JPH0684621A - Trimming method for resistor - Google Patents
Trimming method for resistorInfo
- Publication number
- JPH0684621A JPH0684621A JP4257150A JP25715092A JPH0684621A JP H0684621 A JPH0684621 A JP H0684621A JP 4257150 A JP4257150 A JP 4257150A JP 25715092 A JP25715092 A JP 25715092A JP H0684621 A JPH0684621 A JP H0684621A
- Authority
- JP
- Japan
- Prior art keywords
- resistor
- electrode
- laser beam
- point
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】この発明は基板上に抵抗材料を印
刷焼成して形成する厚膜抵抗体等の抵抗体のトリミング
をレーザ光線を利用して行う方法に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method of trimming a resistor such as a thick film resistor formed by printing and firing a resistive material on a substrate by using a laser beam.
【0002】[0002]
【従来の技術】図4は従来の厚膜抵抗素子を示すもの
で、セラミック基板1上に銀,パラジウム系等の一対の
電極2を印刷して焼成し、その間に酸化ルテニウム等の
抵抗体3を印刷して焼成固定したものである。2. Description of the Related Art FIG. 4 shows a conventional thick film resistance element, in which a pair of electrodes 2 made of silver, palladium or the like is printed on a ceramic substrate 1 and baked, and a resistor 3 made of ruthenium oxide or the like is provided therebetween. Is printed and fixed by firing.
【0003】そして、レーザ光線により、図4のように
抵抗体3の側方より直角に一本の切込み4を入れたり、
図5のように二本の切込み4、5を入れたり、図6のよ
うにL型の切込み6を入れたりしてトリミングを行って
いる。A laser beam is used to make a single cut 4 at a right angle from the side of the resistor 3 as shown in FIG.
Trimming is performed by making two notches 4 and 5 as shown in FIG. 5 or making an L-shaped notch 6 as shown in FIG.
【0004】[0004]
【発明が解決しようとする課題】上記のような従来のト
リミング方法のうち図4、図5に示すものは、切込み4
または5の先端に電流密度集中個所が発生したり、トリ
ミング方向にマイクロクラックが発生して耐サージ性が
低くなり、トリミング後の抵抗値ドリフトが発生する等
の問題があった。Among the conventional trimming methods as described above, the one shown in FIGS.
Alternatively, there are problems that a current density concentration portion is generated at the tip of No. 5, microcracks are generated in the trimming direction to reduce surge resistance, and resistance value drift after trimming occurs.
【0005】また、図6の方法は図4、図5の方法のも
のに比較して電流密度の集中はあまりないが、大幅な耐
サージ性の向上はみられないという問題がある。Further, the method of FIG. 6 has less concentration of the current density as compared with the methods of FIGS. 4 and 5, but has a problem that the surge resistance is not significantly improved.
【0006】この発明の課題は、上記のような従来技術
の問題点に鑑みて、電流密度集中個所の発生がなく、耐
サージ性にすぐれ、しかも高精度のトリミングが行える
トリミング方法を提供することである。In view of the problems of the prior art as described above, an object of the present invention is to provide a trimming method which does not generate a current density concentration portion, is excellent in surge resistance and can perform highly accurate trimming. Is.
【0007】[0007]
【課題を解決するための手段】上記の課題を解決するた
め、この発明は抵抗体の一方の電極から他方の電極にか
けて、レーザ光線を真っ直ぐに抵抗体を突き抜けるよう
に照射し、これを所定の抵抗値になるまでくり返して行
う方法を採用した。In order to solve the above-mentioned problems, the present invention irradiates a laser beam from one electrode of the resistor to the other electrode so that the laser beam goes straight through the resistor, and the laser beam is irradiated at a predetermined level. The method of repeating until the resistance value is reached is adopted.
【0008】[0008]
【作用】この発明においては、上記のようにレーザ光線
を、真っ直ぐに抵抗体を突き抜けるようにしたため、抵
抗体の電流密度が均一になり、また、レーザ光線により
形成されたカット溝の端部が抵抗体中に形成されること
がない。従って、耐サージ特性が向上し、また高精度の
トリミングが可能となる。In the present invention, since the laser beam is made to penetrate straight through the resistor as described above, the current density of the resistor becomes uniform and the end portion of the cut groove formed by the laser beam is It is not formed in the resistor. Therefore, the surge resistance is improved and highly accurate trimming is possible.
【0009】[0009]
【実施例】以下、この発明の実施例を添付図面に基づい
て説明する。Embodiments of the present invention will be described below with reference to the accompanying drawings.
【0010】図1乃至図2において、11はハイブリッ
ドIC等を構成するセラミック基板(要部のみ図示)
で、その上面に銀,パラジウム系等の一対の電極12を
それぞれ印刷し、焼成する。In FIG. 1 and FIG. 2, reference numeral 11 denotes a ceramic substrate (only a main part is shown) which constitutes a hybrid IC or the like.
Then, a pair of electrodes 12 made of silver, palladium, or the like is printed on the upper surface of each and baked.
【0011】そして、該両電極12の間に酸化ルテニウ
ム等の抵抗体13を印刷して該両電極12に接続し、そ
の後焼成する。Then, a resistor 13 made of ruthenium oxide or the like is printed between the both electrodes 12 and connected to the both electrodes 12, followed by firing.
【0012】上記のように製作した厚膜抵抗素子14を
レーザ光線によりトリミングするのであるが、実施例で
は、図1の矢印のように、一方の電極12の外側の始点
(a点)より真っ直ぐに電極12を通り抵抗体13上を
通り他方の電極12を通ってこの電極12の外側の終点
(b点)で終わる。The thick film resistance element 14 manufactured as described above is trimmed by a laser beam, but in the embodiment, as shown by the arrow in FIG. 1, it is straight from the outer starting point (point a) of one electrode 12. Through the electrode 12, the resistor 13, the other electrode 12, and the end point (point b) outside the electrode 12.
【0013】このような、直線状のレーザ光線の照射を
所定の抵抗値になるまで数回くり返すことにより、図2
のように抵抗体13の所要本数のレーザ光線の照射によ
って形成される。このカット部分15内において、抵抗
体が残存しないようにするために、レーザ光線の間隔
は、レーザ光線巾(0.04mm程度)よりも、若干小さく
(0.03mm程度)するのが望ましい。なお、この実施例で
はレーザ光線の始点(a点)および終点(b点)は、両
側の電極12上に位置してもよく、要は抵抗体13の外
側であればよい。By repeating the irradiation of such a linear laser beam several times until a predetermined resistance value is obtained, as shown in FIG.
As described above, the resistor 13 is formed by irradiating the required number of laser beams. In order to prevent the resistor from remaining in the cut portion 15, it is preferable that the laser beam interval be slightly smaller (about 0.03 mm) than the laser beam width (about 0.04 mm). In this embodiment, the starting point (point a) and the ending point (point b) of the laser beam may be located on the electrodes 12 on both sides, and the point is that they are outside the resistor 13.
【0014】また、図3に示すように、最初はレーザ光
線の間隔を広くしてから、のちにレーザ光線の間隔をせ
まくして、トリミングしてもよい。この場合、トリミン
グのスピードアップをはかることができる。Further, as shown in FIG. 3, it is also possible to first widen the intervals of the laser beams and then narrow the intervals of the laser beams for trimming. In this case, trimming speed can be increased.
【0015】[0015]
【発明の効果】この発明の方法は、上記のようにレーザ
光線を一端の電極から他端の電極へと一直線状に照射す
るものであるから、従来のトリミング方法のようにレー
ザ光線により形成されたカット溝の端部が抵抗体中に形
成されることがない。Since the method of the present invention irradiates the laser beam from the electrode at one end to the electrode at the other end in a straight line as described above, it is formed by the laser beam as in the conventional trimming method. The end of the cut groove is not formed in the resistor.
【0016】従って、従来品のような電流密度の集中す
る部分がなくなり大幅な耐サージ性が得られる。また一
端の電極から他端の電極へと一直線にレーザ光線を通す
だけであるからトリミングが容易で例えば0.5mm ×0.5m
m や0.3mm ×0.3mm もしくはそれ以下の小型形状の抵抗
体のトリミングも容易であるなどの効果がある。Therefore, unlike the conventional product, there is no portion where the current density is concentrated, and a large surge resistance can be obtained. In addition, the laser beam is simply passed straight from the electrode on one end to the electrode on the other end, so trimming is easy and, for example, 0.5 mm × 0.5 m
There is an effect that it is easy to trim a small-sized resistor of m, 0.3 mm × 0.3 mm or less.
【図1】この発明の方法の実施例を示す平面図。FIG. 1 is a plan view showing an embodiment of the method of the present invention.
【図2】図1の方法でトリミングされた抵抗素子の平面
図。FIG. 2 is a plan view of a resistance element trimmed by the method of FIG.
【図3】この発明の方法の他の実施例を示す平面図。FIG. 3 is a plan view showing another embodiment of the method of the present invention.
【図4】従来例を示す平面図。FIG. 4 is a plan view showing a conventional example.
【図5】他の従来例を示す平面図。FIG. 5 is a plan view showing another conventional example.
【図6】更に他の従来例を示す平面図。FIG. 6 is a plan view showing still another conventional example.
12 電極 13 抵抗体 14 厚膜抵抗素子 15 カット部分 12 electrode 13 resistor 14 thick film resistance element 15 cut portion
Claims (1)
行う方法において、抵抗体の一方の電極から他方の電極
にかけて、レーザ光線を、真っ直ぐに抵抗体を突き抜け
るように照射し、これを所定の抵抗値になるまでくり返
して行うことを特徴とする抵抗体のトリミング方法。1. A method of trimming a resistor with a laser beam, wherein a laser beam is applied from one electrode of the resistor to the other electrode so that the laser beam goes straight through the resistor, and a predetermined resistance value is applied. The trimming method of the resistor is characterized in that it is repeated until the following.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4257150A JPH0684621A (en) | 1992-08-31 | 1992-08-31 | Trimming method for resistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4257150A JPH0684621A (en) | 1992-08-31 | 1992-08-31 | Trimming method for resistor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0684621A true JPH0684621A (en) | 1994-03-25 |
Family
ID=17302410
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4257150A Pending JPH0684621A (en) | 1992-08-31 | 1992-08-31 | Trimming method for resistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0684621A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6033045A (en) * | 1995-04-19 | 2000-03-07 | Fay D. Roberts | Trapezoidal hidden-monitor computer desk modules and assemblies thereof |
US7057491B2 (en) | 2002-09-23 | 2006-06-06 | Analog Devices, Inc. | Impedance network with minimum contact impedance |
US7598841B2 (en) | 2005-09-20 | 2009-10-06 | Analog Devices, Inc. | Film resistor and a method for forming and trimming a film resistor |
US8441335B2 (en) | 2010-10-21 | 2013-05-14 | Analog Devices, Inc. | Method of trimming a thin film resistor, and an integrated circuit including trimmable thin film resistors |
US8723637B2 (en) | 2012-04-10 | 2014-05-13 | Analog Devices, Inc. | Method for altering electrical and thermal properties of resistive materials |
US9963777B2 (en) | 2012-10-08 | 2018-05-08 | Analog Devices, Inc. | Methods of forming a thin film resistor |
-
1992
- 1992-08-31 JP JP4257150A patent/JPH0684621A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6033045A (en) * | 1995-04-19 | 2000-03-07 | Fay D. Roberts | Trapezoidal hidden-monitor computer desk modules and assemblies thereof |
US7057491B2 (en) | 2002-09-23 | 2006-06-06 | Analog Devices, Inc. | Impedance network with minimum contact impedance |
US7598841B2 (en) | 2005-09-20 | 2009-10-06 | Analog Devices, Inc. | Film resistor and a method for forming and trimming a film resistor |
US7719403B2 (en) | 2005-09-20 | 2010-05-18 | Analog Devices, Inc. | Film resistor and a method for forming and trimming a film resistor |
US8441335B2 (en) | 2010-10-21 | 2013-05-14 | Analog Devices, Inc. | Method of trimming a thin film resistor, and an integrated circuit including trimmable thin film resistors |
US8723637B2 (en) | 2012-04-10 | 2014-05-13 | Analog Devices, Inc. | Method for altering electrical and thermal properties of resistive materials |
US9963777B2 (en) | 2012-10-08 | 2018-05-08 | Analog Devices, Inc. | Methods of forming a thin film resistor |
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