JPH0669018B2 - Pattern exposure device - Google Patents
Pattern exposure deviceInfo
- Publication number
- JPH0669018B2 JPH0669018B2 JP60285071A JP28507185A JPH0669018B2 JP H0669018 B2 JPH0669018 B2 JP H0669018B2 JP 60285071 A JP60285071 A JP 60285071A JP 28507185 A JP28507185 A JP 28507185A JP H0669018 B2 JPH0669018 B2 JP H0669018B2
- Authority
- JP
- Japan
- Prior art keywords
- holder
- sample
- vacuum
- stage
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Electron Beam Exposure (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明はパターン露光装置に関し、特に試料を設置する
真空試料室を備えたパターン露光装置における、真空試
料室への試料本体の固定機構に関する。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a pattern exposure apparatus, and more particularly to a mechanism for fixing a sample body to a vacuum sample chamber in a pattern exposure apparatus equipped with a vacuum sample chamber for mounting a sample.
従来、半導体集積回路等のパターンを石英ガラス基板や
シリコンウェハー等の試料上に描画する為の電子ビーム
露光装置やイオンビーム露光装置において、試料を高真
空に保たれた試料室に設置する際は、第３図に示す如き
試料ホルダーを用いていた。Conventionally, in an electron beam exposure apparatus or an ion beam exposure apparatus for drawing a pattern of a semiconductor integrated circuit or the like on a sample such as a quartz glass substrate or a silicon wafer, when the sample is placed in a sample chamber kept in a high vacuum, , A sample holder as shown in FIG. 3 was used.
第３図(a)(b)は従来例でありICホトマスク用ガラス基板
のホルダーとそのBB断面図である。ホルダー21に挿入さ
れたガラス基板１は押えバネ10により水平方向の押さ
れ、基板上端がホルダーに接し水平方向の位置決めが行
なわれる。又、鉛直方向には持上げバネ23によりガラス
基板１をタブ８に押当て位置決めを行なっている。FIGS. 3 (a) and 3 (b) are conventional examples showing a holder of a glass substrate for an IC photomask and a BB sectional view thereof. The glass substrate 1 inserted in the holder 21 is pushed in the horizontal direction by the holding spring 10, and the upper end of the substrate comes into contact with the holder for horizontal positioning. Further, in the vertical direction, the glass substrate 1 is pressed against the tab 8 by the lifting spring 23 to perform positioning.
基板上に半導体IC等のパターンを描画する際は前述のガ
ラス基板１を挿入したホルダー21を、まず大気圧の試料
交換室に設置する。次に試料交換室を試料室と同じ真空
度に減圧する。その後、ホルダーごと試料室のステージ
に乗せ固定し、パターン描画を行なう。ガラス基板上の
パターン描画の位置精度はサブミクロンのオーダーで行
なう必要がある。When drawing a pattern such as a semiconductor IC on the substrate, the holder 21 into which the glass substrate 1 is inserted is first installed in the sample exchange chamber at atmospheric pressure. Next, the sample exchange chamber is depressurized to the same degree of vacuum as the sample chamber. After that, the holder is placed on the stage in the sample chamber and fixed, and a pattern is drawn. The positional accuracy of pattern writing on the glass substrate must be on the order of submicrons.
しかし、従来装置における試料室でのガラス基板固定方
法によると、次の如き不都合がある。すなわち、ホルダ
ーを設置した試料交換室を大気圧から高真空に減圧する
と、断熱膨張によりホルダー、ガラス基板の温度降下が
起こる。この状態でホルダーを試料室中のステージ上に
設置すると時間経過と共にホルダーとガラス基板の温度
が徐々に上昇することになる。この温度上昇は、低膨張
係数の石英材質のガラス基板に対してはほとんど影響を
与えない。しかし、金属材質から成るホルダーは熱膨張
により位置ずれを起こし、ホルダーに固定されたガラス
基板も位置ずれを起こしてしまう。パターン描画時は、
ステージ上の基準点を基点座標として相対的な位置関係
に従ってガラス基板上に描画を行なう。従って、描画中
に前述の相対位置関係が崩れると、描画したパターンの
位置精度が低下する。However, the conventional method for fixing a glass substrate in a sample chamber has the following disadvantages. That is, when the pressure of the sample exchange chamber in which the holder is installed is reduced from atmospheric pressure to high vacuum, the temperature of the holder and the glass substrate drop due to adiabatic expansion. When the holder is placed on the stage in the sample chamber in this state, the temperature of the holder and the glass substrate gradually rises with the passage of time. This temperature rise has almost no effect on the glass substrate made of quartz having a low expansion coefficient. However, the holder made of a metal material is displaced due to thermal expansion, and the glass substrate fixed to the holder is also displaced. When drawing a pattern,
Drawing is performed on the glass substrate according to the relative positional relationship with the reference point on the stage as the base point coordinates. Therefore, if the above-mentioned relative positional relationship is broken during drawing, the positional accuracy of the drawn pattern is reduced.
上記問題を解決する為には、試料交換室とホルダー、試
料室、ステージ等の温度制御を高い精度で行なえば良い
が、断熱膨張を考慮した温度制御を精度よく行なうこと
は難しい。その他にはホルダーの温度変化がなくなる
迄、ホルダーをステージ上に放置する方法があるが装置
の生産性の面から極めて不利である。In order to solve the above-mentioned problem, the temperature of the sample exchange chamber, the holder, the sample chamber, the stage, etc. may be controlled with high accuracy, but it is difficult to perform the temperature control in consideration of adiabatic expansion with high accuracy. Another method is to leave the holder on the stage until the temperature change of the holder disappears, but this is extremely disadvantageous in terms of the productivity of the apparatus.
本発明はホルダーの熱膨張によるガラス基板の位置ずれ
をなくすパターン露光装置を提供するものである。The present invention provides a pattern exposure apparatus that eliminates positional displacement of a glass substrate due to thermal expansion of a holder.
前記目的を達成するため、本発明に係るパターン露光装
置は、ステージ一体型ホルダーと、搬送ホルダーとを有
するパターン露光装置であって、 ステージ一体型ホルダーは、真空試料室内に固定して設
置され、搬送ホルダーにより送込まれた試料の対向する
縁部を挟持し該試料を前記真空試料室内の真空雰囲気中
に保持するものであり、 搬送ホルダーは、前記真空試料室内に送込むべき試料の
対向する縁部を摺動可能に挟持し、前記真空試料室の真
空度と同圧に減圧した交換室と前記真空試料室内のステ
ージ一体型ホルダーとの間を往復動し、前記試料をロッ
ドで押出して前記ステージ一体型ホルダーに移し替える
ものである。To achieve the above object, a pattern exposure apparatus according to the present invention is a pattern exposure apparatus having a stage-integrated holder and a transport holder, wherein the stage-integrated holder is fixedly installed in a vacuum sample chamber, The conveying holder holds the sample in a vacuum atmosphere inside the vacuum sample chamber by sandwiching the opposite edges of the sample sent by the conveying holder, and the conveying holder faces the sample to be sent into the vacuum sample chamber. The edge part is slidably sandwiched, and the sample is pushed out by a rod by reciprocating between an exchange chamber whose pressure is reduced to the same degree as the vacuum of the vacuum sample chamber and a stage-integrated holder in the vacuum sample chamber. It is to be transferred to the stage-integrated holder.
次に本発明の一実施例について図面を参照して説明す
る。Next, an embodiment of the present invention will be described with reference to the drawings.
第２図(a),(b)は本発明において、交換室から試料室へ
試料を搬送する搬送ホルダー３を示すもので、図におい
て、ガラス基板１はホルダーフック２側から搬送ホルダ
ー３に挿入される。搬送ホルダー３に挿入されたガラス
基板１は樹脂性の押え板4,4′により上下から押えられ
る。下方の押え板４′はバネ５によりガラス基板１が搬
送中に移動しない程度の力で押し上げられている。FIGS. 2 (a) and 2 (b) show a transport holder 3 for transporting a sample from an exchange chamber to a sample chamber in the present invention. In the figure, the glass substrate 1 is inserted into the transport holder 3 from the holder hook 2 side. To be done. The glass substrate 1 inserted in the carrier holder 3 is pressed from above and below by the resin-made pressing plates 4, 4 '. The lower holding plate 4 ′ is pushed up by the spring 5 with a force such that the glass substrate 1 does not move during transportation.
ガラス基板１は搬送ホルダー３に設置された状態で大気
圧の交換室へ置かれ、交換室の圧力を真空試料室の真空
度と同圧に減圧した後、試料室に搬送される。通常生産
性を上げる為、交換室には複数の試料が置かれ、搬送過
程ではエレベータによる上下移動、交換室から試料室へ
の水平移動があるが、搬送ホルダーに保護され、試料そ
のものへの損傷は発生しない。The glass substrate 1 is placed in the transfer holder 3 and placed in an exchange chamber at atmospheric pressure. After the pressure in the exchange chamber is reduced to the same pressure as the vacuum degree in the vacuum sample chamber, the glass substrate 1 is transferred to the sample chamber. Normally, in order to improve productivity, multiple samples are placed in the exchange chamber, and there are vertical movements by the elevator during the transfer process and horizontal movement from the exchange chamber to the sample chamber, but the transfer holder protects and damages the sample itself. Does not occur.
第１図は本実施例におけるステージ一体型ホルダーへの
試料の設置機構を示す。第１図において、搬送ホルダー
３は搬送ホルダー挿入ロッド６により交換室から試料室
のローディングポジションまで移動される。ローディン
グポジションにおいて試料挿入ロッド７が押え板4,4′
により半固定にされているガラス基板１をステージ一体
型ホルダー11に挿入する。ガラス基板１のステージ一体
型ホルダー11への挿入が完了すると、搬送ホルダー３は
ホルダーフック２をロッド６の先端で保持することによ
り交換室に引き戻される。その後、ガラス基板１はステ
ージ一体型ホルダー11のタブ８と試料持上げピン９によ
り鉛直方向の押えバネ10により水平方向の位置決め及び
固定が行なわれる。FIG. 1 shows a mechanism for placing a sample on a stage-integrated holder in this embodiment. In FIG. 1, the transport holder 3 is moved from the exchange chamber to the loading position of the sample chamber by the transport holder insertion rod 6. At the loading position, the sample insertion rod 7 holds the pressing plates 4, 4 '.
Then, the glass substrate 1 which is semi-fixed is inserted into the stage-integrated holder 11. When the insertion of the glass substrate 1 into the stage-integrated holder 11 is completed, the carrier holder 3 is pulled back to the exchange chamber by holding the holder hook 2 at the tip of the rod 6. Then, the glass substrate 1 is positioned and fixed in the horizontal direction by the tab 8 of the stage-integrated holder 11 and the sample lifting pin 9 by the vertical pressing spring 10.
電子ビーム、或はイオンビームでパターンの描画を行な
う際は、ステージ一体型ホルダー上の基準点12を基準座
標として行なわれる。したがって、交換室の断熱膨張が
及ぼすパターン描画位置精度への影響は無視することが
できる。When a pattern is drawn with an electron beam or an ion beam, the reference point 12 on the stage-integrated holder is used as a reference coordinate. Therefore, the effect of the adiabatic expansion of the exchange chamber on the pattern drawing position accuracy can be ignored.
以上説明したように本発明のパターン露光装置は試料を
交換室から真空試料室へ搬送するホルダーと試料室のス
テージ上で試料の固定を行なうホルダーとをそれぞれ独
立に有し、試料を試料室に設置する際、予め真空試料室
に備えられたホルダーに依り試料本体を固定するように
したので、ホルダーの熱膨張によるガラス基板の位置ず
れを防止することができ、容易にパターン描画位置精度
を向上させることができる効果を有するものである。As described above, the pattern exposure apparatus of the present invention independently has a holder for transporting the sample from the exchange chamber to the vacuum sample chamber and a holder for fixing the sample on the stage of the sample chamber, and the sample is placed in the sample chamber. When installing, the sample body is fixed in advance by the holder provided in the vacuum sample chamber, so it is possible to prevent displacement of the glass substrate due to thermal expansion of the holder and easily improve the pattern drawing position accuracy. It has an effect that can be made.
第１図は本発明の一実施例を示す機構図、第２図(a)は
本発明の搬送用ホルダーの平面図、第２図(b)はA-A線断
面図、第３図(a)は従来の試料ホルダーの平面図、第３
図(b)はB-B線断面図である。 １……ガラス基板、２……ホルダーフック、３……試料
搬送ホルダー、4,4′……押え板、５……バネ、６……
搬送ホルダー挿入ロッド、７……試料挿入ロッド、８…
…タブ、９……試料持上げピン、10……押えバネ、11…
…ステージ一体型ホルダー、12……基準点、21……試料
ホルダー、23……持上げバネ。FIG. 1 is a mechanical view showing an embodiment of the present invention, FIG. 2 (a) is a plan view of a carrier holder of the present invention, FIG. 2 (b) is a sectional view taken along line AA, and FIG. 3 (a). Is a plan view of a conventional sample holder, No. 3
Figure (b) is a sectional view taken along the line BB. 1 ... Glass substrate, 2 ... Holder hook, 3 ... Sample transport holder, 4,4 '... Presser plate, 5 ... Spring, 6 ...
Transport holder insertion rod, 7 ... Sample insertion rod, 8 ...
… Tab, 9 …… Sample lifting pin, 10… Presser spring, 11…
… Stage integrated holder, 12 …… reference point, 21 …… sample holder, 23 …… lifting spring.
Claims (1)
とを有するパターン露光装置であって、 ステージ一体型ホルダーは、真空試料室内に固定して設
置され、搬送ホルダーにより送込まれた試料の対向する
縁部を挟持し該試料を前記真空試料室内の真空雰囲気中
に保持するものであり、 搬送ホルダーは、前記真空試料室内に送込むべき試料の
対向する縁部を摺動可能に挟持し、前記真空試料室の真
空度と同圧に減圧した交換室と前記真空試料室内のステ
ージ一体型ホルダーとの間を往復動し、前記試料をロッ
ドで押出して前記ステージ一体型ホルダーに移し替える
ものであることを特徴とするパターン露光装置。1. A pattern exposure apparatus having a stage-integrated holder and a transport holder, wherein the stage-integrated holder is fixedly installed in a vacuum sample chamber and faces a sample sent by the transport holder. The sample is held in a vacuum atmosphere in the vacuum sample chamber by sandwiching an edge portion, and the transport holder slidably sandwiches opposite edges of the sample to be sent into the vacuum sample chamber, It reciprocates between an exchange chamber that is depressurized to the same pressure as the degree of vacuum of the vacuum sample chamber and a stage-integrated holder in the vacuum sample chamber, pushes out the sample with a rod and transfers it to the stage-integrated holder. A pattern exposure apparatus characterized by the above.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60285071A JPH0669018B2 (en) | 1985-12-18 | 1985-12-18 | Pattern exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60285071A JPH0669018B2 (en) | 1985-12-18 | 1985-12-18 | Pattern exposure device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62144324A JPS62144324A (en) | 1987-06-27 |
| JPH0669018B2 true JPH0669018B2 (en) | 1994-08-31 |
Family
ID=17686770
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60285071A Expired - Fee Related JPH0669018B2 (en) | 1985-12-18 | 1985-12-18 | Pattern exposure device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0669018B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07177642A (en) * | 1993-12-22 | 1995-07-14 | Nippon Plast Co Ltd | Cable reel |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110244396A1 (en) * | 2010-04-01 | 2011-10-06 | Nikon Corporation | Exposure apparatus, exchange method of object, exposure method, and device manufacturing method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59111327A (en) * | 1982-12-17 | 1984-06-27 | Hitachi Ltd | Exchanger for sample |
-
1985
- 1985-12-18 JP JP60285071A patent/JPH0669018B2/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07177642A (en) * | 1993-12-22 | 1995-07-14 | Nippon Plast Co Ltd | Cable reel |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62144324A (en) | 1987-06-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |