は、熱および圧力を加えるのみ
で狭ピッチ電極の接続が容易に得られるため近年広く用
いられるようになった。特に液晶表示装置における液晶
パネルへの駆動LSIの接続は透明電極と金属という異
種材料間の接続のため、LSIがボンディングされたテ
ープキャリアを異方導電性接着シートを用いて熱圧着接
続する方法が一般的である。次に、その液晶パネルと駆
動LSIの接続方法を説明する。
2. Description of the Related Art The technique of connecting a semiconductor element to a substrate using an anisotropic conductive adhesive sheet has been widely used in recent years because the connection of narrow-pitch electrodes can be easily obtained only by applying heat and pressure. . In particular, the connection of the driving LSI to the liquid crystal panel in the liquid crystal display device is a connection between the transparent electrodes and the dissimilar materials such as metal. Therefore, there is a method of thermocompression bonding the tape carrier to which the LSI is bonded using an anisotropic conductive adhesive sheet. It is common. Next, a method of connecting the liquid crystal panel and the driving LSI will be described.

【0003】駆動LSIはポリイミドなどのフィルムテ
ープ上に形成した銅箔のリードに半導体チップをボンデ
ィングしたいわゆるテープキャリアパッケージ(以後T
CPと略す)の形状をしたものを用いる。次に図13に
示すように液晶パネル20の端子21上に異方導電性接
着シート22を仮止めした後TCP23の端子と液晶パ
ネル端子との位置整合を行い、異方導電性接着シートの
粘着性を利用して仮固定する。通常液晶パネルの1辺に
複数個のTCPが接続されるためこの工程をTCPの個
数だけ繰り返す。これは異方導電性接着シートの硬化に
は一定の時間がかかるため時間当たりの生産量を増大す
るため個々のTCPについて熱圧着工程を行わずに、少
なくとも1辺のTCPは同時に熱圧着工程を行うためで
ある。次に図14に示すように液晶パネル20をステー
ジ24上に配置し高温の加圧装置25にてTCP23端
子上を加圧し異方導電性接着シートに圧力および熱を与
えることにより、異方導電性接着シート中の導電粒子が
液晶パネルとTCPの両電極間に挟持された状態で接着
剤が硬化し安定した接続を得る。
A drive LSI is a so-called tape carrier package (hereinafter referred to as "T-carrier package") in which a semiconductor chip is bonded to a copper foil lead formed on a film tape such as polyimide.
The shape of (abbreviated as CP) is used. Next, as shown in FIG. 13, after the anisotropic conductive adhesive sheet 22 is temporarily fixed on the terminals 21 of the liquid crystal panel 20, the terminals of the TCP 23 and the liquid crystal panel terminals are aligned, and the anisotropic conductive adhesive sheet is adhered. Use the sex to temporarily fix it. Since a plurality of TCPs are usually connected to one side of the liquid crystal panel, this process is repeated for each TCP. Since it takes a certain amount of time to cure the anisotropic conductive adhesive sheet, the production amount per hour is increased. Therefore, the thermocompression bonding process is not performed for each TCP, and at least one side of the TCP is subjected to the thermocompression bonding process at the same time. This is to do it. Next, as shown in FIG. 14, the liquid crystal panel 20 is placed on the stage 24, and the TCP23 terminal is pressed by the high-temperature pressurizing device 25 to apply pressure and heat to the anisotropic conductive adhesive sheet, so that the anisotropic conductive film is anisotropically conductive. The conductive adhesive in the conductive adhesive sheet is sandwiched between the electrodes of the liquid crystal panel and the TCP to cure the adhesive and obtain a stable connection.

【0004】[0004]

【発明が解決しようとする課題】ところで、最近、液晶
パネルは表示画素密度の上昇が急速に進んでおり、それ
と共に駆動LSIとの接続電極端子の狭ピッチ化が進ん
でいる。特に表示のカラー化により画素密度が3倍にな
った結果電極端子ピッチは3分の1になり、液晶パネル
端子とTCP端子の接続位置精度に対する要求は格段に
高まっている。
By the way, recently, in the liquid crystal panel, the display pixel density is rapidly increasing, and along with that, the pitch of the connecting electrode terminals with the driving LSI is becoming narrower. In particular, as the pixel density is tripled due to the colorization of the display, the electrode terminal pitch is reduced to one third, and the demand for the connection position accuracy between the liquid crystal panel terminal and the TCP terminal is significantly increased.

【0005】ところが、上記従来の方法では、液晶パネ
ル20と駆動LSIのTCP23の接続位置精度につい
て、液晶パネル20をステージ24上に配置し高温の加
圧装置25にてTCP端子上を加圧し異方導電性接着シ
ート22中の接着剤を硬化させる工程において原理的な
位置ズレが発生することが判明した。この位置ズレメカ
ニズムを図を用いて説明する。
However, in the above-mentioned conventional method, the liquid crystal panel 20 is arranged on the stage 24 and the temperature of the TCP terminal is pressed by the high temperature pressurizing device 25 so that the liquid crystal panel 20 and the TCP 23 of the driving LSI are connected accurately. It was found that a theoretical positional deviation occurs in the process of curing the adhesive in the directional conductive adhesive sheet 22. This displacement mechanism will be described with reference to the drawings.

【0006】図15(a)はTCP23を液晶パネル2
0に位置整合した後異方導電性接着シート22の粘着力
を利用して仮固定した状態である。この状態においては
材料加工上の誤差を無視すればTCP電極26と液晶パ
ネル電極27の両者の位置は整合している。図15
(b)は液晶パネル20をステージ24上に固定した後
高温の加圧装置25が上方より下降しTCP23に接し
た瞬間である。この後加圧装置25の熱が液晶パネル2
0に伝導し液晶パネル20は徐々に昇温する、また加圧
装置25は熱伝導により短時間的には温度降下するがヒ
ーターより熱が供給されるため降下量は少ない。図15
(c)は図15(b)より一定時間経過後の状態を示
し、昇温した液晶パネル20には熱膨張による寸法変化
が生じている。一方、異方導電性接着シート22は軟化
しTCP23と液晶パネル20間の摩擦係数が低下して
いるため両者間には滑りが発生し易く、TCP23は液
晶パネル20の寸法変化に追随しない。図15(d)に
示すように一定時間経過後異方導電性接着シート22の
熱硬化が終了し、液晶パネル20とTCP23は図15
(c)の位置関係のまま固定され、加圧装置が上昇し液
晶パネル20が室温にまで冷却されても両者の位置関係
は変化しない。TCP23と液晶パネル20の両端子2
6、27の図15(a)状態から図15(d)状態への
位置ズレは1個のTCP23内では寸法スケールが小さ
いため顕著ではないが、ズレ量は熱圧着の寸法スケール
に比例するため複数個のTCP23が接続された液晶パ
ネル20の1辺全体においては重大な位置ズレとなる。
FIG. 15A shows a liquid crystal panel 2 with a TCP 23.
It is in a state of being temporarily fixed by using the adhesive force of the anisotropic conductive adhesive sheet 22 after being aligned to 0. In this state, the positions of both the TCP electrode 26 and the liquid crystal panel electrode 27 are aligned, ignoring errors in material processing. Figure 15
(B) is the moment when the liquid crystal panel 20 is fixed on the stage 24 and the high-temperature pressing device 25 descends from above and comes into contact with the TCP 23. After that, the heat of the pressure device 25 is applied to the liquid crystal panel 2.
The liquid crystal panel 20 is gradually heated to 0, and the temperature of the pressure device 25 is lowered in a short time by heat conduction, but the amount of fall is small because heat is supplied from the heater. Figure 15
FIG. 15C shows a state after a lapse of a certain time from FIG. 15B, and the temperature of the liquid crystal panel 20 has changed due to thermal expansion. On the other hand, since the anisotropic conductive adhesive sheet 22 is softened and the friction coefficient between the TCP 23 and the liquid crystal panel 20 is lowered, slippage easily occurs between the two, and the TCP 23 does not follow the dimensional change of the liquid crystal panel 20. As shown in FIG. 15D, the thermosetting of the anisotropic conductive adhesive sheet 22 is completed after a certain period of time, and the liquid crystal panel 20 and the TCP 23 are removed from each other.
The positional relationship of (c) is fixed and the positional relationship between the two does not change even when the pressure device is raised and the liquid crystal panel 20 is cooled to room temperature. Both terminals 2 of TCP23 and liquid crystal panel 20
The position shift from the state of FIG. 15 (a) to the state of FIG. 15 (d) of Nos. 6 and 27 is not remarkable because the size scale is small in one TCP 23, but the amount of shift is proportional to the size scale of thermocompression bonding. A serious positional deviation occurs on the entire one side of the liquid crystal panel 20 to which a plurality of TCPs 23 are connected.

【0007】これを解決する方法として、TCP23を
1個ずつ圧着しズレを低減する方法があるが、圧着時間
はTCP1個当たり15〜20秒必要であり多数のTC
Pを用いる大型の液晶パネルでは工程時間が増大し実用
的ではない。
As a method of solving this, there is a method of crimping each TCP 23 one by one to reduce the displacement, but the crimping time is required to be 15 to 20 seconds per TCP, and a large number of TCs are required.
A large-sized liquid crystal panel using P is not practical because the process time increases.

【0008】本発明は、このような従来の半導体素子接
続方法の課題を考慮し、工程時間が短く、しかも、位置
精度が高い半導体素子接続方法及びその装置を提供する
ことを目的とするものである。
In view of the problems of the conventional semiconductor element connecting method, an object of the present invention is to provide a semiconductor element connecting method and apparatus having a short process time and high positional accuracy. is there.

【0009】[0009]

【課題を解決するための手段】本発明は、被接続基板上
に異方導電性接着シートを介して半導体素子を配置する
工程と、温度を変えることの出来る可変温度ステージ上
に被接続基板を配置した後、その可変温度ステージを昇
温し被接続基板を加熱する工程と、被接続基板の温度が
異方導電性接着シートの硬化開始温度以上の一定値に到
達した後、被接続基板温度と実質上等しい温度の加圧装
置にて、半導体素子を所定の時間加圧する工程とを備え
た半導体素子接続方法である。
According to the present invention, there is provided a step of disposing a semiconductor element on a substrate to be connected via an anisotropic conductive adhesive sheet and a substrate to be connected on a variable temperature stage whose temperature can be changed. After arranging, the temperature of the variable temperature stage is raised to heat the substrate to be connected, and after the temperature of the substrate to be connected reaches a certain value higher than the curing start temperature of the anisotropic conductive adhesive sheet, the temperature of the substrate to be connected is reached. And a step of pressurizing the semiconductor element for a predetermined time with a pressurizing device having substantially the same temperature.

【0010】また、本発明は、加熱および冷却機構を有
する、異方導電性接着シートを介して半導体素子が配置
された被接続基板を設置するための、設置ステージと、
被接続基板を加熱加圧することによって半導体素子と接
続するための、所定の温度に制御される加圧装置とを備
えた半導体素子接続装置である。
Further, the present invention comprises an installation stage for installing a substrate to be connected, on which semiconductor elements are arranged, with an anisotropic conductive adhesive sheet, having a heating and cooling mechanism,
It is a semiconductor element connecting device provided with a pressurizing device controlled to a predetermined temperature for connecting to a semiconductor element by heating and pressurizing a substrate to be connected.

【0011】[0011]

【作用】本発明方法では、異方導電性接着シートを介し
て半導体素子が仮固定された被接続基板を可変温度ステ
ージに配置しその後ステージを昇温する。その結果被接
続基板は加熱され温度が上昇し熱膨張が生じる。しか
し、半導体素子は被接続基板への仮固定力以外に拘束さ
れていないため基板の熱膨張に追随して変形する。被接
続基板温度が異方導電性接着シートの硬化開始温度以上
に達した時点において温度がほぼ等しい加圧装置にて半
導体素子を加圧し、異方導電性接着シートを所定の厚み
にまで押しつぶし電気的接続を得る。この工程におい
て、被接続基板と加圧装置の温度がほぼ等しいため基板
の寸法変化は生じない。次に異方導電性接着シートの硬
化が終了した時点において加圧を終了し、被接続基板は
徐々に室温に戻るが、既に異方導電性接着シートは硬化
しているため降温に伴う基板の熱収縮による半導体素子
と基板間の位置ズレは生じない。
In the method of the present invention, the substrate to which the semiconductor element is temporarily fixed is placed on the variable temperature stage via the anisotropic conductive adhesive sheet, and then the temperature of the stage is raised. As a result, the substrate to be connected is heated and its temperature rises, causing thermal expansion. However, the semiconductor element is deformed following the thermal expansion of the substrate because it is not constrained except for the temporary fixing force to the substrate to be connected. When the temperature of the substrate to be connected reaches the curing start temperature of the anisotropic conductive adhesive sheet or higher, the semiconductor elements are pressed by a pressurizing device that has approximately the same temperature, and the anisotropic conductive adhesive sheet is crushed to a prescribed thickness and then electrically Get a physical connection. In this step, since the temperature of the substrate to be connected and the temperature of the pressurizing device are almost the same, the dimensional change of the substrate does not occur. Next, when the curing of the anisotropic conductive adhesive sheet is completed, the pressurization is terminated and the substrate to be connected is gradually returned to room temperature, but since the anisotropic conductive adhesive sheet has already been cured, the The positional deviation between the semiconductor element and the substrate due to heat shrinkage does not occur.

【0012】また、本発明の装置では、設置ステージは
加熱および冷却機構を有するため、基板の加熱が速やか
に行われると共に冷却機構により速やかに被接続基板搭
載以前の状態に戻り、次の基板と半導体素子の接続が滞
りなく実施できる。
Further, in the apparatus of the present invention, since the installation stage has a heating and cooling mechanism, the substrate is quickly heated, and the cooling mechanism promptly returns to the state before mounting the substrate to be connected to the next substrate. The semiconductor elements can be connected without delay.

【0013】[0013]

【実施例】以下、本発明の実施例について図面を参照し
て説明する。
Embodiments of the present invention will be described below with reference to the drawings.

【0014】図1は本発明にかかる一実施例における半
導体素子接続装置の側面図である。
FIG. 1 is a side view of a semiconductor element connecting device according to an embodiment of the present invention.

【0015】被接続基板を配置するステージ1は図2に
示すように矢印の方向に電流を流すことによりパネル支
持面7が短時間で昇温し、ノズル3より低温の空気を吹
き付けることにより短時間で降温できる構造になってい
る。ステージ1を構成する素材は熱膨張係数が非常に小
さいインバー材を使用し、温度変化による形状変化を抑
えている。
In the stage 1 on which the substrate to be connected is placed, the panel supporting surface 7 is heated in a short time by passing a current in the direction of the arrow as shown in FIG. It has a structure that allows the temperature to be lowered in time. As a material forming the stage 1, an Invar material having a very small coefficient of thermal expansion is used to suppress a shape change due to a temperature change.

【0016】加圧装置2は図3に示すように金属ブロッ
クに円筒状ヒーター8を埋め込んだ構造であり、温度セ
ンサ9にて温度を検出し、ヒーター電流を制御すること
により金属ブロックを一定の温度に保っている。図1に
示すように加圧装置全体は空気シリンダ4により上下に
移動し、ステージ1上に置かれた被接続基板の端子部を
加圧することができるようになっている。
As shown in FIG. 3, the pressurizing device 2 has a structure in which a cylindrical heater 8 is embedded in a metal block, and the temperature is detected by a temperature sensor 9, and the heater current is controlled to keep the metal block constant. Keeping at temperature. As shown in FIG. 1, the entire pressurizing device can be moved up and down by an air cylinder 4 to pressurize the terminal portion of the substrate to be connected placed on the stage 1.

【0017】本実施例では、被接続基板は液晶パネルを
構成するガラス基板であり、接続される半導体素子はテ
ープキャリアパッケージ(TCP)実装されたLSIで
ある。
In this embodiment, the substrate to be connected is a glass substrate constituting a liquid crystal panel, and the semiconductor element to be connected is an LSI mounted with a tape carrier package (TCP).

【0018】まず図4に示すように、TCP10と液晶
パネルの端子11上の電極パターンを位置整合した状態
で、双方を異方導電性接着シート12を介して仮接着す
る。
First, as shown in FIG. 4, with the TCP 10 and the electrode pattern on the terminal 11 of the liquid crystal panel aligned, the both are temporarily adhered via the anisotropic conductive adhesive sheet 12.

【0019】次に図5に示すように液晶パネルの端子1
1が接続装置のステージ1の直上に来るように配置す
る。次に前記ステージ1に電流を流し昇温させ液晶パネ
ルの端子11を加熱する。本実施例では150℃以上で
硬化を開始する異方導電性接着シート12を使用したた
め液晶パネルの端子温度が160℃に達した時点でステ
ージ1に流す電流を調整し、160℃を保つようにし
た。
Next, as shown in FIG. 5, the terminal 1 of the liquid crystal panel
1 is placed directly above the stage 1 of the connecting device. Next, a current is passed through the stage 1 to raise the temperature and heat the terminals 11 of the liquid crystal panel. In this embodiment, since the anisotropic conductive adhesive sheet 12 which starts curing at 150 ° C. or higher is used, when the terminal temperature of the liquid crystal panel reaches 160 ° C., the current passed through the stage 1 is adjusted so as to maintain 160 ° C. did.

【0020】次に、図6に示すように予め160℃に加
熱し保温しておいた加圧装置2を降下させTCP10を
上から加圧し、異方導電性接着シート12中の導電粒子
が圧力変形した状態で接着剤が硬化するまで約30秒間
加圧を継続した。異方導電性接着シート12は硬化開始
温度を超えると急速に硬化するため、液晶パネル端子の
昇温速度を充分に速くすると共に、設定温度(本実施例
では160℃)に達すると同時に加圧を開始することが
必要である。
Next, as shown in FIG. 6, the pressure device 2 which has been heated and kept at 160 ° C. in advance is lowered to press the TCP 10 from above so that the conductive particles in the anisotropic conductive adhesive sheet 12 are pressed. Pressing was continued for about 30 seconds until the adhesive was cured in the deformed state. Since the anisotropic conductive adhesive sheet 12 is rapidly cured when the curing start temperature is exceeded, the temperature rising rate of the liquid crystal panel terminals is made sufficiently fast, and at the same time when the set temperature (160 ° C. in this embodiment) is reached, pressure is applied. It is necessary to start.

【0021】次に、ステージ1に流す電流を停止し、ノ
ズル3から冷却空気の送風を開始すると同時に加圧装置
2を上昇させ、その後液晶パネルをステージ1より取り
出し一連の接続作業を終了する。この液晶パネルの取り
出しタイミングについては、既に異方導電性接着シート
12は硬化しTCP10は端子11に強固に接着してい
るため、端子温度が160℃の状態でステージより取り
出しても問題ない。むしろ工程時間の短縮のためにはス
テージ1の降温が開始する前に液晶パネルを取り出し、
次の液晶パネルの配置作業中にステージ1の降温を行っ
た方が有効である。
Next, the current flowing to the stage 1 is stopped, the cooling air is started to be blown from the nozzles 3, and at the same time, the pressurizing device 2 is moved up. Then, the liquid crystal panel is taken out of the stage 1 and a series of connection work is completed. Regarding the timing of taking out the liquid crystal panel, since the anisotropic conductive adhesive sheet 12 has already been hardened and the TCP 10 has been firmly adhered to the terminal 11, there is no problem even if the liquid crystal panel is taken out of the stage at a terminal temperature of 160 ° C. Rather, in order to shorten the process time, take out the liquid crystal panel before the temperature drop of stage 1,
It is more effective to lower the temperature of the stage 1 during the next work of arranging the liquid crystal panel.

【0022】次に、本発明の他の実施例を説明する。Next, another embodiment of the present invention will be described.

【0023】図7は他の一実施例における半導体素子接
続装置の側面図である。
FIG. 7 is a side view of a semiconductor element connecting device according to another embodiment.

【0024】図8に示すようにステージは被接続基板の
支持部材13と上下可動式の加熱ブロック14より構成
される。加熱ブロック14は金属ブロック16に円筒状
ヒーター17を埋め込んだ構造であり、温度センサ18
にて温度を検出し、ヒーター電流を制御することにより
金属ブロックを一定の温度に保っている。ステージは加
熱ブロック14を支持部材13に近接または密着させる
ことにより支持部材13を加熱し、その結果支持部材1
3上に配置された被接続基板を昇温させることができ
る。また、加熱ブロック14を支持部材13より分離し
た後、ノズル3より低温の空気を吹き付けることにより
支持部材13を短時間で降温できる構造になっている。
このように加熱ブロック14と支持部材13を分離した
構造は第1の実施例における電流加熱ステージのような
複雑な加工を要する部材が不要であるという利点があ
る。
As shown in FIG. 8, the stage comprises a support member 13 for the substrate to be connected and a vertically movable heating block 14. The heating block 14 has a structure in which a cylindrical heater 17 is embedded in a metal block 16, and a temperature sensor 18
The temperature is detected and the heater current is controlled to keep the metal block at a constant temperature. The stage heats the support member 13 by bringing the heating block 14 close to or in close contact with the support member 13, and as a result, the support member 1
It is possible to raise the temperature of the substrate to be connected, which is arranged on the substrate 3. Further, after the heating block 14 is separated from the support member 13, the temperature of the support member 13 can be lowered in a short time by blowing low temperature air from the nozzle 3.
As described above, the structure in which the heating block 14 and the supporting member 13 are separated has an advantage that a member that requires complicated processing such as the current heating stage in the first embodiment is unnecessary.

【0025】加圧装置2は、図9に示すように金属ブロ
ックに円筒状ヒーター8を埋め込んだ構造であり、温度
センサ9にて温度を検出しヒーター電流を制御すること
により金属ブロックを一定の温度に保っている。図7に
示すように加圧装置全体はエアシリンダ4により上下に
移動し、支持部材13上に置かれた被接続基板の端子を
加圧することができる。
As shown in FIG. 9, the pressurizing device 2 has a structure in which a cylindrical heater 8 is embedded in a metal block, and the temperature is detected by a temperature sensor 9 and the heater current is controlled to keep the metal block constant. Keeping at temperature. As shown in FIG. 7, the entire pressurizing device can be moved up and down by the air cylinder 4 to pressurize the terminals of the substrate to be connected placed on the supporting member 13.

【0026】第1の実施例と同様に被接続基板は液晶パ
ネルを構成するガラス基板であり、接続される半導体素
子はTCP実装されたLSIである。次にその接続方法
を説明する。
Similar to the first embodiment, the substrate to be connected is a glass substrate which constitutes a liquid crystal panel, and the semiconductor element to be connected is a TCP-mounted LSI. Next, the connection method will be described.

【0027】まず、図10に示すように、TCP10と
液晶パネルの端子11上の電極パターンを位置整合した
状態で、双方を異方導電性接着シート12を介して仮接
着する。
First, as shown in FIG. 10, in a state where the TCP 10 and the electrode pattern on the terminal 11 of the liquid crystal panel are aligned, both of them are temporarily bonded together via the anisotropic conductive adhesive sheet 12.

【0028】次に、図11に示すように液晶パネルの端
子11が接続装置のステージの支持部材13の直上に来
るように配置する。次に加熱ブロック14を上昇させ支
持部材13に密着し、その支持部材13を通して液晶パ
ネルの端子11を加熱する。
Next, as shown in FIG. 11, the terminals 11 of the liquid crystal panel are arranged so as to come directly above the supporting member 13 of the stage of the connecting device. Next, the heating block 14 is raised and brought into close contact with the supporting member 13, and the terminals 11 of the liquid crystal panel are heated through the supporting member 13.

【0029】次に、本実施例では150℃以上で硬化を
開始する異方導電性接着シート12を使用したため液晶
パネルの端子温度が160℃に達した時点で、図12に
示すように予め160℃に加熱し保温しておいた加圧装
置2を降下させTCP10を上から加圧し、異方導電性
接着シート12中の導電粒子が圧力変形した状態で接着
剤が硬化するまで約30秒間加圧を継続した。加圧装置
2がTCP10に接した時点でこれ以上基板を加熱する
必要が無いため加熱ブロック14は下降し支持部材13
より分離する。異方導電性接着シート12は硬化開始温
度を超えると急速に硬化するため、液晶パネル端子の昇
温速度を充分に速くすると共に、設定温度(本実施例で
は160℃)に達すると同時に加圧を開始することが必
要である。
Next, in this embodiment, since the anisotropic conductive adhesive sheet 12 which starts curing at 150 ° C. or higher is used, when the terminal temperature of the liquid crystal panel reaches 160 ° C., as shown in FIG. The pressure device 2 heated to ℃ and kept warm is lowered to press the TCP 10 from above, and the conductive particles in the anisotropic conductive adhesive sheet 12 are heated under pressure for about 30 seconds until the adhesive cures. The pressure continued. When the pressure device 2 contacts the TCP 10, there is no need to heat the substrate any more, and the heating block 14 descends and the supporting member 13
Be more separated. Since the anisotropic conductive adhesive sheet 12 is rapidly cured when the curing start temperature is exceeded, the temperature rising rate of the liquid crystal panel terminals is made sufficiently fast, and at the same time when the set temperature (160 ° C. in this embodiment) is reached, pressure is applied. It is necessary to start.

【0030】次に、設定時間後加圧装置2が上昇し、液
晶パネルを取り出し一連の接続作業を終了する。また、
次の基板の接続作業に備えてステージの支持部材13に
冷却空気を送風し一定温度まで冷却する。これは、毎回
作業開始時において被接続基板の温度が一定でないと基
板温度の上昇速度が変化し接続状態にばらつきが生じる
恐れがあり、また、作業時間が一定しないため生産管理
上悪影響があるためである。
Next, after the set time, the pressurizing device 2 rises, the liquid crystal panel is taken out, and a series of connection work is completed. Also,
In preparation for the next substrate connecting operation, cooling air is blown to the support member 13 of the stage to cool it to a constant temperature. This is because if the temperature of the substrate to be connected is not constant at the start of each work, the rise rate of the substrate temperature may change and the connection state may vary, and the work time is not constant, which adversely affects production control. Is.

【0031】なお、本発明は液晶パネルだけでなく異方
導電性接着シートを用いた接続工法において広く適用で
き、非常に高い位置精度が容易に得られる。
The present invention can be widely applied not only to the liquid crystal panel but also to a connecting method using an anisotropic conductive adhesive sheet, and a very high positional accuracy can be easily obtained.

【0032】また、本発明の可変温度ステージは、上記
実施例で開示された物に限られないことは言うまでもな
い。
Needless to say, the variable temperature stage of the present invention is not limited to the one disclosed in the above embodiment.

【0033】[0033]

【発明の効果】以上述べたところから明らかなように、
本発明の半導体素子接続方法および半導体素子接続装置
は、異方導電性接着シートを用いた熱圧着工法でありな
がら、被接続基板と加圧装置の温度差を解消させ、原理
的に生じる熱圧着時の位置ズレを根本的に無くしたもの
であり、高精度の接続が要求される高表示画素密度のカ
ラー液晶パネル等の製造を可能にするものである。
As is apparent from the above description,
INDUSTRIAL APPLICABILITY The semiconductor element connecting method and the semiconductor element connecting apparatus of the present invention are thermocompression bonding methods that use an anisotropic conductive adhesive sheet, but eliminate the temperature difference between the substrate to be connected and the pressurizing device, and in principle thermocompression bonding occurs. The present invention fundamentally eliminates the positional deviation at the time, and makes it possible to manufacture a color liquid crystal panel or the like having a high display pixel density which requires highly accurate connection.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例における半導体素子接続装置
の側面図
FIG. 1 is a side view of a semiconductor element connecting device according to an embodiment of the present invention.

【図2】同上半導体素子接続装置のステージ側面図FIG. 2 is a side view of a stage of the same semiconductor device connecting apparatus as above.

【図3】同上半導体素子接続装置の加熱装置側面図FIG. 3 is a side view of the heating device of the semiconductor element connecting device of the same as above.

【図4】同上液晶パネルの断面図FIG. 4 is a sectional view of the same liquid crystal panel as above.

【図5】同上半導体素子接続工程の一状態側面図FIG. 5 is a side view showing one state of the semiconductor element connecting process of the same.

【図6】同上半導体素子接続工程の一状態側面図FIG. 6 is a side view showing a state of a semiconductor element connecting process of the same as above.

【図7】本発明の他の実施例における半導体素子接続装
置の側面図
FIG. 7 is a side view of a semiconductor element connecting device according to another embodiment of the present invention.

【図8】同上半導体素子接続装置のステージ側面図FIG. 8 is a side view of a stage of the same semiconductor element connecting device as above.

【図9】同上半導体素子接続装置の加熱装置側面図FIG. 9 is a side view of the heating device for the semiconductor element connecting device of the same as above.

【図10】同上液晶パネルの断面図FIG. 10 is a sectional view of the same liquid crystal panel as above.

【図11】同上半導体素子接続工程の一状態側面図FIG. 11 is a side view showing a state of a semiconductor element connecting step of the same as above.

【図12】同上半導体素子接続工程の一状態側面図FIG. 12 is a side view showing one state of the same semiconductor device connecting step.

【図13】従来例における液晶パネルの斜視図FIG. 13 is a perspective view of a liquid crystal panel in a conventional example.

【図14】同上熱圧着工程の側面図FIG. 14 is a side view of the thermocompression bonding process as above.

【図15】(a)は、同上液晶パネルの段面図、(b)
は、同上液晶パネルの段面図、(c)は、同上液晶パネ
ルの段面図、(d)は、同上液晶パネルの段面図
FIG. 15 (a) is a plan view of the liquid crystal panel of the same as above, and FIG.
Is a plan view of the same liquid crystal panel, (c) is a plan view of the same liquid crystal panel, and (d) is a plan view of the same liquid crystal panel.

【符号の説明】[Explanation of symbols]

1 ステージ 2 加圧装置 3
ノズル 4 エアシリンダー 5 基礎フレーム 6
パネル支持台 7 パネル支持面 8 円筒状ヒーター 9
温度センサー 10 TCP 11 液晶パネル端子 12
異方導電性接着シート 13 支持部材 14 加熱ブロック 15
エアシリンダー 16 金属ブロック 17 円筒状ヒーター 18
温度センサー 20 液晶パネル 21 端子 22
異方導電性接着シート 23 TCP 24 ステージ 25
加圧装置 26 TCP電極 27 液晶パネル電極
1 Stage 2 Pressurizer 3
Nozzle 4 Air cylinder 5 Foundation frame 6
Panel support base 7 Panel support surface 8 Cylindrical heater 9
Temperature sensor 10 TCP 11 Liquid crystal panel terminal 12
Anisotropically conductive adhesive sheet 13 Support member 14 Heating block 15
Air cylinder 16 Metal block 17 Cylindrical heater 18
Temperature sensor 20 Liquid crystal panel 21 Terminal 22
Anisotropically conductive adhesive sheet 23 TCP 24 Stage 25
Pressure device 26 TCP electrode 27 Liquid crystal panel electrode

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】被接続基板上に異方導電性接着シートを介
して半導体素子を配置する工程と、 温度を変えることの出来る可変温度ステージ上に前記被
接続基板を配置した後、その可変温度ステージを昇温し
前記被接続基板を加熱する工程と、 前記被接続基板の温度が前記異方導電性接着シートの硬
化開始温度以上の一定値に到達した後、前記被接続基板
温度と実質上等しい温度の加圧装置にて、前記被接続基
板及び/又は半導体素子を所定の時間加圧、加熱する工
程と、 を備えたことを特徴とする半導体素子接続方法。
1. A step of arranging a semiconductor element on a substrate to be connected via an anisotropic conductive adhesive sheet, and arranging the substrate to be connected on a variable temperature stage whose temperature can be changed, and then changing the temperature. A step of heating the stage to raise the temperature of the substrate to be connected, and after the temperature of the substrate to be connected reaches a constant value equal to or higher than the curing start temperature of the anisotropic conductive adhesive sheet, the temperature of the substrate to be connected is substantially A method of connecting a semiconductor element, comprising: pressing and heating the substrate to be connected and / or the semiconductor element for a predetermined time with a pressurizing device at the same temperature.
【請求項2】加熱および冷却機構を有する、異方導電性
接着シートを介して半導体素子が配置された被接続基板
を設置するための、設置ステージと、 前記被接続基板及び/又は半導体素子を加圧、加熱す
る、所定の温度に制御された加圧装置と、 を備えたことを特徴とする半導体素子接続装置。
2. An installation stage for installing a substrate to be connected, which has a semiconductor element arranged thereon through an anisotropic conductive adhesive sheet, having a heating and cooling mechanism, and the substrate to be connected and / or the semiconductor element. A semiconductor element connection device comprising: a pressurizing device that pressurizes and heats and is controlled to a predetermined temperature.
JP27572893A 1993-11-04 1993-11-04 Semiconductor element connecting method and apparatus therefor Pending JPH07130795A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27572893A JPH07130795A (en) 1993-11-04 1993-11-04 Semiconductor element connecting method and apparatus therefor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27572893A JPH07130795A (en) 1993-11-04 1993-11-04 Semiconductor element connecting method and apparatus therefor

Publications (1)

Publication Number Publication Date
JPH07130795A true JPH07130795A (en) 1995-05-19

Family

ID=17559560

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27572893A Pending JPH07130795A (en) 1993-11-04 1993-11-04 Semiconductor element connecting method and apparatus therefor

Country Status (1)

Country Link
JP (1) JPH07130795A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6494359B1 (en) 1999-07-22 2002-12-17 Nec Corporation Thermo-compression bonding apparatus for connecting a liquid crystal panel to an external drive circuit
US7075036B2 (en) * 2001-06-08 2006-07-11 Shibaura Mechatronics Corporation Electronic part compression bonding apparatus and method
JP2006335036A (en) * 2005-06-06 2006-12-14 Canon Inc Manufacturing method of recording head and manufacturing device therefor
CN100426479C (en) * 2003-11-07 2008-10-15 日本Cmo株式会社 Bonding method and apparatus
CN109616589A (en) * 2018-12-19 2019-04-12 武汉华星光电半导体显示技术有限公司 For the engagement device of display panel and the joint method of display panel
US11515283B2 (en) 2019-05-22 2022-11-29 Samsung Display Co., Ltd. Flexible circuit film bonding apparatus and method of bonding flexible circuit film using the same

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6494359B1 (en) 1999-07-22 2002-12-17 Nec Corporation Thermo-compression bonding apparatus for connecting a liquid crystal panel to an external drive circuit
US7075036B2 (en) * 2001-06-08 2006-07-11 Shibaura Mechatronics Corporation Electronic part compression bonding apparatus and method
CN100426479C (en) * 2003-11-07 2008-10-15 日本Cmo株式会社 Bonding method and apparatus
JP2006335036A (en) * 2005-06-06 2006-12-14 Canon Inc Manufacturing method of recording head and manufacturing device therefor
JP4702934B2 (en) * 2005-06-06 2011-06-15 キヤノン株式会社 Recording head manufacturing method and manufacturing apparatus thereof
CN109616589A (en) * 2018-12-19 2019-04-12 武汉华星光电半导体显示技术有限公司 For the engagement device of display panel and the joint method of display panel
US11515283B2 (en) 2019-05-22 2022-11-29 Samsung Display Co., Ltd. Flexible circuit film bonding apparatus and method of bonding flexible circuit film using the same

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