JPH07124438A - Waste treatment equipment of vapor growth device - Google Patents

Abstract

PURPOSE:To provide the method for collecting efficiently waste whose main component is a substance whose vapor pressure is high at ordinary temperature, contained in exhaust gas from the vapor growth device, for instance, photophorus. CONSTITUTION:This processor is provided with two chambers of an adsorption changer 11 and a takeout chamber 13 separated by a value, waste is adsorbed temporarily in the adsorption chamber 11, and subsequently, by opening the value 12, an adsorbed substance is heated and dissociated, and adsorbed again on the takeout chamber side. After closing the valve 12, the adsorbed waste is collected.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a waste treatment apparatus and a vapor phase growth apparatus equipped with the treatment apparatus.

[0002]

2. Description of the Related Art Conventionally, as an exhaust gas treating apparatus of this type of vapor phase growth apparatus, FIG.
It was general to adopt the configuration shown in (in the case of an atmospheric pressure growth apparatus). That is, the fine powder solid component contained in the exhaust gas from the growth reactor was collected by the filter, and the gas component was collected by the immobilization treatment by the adsorbent provided in the abatement device.

[0003]

However, in the exhaust gas treatment system having the above-mentioned structure, the exhaust gas treatment system is solid or liquid at room temperature, such as phosphorus (P) in the exhaust gas, but has a sublimation point and a boiling point around room temperature. When a substance that easily vaporizes is included, the following problems have been revealed. That is, there was a problem that what was gas in the growth furnace was cooled and liquefied and solidified while being sent through the exhaust pipe and adhered to the pipe to clog the pipe and the filter. In addition, once it has adhered to the inside of the pipe, the vapor pressure at room temperature is high, so it is easily dissociated and adsorbed repeatedly to move inside the pipe and reach the abatement device, which lowers the abatement capacity of the device. It was gone.

The conventional techniques have taken measures such as frequent replacement of a clogged filter, a detoxifying agent whose performance has deteriorated, and baking of piping, but the apparatus must be stopped each time. However, it has brought about the disadvantages of lower operating rates and higher parts replacement costs.

[0005]

As described in the above description, the present invention provides a method for efficiently recovering and removing waste containing a substance having a high vapor pressure at room temperature, which has been difficult to recover and handle until now. To provide. Therefore, in the present invention, a first chamber (exhaust gas adsorption chamber) provided with a heating mechanism for efficiently adsorbing a substance having a high vapor pressure in the middle of the exhaust line and dissociating the substance, and the adsorption chamber Disposal consisting of a second chamber (waste extraction chamber), which is provided in the immediate vicinity via a gate valve and has a structure in which substances dissociated from the adsorption chamber can be adsorbed again at a place different from the exhaust line and taken out as they are Install the waste treatment equipment in the exhaust line.

[0006]

The operation will be described below with reference to FIG. During the vapor phase growth, the valve 12 between the waste adsorption chamber 11 and the extraction chamber 13 is closed, and the exhaust gas from the growth furnace passes only the waste adsorption chamber 11. At this time, more efficient adsorption becomes possible by cooling the entire chamber or the adsorption mechanism.
After the growth is completed, the exhaust line and the waste disposal device are shut off, and the valve 12 between the adsorption chamber 11 and the extraction chamber 13 is opened. When the heating device 103 of the adsorption chamber is operated in this state, the substance adsorbed in the chamber is dissociated, moved to the waste extraction chamber 13, and re-adsorbed. If the extraction chamber or the re-adsorption mechanism in the extraction chamber is cooled, the re-adsorption is further promoted. After the valve 12 between the adsorption chamber and the extraction chamber is closed, the waste re-adsorbed in the extraction chamber can be collected to enable the treatment of waste with high vapor pressure at room temperature, which was difficult to collect and remove until now. Become.

[0007] Here, if a mechanism for exhausting the extraction chamber 13 when the waste is toxic and a mechanism for purging the extraction chamber 13 with an inert gas are provided, the toxic gas can be removed and the work can proceed safely. it can. If the exhaust contains an ignitable substance, a mechanism for introducing an oxidizing gas into the chamber 13 is provided, and the exhaust can be burned or oxidized before taking it out, so that the work can be performed safely.

[0008]

1 shows a first embodiment according to the present invention. The waste adsorption chamber 11 is made of stainless steel and has an exhaust gas introduction port 101 from the growth reactor and an exhaust port 102. The interior of the chamber is provided with a baffle plate 110 to substantially increase the surface area and to increase the retention time of the exhaust gas in the chamber to enhance the adsorption efficiency. A heater 103 is attached to the outer wall of the main chamber to enable heating up to about 150 ° C.

The waste extraction chamber 13 separated by the gate valve 12 is equipped with fins to increase the surface area and enhance the adsorption efficiency as in the adsorption chamber. Since the main chamber is connected to the gate valve by the O-ring, it can be easily removed from this portion. As a result, the re-adsorbed waste can be easily collected.

FIG. 2 shows a second embodiment according to the present invention.
In addition to the embodiment described above, the structure is such that the collection efficiency of waste is further improved. The waste adsorption chamber 11 is equipped with a cooling means using a cooling agent. A heat insulating container is provided so as to surround the adsorption chamber, and a cooling agent 104 such as dry ice or liquid nitrogen can be introduced therein to enhance the adsorption efficiency. Although the side wall is cooled in the present embodiment, the efficiency can be further improved by adopting a structure in which a heat insulating container is provided at the head of the same room to directly cool the baffle plate.

In this embodiment, the waste extraction chamber 13 does not have a detachable structure, but a fin structure for increasing the adsorption area is provided in the interior of the same, and the fin structure is removed from the lower part of the same chamber to re-install it. The adsorbed waste can be easily collected. Further, the main chamber is provided with an inert gas introduction line 105 and an exhaust line 106, and has a structure capable of removing toxic residual gas by purging the inside with an inert gas such as nitrogen before opening the extraction chamber. .

FIG. 3 shows a concrete example of a vapor phase growth apparatus equipped with a waste treatment apparatus according to the present invention. As source gas, arsine 202, phosphine 203, trimethylindium (TMI) 204, triethylgallium (TEG) 2
No. 05 is used to grow InGaAsP crystal. While growing, the bypass valve 55 of the waste treatment device is closed, and the inlet / outlet valves 53 and 54 of the treatment device are opened. In the exhaust gas from the growth reactor, undecomposed arsine, phosphine, phosphorus or InAs, G which is a solid component
It contains aAs, InP, GaP, arsenic and the like. Of these, undecomposed arsine and phosphine are led to the abatement device and treated without being attached as gas in the pipe. Individual components such as InAs, GaAs, InP, GaP, and arsenic are collected by the filter 57. The substance containing phosphorus as a main component flows up to the vacuum pump 52 in a gaseous state, and is gradually solidified and adsorbed in the adsorption chamber 11 of the waste treatment device.

After the growth is completed, the bypass valve 55 is opened and the inlet / outlet valves 53 and 54 of the processing apparatus are closed to isolate the apparatus. After that, the gate valve 12 is opened and the adsorption chamber is opened to 120
When the extraction chamber is cooled to 10 ° C. or lower while being heated at 30 ° C. for about 30 minutes, most of the waste adsorbed in the adsorption chamber during growth moves to the extraction chamber. After that, the gate valve 12 is closed and the pressure in the extraction chamber is reduced to about 0.1 atm, and then air is introduced as an oxidizing gas. By repeating this operation of exhausting and introducing the oxidizing gas several times, the toxic gas component in the extraction chamber is removed and at the same time, the surface of the waste material is not oxidized and ignited.

Although a reduced pressure growth apparatus is shown in this embodiment, it can be easily applied to an atmospheric pressure growth apparatus. In that case, it is desirable to install this treatment device in the exhaust line as close to the growth reactor as possible.

[0015]

EFFECT OF THE INVENTION By providing the waste treatment apparatus according to the present invention in the exhaust line of a vapor phase growth apparatus, it is possible to easily, efficiently and safely recover solid or liquid waste having a high vapor pressure at room temperature. Is possible. As a result, the maintenance of the growth apparatus is simple and easy, and the operating cost can be kept low.

[Brief description of drawings]

FIG. 1 is a waste disposal device according to a first embodiment of the present invention.

FIG. 2 is a waste disposal device according to a second embodiment of the present invention.

FIG. 3 is a conceptual diagram of a reduced pressure vapor phase growth apparatus according to a third embodiment of the present invention.

FIG. 4 is a conceptual diagram showing a conventional reduced pressure vapor phase growth apparatus.

FIG. 5 is a conceptual diagram showing a conventional atmospheric pressure vapor phase growth apparatus.

[Explanation of symbols]

 11: Waste adsorption chamber 12: Partition valve 13: Waste extraction chamber 51: Growth furnace 52: Vacuum pump 53: Inlet valve 54: Outlet valve 55: Bypass valve 56: Harmful device 57: Filter 103: Heater 104: Cold Agent 105: Inert gas introduction line 106: Exhaust line 107: O-ring 108: Oxidizing gas introduction line 109: Cooling water

Claims (7)

[Claims] 1. An apparatus comprising at least two chambers, wherein the first chamber is inserted into an exhaust line of the vapor phase growth apparatus, and has a mechanism for adsorbing waste from the apparatus and heating. Has a function of dissociating the adsorbed substance,
The second chamber is provided in the immediate vicinity of the first chamber via a valve, has a function of adsorbing the dissociated substance again, and a mechanism for collecting the re-adsorbed substance while adsorbing it. Waste treatment equipment having. 2. The waste treatment apparatus according to claim 1, wherein a cooling mechanism is provided in the first chamber. 3. The waste treatment apparatus according to claim 1, wherein the re-adsorption mechanism provided in the second chamber is provided with a cooling unit. 4. The waste treatment device according to claim 1, wherein an exhaust mechanism is provided in the second chamber. 5. The waste treatment device according to claim 1, wherein an inert gas or oxidizing gas introduction mechanism is provided in the second chamber. 6. A reduced pressure vapor phase growth apparatus comprising the waste treatment apparatus according to any one of claims 1 to 5 immediately after a reduced pressure pump. 7. A vapor phase growth apparatus comprising the waste treatment apparatus according to any one of claims 1 to 5 immediately after a reaction furnace.