JPH0657481A - Production of shadow mask - Google Patents

Abstract

PURPOSE:To obtain a shadow mask meeting the requirement of dimensional precision at the time of producing the shadow mask by plating by finish-lapping a stainless steel sheet with a specified abrasive and using the finished sheet. CONSTITUTION:A resist layer is formed on the surface of a stainless steel sheet and patterned, and a shadow mask is formed on the exposed sheet surface by electrolytic iron plating and then released to produce the shadow mask. In this process, the stainless steel sheet is finish-lapped with an abrasive having >=#240 grain size prescribed by JIS R6001 and used. Thus, the releasability of the shadow mask is improved, the shadow mask is released without distorting the shadow mask and a conductor substrate, and a shadow mask excellent in dimensional precision is obtained.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention is directed to an improved method for producing a shadow mask in which a resist layer is formed on the surface of a stainless steel plate, patterned, and then a shadow mask is formed on the exposed surface of the stainless steel plate by electric iron plating and then peeled off. Regarding

[0002]

2. Description of the Related Art Conventionally, a shadow mask is formed by forming a resist layer on a steel plate, patterning a desired shape, etching with a ferric chloride solution to form a large number of holes, and then removing the resist by an etching method. Being manufactured. However, for the shadow mask to be installed in the color picture tube for a display that requires a high-precision and high-definition screen, an electron beam passage hole with a very small hole diameter and pitch is used to correspond to this screen. The dimensional accuracy of about several μm has been required. For this reason, the shadow mask produced by the conventional etching method has many defects in dimensional accuracy, and the product yield is low. Further, there is a drawback that it takes time to process the waste etching liquid.

On the other hand, recently, a shadow mask is manufactured by a plating method instead of the etching method. The shadow mask formed by this plating method is 2B defined by JIS G4305 on the conductor substrate.
And using a 2D finished stainless steel plate, after forming a resist layer on the surface of the stainless steel plate and patterning it, electric iron plating is applied to the exposed surface of the stainless steel plate to form a shadow mask, and then the stainless steel plate is subjected to external stress, etc. It is manufactured by distorting and removing the shadow mask.

[0004]

However, when a shadow mask is manufactured by using the above-described plating method, the shadow mask obtained has satisfactory dimensional accuracy at the time when the shadow mask is formed by electric iron plating on a stainless steel plate. In addition to the distortion, the stainless steel plate used many times also has distortion, and the accuracy is already reduced when it is formed by the electric iron plating, making it very difficult to meet the requirements for dimensional accuracy. I am falling.

Therefore, an object of the present invention is to provide a method for manufacturing a shadow mask by a plating method, which satisfies the requirement of dimensional accuracy.

[0006]

Means for Solving the Problems In order to achieve the above object, the present inventor has conducted diligent research, and as a result, the cause of not satisfying the requirement of dimensional accuracy is mainly due to the distortion generated when the shadow mask is peeled off, and The strain was found to be closely related to the smoothness of the surface of the stainless steel sheet, and the present invention was completed.

That is, the method of the present invention for solving the above-mentioned problems is to form a resist layer on the surface of a stainless steel plate, pattern it, and then perform electric iron plating on the exposed surface of the stainless steel plate. In this method of peeling off the electric iron plating layer, the stainless steel plate has a particle size of # 24 defined by JIS standard R6001.
It is a method for producing a shadow mask, characterized in that it is used after finishing polishing with 0 or more abrasives.

[0008]

Since the conventional 2B and 2D finished stainless steel sheets are subjected to heat treatment, pickling treatment and cold rolling after cold rolling, the smoothness of the surface of the stainless steel sheet is lacking, and the anchor effect between the substrate and the plating film is obtained. It is considered that a plating film with poor peelability is formed.

In the present invention, after a stainless steel plate is polished in advance, it is electroplated with iron to form a plating film with good releasability. That is, stainless steel plate #
Since a smooth stainless steel plate that has been subjected to final polishing with 240 or more abrasives is used, the anchor effect is extremely suppressed, and the shadow mask is peeled off very easily compared to the conventional method without causing distortion in the stainless steel plate and the shadow mask. It becomes possible to do.

On the other hand, when the stainless steel plate is subjected to finish polishing with an abrasive of less than # 240, a sufficiently smooth surface cannot be obtained, and the peelability between the stainless steel plate and the shadow mask is remarkably deteriorated, so that sufficient dimensional accuracy is required. Can't meet.

[0011]

【Example】

Example 1 Vertical 200 which was subjected to finish polishing with an abrasive having a grain size of # 240
mm, width 150 mm, thickness 0.3 mm, the surface of a stainless steel plate, a photoresist is applied to a thickness of 40 μm, a mask for photolithography having a slit having a width of 250 μm and an interval of 50 μm is placed, exposed and developed, Patterning was performed. Then, using the plating solution composition and plating conditions shown in Table 1, electric iron plating was performed on the exposed surface of the stainless steel plate to form a slit-type shadow mask with a thickness of 35 μm, and stress was applied to the end of the stainless steel plate for elasticity. Bending, the plating layer at that portion was peeled off from the steel sheet, and the entire plating layer was peeled off from the peeled portion.

The shadow mask obtained by the above method is suppressed by a glass plate having a thickness of 5 mm from the top, and all the slit widths of the formed shadow mask are slit using an optical length measuring machine having a minimum reading width of 1 μm. A portion 1 mm from the end of was measured to determine the difference between adjacent dimensions. As a result, the dimensional error between the adjacent slits was ± 5 μm, and the requirement that the dimensional accuracy required for the shadow mask was within ± 5 μm could be satisfied.

When the stainless steel plate was placed on a flat surface and observed after peeling, no gap was formed between the stainless steel plate and the flat surface, and no distortion was observed in the stainless steel plate.

[0014]

[Table 1]

Example 2 A shadow mask was manufactured in the same procedure as in Example 1 except that a stainless steel plate finish-polished with an abrasive having a grain size of # 400 was used. The resulting shadow mask has a dimensional error of ±
It was 3 μm, and it was possible to satisfy the requirement of dimensional accuracy.

When the stainless steel plate was placed on a flat surface and observed after peeling, no gap was formed between the stainless steel plate and the flat surface, and no distortion was observed in the stainless steel plate.

Comparative Example 1 A shadow mask was manufactured in the same procedure as in Example 1 except that a 2B-finished stainless steel plate was used. The obtained shadow mask was distorted and the dimensional error between the adjacent slits was about ± 10 μm, so that it was not possible to satisfy the requirement of dimensional accuracy. After the peeling, the stainless steel plate was placed on a flat surface and observed. As a result, a gap of maximum 12 mm was generated between the stainless steel plate and the flat surface, and distortion was observed in the stainless steel plate.

Comparative Example 2 Example 1 was repeated except that a stainless steel plate polished with an abrasive having an abrasive grain size of # 100 was used.
A shadow mask was manufactured in the same procedure as described above. The obtained shadow mask had a dimensional error of about ± 8 μm between adjacent slits, and could not satisfy the requirement for dimensional accuracy. After the peeling, when the stainless steel plate was placed on a flat surface and observed, a maximum gap of about 7 mm was generated between the stainless steel plate and the flat surface, and distortion was observed in the stainless steel plate.

[0019]

By using the method for producing a shadow mask according to the present invention, the shadow mask and the conductive substrate can be peeled off without distortion, and a shadow mask excellent in mechanical reliability, particularly dimensional accuracy can be obtained. Became possible. Further, the method of the present invention can be applied to a method of manufacturing other electronic components and the like that involves peeling from the conductor substrate, and the effect is extremely large.

Claims (1)

[Claims] 1. A method of forming a resist layer on the surface of a stainless steel plate, patterning the same, subjecting the exposed surface of the stainless steel plate to electric iron plating, and then peeling off the electric iron plating layer from the surface of the stainless steel plate. A method for producing a shadow mask, characterized in that a steel sheet is subjected to final polishing with an abrasive having a grain size of # 240 or more as defined by JIS standard R6001 and used.