JPH0657612B2 - Synthetic quartz glass tube and manufacturing method thereof - Google Patents
Synthetic quartz glass tube and manufacturing method thereofInfo
- Publication number
- JPH0657612B2 JPH0657612B2 JP62117835A JP11783587A JPH0657612B2 JP H0657612 B2 JPH0657612 B2 JP H0657612B2 JP 62117835 A JP62117835 A JP 62117835A JP 11783587 A JP11783587 A JP 11783587A JP H0657612 B2 JPH0657612 B2 JP H0657612B2
- Authority
- JP
- Japan
- Prior art keywords
- synthetic quartz
- quartz glass
- glass tube
- tube
- bubbles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/04—Forming tubes or rods by drawing from stationary or rotating tools or from forming nozzles
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/01—Other methods of shaping glass by progressive fusion or sintering of powdered glass onto a shaping substrate, i.e. accretion, e.g. plasma oxidation deposition
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B23/00—Re-forming shaped glass
- C03B23/04—Re-forming tubes or rods
- C03B23/047—Re-forming tubes or rods by drawing
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Manufacturing & Machinery (AREA)
- Glass Melting And Manufacturing (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
【発明の詳細な説明】 （産業上の利用分野） 本発明は合成石英ガラス管およびその製造方法、特には
実質的に泡のない内外二層の合成石英管状層の間に微細
な泡を多数包含する合成石英層を設けた三層構造からな
る、熱的強度のすぐれた半導体工業分野などで有用とさ
れる新規な合成石英ガラス管およびその製造方法に関す
るものである。Description: TECHNICAL FIELD The present invention relates to a synthetic quartz glass tube and a method for producing the same, and in particular, to a large number of fine bubbles between two inner and outer synthetic quartz tubular layers which are substantially bubble-free. The present invention relates to a novel synthetic quartz glass tube having a three-layer structure provided with a synthetic quartz layer, which has excellent thermal strength and is useful in the field of semiconductor industry and the like, and a method for producing the same.
（従来の技術） 半導体工業用、特にシリコンウエーハの熱処理治具とし
て石英製のものが汎用されているが、これらはその殆ど
天然水晶またはけい砂の原料とした天然石英ガラス製の
ものとされている。しかし、この天然石英ガラスには多
種類の不純物が存在しているためにそれらを加工工程中
で完全に除去することは非常に難しく、含有不純物が半
導体の熱処理工程中に拡散、侵透してシリコンウエーハ
を汚染するために、その工程歩留りがわるくなるという
ことが知られている。(Prior Art) Quartz-made jigs are generally used as heat treatment jigs for the semiconductor industry, especially for silicon wafers, but most of them are made of natural quartz glass used as a raw material for natural quartz or silica sand. There is. However, it is very difficult to completely remove these kinds of impurities in this natural quartz glass during the processing step, and the impurities contained in the natural quartz glass diffuse and penetrate during the heat treatment step of the semiconductor. It is known that a silicon wafer is contaminated, resulting in a poor process yield.
このため、半導体工業用に使用される石英ガラス部材を
高純度のけい素化合物を出発原料として化学的に製造さ
れた合成石英ガラスとすることも検討されたけれども、
合成石英ガラスは一般に天然石英ガラスに比較して高温
では軟化し易く、半導体製造用部材としたときに繰り返
しの高温熱処理工程では比較的短時間で変形して遂には
その機能を果たさなくなるという不利があることから、
合成石英ガラスの使用については天然石英ガラスとの多
層構造をとるなどして耐熱性向上の改善も試みられてい
るが、これらは純度の問題もあり満足すべき結果は得ら
れていない。For this reason, although it has been considered to use a quartz glass member used for the semiconductor industry as a synthetic quartz glass that is chemically manufactured using a high-purity silicon compound as a starting material,
Synthetic quartz glass is generally easier to soften at high temperatures than natural quartz glass, and when it is used as a semiconductor manufacturing member, it has a disadvantage that it is deformed in a relatively short time in repeated high temperature heat treatment steps and finally does not fulfill its function. Because there is
Regarding the use of synthetic quartz glass, attempts have been made to improve the heat resistance by taking a multilayer structure with natural quartz glass, but satisfactory results have not been obtained due to the problem of purity.
（発明の構成） 本発明はこのような不利を解決した合成石英ガラス管に
関するものであり、その構成は、実質的に泡を含まない
合成石英の内側および外側の両管状層の中間に、直径10
〜1,000μｍの微細な泡を１cm3当り1,000個以上含まれ
る多孔質合成石英ガラス管状層が一体に形成されて成る
半導体熱処理工業に極めて有用な三層構造の合成石英ガ
ラス管を提供するものである。(Structure of the Invention) The present invention relates to a synthetic quartz glass tube which has solved such disadvantages, and its structure is such that a diameter of the synthetic quartz glass tube is substantially in the middle of both the inner and outer tubular layers of synthetic quartz. Ten
It provides a synthetic quartz glass tube with a three-layer structure, which is extremely useful in the semiconductor heat treatment industry, in which a porous synthetic quartz glass tubular layer containing 1,000 or more fine bubbles of 1,000 μm per 1 cm 3 is integrally formed. is there.
本発明者らは熱的変形することのない合成石英ガラス管
の開発について種々検討した結果、けい素化合物からの
化学的手段で作られた高純度の合成石英ガラス管を２重
管とし、この二層の間に粉末状の合成石英粉を充填し加
熱溶融して延伸一体化させると、実質的に泡のない合成
石英層の中間に微細な泡を多数包含する合成石英層が設
けられて、この泡が壁構造上ハニカム形状またはトラス
形状となるので、このものが機械的強度の大きいものと
なって高温状態での熱的変形が抑制されるようになるこ
とを見出した。すなわち、上記方法によれば、半導体工
業用に使用される熱処理治具としての合成石英製品を容
易に得ることができることを確認して本発明を完成させ
た。As a result of various studies on the development of a synthetic quartz glass tube that is not thermally deformed, the present inventors have made a high purity synthetic quartz glass tube made by a chemical means from a silicon compound into a double tube. When powdered synthetic quartz powder is filled between two layers, heated, melted, and stretched and integrated, a synthetic quartz layer containing many fine bubbles is provided in the middle of the substantially quartz-free synthetic quartz layer. It has been found that, since the bubbles have a honeycomb shape or a truss shape due to the wall structure, the bubbles have a large mechanical strength and the thermal deformation at a high temperature is suppressed. That is, according to the above method, it was confirmed that a synthetic quartz product as a heat treatment jig used for the semiconductor industry could be easily obtained, and the present invention was completed.
つぎにこの合成石英管およびその製造方法を添付の図面
にもとづいて説明するが、第１図は本発明の合成石英ガ
ラス管の横断面図、第２図はこの合成石英ガラス管の製
造方法の縦断面図を示したものである。The synthetic quartz tube and the method for producing the synthetic quartz tube will be described below with reference to the accompanying drawings. FIG. 1 shows a cross-sectional view of the synthetic quartz glass tube of the present invention, and FIG. 2 shows a method for producing the synthetic quartz glass tube. It is a vertical cross-sectional view.
本発明の合成石英ガラス管は第１図に示したように泡の
ない合成石英ガラス層１、２の間に微細な泡を多数包含
する石英層３を介在させたものであるが、このものは泡
を含有する石英層における多数の泡がハニカム形状、ト
ラス形状となるので機械的強度の大きい、したがって熱
的変形のし難いものになるという有利性をもつものにな
る。As shown in FIG. 1, the synthetic quartz glass tube of the present invention is one in which a quartz layer 3 containing a large number of fine bubbles is interposed between bubbles-free synthetic quartz glass layers 1 and 2. Has a merit that a large number of bubbles in the bubble-containing quartz layer have a honeycomb shape or a truss shape, so that the mechanical strength is large, and therefore thermal deformation is difficult.
この泡を含有する石英層はそれが管壁の厚さの１０％以
下では高温状態での熱的耐変形の向上が不充分なものと
なり、９０％以上とするとこの泡が管壁表面にも浮ぶよ
うになって管表面の平滑性が乱されるので１０〜９０％
の範囲のものとすることがよい。また、この泡の大きさ
は泡の直径が１０〜１，０００μｍの範囲であれば熱時
強度の向上が得られるのでこの範囲とすればよいが、石
英ガラス管全体の強度の均一性からは泡の径の分布が狭
いほうがよいので５０〜５００μｍの範囲とすることが
よい。また、この泡についてはその泡密度によって熱的
強度の改善効果が異なり、ガラス層体積１cm3当り１，
０００個以下ではこの改善効果が小さくなるので１cm当
り１，０００個以上、好ましくは５，０００個以上とす
ることがよい。If the quartz layer containing bubbles is 10% or less of the thickness of the tube wall, the improvement of thermal deformation resistance at high temperature is insufficient, and if it is 90% or more, the bubbles are also formed on the surface of the tube wall. As it floats and the smoothness of the tube surface is disturbed, 10 to 90%
It is good to be in the range of. Further, the size of this bubble can be set within this range because the strength at the time of heating can be improved if the diameter of the bubble is in the range of 10 to 1,000 μm. However, from the uniformity of the strength of the entire quartz glass tube, Since it is preferable that the distribution of bubble diameters is narrow, the range is preferably 50 to 500 μm. Further, regarding this foam, the effect of improving the thermal strength differs depending on the foam density, and the volume of glass layer per 1 cm 3 is 1,
If the number is less than 000, the improvement effect will be small, so 1,000 or more, preferably 5,000 or more per cm.
この合成石英ガラス管の製造は例えば第２図に示したよ
うに泡のない合成石英１１および１２からなる２重の石
英ガラス管の空隙部１３に合成石英粉末１４を充填し、
これを電気または火炎を熱源１５とする加熱炉１６中に
導入して加熱溶融し、延伸一体化して合成石英ガラス管
１７を得るようにすればよい。この泡のない２重管状の
合成石英ガラス管は公知の方法で得た管径の相違する２
本の合成石英ガラス管状体を合体することによって作れ
ばよいが、この空隙部１３に充填される合成石英粉末も
充分高純度のものとすることから、合成石英管または棒
を機械的粉砕により得たものとすることがよい。しか
し、この合成石英粉末は本発明の合成石英ガラス管にお
ける泡の直径、泡密度が上記したように直径１０〜１，
０００μｍ、密度１cm当り１，０００個以上のものとす
ることが必要とされることから粒径が１〜１，５００μ
ｍの範囲、好ましくは２０〜１，０００μｍの範囲のも
のとするとがよい。また、この合成石英粉末の空隙部１
３への充填はこれを加熱溶融、延伸一体化させたときに
この合成石英ガラス管中の泡の直径、泡密度を上記の範
囲のものとするこことが必要とされることから、できる
だけ細密に充填することが必要とされるので、この充填
に当ってはバイブレーターなどによる振動充填を行なう
ことがよいが、この合成石英粉末については加熱溶融、
延伸一体化後の合成石英ガラス管中における泡直径を均
一なものとし、さらにその均等分布が特に要望される場
合は充填する前に火炎処理などを施してその形状をでき
るだけ球状のものとしておくことがよい。This synthetic quartz glass tube is manufactured, for example, as shown in FIG. 2, by filling the void portion 13 of a double quartz glass tube made of bubble-free synthetic quartz 11 and 12 with synthetic quartz powder 14.
The synthetic quartz glass tube 17 may be obtained by introducing this into a heating furnace 16 using electricity or flame as a heat source 15, heating and melting, and stretching and integrating. This double-tube synthetic quartz glass tube without bubbles has a different tube diameter obtained by a known method.
It may be made by combining the synthetic quartz glass tubular bodies of the book, but since the synthetic quartz powder filling the voids 13 is also of sufficiently high purity, a synthetic quartz tube or rod can be obtained by mechanical grinding. It is good to have it. However, this synthetic quartz powder has a diameter of bubbles in the synthetic quartz glass tube of the present invention and a bubble density of 10 to 1, as described above.
The particle size is 1 to 1,500μ because it is necessary to have 1,000 or more per 000 μm and a density of 1 cm.
The range of m is preferably 20 to 1,000 μm. In addition, the void portion 1 of this synthetic quartz powder
Filling into No. 3 requires that the diameter and bubble density of the bubbles in the synthetic quartz glass tube be within the above ranges when they are melted by heating and integrated into a stretch. Since it is necessary to fill in, it is preferable to vibrate and fill with a vibrator in this filling, but this synthetic quartz powder is heated and melted,
Make the bubble diameter uniform in the synthetic quartz glass tube after stretching and integration, and if uniform distribution is especially required, apply flame treatment etc. before filling to make the shape as spherical as possible. Is good.
合成石英粉末を細密充填した合成石英ガラス二重管は加
熱溶融、延伸一体化によって目的とする泡層を有する合
成石英ガラス管とされるのであるが、この加溶溶融は電
気または火炎を熱源とする加熱炉中で１，５００〜２，
３００℃の範囲で行なわせればよく、この延伸一体化は
目的とする合成石英ガラス管の直径、管壁の厚さに合わ
せて任意の速度、大きさで延伸するようにすればよい。A synthetic quartz glass double tube that is densely packed with synthetic quartz powder is made into a synthetic quartz glass tube that has a desired foam layer by heat melting and stretching integration, but this melting and melting uses electricity or flame as a heat source. 1,500-2 in a heating furnace
The stretching may be carried out in the range of 300 ° C., and the stretching and unifying may be performed at a desired speed and size according to the diameter of the synthetic quartz glass tube and the thickness of the tube wall.
このようにして得られた合成石英ガラス管は合成石英ガ
ラス管２重管がその中間に充填された合成石英粉末と共
に溶融され、この合成石英粉末相互の間に存在していた
空気がそのまゝ残存してこれが気泡として残留するので
中間に多数の気泡を含有するものとなるが、この気泡が
壁構造上ハニカム形状またはトラス形状のものとなるの
で、この合成石英ガラス管は機械的強度の大きいものと
なり、したがって高温状態での熱的変形にも耐えるもの
になるし、このものは純度の高い合成石英で作られてい
て不純物も極めて少ないので特に半導体工業における熱
処理治具して有用とされる。The synthetic quartz glass tube thus obtained is fused with the synthetic quartz glass tube double tube with the synthetic quartz powder filled in the middle thereof, and the air existing between the synthetic quartz powders remains the same. Since it remains and remains as bubbles, it contains a large number of bubbles in the middle, but since these bubbles have a honeycomb shape or truss shape due to the wall structure, this synthetic quartz glass tube has high mechanical strength. Therefore, it withstands thermal deformation under high temperature conditions. It is made of synthetic quartz of high purity and has very few impurities, so it is particularly useful as a heat treatment jig in the semiconductor industry. .
つぎに本発明の実施例をあげる。Next, examples of the present invention will be given.
実施例 外径１５０mm、内径１３０mmの外管と外径８０mm、内径
６０mmの内管とからなる長さ１，５００mmの合成石英ガ
ラス管２重管の外管と内管との間隙に、平均粒径８００
μｍのもの７５％、１５０μｍのもの２０％、３０μｍ
のもの５％の割合からなる合成石英粉末を細密充填した
のち、これを１，９００℃に加熱している電気加熱炉内
に装入して、これを炉外から引延し、延伸して外径１１
０mm、内径１０３mm、肉厚３．５mmの合成石英ガラス管
を作ったところ、このものは微細な泡層が管の中央部に
管の厚さ方向で管壁の５３％を占めているものであり、
泡の大きさが約５μｍ〜５００μｍ、平均２５μｍ、泡
密度が１０，０００個／cm3のものであった。Example A synthetic quartz glass tube with a length of 1,500 mm consisting of an outer tube with an outer diameter of 150 mm and an inner diameter of 130 mm and an inner tube with an outer diameter of 80 mm and an inner diameter of 60 mm. Diameter 800
75% for μm, 20% for 150 μm, 30 μm
After closely packing synthetic quartz powder consisting of 5% of the above, it was placed in an electric heating furnace heated to 1,900 ° C., drawn from outside the furnace, and stretched. Outer diameter 11
A synthetic quartz glass tube with a diameter of 0 mm, an inner diameter of 103 mm, and a wall thickness of 3.5 mm was made. This is because a fine bubble layer occupies 53% of the tube wall in the center of the tube in the thickness direction of the tube. Yes,
The size of bubbles was about 5 μm to 500 μm, the average was 25 μm, and the bubble density was 10,000 cells / cm 3 .
また、上記における合成石英ガラス管の二重管の肉厚を
変更してその間隙を変えたほかは上記と同様に処理した
ところ、泡層の厚さが管壁の３５％、７５％を占める合
成石英ガラス管が得られた。Further, the same processing as above was performed except that the thickness of the double tube of the synthetic quartz glass tube was changed to change the gap, and the thickness of the foam layer occupied 35% and 75% of the tube wall. A synthetic quartz glass tube was obtained.
つぎに比較のために同一寸法（外径１１０mm、内径１０
３mm）の微細泡層を全く含有しない合成石英ガラス管と
天然石英ガラス管を準備し、上記で得た３種の合成石英
ガラス管と共にその化学分析を行なってその不純物を測
定したところ、第１表に示したとおりの結果が得られた
が、ついでにこれらから外径１１０mm、内径１０３mm、
肉厚３．５mm、長さ３０mmの試験用試片を切り出し、５
％ＨＦ液で３０分間洗浄し、これらを１，２８０℃で加
熱炉中に１８時間保持したときのつぶれ量を試験片の縦
横径比（ＯＤmax×ＯＤmin）で求めたところ第２表に示
したとおりの結果が得られ、本発明品は従来の合成石英
ガラス管にくらべて純度は同等であっても熱的強度は著
しく向上しており、泡層の厚さが管壁の７５％のものは
天然石英ガラスとほとんど類似した熱的強度を示すこと
が確認された。Next, for comparison, the same dimensions (outer diameter 110 mm, inner diameter 10
A synthetic quartz glass tube and a natural quartz glass tube having no fine bubble layer of 3 mm) were prepared, and the chemical analysis was performed together with the three types of synthetic quartz glass tubes obtained above to measure the impurities. The results shown in the table were obtained. Then, from these, the outer diameter 110 mm, inner diameter 103 mm,
Cut out a test piece with a wall thickness of 3.5 mm and a length of 30 mm, and cut out 5
% HF solution was washed for 30 minutes, and the amount of collapse when these were held in a heating furnace at 1,280 ° C. for 18 hours was determined by the longitudinal-lateral diameter ratio (ODmax × ODmin) of the test piece. The following results were obtained, and the product of the present invention has significantly improved thermal strength as compared with the conventional synthetic quartz glass tube even though the purity is the same, and the thickness of the foam layer is 75% of the tube wall. It was confirmed that has a thermal strength almost similar to that of natural quartz glass.
なお、泡層の厚さが管壁の５３％である上記で得た合成
石英ガラス管についてはその泡密度が相違する２種のも
のを作り、これらのつぶれ量を測定したところ、第３表
に示したとおりの結果が得られ、泡密度の高いほうが熱
的強度の大きいことが確認された。Regarding the synthetic quartz glass tubes obtained above in which the thickness of the foam layer is 53% of the tube wall, two kinds having different foam densities were made, and the collapse amounts were measured. It was confirmed that the higher the bubble density is, the higher the thermal strength is.
第１図は本発明の合成石英ガラス管の横断面図、第２図
はこの合成石英ガラス管の製造方法の縦断面図を示した
ものである。 １、２、１１、１２……合成石英ガラス層 ３……泡含有石英層、１３……空隙部、 １４……合成石英粉末、１５……熱源、 １６……電気炉、１７……合成石英ガラス管、FIG. 1 is a transverse sectional view of a synthetic quartz glass tube of the present invention, and FIG. 2 is a vertical sectional view of a method for manufacturing the synthetic quartz glass tube. 1, 2, 11, 12 ... Synthetic quartz glass layer 3 ... Bubble-containing quartz layer, 13 ... Void portion, 14 ... Synthetic quartz powder, 15 ... Heat source, 16 ... Electric furnace, 17 ... Synthetic quartz Glass tube,
Claims (4)
び外側の両管状層の中間に、直径10〜1,000μｍの微細
な泡を１cm3当り1,000個以上含有する多孔質合成石英ガ
ラス管状層が一体に形成されて成る三層構造を有する合
成石英ガラス管。1. A substantially intermediate the inner and outer surfaces of the tubular layer of synthetic quartz containing no bubbles, porous synthetic quartz glass tube containing fine bubbles of diameters 10~1,000μm 1cm 3 1,000 or more per A synthetic quartz glass tube having a three-layer structure in which layers are integrally formed.
ガラス管の厚さの10〜90％の厚さに形成された特許請求
の範囲第１項記載の合成石英ガラス管。2. The synthetic quartz glass tube according to claim 1, wherein the intermediate layer containing fine bubbles is formed to have a thickness of 10 to 90% of the thickness of the three-layer structure glass tube.
ない二本の合成石英管の間隙に、粒径１〜1,500μｍの
合成石英粉末を充填し、加熱溶融して延伸一体化させる
ことを特徴とする微細な泡を多数含んだ中間層を有する
三層構造合成石英管の製造方法。3. A synthetic quartz powder having a particle size of 1 to 1,500 μm is filled in a gap between two synthetic quartz tubes having a concentric double structure and containing substantially no bubbles, and is melted by heating and stretched integrally. A method for producing a three-layer structure synthetic quartz tube having an intermediate layer containing a large number of fine bubbles, characterized in that
許請求の範囲第３項記載の合成石英ガラス管の製造方
法。4. The method for producing a synthetic quartz glass tube according to claim 3, wherein the synthetic quartz powder is a substantially spherical powder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62117835A JPH0657612B2 (en) | 1987-05-14 | 1987-05-14 | Synthetic quartz glass tube and manufacturing method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62117835A JPH0657612B2 (en) | 1987-05-14 | 1987-05-14 | Synthetic quartz glass tube and manufacturing method thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63282134A JPS63282134A (en) | 1988-11-18 |
| JPH0657612B2 true JPH0657612B2 (en) | 1994-08-03 |
Family
ID=14721428
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62117835A Expired - Lifetime JPH0657612B2 (en) | 1987-05-14 | 1987-05-14 | Synthetic quartz glass tube and manufacturing method thereof |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0657612B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3412734B2 (en) * | 1996-08-07 | 2003-06-03 | 株式会社山形信越石英 | Semiconductor wafer reaction vessel and heat treatment apparatus using the vessel |
| JP7162395B2 (en) * | 2019-07-31 | 2022-10-28 | 東ソ－・エスジ－エム株式会社 | Manufacturing method for multilayer structure quartz glass material |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2206493C3 (en) * | 1972-02-11 | 1975-01-30 | Heraeus-Schott Quarzschmelze Gmbh, 6450 Hanau | Multi-layer quartz glass body for use in solid-state technology |
| JPH0243720B2 (en) * | 1982-09-10 | 1990-10-01 | Toshiba Ceramics Co | HANDOTAISHORYOSEKIEIGARASUSEIROSHINKAN |
| JPS5968163A (en) * | 1982-10-12 | 1984-04-18 | Toshiba Ceramics Co Ltd | Quartz glass for emission tube |
| JPS628933A (en) * | 1985-07-05 | 1987-01-16 | Canon Inc | Wafer transfer device |
-
1987
- 1987-05-14 JP JP62117835A patent/JPH0657612B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63282134A (en) | 1988-11-18 |
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