JPH0686930A - Photoreaction device - Google Patents

Abstract

PURPOSE:To prevent the lowering of the intensity of laser beam and to enhance the utilization rate of laser beam and the economical efficiency of the whole of the photoreaction device. CONSTITUTION:Reactive substances 7 are irradiated with first and second laser beams 1A, 1B through a laser beam multiple reflection mechanism 11 to be reacted. The laser beam multiple reflection mechanism 11 is equipped with first and second reflection plates 3, 4 subjecting laser beams 1A, 1B to multiple reflection within a reaction area 2 where the reactive substances 7 are present. The first and second reflection plates 3, 4 are arranged at the positions opposed to each other so as to hold the reaction area 2 therebetween and the angles of reflection thereof are freely controlled.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photoreaction device using laser light, and in particular, improved a laser light multiple reflection mechanism for multiple reflection of laser light to improve the photon utilization rate of laser light. It relates to a photoreactor.

[0002]

2. Description of the Related Art A photoreaction device using a laser light multiple reflection mechanism is disclosed in, for example, Japanese Patent Application Laid-Open No. 3-245836. In this photoreaction device, a reaction material is irradiated with laser light through a laser light multiple reflection mechanism and reacted to generate a target ion or material.

That is, the conventional photoreaction device will be described with reference to FIGS. 4 and 5. In the photoreaction device 12, the incident laser light 1a from a laser light source (not shown) is incident on the laser light multiple reflection mechanism 11. The laser light 1 enters through the mouth 5 and is taken into the reaction region 2, and the entire reaction material 7 in the reaction region 2 is irradiated with the laser light 1, and the laser light after irradiation is irradiated by the first reflection plate 3
The step of repeating the step of irradiating the reaction material 7 with the reflected laser light, irradiating the reaction material 7 again with the reflected laser light, and then irradiating the reaction material 7 with the reflected laser light again. is there.

The laser light multiple reflection mechanism 11 is arranged such that the first reflection plate 3 and the second reflection plate 4 face each other across the reaction region 2 in which the reaction substance 7 exists, and their reflection surfaces are inward. It is arranged so that the reflection angle can be adjusted.

Almost all the laser light 1 incident on the first reflection plate 3 is reflected, passes through the reaction region 2 again, and is incident on the second reflection plate 4. Almost all of the laser light 1 incident on the second reflection plate 4 is reflected and passes through the reaction region 2 again.

After that, the laser beam 1 gradually moves to the lower side of the reaction region 2 while repeating the reflection between the first and second reflection plates 3 and 4 in a zigzag manner, and from the laser beam emission port 6 to the outside. To go out.

[0007]

In the photoreaction device 12 shown in FIGS. 4 and 5, the laser beam 1 has one orbit. Therefore, in order to provide a photoreaction that requires a plurality of types of laser light, the type of the laser light 1 is applied before the plurality of laser lights 1 are incident on the laser light multiple reflection mechanism 11 of the photoreaction device 12. Therefore, it is necessary to combine them into one orbit by using mirrors having different reflectances. Therefore, there are problems that the intensity of the laser light 1 is reduced due to mirror loss and the cost is increased due to the complicated device.

On the other hand, when the laser light absorptivity of the reaction material 7 differs depending on the type of the laser light 1, the rate of attenuation of the laser light 1 as it passes through the reaction material 7 depends on the type of the laser light 1. In the vicinity of the laser light emission port 6, there is a difference in the intensity ratio of each laser light 1.

Therefore, with the laser light 1 having a small absorptance in which the reaction rate of the reactant 7 becomes spatially non-uniform, the utilization rate of the laser light indicated by the attenuation rate after passing through the reactant 7 is low. However, there is a problem that the economical efficiency of the entire device is reduced.

The present invention has been made in order to solve the above problems, and improved the means for injecting a laser beam to a laser beam multiple reflection mechanism so that a plurality of laser beams have different beam shapes, incident angles, and orbits. It is possible to prevent the decrease of the intensity of the laser light due to the loss of the orbital composition mirror and the increase of the cost due to the complexity of the device, and to make the reaction rate of the reactants spatially uniform. It is an object of the present invention to provide a photoreaction device capable of improving the utilization factor of light and thus improving the economical efficiency of the entire device.

[0011]

The present invention relates to a photoreaction device for producing a desired ion or substance by irradiating a reaction substance with laser light through a laser light multiple reflection mechanism to produce a desired ion or substance. The mechanism has a multi-reflection mirror that multiple-reflects laser light in a reaction region where the reactant is present, and is configured such that a plurality of laser lights can be incident with different beam shapes, incident angles, and orbits. Characterize.

[0012]

The plurality of laser beams emitted from the laser light source are incident on the reaction region with different beam shapes and incident angles from the laser beam entrance of the laser beam multiple reflection mechanism. These incident laser beams are reflected by reflecting plates provided facing each other, and travel in zigzag in the reaction region while taking different trajectories to irradiate the reaction substance.

Here, the reaction region is a rectangular parallelepiped having a length h × width d × length l, an interval of the laser light multiple reflection mechanism is l ′, a vertical cross-sectional shape of the laser light is length w × width d, and an incident angle θ. ,
Assuming that the number of reflections is n, the absorption rate ρ to the reaction material, the transmission distance L, and the utilization rate η, it is necessary to set w = 2l'sin θ (1) in order to irradiate the entire reaction region with laser light. At this time, n · w / 2 to h ∴sin θ to h / (n · l ′) (2) Further, the transmission distance of the laser light is L = (n · l ′) / cos θ to n · l ′ ( ∵θ << 1) (3)

Here, assuming two types of first and second laser beams A and B, the utilization rate of the laser beam is proportional to the product of the absorption rate and the transmission distance (η∞ρ · L). , first and second laser light a, the homogenizing _{(ρ a · L a ~ρ B} · L B) the utilization of B _{is, (1 / L a) :(} 1 / L B) ~ It is sufficient to satisfy ρ _A : ρ _B. That is, from the equations (1), (2), and (3), the first and second laser beams A are set so that w _A : w _B = sin θ _A : sin θ _{B to} ρ _A : ρ _B (4) , B, the utilization factors η _A and η _B can be made equal.

In this way, by injecting a plurality of laser beams into the reaction region with different beam shapes, incident angles, and orbits, the laser beam intensity decreases due to the loss of the orbital synthesis mirror, and the apparatus becomes complicated. Prevents cost increase, and makes the reaction rate of the reactants spatially uniform,
It is possible to improve the utilization rate of each laser beam and thus improve the economical efficiency of the entire apparatus.

If the absorptance ρ of the laser light defined here is proportional to the speed of the reaction induced by each laser light, the speed of the reaction induced by each laser light is made equal. Assuming that the required energy density of each laser beam is E and the required laser output is P, E is inversely proportional to ρ, so P _A : P _B = (E _A · w _A ) :( E _B · w _B ) -1: 1 (5), the light sources of the first and second laser beams A and B can have the same device configuration, and the overall system can be rationalized.

[0017]

EXAMPLE An example of the photoreaction device according to the present invention will be described with reference to FIGS. In each figure, the same parts as those in FIGS. 4 and 5 are designated by the same reference numerals.

FIG. 1 is a schematic view showing an embodiment of the present invention, FIG. 2 is a sectional view of FIG. 1, and FIG. 3 is a view of the ZZ 'portion of FIG.

That is, in the photoreactor 12a of this embodiment, as shown in FIG. 1, the laser light multiple reflection mechanism 11 includes a first reflection plate 3 and a second reflection plate 4 in a reaction region in which a reaction substance 7 exists. The reflecting surfaces are arranged so as to face each other across the two so that the reflection angles can be adjusted inward.

The first and second reflectors 3 and 4 reflect almost all of the first laser light 1A and the second laser light 1B.

Therefore, as shown in FIG. 2, the first laser light 1A is incident from the laser light source (not shown) from the laser light entrance 5 of the laser light multiple reflection mechanism 11 at an incident angle θ _A. On the other hand, the second laser light 1B also enters from the laser light entrance 5 of the laser light multiple reflection mechanism 11 at the incident angle θ _B.

The first and second laser beams 1A and 1B then pass through the reaction region 2 in different trajectories, enter the first reflecting plate 3, and enter the first and second laser beams on the reflecting surface.
Almost all of the laser lights 1A and 1B are reflected. Then, the laser beams 1A and 1B again pass through the reaction region 2,
Almost all of the first and second laser beams 1A and 1B that have been incident on the second reflecting plate 4 and also on the reflecting surface are reflected.

After passing through the reaction region 2 again, thereafter, the first and second laser beams 1A and 1B are repeatedly reflected in a zigzag manner between the first and second reflection plates 3 and 4, and gradually become the reaction region 2. The laser light is emitted to the outside through the laser light emission port 6.

At this time, as shown in FIG. 3, the beam width w of the first and second laser beams 1A and 1B is applied to the entire reaction region 2 so that the utilization rates become equal.
_{At A} , w _B and incident angles θ _A , θ _B ,
It is adjusted to maintain the relationship of equations (1) and (4).

Next, the operation of this embodiment will be described. As shown in FIG. 2, the first laser light 1A from a laser light source (not shown) enters through the laser light entrance 5 of the laser light multiple reflection mechanism 11 at an incident angle θ _A. On the other hand, the second laser light 1B also enters from the laser light entrance 5 of the laser light multiple reflection mechanism 11 at the incident angle θ _B.

The first and second laser beams 1A and 1B then pass through the reaction region 2 in different orbits, enter the first reflecting plate 3, and enter the first and second reflecting surfaces.
Almost all of the laser beams 1A and 1B are reflected, pass through the reaction region 2 again, and enter the second reflection plate 4. Almost all of the first and second laser beams 1A and 1B incident on the reflecting surface of the second reflecting plate 4 are reflected and pass through the reaction region 2 again.

Thereafter, the first and second laser beams 1A,
1B gradually moves to the lower side of the reaction region 2 while repeating reflection in a zigzag manner between the first and second reflecting plates 3 and 4, and is emitted from the laser beam emitting port 6 to the outside. ing.

At this time, as shown in FIG. 3, the first and second laser beams 1A and 1B are applied to the entire reaction region 2, and the beam vertical width w thereof is equalized so that the utilization rates become equal.
_{At A} , w _B and incident angles θ _A , θ _B ,
It is adjusted to maintain the relationship of equations (1) and (4).

Therefore, according to the present embodiment, a plurality of laser beams are thus formed in different beam shapes,
By entering the reaction area at the incident angle and orbit,
It prevents the decrease of the laser light intensity due to the loss of the orbital composition mirror and the increase of cost due to the complexity of the device, and also makes the reaction rate of the reactants spatially uniform to improve the utilization rate of each laser light. The economical efficiency of the entire device can be improved.

Further, assuming that the laser light absorptance ρ defined here is proportional to the speed of the reaction induced by each laser light, the required laser output is equivalent as shown in the above equation (5). Therefore, the light sources of the first and second laser lights 1A and 1B can have the same device configuration, and the overall system can be rationalized.

[0031]

According to the present invention, since a plurality of laser beams can be incident with different beam shapes, incident angles and orbits, the laser beam intensity is reduced due to the loss of the orbital composition mirror and the device becomes complicated. To prevent an increase in cost.

Further, it is possible to make the reaction rate of the reactants spatially uniform, improve the utilization rate of each laser beam, and thus improve the economical efficiency of the entire apparatus. Even if there is a difference in absorptance, the light sources of the first and second laser lights A and B can have the same device configuration, and the overall system can be rationalized.

[Brief description of drawings]

FIG. 1 is a schematic diagram showing an embodiment of a photoreaction device according to the present invention.

FIG. 2 is a vertical sectional view of FIG.

FIG. 3 is a cross-sectional view showing a ZZ ′ arrow direction in FIG.

FIG. 4 is a schematic diagram showing a conventional photoreaction device.

5 is a vertical cross-sectional view of FIG.

[Explanation of symbols]

1 ... Laser light, 2 ... Reaction area, 3 ... First reflector, 4
... second reflecting plate, 5 ... laser light incident port, 6 ... laser light emitting port, 7 ... reactive substance, 11 ... laser light multiple reflection mechanism, 12, 12a ... photoreactor.

Claims (1)

[Claims] 1. A photoreactor for producing a target ion or substance by irradiating a reaction substance with laser light through a laser light multiple reflection mechanism to produce a target ion or substance. 1. A photoreaction device comprising a multi-reflection mirror that multiple-reflects in a reaction region in which a substance is present, and is configured so that a plurality of laser lights can be incident with different beam shapes, incident angles, and orbits.