JPH07275805A - Surface-cleaning device for sheet-shaped body - Google Patents

Surface-cleaning device for sheet-shaped body

Info

Publication number
JPH07275805A
JPH07275805A JP6093068A JP9306894A JPH07275805A JP H07275805 A JPH07275805 A JP H07275805A JP 6093068 A JP6093068 A JP 6093068A JP 9306894 A JP9306894 A JP 9306894A JP H07275805 A JPH07275805 A JP H07275805A
Authority
JP
Japan
Prior art keywords
thin plate
cleaning
support table
sheet
adhesive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6093068A
Other languages
Japanese (ja)
Inventor
Keigo Funakoshi
啓吾 船越
Minoru Ametani
稔 雨谷
Hironobu Ukiami
弘信 浮網
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Seiki Co Ltd
Original Assignee
Nitto Seiki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Seiki Co Ltd filed Critical Nitto Seiki Co Ltd
Priority to JP6093068A priority Critical patent/JPH07275805A/en
Publication of JPH07275805A publication Critical patent/JPH07275805A/en
Pending legal-status Critical Current

Links

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  • Testing Electric Properties And Detecting Electric Faults (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Cleaning In General (AREA)

Abstract

PURPOSE:To adhesively remove foreign matter on the surface securely by applying a sufficient pressing force without fear of damaging a fragile sheet such as a glass substrate. CONSTITUTION:This device comprises a support table 1 for suction retaining a sheet-shaped body W, a cleaning rotating body 2 with an adhesive surface being brought into contact with the surface of the sheet-shaped body W retained on the table 1, and a driving mechanism for moving relatively the support table 1 and the cleaning rotating body 2 in the direction along a table surface.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、液晶ディスプレイに用
いるガラス基板などの薄板状体の表面に付着している微
細なゴミ、ほこり、等を清掃除去する装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a device for cleaning and removing fine dust, dust and the like adhering to the surface of a thin plate member such as a glass substrate used for a liquid crystal display.

【0002】[0002]

【従来の技術】従来、薄板状体の表面清掃手段として
は、作業台に載置した薄板状体の表面に手作業で粘着ロ
ールを押圧転動させる手段や、薄板状体をベルト搬送し
て粘着ロール間に通す装置、等が知られている。
2. Description of the Related Art Conventionally, as means for cleaning the surface of a thin plate, a means for manually pressing and rolling an adhesive roll on the surface of the thin plate placed on a work table, or for transporting the thin plate by a belt. A device for passing between adhesive rolls is known.

【0003】[0003]

【発明が解決しようとする課題】手作業による表面清掃
手段は、粘着ロールを薄板状体の表面全体に均一に押圧
作用させるのが困難で清掃むらが生じやすいのみなら
ず、作業能率が低いものである。また、粘着ロール間を
通す清掃装置は、高能率で処理することができて自動化
への展開が容易であるが、粘着ロールの間を通す際に薄
板状体に偏加重が局部的に作用することになって、ガラ
ス基板のように極めて脆弱な薄板状体の場合、破損が発
生しやすいものであった。
In the surface cleaning means by manual work, it is difficult to uniformly apply the pressure-sensitive adhesive roll to the entire surface of the thin plate-like member, and uneven cleaning easily occurs, and the work efficiency is low. Is. Further, the cleaning device that passes between the adhesive rolls can be processed with high efficiency and is easy to develop into automation, but when passing between the adhesive rolls, the biased load locally acts on the thin plate-shaped body. By the way, in the case of an extremely fragile thin plate-like body such as a glass substrate, breakage is likely to occur.

【0004】本発明は、このような点に着目してなされ
たものであって、脆弱な薄板状体でも破損のおそれな
く、十分な押圧力を作用させて表面の異物を確実に粘着
除去できるようにすることを目的とする。
The present invention has been made paying attention to such a point, and even a fragile thin plate-like member can be reliably adhered and removed by applying sufficient pressing force without fear of damage. The purpose is to do so.

【0005】[0005]

【課題を解決するための手段】上記目的を達成するため
に、本発明は次のような構成を採る。すなわち、本発明
に係る薄板状体の表面清掃装置は、薄板状体を一定姿勢
に吸着保持する支持テーブルと、このテーブル上に保持
された薄板状体の表面に圧接される粘着表面を有した清
掃用回転体と、前記支持テーブルと前記清掃用回転体と
をテーブル面に沿う方向に相対移動させる駆動手段とを
備えた構成とする。
In order to achieve the above object, the present invention has the following constitution. That is, the surface cleaning device for a thin plate according to the present invention has a support table that sucks and holds the thin plate in a fixed posture, and an adhesive surface that is pressed against the surface of the thin plate held on the table. The cleaning rotary body is provided with a driving means for relatively moving the support table and the cleaning rotary body in a direction along the table surface.

【0006】[0006]

【作用】上記構成によると、薄板状体を支持テーブル上
に一定姿勢に吸着保持した状態で、清掃用回転体を薄板
状体の表面に所定圧で押圧し、この状態で清掃用回転体
もしくは、支持テーブルをテーブル面に沿う方向に移動
させることで、清掃用回転体が薄板状体の表面に押圧さ
れながら転動して、薄板状体表面の異物を粘着除去して
ゆく。この際、薄板状体は支持テーブル上に安定的に吸
着保持されているので、清掃用回転体による局部的な加
重で薄板状体が局部的に撓み変形することが少なく、異
物付着に必要な押圧力を十分作用させても破損のおそれ
はない。
According to the above structure, the cleaning rotary member is pressed against the surface of the thin plate member with a predetermined pressure in a state where the thin plate member is adsorbed and held on the support table in a fixed posture. By moving the support table in the direction along the table surface, the cleaning rotator rolls while being pressed against the surface of the thin plate member, and the foreign matter on the surface of the thin plate member is adhesively removed. At this time, since the thin plate member is stably adsorbed and held on the support table, the thin plate member is less likely to be locally deformed and deformed by the local load applied by the cleaning rotary member, which is necessary for adhering foreign matter. There is no risk of damage even if sufficient pressing force is applied.

【0007】[0007]

【実施例】以下、本発明の実施例のいくつかを例示す
る。
EXAMPLES Some examples of the present invention will be described below.

【0008】〔実施例1〕図1に本実施例装置の基本構
成の側面が、また、図2にその正面がそれぞれ示されて
いる。この清掃装置は、水平に固定配置された支持テー
ブル1と、粘着テープをその粘着面が外側になるように
ロール巻きしてなる清掃用回転体2と、この清掃用回転
体2を移動させる駆動機構3とから構成されて、開閉可
能なカバー4を備えた装置ケース5に組み込まれてい
る。なお、カーバー4の内面には、支持テーブル1上の
薄板状体Wの静電気を取り除いて塵埃の付着を防止する
ための、図示しない送風型除電器が設けられている。
[Embodiment 1] FIG. 1 shows a side surface of a basic configuration of the apparatus of this embodiment, and FIG. 2 shows a front surface thereof. This cleaning device includes a support table 1 fixed horizontally, a cleaning rotator 2 formed by rolling an adhesive tape with its adhesive surface facing outward, and a drive for moving this cleaning rotator 2. It is composed of the mechanism 3 and is incorporated in the device case 5 having the openable / closable cover 4. A blower static eliminator (not shown) is provided on the inner surface of the carver 4 to remove static electricity from the thin plate member W on the support table 1 and prevent dust from adhering thereto.

【0009】図5に示すように、前記支持テーブル1
は、載置されるガラス薄板等の薄板状体Wよりも大きい
面積の載置面を備え、その薄板状体載置領域に形成され
た多数の吸着孔6が、図外の吸引手段に配管接続された
吸引室7に連通されている。また、支持テーブル1の中
央には、センターテーブル8が昇降可能に配備され、薄
板状体Wの搬入および搬出時には上昇し、清掃処理時に
はテーブル上面と面一になるまで下降されるようになっ
ている。なお、センターテーブル8に吸着保持機構を組
み込むことも可能である。
As shown in FIG. 5, the support table 1
Is provided with a mounting surface having an area larger than that of a thin plate W such as a thin glass plate to be mounted, and a large number of suction holes 6 formed in the thin plate mounting region are connected to a suction means (not shown) by a pipe. It is connected to the connected suction chamber 7. Further, a center table 8 is provided in the center of the support table 1 so as to be able to move up and down, and is raised when loading and unloading the thin plate member W, and is lowered during cleaning processing so as to be flush with the table upper surface. There is. It is also possible to incorporate a suction holding mechanism in the center table 8.

【0010】図3,図4に示すように、清掃用回転体2
は、可動台9から立設した左右一対の支持枠10に軸受
けブラケット11を介して水平軸心周りに回転可能、か
つ、上下動可能に軸支されている。詳述すると、支持枠
10には上方に開放されたガイド溝12が形成され、こ
のガイド溝12に軸受けブラケット11が上下動のみ可
能に嵌合されるとともに、各軸受けブラケット11は、
巻き掛けられたコイルバネ13によって常に下方に向け
て引き下げ付勢されている。また、支持枠10に備えた
エアーシリンダ14によって上下駆動される支持アーム
15が各軸受けブラケット11を下方から支持してお
り、エアーシリンダ14が駆動伸出すると図示のように
軸受けブラケット11がコイルバネ13の付勢力に抗し
て持ち上げ操作され、エアーシリンダ14が短縮作動す
ると、軸受けブラケット11がコイルバネ13の付勢力
によって下降作動するように構成されている。
As shown in FIGS. 3 and 4, the cleaning rotary member 2
Is rotatably supported by a pair of left and right support frames 10 erected from the movable base 9 via bearing brackets 11 so as to be rotatable about a horizontal axis and vertically movable. More specifically, a guide groove 12 that is open upward is formed in the support frame 10, and a bearing bracket 11 is fitted into the guide groove 12 so that it can move up and down.
The coil spring 13 is wound around and constantly urged downward. Further, a support arm 15 vertically driven by an air cylinder 14 provided in the support frame 10 supports each bearing bracket 11 from below, and when the air cylinder 14 is driven and extended, the bearing bracket 11 causes the coil spring 13 to extend as illustrated. When the air cylinder 14 is shortened by a lifting operation against the biasing force of the bearing bracket 11, the bearing bracket 11 is lowered by the biasing force of the coil spring 13.

【0011】コイルバネ13は、その一端13aが支持
枠10に固定されるとともに、他端13bが、支持枠1
0に支点16を中心に天秤揺動可能に取り付けた揺動ア
ーム17の一端に連結されている。そして、揺動アーム
17自体は、コイルバネ13よりも強いバネ18によっ
て図3における反時計方向に大きい力で揺動付勢されて
おり、この揺動アーム17の揺動によってコイルバネ1
3の他端13bが引き下げ付勢されて、軸受けブラケッ
ト11の下降力が発生している。
The coil spring 13 has one end 13a fixed to the support frame 10 and the other end 13b fixed to the support frame 1.
It is connected to one end of a swing arm 17 which is attached to 0 so that the balance can swing about a fulcrum 16. The swing arm 17 itself is biased by a spring 18 stronger than the coil spring 13 in the counterclockwise direction in FIG. 3 with a large force, and the swing of the swing arm 17 causes the coil spring 1 to move.
The other end 13b of No. 3 is urged to pull down, and a downward force of the bearing bracket 11 is generated.

【0012】また、揺動アーム17の他端には、清掃用
回転体2の外周面に押圧接触する追従ローラ19が備え
られており、この追従ローラが清掃用回転体2の外周面
に接触することで揺動アーム17の姿勢が規制されて、
コイルバネ13の他端13b位置が決定し、軸受けブラ
ケット11の下降力が定められるようになっている。
At the other end of the swing arm 17, there is provided a follow-up roller 19 which comes into pressure contact with the outer peripheral surface of the cleaning rotary member 2, and the follower roller contacts the outer peripheral surface of the cleaning rotary member 2. By doing so, the posture of the swing arm 17 is restricted,
The position of the other end 13b of the coil spring 13 is determined, and the descending force of the bearing bracket 11 is determined.

【0013】図1,図2に示すように、可動台9は、一
対のガイド軸20によって支持テーブル1の表面と平行
に水平前後動可能に支持されるとともに、その下方に沿
って巻き掛け配備したベルト21に連結されており、こ
のベルト21を正逆回転駆動することで可動台9が所定
ストロークで前後水平移動する前記駆動機構3が構成さ
れている。
As shown in FIGS. 1 and 2, the movable base 9 is supported by a pair of guide shafts 20 so as to be horizontally movable back and forth in parallel with the surface of the support table 1, and is wound around the lower part thereof. The drive mechanism 3 is connected to the belt 21 and is configured to move the movable base 9 forward and backward horizontally by a predetermined stroke by driving the belt 21 to rotate forward and backward.

【0014】本実施例の表面清掃装置は以上のように構
成されており、次にその作動について説明する。
The surface cleaning apparatus of this embodiment is constructed as described above, and its operation will be described below.

【0015】 薄板状体Wがロボットハンド等によっ
て支持テーブル1上方に搬入されると、上昇待機してい
たセンターテーブル8がこれを受取って下降し、薄板状
体Wを支持テーブル1に一定姿勢で吸着保持する。
When the thin plate W is carried in above the support table 1 by a robot hand or the like, the center table 8 which has been standing by ascent receives it and descends, so that the thin plate W is held on the support table 1 in a fixed posture. Hold by adsorption.

【0016】 清掃用回転体2を持ち上げ支持した状
態で可動台9が支持テーブル1の前端にまで移動する。
The movable table 9 moves to the front end of the support table 1 with the cleaning rotary body 2 being lifted and supported.

【0017】 エアーシリンダ14が短縮作動して軸
受けブラケット11が付勢下降されることで、清掃用回
転体2が支持テーブル1の前端上に押圧される。
When the air cylinder 14 is shortened and the bearing bracket 11 is urged and lowered, the cleaning rotary body 2 is pressed onto the front end of the support table 1.

【0018】 可動台9が前進移動することで、清掃
用回転体2が支持テーブル1上の薄板状体Wの表面を転
動し、薄板状体表面の異物は清掃用回転体2の表面に付
着して除去される。
As the movable table 9 moves forward, the cleaning rotator 2 rolls on the surface of the thin plate W on the support table 1, and the foreign matter on the surface of the thin plate lands on the surface of the cleaning rotator 2. Adhered and removed.

【0019】 可動台9がもとの待機位置に復帰する
と、エアーシリンダ14が伸長作動して軸受けブラケッ
ト11が元の上昇位置に復帰する。
When the movable base 9 returns to the original standby position, the air cylinder 14 extends and the bearing bracket 11 returns to the original raised position.

【0020】 支持テーブル1の吸着を解除するとと
もにセンターテーブル8を上昇させて、処理済みの薄板
状体Wを持ち上げ、ロボットハンド等によって搬出す
る。以上で1回の清掃処理が完了し、以後、これを繰り
返してゆく。
The adsorption of the support table 1 is released, the center table 8 is raised, the processed thin plate W is lifted, and is carried out by a robot hand or the like. With the above, one cleaning process is completed, and thereafter, this process is repeated.

【0021】この際、所定回数の清掃処理が経過する
と、あるいは1回の清掃処理毎に、清掃用回転体2の粘
着テープを1周巻回分だけ切り取り除去して、新しい粘
着面を露呈する。そして、このように清掃処理の経過に
伴って清掃用回転体2の粘着テープをめくり取り除去し
てゆくことで、清掃用回転体2の径が次第に小さくなっ
てゆき、清掃用回転体2が支持テーブル1上の薄板状体
Wの表面に押圧される際の清掃用回転体2高さが低くな
る。結果、コイルバネ13による押し下げ力が低下し、
薄板状体Wの表面への清掃用回転体2の押圧力が減少す
ることになるが、清掃用回転体2の径の減少に伴う前記
追従ローラ19の追従変位によって、揺動アーム17が
強いバネ18によってコイルバネ13の他端13bを引
き下げることになり、これによりコイルバネ13の張力
減少が補足され、もって、薄板状体Wの表面への清掃用
回転体2の押圧力が安定維持される。
At this time, after a predetermined number of cleaning processes have passed or every cleaning process, the adhesive tape of the cleaning rotary member 2 is cut and removed by one turn to expose a new adhesive surface. Then, by turning over and removing the adhesive tape of the cleaning rotator 2 with the progress of the cleaning process, the diameter of the cleaning rotator 2 gradually becomes smaller, and the cleaning rotator 2 becomes smaller. The height of the cleaning rotary member 2 when pressed against the surface of the thin plate member W on the support table 1 becomes low. As a result, the pressing force of the coil spring 13 is reduced,
Although the pressing force of the cleaning rotary body 2 against the surface of the thin plate-like body W is reduced, the swing arm 17 is strong due to the follow-up displacement of the follow-up roller 19 accompanying the decrease in the diameter of the cleaning rotary body 2. The spring 18 pulls down the other end 13b of the coil spring 13, which compensates for the decrease in the tension of the coil spring 13, and thus the pressing force of the cleaning rotary body 2 against the surface of the thin plate member W is stably maintained.

【0022】〔実施例2〕図6に、本発明の第2の実施
例が示されている。この例の場合、支持テーブル1が水
平に往復前後動可能に装備されるとともに、原反ロール
31から繰り出された粘着テープ32を遊転ローラ33
およびガイドローラ34に巻き掛けて構成した清掃用回
転体2が上下動される可動枠35に支持されており、清
掃用回転体2を支持テーブル1上の薄板状体Wの表面に
所定の押圧力で接触させた状態で支持テーブル1を移動
させることで、清掃用回転体2を薄板状体Wの表面に沿
って転動させて、表面の異物を粘着テープ32に付着除
去する。なお、この際、原反ロール31および巻き取り
ロール36を同調回転駆動することで常に新しい粘着面
を薄板状体Wに作用させることになる。
[Embodiment 2] FIG. 6 shows a second embodiment of the present invention. In the case of this example, the support table 1 is horizontally mounted so as to be capable of reciprocating back and forth, and the adhesive tape 32 fed from the original roll 31 is attached to the idle roller 33.
Also, the cleaning rotary body 2 configured by being wound around the guide roller 34 is supported by the movable frame 35 that is moved up and down, and the cleaning rotary body 2 is pressed against the surface of the thin plate W on the support table 1 by a predetermined amount. By moving the support table 1 in a state of being brought into contact with the pressure, the cleaning rotator 2 rolls along the surface of the thin plate member W, and foreign matter on the surface is attached to and removed from the adhesive tape 32. At this time, the original adhesive roll 31 and the take-up roll 36 are driven to rotate synchronously so that a new adhesive surface always acts on the thin plate W.

【0023】〔実施例3〕図7に、本発明の第3の実施
例が示されている。この例の場合、支持テーブル1は固
定配置されるとともに、粘着ゴムローラからなる清掃用
回転体2が上下動および水平前後駆動される可動枠に装
備され、かつ、この清掃用回転体2に接触する強粘着ロ
ーラ41が可動枠42に装備されており、清掃用回転体
2の薄板状体W表面に沿う転動によって、表面の異物を
清掃用回転体2に付着させるとともに、この異物を強粘
着ローラ41に転写させて、常にきれいな粘着面を薄板
状体Wに作用させることができる。
[Third Embodiment] FIG. 7 shows a third embodiment of the present invention. In the case of this example, the support table 1 is fixedly arranged, and a cleaning rotary body 2 composed of an adhesive rubber roller is mounted on a movable frame that is vertically moved and horizontally driven back and forth, and contacts the cleaning rotary body 2. The strong adhesion roller 41 is mounted on the movable frame 42, and the foreign matter on the surface is adhered to the cleaning rotary body 2 by the rolling of the cleaning rotary body 2 along the surface of the thin plate W, and the foreign matter is strongly adhered. By transferring to the roller 41, it is possible to always apply a clean adhesive surface to the thin plate W.

【0024】〔実施例4〕図8に、本発明の第4の実施
例が示されている。この例の場合、支持テーブル1は固
定配置されるとともに、粘着ゴムローラからなる清掃用
回転体2が上下動および水平前後駆動される可動枠51
に装備され、かつ、この清掃用回転体2に接触する強粘
着テープロール52が可動枠51に装備されており、清
掃用回転体2の薄板状体W表面に沿う転動によって、表
面の異物を清掃用回転体2に付着させるとともに、この
異物を強粘着テープロール52に転写させて、常にきれ
いな粘着面を薄板状体Wに作用させることができる。な
お、この場合、強粘着テープロール52は適時、1周巻
回分づつめくり取り除去することになる。
[Fourth Embodiment] FIG. 8 shows a fourth embodiment of the present invention. In the case of this example, the support table 1 is fixedly arranged, and the cleaning rotator 2 composed of an adhesive rubber roller is vertically moved and horizontally movable back and forth.
Is mounted on the movable frame 51, and a strong adhesive tape roll 52 that is in contact with the cleaning rotary body 2 is mounted on the movable frame 51. Can be adhered to the cleaning rotator 2 and the foreign matter can be transferred to the strong adhesive tape roll 52 so that a clean adhesive surface can always act on the thin plate W. In this case, the strong pressure-sensitive adhesive tape roll 52 is timely removed by turning one turn around.

【0025】〔他の実施例〕 支持テーブル1と清掃用回転体2とを相対移動させ
る駆動機構3としてはネジ送り機構や、その他の直線駆
動手段を任意に選択すればよい。
[Other Embodiments] As the drive mechanism 3 for relatively moving the support table 1 and the cleaning rotary body 2, a screw feed mechanism or other linear drive means may be arbitrarily selected.

【0026】 上記各実施例において、支持テーブル
1と清掃用回転体2の移動関係は逆に構成することもで
きる。
In each of the above-described embodiments, the movement relationship between the support table 1 and the cleaning rotary member 2 may be reversed.

【0027】 前記実施例3において、前記強粘着ロ
ーラ41を省略した形態で実施するもよい。この場合、
複数の粘着ゴムローラを前後に並べて清掃用回転体2を
構成するとよい。
In the third embodiment, the strong adhesive roller 41 may be omitted. in this case,
It is advisable to arrange the plurality of adhesive rubber rollers in the front and rear to configure the cleaning rotary body 2.

【0028】 図9に示すように、吸着孔6に連通す
る細溝6aを形成して支持テーブル1の吸着面を構成す
るもよい。
As shown in FIG. 9, the suction surface of the support table 1 may be configured by forming a thin groove 6 a communicating with the suction hole 6.

【0029】 図10に示すように、支持テーブル1
の上面に薄板状体Wの周部にのみ作用する吸着孔6を形
成するとともに、支持テーブル1の上面に正圧を供給す
る空間60を形成し、吸着孔6で薄板状体Wの周部を吸
着保持した状態で、薄板状体Wを空間60の空気圧で押
し上げ支持して、図示しない清掃用回転体2の押圧によ
る薄板状体Wの変形を阻止する形態で実施することも可
能である。
As shown in FIG. 10, the support table 1
A suction hole 6 that acts only on the peripheral portion of the thin plate-like body W is formed on the upper surface of the plate, and a space 60 that supplies a positive pressure is formed on the upper surface of the support table 1. It is also possible to carry out a mode in which the thin plate-like body W is pushed up and supported by the air pressure of the space 60 in a state of adsorbing and holding, and the deformation of the thin plate-like body W due to the pressing of the cleaning rotary body 2 not shown is prevented. .

【0030】[0030]

【発明の効果】以上の説明から明らかなように、本発明
の薄板状体の表面清掃装置によれば、薄板状体の姿勢が
支持テーブルにより高精度で安定するので、清掃用回転
体とテーブル面に沿う方向に相対移動によって、清掃用
回転体を薄板状体の表面に沿って均一に、かつ、十分な
押圧力でもって作用させることができながら、薄板状体
の局部的変形を回避することができ、その結果、ガラス
基板のような脆弱な薄板状体でも確実にその表面を清掃
することが可能となった。
As is apparent from the above description, according to the thin plate surface cleaning apparatus of the present invention, the posture of the thin plate is stabilized by the support table with high accuracy, so that the cleaning rotary member and the table are rotated. By relative movement in the direction along the surface, the cleaning rotor can be made to act uniformly along the surface of the thin plate member with sufficient pressing force, while avoiding local deformation of the thin plate member. As a result, the surface of a fragile thin plate-like body such as a glass substrate can be reliably cleaned.

【図面の簡単な説明】[Brief description of drawings]

【図1】実施例1の概略側面図である。FIG. 1 is a schematic side view of a first embodiment.

【図2】実施例1の概略正面図である。FIG. 2 is a schematic front view of the first embodiment.

【図3】実施例1の要部側面図である。FIG. 3 is a side view of a main part of the first embodiment.

【図4】実施例1の要部平面図である。FIG. 4 is a plan view of a main part of the first embodiment.

【図5】支持テーブルの縦断側面図である。FIG. 5 is a vertical sectional side view of a support table.

【図6】実施例2の概略側面図である。FIG. 6 is a schematic side view of a second embodiment.

【図7】実施例3の概略側面図である。FIG. 7 is a schematic side view of a third embodiment.

【図8】実施例4の概略側面図である。FIG. 8 is a schematic side view of the fourth embodiment.

【図9】支持テーブルの別実施例を示す部分斜視図であ
る。
FIG. 9 is a partial perspective view showing another embodiment of the support table.

【図10】支持テーブルのさらに別の実施例を示す縦断
側面図である。
FIG. 10 is a vertical sectional side view showing still another embodiment of the support table.

【符号の説明】[Explanation of symbols]

1 支持テーブル 2 清掃用回転体 W 薄板状体 1 Support table 2 Rotating body for cleaning W Thin plate

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 薄板状体を吸着保持する支持テーブル
と、このテーブル上に保持された薄板状体の表面に圧接
される粘着表面を有した清掃用回転体と、前記支持テー
ブルと前記清掃用回転体とをテーブル面に沿う方向に相
対移動させる駆動手段とを備えてなる薄板状体の表面清
掃装置。
1. A support table for adsorbing and holding a thin plate member, a cleaning rotary member having an adhesive surface pressed against the surface of the thin plate member held on the table, the support table and the cleaning member. A surface cleaning device for a thin plate-shaped body, comprising: a driving unit that relatively moves a rotating body in a direction along a table surface.
JP6093068A 1994-04-05 1994-04-05 Surface-cleaning device for sheet-shaped body Pending JPH07275805A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6093068A JPH07275805A (en) 1994-04-05 1994-04-05 Surface-cleaning device for sheet-shaped body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6093068A JPH07275805A (en) 1994-04-05 1994-04-05 Surface-cleaning device for sheet-shaped body

Publications (1)

Publication Number Publication Date
JPH07275805A true JPH07275805A (en) 1995-10-24

Family

ID=14072204

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6093068A Pending JPH07275805A (en) 1994-04-05 1994-04-05 Surface-cleaning device for sheet-shaped body

Country Status (1)

Country Link
JP (1) JPH07275805A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008045937A (en) * 2006-08-11 2008-02-28 Micronics Japan Co Ltd Probe assembly, probe unit and apparatus for inspecting display panel
US20150371879A1 (en) * 2014-06-19 2015-12-24 Applied Materials, Inc. Roll to roll wafer backside particle and contamination removal
CN109013620A (en) * 2018-08-22 2018-12-18 黄琦 A kind of cleaning device of the bad watermark of windshield
CN112893372A (en) * 2021-01-22 2021-06-04 深圳市诚亿自动化科技有限公司 Flexible screen terminal wiper mechanism

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008045937A (en) * 2006-08-11 2008-02-28 Micronics Japan Co Ltd Probe assembly, probe unit and apparatus for inspecting display panel
US20150371879A1 (en) * 2014-06-19 2015-12-24 Applied Materials, Inc. Roll to roll wafer backside particle and contamination removal
US9815091B2 (en) * 2014-06-19 2017-11-14 Applied Materials, Inc. Roll to roll wafer backside particle and contamination removal
CN109013620A (en) * 2018-08-22 2018-12-18 黄琦 A kind of cleaning device of the bad watermark of windshield
CN112893372A (en) * 2021-01-22 2021-06-04 深圳市诚亿自动化科技有限公司 Flexible screen terminal wiper mechanism

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