JPH069020Y2 - 多孔質電極 - Google Patents
多孔質電極Info
- Publication number
- JPH069020Y2 JPH069020Y2 JP1988160945U JP16094588U JPH069020Y2 JP H069020 Y2 JPH069020 Y2 JP H069020Y2 JP 1988160945 U JP1988160945 U JP 1988160945U JP 16094588 U JP16094588 U JP 16094588U JP H069020 Y2 JPH069020 Y2 JP H069020Y2
- Authority
- JP
- Japan
- Prior art keywords
- porous
- electrode
- porous filter
- filter medium
- flow velocity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001020 plasma etching Methods 0.000 claims description 14
- 230000002093 peripheral effect Effects 0.000 claims description 12
- 230000007423 decrease Effects 0.000 claims description 2
- 238000011144 upstream manufacturing Methods 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 21
- 239000000463 material Substances 0.000 description 20
- 239000012530 fluid Substances 0.000 description 19
- 239000000758 substrate Substances 0.000 description 11
- 238000005530 etching Methods 0.000 description 9
- 239000004020 conductor Substances 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- 239000005360 phosphosilicate glass Substances 0.000 description 4
- 229910021332 silicide Inorganic materials 0.000 description 4
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910000838 Al alloy Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 230000035699 permeability Effects 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 239000003870 refractory metal Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- Filtering Of Dispersed Particles In Gases (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988160945U JPH069020Y2 (ja) | 1988-12-12 | 1988-12-12 | 多孔質電極 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1988160945U JPH069020Y2 (ja) | 1988-12-12 | 1988-12-12 | 多孔質電極 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0283017U JPH0283017U (enrdf_load_stackoverflow) | 1990-06-27 |
| JPH069020Y2 true JPH069020Y2 (ja) | 1994-03-09 |
Family
ID=31443459
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1988160945U Expired - Lifetime JPH069020Y2 (ja) | 1988-12-12 | 1988-12-12 | 多孔質電極 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH069020Y2 (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4104193B2 (ja) * | 1997-11-14 | 2008-06-18 | 株式会社エフオーアイ | プラズマ処理装置 |
| JP7595841B2 (ja) * | 2020-10-07 | 2024-12-09 | 株式会社リコー | フィルタ保持装置、現像装置、プロセスカートリッジ、及び、画像形成装置 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59162918U (ja) * | 1983-04-18 | 1984-10-31 | 株式会社共立 | エア−クリ−ナ |
-
1988
- 1988-12-12 JP JP1988160945U patent/JPH069020Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0283017U (enrdf_load_stackoverflow) | 1990-06-27 |
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