JPH06322584A - Production of aperture grille - Google Patents

Abstract

PURPOSE:To provide the process for production of the aperture grille which can be peeled from a conductor substrate without distorting the aperture grille. CONSTITUTION:The part where iron. electroplating is not formed is fixed and after the part to be formed with the iron electroplating is sucked by a vacuum suction material, the suction material is moved to direct force toward the longer side of the slit for the iron electroplating, by which the iron electroplating film is peeled from a conductor in the method for peeling the iron electroplating film from the conductor after forming a resist layer on the conductor and patterning this resist layer, then subjecting the exposed conductor to the iron electroplating. As a result, the aperture grille is efficiently produced.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an improved method of manufacturing an aperture grill by electric iron plating.

[0002]

2. Description of the Related Art Conventionally, in an aperture grill, a resist layer is formed on a steel plate, a stripe-shaped slit shape is patterned, etching is performed with a ferric chloride solution to form a large number of slits, and then the resist is removed. It is manufactured by the etching method. However, the aperture grille that is installed in the color picture tube for displays that require high-precision and high-definition screens has an extremely fine width and interval of the slits that are electron beam passage parts to correspond to this screen. It has come to be used. Therefore, the aperture grill produced by the conventional etching method has many dimensional defects, and the product yield is low. Further, there is a drawback that it takes time to process the waste etching liquid.

On the other hand, recently, an attempt has been made to manufacture an aperture grill by a plating method. In this aperture grill, a resist layer is formed on the conductor, and after patterning, the exposed conductor portion is plated with electric iron,
It is manufactured by distorting the conductor by external stress or the like, peeling off the end portion of the electric iron plating film, and peeling off the entire plating film from that portion.

[0004]

However, in the manufacturing by the above plating method, although the dimensional accuracy is satisfied when the electric iron plating film is formed on the conductor, the aperture grill is formed in the step of peeling the aperture grill from the conductor. Distortion easily occurs. Therefore, it is an object of the present invention to provide a method capable of manufacturing an aperture grill without distorting it.

[0005]

Means for Solving the Problems In order to achieve the above object, the present invention comprises forming a resist layer on a conductor, patterning it, and then subjecting the exposed conductor portion to electric iron plating. In the method of peeling off the electric iron plating film, the non-formed portion of the electric iron plating is fixed, the formed portion of the electric iron plating is adsorbed by a vacuum adsorbent, and then the adsorbent is lengthened by the slit of the electric iron plating. A method for manufacturing an aperture grill, characterized in that the peeling is performed by moving so as to direct a force in the direction of the side.

[0006]

The function of the aperture grill obtained by the electric iron plating method is usually 30 to 50 μm in order to satisfy the requirement of dimensional accuracy.
It is a thin film, and the width of the slit band is 200
Since the thickness is about μm, the strength is not so high and it is easily distorted during peeling.

In the present invention, in the step of peeling the aperture grill from the conductor, the non-formed portion of the electric iron plating is fixed, and the vacuum adsorbent adsorbed to the formed portion of the electric iron plating is moved to move the electric iron from the conductor. Remove the plating film. Further, this peeling is performed so that the force is directed in the direction of the long side of the slit of electric iron plating. By doing so, the aperture grill can be peeled off without distorting. It is considered that this is because there is little variation in the peeling force of the iron plating film in the above direction and the peeling force is evenly applied.

[0008]

【Example】

Example: A conductor board has a length of 200 mm, a width of 150 mm, and a thickness of 0.3 m.
m stainless steel plate, its surface (vertical 160 mm,
Photoresist is applied to a thickness of 40 μm (width 130 mm), width 250 μm, vertical length 135 mm, interval 50 μm
After a photolithographic mask having slits of m (slit forming part: length 74 mm, width 100 mm) was placed, exposure, development and patterning were performed. Next, the exposed conductor surface was plated with electric iron under the plating solution composition and conditions shown in Table 1 to form an aperture grill.

After the non-plated portion is fixed horizontally by a jig, the conductor substrate plated with electric iron is parallel to the short side at a distance of 5 mm from the short side (length 130 mm) of the plated portion. A vacuum adsorbent having suction holes with a width of 1 mm and a length of 125 mm was adsorbed on both short sides.

Next, when these vacuum adsorbents were pulled vertically so that the tension was constant, peeling started from both short sides of the plating film in the long side direction. With the peeling, the adsorbent was moved parallel to the long side direction so as to approach the central portion, and the entire plated coating was peeled from the conductor substrate.

Table 1 Composition of plating solution and conditions (solution composition) FeCl ₂ .4H ₂ O 2.01 mol / liter CaCl ₂ 1.62 mol / liter saccharin 9.13 mmol / liter CH ₃ (CH ₂ ) ₆ CH ₂ OSO ₃ Na 0.30 mmol / liter (plating conditions) Temperature 90 ° C. Cathode current density 5 A / dm ² Anode Pt time 46 minutes

The aperture grill obtained by the above method is held by a glass plate having a thickness of 5 mm from the top, and all the slit widths of the formed aperture grill are slit by using an optical length measuring machine having a minimum reading width of 1 μm. 1mm from the edge of
Was measured and the difference between adjacent dimensions was determined. As a result, the dimensional difference between adjacent slit widths is ± 3 μm.
The dimensional accuracy required for the aperture grill is ± 5μ
We were able to meet the requirements within m.

Further, using the same conductor substrate, the above operation was repeated 100 times to obtain 100 aperture grills. All of these aperture grills satisfied the required dimensional accuracy within ± 5 μm.

Comparative Example The procedure was the same as that of the example except that the procedure from fixing the conductive iron-plated conductive substrate with a jig to peeling the entire plated coating from the conductive substrate was performed as follows. The aperture grill was manufactured, inspected, and the stainless steel plate was observed for distortion. That is, the long side of the plating forming portion (length 16
0 mm) to a distance of 5 mm and a width of 1 mm parallel to the long side,
A vacuum adsorbent having suction holes with a length of 125 mm was adsorbed on both long sides. Next, these vacuum adsorbents are pulled vertically so that the tension becomes constant, and peeling is performed from both long sides of the plating film in the short side direction, and as the peeling progresses, the adsorbents approach the central portion parallel to the short side direction. To move.

The aperture grill obtained by the above-mentioned method was markedly damaged around the band of the slit, and was rejected without measuring the dimensional accuracy.

[0016]

According to the method of the present invention, the aperture grill can be efficiently manufactured without distortion.

Claims (1)

[Claims] 1. A resist layer is formed on a conductor and after patterning, the exposed conductor portion is plated with electric iron.
In the method of peeling off the electric iron plating film from the conductor, the non-formed portion of the electric iron plating is fixed, and the formed portion of the electric iron plating is adsorbed by a vacuum adsorbent, and then the adsorbent is electroplated by the electric iron plating. The method of manufacturing an aperture grill, wherein the peeling is performed by moving the slit so as to direct the force in the direction of the long side.