JPH0697268A - Sticking device for adhesive tape on wafer - Google Patents

Sticking device for adhesive tape on wafer

Info

Publication number
JPH0697268A
JPH0697268A JP26936192A JP26936192A JPH0697268A JP H0697268 A JPH0697268 A JP H0697268A JP 26936192 A JP26936192 A JP 26936192A JP 26936192 A JP26936192 A JP 26936192A JP H0697268 A JPH0697268 A JP H0697268A
Authority
JP
Japan
Prior art keywords
wafer
adhesive film
adhesive
ring frame
adhesive tape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP26936192A
Other languages
Japanese (ja)
Inventor
Saburo Miyamoto
三郎 宮本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP26936192A priority Critical patent/JPH0697268A/en
Publication of JPH0697268A publication Critical patent/JPH0697268A/en
Pending legal-status Critical Current

Links

Landscapes

  • Dicing (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PURPOSE:To make a wafer loading mechanism and a wafer unloading mechanism simple in structure so as to uniformly stick a wafer on an adhesive film provided onto a ring frame. CONSTITUTION:A ring frame 5 is provided with an adhesive film 4 stuck on its underside. A wafer holding mechanism which places and fixes the ring frame 5 onto a table 3 making its film adhesive surface face upward, a wafer loading mechanism which feeds a wafer W as holding it with a holding member 9 making its pattern surface face upward and loads it onto the adhesive tape 4, a wafer support mechanism which supports the upside of the wafer W placed on the adhesive film 4 by pressing with a wafer presser 15, and an elastic pressing mechanism which slightly presses throughout the underside region of the adhesive film 4 where a wafer is placed through the intermediary of an elastic material 18 with a roller 23 as scanning are provided inside a vacuum chamber which can be exhausted.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、リングフレームに貼着
された粘着フィルムに、半導体ウエハ等の薄板(以下、
ウエハという)を貼付ける装置に関する。
BACKGROUND OF THE INVENTION The present invention relates to a thin film such as a semiconductor wafer (hereinafter,
A wafer).

【0002】[0002]

【従来の技術】従来、上記装置としては、特公平2−3
4175号公報に示されるように、パターン面を下向き
にした姿勢で保持されたウエハの上に、粘着フィルムを
貼着したリングフレームを、そのフィルム粘着面が下向
きになる姿勢で接近配置した後、これらを収納した減圧
室を減圧してフィルム粘着面とウエハとを軽く粘着さ
せ、次に粘着フィルムの上面をローラで押圧走査してウ
エハを全体的に粘着させるように構成したものが知られ
ている。
2. Description of the Related Art Conventionally, as the above-mentioned apparatus, Japanese Patent Publication No.
As disclosed in Japanese Patent No. 4175, after a ring frame having an adhesive film adhered on a wafer held in a posture with a pattern surface facing downward, the ring frame having the film adhesive surface facing downward is arranged closely. It is known that the decompression chamber containing these is decompressed to lightly adhere the film adhesive surface to the wafer, and then the upper surface of the adhesive film is pressed and scanned by a roller to adhere the wafer as a whole. There is.

【0003】[0003]

【発明が解決しようとする課題】上記従来装置は、ウエ
ハ貼付け処理を減圧室内で行うために、ウエハ貼付け面
に気泡を巻き込むことなく均一良好に貼付け処理を行う
ことができるものであるが、一般にウエハはそのパター
ン面を上向きにした姿勢で各処理を受けるので、前処理
行程を経たウエハを表裏反転して貼付け装置にセット
し、かつ、貼付け処理後のリングフレームを表裏反転し
て次の処理行程に送り込む必要があり、このためにウエ
ハ搬入装填手段および搬出手段が複雑になるものであっ
た。また、ウエハを表裏反転させる際に、吸着ミス等が
発生してウエハを脱落させる可能性もあった。
Since the above-mentioned conventional apparatus performs the wafer bonding process in the decompression chamber, it is possible to perform the bonding process uniformly and well without entraining air bubbles on the wafer bonding surface. Since the wafer undergoes each process with its pattern surface facing upwards, the wafer that has undergone the pretreatment process is turned upside down and set in the bonding machine, and the ring frame after the bonding process is turned upside down for the next process. It is necessary to send the wafer into the process, which complicates the wafer loading / unloading means and the unloading means. Moreover, when the wafer is turned upside down, a suction error or the like may occur and the wafer may fall off.

【0004】本発明は、このような点に着目してなされ
たものであって、ウエハ搬入装填および搬出に際しての
上記不具合をもたらすことなく、ウエハに粘着テープを
均一良好に貼付けることができる装置を提供することを
目的とする。
The present invention has been made paying attention to such a point, and is an apparatus capable of uniformly sticking an adhesive tape onto a wafer without causing the above-mentioned problems in loading and unloading the wafer. The purpose is to provide.

【0005】[0005]

【課題を解決するための手段】上記目的を達成するため
に、本発明のウエハへの粘着テープ貼付け装置はつぎの
ような構成をとる。すなわち、下面に粘着フィルムを張
り付けたリングフレームを、そのフィルム粘着面が上向
きになる姿勢で保持するフレーム支持手段と、パターン
面を上向きにした姿勢のウエハを前記フレーム支持手段
で支持されたリングフレームの粘着フィルム上に落し込
み装填するウエハ装填手段と、粘着フィルムの下面の少
なくともウエハ載置領域全体を弾性材を介して軽く押圧
走査する弾性押圧手段と、を排気可能かつ開放可能な減
圧室に内装した構成とする。
In order to achieve the above object, an apparatus for attaching an adhesive tape to a wafer according to the present invention has the following construction. That is, a frame support means for holding a ring frame having an adhesive film attached to the lower surface in a posture in which the film adhesive surface faces upward, and a ring frame in which a wafer in a posture in which the pattern surface faces upward is supported by the frame supporting means. In the decompression chamber which can be evacuated and opened, the wafer loading means that is dropped onto the adhesive film and loaded, and the elastic pressing means that gently presses and scans at least the entire wafer mounting area on the lower surface of the adhesive film through the elastic material. The structure will be interior.

【0006】[0006]

【作用】本発明によると、ウエハは前処理行程と同様に
パターン面を上向きにした姿勢で、例えば係止部材など
に周部を載置してパターン面に触れることなく装填セッ
トすることができる。減圧状態でウエハを粘着フィルム
上に供給載置することで、貼付け面に気泡が介在されな
い状態でウエハは軽く粘着され、この状態で粘着フィル
ム下面から弾性的な押圧走査を加えることで、ウエハは
均一に粘着フィルムに貼付けられる。
According to the present invention, a wafer can be loaded and set in a posture in which the pattern surface is directed upwards, as in the pretreatment process, for example, by mounting the peripheral portion on a locking member or the like without touching the pattern surface. . By supplying and placing the wafer on the adhesive film in a reduced pressure state, the wafer is lightly adhered in a state where no air bubbles are present on the sticking surface. It is evenly attached to the adhesive film.

【0007】[0007]

【実施例】図1ないし図3に第1の実施例が示されてい
る。このウエハ貼付け装置は、固定された下部ハウジン
グ1aと、これに対して開閉自在な上部ハウジング1b
とで構成される減圧室2内にウエハ貼付けのための各種
手段を装備した構造となっている。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS A first embodiment is shown in FIGS. This wafer sticking apparatus includes a fixed lower housing 1a and an upper housing 1b which can be opened and closed.
It has a structure in which various means for attaching a wafer are provided in the decompression chamber 2 constituted by.

【0008】下部ハウジング1aの上部にはリング状の
テーブル3が固定され、このテーブル3上に、粘着フィ
ルム4を下面に張りつけたリングフレーム5を所定の位
置決め状態で載置してクランプ6で固定するようして、
フレーム支持手段が構成されている。
A ring-shaped table 3 is fixed to the upper part of the lower housing 1a, and a ring frame 5 having an adhesive film 4 attached to the lower surface is placed on the table 3 in a predetermined positioning state and fixed by a clamp 6. To do
A frame support means is configured.

【0009】上部ハウジング1bの対向する周壁部位に
は、スライド軸7を介して水平進退自在な可動枠8が装
着されるとともに、各可動枠8の下端にウエハWの周部
対角部位を載置支持する支持部材9が前記テーブル3上
に近接して備えられている。また、各可動枠8のスライ
ド軸7の外端に固定された連結部材10が、上部ハウジ
ング1bの上壁中央に縦軸心P周りに回動可能かつエア
シリンダ11で回動駆動可能に装備した回動アーム12
の両端にロッド13を介してそれぞれ連係接続されてお
り、回動アーム12をエアシリンダ11で回動して両可
動枠8を互いに後退させることで、両支持部材10に載
置されているウエハWをリングフレーム5の粘着フィル
ム4上に落とし込み装填するウエハ装填手段が構成され
ている。
Movable frames 8 which can be moved horizontally and horizontally through slide shafts 7 are mounted on opposing peripheral wall portions of the upper housing 1b, and peripheral diagonal portions of the wafer W are mounted on the lower ends of the movable frames 8. A support member 9 for placing and supporting is provided on the table 3 in close proximity thereto. Further, a connecting member 10 fixed to the outer end of the slide shaft 7 of each movable frame 8 is provided at the center of the upper wall of the upper housing 1b so as to be rotatable about the vertical axis P and rotatable by an air cylinder 11. Rotating arm 12
Are connected to both ends of the wafer via rods 13, and the rotating arm 12 is rotated by the air cylinder 11 to retract both movable frames 8 from each other, so that the wafers mounted on both supporting members 10 are rotated. Wafer loading means for dropping and loading W onto the adhesive film 4 of the ring frame 5 is configured.

【0010】上部ハウジング1bの上壁中央には、前記
回動アーム12の回動軸心Pと同心にエアシリンダ14
が装備され、減圧室2内に突入されたピストンロッド1
4aの下端にリング状のウエハ押え15を備えたディス
ク16が連結されており、エアシリンダ14の伸長作動
によって下降されたウエハ押え15で、粘着フィルム4
上のウエハWの上面周辺部を支持して、後述する下方か
らの貼付け押圧作用でウエハWが押し上げられるのを阻
止している。
At the center of the upper wall of the upper housing 1b, the air cylinder 14 is concentric with the rotation axis P of the rotation arm 12.
Equipped with a piston rod 1 that is thrust into the decompression chamber 2.
A disk 16 having a ring-shaped wafer retainer 15 is connected to the lower end of the wafer 4a, and the wafer retainer 15 lowered by the extension operation of the air cylinder 14 is used for the adhesive film 4
By supporting the peripheral portion of the upper surface of the upper wafer W, the wafer W is prevented from being pushed up by the below-described sticking and pressing action from below.

【0011】下部ハウジング1aの上部には、一端を固
定されて片持ち状に支持された薄いバネ板17が配備さ
れるとともに、このバネ板17の上面にウエハWより大
径に形成した柔軟なゴムあるいはスポンジ状の弾性材1
8が貼付けられている。また、このバネ板17の下方に
は、ガイド軸19を介して水平移動可能に支持されると
ともにエアシリンダ20で往復駆動される可動ブラケッ
ト21が配備され、この可動ブラケット21に支点Q周
りに回動可能な一対のアーム22を介してバネ板最大幅
と同等の長さのローラ23が水平に軸支されている。前
記アーム22の下端には、下部ハウジング1aの底面に
設けたカムレール24に作用するカムフォロア25が備
えられており、図1に示すように、ローラ23がバネ板
17の基端側に後退している状態では、カムフォロア2
5がカムレール24の低部に落ち込んでローラ23がバ
ネ板17から離反下降した姿勢にあり、ローラ23が前
進するとカムフォロア25がカムレール24の高部に乗
り上がってローラ23がバネ板17を押し上げて、弾性
材18を粘着フィルム4の下面に押圧作用させるように
弾性押圧手段が構成されている。
A thin spring plate 17 having one end fixed and supported in a cantilever manner is provided on the upper part of the lower housing 1a, and a flexible spring 17 having a larger diameter than the wafer W is formed on the upper surface of the spring plate 17. Rubber or sponge-like elastic material 1
8 is attached. A movable bracket 21 is provided below the spring plate 17 so as to be horizontally movable via a guide shaft 19 and reciprocally driven by an air cylinder 20. The movable bracket 21 is rotated around the fulcrum Q. A roller 23 having a length equal to the maximum width of the spring plate is horizontally supported by a pair of movable arms 22. The lower end of the arm 22 is provided with a cam follower 25 acting on a cam rail 24 provided on the bottom surface of the lower housing 1a. As shown in FIG. 1, the roller 23 is retracted to the base end side of the spring plate 17. Cam follower 2
When the roller 23 moves forward from the spring plate 17, the cam follower 25 rides on the high part of the cam rail 24 and the roller 23 pushes up the spring plate 17. The elastic pressing means is configured to press the elastic material 18 against the lower surface of the adhesive film 4.

【0012】本発明の第1実施例に係る貼付け装置は以
上のように構成されており、次にその作動を説明する。
先ず、上部ハウジング1bが開放された状態でフレーム
支持手段のテーブル3上に粘着テープ4を下面に張りつ
けたリングフレーム5を位置決め載置して固定する。ま
た、両支持部材9上にパターン面を上向きにしたウエハ
Wを位置決め載置する。この際、ウエハ支持手段のウエ
ハ押え15は上昇復帰位置に、かつ、弾性押圧手段のロ
ーラ23も後退復帰位置に待機されている。
The pasting device according to the first embodiment of the present invention is constructed as described above, and its operation will be described below.
First, in a state where the upper housing 1b is opened, the ring frame 5 having the adhesive tape 4 attached to the lower surface is positioned and fixed on the table 3 of the frame supporting means. Further, the wafer W having the pattern surface facing upward is positioned and mounted on both the support members 9. At this time, the wafer retainer 15 of the wafer supporting means is on standby at the ascending return position, and the roller 23 of the elastic pressing means is also on standby at the retracting return position.

【0013】次に、上部ハウジング1bを下部ハウジン
グ1aに接合して、下部ハウジング1aの排気口26か
ら室内空気を図外真空ポンプで吸引排気し、減圧室2を
所定の真空圧まで減圧する。
Next, the upper housing 1b is joined to the lower housing 1a, and the room air is sucked and exhausted from the exhaust port 26 of the lower housing 1a by a vacuum pump (not shown) to depressurize the decompression chamber 2 to a predetermined vacuum pressure.

【0014】次に、両支持部材9を後退作動させてウエ
ハWを粘着テープ4の上面、つまり粘着面の上に落とし
込み装填するとともに、ウエハ押え15を下降させて粘
着テープ4上に載置されたウエハWの上面周辺部を支持
する。
Next, both support members 9 are retracted to drop the wafer W onto the upper surface of the adhesive tape 4, that is, the adhesive surface, and the wafer retainer 15 is lowered and placed on the adhesive tape 4. The peripheral portion of the upper surface of the wafer W is supported.

【0015】その後、ローラ23を前進させることで、
弾性材18を粘着テープ4の下面に押し当て、ローラ2
3の移動に伴う押圧走査によって粘着テープ4をウエハ
Wの下面(裏面)に均一に貼付けてゆき、図6に示すよ
うに、リングフレーム5に粘着テープ4を介してウエハ
Wをマウントしたワークが得られ、姿勢反転などの処置
を要することなく、そのままの姿勢で以降の処理行程に
供給することができる。
After that, by moving the roller 23 forward,
The elastic material 18 is pressed against the lower surface of the adhesive tape 4, and the roller 2
The adhesive tape 4 is evenly adhered to the lower surface (back surface) of the wafer W by the pressure scan accompanying the movement of the wafer W, and as shown in FIG. 6, the work in which the wafer W is mounted on the ring frame 5 via the adhesive tape 4 is processed. The obtained posture can be supplied to the subsequent processing steps in the same posture without requiring any treatment such as posture reversal.

【0016】図4ないし図6に、本発明の第2の実施例
が示されている。この例では、テーブル3上にリングフ
レーム5を載置固定するクランプ30がエアシリンダ3
1で駆動可能に装備されてフレーム支持手段が構成され
ている。また、上部ハウジング1bの中央に装備したエ
アシリンダ32によって昇降されるディスク33の周部
下面にリング状のウエハ押え33aが装着されるととも
に、ディスク33の周部複数箇所にL形アーム34を介
して上下揺動されるクランプ35が取り付けられ、ウエ
ハ押え33aとクランプ35によってウエハWを挟持支
持してリングフレーム5の粘着テープ4近くまで下降し
た後、クランプ35を解除してウエハWを粘着テープ4
上に落とし込み装填するウエハ装填手段が構成されてい
る。
A second embodiment of the invention is shown in FIGS. In this example, the clamp 30 for mounting and fixing the ring frame 5 on the table 3 is the air cylinder 3
The frame supporting means is configured so as to be drivable by means of 1. Further, a ring-shaped wafer retainer 33a is mounted on the lower surface of the peripheral portion of the disk 33 which is lifted and lowered by an air cylinder 32 mounted in the center of the upper housing 1b, and L-shaped arms 34 are provided at a plurality of peripheral portions of the disk 33. A clamp 35 that is vertically swung is attached, and the wafer W is clamped and supported by the wafer retainer 33a and the clamp 35 and lowered to near the adhesive tape 4 of the ring frame 5, and then the clamp 35 is released to attach the wafer W to the adhesive tape. Four
Wafer loading means for dropping and loading is configured.

【0017】なお、クランプ駆動用のL形アーム34
は、図5に示すように、ディスク33上に同心で回動可
能に支持した回転板36にロッド37を介して連係され
ており、回転板36をエアシリンダ38で正逆回転して
各ロッド37を押し引き操作することでクランプ35を
揺動するように構成されている。
The L-shaped arm 34 for driving the clamp is used.
As shown in FIG. 5, is connected to a rotary plate 36 concentrically and rotatably supported on a disk 33 via a rod 37, and the rotary plate 36 is rotated forward and backward by an air cylinder 38 to rotate each rod. The clamp 35 is rocked by pushing and pulling 37.

【0018】また、図6に示すように、クランプ35は
ウエハ押え33aよりも上方まで後退揺動可能となって
おり、この状態でウエハ押え33aを下降することで、
粘着テープ4上のウエハWを押さえ込むウエハ支持手段
としても機能するように構成されている。
Further, as shown in FIG. 6, the clamp 35 is capable of retracting and swinging above the wafer retainer 33a, and by lowering the wafer retainer 33a in this state,
It is configured so as to also function as a wafer supporting unit that presses the wafer W on the adhesive tape 4.

【0019】下部ハウジング1aの中央には、図示しな
い駆動機構によって昇降および回転される支軸39が装
備され、この支軸39の上端にウエハ径より長い列状に
ブラシ状の弾性材40が備えられ、粘着テープ4の下面
を弾性的に押圧しながら回転走査する弾性押圧手段が構
成されている。
At the center of the lower housing 1a, there is provided a support shaft 39 which is raised and lowered and rotated by a drive mechanism (not shown), and brush-like elastic members 40 are provided at the upper end of the support shaft 39 in a row longer than the wafer diameter. The elastic pressing means is configured to rotate and scan while elastically pressing the lower surface of the adhesive tape 4.

【0020】本実施例によれば、ウエハWを粘着テープ
4に落とし込んだ後、ウエハ押え33aでウエハWの上
面周辺部を押さえ込み支持した状態で、弾性材40を上
昇させて粘着テープ4の下面に軽く押圧接触させ、その
後、弾性材40を回転駆動することにより、ウエハWの
下面(裏面)に粘着テープ4が貼付けられる。
According to the present embodiment, after the wafer W is dropped onto the adhesive tape 4, the elastic material 40 is lifted to raise the lower surface of the adhesive tape 4 while the peripheral portion of the upper surface of the wafer W is pressed and supported by the wafer retainer 33a. The pressure-sensitive adhesive tape 4 is attached to the lower surface (back surface) of the wafer W by lightly pressing it into contact with and then rotating the elastic member 40.

【0021】なお、上述した各実施例では、粘着テープ
4の貼付け時に、ウエハWの上面周辺部をウエハ押え1
5、33aで押さえ込み支持したが、ウエハWの裏面が
平滑である場合は、必ずしもウエハ押え15、33aで
ウエハWを押さえ込み支持する必要はない。
In each of the above-described embodiments, when the adhesive tape 4 is attached, the peripheral portion of the upper surface of the wafer W is held by the wafer holder 1.
Although the wafer W is pressed and supported by 5, 33a, when the back surface of the wafer W is smooth, it is not always necessary to press and support the wafer W by the wafer retainers 15, 33a.

【0022】[0022]

【発明の効果】以上、説明したように、本発明のウエハ
貼付け装置によると、減圧下で、ウエハと粘着テープと
を貼付けるので、両者の間に気泡が巻き込まれることが
軽減され、粘着テープを均一に貼付けることができる。
また、ウエハをそのパターン面を上向きにした姿勢で粘
着フィルム上に装填するので、その前処理行程でのウエ
ハ姿勢のままでウエハ貼付け装置に供給し、かつ、その
ままの姿勢で取り出して以降の行程に送り出すことがで
き、ウエハ搬入および搬出の都度、姿勢反転操作を行う
必要がなく、ウエハ搬入装填手段および搬出手段を構造
簡単なもので済ますことが可能となった。また、ウエハ
反転にともなうウエハの脱落のおそれもなく安全に処理
を行えるようになった。
As described above, according to the wafer sticking apparatus of the present invention, the wafer and the adhesive tape are stuck together under reduced pressure, so that air bubbles are prevented from being trapped between the two. Can be applied evenly.
Further, since the wafer is loaded on the adhesive film in a posture with its pattern surface facing upward, it is supplied to the wafer sticking device in the wafer posture in the pretreatment process, and taken out in the posture as it is. Since it is not necessary to perform the posture reversing operation every time the wafer is loaded and unloaded, the wafer loading / unloading means and the unloading means can be simply structured. In addition, it is possible to safely perform processing without fear that the wafer will fall out when the wafer is turned over.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係るウエハへの粘着テープ貼付け装置
の一実施例の縦断側面図である。
FIG. 1 is a vertical sectional side view of an embodiment of a device for attaching an adhesive tape to a wafer according to the present invention.

【図2】実施例装置の横断平面図である。FIG. 2 is a cross-sectional plan view of an example device.

【図3】実施例装置の弾性押圧手段の縦断正面図であ
る。
FIG. 3 is a vertical cross-sectional front view of an elastic pressing unit of the embodiment apparatus.

【図4】第2実施例の縦断面図である。FIG. 4 is a vertical sectional view of a second embodiment.

【図5】第2実施例のクランプ駆動機構の平面図であ
る。
FIG. 5 is a plan view of a clamp drive mechanism according to a second embodiment.

【図6】第2実施例の貼付け作動状態の要部の縦断面図
である。
FIG. 6 is a vertical cross-sectional view of a main part of a second embodiment in a pasting operation state.

【図7】貼付け処理の終了したワークの斜視図である。FIG. 7 is a perspective view of a work on which the pasting process has been completed.

【符号の説明】[Explanation of symbols]

2 減圧室 4 粘着フィルム 5 リングフレーム 18 弾性材 40 弾性材 W ウエハ 2 Decompression chamber 4 Adhesive film 5 Ring frame 18 Elastic material 40 Elastic material W Wafer

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 下面に粘着フィルムを張り付けたリング
フレームを、そのフィルム粘着面が上向きになる姿勢で
保持するフレーム支持手段と、パターン面を上向きにし
た姿勢のウエハを前記フレーム支持手段で支持されたリ
ングフレームの粘着フィルム上に落し込み装填するウエ
ハ装填手段と、粘着フィルムの下面の少なくともウエハ
載置領域全体を弾性材を介して軽く押圧走査する弾性押
圧手段と、を排気可能かつ開放可能な減圧室に内装して
なることを特徴とするウエハへの粘着テープ貼り付け装
置。
1. A frame supporting means for holding a ring frame having an adhesive film attached to a lower surface in a posture in which the film adhesive surface faces upward, and a wafer in a posture in which a pattern surface faces upward is supported by the frame supporting means. The wafer loading means for dropping and loading the ring frame onto the adhesive film, and the elastic pressing means for lightly pressing and scanning at least the entire wafer mounting area on the lower surface of the adhesive film via the elastic material can be exhausted and openable. A device for attaching an adhesive tape to a wafer, which is characterized by being internally provided in a decompression chamber.
JP26936192A 1992-09-11 1992-09-11 Sticking device for adhesive tape on wafer Pending JPH0697268A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP26936192A JPH0697268A (en) 1992-09-11 1992-09-11 Sticking device for adhesive tape on wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26936192A JPH0697268A (en) 1992-09-11 1992-09-11 Sticking device for adhesive tape on wafer

Publications (1)

Publication Number Publication Date
JPH0697268A true JPH0697268A (en) 1994-04-08

Family

ID=17471317

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26936192A Pending JPH0697268A (en) 1992-09-11 1992-09-11 Sticking device for adhesive tape on wafer

Country Status (1)

Country Link
JP (1) JPH0697268A (en)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0745559A (en) * 1993-07-26 1995-02-14 Furukawa Electric Co Ltd:The Bonding method of adhesive tape onto semiconductor wafer
JP2007073767A (en) * 2005-09-07 2007-03-22 Disco Abrasive Syst Ltd Viscous film sticking device
SG132624A1 (en) * 2005-11-29 2007-06-28 Tokyo Seimitsu Co Ltd Method and apparatus for attaching a peeling tape
JP2008042016A (en) * 2006-08-08 2008-02-21 Nitto Denko Corp Holding method of semiconductor wafer, and semiconductor wafer holding structure
JP2008066597A (en) * 2006-09-08 2008-03-21 Lintec Corp Sheet sticking equipment
JP2014179441A (en) * 2013-03-14 2014-09-25 Lintec Corp Sheet sticking device and sticking method
TWI560129B (en) * 2016-05-03 2016-12-01 Top Range Machinery Co Ltd Adhesion device
JP2017079236A (en) * 2015-10-19 2017-04-27 ハンファテクウィン株式会社Hanwha Techwin Co.,Ltd. Component loading device
JP2018137415A (en) * 2017-02-23 2018-08-30 日東電工株式会社 Pressure-sensitive adhesive tape sticking method and pressure-sensitive adhesive tape sticking device
KR20190053796A (en) 2017-11-10 2019-05-20 시바우라 메카트로닉스 가부시끼가이샤 Film formation apparatus and component peeling apparatus
KR20190055743A (en) 2017-11-15 2019-05-23 시바우라 메카트로닉스 가부시끼가이샤 Film formation apparatus and embedding processing apparatus
JP2020205357A (en) * 2019-06-18 2020-12-24 株式会社ディスコ Tape attachment method
KR20210037559A (en) 2019-09-27 2021-04-06 시바우라 메카트로닉스 가부시끼가이샤 Film formation apparatus and embedding processing apparatus

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0745559A (en) * 1993-07-26 1995-02-14 Furukawa Electric Co Ltd:The Bonding method of adhesive tape onto semiconductor wafer
JP2007073767A (en) * 2005-09-07 2007-03-22 Disco Abrasive Syst Ltd Viscous film sticking device
JP4637692B2 (en) * 2005-09-07 2011-02-23 株式会社ディスコ Adhesive film sticking device
SG132624A1 (en) * 2005-11-29 2007-06-28 Tokyo Seimitsu Co Ltd Method and apparatus for attaching a peeling tape
US7757741B2 (en) 2005-11-29 2010-07-20 Tokyo Seimitsu Co., Ltd. Apparatus for attaching a peeling tape
TWI412098B (en) * 2006-08-08 2013-10-11 Nitto Denko Corp Semiconductor wafer holding method, and semiconductor wafer holding apparatus
JP2008042016A (en) * 2006-08-08 2008-02-21 Nitto Denko Corp Holding method of semiconductor wafer, and semiconductor wafer holding structure
KR101489966B1 (en) * 2006-08-08 2015-02-04 닛토덴코 가부시키가이샤 Semiconductor wafer holding method, semiconductor wafer holding apparatus and semiconductor wafer holding structure
JP2008066597A (en) * 2006-09-08 2008-03-21 Lintec Corp Sheet sticking equipment
JP4666519B2 (en) * 2006-09-08 2011-04-06 リンテック株式会社 Sheet pasting device
JP2014179441A (en) * 2013-03-14 2014-09-25 Lintec Corp Sheet sticking device and sticking method
JP2017079236A (en) * 2015-10-19 2017-04-27 ハンファテクウィン株式会社Hanwha Techwin Co.,Ltd. Component loading device
TWI560129B (en) * 2016-05-03 2016-12-01 Top Range Machinery Co Ltd Adhesion device
JP2018137415A (en) * 2017-02-23 2018-08-30 日東電工株式会社 Pressure-sensitive adhesive tape sticking method and pressure-sensitive adhesive tape sticking device
KR20190053796A (en) 2017-11-10 2019-05-20 시바우라 메카트로닉스 가부시끼가이샤 Film formation apparatus and component peeling apparatus
KR20190055743A (en) 2017-11-15 2019-05-23 시바우라 메카트로닉스 가부시끼가이샤 Film formation apparatus and embedding processing apparatus
JP2020205357A (en) * 2019-06-18 2020-12-24 株式会社ディスコ Tape attachment method
KR20210037559A (en) 2019-09-27 2021-04-06 시바우라 메카트로닉스 가부시끼가이샤 Film formation apparatus and embedding processing apparatus

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