JPH0697328A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPH0697328A JPH0697328A JP4247757A JP24775792A JPH0697328A JP H0697328 A JPH0697328 A JP H0697328A JP 4247757 A JP4247757 A JP 4247757A JP 24775792 A JP24775792 A JP 24775792A JP H0697328 A JPH0697328 A JP H0697328A
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- semiconductor
- semiconductor circuit
- covered
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
- H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/0212—Auxiliary members for bonding areas, e.g. spacers
- H01L2224/02122—Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body
- H01L2224/02163—Auxiliary members for bonding areas, e.g. spacers being formed on the semiconductor or solid-state body on the bonding area
- H01L2224/02165—Reinforcing structures
- H01L2224/02166—Collar structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/023—Redistribution layers [RDL] for bonding areas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/04042—Bonding areas specifically adapted for wire connectors, e.g. wirebond pads
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/05541—Structure
- H01L2224/05548—Bonding area integrally formed with a redistribution layer on the semiconductor or solid-state body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
- H01L2224/0554—External layer
- H01L2224/0555—Shape
- H01L2224/05552—Shape in top view
- H01L2224/05554—Shape in top view being square
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/48463—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a ball bond
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01013—Aluminum [Al]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01033—Arsenic [As]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3011—Impedance
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は、半導体装置に関し、特
に小型で薄型のパッケージや高速・大容量化に適した半
導体装置に関するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device, and more particularly to a small and thin package and a semiconductor device suitable for high speed and large capacity.
【０００２】[0002]
【従来の技術】近年、半導体装置は実装密度を上げるた
めにそのパッケージは薄型で小型化が要求されるように
なってきている。これに伴って、従来ではパッケージの
肉厚が大きいために問題にならなかった遮光性の問題が
大きくクローズアップされるようになってきた。2. Description of the Related Art In recent years, semiconductor devices have been required to be thin and compact in order to increase the packaging density. Along with this, the problem of light-shielding property, which has not been a problem due to the large thickness of the package in the past, has come to be greatly highlighted.
【０００３】また、素子の高性能化及び大容量化によ
り、動作周波数の上昇に伴う不要輻射が発生するという
問題、及びチップサイズの増大に伴ってボンディングパ
ッドがチップ内において占める面積割合が増加するとい
う問題が生じてきた。Further, as the performance and capacity of the device increase, unnecessary radiation occurs with an increase in operating frequency, and as the chip size increases, the area ratio of the bonding pad in the chip increases. The problem has arisen.
【０００４】以下、従来の半導体装置について説明す
る。A conventional semiconductor device will be described below.
【０００５】図６は従来の半導体装置の平面構造を示
し、図７は従来の半導体装置の断面構造を示している。
同図において、１は半導体チップ、２は半導体基板の表
面に形成された半導体回路、３Ａ，３Ｂ，３Ｃ，３Ｄ，
３Ｅ，３Ｆ，３Ｇ，３Ｈはそれぞれ半導体基板１の表面
に形成されたボンディングパッド、５は半導体基板１の
表面を覆う酸化膜からなる保護膜、７Ａは保護膜５を覆
う樹脂系材料からなる絶縁膜、８は図示しない外部引き
出し用端子とボンディングパッド３Ａ〜３Ｈとを接続す
るボンディングワイヤである。FIG. 6 shows a planar structure of a conventional semiconductor device, and FIG. 7 shows a sectional structure of a conventional semiconductor device.
In the figure, 1 is a semiconductor chip, 2 is a semiconductor circuit formed on the surface of a semiconductor substrate, 3A, 3B, 3C, 3D,
3E, 3F, 3G and 3H are bonding pads formed on the surface of the semiconductor substrate 1, 5 is a protective film made of an oxide film covering the surface of the semiconductor substrate 1, and 7A is an insulating material made of a resin material covering the protective film 5. A film, 8 is a bonding wire for connecting an external lead-out terminal (not shown) to the bonding pads 3A to 3H.
【０００６】図７から明らかなように、半導体チップ１
の表面には半導体回路２とボンディングパッド３Ａ〜３
Ｈとが形成され、半導体チップ１の表面におけるボンデ
ィングパッド３Ａ〜３Ｈを除く部分は保護膜５によって
覆われ、該保護膜５の表面は樹脂系材料からなる絶縁膜
７Ａによって覆われており、該絶縁膜７Ａは半導体チッ
プ１に加わる応力から半導体回路２を保護している。As is apparent from FIG. 7, the semiconductor chip 1
On the surface of the semiconductor circuit 2 and the bonding pads 3A-3
H is formed, and a portion of the surface of the semiconductor chip 1 excluding the bonding pads 3A to 3H is covered with a protective film 5, and the surface of the protective film 5 is covered with an insulating film 7A made of a resin material. The insulating film 7A protects the semiconductor circuit 2 from the stress applied to the semiconductor chip 1.
【０００７】[0007]
【発明が解決しようとする課題】ところが、上記従来の
半導体装置の構造によると、図７に示すように、半導体
回路２の上には保護膜５と絶縁膜７Ａとが設けられてい
るのみであり、これら保護膜５及び絶縁膜７は通常遮光
性に乏しいので、半導体チップ１が樹脂パッケージに覆
われていない裸の状態である場合、或いは半導体チップ
１を封止する樹脂パッケージの肉厚が薄い場合には、外
部からの光が保護膜５及び絶縁膜７Ａを透過して半導体
回路２に到達するため、半導体回路２の動作が不安定に
なるという第１の問題がある。However, according to the structure of the conventional semiconductor device described above, as shown in FIG. 7, only the protective film 5 and the insulating film 7A are provided on the semiconductor circuit 2. However, since the protective film 5 and the insulating film 7 usually have poor light-shielding properties, when the semiconductor chip 1 is in a bare state where it is not covered with the resin package, or the thickness of the resin package for sealing the semiconductor chip 1 is small. When the thickness is thin, light from the outside passes through the protective film 5 and the insulating film 7A and reaches the semiconductor circuit 2, so that there is the first problem that the operation of the semiconductor circuit 2 becomes unstable.
【０００８】また、高速に動作する半導体回路２から電
磁波などの不要輻射が発生し、この不要輻射が外部の電
気回路や機器に悪影響を及ぼすという第２の問題もあ
る。There is also a second problem that unnecessary radiation such as electromagnetic waves is generated from the semiconductor circuit 2 which operates at high speed, and this unwanted radiation adversely affects external electric circuits and equipment.
【０００９】さらに、図６に示すように、半導体チップ
１の表面においては、半導体回路２とボンディングパッ
ド３Ａ〜３Ｈとは別々の領域を占めており、半導体チッ
プ１の集積化技術が進み半導体回路２の面積が少なくな
っても、ボンディングパッド３Ａ〜３Ｈの面積は変わら
ない。このため、半導体チップ１の集積率が向上しても
半導体チップの面積の減少率は鈍化するという第３の問
題もある。Further, as shown in FIG. 6, on the surface of the semiconductor chip 1, the semiconductor circuit 2 and the bonding pads 3A to 3H occupy different regions, and the integration technology of the semiconductor chip 1 is advanced and the semiconductor circuit is advanced. Even if the area of 2 is reduced, the areas of the bonding pads 3A to 3H do not change. Therefore, there is a third problem that the reduction rate of the area of the semiconductor chip is slowed down even if the integration rate of the semiconductor chip 1 is improved.
【００１０】本発明は、少なくとも上記第１の問題を解
決し、外部からの光が保護膜及び絶縁膜を透過して半導
体回路に到達する事態を防止し、半導体回路の動作の安
全性を確保することを目的とする。The present invention solves at least the above-mentioned first problem, prevents a situation in which light from the outside passes through the protective film and the insulating film and reaches the semiconductor circuit, and secures the operation safety of the semiconductor circuit. The purpose is to do.
【００１１】[0011]
【課題を解決するための手段】請求項１の発明は、上記
の目的を達成するため、半導体チップに形成された半導
体回路の上面を遮光膜によって覆うものであって、具体
的には、半導体装置を、半導体回路が形成された半導体
チップの上面は略全面に亘って樹脂系材料からなる第１
の絶縁膜によって覆われ、該第１の絶縁膜における少な
くとも上記半導体回路の上側部分は遮光膜によって覆わ
れ、該遮光膜の上面は略全面に亘って樹脂系材料からな
る第２の絶縁膜によって覆われている構成とするもので
ある。In order to achieve the above object, the invention of claim 1 is to cover the upper surface of a semiconductor circuit formed on a semiconductor chip with a light-shielding film. In the device, the first surface of the semiconductor chip on which the semiconductor circuit is formed is made of a resin material over substantially the entire surface.
Of the first insulating film, at least the upper portion of the semiconductor circuit in the first insulating film is covered with the light shielding film, and the upper surface of the light shielding film is covered with the second insulating film made of a resin material over substantially the entire surface. The configuration is covered.
【００１２】請求項２の発明は、上記第１の問題に加え
て上記第２の問題をも解決するものであって、具体的に
は、請求項１の構成に、上記遮光膜は導電性材料により
形成されており且つ上記半導体回路の接地線に接続され
ているという構成を付加するものである。The invention of claim 2 solves not only the first problem but also the second problem. Specifically, in the structure of claim 1, the light-shielding film is electrically conductive. The structure is made of a material and is connected to the ground line of the semiconductor circuit.
【００１３】請求項３の発明は、上記第１の問題に加え
て上記第３の問題をも解決するものであって、具体的に
は、半導体装置を、半導体回路が形成された半導体チッ
プの上面は略全面に亘って樹脂系材料からなる第１の絶
縁膜によって覆われ、該第１の絶縁膜における上記半導
体回路の上側部分の上面に沿って遮光性材料からなり上
記半導体回路の入出力端子に接続されたボンディングパ
ッドが設けられ、該ボンディングパッドにおけるボンデ
ィングワイヤが取り付けられていない部位の上面は略全
面に亘って樹脂系材料からなる第２の絶縁膜によって覆
われている構成とするものである。According to a third aspect of the present invention, the third problem is solved in addition to the first problem. Specifically, a semiconductor device is a semiconductor chip formed with a semiconductor circuit. The upper surface is substantially entirely covered with a first insulating film made of a resin material, and is made of a light-shielding material along the upper surface of the upper portion of the semiconductor circuit in the first insulating film. A bonding pad connected to the terminal is provided, and an upper surface of a portion of the bonding pad where the bonding wire is not attached is covered with a second insulating film made of a resin material over substantially the entire surface. Is.
【００１４】[0014]
【作用】請求項１の構成により、半導体チップの上面を
覆う第１の絶縁膜における少なくとも半導体回路の上側
部分は遮光膜によって覆われているため、外部からの光
は遮光膜によって遮られ、半導体回路に到達することは
ない。According to the structure of claim 1, since at least the upper portion of the semiconductor circuit in the first insulating film covering the upper surface of the semiconductor chip is covered with the light shielding film, light from the outside is shielded by the light shielding film, It never reaches the circuit.
【００１５】請求項２の構成により、遮光膜は半導体回
路の接地線に接続されているため、半導体回路が高速動
作する際に発生する不要輻射は電磁シールドされる。According to the second aspect of the present invention, since the light shielding film is connected to the ground line of the semiconductor circuit, unnecessary radiation generated when the semiconductor circuit operates at high speed is electromagnetically shielded.
【００１６】請求項２の構成により、半導体チップの上
面を覆う第１の絶縁膜における半導体回路の上側部分の
上面に沿って遮光性材料からなり半導体回路の入出力端
子に接続されたボンディングパッドが設けられているた
め、ボンディングパッドを半導体回路と平面的に配置し
なくてもよいので、半導体チップの面積を小さくするこ
とができる。また、ボンディングパッドは遮光性材料か
らなり且つ半導体回路の上側に設けられているため、該
ボンディングパッドは外部からの光が半導体回路に到達
することを防止している。According to the structure of claim 2, bonding pads made of a light-shielding material and connected to the input / output terminals of the semiconductor circuit are provided along the upper surface of the upper part of the semiconductor circuit in the first insulating film covering the upper surface of the semiconductor chip. Since the bonding pad is provided, it is not necessary to dispose the bonding pad in a plane with the semiconductor circuit, so that the area of the semiconductor chip can be reduced. Further, since the bonding pad is made of a light-shielding material and provided on the upper side of the semiconductor circuit, the bonding pad prevents external light from reaching the semiconductor circuit.
【００１７】[0017]
【実施例】以下、本発明の一実施例について、図面を参
照しながら説明する。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.
【００１８】図１は本発明の第１実施例に係る半導体装
置の平面構造を、図２は上記半導体装置の断面構造をそ
れぞれ示している。同図に示すように、半導体チップ１
の表面における中央部には半導体回路２が形成されてい
ると共に、半導体チップ１の表面における周辺部にはボ
ンディングパッド３Ａ，３Ｂ，３Ｃ，３Ｄ，３Ｅ，３
Ｆ，３Ｇ，３Ｈがそれぞれ形成されている。半導体チッ
プ１の表面におけるボンディングパッド３Ａ〜３Ｈを除
く部分は酸化膜からなる保護膜５により覆われ、保護膜
５の表面は全面に亘って樹脂系材料からなる第１の絶縁
膜６によって覆われている。第１の絶縁膜６の表面にお
ける周縁部を除く部分はアルミニウムよりなる遮光膜４
によって覆われ、第１の絶縁膜６の表面における遮光膜
４により覆われていない部分の表面及び遮光膜４の表面
は全面に亘って樹脂系材料からなる第２の絶縁膜７Ｂに
よって覆われている。尚、同図において、８は図示しな
い外部引き出し用端子とボンディングパッド３Ａ〜３Ｈ
とを接続するボンディングワイヤである。FIG. 1 shows a plane structure of a semiconductor device according to a first embodiment of the present invention, and FIG. 2 shows a sectional structure of the semiconductor device. As shown in FIG.
The semiconductor circuit 2 is formed in the central portion of the surface of the semiconductor chip, and the bonding pads 3A, 3B, 3C, 3D, 3E, 3 are formed in the peripheral portion of the surface of the semiconductor chip 1.
F, 3G and 3H are formed respectively. A portion of the surface of the semiconductor chip 1 excluding the bonding pads 3A to 3H is covered with a protective film 5 made of an oxide film, and the entire surface of the protective film 5 is covered with a first insulating film 6 made of a resin material. ing. A portion of the surface of the first insulating film 6 excluding the peripheral portion is made of aluminum and is a light shielding film 4
And the surface of the portion of the surface of the first insulating film 6 not covered by the light shielding film 4 and the surface of the light shielding film 4 are entirely covered with the second insulating film 7B made of a resin material. There is. In the figure, 8 is a terminal for external drawing and bonding pads 3A to 3H (not shown).
It is a bonding wire that connects with.
【００１９】本第１実施例に係る半導体装置によると、
外部からの光は第２の絶縁膜７Ｂを透過しても遮光膜４
に遮られるので半導体回路２には到達しない。このた
め、内部に侵入した光による半導体回路２の誤動作は防
止される。また、遮光膜４は第２の絶縁膜７Ｂによって
覆われているため、面積の大きい遮光膜４に生じる応力
の緩和が図られている。このため、半導体チップ１が樹
脂パッケージによって封止されていない裸の状態或いは
樹脂パッケージの薄型化により樹脂パッケージの肉厚が
薄くなっても半導体装置の遮光性は確保される。According to the semiconductor device of the first embodiment,
Even if light from the outside passes through the second insulating film 7B, the light shielding film 4
The semiconductor circuit 2 is not reached because it is blocked by. Therefore, the malfunction of the semiconductor circuit 2 due to the light penetrating inside is prevented. Further, since the light shielding film 4 is covered with the second insulating film 7B, the stress generated in the light shielding film 4 having a large area is relaxed. Therefore, even when the semiconductor chip 1 is not sealed with the resin package in a bare state or the resin package is thinned, the light-shielding property of the semiconductor device is ensured even if the resin package becomes thin.
【００２０】図３は本発明の第２実施例に係る半導体装
置の平面構造を示している。FIG. 3 shows a planar structure of a semiconductor device according to the second embodiment of the present invention.
【００２１】本第２実施例においては、第１実施例と同
様に、半導体チップ１の表面には半導体回路２が形成さ
れ、半導体チップ１の表面における周辺部にはボンディ
ングパッド３Ａ，３Ｂ，３Ｃ，３Ｄ，３Ｅ，３Ｆ，３Ｇ
が形成され、半導体チップ１の表面におけるボンディン
グパッド３Ａ〜３Ｇを除く部分は酸化膜からなる保護膜
５により覆われ、保護膜５の表面は全面に亘って樹脂系
材料からなる第１の絶縁膜６によって覆われ、第１の絶
縁膜６の表面はアルミニウムよりなる遮光膜４によって
覆われ、遮光膜４の表面は全面に亘って樹脂系材料から
なる第２の絶縁膜７Ｂによって覆われている。In the second embodiment, similarly to the first embodiment, the semiconductor circuit 2 is formed on the surface of the semiconductor chip 1, and the bonding pads 3A, 3B, 3C are formed on the peripheral portion of the surface of the semiconductor chip 1. , 3D, 3E, 3F, 3G
Is formed, and the portion of the surface of the semiconductor chip 1 excluding the bonding pads 3A to 3G is covered with a protective film 5 made of an oxide film, and the entire surface of the protective film 5 is made of a first insulating film made of a resin material. 6, the surface of the first insulating film 6 is covered with the light shielding film 4 made of aluminum, and the entire surface of the light shielding film 4 is covered with the second insulating film 7B made of a resin material. .
【００２２】本第２実施例の特徴として、半導体回路２
の接地線と遮光膜４とを接続するコンタクト部９Ａ，９
Ｂ，９Ｃ，９Ｄ，９Ｅ，９Ｆがそれぞれ設けられてい
る。A feature of the second embodiment is that the semiconductor circuit 2
Contact portions 9A, 9 for connecting the ground wire of
B, 9C, 9D, 9E and 9F are provided respectively.
【００２３】従って、半導体回路２は高速動作する際
に、さまざまな不要輻射を発生し外部の機器に悪影響を
及ぼす原因になるが、本第２実施例においては、電磁シ
ールドされているので上述の不要輻射を防止することが
できる。Therefore, when the semiconductor circuit 2 operates at a high speed, various unnecessary radiations are generated, which may adversely affect external equipment. However, in the second embodiment, the semiconductor circuit 2 is electromagnetically shielded, so that the above-mentioned problem occurs. Unwanted radiation can be prevented.
【００２４】また、アルミニウムよりなる遮光膜４は、
極めて低インピーダンスの接地線として働くので、半導
体回路２の動作時に流れる瞬時電流による接地線の電位
変動を抑制することができる。このため、本第２実施例
によると、半導体チップ１の面積を増大することなく、
接地線インピーダンスを下げることが可能になる。The light-shielding film 4 made of aluminum is
Since it functions as a ground line having an extremely low impedance, it is possible to suppress potential fluctuations in the ground line due to an instantaneous current that flows when the semiconductor circuit 2 operates. Therefore, according to the second embodiment, without increasing the area of the semiconductor chip 1,
It is possible to lower the ground line impedance.
【００２５】図４は本発明の第３実施例に係る半導体装
置の平面構造を、図５は該半導体装置の断面構造をそれ
ぞれ示している。FIG. 4 shows a plane structure of a semiconductor device according to a third embodiment of the present invention, and FIG. 5 shows a sectional structure of the semiconductor device.
【００２６】本第３実施例においては、第１実施例と同
様に、半導体チップ１の表面には半導体回路２が形成さ
れ、半導体チップ１の表面における周辺部には内部側ボ
ンディングパッド３Ｋが形成されており、半導体チップ
１の表面における内部側ボンディングパッド３Ｋを除く
部分は酸化膜からなる保護膜５により覆われ、保護膜５
の表面は全面に亘って樹脂系材料からなる第１の絶縁膜
６によって覆われている。これにより、保護膜５及び第
１の絶縁膜６における内部側ボンディングパッド３Ｋの
上側にはコンタクトホールが形成されている。第１の絶
縁膜６の周縁部上面には、アルミニウムよりなる外部側
ボンディングパッド１０Ａ，１０Ｂ，１０Ｃ，１０Ｄ，
１０Ｅ，１０Ｆ，１０Ｇ，１０Ｈが半導体回路２の一部
分を覆うように形成されており、各外部側ボンディング
パッド１０Ａ〜１０Ｈは対応する内部側ボンディングパ
ッド３Ｋと上記のコンタクトホールを通して電気的に接
続されている。外部側ボンディングパッド１０Ａ〜１０
Ｈにおける中央部を除く部分の表面及び第１の絶縁膜６
の表面は、樹脂系材料からなる第２の絶縁膜７Ｂによっ
て覆われており、外部側ボンディングパッド１０Ａ〜１
０Ｈの中央部には、該外部側ボンディングパッド１０Ａ
〜１０Ｈと図示しない外部引き出し用端子とを接続する
ボンディングワイヤ８が取り付けられている。In the third embodiment, similarly to the first embodiment, the semiconductor circuit 2 is formed on the surface of the semiconductor chip 1, and the inner side bonding pad 3K is formed on the peripheral portion of the surface of the semiconductor chip 1. The portion of the surface of the semiconductor chip 1 excluding the inner bonding pads 3K is covered with the protective film 5 made of an oxide film.
The entire surface of is covered with the first insulating film 6 made of a resin material. As a result, a contact hole is formed above the inner bonding pad 3K in the protective film 5 and the first insulating film 6. External bonding pads 10A, 10B, 10C, 10D made of aluminum are formed on the upper surface of the peripheral edge of the first insulating film 6.
10E, 10F, 10G and 10H are formed to cover a part of the semiconductor circuit 2, and the external bonding pads 10A to 10H are electrically connected to the corresponding internal bonding pads 3K through the contact holes. There is. External bonding pads 10A-10
The surface of the portion other than the central portion of H and the first insulating film 6
Is covered with a second insulating film 7B made of a resin material, and the external bonding pads 10A-1
The outer bonding pad 10A is provided at the center of 0H.
Bonding wires 8 for connecting 10H to 10H and an external lead terminal (not shown) are attached.
【００２７】本第３実施例に係る半導体装置において
は、内部側ボンディングパッド３Ｋは外部側ボンディン
グパッド１０Ａ〜１０Ｈと接続する機能を有しておれば
よいので、従来のように大きな面積は必要としない。In the semiconductor device according to the third embodiment, since the inner side bonding pad 3K has a function of connecting to the outer side bonding pads 10A to 10H, a large area is required as in the conventional case. do not do.
【００２８】また、外部側ボンディングパッド１０Ａ〜
１０Ｈを半導体回路２の上側に設けることができるの
で、半導体チップ１の面積を小さくすることができる。
この場合、第１の絶縁膜６は、ワイヤボンディング時の
衝撃から半導体回路２を守る機能を有している。Further, the external side bonding pads 10A-
Since 10H can be provided on the upper side of the semiconductor circuit 2, the area of the semiconductor chip 1 can be reduced.
In this case, the first insulating film 6 has a function of protecting the semiconductor circuit 2 from an impact during wire bonding.
【００２９】尚、上記第１〜第３実施例においては、遮
光膜４はアルミニウムにより形成したが、遮光膜４を形
成する材料はこれに限られず、他の材料により形成して
もよいのは当然である。Although the light-shielding film 4 is made of aluminum in the first to third embodiments, the material for forming the light-shielding film 4 is not limited to this, and it may be made of other materials. Of course.
【００３０】[0030]
【発明の効果】以上説明したように、請求項１の発明に
係る半導体装置によると、半導体チップの上面を覆う第
１の絶縁膜における少なくとも半導体回路の上側部分を
遮光膜によって覆ったため、外部からの光は、遮光膜に
よって遮られ半導体回路に到達することがないので、半
導体チップが樹脂パッケージに覆われていない裸の状態
である場合或いは半導体チップを封止する樹脂パッケー
ジの肉厚が薄い場合でも、半導体回路の動作の安全性を
確保することができる。As described above, according to the semiconductor device of the first aspect of the invention, at least the upper portion of the semiconductor circuit in the first insulating film that covers the upper surface of the semiconductor chip is covered with the light shielding film. Light does not reach the semiconductor circuit because it is not blocked by the light-shielding film, so when the semiconductor chip is in a bare state where it is not covered by the resin package or when the thickness of the resin package that seals the semiconductor chip is thin. However, the safety of the operation of the semiconductor circuit can be ensured.
【００３１】また、請求項２の発明に係る半導体装置に
よると、遮光膜を半導体回路の接地線に接続したため、
請求項１と同様半導体回路の動作の安全性を確保するこ
とができる上に、半導体回路が高速動作する際に発生す
る不要輻射を確実に抑制することができる。According to the semiconductor device of the second aspect of the invention, since the light shielding film is connected to the ground line of the semiconductor circuit,
The safety of the operation of the semiconductor circuit can be ensured as in the first aspect, and unnecessary radiation generated when the semiconductor circuit operates at a high speed can be surely suppressed.
【００３２】さらに、請求項３の発明に係る半導体装置
によると、半導体チップの上面を覆う第１の絶縁膜にお
ける半導体回路の上側部分の上面に沿って遮光性材料か
らなり半導体回路の入出力端子に接続されたボンディン
グパッドを設けたため、ボンディングパッドを半導体回
路と平面的に配置しなくてもよいので半導体チップの面
積を小さくすることができると共に、該ボンディングパ
ッドは外部からの光が半導体回路に到達することを防止
するので半導体チップが樹脂パッケージに覆われていな
い裸の状態である場合或いは半導体チップを封止する樹
脂パッケージの肉厚が薄い場合でも半導体回路の動作の
安全性を確保することができる。Further, according to the semiconductor device of the third aspect, the input / output terminal of the semiconductor circuit is made of a light-shielding material along the upper surface of the upper portion of the semiconductor circuit in the first insulating film covering the upper surface of the semiconductor chip. Since the bonding pad connected to the semiconductor chip is provided, it is not necessary to dispose the bonding pad in a plane with the semiconductor circuit. Therefore, the area of the semiconductor chip can be reduced, and the bonding pad allows light from the outside to enter the semiconductor circuit. To ensure the safety of the operation of the semiconductor circuit even when the semiconductor chip is bare without being covered with the resin package or when the resin package that seals the semiconductor chip has a small thickness to prevent it from reaching You can
【図１】本発明の第１実施例に係る半導体装置の平面図
である。FIG. 1 is a plan view of a semiconductor device according to a first exemplary embodiment of the present invention.
【図２】本発明の第１実施例に係る半導体装置の断面図
である。FIG. 2 is a sectional view of a semiconductor device according to a first exemplary embodiment of the present invention.
【図３】本発明の第２実施例に係る半導体装置の上面図
である。FIG. 3 is a top view of a semiconductor device according to a second exemplary embodiment of the present invention.
【図４】本発明の第３実施例に係る半導体装置の上面図
である。FIG. 4 is a top view of a semiconductor device according to a third embodiment of the present invention.
【図５】本発明の第３実施例に係る半導体装置の断面図
である。FIG. 5 is a sectional view of a semiconductor device according to a third embodiment of the present invention.
【図６】従来の半導体装置の平面図である。FIG. 6 is a plan view of a conventional semiconductor device.
【図７】従来の半導体装置の断面図である。FIG. 7 is a cross-sectional view of a conventional semiconductor device.
１ 半導体チップ ２ 半導体回路 ３Ａ，３Ｂ，３Ｃ，３Ｄ，３Ｅ，３Ｆ，３Ｇ，３Ｈ ボ
ンディングパッド ３Ｋ 内側のボンディングパッド ４ 遮光膜 ５ 保護膜 ６ 第１の絶縁膜 ７Ａ 絶縁膜 ７Ｂ 第２の絶縁膜 ８ ボンディングワイヤ ９Ａ，９Ｂ，９Ｃ，９Ｄ，９Ｅ，９Ｆ コンタクト部 １０Ａ，１０Ｂ，１０Ｃ，１０Ｄ，１０Ｅ，１０Ｆ，１
０Ｇ，１０Ｈ 外側のボンディングパッド1 semiconductor chip 2 semiconductor circuit 3A, 3B, 3C, 3D, 3E, 3F, 3G, 3H bonding pad 3K inner bonding pad 4 light-shielding film 5 protective film 6 first insulating film 7A insulating film 7B second insulating film 8 Bonding wire 9A, 9B, 9C, 9D, 9E, 9F Contact part 10A, 10B, 10C, 10D, 10E, 10F, 1
0G, 10H Outside bonding pad
Claims (3)
上面は略全面に亘って樹脂系材料からなる第１の絶縁膜
によって覆われ、該第１の絶縁膜における少なくとも上
記半導体回路の上側部分は遮光膜によって覆われ、該遮
光膜の上面は略全面に亘って樹脂系材料からなる第２の
絶縁膜によって覆われていることを特徴とする半導体装
置。1. An upper surface of a semiconductor chip on which a semiconductor circuit is formed is substantially entirely covered with a first insulating film made of a resin material, and at least an upper portion of the first insulating film in the semiconductor circuit is covered. A semiconductor device characterized in that it is covered with a light-shielding film, and the upper surface of the light-shielding film is substantially entirely covered with a second insulating film made of a resin material.
れており且つ上記半導体回路の接地線に接続されている
ことを特徴とする請求項１に記載の半導体装置。2. The semiconductor device according to claim 1, wherein the light-shielding film is made of a conductive material and is connected to a ground line of the semiconductor circuit.
上面は略全面に亘って樹脂系材料からなる第１の絶縁膜
によって覆われ、該第１の絶縁膜における上記半導体回
路の上側部分の上面に沿って遮光性材料からなり上記半
導体回路の入出力端子に接続されたボンディングパッド
が設けられ、該ボンディングパッドにおけるボンディン
グワイヤが取り付けられていない部位の上面は略全面に
亘って樹脂系材料からなる第２の絶縁膜によって覆われ
ていることを特徴とする半導体装置。3. An upper surface of a semiconductor chip on which a semiconductor circuit is formed is substantially entirely covered with a first insulating film made of a resin material, and an upper surface of an upper portion of the semiconductor circuit in the first insulating film. A bonding pad made of a light-shielding material and connected to the input / output terminals of the semiconductor circuit is provided along the above, and the upper surface of the portion of the bonding pad where the bonding wire is not attached is made of a resin material over substantially the entire surface. A semiconductor device, which is covered with a second insulating film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4247757A JP3016663B2 (en) | 1992-09-17 | 1992-09-17 | Semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4247757A JP3016663B2 (en) | 1992-09-17 | 1992-09-17 | Semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0697328A true JPH0697328A (en) | 1994-04-08 |
| JP3016663B2 JP3016663B2 (en) | 2000-03-06 |
Family
ID=17168215
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4247757A Expired - Fee Related JP3016663B2 (en) | 1992-09-17 | 1992-09-17 | Semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3016663B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2293109A1 (en) | 2009-09-02 | 2011-03-09 | J. Morita Manufacturing Corporation | Radiological image reader |
-
1992
- 1992-09-17 JP JP4247757A patent/JP3016663B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2293109A1 (en) | 2009-09-02 | 2011-03-09 | J. Morita Manufacturing Corporation | Radiological image reader |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3016663B2 (en) | 2000-03-06 |
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